TW200627093A - Developer composition - Google Patents

Developer composition

Info

Publication number
TW200627093A
TW200627093A TW094102729A TW94102729A TW200627093A TW 200627093 A TW200627093 A TW 200627093A TW 094102729 A TW094102729 A TW 094102729A TW 94102729 A TW94102729 A TW 94102729A TW 200627093 A TW200627093 A TW 200627093A
Authority
TW
Taiwan
Prior art keywords
weight
parts
occupies
mentioned component
developer composition
Prior art date
Application number
TW094102729A
Other languages
English (en)
Chinese (zh)
Other versions
TWI304161B (ja
Inventor
qi-sheng Chen
Original Assignee
Everlight Chem Ind Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Everlight Chem Ind Corp filed Critical Everlight Chem Ind Corp
Priority to TW094102729A priority Critical patent/TW200627093A/zh
Publication of TW200627093A publication Critical patent/TW200627093A/zh
Application granted granted Critical
Publication of TWI304161B publication Critical patent/TWI304161B/zh

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Developing Agents For Electrophotography (AREA)
TW094102729A 2005-01-28 2005-01-28 Developer composition TW200627093A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW094102729A TW200627093A (en) 2005-01-28 2005-01-28 Developer composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW094102729A TW200627093A (en) 2005-01-28 2005-01-28 Developer composition

Publications (2)

Publication Number Publication Date
TW200627093A true TW200627093A (en) 2006-08-01
TWI304161B TWI304161B (ja) 2008-12-11

Family

ID=45070873

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094102729A TW200627093A (en) 2005-01-28 2005-01-28 Developer composition

Country Status (1)

Country Link
TW (1) TW200627093A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI408516B (zh) * 2008-02-28 2013-09-11 Tokyo Electron Ltd 半導體裝置之製造方法及光阻塗佈顯影處理系統
TWI468877B (zh) * 2009-03-30 2015-01-11 顯影液
TWI472881B (zh) * 2010-11-29 2015-02-11 Tokyo Electron Ltd 基板處理系統、基板處理方法及電腦記憶媒體

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI408516B (zh) * 2008-02-28 2013-09-11 Tokyo Electron Ltd 半導體裝置之製造方法及光阻塗佈顯影處理系統
TWI468877B (zh) * 2009-03-30 2015-01-11 顯影液
TWI472881B (zh) * 2010-11-29 2015-02-11 Tokyo Electron Ltd 基板處理系統、基板處理方法及電腦記憶媒體

Also Published As

Publication number Publication date
TWI304161B (ja) 2008-12-11

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees