TW200636521A - All surface data for use in substrate inspection - Google Patents

All surface data for use in substrate inspection

Info

Publication number
TW200636521A
TW200636521A TW094143428A TW94143428A TW200636521A TW 200636521 A TW200636521 A TW 200636521A TW 094143428 A TW094143428 A TW 094143428A TW 94143428 A TW94143428 A TW 94143428A TW 200636521 A TW200636521 A TW 200636521A
Authority
TW
Taiwan
Prior art keywords
surface data
substrate inspection
data
disclosed
inspection
Prior art date
Application number
TW094143428A
Other languages
English (en)
Inventor
David Reich
Kenneth Durden
Randall Shay
Original Assignee
August Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/890,762 external-priority patent/US7340087B2/en
Priority claimed from US11/296,645 external-priority patent/US7593565B2/en
Application filed by August Technology Corp filed Critical August Technology Corp
Publication of TW200636521A publication Critical patent/TW200636521A/zh

Links

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)
TW094143428A 2004-07-14 2005-12-08 All surface data for use in substrate inspection TW200636521A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/890,762 US7340087B2 (en) 2003-07-14 2004-07-14 Edge inspection
US63415904P 2004-12-08 2004-12-08
US11/296,645 US7593565B2 (en) 2004-12-08 2005-12-07 All surface data for use in substrate inspection

Publications (1)

Publication Number Publication Date
TW200636521A true TW200636521A (en) 2006-10-16

Family

ID=57809529

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094143428A TW200636521A (en) 2004-07-14 2005-12-08 All surface data for use in substrate inspection

Country Status (1)

Country Link
TW (1) TW200636521A (zh)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI455000B (zh) * 2007-09-06 2014-10-01 Cypress Semiconductor Corp 雙感測模式之接觸感測裝置
TWI463380B (zh) * 2007-09-06 2014-12-01 Cypress Semiconductor Corp 單層接觸感測裝置之校正
TWI469018B (zh) * 2007-11-02 2015-01-11 Cypress Semiconductor Corp 用於碰觸感測器裝置的壓下電力開啓的偵測
TWI498543B (zh) * 2013-06-06 2015-09-01 Crystalwise Technology 自動晶圓光學檢測裝置及檢測晶圓表面均勻性的方法
CN104949991A (zh) * 2015-05-19 2015-09-30 东莞市威力固电路板设备有限公司 印刷电路板自动光学检测系统及其印刷电路板载物台
TWI502546B (zh) * 2012-08-22 2015-10-01 Nvidia Corp 推擠一模型通過二維場景的系統、方法和電腦程式商品
TWI549012B (zh) * 2014-06-10 2016-09-11 Ａｓｍｌ荷蘭公司 計算晶圓檢測
US9842186B2 (en) 2014-09-22 2017-12-12 Asml Netherlands B.V. Process window identifier
TWI628552B (zh) * 2013-03-14 2018-07-01 康維特公司 用於三維虛擬製造環境中的設計規則檢查之非暫態電腦可讀媒體、方法及系統
CN111564382A (zh) * 2020-04-08 2020-08-21 中国科学院微电子研究所 晶圆检测装置及检测方法
TWI743223B (zh) * 2016-10-07 2021-10-21 美商克萊譚克公司 光學檢查系統、光學檢查設備、及光學檢查方法

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI463380B (zh) * 2007-09-06 2014-12-01 Cypress Semiconductor Corp 單層接觸感測裝置之校正
TWI455000B (zh) * 2007-09-06 2014-10-01 Cypress Semiconductor Corp 雙感測模式之接觸感測裝置
US9292122B1 (en) 2007-09-06 2016-03-22 Cypress Semiconductor Corporation Calibration of a touch-sensor device
TWI469018B (zh) * 2007-11-02 2015-01-11 Cypress Semiconductor Corp 用於碰觸感測器裝置的壓下電力開啓的偵測
TWI502546B (zh) * 2012-08-22 2015-10-01 Nvidia Corp 推擠一模型通過二維場景的系統、方法和電腦程式商品
TWI628552B (zh) * 2013-03-14 2018-07-01 康維特公司 用於三維虛擬製造環境中的設計規則檢查之非暫態電腦可讀媒體、方法及系統
TWI498543B (zh) * 2013-06-06 2015-09-01 Crystalwise Technology 自動晶圓光學檢測裝置及檢測晶圓表面均勻性的方法
US10579772B2 (en) 2014-06-10 2020-03-03 Asml Netherlands B.V. Computational wafer inspection
US9507907B2 (en) 2014-06-10 2016-11-29 Asml Netherlands B.V. Computational wafer inspection
US9990462B2 (en) 2014-06-10 2018-06-05 Asml Netherlands B.V. Computational wafer inspection
TWI549012B (zh) * 2014-06-10 2016-09-11 Ａｓｍｌ荷蘭公司 計算晶圓檢測
US11080459B2 (en) 2014-06-10 2021-08-03 Asml Netherlands B.V. Computational wafer inspection
US9842186B2 (en) 2014-09-22 2017-12-12 Asml Netherlands B.V. Process window identifier
US10755025B2 (en) 2014-09-22 2020-08-25 Asml Netherlands B.V. Process window identifier
US11379648B2 (en) 2014-09-22 2022-07-05 Asml Netherlands B.V. Process window identifier
CN104949991A (zh) * 2015-05-19 2015-09-30 东莞市威力固电路板设备有限公司 印刷电路板自动光学检测系统及其印刷电路板载物台
TWI743223B (zh) * 2016-10-07 2021-10-21 美商克萊譚克公司 光學檢查系統、光學檢查設備、及光學檢查方法
CN111564382A (zh) * 2020-04-08 2020-08-21 中国科学院微电子研究所 晶圆检测装置及检测方法

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