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Application filed by Powerchip Semiconductor CorpfiledCriticalPowerchip Semiconductor Corp
Priority to TW94106212ApriorityCriticalpatent/TWI254385B/en
Application grantedgrantedCritical
Publication of TWI254385BpublicationCriticalpatent/TWI254385B/en
Publication of TW200633079ApublicationCriticalpatent/TW200633079A/en
Container, Conveyance, Adherence, Positioning, Of Wafer
(AREA)
Chemical Vapour Deposition
(AREA)
Abstract
A deposition apparatus is provided. The deposition apparatus includes a device carrier table, a device support table, and many lift pins at least. The device carrier table has many holes, while the device support table is located under the device carrier table. Also, the lift pins are fixed on the device support table, and can cross the holes.
TW94106212A2005-03-022005-03-02Deposition apparatus and method of depositing film
TWI254385B
(en)