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Application filed by Nikon CorpfiledCriticalNikon Corp
Publication of TW200632579ApublicationCriticalpatent/TW200632579A/en
Application grantedgrantedCritical
Publication of TWI416266BpublicationCriticalpatent/TWI416266B/en
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure
(AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials
(AREA)
Abstract
An exposure apparatus EX is provided with measurement equipment 60 for measuring at least characteristics or components of a liquid LQ in a status where a liquid immersion region LR is formed on an object different from a substrate P to be exposed. The exposure apparatus accurately performs exposure process and measuring process through the liquid by previously judging the status of the liquid and performing the process accordingly.
TW094143401A2004-12-092005-12-08
An exposure apparatus, an exposure method, an element manufacturing method, and a maintenance method
TWI416266B
(en)
Component mounting method, component mounting apparatus, method for determining mounting conditions, and apparatus and program for determining mounting conditions
Apparatus and method for use in automatically inspecting and repairing prined circuit boards, and apparatus for use in automatically marking printed circuit boards