TW200627093A - Developer composition - Google Patents
Developer compositionInfo
- Publication number
- TW200627093A TW200627093A TW094102729A TW94102729A TW200627093A TW 200627093 A TW200627093 A TW 200627093A TW 094102729 A TW094102729 A TW 094102729A TW 94102729 A TW94102729 A TW 94102729A TW 200627093 A TW200627093 A TW 200627093A
- Authority
- TW
- Taiwan
- Prior art keywords
- weight
- parts
- occupies
- mentioned component
- developer composition
- Prior art date
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Developing Agents For Electrophotography (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW094102729A TW200627093A (en) | 2005-01-28 | 2005-01-28 | Developer composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW094102729A TW200627093A (en) | 2005-01-28 | 2005-01-28 | Developer composition |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200627093A true TW200627093A (en) | 2006-08-01 |
TWI304161B TWI304161B (ja) | 2008-12-11 |
Family
ID=45070873
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094102729A TW200627093A (en) | 2005-01-28 | 2005-01-28 | Developer composition |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW200627093A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI408516B (zh) * | 2008-02-28 | 2013-09-11 | Tokyo Electron Ltd | 半導體裝置之製造方法及光阻塗佈顯影處理系統 |
TWI468877B (zh) * | 2009-03-30 | 2015-01-11 | 顯影液 | |
TWI472881B (zh) * | 2010-11-29 | 2015-02-11 | Tokyo Electron Ltd | 基板處理系統、基板處理方法及電腦記憶媒體 |
-
2005
- 2005-01-28 TW TW094102729A patent/TW200627093A/zh not_active IP Right Cessation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI408516B (zh) * | 2008-02-28 | 2013-09-11 | Tokyo Electron Ltd | 半導體裝置之製造方法及光阻塗佈顯影處理系統 |
TWI468877B (zh) * | 2009-03-30 | 2015-01-11 | 顯影液 | |
TWI472881B (zh) * | 2010-11-29 | 2015-02-11 | Tokyo Electron Ltd | 基板處理系統、基板處理方法及電腦記憶媒體 |
Also Published As
Publication number | Publication date |
---|---|
TWI304161B (ja) | 2008-12-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |