TW200632152A - Apparatus for manufacturing quartz film - Google Patents

Apparatus for manufacturing quartz film

Info

Publication number
TW200632152A
TW200632152A TW094146241A TW94146241A TW200632152A TW 200632152 A TW200632152 A TW 200632152A TW 094146241 A TW094146241 A TW 094146241A TW 94146241 A TW94146241 A TW 94146241A TW 200632152 A TW200632152 A TW 200632152A
Authority
TW
Taiwan
Prior art keywords
substrate
substrate holder
inlet pipe
reaction vessel
gas inlet
Prior art date
Application number
TW094146241A
Other languages
Chinese (zh)
Other versions
TWI390090B (en
Inventor
Naoyuki Takahashi
Takato Nakamura
Satoshi Nonaka
Yoshinori Kubo
Yoichi Shinriki
Katsumi Tamanuki
Original Assignee
Humo Lab Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2005272749A external-priority patent/JP4786982B2/en
Priority claimed from JP2005272746A external-priority patent/JP4682001B2/en
Application filed by Humo Lab Ltd filed Critical Humo Lab Ltd
Publication of TW200632152A publication Critical patent/TW200632152A/en
Application granted granted Critical
Publication of TWI390090B publication Critical patent/TWI390090B/en

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)

Abstract

An apparatus for manufacturing a quartz film comprising a reaction vessel made of quartz and equipped with a gas outlet, a substrate holder arranged in the reaction vessel (the substrate holder optionally placed in a shielding cylinder arranged in the reaction vessel along its inner surface, in which the shielding cylinder has an inner surface made of material which is inert to gaseous silicon oxide), a first gas inlet pipe that is connected through its outside end to a silicon alkoxide source-containing vessel and that has an in-side end facing a substrate to be fixed onto the substrate holder or a plane around the substrate with a space, and a second gas inlet pipe that is connected through its outside end to a vessel containing an oxygen-containing gas source and that has an inside end facing the substrate to be fixed onto the substrate holder or the plane around the substrate with a space smaller than the space between the substrate and the inside end of the first gas inlet pipe.
TW094146241A 2004-12-24 2005-12-23 Apparatus for manufacturing quartz film TWI390090B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2004374208 2004-12-24
JP2004377432 2004-12-27
JP2005272749A JP4786982B2 (en) 2004-12-27 2005-09-20 Crystal thin film manufacturing equipment
JP2005272746A JP4682001B2 (en) 2004-12-24 2005-09-20 Crystal thin film manufacturing equipment

Publications (2)

Publication Number Publication Date
TW200632152A true TW200632152A (en) 2006-09-16
TWI390090B TWI390090B (en) 2013-03-21

Family

ID=37166516

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094146241A TWI390090B (en) 2004-12-24 2005-12-23 Apparatus for manufacturing quartz film

Country Status (3)

Country Link
KR (1) KR101146547B1 (en)
CN (1) CN1807295B (en)
TW (1) TWI390090B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI490940B (en) * 2008-12-22 2015-07-01 Tokyo Electron Ltd A supply method of a mixed gas, and a supply means for a mixed gas

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3111994B2 (en) * 1998-08-03 2000-11-27 日本電気株式会社 Vapor growth apparatus for metal oxide dielectric materials
JP2001152342A (en) * 1999-11-30 2001-06-05 Hitachi Ltd Semiconductor producing system and method for producing semiconductor system
JP3592218B2 (en) * 2000-09-06 2004-11-24 株式会社ヒューモラボラトリー Manufacturing method of crystal thin film
JP4592198B2 (en) * 2001-03-01 2010-12-01 シャープ株式会社 III-V compound semiconductor manufacturing apparatus and III-V compound semiconductor manufacturing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI490940B (en) * 2008-12-22 2015-07-01 Tokyo Electron Ltd A supply method of a mixed gas, and a supply means for a mixed gas

Also Published As

Publication number Publication date
TWI390090B (en) 2013-03-21
CN1807295B (en) 2010-11-03
KR20060073523A (en) 2006-06-28
KR101146547B1 (en) 2012-05-25
CN1807295A (en) 2006-07-26

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees