TW200506321A - Apparatus and method for detecting deviations of incident angles of ion beam - Google Patents
Apparatus and method for detecting deviations of incident angles of ion beamInfo
- Publication number
- TW200506321A TW200506321A TW092122062A TW92122062A TW200506321A TW 200506321 A TW200506321 A TW 200506321A TW 092122062 A TW092122062 A TW 092122062A TW 92122062 A TW92122062 A TW 92122062A TW 200506321 A TW200506321 A TW 200506321A
- Authority
- TW
- Taiwan
- Prior art keywords
- ion beam
- incident angles
- detecting deviations
- deviations
- deviated
- Prior art date
Links
Landscapes
- Electron Sources, Ion Sources (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Vapour Deposition (AREA)
Abstract
An apparatus for detecting deviations of incident angles of ion beam is provided. The apparatus comprises an ion beam source, a means for fixing wafers and an ion beam sensor. A method for detecting deviations of incident angles of ion beam is provided. The ion beam source is configured opposite to where the means for fixing wafers is configured. The ion beam sensor receives the ion beam beside the means for fixing wafers, which is emitted from the ion beam source. Compare the values of current of the deviated incident angles to the non- deviated incident angles would get the deviations of incident angles of ion beam.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW92122062A TWI220154B (en) | 2003-08-12 | 2003-08-12 | Apparatus and method for detecting deviations of incident angles of ion beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW92122062A TWI220154B (en) | 2003-08-12 | 2003-08-12 | Apparatus and method for detecting deviations of incident angles of ion beam |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI220154B TWI220154B (en) | 2004-08-11 |
TW200506321A true TW200506321A (en) | 2005-02-16 |
Family
ID=34076487
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW92122062A TWI220154B (en) | 2003-08-12 | 2003-08-12 | Apparatus and method for detecting deviations of incident angles of ion beam |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI220154B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI415159B (en) * | 2005-04-01 | 2013-11-11 | Axcelis Tech Inc | Ion implantation system and ion beam angle measurement apparatus |
-
2003
- 2003-08-12 TW TW92122062A patent/TWI220154B/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI415159B (en) * | 2005-04-01 | 2013-11-11 | Axcelis Tech Inc | Ion implantation system and ion beam angle measurement apparatus |
Also Published As
Publication number | Publication date |
---|---|
TWI220154B (en) | 2004-08-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |