TW200425237A - Pump - Google Patents

Abstract

A vacuum pump is formed by a member made of aluminum or an aluminum alloy. The surface of the member is oxidized by plasma oxidization or oxidization with oxygen radicals. Thus, an aluminum oxide film which is dense and flat is formed so that the vacuum pump having high corrosion resistance is formed.

Description

200425237 V. Description of the invention (1) 1. [Technical field to which the invention belongs] The present invention relates to a pump ', particularly to a vacuum pump used in a vacuum processing system, and a manufacturing method thereof. 2. [Previous technology] Generally, vacuum processing systems used in semiconductor devices include cluster systems and online systems. Each of these systems has a large number of processing chambers and transfers the components to be processed (wafers, wafers, Glass substrate) moving mechanism. In these vacuum processing systems, in each processing chamber, under the state of atmospheric pressure (that is, the vacuum state), various processes such as film formation and etching are performed on the member to be processed. In each processing chamber of the vacuum processing system, most vacuum pumps are used for exhausting the processing chamber. In addition, the vacuum processing system Ik wafers, glass substrates, and other components to be processed have become larger and larger, and the weight is so large that they are usually handled. Equipment tends to be unable to move. The nearest vacuum processing body at the plasma, strong gas medium is here. The pump, the low temperature air fruit contains the shaft body, the teeth are usually or stainless steel processing room, and the plasma is often strong. ..., exhaust, dry inlets and components. The essence of the pump is based on the improvement of the true '碉 π run-up system. Such reactive non-corruptible materials The processing system pump and booster pump are formed in a vacuum pump with a suction wheel and the like to form a vacuum, and the internal plasma oxidation or oxygen radical oxidation is used. The plasma processing system uses a cluster processing system. Er Li itself must use various types of pumps, such as turbo molecular pumps and scroll pumps, for non-reactive vacuum pumps. The rotors, blades, and empty pump components in the shells of these true exits are made of aluminum alloys such as Dura Aluminum. Lightweight pump, compared with aluminum alloy

200425237 Fifth, the description of the invention (2) is good. However, when a vacuum pump made of a chain alloy is used as a vacuum pump for a plasma processing system, the internal wall of the vacuum pump is corroded by media such as ions / tongue species and corrosive gases when various gases are dissociated by the plasma. The vacuum system formed by aluminum alloy cannot be used in plasma processing system. On the other hand, the vacuum pump made of stainless steel still has insufficient corrosion resistance to media such as active species. These problems are not limited to vacuum pumps for plasma processing systems. Generally speaking, pumps used to discharge corrosive media also have these problems. In addition, Japanese Patent Laid-Open No. 7-2 1 658 9 (Patent Document 1) proposes that an anodic oxidation treatment is used for a vacuum pump to form alumina with corrosion resistance on the surface of a member formed of aluminum or an aluminum alloy. Membrane (Ab%). In fact, Japanese Patent Application Laid-Open No. 2 0 3-2 1 0 62 (Patent Document 2) describes a cryopump having an anodized cryopump. However: the AW film formed by J anodizing is basically a porous shell film, and the surface is also uneven. Therefore, gas, HC1, ¥ 〇4, HF, etc., and the "~» π _ π > u \ ^ strong anodic emulsified Α 丨 2 〇3 coating, very corrosion resistance Low. Moreover, when the anode gas servant A] η ", moisture is absorbed into the membrane molecules to make it February ^ with high temperature water vapor touch and so on. There is post-processing such as swollen swelling, there are landfills, etc. The gas used for the electrical equipment treated as above is applied; = the actual oxidation place under high decompression degree: 1 ... reached; fixed; non :: Jingyang on the anodized Ming alloy surface Oxide coating

$ 7 页 200425237-V. Description of the invention (3) ^^ In essence, it is porous and has the problem of generating gas. The remaining voids formed in the membrane are caused by the existence of it. Specific degree of decompression. In addition, when electroless nickel plating is applied to aluminum alloys, nickel becomes a catalyst, which promotes decomposition of gases such as S% H, PHS, AsH3, and C1FS, and produces corrosive gases and products. III. [Content of the invention] For the rot in vacuum processing system Small and lightweight vacuum pump. For a highly reactive gas or drug, the object of the present invention is to provide a vacuum pump that can be used with insectic gases. Another object of the present invention is to provide, and another object of the present invention is to provide, the liquid has a chestnut with a surname of Nan. The pump of the present invention is specially made of Shao or Ming alloy, and is: a part of the membrane exposed to the discharged medium. An example of an oxide film having a plasma-treated oxide oxidized by the above plasma-treated ^, plasma generated oxygen free beauty ^ is, according to the present inventors: a chemical oxide film. Free-radical film formation at Lu He ^ confirmed that the oxygen produced by plasma treatment has a flat surface, and the oxide film on the surface is extremely dense, the physical film is hard, and the corrosion resistance is high. No void exists. It is also known that the above-mentioned oxidation is determined to use a member having a coating that is highly contact-reactive. This is used for the pump, and the degree of time can be longer than that of the conventional pump body. It also improves. Oxygen of oxygen free radicals 200425237 V. Description of the invention (4), as described later, is, for example, plasma treatment of oxygen-containing gas ^ surface plasma treatment. The component of the pump is composed of = the surface of the component, and may also have a trace amount of dilute: gas ^, the above-mentioned true gold oxide film. The aluminum or aluminum alloy of the milk component is suppressed due to the rare gas' film stress. The gas system is based on tritium gas i H and reliability. The pump component of the present invention is composed of Ming Zhongguang or one of the aluminum alloys. The surface of the vacuum pump component can also be an oxide film. Oxygenate coatings containing aluminum, the upper t is less than one oxide. The plasma treatment is enhanced by the oxidation of the lock. Components, residual resistance The above-mentioned aluminum alloy may contain at least errors, and at the same time, the mechanical strength is improved. ,, To>, containing ytterbium, containing this / η, and again, the Fe, Mn, Cr, and Zn of the above-mentioned aluminum alloy are preferably 0.1% by weight or less. a # χ ^ 5 is degraded at any rate. Good because these metals are contained on the right, the corrosion resistance is above. The above is used on the base material of the vacuum pump component = :, but the present invention is by no means limited to this, and can also be used as the surface of the material in the case of if5 gold! Oxidation treatment, or an aluminum oxide film formed on the surface of the second-shaped iron. At this time, it is suitable to use, μ radical oxidation and inert oxidation contained in the substrate, and the plasma-containing substrate selected by plasma treatment, has = steel; the technology of forming a gasification film on the surface. In this way, the surface of the necessary part of the structure is formed by electropolymerization treatment, etc. Page 9 200425237 V. Description of the invention (5) The method of chemical compound coating can adopt the special application No. 20003-〇2 8 4 7 6 Plasma treatment method described in the manual. According to the present invention, a denser and flat surface film can be formed than in the conventional anodizing process, and the money resistance can be improved. 4. [Embodiment] An embodiment of the present invention will be described below. Referring to FIG. 1, a vacuum processing system using a vacuum pump according to the present invention is shown as a cluster type vacuum processing system. The vacuum processing system has a large number of reaction chambers (vacuum vessels) 10, 11, 12, and two-load interlocking vacuum.室 13, 14 and transfer room 15. In addition, in order to reduce the pressure inside the reaction chamber (vacuum container) 10, 1 1, 12 or make it vacuum, it is provided in each reaction chamber (vacuum container) 10, Π, and 12, and each is arranged with one or Most of the high vacuum pumps 1, 2, and 3 are the booster pumps 4a, 5a, and 6a, and the rear pumps (dry pumps) 4b, 5b, and 6b arranged at the rear of the vacuum pump. In the example shown in the figure, the loading interlocking vacuum chambers 3, 14 and the transfer chamber 5 are connected to the booster pumps 7a, 8a, 9a, and the rear pumps 7b, 8b, 9b, respectively. In addition, valves 22, 23, and 24 are provided between the high vacuum pumps 1, 2, and 3 and the booster pumps 4a, 5a, and 6a. There are turbo molecular pumps (threaded pumps), cryogenic pumps, mechanical boosters, and rear pumps (dry type Pumps) and scroll pumps. Take the rear pump (Figure 2) as an example. Here, the operation of the vacuum processing system of FIG. 1 will be described first. The objects to be processed, such as wafers, are loaded into the loading interlocking vacuum chamber 13, and the objects to be loaded into the loading interlocking vacuum chamber 13 are passed through a transfer chamber 15 having a robot arm (moving device) for transferring the processed objects, Feed into the reaction chambers 10, 11, 12. Reaction room

200425237 V. Description of the invention (6) After the processing of 10, 11, 12 is carried out, the object to be processed is sent from the reaction chamber 11, 12 and 12 to the loading interlocking vacuum chamber 14 through the transfer chamber 15. Although not shown in the figure, the reaction chambers (vacuum containers) 10, n, and 12 are further provided with heating devices such as gas inlets and heaters, and a specific gas is introduced under heating to perform specific processing such as film formation. Among these reaction chambers 10, 11, and 12, at least one of the reaction chambers is configured to be capable of plasma oxidation treatment and oxidation treatment using oxygen radicals. When such an oxidation treatment is performed, the gas is decomposed in the reaction chamber to generate a corrosive gas. The corrosive gas is sequentially exhausted by the vacuum polymerization in a plurality of stages as shown in the figure. ^ In the first figure, A1 shows the piping between the high vacuum pumps 1, 2, and 3, and the booster pumps 4a, 5a, and 6a, and A2 shows the reaction chambers (vacuum vessels) ι, n, and 12, and the above-mentioned vacuum pump 1, Piping between 2 and 3. In addition, r in the figure shows a clean room. The vacuum processing system shown in the figure is first set in the standby state. In this standby state, the transfer chamber 15 and the reaction chamber (vacuum container) 10, 11, and 2 are kept under reduced pressure or vacuum. 'In this state, from the atmosphere outside the vacuum processing system, the cassette containing the object to be processed, such as a wafer, is sent to the loading interlocking vacuum chamber 13, and the loading interlocking vacuum chamber 13 is evacuated. Next, open the gate valve (not shown) between the loading interlocking vacuum chamber 13 and the transfer chamber 15, and the robot for moving the object to be processed removes a piece of the object in the card g and moves to the transfer chamber 1 5. Then, the gate valve 'between the reaction chamber (vacuum container) 10 and the transfer chamber 5 is opened to move the arm to place the object to be processed on the platform within the reaction chamber (vacuum container) 10. After specific treatments such as film formation treatment,

Page 11 200425237- V. Description of the invention (7)

ΪΓΪΐΐ Take other reaction chambers 11 and 12 or load interlocking vacuum chamber 1W, then take ~ self-loading interlocking vacuum chamber 14 to the outside. Sense oxygen from chambers 10, 11 and? "Zhong" at least from the anti-poisonous gas that forms a lice compound layer on the to-be-processed object by electropolymerized oxidation biting milk from the base; ^ ^ is; ^ ^ There is a strong reaction in the heart m — Γ Pump discharge To the rear pump. The present invention is also suitable for the high and straight pumps Q with two reaction chambers 10, U, and 12 used for exhausting the reactive gas. Here, the pumps 1 and 2 , 3, assist 9a 'and rear pump (dry pumps ⑽ to ⑽ are all made of the present invention. Refer to Figure 2 (a) and ⑻, and use the rear secret as an example to illustrate the true line. The true line is provided with a spiral system—a spiral land portion and a groove portion of the main body, and a pair of spiral rotors 25 and 26 that engage with each other and rotate around the two-axis axis of I and II. The end is mounted to incorporate the synchronous rotation of the shaft 2 8 into the inlet 3 1, (b)). The gas side. The gas is the gas inside. 2 The rotors 25 and 26 are incorporated in the casing 27. The supporting screw turns St. One end is supported by the bearing 35 and can rotate. The other end of shaft 28 :: Day: Gear 30 'is connected to a motor (not shown). % Of rotation, measured by the timing teeth, to the spiral rotor 25, 2 〇

， 的 壳 2 ： At the end side, an outlet 3 2 is formed at the other end side (in the second illustration and the inlet 31 is connected to the reaction chamber side, and the outlet 32 is connected to the motor so that the spiral rotor 25, The step turns and comes from the reaction chamber: from the suction = mouth 31 1 suction 'is discharged from the outlet 3 2 and as a result, the reaction is discharged.

2Θ0425237

The formation can cause the cold gas to be compressed due to the formation of a hollow portion on the outlet 32 side of the casing 27: a 7-layer mounted jacket 33 is specially constructed so that the heat generated on the outlet 32 side can be cooled. Lady ,. One of the housings 27 incorporating the two spiral rotors 25 and 26 is adjacent to one end: 34, and the shaft 28 supporting the spiral rotor 26 is connected to the rotating shaft described later from the cover 34 & c. Furthermore, a sealing member 29 is provided between the bearing 35 and the spiral rotors 25 and 26. After Figure I, the pump (dry pump) components are all based on aluminum or aluminum alloy. Among these components, the rotors 25, 26, the housing 27, the sealing member 29, the suction port 3 1 and the outlet 3 2 etc. (sometimes Axis 28 is the same.) During the discharge of corrosive gas and chemical liquid, it is exposed to such corrosive gas and chemical liquid. At this time, the highly reactive gas or chemical liquid includes, for example, C1-based gas, f-based gas, hci, h2S04, and HF. All the components constituting the rear pump are treated with the present invention to make the entire rear pump corrosion-resistant. In this case, components that are exposed to corrosive gases, that is, at least the rotors 2 5 and 2 6, the casing 2 7, the sealing member 2 9, and the outlet 32 of the suction port 31 explode on the surface of the gas. As a result of plasma oxidation treatment or oxygen radical oxidation treatment according to the invention, as shown by the thick lines in Fig. 2 (a) and (b), an aluminum oxide film is formed on the surface of each member. In this way, the aluminum oxide film formed by plasma oxidation treatment or oxygen radical oxidation treatment has the characteristics of no voids, extremely dense, and flat surface. Therefore, a high margin resistance can be maintained for a highly reactive gas or the like. A method for forming the above-mentioned aluminum oxide film on a vacuum pump member using a plasma processing apparatus i will be described with reference to FIG. 3. Electro-mechanical device shown in figure 200425237

胩 f ^ The treatment of the rectangular vacuum pump member 40 is performed. Plasma treatment: For example, it is made of aluminum alloy with an opening at the top and a cylindrical shape at the bottom. The bottom of the processing container 2 is provided with a receiver 3 on which an "empty pump member 40" is placed. The receiver 3 is made of, for example, a chain alloy, and is powered by an AC power source 4 provided outside the processing container 2. The receiver 3 is heated For 5 to generate heat, the vacuum pump member 40 on the receiver 3 is heated to the bottom of the dead body 2 and connected to the turbo molecular pump and other exhausts through an exhaust pipe 42. The exhaust device 4 is set as 1 The exhaust in the processing container 2.

A supply pipe 44 for supplying a processing gas from a processing gas supply source 43 is provided on the side wall of the processing container 2. In the present embodiment, the processing gas supply source 43 is connected to respective supply sources 45, 46 of oxygen (02) and inert gas (Ar) gas. The processing valley is opened at the upper portion 2 of the seal 2 to ensure the airtightness, and a seal 21 is provided with a dielectric window 22 made of, for example, quartz glass. A processing space S is formed in the processing container 2 by the dielectric window 22.

An antenna member 51 is provided above the dielectric window 22. In this example, the antenna member 5 1 is an antenna cover 5 that covers and cools the slow wave plate 5 3 with a radial slot antenna 5 2 located at the bottom and a slow wave plate 5 3 located at the upper portion thereof, for example. 4 constructs. The radial slot antenna 5 2 is made of a conductive material, such as a thin circular plate of copper, and the circular plates are arranged in a concentric circle to form a pair of slot holes having an acute angle with an almost orthogonal angle. The slow wave plate 5 3 is provided at its center with a bulge 55 constituting a part of a conical shape made of metal, for example. The bulge 55 is composed of an inner conductor 56a and an outer pipe 56b.

200425237 V. Description of the invention (ίο) The inner conductor of the conduit 56 is electrically conductive. The coaxial waveguide production structure is such that the microwave supply device 57 can generate, for example, 2.45 ¼ 4 Sihe microwave 'load-matching cry wire member 51. With "58" propagating to the sky through the y-axis waveguide 56, followed by the description of the straight hollow virtual armor method. The first task, ^ + Lirenba's plasma treatment method, or vacuum pump member 40 formed of aluminum δ gold. f on the receiver 3 'In this state, the self-supplying weigher J10 is placed on the oxygen generated by the imaginary if supply, Ό, and 3 lice, so that the plasma holder is generated in the treatment ^ 2. At this time,' vacuum The following (preferably from 150 ° C to 250 t) is produced by θ. The re / 40 is maintained at 450 C and the component 40 is at room temperature (for example, 23.0), even if the vacuum pump is maintained. It can also generate plasma in the processing container 2. Once the plasma is generated, it will be processed in the Jiao 9 ca Li 丄 t member 4. The surface is emulsified by free oxygen / free radicals on the surface to form a lice compound film. In this way, in order to use oxygen freely to confirm the system, the gap in the helmet is extremely sufficient = 0 The oxide film produced by this treatment is due to 2: 2 The A1 flood film with a flat surface. This is a field on the surface of aluminum or aluminum alloy. The oxygen radicals are modified. At this time, the reaction formula is as follows. '2A1 + 30 *-Al2〇3 In addition, with aluminum (Mg) containing aluminum, you, When entering the host to form the vacuum pump member 40, you can use rolling free radicals on the surface of the alloy #Xiren (Α1Π, Shangxin BaMίΊ + catty Chengxi 3M§〇oxide film, A i2 〇3) 〇 So the oxidation of Mg 0 containing your Lu LU ^ ^ Qi 卞 emulsified film, corrosion resistance, strength can be improved

Rise. At this time, the content ratio of magnesium should be 0R tongue (V weight. / 0.) And the gas containing 氪 氪 φ ί to the maximum solid solution amount (approximately 6. 8 of 8 jn I nt is electrically destroyed to generate oxygen radicals , Even if the magnesium content is as low as 0.5% by weight to 〖〇. Θ 1 team leader 1 · Q weight ΐ% is extremely low, can also be contained on page 15 200425237 V. Description of the invention (11) oxidation of MgO It is possible to use the wrong alloy and give it to the alloy. The alloy surface can be lifted and confirmed. When gold is used, the alloy particle pump component 40 can be suppressed. Furthermore, when the alloy is used, the vacuum pump component can also be suppressed. On the other hand, aluminum alloys usually cause any aluminum alloy to be at 0.001% by weight Zn. At the temperature at which the aluminum alloy is oxidized, it is reduced with hydrogen, and it is explained that a plasma is generated by a plasma (θΚγ). Although the situation is forgiving and the oxygen molecules are low in generating oxygen from the gas to generate oxygen radicals, it can actually be as light as described above, using a plasma plasma oxidation treatment, for example, the content of the oxide film is inhibited The oxide is below the resistance of gold to gold. Alas, it can be removed. Generate oxygen 'this It is easy to use, cheap, argon, etc. It is easy to use cheap, argon, etc. When using a small amount of membrane free radicals, it is mixed with tritium gas, which is simple and convenient. When argon is used, it treats really rare gas oxygen radical rare gas stress. 'In addition to the above-mentioned magnesium, an oxide film containing gill, barium, and more containing SrO and BaO is formed on the aluminum vacuum pump member 40. Corrosion resistance and strength. Aluminum alloy having a hammer of about 0.1 to 0.15% by weight Growth, the formation of corrosion resistance, high mechanical strength The use of aluminum gold particles containing 0.1 to 0.15 wt% of rhenium to grow, to obtain corrosion resistance, high mechanical strength 'mostly contains Fe, Mn, Cr, Zη, corrosion The content of these materials should be reduced, and the content of 卩 6, 挝 11, () 1 'in 1 Lu alloy should be set so that the vacuum system member 40 is less than 4 5 0, and oxygen-containing gas is introduced to cause the second generation. Oxygen is mixed into argon (A r) because the argon gas is easy to generate oxygen-free oxidation treatment components for the empty pump member 40. The dilute density, the mixing degree, and the generation of free gas are used

P.16 5. Description of the invention (12) Function. The plasma source that generates oxygen radicals is a microwave plasma nozzle with a frequency of 2.45 gigahertz ^. Plasma fd: a relatively low level of stable electricity. 2 Electric floc J. As a surface of a vacuum free radical gasification alloy can be 1 = = this or Shao alloy is formed into a vacuum pump member, ☆ its surface: not limited to this to include * results. The day when the oxide film is formed on the surface: In addition, the present invention is generally applicable to highly corrosive materials. It is not limited to that shown in Figure 2. The above-mentioned gas or chemical liquid component = body or chemical liquid pump. The surface is made of oxides containing sulphur oxides ..._ Industrial The pump can be used in the vacuum processing system related to the present invention, which is used for various sounds, and it is a high-density jk device in the semiconductor equipment 3 processing chamber. The stainless steel structure of the surface of the pump which is damaged by the oxide can be obtained with the same structure, and it is also suitable for the empty pump which is particularly effective in contact with the coating. 200425237 Brief description of the drawings 5. Brief description of the drawings The first diagram is a block diagram showing the exhaust system in the embodiment of the present invention. Fig. 2 shows the rear pump of the exhaust system shown in Fig. 1. (a) is a sectional view 'and (b) is another sectional view. Fig. 3 is a schematic sectional view showing a plasma processing apparatus used in the present invention. Component symbol description:

Figures 1 and 2 A (screw pump) body A1, A 2 Piping R Clean room 1, 2, 3 High vacuum pumps 4a, 5a, 6a, 7a, 8a, 9a Booster pumps 4b, 5b, 6b, 7b, 8b, 9b Rear pump (dry pump) 1 0, 11, 1 2 Reaction chamber (vacuum container)

1 3, 1 4 Loading interlocking vacuum chamber 15 Transfer chamber 22, 23, 24 Valve 2 5, 2 6 Screw rotor 27 Housing 28 Shaft 2 9 Sealing member

Page 18 200425237 Brief description of the drawings 3 0 Timing gear 31 Suction port 32 Out π 33 Jacket 34 Cover 3 5 Bearing Fig. 3

1 Plasma processing device, vacuum processing system 2 Processing container 3 Holder 4 AC power supply 5 Heater 5 Processing space 21 Seal 22 Dielectric window

4 0Vacuum pump member 4 1Exhaust device 4 2Exhaust pipe 4 3Processing gas supply source 4 4Supply pipe 4 5 (Oxygen) supply source 4 6 (Argon) supply source 5 1Antenna component

Page 19 200425237

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Claims (1)

/ 、、 Scope of patent application ____ One out of the body; the gas inlet of the gas / special gas and the above-mentioned gas are the surface layer. "The component has an oxide film that is oxidized by electropolymerization and is made of gold. The surface layer.-Species ^, with d and inlet of the gas to be vented, /, characterized by: exposed to the above-mentioned gas * the above-mentioned components have oxygen free radical oxidation: the components by the Ming or Shao Heli The chemically treated lice compound film is a pump that contains 3 pieces of theta, such as the first or second item in the scope of the patent application. Among them, the upper, ten, and counterfeit s 34 summer rare aerobics, eighty four buckets, and the above surface layer 40% or Oxide cavity of aluminum alloy 8. If the pump in the scope of patent application No. 3, the material is coated. The blade is krypton or xenon. 5 of the above rare gas adult; type / '/, should be excluded The gas inlet of the gas and the above-mentioned components of the magnesium, vanadium, and pores are at least one of the group consisting of right Feng Bai _κ ~, shell, coo, and dysprosium, and the above components have an oxide film As the surface layer of the aluminum alloy structure, the part of the gas exposed by Bu, f J is the above-mentioned emulsification. The film contains an oxide of aluminum. 6. As described in item 5 of the scope of the application for patents, beans, bu, +, and more contain magnesium, _, _ Ά Ά ^ ... 7, the above-mentioned oxide film. "Zircon and At least one of the oxides of 铪 —oxidation 7. If the pumps in the scope of patent application No. 1, 2 or 5 are applied, wherein the content ratios of Fe, Mn, Cr, and Zn from Bajin are any 〇 · 〇1 Weight8 · A vacuum pump characterized by being used in a vacuum processing system, and the components exposed to the medium that should be vented from the vacuum system are made of aluminum or 1__ 200425237 The scope of the patent application is composed of aluminum alloy, which is more exposed to the upper layer and oxidized oxide film as μ, which has been passed through electricity. 9 · A vacuum pump, which is expected to be exposed to # ^ system, should be exposed from the above direct introduction Seasonal turnover ,,,, and, for the "air treatment" aluminum alloy composition, but also in the morning 2 2 gas media components are made of aluminum or the United States-Kushiro in the above-mentioned media, and there are "white" based emulsification The oxide film is used as the surface layer. 丨 "Material free 10, such as the vacuum pump of the patent application No. 8 or 9, Fu Zhongbu, f 矣 t Shao or Ming alloy oxide film. .u. For example, the vacuum pump in the scope of application of patent No. 10, the gas component of Krypton and f is Krypton or Xenon. / 、 The above-mentioned rare fraction iso-L2 · A vacuum pump used in vacuum processing systems and systems, at least-2 of which are exposed to the medium that should be exhausted from the above vacuum system:: Contains selected from magnesium, H, 丄 = surface Γ It is made of alloy, and it also contains oxides as a layer. The vacuum pump includes item 12 of the patent scope, in which the above-mentioned surfaceization is selected from the group consisting of m and oxygen of at least one of the oxides. The vacuum pump of item 12 or item 13, in which the content ratio of Fe, Mn, Cr, and Zn of the alloy is 0. ㈦% by weight 2. 15. As described in the patent application No. 8, θ, 12 or 13 Vacuum pump, the above-mentioned vacuum processing system is a plasma processing device for performing plasma processing. / 、 16. If the vacuum pump in the scope of patent application No. 8, 9, 12 or 13 is applied, 200425237 6. The above media in the scope of patent application are highly reactive gases or drugs 17. A pump with a body that should be discharged The outlet is characterized in that the base material formed by the iron and aluminum exposed to the aluminum has a plasma coating film as a surface layer. 1 8 · A pump characterized by having a port and an outlet of the above-mentioned medium, a base material formed by being exposed to the above-mentioned iron, and having an oxygen free radical coating as a surface layer. ^ 19. If the scope of patent application No. 17 or 18 is a stainless steel containing 3 to 7% by weight of aluminum. ^ 2 0 · If the patent application scope No. 7 or J 8 layer contains the above-mentioned rare gas component of the above-mentioned aluminum 21 · Such as patent application scope No. 丨 7 or] 8 The oxide film system is formed at least on the exposure 2 2 · One The vacuum pump is characterized in that at least a part of the vacuum pump is exposed to a vacuum from the above-mentioned vacuum, and has a substrate made of aluminum-containing iron, and an oxide film having the above description as a surface layer. 2 3 · A vacuum pump characterized in that at least a part of the vacuum pump is exposed to the above-mentioned vacuum and has a substrate made of iron containing aluminum, and an oxide film having a chain as a surface layer. 24. Liquid No. 22 or 23 as in the scope of patent application. The suction port of the medium and the exhibition member of the above-mentioned medium have a pump that contains the above-mentioned oxygen that should be oxidized by the aluminum. The material of the pump 'wherein the oxide film on the surface. Item of the pump 'wherein the surface of the aluminum portion of the medium. Components used in vacuum processing systems, conventional exhaust media components are oxidized by plasma treatment. Components used in vacuum processing systems, system exhaust media components are vacuum pumps of the above-mentioned items oxidized by oxygen radicals, wherein Page 23 200425237 Basic surface Aluminum surface Basic surface Oxygen aluminum ring method Material surface Patent application scope The material is stainless steel containing 3 to 7% by weight of aluminum. The surface of the vacuum pump of the patent application No. 22 or 23, whose layer is the above-mentioned aluminum oxide film containing a trace amount of a dilute gas component, such as the vacuum pump of the patent application No. 22 or 23, its oxide film is formed at least in the exposure In the above body 〇 1 27. One material, with a layer. 28. Such as a chemical compound film 29. An exhaust medium in a metallic ambient gas 30. Such as' wherein the upper part 31. Such as' wherein the upper part 32. an 'has a warp layer. 33. First, an air pump, characterized in that: the above-mentioned aluminum oxide film having the above-mentioned aluminum oxide film oxidized by oxygen-containing iron by oxygen radicals is applied to at least one vacuum body, and the above-mentioned processing is applied to the application-specific metal application-specific Metal type pump, plasma treatment range No. 2 7 Vacuum pump structure formed at the second pumping system of the exposed pump component No. 29, No. 29 or No. 29 range of the vacuum pump component No. 3 and 7 features ： The vacuum pump of the oxidized item, the manufacturing method of the part above the above-mentioned media, is exposed to the self-manufacturing method, which is characterized by the vacuum pump component that is formed by the plasma treatment or the formation of oxides of aluminum by oxygen. Gold. The vacuum pump member of the item is made of a stainless steel c having a weight% of aluminum. The surface has a surface as an aluminum, which is formed of the oxide film of aluminum with iron. Vacuum system: with free radical film. The base of the manufacturing method is used as a surface material. The pump has the freedom of borrowing oxygen. It is characterized by: on the base gasification, there is an oxide film made of aluminum containing iron. Page 24 200425237 6. Scope of Patent Application Layer 0 Page 25