TW200631008A - Preparation method of disc master - Google Patents

Preparation method of disc master

Info

Publication number
TW200631008A
TW200631008A TW094105281A TW94105281A TW200631008A TW 200631008 A TW200631008 A TW 200631008A TW 094105281 A TW094105281 A TW 094105281A TW 94105281 A TW94105281 A TW 94105281A TW 200631008 A TW200631008 A TW 200631008A
Authority
TW
Taiwan
Prior art keywords
hard mask
preparation
mask layer
disc master
layer
Prior art date
Application number
TW094105281A
Other languages
Chinese (zh)
Inventor
Cheng-Yuan Tsai
Chung-Ching Hsieh
Original Assignee
Prodisc Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Prodisc Technology Inc filed Critical Prodisc Technology Inc
Priority to TW094105281A priority Critical patent/TW200631008A/en
Publication of TW200631008A publication Critical patent/TW200631008A/en

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Abstract

A preparation method of a disc master includes depositing a hard mask layer on a substrate, coating a photoresist layer above the hard mask layer, wherein the etching rate of the photoresist layer is larger than the hard mask layer, laser beam recording the photoresist layer and the hard mask layer and developing them, etching the substrate and removing the photoresist layer, and removing the hard mask layer.
TW094105281A 2005-02-22 2005-02-22 Preparation method of disc master TW200631008A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW094105281A TW200631008A (en) 2005-02-22 2005-02-22 Preparation method of disc master

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW094105281A TW200631008A (en) 2005-02-22 2005-02-22 Preparation method of disc master

Publications (1)

Publication Number Publication Date
TW200631008A true TW200631008A (en) 2006-09-01

Family

ID=57809112

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094105281A TW200631008A (en) 2005-02-22 2005-02-22 Preparation method of disc master

Country Status (1)

Country Link
TW (1) TW200631008A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10510605B2 (en) 2016-07-29 2019-12-17 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor die singulation and structures formed thereby

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10510605B2 (en) 2016-07-29 2019-12-17 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor die singulation and structures formed thereby
US10720360B2 (en) 2016-07-29 2020-07-21 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor die singulation and structures formed thereby
US11367658B2 (en) 2016-07-29 2022-06-21 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor die singulation and structures formed thereby

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