200525286 (1) 九、發明說明 【發明所屬之技術領域】 本發明是關於使用在防止異物附著於製造TFTLCD( 薄膜晶體管液晶顯示器）等時之平板印刷術步驟所使用的 光罩上的大型薄膜。 【先前技術】 以往，半導體電路圖案等的製造中，在光罩的兩側面 配置稱爲薄膜的防塵手段以進行對於該光罩之異物附著的 防止。 薄膜是在具有配合光罩形狀的形狀的厚度爲數mm左 右的框體一側緣面上黏貼厚度1 〇μιη以下的硝化纖維素或 纖維素衍生物等的透明高分子膜所構成的薄膜膜片，並且 該框體的另外側的緣面藉黏著材黏貼在光罩的表面上。 在光罩的表面附著有異物時，其異物在TFTLTD用基 樣玻璃上所形成的光致抗蝕劑上成像而造成電路圖案缺陷 的原因。其中，在光罩的兩面側配置薄膜時，附著在薄膜 表面的異物可藉著焦距位置的偏移不在TFTLCD用基樣玻 璃所形成的光致抗蝕劑上成像而不致在電路圖案上產生缺 陷。 近年來由於各種多媒體的普及而期待可運用於局國質 、可高精密顯示的大型彩色TFTLCD (薄膜晶體管液晶顯 示器）的平板印刷術步驟所使用大型光罩的大型薄膜。 可運用大型TFTLCD等的平板印刷術步驟所使用大型 200525286 (2) 光罩之大型薄膜的大型框體一般爲具有長邊和短邊的方形 。並且，薄膜的框體寬度由於以下的理由而設計成極細° 遮光罩材質的石英玻璃價昂，而極力地要求小的面積，因 此同時要求小的薄膜的外型。又，爲了確保大的遮光罩的 有效曝光區域，期待有大的薄膜內徑。 在此細的框體上黏貼薄膜膜片時，藉著該薄膜膜片的 張力，尤其可以使框體的長邊容易撓曲，而會有因此一撓 曲減小光罩的有效曝光區域的問題，隨著大型薄膜膜片的 ^ 展開面積的增大使得其現象更爲顯著。 如上述，形成使上述框體的一對長邊朝著該框體的外 側突出，抑制因大型薄膜的張力產生朝著該長邊的框體內 側的撓曲以確保光罩等有效曝光區域的大型薄膜（例如， 參閱日本專利特開200 1 -42507 )爲一般所熟知。 【發明內容】 〔發明的目的和槪要〕 β 但是在上述特開200 1 -42507中，如第4圖表示，在凸外 框上黏貼膜片雖然大致形成直線，但是少許殘留著凸形狀。 以此狀態將外框設定於型架上在薄膜膜片上產生皴摺 時’進彳了薄膜膜片上是否附著有異物的檢查時，不能充分 進行皴摺產生處的檢查。並且，皺摺產生的狀態下一旦將 薄膜膜片黏貼光罩等時，TFT圖案等曝光時會導致曝光光 路彎曲的場合。 該皺摺產生的問題會使得薄膜的大小增大，其重量加 -5- 200525286 (3) 重使邊的長度增長等更爲顯著。 因此，本發明是以將黏貼在框體的面積爲l,〇〇〇cm2 以上的大型薄膜膜片黏貼在光罩上時，防止上述大型薄膜 膜片皺摺的產生及/或抑制薄膜膜片的有效曝光區域的減 少爲目的。 爲了達成上述目的用的本發明涉及的代表性構成爲具 有其厚度方向的面積爲1，〇〇〇 cm2以上的薄膜膜片，及在 其上方隨著拉伸應力而伸展的薄膜膜片的框所成的薄膜中 φ ，框具有從薄膜膜片的厚度方向顯示，在一個方向中彼此 對向的相對較短的兩個外圍側邊的對，及框從薄膜膜片的 厚度方向顯示，在上述一個方向形成直角的方向中，彼此 對向的相對較長的兩個外圍側邊的對。 薄膜膜片張貼在框上之前，彎曲，從薄膜膜片厚度方 向顯示連結其上的第一位置和第二位置的假想直線是相對 於第一位置和第二位置之間其上方的第三位置，通過框的 半徑方向內側的相對較長的兩個外圍側邊的至少一側隨著 φ 拉伸應力將薄膜膜片張貼在框上時，從薄膜膜片的厚度方 向顯示，相對於第一位置和第二位置之間的第三位置使連 結第一位置和第二位置的假想直線變形通過框半徑方向的 外側，因此將相對較長的兩個外圍側邊的至少一側設定在 型架上可防止在薄膜膜片上產生皴摺。 薄膜膜片張貼在框上之前，彎曲，從薄膜膜片厚度方 向顯示連結其上的第一位置和第二位置的假想直線是相對 於第一位置和第二位置之間其上方的第三位置，通過框的 -6 - 200525286 (4) 半徑方向內側的相對較長的分別兩個外圍側邊隨著拉伸應 力將薄膜膜片張貼在框上時，從薄膜膜片的厚度方向顯示 ’連結第一位置和第二位置的假想直線一旦相對於第一位 置和第二位置之間的第三位置變形而通過框半徑方向的外 側時，將相對較長的兩個外圍側邊的其中之一設定在型架 上可防止在薄膜膜片上產生皺摺。 薄膜膜片張貼在框上之前，彎曲，從薄膜膜片厚度方 向顯示連結其上的第一位置和第二位置的假想直線是相對 · 於第一位置和第二位置之間其上方的第三位置，通過框的 半徑方向內側的相對較短的兩個外圍側邊的至少一側隨著 拉伸應力將薄膜膜片張貼在框上時，從薄膜膜片的厚度方 向顯示，連結第一位置和第二位置的假想直線是相對於第 一位置和第二位置之間的第三位置變形而通過框半徑方向 的外側，因此將相對較短的兩個外圍側邊的其中之一側設 定在型架上可防止在薄膜膜片上產生皺摺。 薄膜膜片張貼在框上之前，彎曲，從薄膜膜片厚度方 · 向顯示連結其上的第一位置和第二位置的假想直線是相對 於第一位置和第二位置之間其上方的第三位置，通過框的 半徑方向內側的相對較短的分別兩個外圍側邊隨著拉伸應 力將薄膜膜片張貼在框上時，從薄膜膜片的厚度方向顯示 ，連結第一位置和第二位置的假想直線一旦相對於第一位 置和第二位置之間的第三位置變形而通過框半徑方向的外 側時，將相對較短的兩個外圍側邊的其中之一設定在型架 上可防止在薄膜膜片上產生皺摺。 200525286 (5) 隨著拉伸應力將薄膜膜片張貼在框上時，從薄膜膜片 的厚度方向顯示，連結相對較長的兩個外圍側邊的至少一 側的兩端位置的假想直線相對於兩端位置間的中央位置， 和連結兩端位置的假想直線呈直角的方向中，變形以致分 開02.mm以上6mm (或者3mm)以下時，第三位置（從 比第一位置和第二位置相對較短的兩個外圍側邊分開而接 近框的中心）附近的區域中，對於薄膜膜片持續地外加適 當的拉伸應力，可以達成使薄膜的有效曝光區域的減小抑 φ 制在最小限。 本發明的大型薄膜是如上述，上述框體的長邊中央部 由於較長邊端部朝著內側凹陷，因此不會凸出外側。如上 述，即使例如固定上述長邊端部而按壓框體時，上述長邊 中央部也不致撓曲。因此，藉著框體撓曲的防止，可以防 止在薄膜膜片上產生鈹摺。 並將凹陷量抑制在6mm以下，加上上述的效果，可 以使光罩的有效曝光區域形成較小問題的最小限。 鲁 有關構成上述目的用的本發明代表性的構成，係具有 面積1，000 cm2以上的大型薄膜膜片，及在其上薄膜膜片 隨著拉伸應力而張貼的框所成的大型薄膜中，框係具有： 從薄膜膜片的厚度方向所見的方向，在一個方向中彼此對 向的相對較短的兩個樑的對，在其上固定薄膜膜片的周邊 部所成的相對較短的兩個樑的對，及從薄膜膜片的厚度方 向所見的方向，和上述一個方向呈直角的另外一個方向中 ，係彼此對向的相對較長的兩個樑的對，在其上固定薄膜 -8- 200525286 (6) 膜片的周邊部所成的相對較長的兩個裸的對，將薄膜膜片 張貼在框上之前，其中立軸（材料力學所使用的用語爲中 立軸（通過形心的線））呈彎曲，從薄膜膜片的厚度方向 所見的方向，連結中立軸上的第一位置和第二位置的假想 直線相對於第一位置和第二位置之間的中立軸上的第三位 置，通過框的半徑方向的內側的相對較長的兩個樑的至少 一側是隨著拉伸應力將薄膜膜片張貼在框上，從薄膜膜片 的厚度方向所見的方向，連結相對較長的兩個樑的至少一 φ 側中立軸上的第一位置和第二位置的假想直線相對於第一 位置和第二位置之間的中立軸上的第三位置，變形以至通 過框的半徑方向的外側爲止，藉此隨著拉伸應力將薄膜膜 片張貼在框上時，即使在第三位置（從比第一位置和第二 位置相對較短的兩個樑離開而接近框的中心）附近的區域 ，可賦予薄膜膜片充分的拉伸應力，達成薄膜膜片的穩定 支撐。 將薄膜膜片張貼在框上之前，其中立軸（材料力學所 φ 使用的用語爲中立軸（通過形心的線））呈彎曲，從薄膜 膜片的厚度方向所見的方向，連結中立軸上的第一位置和 第二位置的假想直線相對於第一位置和第二位置之間的中 立軸上的第三位置，通過框的半徑方向的內側之相對較長 的分別兩個樑，隨著拉伸應力將薄膜膜片張貼在框上’藉 此從薄膜膜片的厚度方向所見的方向，連結相對較長的各 兩個樑中立軸上的第一位置和第二位置的假想直線相對於 第一位置和第二位置之間的中立軸上的第三位置，變形以 -9- 200525286 (7) 致通過框的半徑方向外側爲止時，即使在第三位置（從比 第一位置和第二位置相對較短的兩個樑離開而接近框的中 心）附近的區域，賦予薄膜膜片充分的拉伸應力，更可進 一步達成薄膜膜片的穩定支撐。 將薄膜膜片張貼在框上之前，其中立軸（材料力學所 使用的用語爲中立軸（通過形心的線））呈彎曲，從薄膜 膜片的厚度方向所見的方向，連結中立軸上的第一位置和 第二位置的假想直線相對於第一位置和第二位置之間的中 φ 立軸上的第三位置，通過框的半徑方向的內側之相對較短 的兩個樑的至少一側，隨著拉伸應力將薄膜膜片張貼在框 上，藉此從薄膜膜片的厚度方向所見的方向，連結相對較 短的兩個樑的至少一側中立軸上的第一位置和第二位置的 假想直線相對於第一位置和第二位置之間的中立軸上的第 三位置，變形以致通過框的半徑方向外側爲止時，即使在 第三位置（從比第一位置和第二位置相對較短的兩個樑離 開而接近框的中心）附近的區域，可賦予薄膜膜片充分的 φ 拉伸應力，達成薄膜膜片的穩定支撐。 將薄膜膜片張貼在框上之前，其中立軸（材料力學所 使用的用語爲中立軸（通過形心的線））呈彎曲，從薄膜 膜片的厚度方向所見的方向，連結中立軸上的第一位置和 第二位置的假想直線相對於第一位置和第二位置之間的中 立軸上的第三位置，通過框的半徑方向的內側之相對較短 的分別雨個樑，隨著拉伸應力將薄膜膜片張貼在框上，藉 此從薄膜膜片的厚度方向所見的方向，連結相對較短的各 -10- 200525286 (8) 兩個樑中立軸上的第一位置和第二位置的假想直線相對於 第一位置和第二位置之間的中立軸上的第三位置，變形以 致通過框的半徑方向外側爲止時，即使在第三位置（從比 第一位置和第二位置相對較短的兩個樑離開而接近框的中 心）附近的區域，賦予薄膜膜片充分的拉伸應力，更可進 一步達成薄膜膜片的穩定支撐。 【實施方式】 φ 使用圖示說明實施本發明用的最佳形態。第1圖是表 示大型薄膜用框體的構成的透視圖。第2(a)圖是表示大 型薄膜用框體的構成的上視圖，第2(b)圖是表示在大型 薄膜用框體上黏貼薄膜膜片使大型薄膜用框體的長邊朝內 側呈凹陷狀態的上視圖，第3圖是表示以型架保持大型薄 膜時的狀態的圖。 第1圖〜第2圖中，1是將厚度1〇卜见以下的硝化纖維 素或纖維素衍生物或非晶質含氟聚合物（例如旭硝子（股 鲁 )製的CYTOP (商品名））或杜邦（股）製的teflonAF ( 商品名）等）等高分子膜所構成的大型薄膜膜片（以下， 僅稱「薄膜膜片」）2展開支持的鋁或其合金、或者鐵系 的合金等所構成的大型薄膜用框體（以下，僅稱爲「框體 J ) ° 框體1具有一對長邊la和一對短邊lb，長邊la及短 邊1 b分別具有預定的寬度尺寸及彼此相等的預定高度所 構成。長邊1 a及短邊1 b的一側面上以框體1的整體呈平 -11 - 200525286 (9) 坦面所構成，形成有黏貼薄膜膜片2用的黏貼面1 al、1 b 1 ο 黏貼框體1的薄膜膜片2之後的面積是以l，〇〇〇cm2 以上所構成，該框體1的一對長邊1 a是形成朝著框體i 的外側突出。並且，本實施形態中，框體1 a的一對長邊 1 a雖具有預定的曲率朝著外側彎曲突出，但是也可以橢圓 形或拋物線形，或者其他各種形狀突出。 黏貼上述薄膜膜片2的面積由於在l，000cm2以上， φ 因此可運用作爲大型TFTLCD (薄膜晶體管液晶顯示器） 的平板印刷術步驟所使用的大型光罩或光栅的薄膜等利用 〇 如第2(b)圖表示，在框體1的長邊la及短邊lb的 黏貼面lal、lbl上塗敷黏著劑，展開薄膜膜片2。黏貼在 框體1的黏貼面lal、lbl的薄膜膜片2的張力雖然均勻 作用於框體1的全周圍，但是其剖面形狀並非全周圍即必 須形成相等，剖面形狀相等時邊的較長側會形成大的撓曲 參 。因此，尤其是長邊1 a會作用而朝著框體1的內側產生 大的撓曲。展開薄膜膜片2黏貼在框體1之後，和框體1 相對的邊同時朝著內側凹陷。將薄膜膜片黏貼在框體（框 架）時，也可以維持著薄膜膜片的張力而黏貼在框體上， 也可以使用型架等將薄膜膜片的張力控制在預定的張力之 後，黏貼在框架上。 但是，本發明中，形成朝著框體1的外側突出的框體 1的一對長邊1 a，可藉此抑制朝著長邊1 a之框體1的內 -12- 200525286 (10) 側撓曲。可以確保安裝大型薄膜的未圖示光罩或光柵等的 有效曝光區域。 在此，本實施形態中’展開薄膜膜片2時長邊1 a的 中央部形成較長邊1 a的端部更向內側僅凹陷有凹陷量d。 如此，在黏貼薄膜膜片2的狀態下，長邊1 a的一部份不 致突出。 因此，如第3圖表示，將框體1的端部設定在型架3 上藉安裝器按壓時，不會按壓型架3突出的部分。其結果 · ，對於展開於框體1上的薄膜膜片2不會施以不必要的力 ，不會有導致皺摺產生之虞。 並且，凹陷量爲3mm以下時，加上上述的作用，藉 著框體長邊的撓曲可以使得形成小的光罩有效曝光區域的 問題得以最小限。 以下是根據上述實施形態形成的框體1之一實施例的 說明。凹陷量d是以下列式槪略求得。其中，設定d :凹 陷量、ω ··張力、L :長邊的長、E :彈性率、h :框體的 鲁 高度、b:框體的高度。 d=126； L4 / 384xExhxb3 本發明中，構成 L = 777.7mm、£ = 72001^01111112、 h = 4.3mm、b = 9nnn、ω =3 xl(T3kgf/mni ( =3gf/mm 即 2.9 x 10-2Mpa/mm)的結果’獲得 d = 1.5mm。 再者，本實施例中，凹陷量d雖是設定爲1 . 5 m m，但 -13- 200525286 (11) 是凹陷量d形成在3mm (或者6mm )以下的範圍內，其他 的數値可任意地變更。 本發明的大型薄膜是使用於安裝在更大型光罩用的薄 膜。 【圖式簡單說明】 第1圖是表示大型薄膜用框體構成的透視圖。 第2圖的（a)部是表示張貼薄膜膜片前的大型薄膜 用框體的狀態的上視圖。第2圖的（b )部是表示在大型 薄膜用框體上黏貼薄膜膜片使大型薄膜用框體的長邊朝內 側呈凹陷狀態的上視圖。 第3圖是表示以型架保持大型薄膜時的狀態的圖。 第4圖是表示習知大型薄膜的構成的上視圖。 第5圖是表示張貼薄膜膜片之前，黏貼薄膜膜片之後 的第2圖所示之大型薄膜用框體尺寸的變化値的表，u是 表示短邊側樑的寬度、W是表示長邊側樑的寬度、V是表 示短邊側樑縱向中央部的短邊側樑的外緣長度、X是表示 長邊側樑縱向中央部的長邊側樑的外緣長度、Y是表示短 邊側樑的縱向長度、Z是表示長邊側樑的縱向長度。 【主要元件符號說明】 1 框體 la 長邊 lb 短邊 -14- 200525286 (12) lal、 lb 1 黏貼 2 薄 膜 膜 片 3 型 架 b 框 體 寬 度 d 凹 陷 量 E 彈 性 率 H 框 體 局 度 L 長 邊 的 長度 張力 -15-200525286 (1) IX. Description of the invention [Technical field to which the invention belongs] The present invention relates to a large film used on a photomask used in a lithography process when preventing foreign matter from adhering to a TFTLCD (thin film transistor liquid crystal display) or the like. [Prior Art] Conventionally, in the manufacture of semiconductor circuit patterns and the like, dust-repellent means called thin films are arranged on both sides of a photomask to prevent foreign matter from adhering to the photomask. The film is a film made of a transparent polymer film such as a nitrocellulose or a cellulose derivative having a thickness of 10 μm or less on a side surface of a frame having a thickness of about several mm that has a shape that matches the shape of the mask. Sheet, and an edge surface on the other side of the frame is adhered to the surface of the photomask by an adhesive material. When foreign matter is adhered to the surface of the photomask, the foreign matter is imaged on a photoresist formed on the TFTLTD-based glass to cause a circuit pattern defect. When the films are arranged on both sides of the photomask, foreign matter adhering to the surface of the film can be prevented from being imaged on the photoresist formed by the TFTLCD-based glass by shifting the focal position without causing defects in the circuit pattern. . In recent years, due to the popularity of various multimedia, large-scale films used in the lithography process of large-scale color TFTLCDs (thin-film transistor liquid crystal displays) that can be applied to local quality and high-precision display are expected. Large 200525286 (2) Photomasks can be used for large-format lithographic steps such as large-sized films. The large frames are generally square with long and short sides. In addition, because the frame width of the film is designed to be extremely thin, the quartz glass material of the hood is expensive, and requires a small area as much as possible. Therefore, a small film appearance is also required. In addition, in order to ensure a large effective exposure area of the hood, a large film inner diameter is expected. When a thin film is stuck on this thin frame, the long side of the frame can be easily bent by the tension of the thin film, and there is a deflection that reduces the effective exposure area of the photomask. The problem is that with the increase of the expanded area of the large thin film diaphragm, the phenomenon becomes more significant. As described above, the pair of long sides of the frame is formed to protrude toward the outside of the frame, and the bending of the large film to the inside of the long side is suppressed to ensure effective exposure areas such as a photomask. Large films (see, for example, Japanese Patent Laid-Open No. 2001-42507) are generally known. [Summary of the Invention] [Objective and Summary of the Invention] β However, as shown in Fig. 4 of the above-mentioned Japanese Patent Application Laid-Open Nos. 2001-42507, although a film is stuck on a convex frame to form a substantially straight line, a convex shape remains slightly. When the outer frame is set on the mold frame in this state, and the film diaphragm is folded, it is not possible to perform a sufficient inspection on the place where the film collapse occurred when the foreign film adhered to the film diaphragm was inspected. In addition, when a thin film film is attached to a mask or the like in a state where wrinkles are generated, the exposure optical path may be bent during exposure of a TFT pattern or the like. The problem caused by this wrinkle will increase the size of the film, and its weight will increase more significantly. Therefore, the present invention prevents the occurrence of wrinkles of the large-sized thin film film and / or suppresses the thin-film film when the large-sized thin film film adhered to the frame body with an area of 1,000 cm2 or more is adhered to the photomask. The purpose is to reduce the effective exposure area. In order to achieve the above-mentioned object, a representative structure according to the present invention includes a thin film sheet having an area in a thickness direction of 1,000 cm 2 or more, and a frame of the thin film sheet stretched with tensile stress thereon. In the formed film φ, the frame has a display from the thickness direction of the film diaphragm, a pair of relatively short two peripheral sides facing each other in one direction, and the frame shows from the thickness direction of the film diaphragm, at In the direction in which the one direction forms a right angle, the pair of relatively long two peripheral sides facing each other. Before the thin film diaphragm is put on the frame, it is bent to show the imaginary straight line connecting the first position and the second position from the thickness direction of the thin film diaphragm with respect to the third position above the first position and the second position. When a thin film is pasted on the frame through at least one of the two relatively long outer peripheral sides on the inner side in the radial direction of the frame, it is displayed from the thickness direction of the thin film when compared to the first The third position between the position and the second position causes an imaginary straight line connecting the first position and the second position to pass through the outside in the radial direction of the frame, so at least one of the two relatively long peripheral sides is set on the profile It prevents folds on the membrane. Before the thin film diaphragm is put on the frame, it is bent to show the imaginary straight line connecting the first position and the second position from the thickness direction of the thin film diaphragm with respect to the third position above the first position and the second position. -6-200525286 through the frame (4) The two relatively long outer edges on the inner side in the radial direction are attached to the frame with tensile stress, and the 'connection' is displayed from the thickness direction of the thin film Once the imaginary straight line of the first position and the second position is deformed relative to the third position between the first position and the second position, and passes through the outside of the frame radial direction, one of the two peripheral sides that are relatively long Setting on the profile frame prevents wrinkles on the film diaphragm. Before the thin film diaphragm is put on the frame, it is bent, and the imaginary straight line connecting the first position and the second position is displayed from the thickness direction of the thin film. Position, at least one of the two relatively short outer sides on the inner side in the radial direction of the frame is attached to the frame from the thickness direction of the thin film when the thin film is attached to the frame with tensile stress The imaginary straight line from the second position is deformed relative to the third position between the first position and the second position, and passes through the outer side in the radial direction of the frame. Therefore, one of the two relatively short peripheral sides is set at The profile frame prevents wrinkles on the film diaphragm. Before the thin film diaphragm is put on the frame, it is bent, and the imaginary straight line connecting the first position and the second position from the thickness direction of the thin film is displayed relative to the first straight line between the first position and the second position. At three positions, when the thin film membrane is attached to the frame through the relatively short two outer sides of the frame on the inner side in the radial direction, the first position and the first position are connected by displaying the thickness of the thin film membrane on the frame. Once the imaginary straight line at the two positions is deformed relative to the third position between the first position and the second position, and passes through the outside of the frame radial direction, one of the two relatively short peripheral sides is set on the profile. Can prevent wrinkles on thin film diaphragms. 200525286 (5) When a thin film diaphragm is attached to a frame with tensile stress, it is shown from the thickness direction of the thin film diaphragm that an imaginary straight line connecting at least two ends of at least one side of two relatively long peripheral sides is opposite. The third position (from the first position to the second position) is deformed to be at a right angle to the imaginary straight line connecting the two end positions at a center position between the two end positions. In the area near the outer edges of the two relatively short sides, which are close to the center of the frame), a suitable tensile stress is continuously applied to the film diaphragm, which can reduce the effective exposure area of the film and restrain φ The minimum. As described above, in the large-sized film of the present invention, since the central portion of the long side of the frame is recessed toward the inside, the outer side does not protrude. As described above, even when the end portion of the long side is fixed and the frame is pressed, the center portion of the long side is not warped. Therefore, by preventing the deflection of the frame, it is possible to prevent beryllium folds from occurring on the thin film diaphragm. By suppressing the depression amount to 6 mm or less and adding the above-mentioned effects, the effective exposure area of the photomask can be minimized to minimize problems. The representative structure of the present invention for the above purpose is a large-size film having an area of 1,000 cm2 or more, and a large-size film formed by a frame on which the film is attached with tensile stress. The frame has: a direction seen from the thickness direction of the thin film diaphragm, a pair of relatively short two beams facing each other in one direction, and a relatively short portion formed by fixing the peripheral portion of the thin film diaphragm thereon The pair of two beams, and the direction seen from the thickness direction of the thin film diaphragm, and the other direction that is at right angles to one of the above directions, are a pair of relatively long two beams facing each other and fixed on it Film-8- 200525286 (6) The relatively long two bare pairs formed by the periphery of the diaphragm, before the film diaphragm is placed on the frame, the vertical axis (the term used in material mechanics is the neutral axis (pass The line of the centroid)) is curved, and the imaginary straight line connecting the first position and the second position on the neutral axis is relative to the neutral axis between the first position and the second position as seen from the thickness direction of the thin film diaphragm. Third place At least one side of the two relatively long beams passing through the inner side in the radial direction of the frame is a thin film sheet attached to the frame with tensile stress. The imaginary straight line of the first position and the second position on the neutral axis of at least one φ side of the two long beams is deformed so as to pass the radius of the frame with respect to the third position on the neutral axis between the first position and the second position. Up to the outside of the direction, when the thin film diaphragm is attached to the frame with tensile stress, it approaches the center of the frame even when it is in the third position (away from the two beams that are relatively shorter than the first and second positions) In the vicinity of the film, sufficient tensile stress can be given to the thin film diaphragm to achieve stable support of the thin film diaphragm. Before the thin film diaphragm is placed on the frame, the vertical axis (the term used for material mechanics φ is the neutral axis (line passing through the centroid)) is curved, and the direction on the neutral axis is connected from the thickness direction of the thin film diaphragm. The imaginary straight line between the first position and the second position is relative to the third position on the neutral axis between the first position and the second position, and passes through two relatively long beams on the inner side in the radial direction of the frame. The tensile stress puts the thin film diaphragm on the frame, thereby imaginary straight lines connecting the first position and the second position on the neutral axis of each of the relatively long two beams from the direction seen from the thickness direction of the thin film diaphragm with respect to the first The third position on the neutral axis between the one position and the second position is deformed by -9- 200525286 (7) until it passes through the outside of the frame in the radial direction, even in the third position (from the first position and the second position). The relatively short positions of the two beams close to the center of the frame) give the film diaphragm sufficient tensile stress, which can further achieve stable support of the film diaphragm. Before the thin film diaphragm is placed on the frame, the vertical axis (the term used in the material mechanics is the neutral axis (line passing through the centroid)) is curved, and the direction from the thickness direction of the thin film diaphragm is connected to the first axis on the neutral axis. The imaginary straight line of one position and the second position passes through at least one side of the relatively short two beams on the inner side in the radial direction of the frame with respect to the third position on the middle φ vertical axis between the first position and the second position, The thin film diaphragm is attached to the frame with tensile stress, thereby connecting the first position and the second position on the neutral axis of at least one side of the two relatively short beams in a direction seen from the thickness direction of the thin film diaphragm. The imaginary straight line relative to the third position on the neutral axis between the first position and the second position is deformed so as to pass through the outside of the radial direction of the frame, even in the third position (from the relative position between the first position and the second position). The short two beams are separated and close to the center of the frame), the film diaphragm can be given sufficient φ tensile stress to achieve stable support of the film diaphragm. Before the thin film diaphragm is placed on the frame, the vertical axis (the term used in the material mechanics is the neutral axis (line passing through the centroid)) is curved, and the direction from the thickness direction of the thin film diaphragm is connected to the first axis on the neutral axis. The imaginary straight line at one position and the second position is relative to the third position on the neutral axis between the first position and the second position, and passes through the relatively short inner beams of the frame on the inner side in the radial direction. The stress attaches the thin film diaphragm to the frame, thereby connecting the relatively short ones from the direction seen from the thickness direction of the thin film -10- 200525286 (8) the first and second positions on the neutral axis of the two beams The imaginary straight line relative to the third position on the neutral axis between the first position and the second position is deformed so as to pass through the outside of the radial direction of the frame, even in the third position (from the relative position between the first position and the second position). The shorter two beams leave the area near the center of the frame), which gives the film diaphragm sufficient tensile stress, which can further achieve the stable support of the film diaphragm. [Embodiment] The best mode for carrying out the present invention will be described with reference to the drawings. Fig. 1 is a perspective view showing the structure of a large-sized film frame. Fig. 2 (a) is a top view showing the structure of a large-sized film frame, and Fig. 2 (b) is a view showing a thin-film frame adhered to the large-sized film frame so that the long side of the large-sized film frame faces inward. A top view of the recessed state, and FIG. 3 is a view showing a state in which a large film is held by a mold frame. In FIGS. 1 to 2, 1 is a nitrocellulose or a cellulose derivative or an amorphous fluoropolymer having a thickness of 10 Å (for example, CYTOP (trade name) made by Asahi Glass). Large-size thin-film diaphragms (hereinafter referred to as "thin-film diaphragms") made of polymer films such as teflonAF (trade name) made by DuPont Co., Ltd. 2 Aluminum or its alloys or iron-based alloys supported by unfolding A large-size film frame (hereinafter, simply referred to as “the frame J”) composed of the frame and the like ° The frame 1 has a pair of long sides la and a pair of short sides lb, and the long sides la and short sides 1 b each have a predetermined width. Dimensions and predetermined heights that are equal to each other. One side of the long side 1 a and the short side 1 b is flat with the entire frame 1-11-200525286 (9) A flat surface is formed with an adhesive film membrane 2 Adhesive surfaces 1 al, 1 b 1 ο The area after the thin film diaphragm 2 of the frame 1 is pasted 10,000 cm 2 or more, and a pair of long sides 1 a of the frame 1 are formed facing The outside of the frame body i protrudes. Also, in this embodiment, the pair of long sides 1 a of the frame body 1 a are curved toward the outside although having a predetermined curvature. It can be prominent, but it can also be oval, parabolic, or other various shapes. Since the area of the above-mentioned thin film diaphragm 2 is more than 1,000cm2, φ, it can be used as a lithography step for large TFTLCD (thin film transistor liquid crystal display). As shown in FIG. 2 (b), the large-scale photomask, grating film, and the like used are coated with adhesive on the adhesive surfaces lal and lbl of the long side la and the short side lb of the frame 1, and the film 2 is unfolded. The tension of the thin film diaphragm 2 adhered to the adhesive surfaces lal and lbl of the frame 1 is uniformly applied to the entire periphery of the frame 1, but the cross-sectional shape is not equal to the entire periphery, which must be equal. A large deflection parameter will be formed on the side. Therefore, especially the long side 1 a will act to produce a large deflection toward the inside of the frame body 1. The unfolded thin film diaphragm 2 is adhered to the frame body 1 and faces the frame body 1 The edge of the film is recessed toward the inside at the same time. When the film diaphragm is adhered to the frame (frame), the film diaphragm can also be adhered to the frame while maintaining the tension of the film diaphragm. The tension of the film diaphragm can also be controlled by using a profile frame or the like After a predetermined tension, the frame is adhered to the frame. However, in the present invention, a pair of long sides 1 a of the frame 1 protruding toward the outside of the frame 1 is formed, thereby suppressing the frame toward the long side 1 a. The inside of 1-12-200525286 (10) side deflection. It can ensure the effective exposure area of a large film, such as a photomask or a grating, which is not shown. Here, in this embodiment, when the film 2 is unrolled, the long side 1 The central part of a forms the longer side 1 a. The end part of the long side 1 a is recessed inward only by the recessed amount d. In this way, a part of the long side 1 a does not protrude when the thin film membrane 2 is adhered. 3 shows that when the end of the frame 1 is set on the profile frame 3 and pressed by the mounter, the protruding portion of the profile frame 3 is not pressed. As a result, unnecessary force is not applied to the thin-film membrane sheet 2 spread on the frame 1, and there is no possibility of causing wrinkles. In addition, when the amount of depression is 3 mm or less, the above-mentioned effect can be used to minimize the problem of forming a small mask effective exposure area by flexing the long side of the frame. The following is an explanation of one example of the frame body 1 formed according to the above embodiment. The depression amount d is obtained by the following formula. Among them, set d: the amount of depression, ω ·· tension, L: the length of the long side, E: the elastic modulus, h: the height of the frame, and b: the height of the frame. d = 126; L4 / 384xExhxb3 In the present invention, constituting L = 777.7mm, £ = 72001 ^ 01111112, h = 4.3mm, b = 9nnn, ω = 3 xl (T3kgf / mni (= 3gf / mm or 2.9 x 10- 2Mpa / mm). D = 1.5mm. Furthermore, in this embodiment, although the depression amount d is set to 1.5 mm, -13-200525286 (11) means that the depression amount d is formed at 3mm (or 6mm), other numbers can be arbitrarily changed. The large film of the present invention is a film used for mounting on a larger photomask. [Brief description of the drawing] Figure 1 shows a frame for a large film A perspective view of the structure. Part (a) of FIG. 2 is a top view showing a state of the large-sized film frame before the film film is pasted. Part (b) of FIG. 2 shows a state where the large-sized film frame is pasted. Top view of the thin film sheet with the long side of the frame for large-size films recessed toward the inside. Figure 3 is a view showing a state in which a large-size film is held by a mold frame. Top view. Figure 5 shows the large-scale thin film shown in Figure 2 before the film film is pasted and after the film film is pasted. Table of changes in the size of the frame for the film u, u is the width of the short side beam, W is the width of the long side beam, and V is the length of the outer edge of the short side beam at the longitudinal center of the short side beam , X is the length of the outer edge of the long side beam at the longitudinal center of the long side beam, Y is the length of the short side beam, and Z is the length of the long side beam. [Description of Symbols of Main Components] 1 Frame la long side lb short side -14- 200525286 (12) lal, lb 1 stick 2 film diaphragm 3 frame b frame width d depression amount E modulus of elasticity H frame locality L length side length tension -15 -