TW200622046A - Multi-single wafer processing apparatus - Google Patents
Multi-single wafer processing apparatusInfo
- Publication number
- TW200622046A TW200622046A TW094131501A TW94131501A TW200622046A TW 200622046 A TW200622046 A TW 200622046A TW 094131501 A TW094131501 A TW 094131501A TW 94131501 A TW94131501 A TW 94131501A TW 200622046 A TW200622046 A TW 200622046A
- Authority
- TW
- Taiwan
- Prior art keywords
- wafer
- wafer processing
- loading
- reactors
- processing
- Prior art date
Links
Landscapes
- Chemical Vapour Deposition (AREA)
Abstract
A wafer processing apparatus includes one or more processing modules, each having multiple, distinct, single-wafer processing reactors configured for semi-independent ALD and/or CVD film deposition therein; a robotic central wafer handler configured to provide wafers to and accept wafers from each of said wafer processing modules; and a single-wafer loading and unloading mechanism that includes a loading and unloading port and a mini-environment coupling the loading and unloading port to the robotic central wafer handler. The wafer processing reactors may be arranged (i) along axes of a Cartesian coordinate system, or (ii) in quadrants defined by said axes, one axis being parallel to a wafer input plane of the at least one of the process modules to which the single-wafer processing reactors belong. Each processing module can include up to four single-wafer processing reactors, each with an independent gas distribution module.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US60959804P | 2004-09-13 | 2004-09-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200622046A true TW200622046A (en) | 2006-07-01 |
Family
ID=57808439
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094131501A TW200622046A (en) | 2004-09-13 | 2005-09-13 | Multi-single wafer processing apparatus |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW200622046A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111364025A (en) * | 2020-05-09 | 2020-07-03 | 南京原磊纳米材料有限公司 | Improved generation ALD coating machine |
CN113745131A (en) * | 2021-08-31 | 2021-12-03 | 顾赢速科技(合肥)有限公司 | Multilayer epitaxy process and linear platform equipment thereof |
-
2005
- 2005-09-13 TW TW094131501A patent/TW200622046A/en unknown
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111364025A (en) * | 2020-05-09 | 2020-07-03 | 南京原磊纳米材料有限公司 | Improved generation ALD coating machine |
CN113745131A (en) * | 2021-08-31 | 2021-12-03 | 顾赢速科技(合肥)有限公司 | Multilayer epitaxy process and linear platform equipment thereof |
CN113745131B (en) * | 2021-08-31 | 2024-01-16 | 顾赢速科技(合肥)有限公司 | Multilayer epitaxy process and linear platform equipment thereof |
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