TW200512310A - Substrate processing apparatus - Google Patents
Substrate processing apparatusInfo
- Publication number
- TW200512310A TW200512310A TW093122227A TW93122227A TW200512310A TW 200512310 A TW200512310 A TW 200512310A TW 093122227 A TW093122227 A TW 093122227A TW 93122227 A TW93122227 A TW 93122227A TW 200512310 A TW200512310 A TW 200512310A
- Authority
- TW
- Taiwan
- Prior art keywords
- pin
- substrate
- processing apparatus
- gas
- substrate processing
- Prior art date
Links
Landscapes
- Chemical Vapour Deposition (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
A substrate processing apparatus is capable of decreasing the jam of the substrate transferring after the substrate moving up or down in reaction chambers of semiconductor equipments like CVD equipments, the decreasing of jam increases the productivity of LCD array substrates.The substrate processing apparatus 10 comprises: a pin 12 supporting, lifting and lowering the substrate 42; a pin guider 14, formed into a tube-shape allowing the pin 12 pass through, which has inward surface forming with concaves 19; a gas introducing hole 16 transporting gas into the pin guider 14 and a exhausting hole 18 exhausting the gas. The gas transported into the pin guider 14 can form an air-bearing layer between the pin 12 and the pin guider 14 and make the pin 12 move up-down smoothly.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003200989A JP4412640B2 (en) | 2003-07-24 | 2003-07-24 | Substrate processing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200512310A true TW200512310A (en) | 2005-04-01 |
TWI297737B TWI297737B (en) | 2008-06-11 |
Family
ID=34261205
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW93122227A TWI297737B (en) | 2003-07-24 | 2004-07-23 | Substrate processing apparatus |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP4412640B2 (en) |
TW (1) | TWI297737B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100367485C (en) * | 2003-04-21 | 2008-02-06 | 东京毅力科创株式会社 | Device for applying semiconductor treatment to treatment subject substrate |
JP6451508B2 (en) * | 2015-05-29 | 2019-01-16 | 株式会社Sumco | Epitaxial growth apparatus, epitaxial wafer manufacturing method, and lift pin for epitaxial growth apparatus |
-
2003
- 2003-07-24 JP JP2003200989A patent/JP4412640B2/en not_active Expired - Fee Related
-
2004
- 2004-07-23 TW TW93122227A patent/TWI297737B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TWI297737B (en) | 2008-06-11 |
JP4412640B2 (en) | 2010-02-10 |
JP2005042141A (en) | 2005-02-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |