TW200625710A - Methods of cleaning the shadow masks in the production of displays (variants) and device for their realization - Google Patents

Methods of cleaning the shadow masks in the production of displays (variants) and device for their realization

Info

Publication number
TW200625710A
TW200625710A TW095108204A TW95108204A TW200625710A TW 200625710 A TW200625710 A TW 200625710A TW 095108204 A TW095108204 A TW 095108204A TW 95108204 A TW95108204 A TW 95108204A TW 200625710 A TW200625710 A TW 200625710A
Authority
TW
Taiwan
Prior art keywords
mask
ion
variants
cooled holder
vacuum chamber
Prior art date
Application number
TW095108204A
Other languages
Chinese (zh)
Other versions
TWI277230B (en
Inventor
Vladimir Jakovlevich Shiripov
Airat Hamitovich Hisamov
Sergei Pavlovich Maryshev
Original Assignee
Vladimir Jakovlevich Shiripov
Airat Hamitovich Hisamov
Sergei Pavlovich Maryshev
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vladimir Jakovlevich Shiripov, Airat Hamitovich Hisamov, Sergei Pavlovich Maryshev filed Critical Vladimir Jakovlevich Shiripov
Priority to TW95108204A priority Critical patent/TWI277230B/en
Publication of TW200625710A publication Critical patent/TW200625710A/en
Application granted granted Critical
Publication of TWI277230B publication Critical patent/TWI277230B/en

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

The method of cleaning the shadow masks (variants) and the device for its realization proposed as an invention are intended for use in the field of the vacuum cleaning of the shadow masks from deposition of organic and inorganic materials in the production of the OLED (Organic Light Emitting Diode) displays with using the reactive ion-beam etching of the contaminated surface. In the first variant of the method according to the inventions, the cooled holder, in which the mask is disposed, is mounted in the vacuum chamber; the processed mask surface, which is directed towards the emitting surface of the ion source, is being scanned by the focused ribbon ion beam. The tangential speed of scanning is selected in such a way that the energy dose received by the element of the mask surface during a single ion-beam passage over this surface would not exceed the quantity of heat corresponding to the maximum allowable overheating and where oxygen or the mixture thereof is used as ion-forming gas. In the second variant of the method, the mask is pressed additionally to. The holder by means of a clamping mechanism for ensuring the heat contact between the cooled holder and the not treated mask surface. In both variants, oxygen is mixed with the gases from the following series: Ar, Xe, Kr, Ne, N2, CxHy, CxFy, and the oxygen part in the mixture exceeds 10%. In the second variant, the mask is pressed to the surface of the cooled holder by means of the magnetic field created by the magnetic field source. The device for realizing the method any of variants, which comprises the vacuum chamber and, at least, one ion source disposed therein and mask the treated surface of which is faced to the emitting surface of the ion source, is provided additionally, according to the invention, with a cooled holder disposed inside the vacuum chamber and clamping mechanism disposed above and/or inside the vacuum chamber intended for pressing the mask against the cooled holder and ensuring the heal; contact between the cooled holder and not treated mask surface, the ion source designed so that it can alter the coordinates of intersection of the ion beam with the treated mask surface.
TW95108204A 2006-03-10 2006-03-10 Methods of cleaning the shadow masks in the production of displays (variants) and device for their realization TWI277230B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW95108204A TWI277230B (en) 2006-03-10 2006-03-10 Methods of cleaning the shadow masks in the production of displays (variants) and device for their realization

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW95108204A TWI277230B (en) 2006-03-10 2006-03-10 Methods of cleaning the shadow masks in the production of displays (variants) and device for their realization

Publications (2)

Publication Number Publication Date
TW200625710A true TW200625710A (en) 2006-07-16
TWI277230B TWI277230B (en) 2007-03-21

Family

ID=38646452

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95108204A TWI277230B (en) 2006-03-10 2006-03-10 Methods of cleaning the shadow masks in the production of displays (variants) and device for their realization

Country Status (1)

Country Link
TW (1) TWI277230B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI484053B (en) * 2013-07-08 2015-05-11 Everdisplay Optronics Shanghai Ltd Apparatus for removing organic compounds or stains from mask

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103332867B (en) * 2013-07-29 2015-05-20 四川虹视显示技术有限公司 OLED (Organic Light Emitting Diode) panel thinning device and application method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI484053B (en) * 2013-07-08 2015-05-11 Everdisplay Optronics Shanghai Ltd Apparatus for removing organic compounds or stains from mask

Also Published As

Publication number Publication date
TWI277230B (en) 2007-03-21

Similar Documents

Publication Publication Date Title
WO2005059942A3 (en) Method and apparatus for extending equipment uptime in ion implantation
US8168128B2 (en) Plasma reactor
EP2483906B1 (en) Method for ion source component cleaning
KR0158894B1 (en) Surface-treating method and apparatus
KR101160258B1 (en) Method of removing resist and apparatus therefor
US7749782B1 (en) Laser roughening to improve LED emissions
KR20160067743A (en) Technique to deposit sidewall passivation for high aspect ratio cylinder etch
JP5217951B2 (en) Resist removing method and apparatus
TW200945425A (en) Removal of surface dopants from a substrate
TW200501222A (en) Processing apparatus, manufacturing apparatus, processing method, and manufacturing method of electronic device
EA200501086A1 (en) METHOD OF CLEANING SHADOW MASKS IN MANUFACTURE OF DISPLAYS (OPTIONS) AND DEVICE FOR ITS IMPLEMENTATION
WO2003007326A3 (en) Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing
WO2004001804A3 (en) Device for generation of reactive ions
TW200712259A (en) A method for etching high dielectric constant materials
US20130146564A1 (en) Plasma treatment apparatus and plasma treatment method
JP5366436B2 (en) Patterning device cleaning method, layer system deposition method on a substrate, patterning device cleaning system, and coating system for depositing a layer system on a substrate
TW200518229A (en) Method for high resolution processing of thin layers using electron beams
TW200625710A (en) Methods of cleaning the shadow masks in the production of displays (variants) and device for their realization
WO2002047445A3 (en) Chemical plasma cathode
JP2008047535A6 (en) Method for ion beam treatment of dielectric surface and apparatus for performing the method
ES2151633T3 (en) PROCEDURE AND DEVICE FOR DECAPING A METAL SUBSTRATE.
JP2008047535A (en) Ion beam treatment method of dielectric surface, and device for carrying out the method
WO2007067605A3 (en) Ion implanter with ionization chamber electrode design
KR20060127741A (en) Methods of cleaning the shadow masks in the production of displays and decive for their realization
ATE491220T1 (en) PLASMA ETCHING PROCESS AND ETCHING CHAMBER

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees