TW200628401A - Method and apparatus for fabricating high purity silica powder and high purity silica powder - Google Patents
Method and apparatus for fabricating high purity silica powder and high purity silica powderInfo
- Publication number
- TW200628401A TW200628401A TW095101689A TW95101689A TW200628401A TW 200628401 A TW200628401 A TW 200628401A TW 095101689 A TW095101689 A TW 095101689A TW 95101689 A TW95101689 A TW 95101689A TW 200628401 A TW200628401 A TW 200628401A
- Authority
- TW
- Taiwan
- Prior art keywords
- silica powder
- high purity
- fabricating
- purity silica
- glass particles
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1446—Means for after-treatment or catching of worked reactant gases
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/126—Preparation of silica of undetermined type
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/10—Forming beads
- C03B19/1005—Forming solid beads
- C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Processing Of Solid Wastes (AREA)
- Glass Melting And Manufacturing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005011723A JP2006199525A (ja) | 2005-01-19 | 2005-01-19 | 高純度シリカ粉の製造方法及び装置、並びに高純度シリカ粉 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200628401A true TW200628401A (en) | 2006-08-16 |
Family
ID=36692108
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095101689A TW200628401A (en) | 2005-01-19 | 2006-01-17 | Method and apparatus for fabricating high purity silica powder and high purity silica powder |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2006199525A (zh) |
TW (1) | TW200628401A (zh) |
WO (1) | WO2006077717A1 (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104556070B (zh) * | 2014-12-26 | 2017-01-11 | 中天科技精密材料有限公司 | 一种回收高纯二氧化硅的方法及装置 |
CN108217663B (zh) * | 2018-01-30 | 2020-06-02 | 清华大学 | 一种四氯化硅制备白炭黑的低温气相水解设备 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000256008A (ja) * | 1999-03-08 | 2000-09-19 | Tokuyama Corp | 疎水性煙霧シリカ及びその製造方法 |
JP4112125B2 (ja) * | 1999-08-13 | 2008-07-02 | 電気化学工業株式会社 | 微細球状シリカ粉末の製造方法 |
JP2004321970A (ja) * | 2003-04-25 | 2004-11-18 | Shin Etsu Chem Co Ltd | 排気ガス処理方法及び処理装置 |
-
2005
- 2005-01-19 JP JP2005011723A patent/JP2006199525A/ja active Pending
- 2005-12-26 WO PCT/JP2005/023770 patent/WO2006077717A1/ja not_active Application Discontinuation
-
2006
- 2006-01-17 TW TW095101689A patent/TW200628401A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
JP2006199525A (ja) | 2006-08-03 |
WO2006077717A1 (ja) | 2006-07-27 |
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