TW200515477A - Holographic reticle and method for manufacturing the same, and photolithograph method with holographic technology for semiconductor manufacture - Google Patents
Holographic reticle and method for manufacturing the same, and photolithograph method with holographic technology for semiconductor manufactureInfo
- Publication number
- TW200515477A TW200515477A TW092129200A TW92129200A TW200515477A TW 200515477 A TW200515477 A TW 200515477A TW 092129200 A TW092129200 A TW 092129200A TW 92129200 A TW92129200 A TW 92129200A TW 200515477 A TW200515477 A TW 200515477A
- Authority
- TW
- Taiwan
- Prior art keywords
- holographic
- reticle
- technology
- photolithograph
- manufacturing
- Prior art date
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
A holographic mask and a method for manufacturing the same, and a photolithograph method with holographic technology for semiconductor manufacture are disclosed, by using holographic technology to convert a layout pattern into holographic fringes to form a hologram reticle (HR), and then using typical photolithograph technology to reconstruct the holographic fringes on the hologram reticle onto a photoresist on a substrate. By the characteristic of the holography, defect on the hologram reticle will not affect the pattern image formed on the photoresist of the substrate seriously, thereby improving the defect problem of the reticle effectively.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW92129200A TWI222102B (en) | 2003-10-21 | 2003-10-21 | Holographic reticle and method for manufacturing the same, and photolithograph method with holographic technology for semiconductor manufacture |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW92129200A TWI222102B (en) | 2003-10-21 | 2003-10-21 | Holographic reticle and method for manufacturing the same, and photolithograph method with holographic technology for semiconductor manufacture |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI222102B TWI222102B (en) | 2004-10-11 |
TW200515477A true TW200515477A (en) | 2005-05-01 |
Family
ID=34433025
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW92129200A TWI222102B (en) | 2003-10-21 | 2003-10-21 | Holographic reticle and method for manufacturing the same, and photolithograph method with holographic technology for semiconductor manufacture |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI222102B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104749890B (en) * | 2013-12-25 | 2017-02-15 | 昆山国显光电有限公司 | Exposure method and system of photoetching technology |
-
2003
- 2003-10-21 TW TW92129200A patent/TWI222102B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TWI222102B (en) | 2004-10-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |