200427644 玖、發明說明： 【發明所屬之技術領域】 本發明係關於一種光觸媒玻璃之製造方法，尤其係於 一種可以產生自我清潔效果的光觸媒破璃之製造方法者。 【先前技術】 玻璃為曰常生活之中，經常使用到的物品之一，因為 使用需求的不同，玻璃的製造及加工方式、特性、強度亦 有所不同。傳統玻璃在製造上’大部分的原板玻璃製程係 將原料經由窯爐加以熔解後，經錫槽將玻璃拉製成所需厚 度、寬度，經徐冷窯控制冷卻、調整應力以製成原板玻璃 。該原板玻璃最後再經由使用之需求進行裁切、加工等程 序以提供使用者使用。 然而傳統玻璃一旦與商品結合使用，多會在其表面吸 附灰塵、污垢’因此使用者在經過_段時間之後，便必須 利用玻璃清潔劑進行玻璃表面之清潔，如此不僅麻煩，且 倘若該玻璃是使用於高空建築物之外牆玻璃時，其清潔工 孝之進仃不僅不易且危險，因此若該玻璃可進行自我清潔 則便可省去許多不必要的清潔工程及費用。 玻璃從事業者多已著手嘗試開發可進行自我清潔之玻 ::然而由於技術與操作條件上之限制，戶斤生產出來之所 =潔玻璃之多樣化生產之靈活度不佳，增加庫存壓力且 、乂依據不同業主及建築師的期望而調整生產條件。 【發明内容】 /生你1千 本如明人有鑑於此，乃積極進行研究開發，以期可以 敌供一種可以進杆白浊、主、知 廼仃自我#潔，又不必增加庫存，且能依客 200427644 戶之設計而靈活生產之玻璃製法，藉由該製法以提供消費 者一種可真正進行自我清潔效果之玻璃，經過不斷的試驗 及努力，終於開發出本發明。 本I月之主要目的在於提供一種藉由光觸媒效果以產 生自我清潔效果之玻璃的製造方法。 &為了達到上述發明目的，本發明乃採取以下之技術手 段予以達成，其中本發明乃是藉由真空滅錢之方法於原板 玻璃之表面鑛上二氧化鈦之薄膜，其真空濺鑛時之操作壓 力為1X1『3mb〜3xl〇-3mb，通入之氣體為 2 8卜3 5 0 s c cm之氬氣、工5 ◦〜2 6 〇 s c c ①之氧氣、5〜20 S r rm夕# u c cm之虱乳，所產生之膜厚為工 〇〇〜2〇〇nm，鍍膜之輻射率為〇·75〜〇·9。 糟由上述製成條件，本發明可在玻璃之表面鍍上二氧 化鈦：薄膜，經熱處理將膜層結晶組織調整，藉由此一光 觸媒薄膜可以提供玻璃確實之自我清潔效果。 【實施方式】 、本發明之光觸媒玻璃之製造方法乃是在玻璃傳統之生 ，法後將製造完成之原板玻璃移至真空濺鍍槽内進行二 乳化鈦薄膜之滅鍍工程，其中原板破璃於真空滅鑛槽内之 操作壓力為1><10-311113〜3><1〇_31^，通入之 氣體為28〇〜350sccm之氬氣、15〇〜200427644 发明 Description of the invention: [Technical field to which the invention belongs] The present invention relates to a method for manufacturing a photocatalyst glass, and in particular to a method for manufacturing a photocatalyst breaking glass that can produce a self-cleaning effect. [Previous technology] Glass is one of the items often used in daily life. Because of different usage needs, glass manufacturing and processing methods, characteristics, and strength are also different. In traditional glass manufacturing, most of the original plate glass manufacturing process is to melt the raw materials through a kiln, and then draw the glass into a desired thickness and width through a tin bath. The cold cooling kiln controls the cooling and adjusts the stress to make the original plate glass . The original glass is finally cut and processed by the user's needs to be used by users. However, once traditional glass is used in combination with goods, it will often adsorb dust and dirt on its surface. Therefore, after a period of time, the user must use glass cleaner to clean the glass surface. This is not only troublesome, but if the glass is When it is used in the exterior glass of high-altitude buildings, it is not easy and dangerous for its cleaners to clean it. Therefore, if the glass can be cleaned by itself, many unnecessary cleaning projects and costs can be saved. Many glass manufacturers have begun to try to develop self-cleaning glass :: However, due to technical and operating conditions, the production of household products = poor flexibility of diversified production of clean glass, increasing inventory pressure, and,调整 Adjust production conditions according to the expectations of different owners and architects. [Summary of the Invention] / In the light of this, 1,000 people are actively researching and developing, so as to provide an enemy with a white cloud, a master and a knowledgeable self-cleaning, without having to increase inventory, and The 200427644 household designed and flexibly produced the glass manufacturing method. By using this manufacturing method to provide consumers with a glass that can truly perform self-cleaning effects, after continuous experiments and efforts, the invention was finally developed. The main purpose of this month is to provide a method for manufacturing a glass that produces a self-cleaning effect by a photocatalyst effect. & In order to achieve the above-mentioned object of the invention, the present invention is achieved by adopting the following technical means, in which the present invention is a method of extinguishing money by vacuum on the surface of the original plate glass of titanium dioxide film, the operating pressure during vacuum sputtering It is 1X1 "3mb ~ 3xl0-3mb, the gas to be passed in is 2 8b 3 5 0 sc cm of argon, 5 ◦ ~ 2 6 〇scc ① of oxygen, 5 ~ 20 S r rm evening # uc cm of For lice milk, the film thickness produced is OO ~ 200nm, and the emissivity of the coating is 0.75 ~ 0.9. Based on the above-mentioned manufacturing conditions, the present invention can plate titanium dioxide: thin film on the surface of the glass, and adjust the crystal structure of the film layer by heat treatment, so that a photocatalyst film can provide the glass with a true self-cleaning effect. [Embodiment] The manufacturing method of the photocatalyst glass of the present invention is based on the tradition of glass. After the method, the manufactured original glass is moved to a vacuum sputtering tank to perform the deplating process of the two emulsified titanium films. The original glass is broken. The operating pressure in the vacuum ore extinguishing tank is 1 > < 10-311113 ~ 3 > < 1〇_31 ^, and the gas introduced is 28 ~ 350sccm argon, 15 ~
SbCCI^氧氣、5〜20sccm之氮氣，所產生之膜 旱為1 QQ〜2Q〇nm ’鍍膜之轄射率為q.75〜〇. 200427644 。月參看第-圖所示，本發明乃是將原板玻璃（丄〇 ) 置於真空濺鍍槽之運送滾輪（2 〇 ) i，經由運送滾輪（ 2 ◦)將原板玻璃（1 0 )運送至濺鍍陰極組（2 1 )之 下方將鈦靶（2 4 )作成為陰極，利用氣體供應裝置（ 25)導入之氬氣解離成為氬正離子（26)，加速撞擊 陰極之鈦鈀（2 4 )表面，將鈦原子（2 2 )濺射到原板 玻璃（10)1面前，其會與導入真空室中之氧氣作用而 形成二氧化鈦原子，並在原板玻璃（1 (3 )表面堆積成為 二氧化鈦濺鍍膜（2 3 )。 另外，在形成有二氧化鈦濺鍍膜後之玻璃可依需要再 將其移至強化爐中加以熱處理，以進行鍍膜結晶組織的調 整，此項熱處理之溫度則是取決於光觸媒濺鍍膜之膜厚， 其範圍為玻璃厚度為2〜1 9mm，加熱溫度為6 4〇〜 7 4 0 °C，加熱時間為丄〇 〇〜9 6 〇秒。 經過熱處理之玻璃則以徐冷、急冷或半急冷等不使玻 璃破裂之降溫法，使玻璃溫度降到常溫或4 〇〜8 〇I， 增加玻璃強度及二氧化鈦結晶組織調整。 經由本發明方法，則光觸媒玻璃可以進行離線錄膜作 業加以進行而不同於國外生產自潔玻璃需採原板玻璃線上 鍍膜之方式’由於原板玻璃線上鍍膜需要量產，且無法因 應不同客戶需求加以調整，而本發明方法可單片生產，亦 可上線量產，並經由陰極功率、運輸速度、氣體含量、膜 厚控制及光學數據之彈性調整，可確實滿足客戶之不同需 200427644 【圖式簡單說明】 (一） 圖式部分 第一圖為本發明進行真空濺鍍時之離子移動狀態 示意圖。 (二） 元件代表符號 (1 0 )原板玻璃 (2 0 )運送滾輪 (21)濺鍍陰極組 (2 2 )鈦原子 _ (2 3 )濺鍍膜 (2 4 )鈦靶 (2 5 )氣體供應裝置 (2 6 )氬正離子SbCCI ^ oxygen, 5 ~ 20sccm of nitrogen, the resulting film is 1 QQ ~ 2Q〇nm 'emission rate of the coating is q.75 ~ 〇. 200427644. As shown in FIG.-FIG., The present invention is to place the original glass (丄 〇) in a transporting roller (20) i of a vacuum sputtering tank, and transport the original glass (1 0) to the Below the sputtering cathode group (2 1), a titanium target (2 4) is used as a cathode, and argon gas introduced by a gas supply device (25) is dissociated into positive argon ions (26), and titanium palladium (2 4) that hits the cathode is accelerated. ) Surface, titanium atoms (2 2) are sputtered in front of the original plate glass (10) 1, which will interact with oxygen introduced into the vacuum chamber to form titanium dioxide atoms, and will be deposited on the surface of the original plate glass (1 (3)) as titanium dioxide splashes. Coating (2 3). In addition, after forming the titanium dioxide sputtering film, the glass can be moved to a strengthening furnace and heat treated as needed to adjust the crystal structure of the coating. The temperature of this heat treatment depends on the photocatalytic sputtering. The film thickness of the coating film is in the range of glass thickness of 2 ~ 19mm, heating temperature of 640 ~ 740 ° C, and heating time of 丄 〇〇 ～ 960。 The heat-treated glass is cooled by Tempering or semi-tempering does not break the glass The cooling method reduces the temperature of the glass to normal temperature or 4 0 ~ 80 0I, and increases the glass strength and titanium dioxide crystal structure adjustment. Through the method of the present invention, the photocatalyst glass can be used for offline film recording operation, which is different from self-cleaning in foreign production. The glass needs to be coated on the original plate glass line. 'Because the original plate glass line coating needs mass production and cannot be adjusted according to different customer needs, the method of the present invention can be produced in a single piece or on-line for mass production. , Gas content, film thickness control, and flexible adjustment of optical data, can truly meet the different needs of customers 200427644 [Simplified diagram] (a) The first diagram of the diagram part is the schematic diagram of the ion movement state during vacuum sputtering of the present invention (II) Symbols of component representation (1 0) original glass (20) transport roller (21) sputtering cathode group (2 2) titanium atom (2 3) sputtering film (2 4) titanium target (2 5) gas Supply device (2 6) argon positive ion