TW200621396A - Heater plate and manufacturing method of heater plate - Google Patents

Heater plate and manufacturing method of heater plate

Info

Publication number
TW200621396A
TW200621396A TW094108636A TW94108636A TW200621396A TW 200621396 A TW200621396 A TW 200621396A TW 094108636 A TW094108636 A TW 094108636A TW 94108636 A TW94108636 A TW 94108636A TW 200621396 A TW200621396 A TW 200621396A
Authority
TW
Taiwan
Prior art keywords
heater plate
parts
coupling
heater
jointing
Prior art date
Application number
TW094108636A
Other languages
English (en)
Other versions
TWI317662B (zh
Inventor
Katsumi Watanabe
Akira Fukuchi
Original Assignee
Furukawa Sky Aluminum Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Sky Aluminum Corp filed Critical Furukawa Sky Aluminum Corp
Publication of TW200621396A publication Critical patent/TW200621396A/zh
Application granted granted Critical
Publication of TWI317662B publication Critical patent/TWI317662B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67103—Apparatus for thermal treatment mainly by conduction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67248—Temperature monitoring
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Surface Heating Bodies (AREA)
  • Resistance Heating (AREA)
TW094108636A 2004-12-17 2005-03-21 Heater plate and manufacturing method of heater plate TW200621396A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004365669A JP4868737B2 (ja) 2004-12-17 2004-12-17 ヒータプレート及びヒータプレートの製造方法

Publications (2)

Publication Number Publication Date
TW200621396A true TW200621396A (en) 2006-07-01
TWI317662B TWI317662B (zh) 2009-12-01

Family

ID=36673480

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094108636A TW200621396A (en) 2004-12-17 2005-03-21 Heater plate and manufacturing method of heater plate

Country Status (4)

Country Link
JP (1) JP4868737B2 (zh)
KR (1) KR101164182B1 (zh)
CN (1) CN1791286A (zh)
TW (1) TW200621396A (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8263908B2 (en) 2004-10-08 2012-09-11 Furukawa-Sky Aluminum Corp. Heater plate and a method for manufacturing the heater plate
DE102010037005B3 (de) * 2010-08-16 2011-11-03 Alinox Ag Metallplatte mit eingebettetem Heizelement und Verfahren zu ihrer Herstellung
CN102158994B (zh) * 2011-04-06 2015-04-22 张晓骏 铝合金制加热膜的制造方法
CN102123528B (zh) * 2011-04-17 2012-12-26 李昆生 铝型材制造的电热板
CN102768971A (zh) * 2012-07-04 2012-11-07 上海华力微电子有限公司 一种消除晶体状凝结缺陷的刻蚀机台
JP5857081B2 (ja) * 2014-02-17 2016-02-10 助川電気工業株式会社 基板加熱プレートヒータの製造方法
CN104084512B (zh) * 2014-06-26 2018-07-10 北京通蓝海科技发展有限公司 一种生产热定型加热板的方法
JP6948832B2 (ja) 2017-05-22 2021-10-13 株式会社Ｕａｃｊ鋳鍛 真空装置用伝熱板及びその製造方法
CN110479915B (zh) * 2019-09-02 2020-07-24 绍兴永昊精密电热器件有限公司 一种用于加热板自动埋丝的自动化生产设备

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000243542A (ja) * 1999-02-24 2000-09-08 Nhk Spring Co Ltd ヒータユニット及びその製造方法
JP3895498B2 (ja) * 1999-04-28 2007-03-22 古河スカイ株式会社 金属部材を接合したヒートプレート及びその製造方法

Also Published As

Publication number Publication date
KR101164182B1 (ko) 2012-07-10
KR20060069210A (ko) 2006-06-21
JP4868737B2 (ja) 2012-02-01
TWI317662B (zh) 2009-12-01
CN1791286A (zh) 2006-06-21
JP2006172970A (ja) 2006-06-29

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