TW200623376A - Fabrication method of anisotropic conductive film and structure of the same - Google Patents
Fabrication method of anisotropic conductive film and structure of the sameInfo
- Publication number
- TW200623376A TW200623376A TW093141107A TW93141107A TW200623376A TW 200623376 A TW200623376 A TW 200623376A TW 093141107 A TW093141107 A TW 093141107A TW 93141107 A TW93141107 A TW 93141107A TW 200623376 A TW200623376 A TW 200623376A
- Authority
- TW
- Taiwan
- Prior art keywords
- conductive film
- anisotropic conductive
- nanowires
- forming
- same
- Prior art date
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Chemically Coating (AREA)
- Non-Insulated Conductors (AREA)
Abstract
The Anisotropic conductive film and the forming method thereof are disclosed. The method includes steps of (A) provide a nano-porous template and form the thin metal layer on its surface; (B) grow the nanowires into the nanochannel of the template; (C) removing the porous template; (D) forming a magnetic coating layer on the nanowires; (E) applying a magnetic field on the nanowires and forming a passivation layer between the nanowires; and (F) optionally removing the substrate. (G) forming electrodes by sputtering on the both side of the anisotropic conductive film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW93141107A TWI244188B (en) | 2004-12-29 | 2004-12-29 | Fabrication method of anisotropic conductive film and structure of the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW93141107A TWI244188B (en) | 2004-12-29 | 2004-12-29 | Fabrication method of anisotropic conductive film and structure of the same |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI244188B TWI244188B (en) | 2005-11-21 |
TW200623376A true TW200623376A (en) | 2006-07-01 |
Family
ID=37154724
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW93141107A TWI244188B (en) | 2004-12-29 | 2004-12-29 | Fabrication method of anisotropic conductive film and structure of the same |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI244188B (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI385118B (en) * | 2008-11-28 | 2013-02-11 | Univ Nat Cheng Kung | Heterogeneous surface nanowire structure and its manufacturing method |
TWI582796B (en) * | 2010-06-09 | 2017-05-11 | 鑫河電材股份有限公司 | Anisotropic conductive film and method of fabricating the same |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI287805B (en) | 2005-11-11 | 2007-10-01 | Ind Tech Res Inst | Composite conductive film and semiconductor package using such film |
-
2004
- 2004-12-29 TW TW93141107A patent/TWI244188B/en active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI385118B (en) * | 2008-11-28 | 2013-02-11 | Univ Nat Cheng Kung | Heterogeneous surface nanowire structure and its manufacturing method |
TWI582796B (en) * | 2010-06-09 | 2017-05-11 | 鑫河電材股份有限公司 | Anisotropic conductive film and method of fabricating the same |
Also Published As
Publication number | Publication date |
---|---|
TWI244188B (en) | 2005-11-21 |
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