TW200511541A - Fine pitch gold bump fabrication process and its package article - Google Patents
Fine pitch gold bump fabrication process and its package articleInfo
- Publication number
- TW200511541A TW200511541A TW092124453A TW92124453A TW200511541A TW 200511541 A TW200511541 A TW 200511541A TW 092124453 A TW092124453 A TW 092124453A TW 92124453 A TW92124453 A TW 92124453A TW 200511541 A TW200511541 A TW 200511541A
- Authority
- TW
- Taiwan
- Prior art keywords
- gold
- fabrication process
- fine pitch
- bump
- gold bump
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/11—Manufacturing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/11—Manufacturing methods
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
A fine pitch gold bump fabrication process is carried out on a wafer, which has a plurality of chips, each of which has a plurality of bump pads. The fabrication process comprises forming a gold electroplating seed metal film with thickness of 1500-2500 Å on the wafer where there are bump pads, electroplating a gold metal pattern layer on the electroplating seed metal film, in which the metal pattern layer has a plurality of gold bumps individually located on the bump pads, and finally removing the portion of the electroplating seed metal film, which is not located beneath the gold bumps to complete the gold bump fabrication process with pitch of 15-35 μm. Therefore, good height uniformity of the gold bumps and high degree of surface planarity of the gold bumps are achieved.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW092124453A TWI222198B (en) | 2003-09-04 | 2003-09-04 | Fine pitch gold bump fabrication process and its package article |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW092124453A TWI222198B (en) | 2003-09-04 | 2003-09-04 | Fine pitch gold bump fabrication process and its package article |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI222198B TWI222198B (en) | 2004-10-11 |
TW200511541A true TW200511541A (en) | 2005-03-16 |
Family
ID=34433011
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW092124453A TWI222198B (en) | 2003-09-04 | 2003-09-04 | Fine pitch gold bump fabrication process and its package article |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI222198B (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI385281B (en) * | 2005-09-30 | 2013-02-11 | Metalor Technologies Japan Corp | Gold bump or gold wiring formation method |
US9450061B2 (en) | 2013-05-06 | 2016-09-20 | Himax Technologies Limited | Metal bump structure for use in driver IC and method for forming the same |
CN112864021A (en) * | 2019-11-27 | 2021-05-28 | 南茂科技股份有限公司 | Conductive bump and method for making the same |
-
2003
- 2003-09-04 TW TW092124453A patent/TWI222198B/en not_active IP Right Cessation
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI385281B (en) * | 2005-09-30 | 2013-02-11 | Metalor Technologies Japan Corp | Gold bump or gold wiring formation method |
US9450061B2 (en) | 2013-05-06 | 2016-09-20 | Himax Technologies Limited | Metal bump structure for use in driver IC and method for forming the same |
US10128348B2 (en) | 2013-05-06 | 2018-11-13 | Himax Technologies Limited | Metal bump structure for use in driver IC and method for forming the same |
CN112864021A (en) * | 2019-11-27 | 2021-05-28 | 南茂科技股份有限公司 | Conductive bump and method for making the same |
Also Published As
Publication number | Publication date |
---|---|
TWI222198B (en) | 2004-10-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |