TW200632579A - Exposure apparatus, exposure method and manufacturing method of device - Google Patents

Exposure apparatus, exposure method and manufacturing method of device

Info

Publication number
TW200632579A
TW200632579A TW094143401A TW94143401A TW200632579A TW 200632579 A TW200632579 A TW 200632579A TW 094143401 A TW094143401 A TW 094143401A TW 94143401 A TW94143401 A TW 94143401A TW 200632579 A TW200632579 A TW 200632579A
Authority
TW
Taiwan
Prior art keywords
exposure
liquid
exposure apparatus
manufacturing
status
Prior art date
Application number
TW094143401A
Other languages
Chinese (zh)
Other versions
TWI416266B (en
Inventor
Yoshiki Kida
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200632579A publication Critical patent/TW200632579A/en
Application granted granted Critical
Publication of TWI416266B publication Critical patent/TWI416266B/en

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

An exposure apparatus EX is provided with measurement equipment 60 for measuring at least characteristics or components of a liquid LQ in a status where a liquid immersion region LR is formed on an object different from a substrate P to be exposed. The exposure apparatus accurately performs exposure process and measuring process through the liquid by previously judging the status of the liquid and performing the process accordingly.
TW094143401A 2004-12-09 2005-12-08 An exposure apparatus, an exposure method, an element manufacturing method, and a maintenance method TWI416266B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004356535 2004-12-09

Publications (2)

Publication Number Publication Date
TW200632579A true TW200632579A (en) 2006-09-16
TWI416266B TWI416266B (en) 2013-11-21

Family

ID=49990915

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094143401A TWI416266B (en) 2004-12-09 2005-12-08 An exposure apparatus, an exposure method, an element manufacturing method, and a maintenance method

Country Status (1)

Country Link
TW (1) TWI416266B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI450769B (en) * 2007-06-25 2014-09-01 Nordson Corp Method of applying liquid and apparatus therefor

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1420298B1 (en) * 2002-11-12 2013-02-20 ASML Netherlands B.V. Lithographic apparatus
KR20050085236A (en) * 2002-12-10 2005-08-29 가부시키가이샤 니콘 Exposure apparatus and method for manufacturing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI450769B (en) * 2007-06-25 2014-09-01 Nordson Corp Method of applying liquid and apparatus therefor

Also Published As

Publication number Publication date
TWI416266B (en) 2013-11-21

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees