TW200506321A - Apparatus and method for detecting deviations of incident angles of ion beam - Google Patents

Apparatus and method for detecting deviations of incident angles of ion beam

Info

Publication number
TW200506321A
TW200506321A TW092122062A TW92122062A TW200506321A TW 200506321 A TW200506321 A TW 200506321A TW 092122062 A TW092122062 A TW 092122062A TW 92122062 A TW92122062 A TW 92122062A TW 200506321 A TW200506321 A TW 200506321A
Authority
TW
Taiwan
Prior art keywords
ion beam
incident angles
detecting deviations
deviations
deviated
Prior art date
Application number
TW092122062A
Other languages
Chinese (zh)
Other versions
TWI220154B (en
Inventor
Heng-Kai Hsu
Jui-Pin Chen
Original Assignee
Promos Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Promos Technologies Inc filed Critical Promos Technologies Inc
Priority to TW92122062A priority Critical patent/TWI220154B/en
Application granted granted Critical
Publication of TWI220154B publication Critical patent/TWI220154B/en
Publication of TW200506321A publication Critical patent/TW200506321A/en

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Landscapes

  • Electron Sources, Ion Sources (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

An apparatus for detecting deviations of incident angles of ion beam is provided. The apparatus comprises an ion beam source, a means for fixing wafers and an ion beam sensor. A method for detecting deviations of incident angles of ion beam is provided. The ion beam source is configured opposite to where the means for fixing wafers is configured. The ion beam sensor receives the ion beam beside the means for fixing wafers, which is emitted from the ion beam source. Compare the values of current of the deviated incident angles to the non- deviated incident angles would get the deviations of incident angles of ion beam.
TW92122062A 2003-08-12 2003-08-12 Apparatus and method for detecting deviations of incident angles of ion beam TWI220154B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW92122062A TWI220154B (en) 2003-08-12 2003-08-12 Apparatus and method for detecting deviations of incident angles of ion beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW92122062A TWI220154B (en) 2003-08-12 2003-08-12 Apparatus and method for detecting deviations of incident angles of ion beam

Publications (2)

Publication Number Publication Date
TWI220154B TWI220154B (en) 2004-08-11
TW200506321A true TW200506321A (en) 2005-02-16

Family

ID=34076487

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92122062A TWI220154B (en) 2003-08-12 2003-08-12 Apparatus and method for detecting deviations of incident angles of ion beam

Country Status (1)

Country Link
TW (1) TWI220154B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI415159B (en) * 2005-04-01 2013-11-11 Axcelis Tech Inc Ion implantation system and ion beam angle measurement apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI415159B (en) * 2005-04-01 2013-11-11 Axcelis Tech Inc Ion implantation system and ion beam angle measurement apparatus

Also Published As

Publication number Publication date
TWI220154B (en) 2004-08-11

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees