TW200620369A - Ion source - Google Patents

Ion source

Info

Publication number
TW200620369A
TW200620369A TW093138256A TW93138256A TW200620369A TW 200620369 A TW200620369 A TW 200620369A TW 093138256 A TW093138256 A TW 093138256A TW 93138256 A TW93138256 A TW 93138256A TW 200620369 A TW200620369 A TW 200620369A
Authority
TW
Taiwan
Prior art keywords
discharge region
ion source
anode
cathode
spaced
Prior art date
Application number
TW093138256A
Other languages
Chinese (zh)
Other versions
TWI322996B (en
Inventor
Hsin-Ho Lee
Original Assignee
Hon Hai Prec Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hon Hai Prec Ind Co Ltd filed Critical Hon Hai Prec Ind Co Ltd
Priority to TW93138256A priority Critical patent/TWI322996B/en
Publication of TW200620369A publication Critical patent/TW200620369A/en
Application granted granted Critical
Publication of TWI322996B publication Critical patent/TWI322996B/en

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)

Abstract

An ion source includes a discharge region; a magnetic wall surrounding the discharge region; a gas supply system; an anode disposed under the discharge region; a cathode disposed above the discharge region and spaced from the anode; and the cathode introduce several field emission devices whose emitters facing to the discharge region.
TW93138256A 2004-12-10 2004-12-10 Ion source TWI322996B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW93138256A TWI322996B (en) 2004-12-10 2004-12-10 Ion source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW93138256A TWI322996B (en) 2004-12-10 2004-12-10 Ion source

Publications (2)

Publication Number Publication Date
TW200620369A true TW200620369A (en) 2006-06-16
TWI322996B TWI322996B (en) 2010-04-01

Family

ID=45074011

Family Applications (1)

Application Number Title Priority Date Filing Date
TW93138256A TWI322996B (en) 2004-12-10 2004-12-10 Ion source

Country Status (1)

Country Link
TW (1) TWI322996B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI729237B (en) * 2016-12-19 2021-06-01 美商瓦里安半導體設備公司 Gas injection system for ion beam device and manufacturing method of extraction plate thereof
CN115681053A (en) * 2023-01-03 2023-02-03 国科大杭州高等研究院 Operation method of self-maintaining Hall thrust system
WO2024146568A3 (en) * 2023-01-03 2024-08-29 国科大杭州高等研究院 Operating method for self-sustaining hall thrust system, non-working medium cathode, hall thruster comprising same, and space device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI729237B (en) * 2016-12-19 2021-06-01 美商瓦里安半導體設備公司 Gas injection system for ion beam device and manufacturing method of extraction plate thereof
CN115681053A (en) * 2023-01-03 2023-02-03 国科大杭州高等研究院 Operation method of self-maintaining Hall thrust system
CN115681053B (en) * 2023-01-03 2023-06-02 国科大杭州高等研究院 Operation method of self-maintaining Hall thrust system
WO2024146568A3 (en) * 2023-01-03 2024-08-29 国科大杭州高等研究院 Operating method for self-sustaining hall thrust system, non-working medium cathode, hall thruster comprising same, and space device

Also Published As

Publication number Publication date
TWI322996B (en) 2010-04-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees