TW200622046A - Multi-single wafer processing apparatus - Google Patents

Multi-single wafer processing apparatus

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Publication number
TW200622046A
TW200622046A TW094131501A TW94131501A TW200622046A TW 200622046 A TW200622046 A TW 200622046A TW 094131501 A TW094131501 A TW 094131501A TW 94131501 A TW94131501 A TW 94131501A TW 200622046 A TW200622046 A TW 200622046A
Authority
TW
Taiwan
Prior art keywords
wafer
wafer processing
loading
reactors
processing
Prior art date
Application number
TW094131501A
Other languages
Chinese (zh)
Inventor
Jerzy Puchacz
Sasangan Ramanathan
Manolito Q Reyes
Thomas E Seidel
Original Assignee
Genus Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Genus Inc filed Critical Genus Inc
Publication of TW200622046A publication Critical patent/TW200622046A/en

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Abstract

A wafer processing apparatus includes one or more processing modules, each having multiple, distinct, single-wafer processing reactors configured for semi-independent ALD and/or CVD film deposition therein; a robotic central wafer handler configured to provide wafers to and accept wafers from each of said wafer processing modules; and a single-wafer loading and unloading mechanism that includes a loading and unloading port and a mini-environment coupling the loading and unloading port to the robotic central wafer handler. The wafer processing reactors may be arranged (i) along axes of a Cartesian coordinate system, or (ii) in quadrants defined by said axes, one axis being parallel to a wafer input plane of the at least one of the process modules to which the single-wafer processing reactors belong. Each processing module can include up to four single-wafer processing reactors, each with an independent gas distribution module.
TW094131501A 2004-09-13 2005-09-13 Multi-single wafer processing apparatus TW200622046A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US60959804P 2004-09-13 2004-09-13

Publications (1)

Publication Number Publication Date
TW200622046A true TW200622046A (en) 2006-07-01

Family

ID=57808439

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094131501A TW200622046A (en) 2004-09-13 2005-09-13 Multi-single wafer processing apparatus

Country Status (1)

Country Link
TW (1) TW200622046A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111364025A (en) * 2020-05-09 2020-07-03 南京原磊纳米材料有限公司 Improved generation ALD coating machine
CN113745131A (en) * 2021-08-31 2021-12-03 顾赢速科技(合肥)有限公司 Multilayer epitaxy process and linear platform equipment thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111364025A (en) * 2020-05-09 2020-07-03 南京原磊纳米材料有限公司 Improved generation ALD coating machine
CN113745131A (en) * 2021-08-31 2021-12-03 顾赢速科技(合肥)有限公司 Multilayer epitaxy process and linear platform equipment thereof
CN113745131B (en) * 2021-08-31 2024-01-16 顾赢速科技(合肥)有限公司 Multilayer epitaxy process and linear platform equipment thereof

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