TW200515477A - Holographic reticle and method for manufacturing the same, and photolithograph method with holographic technology for semiconductor manufacture - Google Patents

Holographic reticle and method for manufacturing the same, and photolithograph method with holographic technology for semiconductor manufacture

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Publication number
TW200515477A
TW200515477A TW092129200A TW92129200A TW200515477A TW 200515477 A TW200515477 A TW 200515477A TW 092129200 A TW092129200 A TW 092129200A TW 92129200 A TW92129200 A TW 92129200A TW 200515477 A TW200515477 A TW 200515477A
Authority
TW
Taiwan
Prior art keywords
holographic
reticle
technology
photolithograph
manufacturing
Prior art date
Application number
TW092129200A
Other languages
Chinese (zh)
Other versions
TWI222102B (en
Inventor
Shih-Ming Chang
Chung-Hsing Chang
Chih-Cheng Chin
Wen-Chuan Wang
Chi-Lun Lu
Sheng Chi Chin
Chin Hsiang Lin
Original Assignee
Taiwan Semiconductor Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg Co Ltd filed Critical Taiwan Semiconductor Mfg Co Ltd
Priority to TW92129200A priority Critical patent/TWI222102B/en
Application granted granted Critical
Publication of TWI222102B publication Critical patent/TWI222102B/en
Publication of TW200515477A publication Critical patent/TW200515477A/en

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

A holographic mask and a method for manufacturing the same, and a photolithograph method with holographic technology for semiconductor manufacture are disclosed, by using holographic technology to convert a layout pattern into holographic fringes to form a hologram reticle (HR), and then using typical photolithograph technology to reconstruct the holographic fringes on the hologram reticle onto a photoresist on a substrate. By the characteristic of the holography, defect on the hologram reticle will not affect the pattern image formed on the photoresist of the substrate seriously, thereby improving the defect problem of the reticle effectively.
TW92129200A 2003-10-21 2003-10-21 Holographic reticle and method for manufacturing the same, and photolithograph method with holographic technology for semiconductor manufacture TWI222102B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW92129200A TWI222102B (en) 2003-10-21 2003-10-21 Holographic reticle and method for manufacturing the same, and photolithograph method with holographic technology for semiconductor manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW92129200A TWI222102B (en) 2003-10-21 2003-10-21 Holographic reticle and method for manufacturing the same, and photolithograph method with holographic technology for semiconductor manufacture

Publications (2)

Publication Number Publication Date
TWI222102B TWI222102B (en) 2004-10-11
TW200515477A true TW200515477A (en) 2005-05-01

Family

ID=34433025

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92129200A TWI222102B (en) 2003-10-21 2003-10-21 Holographic reticle and method for manufacturing the same, and photolithograph method with holographic technology for semiconductor manufacture

Country Status (1)

Country Link
TW (1) TWI222102B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104749890B (en) * 2013-12-25 2017-02-15 昆山国显光电有限公司 Exposure method and system of photoetching technology

Also Published As

Publication number Publication date
TWI222102B (en) 2004-10-11

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees