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Priority to TW094107961ApriorityCriticalpatent/TW200634434A/en
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Publication of TWI296355BpublicationCriticalpatent/TWI296355B/zh
The present invention provides a compressing pattern transfer process for silicification acid polymer material, which uses a plurality of monomers including acid monomers and silicon monomers to synthesize polymer resist via a polymerization process. Since the polymer resist is an acid silicification polymer, it can be removed by using environmental protection type alkaline water solution, without applying expensive dry etching or organic solvent for removal, when the polymer resist is coated on the substrate for performing hot embossing imprint pattern transfer process, thereby speeding up the manufacturing process, reducing the consumption of machine and the material cost.
TW094107961A2005-03-162005-03-16Compressing pattern transfer process using silicification acid polymer material
TW200634434A
(en)
Method for manufacturing a master mold which is used to form a micropatterned film applied to an exterior of a household appliance and manufacturing apparatus and method of the film using the master mold
Method of forming micro patterns, shape created by this method of forming micro patterns, transfer method and formation of micro patterns using said shape