TW200508740A - Method of manufacturing a reflector, and liquid crystal display device including such a reflector - Google Patents
Method of manufacturing a reflector, and liquid crystal display device including such a reflectorInfo
- Publication number
- TW200508740A TW200508740A TW093121364A TW93121364A TW200508740A TW 200508740 A TW200508740 A TW 200508740A TW 093121364 A TW093121364 A TW 093121364A TW 93121364 A TW93121364 A TW 93121364A TW 200508740 A TW200508740 A TW 200508740A
- Authority
- TW
- Taiwan
- Prior art keywords
- reflector
- layer
- photo
- liquid crystal
- crystal display
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
- G02B5/0215—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures the surface having a regular structure
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
- G02B5/0221—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures the surface having an irregular structure
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0268—Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0273—Diffusing elements; Afocal elements characterized by the use
- G02B5/0284—Diffusing elements; Afocal elements characterized by the use used in reflection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0273—Diffusing elements; Afocal elements characterized by the use
- G02B5/0289—Diffusing elements; Afocal elements characterized by the use used as a transflector
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133553—Reflecting elements
- G02F1/133555—Transflectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
- G03F7/405—Treatment with inorganic or organometallic reagents after imagewise removal
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Manufacturing & Machinery (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Organic Chemistry (AREA)
- Optical Elements Other Than Lenses (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03102200 | 2003-07-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200508740A true TW200508740A (en) | 2005-03-01 |
Family
ID=34072645
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093121364A TW200508740A (en) | 2003-07-17 | 2004-07-16 | Method of manufacturing a reflector, and liquid crystal display device including such a reflector |
Country Status (7)
Country | Link |
---|---|
US (1) | US20060187383A1 (zh) |
EP (1) | EP1649319A1 (zh) |
JP (1) | JP2007530988A (zh) |
KR (1) | KR20060038448A (zh) |
CN (1) | CN1823295A (zh) |
TW (1) | TW200508740A (zh) |
WO (1) | WO2005008321A1 (zh) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007520030A (ja) * | 2003-12-10 | 2007-07-19 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | モノマー含有層をフォトエンボス加工する方法 |
WO2006051484A2 (en) * | 2004-11-10 | 2006-05-18 | Koninklijke Philips Electronics N.V. | Printer device for printing tactile information |
TWI325071B (en) * | 2004-12-10 | 2010-05-21 | Hon Hai Prec Ind Co Ltd | Transflective liquid crystal display device |
TWI257020B (en) * | 2004-12-10 | 2006-06-21 | Hon Hai Prec Ind Co Ltd | Transflective liquid crystal display |
WO2006085741A1 (en) * | 2005-02-09 | 2006-08-17 | Stichting Dutch Polymer Institute | Process for preparing a polymeric relief structure |
KR100742376B1 (ko) * | 2005-09-30 | 2007-07-24 | 삼성에스디아이 주식회사 | 패드부 및 그 제조 방법 |
US8574823B2 (en) | 2005-10-05 | 2013-11-05 | Hewlett-Packard Development Company, L.P. | Multi-level layer |
EP1855127A1 (en) * | 2006-05-12 | 2007-11-14 | Rolic AG | Optically effective surface relief microstructures and method of making them |
CN101535900B (zh) * | 2006-08-30 | 2013-09-04 | 斯蒂茨丁荷兰聚合物学会 | 一种制备聚合浮雕结构的方法 |
EP2019336A1 (en) * | 2007-06-11 | 2009-01-28 | Stichting Dutch Polymer Institute | Process for preparing a polymeric relief structure |
JP5647001B2 (ja) * | 2007-12-11 | 2014-12-24 | コーニンクレッカ フィリップス エヌ ヴェ | ハイブリッド上部反射器を備える側面放射装置 |
EP2109005A1 (en) | 2008-04-07 | 2009-10-14 | Stichting Dutch Polymer Institute | Process for preparing a polymeric relief structure |
EP2192447A1 (en) * | 2008-11-27 | 2010-06-02 | Akzo Nobel Coatings International B.V. | Method of applying a pattern to a substrate |
IT1399160B1 (it) | 2009-09-24 | 2013-04-11 | Univ Calabria | Matrice polimerica formata da unâ¬"alternarsi muri polimerici e canali vuoti e processo per la sua realizzazione |
GB0918976D0 (en) * | 2009-10-29 | 2009-12-16 | Univ Surrey | A method of making a patterned dried polymer and a patterned dried polmer |
US11467397B2 (en) * | 2017-04-25 | 2022-10-11 | Microcontinuum, Inc. | Methods and apparatus for forming dual polarized images |
CN113203073A (zh) * | 2021-05-11 | 2021-08-03 | 陕西交通控股集团有限公司 | 公路隧道加强照明的阳光输送系统 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61187237A (ja) * | 1985-02-14 | 1986-08-20 | Toshiba Corp | パタ−ン形成方法 |
US6285426B1 (en) * | 1998-07-06 | 2001-09-04 | Motorola, Inc. | Ridged reflector having optically transmissive properties for an optical display device |
KR100394023B1 (ko) * | 1998-08-06 | 2003-10-17 | 엘지.필립스 엘시디 주식회사 | 반투과 반사형 액정표시장치 |
-
2004
- 2004-07-15 EP EP04744589A patent/EP1649319A1/en not_active Withdrawn
- 2004-07-15 KR KR1020067001149A patent/KR20060038448A/ko not_active Application Discontinuation
- 2004-07-15 US US10/564,327 patent/US20060187383A1/en not_active Abandoned
- 2004-07-15 CN CNA2004800202968A patent/CN1823295A/zh active Pending
- 2004-07-15 WO PCT/IB2004/051231 patent/WO2005008321A1/en not_active Application Discontinuation
- 2004-07-15 JP JP2006520095A patent/JP2007530988A/ja active Pending
- 2004-07-16 TW TW093121364A patent/TW200508740A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
JP2007530988A (ja) | 2007-11-01 |
KR20060038448A (ko) | 2006-05-03 |
EP1649319A1 (en) | 2006-04-26 |
CN1823295A (zh) | 2006-08-23 |
US20060187383A1 (en) | 2006-08-24 |
WO2005008321A1 (en) | 2005-01-27 |
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