200530630200530630
【發明所屬之技術領域】 本發明係與-種微球透鏡有關，更詳而言< 指:種可簡化IU呈步驟、降低生產成本及提高效能與^ 的Μ球透鏡與其陣列之製造方法。 /、 貝 【先前技術】 目前製作 構回流法，主 成圓柱狀，再 #科相對的表面 回流成圓形而 材油浴法，主 (lift-off me 基材上用物理 之後，去除光 成光阻圓柱， 微球透鏡方法大致有二 要是以黃光製程的方法 放入南溫中做回流動作 張力，使得下層結構回 完成微球透鏡之製作； 要是利用兩道光罩黃光 thod)，於第一道光罩 氣相沈積（PVD)沈積出 阻留下鐵氟龍（PTFE)環 最後，以矽油熱融方式 種：第 將兩層 ’利用 流成錐 第二種 微影製 製作空 鐵氟龍 ’再用 熔融出 一種為 高分子 兩層高 狀，上 則為鐵 程之舉 心光阻 (PTFE) 第二道 微球透 雙層結 材料做 分子材 層結構 氣龍底 離法 圓環， 薄膜， 光阻完 鏡0 【發明内容】 ^旦制你山第種雙層結構回流法，其製作方法雖然簡單， 材微球透鏡由於附著性差，⑨容易產生脫落，且 球透面較為不易，第二種鐵氟龍底材油浴法，其微 想之ί作^ ^則較為繁瑣，同時製作上較為困難，均非理 本發明係提供一種微球透鏡與其陣列之製造方法，主[Technical field to which the invention belongs] The present invention relates to a kind of microsphere lens, more specifically < means: a method of manufacturing a sphere lens and an array thereof that can simplify the steps of IU presentation, reduce production costs, and increase efficiency and efficiency. . / 、 Shell [Previous technology] At present, the structure reflow method is produced, the main shape is cylindrical, and the opposite surface of the branch is reflowed into a circular and oil-bath method. After the physical use on the lift-off me substrate, the light is removed. There are roughly two methods of photoresistive cylinders and microsphere lenses. The yellow light process is used to put the temperature in the south temperature to make the reflow action tension, so that the underlying structure is completed to complete the production of the microsphere lens. The first photomask vapor deposition (PVD) deposits a Teflon (PTFE) ring. Finally, it is seeded with silicone oil. The first two layers are made by using a flow cone and the second is a lithography system. Fluoron 'then melts a polymer with two layers of high shape, and the top is Tiecheng's Lifting Photoresistor (PTFE). The second microsphere penetrates the double-layer junction material to make the molecular layer structure. Thin film, photoresist finished mirror 0 [Summary of the Invention] ^ The first double-layer structure reflow method made by Nishan is simple. Although the manufacturing method is simple, the microsphere lens is easy to fall off due to poor adhesion, and the surface of the ball is not easy. Second Teflon Oil bath timber, which like the micro ί ^ ^ is more complicated to make, while the production is difficult, are irrational The present invention provides a method of manufacturing an array of microsphere lenses therewith, the main
200530630 五、發明說明（2) ' "" ^ 要疋利用鐵氟龍（PTFE)本身具疏水物理性質之特點，使熔 融中之光阻微透鏡接觸角增大成微球透鏡，其步驟係在s i w^fer基板上塗佈（c〇ating) 一層鐵氟龍薄膜，並藉由一道 育光微影技術將光阻製作成微圓柱結構，再以光阻熱熔法 熔融成微球透鏡或微球透鏡陣列。 本發明所提供之製法，不僅可製造出高效能與高品質 之微透鏡結構或微透鏡陣列，更可簡化製程步驟，同時降 低生產設備與材料成本。 _【實施方式】 首先’請參閱第一圖，本發明係提供一種微球透鏡與 其陣列之製造方法較佳實施例，主要包含有下列步驟： a 、預備步驟：準備單一或陣列圖案1 1為圓形之光 罩1 0，以便於製作後續微球透鏡之形狀； b、 製作鐵氟龍薄膜步驟··將液體鐵氟龍（pTF E) 2 〇 均勻地塗佈於S i w a f e r基板3 0上，並以兩段轉速分別為 30 0rpm、10sec與4 0 0rpm、40sec進行旋塗動作，之後，再 利用熱墊板（圖中未示）依序以參數為丨丨〇艺、丨〇m i η，以 及165C、10min與265 °C、15min進行烤乾動作，而完成鐵 _氟龍（PTFE)薄膜2 1 ; c、 微影成型步驟：將A Z 4 6 2 0光阻4 〇均勻塗佈於上 述鐵氟龍（PTFE)薄膜2 1上，並利用兩段轉速分別為3 00 。111、1〇36(：與6〇(^0111、2536(：進行旋塗動作，以形成平均 膜厚約15//m之光阻薄膜4 1 ，之後，再其放在熱墊板（H〇t200530630 V. Description of the invention (2) '" " ^ To make use of the characteristics of hydrophobic physical properties of Teflon (PTFE), to increase the contact angle of the photoresistive microlens in the fusion into a microsphere lens, the steps are as follows: Coat a layer of Teflon film on the siw ^ fer substrate, and make the photoresist into a micro-cylindrical structure by a light lithography technology, and then fuse into a microsphere lens or Microsphere lens array. The manufacturing method provided by the present invention can not only manufacture high-performance and high-quality microlens structures or microlens arrays, but also simplify manufacturing steps and reduce production equipment and material costs. _ [Embodiment] First, please refer to the first figure. The present invention provides a preferred embodiment of a method for manufacturing a microsphere lens and its array, which mainly includes the following steps: a. Preparation steps: preparing a single or array pattern 1 1 is Round photomask 10, in order to make the shape of the subsequent microsphere lens; b. Steps of making Teflon film ·· Apply liquid Teflon (pTF E) 2 〇 evenly on Siwafer substrate 30 And spin coating at two speeds of 300 rpm, 10 sec, 400 rpm, and 40 sec. After that, the hot pad (not shown in the figure) is used to sequentially set the parameters as 丨 丨 〇 艺, 丨 〇mi η , And 165C, 10min and 265 ° C, 15min for drying action to complete the iron-fluoron (PTFE) film 2 1; c, lithographic molding step: AZ 4 6 2 0 photoresist 4 〇 uniform coating The above Teflon (PTFE) film 21 is used, and two rotation speeds of 3 00 are used. 111, 1036 (: and 60 (^ 0111, 2536 (: spin coating operation to form a photoresist film 4 1 with an average film thickness of about 15 // m, and then put it on a hot pad (H 〇t
第6頁 200530630Page 6 200530630
Plate)與烤箱（Oven)中軟烤，j：教祕A 、5分鐘，以及烤箱中9G t、2分鐘，】ί為熱塾板中9〇 1 1為圓形之光罩1 〇置於光阻薄膜，’再將上述圓案 .b . , Q r η ,ΛΛ λ 号聘41上方，並以近uv 1外光（35〇nm〜4 0〇nm)之曝光機5〇對準1 光’其曝光劑量約為500 m J〜65 OmJ之間，之後進γ丨〇 影動[即可完成微圓柱結構4 2或微二結構 d、熔融製程：最後，將上述微圓柱結構4 2放入烤 箱（0v = n) 6 0中進行熱融，亦即將微圓柱結構j 2以參數 丨•為120 C、10分鐘及160 °c、10分鐘加熱至AZ462 〇光阻4 〇 之玻璃轉換溫度，使光阻4 0形成之微圓柱結構4 2得以 回流形成微球透鏡4 3或微球透鏡4 3陣列成品。 本發明之優點及功效可歸納如下： 1 ·本發明可製作單一微球透鏡4 3或微球透鏡4 3 陣列。 2 ·本發明製程穩定，並可透過光阻4 〇旋塗之轉速 與光罩1 0圖案1 1之大小穩定控制微球透鏡4 3之直徑 尺寸’该微球透鏡之尺寸可由十# m至數十// m。 3 ·本發明無需複雜昂貴之裝置或生產設備，且生產 備成本低，可大量生產。 4 ·本發明只需一道光罩1 0 ，故可避免因對準問題 產生誤差所導致微球透鏡4 3良率降低之現象。 5 ·本發明微球透鏡4 3可廣泛應用於數位影像系統 、手機通訊、影像儲存、光纖及生醫檢測等產業，故應用Plate) and soft roast in the oven (Oven), j: Secretaries A, 5 minutes, and 9G t, 2 minutes in the oven]] is 901 in the hot plate 1 is a circular mask 1 〇 Photoresist film, 'the above circular case .b., Q r η, ΛΛ λ are hired above 41, and an exposure machine 50 near UV 1 external light (35nm ~ 400nm) is aimed at 1 light 'Its exposure dose is about 500 m J ~ 65 OmJ, and then enter γ 丨 〇 shadowing [to complete the micro-cylinder structure 4 2 or micro-two structure d, melting process: Finally, the above micro-cylinder structure 4 2 is placed Heat into the oven (0v = n) 6 0, that is, the micro-cylinder structure j 2 is heated to a temperature of AZ462 〇 photoresistance 4 〇 with the parameters 丨 • 120 C, 10 minutes and 160 ° c, 10 minutes , So that the micro-cylinder structure 42 formed by the photoresist 40 can be reflowed to form a microsphere lens 43 or an array of microsphere lenses 43. The advantages and effects of the present invention can be summarized as follows: 1. The present invention can make a single microsphere lens 43 or an array of microsphere lenses 43. 2 · The process of the present invention is stable, and the rotation speed of the photoresist 40 spin coating and the size of the photomask 10 pattern 1 1 can be stably controlled. The diameter of the microsphere lens 4 3 'The size of the microsphere lens can be from ten # m to Dozens of // m. 3. The present invention does not require complicated and expensive equipment or production equipment, and has low production cost, and can be mass-produced. 4. The present invention only needs a photomask 10, so it can avoid the phenomenon that the yield of the microsphere lens 43 is reduced due to the error caused by the alignment problem. 5 · The microsphere lens 4 3 of the present invention can be widely used in digital imaging system, mobile phone communication, image storage, optical fiber and biomedical inspection industries, so it is applied
第7頁 200530630 五、發明說明（4) 範疇相當廣泛。 綜上所述，本發明在同類產品中實有其極佳之進步實 用性，同時遍查國内外關於此類結構之技術資料，文獻中 亦未發現有相同的構造存在在先，是以，本發明實已具備 新型專利要件，爰依法提出申請。 惟，以上所述者，僅係本發明之一較佳可行實施例而 已，故舉凡應用本發明說明書及申請專利範圍所為之等效 結構變化，理應包含在本發明之專利範圍内。Page 7 200530630 V. Description of Invention (4) The scope is quite extensive. In summary, the present invention has excellent progress and practicality among similar products. At the same time, it has traversed domestic and foreign technical data on such structures. It has not been found in the literature that the same structure exists first. Therefore, The present invention already has the new patent elements, and the application is filed according to law. However, the above is only one of the preferred and feasible embodiments of the present invention. Therefore, any equivalent structural changes made by applying the description of the present invention and the scope of patent application should be included in the patent scope of the present invention.
第8頁 200530630 圖式簡單說明 # 第 _ 一 圖 係 本發 明 微 球 透 鏡 結 構 之 製 作 流 程 方 塊 第 二 圖 係 本發 明 微 球 透 鏡 結 構 之 光 罩 示 意 圖 〇 第 二 圖 係 本發 明 之 液 體 鐵 氟 龍 (PTFE) 之 塗 佈 示 第 四 圖 係 本發 明 之 液 體 鐵 氟 龍 (PTFE) 塗 佈 後 示 第 五 圖 係 本發 明 之 光 阻 塗 佈 示 意 圖 〇 第 六 圖 係 本發 明 之 光 阻 塗 佈 後 示 意 圖 〇 第 七 圖 係 本發 明 之 曝 光 示 意 圖 〇 第 八 圖 係 本發 明 之 微 影 成 形 後 示 意 圖 〇 第 九 圖 係 本發 明 以 烘 烤 教 $ 融 結 構 之 示 意 圖 〇 第 十 圖 係 本發 明 之 微 球透 鏡 結 構 圖 〇 第 十 一 圖 係本發 明 之 實 際 微 球 透 鏡 結 構 圖 〇 要 元 件 代 表符 號 說 明 ] 1 0 光 罩 2 0 液 體 鐵 氟 龍 3 0 基 板 4 0 光 阻 4 1 光 阻薄 膜 4 2 微 圓 柱 結 構 4 3 微 球透 鏡 5 0 曝 光機 6 0 烤 箱Page 8 200530630 Brief description of the diagram # The first diagram is the manufacturing process of the microsphere lens structure of the present invention. The second diagram is a schematic diagram of the photomask of the microsphere lens structure of the present invention. The second diagram is the liquid teflon of the present invention. (PTFE) coating is shown. The fourth picture is the liquid Teflon (PTFE) coating of the present invention. The fifth picture is the photoresist coating schematic of the present invention. The sixth picture is the photoresist coating of the present invention. Schematic diagram VII. Schematic diagram of exposure of the present invention. VIII. Diagram of lithography of the invention. IX. Diagram of baking structure of the invention. IX. Lens structure diagram. The eleventh diagram is the actual microsphere lens structure diagram of the present invention. The description of the representative symbols of the components] 1 0 Photomask 2 0 Liquid Teflon 3 0 Substrate 4 0 Photoresist 4 1 Barrier film 42 slightly rounded pillar structure 43 microsphere lenses 50 exposure machine 60 the oven