TW200604254A - Process for preparing phenolic resin for photo-resist and photo-resist composition - Google Patents

Process for preparing phenolic resin for photo-resist and photo-resist composition

Info

Publication number
TW200604254A
TW200604254A TW094108328A TW94108328A TW200604254A TW 200604254 A TW200604254 A TW 200604254A TW 094108328 A TW094108328 A TW 094108328A TW 94108328 A TW94108328 A TW 94108328A TW 200604254 A TW200604254 A TW 200604254A
Authority
TW
Taiwan
Prior art keywords
photo
phenolic resin
resist
photoresist
phenols
Prior art date
Application number
TW094108328A
Other languages
Chinese (zh)
Inventor
Osamu Onishi
Kouhei Anada
Original Assignee
Sumitomo Bakelite Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co filed Critical Sumitomo Bakelite Co
Publication of TW200604254A publication Critical patent/TW200604254A/en

Links

Classifications

    • E—FIXED CONSTRUCTIONS
    • E05—LOCKS; KEYS; WINDOW OR DOOR FITTINGS; SAFES
    • E05D—HINGES OR SUSPENSION DEVICES FOR DOORS, WINDOWS OR WINGS
    • E05D5/00—Construction of single parts, e.g. the parts for attachment
    • E05D5/02—Parts for attachment, e.g. flaps
    • E05D5/06—Bent flaps
    • E—FIXED CONSTRUCTIONS
    • E05—LOCKS; KEYS; WINDOW OR DOOR FITTINGS; SAFES
    • E05Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES E05D AND E05F, RELATING TO CONSTRUCTION ELEMENTS, ELECTRIC CONTROL, POWER SUPPLY, POWER SIGNAL OR TRANSMISSION, USER INTERFACES, MOUNTING OR COUPLING, DETAILS, ACCESSORIES, AUXILIARY OPERATIONS NOT OTHERWISE PROVIDED FOR, APPLICATION THEREOF
    • E05Y2900/00—Application of doors, windows, wings or fittings thereof
    • E05Y2900/10—Application of doors, windows, wings or fittings thereof for buildings or parts thereof
    • E05Y2900/13—Type of wing
    • E05Y2900/132—Doors

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)

Abstract

The object of the present invention is to inexpensively and simply manufacture a phenolic resin for photoresist, capable of suppressing contaminations caused by sublimates of photoresist resin composition in a production line and enhancing the productivity. The present invention provides a phenolic resin composition for photoresist obtained by the following manufacturing method, and a method of manufacturing a phenolic resin for photoresist comprising the steps of (a) performing a condensation reaction of phenols and aldehydes, and (b) increasing the temperature of the reaction system after the step (a) so as to remove water and unreacted monomers, which is characterized in that 0.2 mole or more of an acidic catalyst per 1 mole of the phenols is used in the step (a).
TW094108328A 2004-03-18 2005-03-18 Process for preparing phenolic resin for photo-resist and photo-resist composition TW200604254A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004077437A JP4661064B2 (en) 2004-03-18 2004-03-18 Method for producing phenolic resin for photoresist and photoresist composition

Publications (1)

Publication Number Publication Date
TW200604254A true TW200604254A (en) 2006-02-01

Family

ID=35088819

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094108328A TW200604254A (en) 2004-03-18 2005-03-18 Process for preparing phenolic resin for photo-resist and photo-resist composition

Country Status (3)

Country Link
JP (1) JP4661064B2 (en)
KR (1) KR20060043671A (en)
TW (1) TW200604254A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5004904B2 (en) * 2008-07-29 2012-08-22 田岡化学工業株式会社 Method for producing cresol / formaldehyde resin, cresol / formaldehyde resin and rubber composition containing the same
CN106133018B (en) 2013-10-17 2020-07-14 Si集团有限公司 In situ alkylphenol-aldehyde resins
EP3058004A1 (en) 2013-10-17 2016-08-24 SI Group, Inc. Modified alkylphenol-aldehyde resins stabilized by a salicylic acid

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1279430C (en) * 1985-12-06 1991-01-22 Takashi Kubota High-molecular-weight soluble novolak resin and process for preparation thereof
JP2961742B2 (en) * 1989-02-23 1999-10-12 ジェイエスアール株式会社 Method for producing novolak resin
JP3458385B2 (en) * 1991-07-11 2003-10-20 住友化学工業株式会社 Method for producing novolak resin and positive resist composition
KR930006068A (en) * 1991-09-27 1993-04-20 모리 히데오 Novolak resin and preparation method thereof
JP3890387B2 (en) * 1996-07-12 2007-03-07 小西化学工業株式会社 Method for producing dihydroxydiphenylsulfone
JP3546920B2 (en) * 1998-03-05 2004-07-28 住友ベークライト株式会社 Method for producing novolak phenolic resin
US6239248B1 (en) * 1998-09-22 2001-05-29 Borden Chemical, Inc. Phenol-novolacs with improved optical properties
JP3651843B2 (en) * 1999-12-16 2005-05-25 住友ベークライト株式会社 Method for producing phenolic resin
JP2002003562A (en) * 2000-06-21 2002-01-09 Sumitomo Bakelite Co Ltd Production method of phenol resin for photoresist
JP2002268213A (en) * 2001-03-08 2002-09-18 Sumitomo Bakelite Co Ltd Novolak type phenolic resin for photoresist
WO2003042267A1 (en) * 2001-11-16 2003-05-22 Asahi Organic Chemicals Industry Co., Ltd. Phenolic novolaks and process for production thereof
WO2004020492A1 (en) * 2002-08-30 2004-03-11 Asahi Organic Chemicals Industry Co., Ltd. Process for producing phenolic novolak
JP4354766B2 (en) * 2003-09-16 2009-10-28 旭有機材工業株式会社 Method for producing novolac type phenolic resin

Also Published As

Publication number Publication date
KR20060043671A (en) 2006-05-15
JP2005263942A (en) 2005-09-29
JP4661064B2 (en) 2011-03-30

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