TW200422377A - Novel polymers for use in optical devices - Google Patents
Novel polymers for use in optical devices Download PDFInfo
- Publication number
- TW200422377A TW200422377A TW092130088A TW92130088A TW200422377A TW 200422377 A TW200422377 A TW 200422377A TW 092130088 A TW092130088 A TW 092130088A TW 92130088 A TW92130088 A TW 92130088A TW 200422377 A TW200422377 A TW 200422377A
- Authority
- TW
- Taiwan
- Prior art keywords
- alkyl
- substituted
- aryl
- crc18
- group
- Prior art date
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- 229920000642 polymer Polymers 0.000 title claims abstract description 127
- 230000003287 optical effect Effects 0.000 title claims abstract description 12
- 125000000217 alkyl group Chemical group 0.000 claims description 270
- -1 and R71 is H Chemical group 0.000 claims description 130
- 125000003118 aryl group Chemical group 0.000 claims description 113
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 97
- 239000000126 substance Substances 0.000 claims description 77
- 125000003545 alkoxy group Chemical group 0.000 claims description 68
- 239000004305 biphenyl Substances 0.000 claims description 54
- 235000010290 biphenyl Nutrition 0.000 claims description 54
- 125000001072 heteroaryl group Chemical group 0.000 claims description 44
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 42
- 239000000178 monomer Substances 0.000 claims description 33
- 125000001624 naphthyl group Chemical group 0.000 claims description 33
- 125000000304 alkynyl group Chemical group 0.000 claims description 23
- 125000003342 alkenyl group Chemical group 0.000 claims description 20
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 20
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 19
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 125000001424 substituent group Chemical group 0.000 claims description 10
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 9
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 8
- 229910052736 halogen Inorganic materials 0.000 claims description 6
- 150000002367 halogens Chemical class 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 125000000714 pyrimidinyl group Chemical group 0.000 claims description 6
- 239000002800 charge carrier Substances 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 125000005842 heteroatom Chemical group 0.000 claims description 3
- 229910052702 rhenium Inorganic materials 0.000 claims description 3
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims description 3
- 239000007921 spray Substances 0.000 claims description 3
- 125000002837 carbocyclic group Chemical group 0.000 claims description 2
- 238000006467 substitution reaction Methods 0.000 claims 2
- LXXQADRIIXEBHT-UHFFFAOYSA-N 2,4,6-tris(4-bromophenyl)pyrimidine Chemical compound C1=CC(Br)=CC=C1C1=CC(C=2C=CC(Br)=CC=2)=NC(C=2C=CC(Br)=CC=2)=N1 LXXQADRIIXEBHT-UHFFFAOYSA-N 0.000 claims 1
- AXNLMCWMZXDBNC-UHFFFAOYSA-N 4,6-bis(4-bromophenyl)-2-phenylpyrimidine Chemical compound C1=CC(Br)=CC=C1C1=CC(C=2C=CC(Br)=CC=2)=NC(C=2C=CC=CC=2)=N1 AXNLMCWMZXDBNC-UHFFFAOYSA-N 0.000 claims 1
- 101100258315 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) crc-1 gene Proteins 0.000 claims 1
- 238000000576 coating method Methods 0.000 abstract description 18
- 238000004519 manufacturing process Methods 0.000 abstract description 13
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 abstract description 12
- 230000009477 glass transition Effects 0.000 abstract description 4
- 230000007547 defect Effects 0.000 abstract description 2
- SEEPANYCNGTZFQ-UHFFFAOYSA-N sulfadiazine Chemical compound C1=CC(N)=CC=C1S(=O)(=O)NC1=NC=CC=N1 SEEPANYCNGTZFQ-UHFFFAOYSA-N 0.000 abstract description 2
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 93
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 66
- 239000010410 layer Substances 0.000 description 49
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 48
- 239000002585 base Substances 0.000 description 29
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 29
- 238000000034 method Methods 0.000 description 29
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 29
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 29
- 239000010408 film Substances 0.000 description 28
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 27
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 26
- 238000006243 chemical reaction Methods 0.000 description 24
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 24
- 239000000203 mixture Substances 0.000 description 19
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 19
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 18
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 18
- 239000000463 material Substances 0.000 description 18
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 16
- 238000006116 polymerization reaction Methods 0.000 description 16
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 15
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 15
- 239000011248 coating agent Substances 0.000 description 14
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 12
- QARVLSVVCXYDNA-UHFFFAOYSA-N bromobenzene Chemical compound BrC1=CC=CC=C1 QARVLSVVCXYDNA-UHFFFAOYSA-N 0.000 description 12
- 239000002244 precipitate Substances 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 10
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 9
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- 229910052786 argon Inorganic materials 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 9
- 238000005401 electroluminescence Methods 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 229910052759 nickel Inorganic materials 0.000 description 8
- 229920006254 polymer film Polymers 0.000 description 8
- 230000002378 acidificating effect Effects 0.000 description 7
- 238000005859 coupling reaction Methods 0.000 description 7
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 7
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 7
- 238000004528 spin coating Methods 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 6
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical group C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 6
- 238000001914 filtration Methods 0.000 description 6
- 229910052738 indium Inorganic materials 0.000 description 6
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 6
- 239000011777 magnesium Substances 0.000 description 6
- 229910052749 magnesium Inorganic materials 0.000 description 6
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 6
- HXITXNWTGFUOAU-UHFFFAOYSA-N phenylboronic acid Chemical compound OB(O)C1=CC=CC=C1 HXITXNWTGFUOAU-UHFFFAOYSA-N 0.000 description 6
- 239000011541 reaction mixture Substances 0.000 description 6
- 229910000861 Mg alloy Inorganic materials 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 239000012300 argon atmosphere Substances 0.000 description 5
- 125000004104 aryloxy group Chemical group 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 5
- 230000005525 hole transport Effects 0.000 description 5
- 229920001519 homopolymer Polymers 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 5
- 150000003254 radicals Chemical class 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 4
- 229920005603 alternating copolymer Polymers 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- 229920001940 conductive polymer Polymers 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 4
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 4
- 239000000376 reactant Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000002207 thermal evaporation Methods 0.000 description 4
- 125000001544 thienyl group Chemical group 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- JRTIUDXYIUKIIE-KZUMESAESA-N (1z,5z)-cycloocta-1,5-diene;nickel Chemical compound [Ni].C\1C\C=C/CC\C=C/1.C\1C\C=C/CC\C=C/1 JRTIUDXYIUKIIE-KZUMESAESA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 239000003109 Disodium ethylene diamine tetraacetate Substances 0.000 description 3
- ZGTMUACCHSMWAC-UHFFFAOYSA-L EDTA disodium salt (anhydrous) Chemical compound [Na+].[Na+].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O ZGTMUACCHSMWAC-UHFFFAOYSA-L 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 238000006069 Suzuki reaction reaction Methods 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000010405 anode material Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005266 casting Methods 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000010406 cathode material Substances 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- VBXDEEVJTYBRJJ-UHFFFAOYSA-N diboronic acid Chemical class OBOBO VBXDEEVJTYBRJJ-UHFFFAOYSA-N 0.000 description 3
- 235000019301 disodium ethylene diamine tetraacetate Nutrition 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 125000000623 heterocyclic group Chemical group 0.000 description 3
- 239000011133 lead Substances 0.000 description 3
- 125000005647 linker group Chemical group 0.000 description 3
- 229910001092 metal group alloy Inorganic materials 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 229920000767 polyaniline Polymers 0.000 description 3
- 229920000123 polythiophene Polymers 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 229920005604 random copolymer Polymers 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 3
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 3
- 239000011135 tin Substances 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- 125000005869 (methoxyethoxy)methanyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])OC([H])([H])* 0.000 description 2
- ALEDFYPQEIOLQU-UHFFFAOYSA-N 1-bromo-4-(2-phenylphenyl)benzene Chemical group C1=CC(Br)=CC=C1C1=CC=CC=C1C1=CC=CC=C1 ALEDFYPQEIOLQU-UHFFFAOYSA-N 0.000 description 2
- PKJBWOWQJHHAHG-UHFFFAOYSA-N 1-bromo-4-phenylbenzene Chemical group C1=CC(Br)=CC=C1C1=CC=CC=C1 PKJBWOWQJHHAHG-UHFFFAOYSA-N 0.000 description 2
- IBXNCJKFFQIKKY-UHFFFAOYSA-N 1-pentyne Chemical compound CCCC#C IBXNCJKFFQIKKY-UHFFFAOYSA-N 0.000 description 2
- CDOYZTOFTGTGBC-UHFFFAOYSA-N 1-tert-butyl-4-phenylbenzene Chemical group C1=CC(C(C)(C)C)=CC=C1C1=CC=CC=C1 CDOYZTOFTGTGBC-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 2
- 101150010802 CVC2 gene Proteins 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- 229920000265 Polyparaphenylene Polymers 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
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- 229910052796 boron Inorganic materials 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 2
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- 125000004122 cyclic group Chemical group 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- SMBQBQBNOXIFSF-UHFFFAOYSA-N dilithium Chemical class [Li][Li] SMBQBQBNOXIFSF-UHFFFAOYSA-N 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 description 2
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- 125000000524 functional group Chemical group 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 230000005283 ground state Effects 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- 229920001197 polyacetylene Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- XSCHRSMBECNVNS-UHFFFAOYSA-N quinoxaline Chemical compound N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 239000002689 soil Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- RRKODOZNUZCUBN-CCAGOZQPSA-N (1z,3z)-cycloocta-1,3-diene Chemical compound C1CC\C=C/C=C\C1 RRKODOZNUZCUBN-CCAGOZQPSA-N 0.000 description 1
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- 102220243367 rs1193754562 Human genes 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 125000005630 sialyl group Chemical group 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- ORFSSYGWXNGVFB-UHFFFAOYSA-N sodium 4-amino-6-[[4-[4-[(8-amino-1-hydroxy-5,7-disulfonaphthalen-2-yl)diazenyl]-3-methoxyphenyl]-2-methoxyphenyl]diazenyl]-5-hydroxynaphthalene-1,3-disulfonic acid Chemical compound COC1=C(C=CC(=C1)C2=CC(=C(C=C2)N=NC3=C(C4=C(C=C3)C(=CC(=C4N)S(=O)(=O)O)S(=O)(=O)O)O)OC)N=NC5=C(C6=C(C=C5)C(=CC(=C6N)S(=O)(=O)O)S(=O)(=O)O)O.[Na+] ORFSSYGWXNGVFB-UHFFFAOYSA-N 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229920006301 statistical copolymer Polymers 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 1
- JKUYRAMKJLMYLO-UHFFFAOYSA-N tert-butyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OC(C)(C)C JKUYRAMKJLMYLO-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
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Abstract
Description
2004223 77 玖、發明說明: H j^fr ^1 本發明係有關包含含有嘧啶之重複單元之新穎聚合 物,及其於光學裝置(諸如,包含電致發光裝置或光生伏 5 打裝置之光學裝置)之使用。 I:先前技術】 聚(對-伸苯基伸乙烯基)之衍生物已知作為電致發光 (EL)材料已持續一段時間(例如,見WO90/13148)。 WO98/11150揭示化學式2004223 77 发明 Description of the invention: H j ^ fr ^ 1 The present invention relates to novel polymers containing repeating units containing pyrimidines, and to optical devices such as those containing electroluminescent devices or photovoltaic devices. ). I: Prior art] Poly (p-phenylene vinylene) derivatives have been known as electroluminescence (EL) materials for some time (see, for example, WO90 / 13148). WO98 / 11150 reveals chemical formula
之三嗪聚合 10 物,及其於電致發光(EL)配置物之使用。 US-A-5,876,864係有關於以芴為主交替式聚合物,及 其作為電致發光材料。 Μ. M. Koten 等人之 Vysokomolekulyarnye Soedin·; Seriya B: Kratkie Soobshcheniya,第 30冊,編號 10,1978, 15 792-793揭示以2-苯基-4,6_雙(對-胺基苯基)嘧啶:Triazine polymer 10 and its use in electroluminescence (EL) configurations. US-A-5,876,864 relates to fluorene-based alternating polymers and their use as electroluminescent materials. Vysokomolekulyarnye Soedin · M. M. Koten et al .; Seriya B: Kratkie Soobshcheniya, Vol. 30, No. 10, 1978, 15 792-793 discloses 2-phenyl-4,6_bis (p-aminophenyl) ) Pyrimidine:
為主之聚醯亞胺,其中,R係如下化學式之基 2004223 77 J 1Main polyimide, where R is the base of the following chemical formula 2004223 77 J 1
DE-A-10143353揭示共軛聚合物,其含有螺旋雙芴單 元及選擇性之如下化學式之以嘧啶為主之單元DE-A-10143353 discloses a conjugated polymer containing a helical difluorene unit and a selective pyrimidine-based unit of the following chemical formula
10 及其作為電致發光材料。 US2001/0012572揭示如下化學式之含嘧啶單元之聚合 2004223 77 物 SCH2CH(CH2CH3)CH2CH2CH2CH310 and its use as an electroluminescent material. US2001 / 0012572 discloses the polymerization of pyrimidine-containing units of the following chemical formula: 2004223 77 SCH2CH (CH2CH3) CH2CH2CH2CH3
N人NN people N
(Mw = 23000)(Mw = 23000)
(Mw = 28000)(Mw = 28000)
,及 WOOO/46321及1^4-6,512,083係有關於含芴之聚合物 及其於電致發光配置之使用。 EP-A-690052揭示使用諸如, And WOOO / 46321 and 1 ^ 4-6,512,083 are related to rhenium-containing polymers and their use in electroluminescent configurations. EP-A-690052 reveals the use of such as
10 之含嘴咬之共輛聚合物作為電致發光材料。 E -Ar-Ar~y ^-Ar-Ar-E Nv Ν W002/059121揭示具化學式 ^ 之單 體,其中,X係0, S,NR,RC-CR,或ROCR,Ar係芳基或 雜芳基,且E係能進行鏈延長之反應基,及其用於製造可 用於光學裝置之聚合物(亦見WO01/62869)。 15 DE-A_19651439(US-A-6,323,373)係有關於如下化學式 2004223 77 之可聚合雙芳基衍生物A total of 10 polymers with mouth bites were used as electroluminescent materials. E -Ar-Ar ~ y ^ -Ar-Ar-E Nv Ν W002 / 059121 discloses a monomer having a chemical formula ^, wherein X is 0, S, NR, RC-CR, or ROCR, Ar is aryl or hetero Aryl, and E is a reactive group capable of chain extension, and its use in the manufacture of polymers that can be used in optical devices (see also WO01 / 62869). 15 DE-A_19651439 (US-A-6,323,373) is a polymerizable bisaryl derivative of the following chemical formula 2004223 77
環2 環1 其中之符號及標記具有如下之意義: 5 X: -CH2-Z,-CHO; Y1,Y2, Y3: CH; N, Z:相同或相異,I,Cl,Br,CN,SCN,NCO,PCHOR1)。 PO(R2)2, P(R3),a-; 芳基:具有6至14個碳原子之芳基; 10 R’,R":相同或相異,CN,F,C1,具有1至20個碳原子之直鏈 或支化或環狀之烷基或烷氧基,其中,一或多個非相鄰之 CH2基選擇性地以_〇_,_s_,_C0_,-C〇〇_,_〇_c〇·,-NR4_,- (NR5r6)+A-或-CONR7-替代,且一或多個H原子選擇性以F 替代,或具有6至14個碳原子之芳基,其可以一或多個非 方香族基R’取代; R,R2, R3, R5, R6 :相同或相異,具有1至20個碳原子之脂 族或芳香族之烴基; R4’ R7:相同或相異,氫或具有1至20個碳原子之脂族或芳 香族之煙基; 20 Δ-. ^ •早一電荷之陰離子或其等化物; m: 0, 1 或2; n: L 2, 3, 4或5,及其用於製造聚合物。 當其性能與現存技術相比時,弓|入有機電致發光顯示 益面吨種挑戰。需藉由特殊指導方針(即,.ο獲得正 確顏色座標已具問題。當對比於現存無機技術時,電致發 =裝置之操作壽命係相對較低。此外,製造具純藍色及長 奇命之材料係用於此產業之重大問題之一。 【發明内容】 因此,本發明之目的係提供新穎材料,當併納於光學 裝置内時於顏色純度、裝置效率及/或操作壽命顯示重大 優點。 該目的係藉由本發明聚合物解決,其包含含有二嗪(特 別係嘧啶)之重複單元。包含本發明聚合物之光學裝置可 於顏色純度、裝置效率及/或操作壽命顯示重大優點。此 外,聚合物具有良好溶解特性及相對較高之玻璃轉移溫 度,促進其製成相對較薄、熱安定及相對較無缺失之塗覆 物及薄膜。若聚合物含有可被交之端基,於薄膜或塗覆物 形成後此等基之交聯作用增加其耐溶劑性,其於其間_戋 更多之以溶劑為主之材料層被沈積於其上之應用係有利 的0 因此,本發明之聚合物需具有高於1〇〇。〇之玻璃轉移 溫度,特別地係高於150°c之玻璃轉移溫度。 於此使用時,”本發明聚合物,,一辭係指具有化學式Ϊ(包 含化學式la及lb)及/或π(包含化學式Ila,lib及lie)之重複單 2004223 77 元之聚合物。 第方面,本發明係有關於包含如下化學式之重 元之聚合物 >Ring 2 Ring 1 The symbols and signs in it have the following meanings: 5 X: -CH2-Z, -CHO; Y1, Y2, Y3: CH; N, Z: same or different, I, Cl, Br, CN, SCN, NCO, PCHOR1). PO (R2) 2, P (R3), a-; aryl: aryl having 6 to 14 carbon atoms; 10 R ', R ": same or different, CN, F, C1, having 1 to 20 Linear or branched or cyclic alkyl or alkoxy groups of one carbon atom, wherein one or more non-adjacent CH2 groups are optionally _〇_, _s_, _C0_, -C〇〇_, _〇_c〇 ·, -NR4_,-(NR5r6) + A- or -CONR7-, and one or more H atoms are optionally substituted with F, or an aryl group having 6 to 14 carbon atoms, which may be R ', R2, R3, R5, R6: the same or different, aliphatic or aromatic hydrocarbon groups having 1 to 20 carbon atoms; R4' R7: the same or Dissimilar, hydrogen or aliphatic or aromatic nicotinic group having 1 to 20 carbon atoms; 20 Δ-. ^ • an earlier charged anion or its equivalent; m: 0, 1 or 2; n: L 2 , 3, 4 or 5, and its use in the manufacture of polymers. When it comes to performance compared to existing technologies, bowing into organic electroluminescence displays has many challenges. Need to use special guidelines (ie, .o to get the correct color coordinates is already a problem. When compared to existing inorganic technology, electro-fabrication = device operating life is relatively low. In addition, manufacturing with pure blue and long odd Material is one of the major problems used in this industry. [Summary of the Invention] Therefore, the object of the present invention is to provide novel materials that, when incorporated in optical devices, show significant color purity, device efficiency, and / or operating life. Advantages. This object is solved by the polymer of the present invention, which includes repeating units containing a diazine (especially a pyrimidine). An optical device including the polymer of the present invention can show significant advantages in color purity, device efficiency, and / or operating life. In addition, the polymer has good dissolution characteristics and a relatively high glass transition temperature, which facilitates its production into coatings and films that are relatively thin, thermally stable, and relatively free of defects. If the polymer contains end groups that can be cross-linked, After the film or coating is formed, the crosslinking of these groups increases its solvent resistance, during which more layers of solvent-based materials are deposited. The application is advantageous. Therefore, the polymer of the present invention needs to have a glass transition temperature higher than 100 °, especially a glass transition temperature higher than 150 ° c. When used herein, "the polymer of the present invention The term refers to a polymer with a repeating order 2004223 77 yuan of chemical formula Ϊ (comprising chemical formulas la and lb) and / or π (comprising chemical formulas Ila, lib and lie). In a first aspect, the present invention relates to a polymer containing the following chemical formula Polymer of the heavy element >
RR
、 (1),其中,Rl及R2彼此個別係有機取 代基,特別係cvQo方基或c^c:26雜芳基,其選擇性地可被取 代,(1), wherein R1 and R2 are each independently an organic substituent, particularly a cvQo square group or a c ^ c: 26 heteroaryl group, which may be optionally substituted,
X1及X2彼此個別係二價鍵結基,其中, 化學式X1 and X2 are each a divalent bond group, wherein, the chemical formula
(la)或(la) or
(lb)之 重複早元係較佳。 10 適當二價鍵結基χΐ及X2之例子係 單鍵,-CO-,_COO_;(lb) is better for repeated early elements. 10 Examples of suitable divalent bonding groups χΐ and X2 are single bonds, -CO-, _COO_;
10 2004223 7710 2004 223 77
11 2004223 7711 2004 223 77
nl,n2, n3, n4, n5, n6及n7係1至10之整數,特別係1至 3, R6及R7彼此個別係H,CrC18烷基,以E取代及/或以D 5間斷之CrC18烷基,C5-C12環烷基,以E取代之(:5-(:12環 烷基,C6-C24芳基,以E取代之C6-C24芳基,C2-C2G雜芳基, 以E取代之C2-C2()雜芳基,C2-C18烯基,C2-C18炔基,CrC18 烷氧基,以E取代及/或以D間斷之(^-(:18烷氧基,C7_C25 芳烷基,或-CO-R28, 10 R8係CrC18烷基,以E取代及/或以D間斷之CrC18烷基, C6-C24芳基,或C7-C25*烷基, R9及R1G彼此個別係CrCls烷基,以E取代及/或以D間斷 之ci_C18烧基,C6-C24芳基,以E取代之C6-C24芳基,C2-C20 雜芳基,以E取代之C2-C2G雜芳基,C2-C18烯基,(:2<18炔 15基,crci8烷氧基,以E取代及/或以D間斷之crC18烷氧 基,或C7-C25芳烷基,或 R9及R1G形成環,特別係五-或六-員之環,其可選擇性地以 R6取代, R14及R15彼此個別係H,CVCm烷基,以E取代及/或以D 20間斷之ci_ci8烧基,CfC24芳基,以E取代之c6-C24芳基, 雜芳基,或以E取代之c2-C2G雜芳基, D 係-CO-; -COO-; -S-; -SO-; -SOr; -NR25-; -SiR3〇R31-; 12 2004223 77 -POR32-; -CR23=CR24-;或-OC-;且 E 係-OR29; -SR29; -NR25R26; -COR28; _COOR27;-CONR25R26; •CN;-OCOOR27;或鹵素;其中, R23, R24, R25及R26彼此個別係H; C6_C18芳基;以(^-〇:18烷 5 基,CrC18烷氧基取代之C6-C18芳基;CrC18烷基;或以 間斷之CrC18烷基;或 R25及R26 —起形成五或六員之環,特別係nl, n2, n3, n4, n5, n6 and n7 are integers from 1 to 10, especially from 1 to 3, R6 and R7 are each independently H, CrC18 alkyl, substituted by E and / or D 5 interrupted CrC18 Alkyl, C5-C12 cycloalkyl, substituted with E (: 5-(: 12 cycloalkyl, C6-C24 aryl, E substituted C6-C24 aryl, C2-C2G heteroaryl, E Substituted C2-C2 () heteroaryl, C2-C18 alkenyl, C2-C18 alkynyl, CrC18 alkoxy, substituted with E and / or interrupted by D (^-(: 18 alkoxy, C7_C25 aryl Alkyl, or -CO-R28, 10 R8 CrC18 alkyl, CrC18 alkyl substituted with E and / or D interrupted, C6-C24 aryl, or C7-C25 * alkyl, R9 and R1G are each independently CrCls alkyl, ci_C18 alkyl substituted with E and / or D interrupted, C6-C24 aryl, C6-C24 aryl substituted with E, C2-C20 heteroaryl, C2-C2G heteroaryl substituted with E Group, C2-C18 alkenyl group, (: 2 < 18 alkynyl 15 group, crci8 alkoxy group, crC18 alkoxy group substituted with E and / or D interruption, or C7-C25 aralkyl group, or R9 and R1G Ring, especially a five- or six-membered ring, which may be optionally substituted with R6, R14 and R15 are each independently H, CVCm alkyl, substituted with E and / or D 20 Broken ci_ci8 alkyl group, CfC24 aryl group, c6-C24 aryl group substituted with E, heteroaryl group, or c2-C2G heteroaryl group substituted with E, D is -CO-; -COO-; -S-; -SO-; -SOr; -NR25-; -SiR3〇R31-; 12 2004223 77 -POR32-; -CR23 = CR24-; or -OC-; and E system -OR29; -SR29; -NR25R26; -COR28; _COOR27; -CONR25R26; • CN; -OCOOR27; or halogen; wherein, R23, R24, R25 and R26 are each H; C6_C18 aryl; C6 substituted with (^ -〇: 18 alkyl 5 group, CrC18 alkoxy group -C18 aryl; CrC18 alkyl; or intermittent CrC18 alkyl; or R25 and R26 together to form a five- or six-membered ring, especially
R27及R28彼此個別係H; C6_C18芳基;以CVC18烷基,或 10 crc18烷氧基取代之c6_c18芳基;crc18烷基;或以·〇_間 斷之crc18烷基, R29係H; C6-C18芳基;以CrC18烷基,CrC18烷氧基取代之 c6-c18芳基;CrC18烷基;或以-0-間斷之CVC18烷基, R30及R31彼此個別係CrC18烷基,C6-C18芳基,或以CrC18 15 烧基取代之C6-C18方基,且 R32係CrC18烷基,C6-C18芳基,或以CrC18烷基取代之C6_ c18芳基。 較佳地,R6及R7彼此個別係H,CVC18烷基,諸如,甲基, 乙基,正丙基,異丙基,正丁基,異丁基,第二丁基,第三 20 丁基,2-甲基丁基,正戊基,異戊基,正己基,2-乙基己基, 或正庚基,以E取代及/或以D間斷之CrC18烷基,諸如, -ch2och3, -ch2och2ch3, -ch2och2ch2och3,或 13 2004223 77 •CH2OCH2CH2OCH2CH3,c6_c24 烧基,諸如,苯基,萘基, 或聯苯基,C5-C12環烧基,諸如,環己基,以E取代之C6-C24 芳基,諸如,-c6h4och3, -c6h4och2ch3, -c6h3(och3)2, 或-c6h3(och2ch3)2, -c6h4ch3, -c6h3(ch3)2, -c6h2(ch3)3, 5 或-C6H4tBu。 R較佳係烧基,诸如’甲基,乙基,正丙基,異 丙基,正丁基,異丁基,第二丁基,第三丁基,2-甲基丁基, 正戊基,異戊基,正己基,2·乙基己基,正庚基,或c6-C24 芳基,諸如,苯基,萘基,或聯苯基。 10 較佳地,R9及R1G彼此個別係h,c「c18烷基,諸如, 正丁基,第二丁基,己基,辛基,或2-乙基-己基,以e取 代及/或以D間斷之CrC18烷基,諸 如,-CH2(OCH2CH2)wOCH3, W = 1,2, 3,或 4, C6-C24 芳基, 諸如,苯基,萘基,或聯苯基,以E取代之C6-C24芳基,諸 15 如,-C6H4OCH3, ·0:6Η400:Η2(:Η3, -c6h3(〇ch3)25 -c6H3(〇ch2ch3)2? -c6h4ch35 -C6H3(CH3)25 -C6H2(CH3)3,或_C6H4tBu,或 R9 及 R1g —起形成 4 至 8 員 之環,特別係5或6員之環,諸如,環己基,或環戊基,其 可選擇性地以CrC8烷基取代。 2〇 較佳地,Rl4’&Rl5’彼此個別係H,烷基,諸如,甲 基,乙基,正丙基,異丙基,正丁基,異丁基,或第二丁基,或C6_ Cm芳基,諸如,苯基,萘基,或聯苯基。 D較佳係-CO-,-COO·,-S-,-SO-,-SOr,-0、_NR'其 中,R25係crCl8烷基,諸如,甲基,乙基,正丙基,異丙基,^ 14 2004223 77 丁基,異丁基,或第二丁基,或C6_C24芳基,諸如,苯基,萘基, 或聯苯基。 E較佳係-OR29; -SR29—nr25r25; c〇r28; -CONRf;或-CN;其中,r25, r27,…及…彼此個別係& 5 Cis烷基,諸如,甲基,乙基,正丙基,異丙基,正丁基,異丁基,第 二丁基,己基,辛基,或2-乙基-己基,或kb芳基,諸如,苯基, 萘基,或聯苯基。 於上述X1及X2基中,下列基係較佳:R27 and R28 are each independently H; C6_C18 aryl; c6_c18 aryl substituted with CVC18 alkyl, or 10 crc18 alkoxy; crc18 alkyl; or crc18 alkyl interrupted by · 〇_, R29 is H; C6- C18 aryl group; c6-c18 aryl group substituted with CrC18 alkyl group, CrC18 alkoxy group; CrC18 alkyl group; or CVC18 alkyl group with -0 interruption, R30 and R31 are each CrC18 alkyl group, C6-C18 aromatic group Group, or C6-C18 square group substituted with CrC18 15 alkyl group, and R32 is CrC18 alkyl group, C6-C18 aryl group, or C6_c18 aryl group substituted with CrC18 alkyl group. Preferably, R6 and R7 are each H, CVC18 alkyl, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third 20 butyl , 2-methylbutyl, n-pentyl, isopentyl, n-hexyl, 2-ethylhexyl, or n-heptyl, CrC18 alkyl substituted with E and / or D interrupted, such as -ch2och3,- ch2och2ch3, -ch2och2ch2och3, or 13 2004223 77 • CH2OCH2CH2OCH2CH3, c6_c24 alkyl, such as phenyl, naphthyl, or biphenyl, C5-C12 cycloalkyl, such as cyclohexyl, C6-C24 aryl substituted with E , Such as -c6h4och3, -c6h4och2ch3, -c6h3 (och3) 2, or -c6h3 (och2ch3) 2, -c6h4ch3, -c6h3 (ch3) 2, -c6h2 (ch3) 3, 5 or -C6H4tBu. R is preferably an alkyl group such as' methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, 2-methylbutyl, n-pentyl Group, isopentyl, n-hexyl, 2.ethylhexyl, n-heptyl, or c6-C24 aryl, such as phenyl, naphthyl, or biphenyl. 10 Preferably, R9 and R1G are each h, c, c18 alkyl, such as n-butyl, second butyl, hexyl, octyl, or 2-ethyl-hexyl, substituted with e and / or D intermittent CrC18 alkyl, such as -CH2 (OCH2CH2) wOCH3, W = 1, 2, 3, or 4, C6-C24 aryl, such as phenyl, naphthyl, or biphenyl, substituted with E C6-C24 aryl, 15 such as -C6H4OCH3, · 0: 6Η400: Η2 (: Η3, -c6h3 (〇ch3) 25 -c6H3 (〇ch2ch3) 2? -C6h4ch35 -C6H3 (CH3) 25 -C6H2 (CH3 ) 3, or _C6H4tBu, or R9 and R1g together to form a 4- to 8-membered ring, especially a 5- or 6-membered ring, such as cyclohexyl, or cyclopentyl, which can be optionally substituted with CrC8 alkyl 2〇 Preferably, R14 '& R15' are each independently H, alkyl, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, or second butyl Or C6-Cm aryl, such as phenyl, naphthyl, or biphenyl. D is preferably -CO-, -COO ·, -S-, -SO-, -SOr, -0, _NR ', R25 is a crCl8 alkyl group such as methyl, ethyl, n-propyl, isopropyl, ^ 14 2004223 77 butyl, isobutyl, Or a second butyl, or a C6-C24 aryl, such as phenyl, naphthyl, or biphenyl. E is preferably -OR29; -SR29-nr25r25; c〇r28; -CONRf; or -CN; wherein, r25 , r27, ... and ... are each independently & 5 Cis alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, hexyl, octyl, Or 2-ethyl-hexyl, or kb aryl, such as phenyl, naphthyl, or biphenyl. Among the above X1 and X2 groups, the following groups are preferred:
R1及R2原則上可為任何有機取代基,只要對於聚合 物之電致發光特性無負面影響。…及R2之例子係H,Ci<^ 烷基,以E取代及/或以D間斷之CrCi8烷基,C2_Ci8烯基, 15 C2_C18炔基,CrC18烧氧基,以E取代及/或以D間斷之 C18烷氧基,C7-C25芳烷基,R1 and R2 may in principle be any organic substituent, as long as it has no negative effect on the electroluminescent properties of the polymer. ... and examples of R2 are H, Ci < ^ alkyl, CrCi8 alkyl substituted with E and / or D interrupted, C2_Ci8 alkenyl, 15 C2_C18 alkynyl, CrC18 alkyloxy, substituted with E and / or D Intermittent C18 alkoxy, C7-C25 aralkyl,
-X5-X5
Cm芳基,或CVC2。雜芳基,其選擇性地可被取代,特別係、 如下化學式之基 15 2004223 77Cm aryl, or CVC2. Heteroaryl, which may be optionally substituted, in particular, a radical of the following formula 15 2004223 77
16 2004223 7716 2004 223 77
其中’ ml,m2, m3, m4, m5, m6及m7係1至10之整數,特 別係1至3, X6係H,CrC18烷基,以e取代及/或以D間斷之CrC18烷 5 基,CrC24芳基,其選擇性可被取代,特別係Where 'ml, m2, m3, m4, m5, m6 and m7 are integers from 1 to 10, especially from 1 to 3, X6 is H, CrC18 alkyl, CrC18 alkyl 5 substituted with e and / or D interrupted CrC24 aryl, its selectivity can be substituted, especially
C2-C18烯基,c2_C18炔基,CrC18烷氧基,以E取代及/或以 D間斷之CrC18烷氧基,或CrC25*烷基, 10 χ4係Ci_C18烷基,以E取代及/或以D間斷之CrC18烷基, 芳基,其選擇性可被取代, χ5係Crci8烷基,C6-C24芳基,以-〇CrC18烷基取代之C6-C24芳基,或-〇C6-C24芳基,C2-C18 alkenyl, c2_C18 alkynyl, CrC18 alkoxy, CrC18 alkoxy substituted with D and / or D interrupted, or CrC25 * alkyl, 10 χ4 Ci_C18 alkyl, substituted with E and / or D intermittent CrC18 alkyl, aryl, which can be substituted, χ5 is Crci8 alkyl, C6-C24 aryl, C6-C24 aryl substituted with -0CrC18 alkyl, or -〇C6-C24 aryl base,
Rl1,R12及R13彼此個別係H,C「C18烷基,以E取代及/或 15以D間斷之Crci8烷基,C6_C24芳基,以E取代之C6-C24 芳基,C2_ci8烯基,C2-C18炔基,CrC18烷氧基,以E取代及/ 17 2004223 77 或以D間斷之CrC18烷氧基,C7_C25芳烷基,且 D,E,R6, R7, R8, R9, Rl〇, Rl4’ 及 Rl5,係如上所界定。 較佳地,R6及R7彼此個別係H,c「Ci8燒基,諸如,甲 基,乙基,正丙基,異丙基,正丁基,異丁基,第二丁基,第 5二丁基,2_甲基丁基,正戊基,異戊基,正己基,2-乙基己基, 或正庚基,以E取代及/或以d間斷之CrC18烧基,諸 如,-CH2OCH3,-CH2〇CH2CH3,·ΟΗ2Ο0Ή2αί2Ο(:Η3, 或-CH2OCH2CH2OCH2CH3,C5-C12 環烧基,諸如,環己基, CrC24芳基,諸如,苯基,萘基,或聯苯基,以E取代之 10 c6-c24 芳基,諸如,·〇6Η4(Χ:Η3,Τ6Η4〇σΗ2(:Η3, -C6H3(OCH3)2,或-C6H3(OCH2CH3)2, -C6H4CH3, -C6H3(CH3)2, _C6H2(CH3)3,或-C6H4tBu。 R8較佳係H,CrC18烷基,諸如,甲基,乙基,正丙基,異 丙基,正丁基,異丁基,第二丁基,第三丁基,2-甲基丁基,正戊 15基,異戊基,正己基,2·乙基己基,及正庚基,或C6-C24芳基,諸 如,苯基,萘基,或聯苯基。 較佳地,R9及R1G彼此個別係H,C「C18烷基,諸如, 正丁基,第一丁基,己基,辛基,及2-乙基-己基,以E取 代及/或以 D 間斷之 CVC18烷基,諸 20 如,-CH2(OCH2CH2)wOCH3, W = 1,2, 3,或 4, C6-C24 芳基,諸 如,苯基,萘基,及聯苯基,以E取代之C6-C24芳基,諸 如,-C6H4OCH3, -C6H4OCH2CH3, -c6h3(och3)2, -c6h3(och2ch3)2, -c6h4ch3, -c6h3(ch3)2, -C6H2(CH3)3,及-C6H4tBu,或 R9 及 r1g —起形成 4 至 8 員 18 之衣’特別係5或6員之環,諸如,環己基,或環戊基,其 可選擇性地以Crc8燒基取代。 車乂铨地,玟14’及Rl5’彼此個別係H,CrC18烷基,諸如, 甲基’乙基,正丙基,異丙基,正丁基,異丁基,及第二丁基,或 5 C24芳基,諸如,苯基,萘基,及聯苯基。 車交佳係CrC18烧基,諸如,甲基,乙基,正丙基,異丙基, 正丁基,異丁基,第二丁基,第三丁基,己基,辛基,及2-乙基-己 基,或kC24芳基,諸如,苯基,萘基,及聯苯基,且π較佳係 CrCl8燒基,諸如,甲基,乙基,正丙基,異丙基,正丁基,異丁 1〇基,第二丁基,第三丁基,己基,辛基,及2-乙基己基,或C6_C24 芳基,諸如,苯基,萘基,及聯苯基。 較佳地,Rll,R12及R13彼此個別係H,CVC18烷基,諸如, 曱基,及乙基,以E取代及/或以D間斷之CrC18烷基,諸 如,-ch2och3,-ch2och2ch3,-ch2och2ch2och3, 15 及-CH20CH2CH20CH2CH3, c6-c24 芳基,諸如,苯基,萘基, 及聯苯基,以E取代之C6-C24芳基,諸如,-C6H4OCH3, -c6h4och2ch35 -c6h3(〇ch3)25 -c6h3(〇ch2ch3)2? -c6h4ch3? C6H3(CH3)2, -C6H2(CH3)3,及-C6H4tBu,C2-C18 烯基,C2-C18 炔 基,CrC18烷氧基,以E取代及/或以D間斷之CrC18烷氧 20 基,諸如,_OCH2OCH3,-OCH2OCH2CH3, CH2OCH2CH2OCH3, -OCH2CH2OCH3,-OCH2CH2OCH2CH2OCH3 及 -OCH2CH2OCH2CH2OCH2CH3,甲氧基,乙氧基,正丙氧基,異 丙氧基,正丁氧基,異丁氧基,第二丁氧基,己氧基,辛氧基,及 2-乙基-己氧基,及CrC25芳氧基。 19 2004223 77 D 較佳係-CO-,-COCK-S-,-SO-,-S02-,-〇-,-NR25-,其 中’R係C「C18烧基,諸如,甲基,乙基,正丙基,異丙基,正 丁基,異丁基,第二丁基,第三丁基,己基,辛基,及2-乙基-己基, 或方基,諸如,苯基,萘基,及聯苯基。 E 較佳係一OR2、_SR29, _NR25R25, _C〇R28, _c〇〇r27,Rl1, R12, and R13 are each H, C, C18 alkyl, Crci8 alkyl substituted with E and / or 15 interrupted by D, C6_C24 aryl, C6-C24 aryl substituted with E, C2_ci8 alkenyl, C2 -C18 alkynyl, CrC18 alkoxy, substituted with E and / 17 2004223 77 or CrC18 alkoxy interrupted by D, C7_C25 aralkyl, and D, E, R6, R7, R8, R9, R10, Rl4 'And R15 are as defined above. Preferably, R6 and R7 are each independently H, c, Ci8 alkyl, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl , Second butyl, fifth dibutyl, 2-methylbutyl, n-pentyl, isopentyl, n-hexyl, 2-ethylhexyl, or n-heptyl, substituted with E and / or interrupted by d CrC18 alkyl, such as -CH2OCH3, -CH2〇CH2CH3, · ΟΗ2Ο0Ή2αί2Ο (: Η3, or -CH2OCH2CH2OCH2CH3, C5-C12 cycloalkyl, such as, cyclohexyl, CrC24 aryl, such as, phenyl, naphthyl, or Biphenyl, 10 c6-c24 aryl substituted with E, such as · 〇6Η4 (χ: Η3, T6Η4〇σΗ2 (: Η3, -C6H3 (OCH3) 2, or -C6H3 (OCH2CH3) 2, -C6H4CH3, -C6H3 (CH3) 2, _C6H2 (CH3) 3, or -C6H4tBu. R8 is more H, CrC18 alkyl, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, 2-methylbutyl, n-pentyl 15-based, iso-pentyl, n-hexyl, 2.ethylhexyl, and n-heptyl, or C6-C24 aryl, such as phenyl, naphthyl, or biphenyl. Preferably, R9 and R1G are each separate H, C, C18 alkyl, such as n-butyl, first butyl, hexyl, octyl, and 2-ethyl-hexyl, CVC18 alkyl substituted with E and / or D interrupted, such as 20 , -CH2 (OCH2CH2) wOCH3, W = 1, 2, 3, or 4, C6-C24 aryl, such as phenyl, naphthyl, and biphenyl, C6-C24 aryl substituted with E, such as, -C6H4OCH3, -C6H4OCH2CH3, -c6h3 (och3) 2, -c6h3 (och2ch3) 2, -c6h4ch3, -c6h3 (ch3) 2, -C6H2 (CH3) 3, and -C6H4tBu, or R9 and r1g together The clothes of 8 members and 18 members are especially rings of 5 or 6 members, such as cyclohexyl, or cyclopentyl, which can be optionally substituted by Crc8 alkyl groups. Chedi, 玟 14 'and Rl5' are each independently related to each other. H, CrC18 alkyl, such as methyl'ethyl, n-propyl, isopropyl, n-butyl Isobutyl, and sec-butyl, or 5 C24 aryl group, such as phenyl, naphthyl and biphenyl. Che Jia Jia CrC18 alkyl, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, hexyl, octyl, and 2- Ethyl-hexyl, or kC24 aryl, such as phenyl, naphthyl, and biphenyl, and π is preferably CrCl8 alkyl, such as methyl, ethyl, n-propyl, isopropyl, n-butyl Methyl, isobutyl 10yl, second butyl, third butyl, hexyl, octyl, and 2-ethylhexyl, or C6-C24 aryl, such as phenyl, naphthyl, and biphenyl. Preferably, R11, R12 and R13 are each H, CVC18 alkyl, such as fluorenyl, and ethyl, CrC18 alkyl substituted with E and / or D interrupted, such as -ch2och3, -ch2och2ch3,- ch2och2ch2och3, 15 and -CH20CH2CH20CH2CH3, c6-c24 aryl, such as phenyl, naphthyl, and biphenyl, C6-C24 aryl substituted with E, such as -C6H4OCH3, -c6h4och2ch35 -c6h3 (〇ch3) 25 -c6h3 (〇ch2ch3) 2? -c6h4ch3? C6H3 (CH3) 2, -C6H2 (CH3) 3, and -C6H4tBu, C2-C18 alkenyl, C2-C18 alkynyl, CrC18 alkoxy, substituted with E and // Or CrC18 alkoxy 20 groups interrupted by D, such as _OCH2OCH3, -OCH2OCH2CH3, CH2OCH2CH2OCH3, -OCH2CH2OCH3, -OCH2CH2OCH2CH2OCH3 and -OCH2CH2OCH3, -OCH2CH2OCH2, methoxy, ethoxy, n-butoxy, n-butoxy Group, isobutoxy, second butoxy, hexyloxy, octyloxy, and 2-ethyl-hexyloxy, and CrC25 aryloxy. 19 2004223 77 D is more preferably -CO-, -COCK-S-, -SO-, -S02-, -〇-, -NR25-, wherein 'R is C, C18 alkyl, such as methyl, ethyl , N-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, hexyl, octyl, and 2-ethyl-hexyl, or square groups such as phenyl, naphthalene And biphenyl. E is preferably OR2, _SR29, _NR25R25, _C〇R28, _c〇〇r27,
-CONR25R25,或_CN,其中,R25, R27, R28 及 R29 彼此個別係 CrCls烷基,諸如,甲基,乙基,正丙基,異丙基,正丁基,異丁 基,第一丁基,己基,辛基,2-乙基己基,或C6_C24芳基,諸如, 苯基,秦基及聯苯基。 較佳地,R1及R2至少一者係C6-C24芳基或C2-C2Q雜芳 基,其可選擇性地被取代。於此情況,R1及R2較佳係選自-CONR25R25, or _CN, where R25, R27, R28, and R29 are each a CrCls alkyl group, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, first butyl Radicals, hexyl, octyl, 2-ethylhexyl, or C6-C24 aryl, such as phenyl, heptyl, and biphenyl. Preferably, at least one of R1 and R2 is a C6-C24 aryl group or a C2-C2Q heteroaryl group, which may be optionally substituted. In this case, R1 and R2 are preferably selected from
R6,R7及X6彼此個別係H, CrC18烷基,諸如,甲基,乙基,正R6, R7 and X6 are each H, CrC18 alkyl, such as methyl, ethyl, n
15 丙基,異丙基,正丁基,異丁基,第二丁基,第三丁基,己基,辛 基,2-乙基-己基,以E取代及/或以D間斷之CrC18烷基,諸 如,-ch2och3, -ch2och2ch3,-ch2och2ch2och3, 及-ch2och2ch2och2ch3, c6_c24 芳基,諸如,苯基,萘基, 及聯苯基,以E取代之C6-C24芳基,諸如,-C6H4OCH3, 20 -c6h4och2ch35 -c6h3(〇ch3)2? -c6h3(〇ch2ch3)25 -c6h4ch35 20 2004223 77 -C6H3(CH3)2, -C6H2(CH3)3,及-C6H4tBu, R8係H,C「C18烷基,諸如,甲基,乙基,正丙基,異丙基,正丁 基,異丁基,及第二丁基,或c6_c24芳基,諸如,苯基,萘基,及 聯苯基,且 5 ^及R1G彼此個別係H,CrC18烷基,諸如,正丁基,第二丁 基,己基,辛基,或2·乙基-己基,以E取代及/或以D間斷之 cvc18烷基,諸如,_CH2(〇CH2CH2)w〇CH3, w = I 2,3,或 4, C6_C:24芳基,諸如,苯基,萘基,或聯苯基,以E取代之 芳基,諸如,_C6H4OCH3,_C6H4OCH2CH3,_C6H3(OCH3)2, 10 -C6H3(OCH2CH3)2? .C6H4CH3? -C6H3(CH3)2? -C6H2(CH3)35 或-QHjBu,或R9及rig 一起形成4至8員之環,特別係5 或6員之環,諸如,環己基,或環戊基。 最佳地,於化學式以及Ib中,R2係H且以係C6_C24 芳基或C2-C2G雜芳基。 15 本發明聚合物包含0_5莫耳%至1〇〇莫耳%之量(特別係 40莫耳%至60莫耳%之量)之化學式I之重複單元,其中, 所有重複單元(單體)之總和⑻莫耳%。因此,本發明之 聚^物除化學式1之重複單元外可另包含最高達99_5莫耳% 之量(特別係60莫耳%至40莫耳%之量)之共單體。 20 於本發明之較佳實施例中,聚合物係同聚物,其包含 如下化學式之重複單元: 21 2004223 77 R1 N人NljSf^x215 Propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, hexyl, octyl, 2-ethyl-hexyl, CrC18 alkyl substituted with E and / or D interrupted Groups such as -ch2och3, -ch2och2ch3, -ch2och2ch2och3, and -ch2och2ch2och2ch3, c6_c24 aryl groups, such as phenyl, naphthyl, and biphenyl, C6-C24 aryl groups substituted with E, such as -C6H4OCH3, 20 -c6h4och2ch35 -c6h3 (〇ch3) 2? -c6h3 (〇ch2ch3) 25 -c6h4ch35 20 2004223 77 -C6H3 (CH3) 2, -C6H2 (CH3) 3, and -C6H4tBu, R8 series H, C "C18 alkyl, Such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, and second butyl, or c6-c24 aryl, such as phenyl, naphthyl, and biphenyl, and 5 ^ And R1G are each H, CrC18 alkyl, such as n-butyl, second butyl, hexyl, octyl, or 2-ethyl-hexyl, cvc18 alkyl substituted with E and / or D interrupted, For example, _CH2 (〇CH2CH2) woCH3, w = I 2,3, or 4, C6_C: 24 aryl, such as phenyl, naphthyl, or biphenyl, aryl substituted with E, such as _C6H4OCH3 , _C6H4OCH2CH3, _C6H3 (OCH3) 2, 10 -C6H 3 (OCH2CH3) 2? .C6H4CH3? -C6H3 (CH3) 2? -C6H2 (CH3) 35 or -QHjBu, or R9 and rig together form a 4 to 8 member ring, especially a 5 or 6 member ring, such as, Cyclohexyl, or cyclopentyl. Most preferably, in the chemical formula and Ib, R2 is H and C6_C24 aryl or C2-C2G heteroaryl. 15 The polymer of the present invention contains 0-5 mole% to 100 moles. Mol% (especially 40 mol% to 60 mol%) of the repeating unit of formula I, wherein the sum of all repeating units (monomers) is mol%. Therefore, the polymer of the present invention In addition to the repeating unit of Chemical Formula 1, it may further include a comonomer in an amount of up to 99-5 mol% (especially in an amount of 60 mol% to 40 mol%). 20 In a preferred embodiment of the present invention, polymerization A homopolymer of a system comprising a repeating unit of the following chemical formula: 21 2004223 77 R1 N human NljSf ^ x2
(Ia),或 (lb) 其中(Ia), or (lb) where
,或 r\, Or r \
Rb R°Rb R °
特別係 W ,或In particular W, or
ΧΌ ,或 5 ,其中,X6係H,CrC18烷基,環己基,或(^-018烷 氧基, R2 係 H,ΧΌ, or 5, where X6 is H, CrC18 alkyl, cyclohexyl, or (^ -018 alkoxy, R2 is H,
X1及X2彼此個別係如下化學式之基X1 and X2 are each independently a base of the following chemical formula
本發明非如下化學式之聚合物 22 10 2004223 77Polymers of the invention not having the following chemical formula 22 10 2004 223 77
23 2004223 77 SCH2CH(CH2CH3)CH2CH2CH2CH323 2004 223 77 SCH2CH (CH2CH3) CH2CH2CH2CH3
N人NN people N
(Mw = 23000)(Mw = 23000)
(Mw = 28000)(Mw = 28000)
較佳地,本發明不包含如下化學式之重複單元Preferably, the present invention does not include a repeating unit of the following chemical formula
其中,X (=X),Y(= Z),Y1 (= R1),Y2 (= R2),X (= η)且 y (= m) 係如DE-A-10143353中所界定。 適合之共單體T係選自如下所組成族群Among them, X (= X), Y (= Z), Y1 (= R1), Y2 (= R2), X (= η) and y (= m) are as defined in DE-A-10143353. A suitable comonomer T is selected from the group consisting of
24 10 20042237724 10 200422377
25 20042237725 200422377
5其中, R16係H; C6-C18芳基,以CrC18烧基取代之芳基, c「c18燒基,c7-c25芳烧基,或以-〇-間斷之Cl-Cl8烧基; · p係1至ίο之整數,特別係1,2 $ 3, q係1至ίο之整數,特別係1,2或3, 10 s係1至10之整數,特別係1,2或3, R6, R7, R8, R9及R1G係如上所界定,或 R9及R10 —起形成化學式^CRWOR1。1之基,其中, R10G及R1G1彼此個別係H,CrC18烷基,以E取代及/或以D 間斷之CrCls烧基,C6-C24芳基,以E取代之C6-C24芳基, 15 CrC2G雜芳基,或以E取代之C2-C2G雜芳基,且 26 422377 R4及R15彼此個別係H,Ci_Ci8烷基,以E取代及/或以D 間斷之eve”烷基,c0-C24芳基,以E取代之C6-C24芳基, crC2〇雜芳基,或以E取代之C2_Cm雜芳基。 若R9及R1G形成化學式=criggri(h之基,T較佳係如 下化學式之基5 wherein, R16 is H; C6-C18 aryl, aryl substituted with CrC18 alkyl, c "c18 alkyl, c7-c25 aryl, or -0-interrupted Cl-Cl8 alkyl; p Is an integer from 1 to ίο, in particular 1,2 $ 3, q is an integer from 1 to ίο, especially 1,2 or 3, 10 s is an integer from 1 to 10, especially 1,2 or 3, R6, R7, R8, R9 and R1G are as defined above, or R9 and R10 together form a base of the formula ^ CRWOR1.1, wherein R10G and R1G1 are each H, CrC18 alkyl, each substituted by E and / or interrupted by D CrCls, C6-C24 aryl, C6-C24 aryl substituted with E, 15 CrC2G heteroaryl, or C2-C2G heteroaryl substituted with E, and 26 422377 R4 and R15 are each H, Ci_Ci8 alkyl, eve "alkyl substituted with E and / or D interrupted, c0-C24 aryl, C6-C24 aryl substituted with E, crC20 heteroaryl, or C2_Cm heteroaryl substituted with E . If R9 and R1G form the formula = criggri (h, T is preferably the following formula
,其中HR103彼此個別係々C18貌基,Cl-Cl8院氧基: CA。芳基,Q-q。芳氧基,或二(CrCi8縣)胺基,其中, 10 芳基或芳氧基選擇性地可以C广CJ基取代(购. 6,512,083)。 T之較佳例子係選自如下化學式之笑Among them, HR103 is C18 aryl group, Cl-Cl8 oxygen group: CA. Aryl, Q-q. Aryloxy, or bis (CrCi8) amine, wherein 10 aryl or aryloxy can be optionally substituted with C-CJ groups (purchased. 6,512,083). A good example of T is selected from the following chemical formula
66
27 2004223 7727 2004 223 77
R及R7彼此個別係H,烧基,諸如,甲基,乙基,正丙 基,異丙基,正丁基,異丁基,第二丁基,第三丁基,2·甲基丁基, 5正戊基,異戊基,正己基,2·乙基己基,或正庚基,以E取代及/ 或以 D 間斷2CrC18 烷基,諸如,-CH20CH3,-CH20CH2CH3, -ch2och2ch2och3,或-ch2och2ch2och2ch3, 0:5<12環R and R7 are each independently H, alkyl, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, and 2.methylbutyl , 5 n-pentyl, iso-pentyl, n-hexyl, 2 · ethylhexyl, or n-heptyl, substituted with E and / or interrupted 2CrC18 alkyl such as -CH20CH3, -CH20CH2CH3, -ch2och2ch2och3, or -ch2och2ch2och2ch3, 0: 5 < 12 rings
烷基,諸如,環己基,c6-c24芳基,諸如,苯基,萘基,或聯苯 基,以E取代之C6_C24芳基,諸如,-C6H4OCH3, 10 -C6H4OCH2CH3,-C6H3(OCH3)25 或 _C6H3(OCH2CH3)2, -C6H4CH3, -C6H3(CH3)2, _C6H2(CH3)3,或 _C6H4tBii, R係H,CpCu烧基,诸如’甲基,乙基,正丙基,異丙基,正丁 基,異丁基,第二丁基,第三丁基,2-甲基丁基,正戊基,異戊基, 正己基,2-乙基己基,正庚基,或c6-C24芳基,諸如,苯基,萘基, 15 或聯苯基,且 R9及R1G彼此個別係H,CrC18烷基,諸如,正丁基,第二丁 基,己基,辛基,或2-乙基己基,以E取代及/或以D間斷之 CrC18 烷基,諸如,-CH2(0CH2CH2)w0CH3, w = 1,2, 3,或 4, 28 2004223 77 G-C24芳基,諸如,苯基,萘基,或聯苯基,以E取代之c6_c24 芳基,諸如,-C6H4OCH3, -c6h4och2ch3, -c6h3(och3)2, -c6h3(och2ch3)2,-c6h4ch3,-c6h3(ch3)2,-c6h2(ch3)3, 或-QHjBu,或R9及Ri❹一起形成4至8員之環,特別係5 5 或6員之環,諸如,環己基,或環戊基,其可選擇性地以cr cls(諸如,甲基,乙基,正丙基,異丙基,正丁基,異丁基,第二 丁基,第三丁基,2-甲基丁基,正戊基,異戊基,正己基,乙基 己基,或正庚基)烷基取代,以E取代及/或以d間斷之Ci_Ci8 烷基,諸如,-CH2OCH3, -CH2OCH2CH3, 10 -CH2OCH2CH2OCH3,或-CH20CH2CH20CH2CH3, C^C24芳基,諸如,苯基,萘基,或聯苯基,以e取代之c cAlkyl, such as cyclohexyl, c6-c24 aryl, such as phenyl, naphthyl, or biphenyl, C6-C24 aryl substituted with E, such as -C6H4OCH3, 10 -C6H4OCH2CH3, -C6H3 (OCH3) 25 Or _C6H3 (OCH2CH3) 2, -C6H4CH3, -C6H3 (CH3) 2, _C6H2 (CH3) 3, or _C6H4tBii, R is H, CpCu alkyl, such as' methyl, ethyl, n-propyl, isopropyl Base, n-butyl, isobutyl, second butyl, third butyl, 2-methylbutyl, n-pentyl, isopentyl, n-hexyl, 2-ethylhexyl, n-heptyl, or c6 -C24 aryl, such as phenyl, naphthyl, 15 or biphenyl, and R9 and R1G are each H, CrC18 alkyl, such as n-butyl, second butyl, hexyl, octyl, or 2 -Ethylhexyl, CrC18 alkyl substituted with E and / or D interrupted, such as, -CH2 (0CH2CH2) w0CH3, w = 1, 2, 3, or 4, 28 2004223 77 G-C24 aryl, such as, Phenyl, naphthyl, or biphenyl, c6_c24 aryl substituted with E, such as -C6H4OCH3, -c6h4och2ch3, -c6h3 (och3) 2, -c6h3 (och2ch3) 2, -c6h4ch3, -c6h3 (ch3) 2 , -C6h2 (ch3) 3, or -QHjBu, or R9 and Ri❹ together form a 4 to 8 member ring, especially 5 5 or 6 membered rings, such as cyclohexyl, or cyclopentyl, which may optionally be cr cls (such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, Second butyl, third butyl, 2-methylbutyl, n-pentyl, isopentyl, n-hexyl, ethylhexyl, or n-heptyl) alkyl substituted, substituted with E and / or interrupted by d Ci_Ci8 alkyl, such as -CH2OCH3, -CH2OCH2CH3, 10 -CH2OCH2CH2OCH3, or -CH20CH2CH20CH2CH3, C ^ C24 aryl, such as phenyl, naphthyl, or biphenyl, cc substituted by e
芳基,諸如,-c6h4och3,-c6h4och2ch3? -c6h3(〇ch3)I 或-C6H3(〇CH2CH3)2, -C6H4CH3, -C6H3(CH3k ^ 或 _C6H4tBu 〇 15 於較佳實施例,聚合物包含化學式ia或 7复-罕- 元,其中,R1係如下化學式之基Aryl groups such as -c6h4och3, -c6h4och2ch3? -C6h3 (〇ch3) I or -C6H3 (〇CH2CH3) 2, -C6H4CH3, -C6H3 (CH3k ^ or _C6H4tBu ○ 15 In preferred embodiments, the polymer contains a chemical formula ia or 7 complex-han-yuan, where R1 is the base of the formula
29 200422377 R2 係 Η, R6及R7彼此個別係Η,CVC12烷基,環己基,或C「C12烷氧 基, R8係crc18烷基,以一或二個氧原子間斷之cvc18烷基,或 C6_C12芳基,其選擇性地可以CrCi2烷基取代,或(^/^烷 氧基, R9及R1G彼此個別係CrC18烷基,特別係c4-c12烷基,其可 以一或二個氧原子間斷,且 X,X2, T,X及y係如上所界定。 於該實施例中,共單體τ可選擇性地存在,其較佳係 選自如下所組成之族群29 200422377 R2 is R, R6 and R7 are each independently R, CVC12 alkyl, cyclohexyl, or C "C12 alkoxy, R8 is crc18 alkyl, cvc18 alkyl interrupted by one or two oxygen atoms, or C6_C12 Aryl, which may be optionally substituted with CrCi2 alkyl, or (^ / ^ alkoxy, R9 and R1G are each CrC18 alkyl, especially c4-c12 alkyl, which may be interrupted by one or two oxygen atoms, And X, X2, T, X and y are as defined above. In this embodiment, the comonomer τ may optionally exist, which is preferably selected from the group consisting of
30 2004223 7730 2004 223 77
斗/^ ά, 其中,R6係Η,或CrC8烷基,R8係CVC18烷基, R9及R1G彼此個別係C「C18烷基,特別係C4-C12烷基,其可 5 以一或二個氧原子間斷,或 R9及R1G形成五或六員之碳環,其可選擇性地以Ci_C8烷基 取代。 於本發明之第一方面,聚合物係別佳,其包含如下化 學式之重複單元 10// ^ ά, where R6 is Η, or CrC8 alkyl, R8 is CVC18 alkyl, R9 and R1G are each C, C18 alkyl, especially C4-C12 alkyl, which can be one or two The oxygen atom is discontinuous, or R9 and R1G form a five- or six-membered carbocyclic ring, which can be optionally substituted with Ci_C8 alkyl group. In the first aspect of the present invention, the polymer is particularly good, and includes repeating unit 10 of the following chemical formula
(lb),及 共單體 =广之範圍,特別係〇4至。6々輪 圍,特別係〇.6至0.4,其中,X與y之總和係J R1係如下化學式之基 、, 31 200422377(lb), and comonomers = a wide range, especially from 0 to. 6々 round, especially 0.6 to 0.4, where the sum of X and y is J R1 is the base of the following chemical formula, 31 200422377
R2 係 H, 5 X1及X2彼此個別係如下化學式之基R2 is H, 5 X1 and X2 are each independently a base of the following chemical formula
及R1G彼此個別係(VCm烧基,特別係c4_c12烧基,其可以 10 —或二個氧原子間斷,且 R6及R7彼此個別係H,CrC12烧基,環己基,c6_c24芳基,特 別係苯基,萘基,或聯苯基,其可以-〇_Ci_Ci2烷基,或Ci_Ci8 烷氧基取代。 於第二方面,本發明係有關於包含如下化學式之重複 15 單元之聚合物 32 2004223 77And R1G are each independently (VCm alkyl, especially c4_c12 alkyl, which can be interrupted by 10 or two oxygen atoms, and R6 and R7 are each independently H, CrC12 alkyl, cyclohexyl, c6_c24 aryl, especially benzene , Naphthyl, or biphenyl, which may be substituted with -0_Ci_Ci2 alkyl, or Ci_Ci8 alkoxy. In a second aspect, the present invention relates to polymers comprising repeating 15 units of the following chemical formula 32 2004223 77
(II),其中, R3, R4及R5彼此個別係有機取代基,特別係C2-C3()芳基或 C2-C26雜芳基,其選擇性地可被取代, X3係二價之鍵結基,其中,如下化學式之重複單元(II), wherein R3, R4 and R5 are each an organic substituent, especially a C2-C3 () aryl group or a C2-C26 heteroaryl group, which can be optionally substituted, and X3 is a divalent bond Group, in which the repeating unit of the following chemical formula
(lib)係較佳,且如下化學式之重複單 元(lib) is better, and the repeating unit of the following chemical formula
係特別佳。 (He),Department is particularly good. (He),
適當二價鍵結基X3之例子係An example of a suitable divalent bonding group X3 is
33 10 2004223 77 R7133 10 2004 223 77 R71
表示結合至嘴σ定環之鍵; R3; R4及R5係如上所界定; R56及R57彼此個別係H; CrC18烷基;以Ε取代及/或以D 5 間斷之CrC18烷基;C5-C12環烷基,以E取代之C5-C12環 烷基,C6-C24芳基;以E取代之C6_C24芳基;C2-C2。雜芳基; 以E取代之C2-C2。雜芳基;C2-C18烯基;C2_C18炔基;cvc18 烷氧基;以E取代及/或以D間斷之(^-(:18烷氧基;或C7-C25 芳烷基; 10 R58係H; CrC18烷基;以E取代及/或以D間斷之CrC18烷 基;C6-C24芳基;或C7-C25#烷基; R59係H; C「C18烷基;以E取代及/或以D間斷之<^-(:18烷 基;C6-C24芳基;以E取代之C6-C24芳基;C2-C2。雜芳基;以 E取代之C2-C2()雜芳基;C2-C18烯基;C2-C18炔基;(^_0:18烷 15 氧基;以E取代及/或以D間斷之CrC18烷氧基;或C7-C25 芳烧基; R71 係 H,CVC18 烷基,-ON,-CONR25R26 或-COOR27, D 係-CO-; -COO_; -OCOO·; -S-; -SO·; -SOr; -NR25-; -SiR30R31-; -POR32·; -CR23=CR24-;或-CC-;且 20 E 係-OR29; -SR29; -NR25R26; -COR28; -COOR27; -CONR25R26; -CN;-OCOOR27;或鹵素;其中 34 2004223 77 R23; R24; R25 及 R26 彼此個別係 H; c6-c18 芳基;以 cvc18^ 基取代之cvc18芳基;Ci_Ci8烷氧基;crCi8烷基;或以-Ο 間斷之cvcu烷基;或R3; R4 and R5 are as defined above; R56 and R57 are each independently H; CrC18 alkyl; CrC18 alkyl substituted with E and / or interrupted by D5; C5-C12 Cycloalkyl, C5-C12 cycloalkyl substituted with E, C6-C24 aryl; C6-C24 aryl substituted with E; C2-C2. Heteroaryl; C2-C2 substituted with E. Heteroaryl; C2-C18 alkenyl; C2-C18 alkynyl; cvc18 alkoxy; substituted with E and / or interrupted by D (^-(: 18 alkoxy; or C7-C25 aralkyl; 10 R58) H; CrC18 alkyl; CrC18 alkyl substituted with E and / or D interrupted; C6-C24 aryl; or C7-C25 # alkyl; R59 is H; C "C18 alkyl; substituted with E and / or ≪ ^-(: 18 alkyl; C6-C24 aryl; D substituted with E; C6-C24 aryl substituted with E; C2-C2. Heteroaryl; C2-C2 () heteroaryl substituted with E C2-C18 alkenyl; C2-C18 alkynyl; (^ _0: 18 alk 15 oxy; CrC18 alkoxy substituted with E and / or D interrupted; or C7-C25 aralkyl; R71 is H, CVC18 alkyl, -ON, -CONR25R26 or -COOR27, D system -CO-; -COO_; -OCOO ·; -S-; -SO ·; -SOr; -NR25-; -SiR30R31-; -POR32 ·;- CR23 = CR24-; or -CC-; and 20 E series -OR29; -SR29; -NR25R26; -COR28; -COOR27; -CONR25R26; -CN; -OCOOR27; or halogen; of which 34 2004223 77 R23; R24; R25 And R26 are each H; c6-c18 aryl; cvc18 aryl substituted with cvc18 ^; Ci_Ci8 alkoxy; crCi8 alkyl; or cvcu alkyl interrupted by -0; or
5 υ ,或 〇 , R27及R28彼此個別係H; C6_C18芳基;以CrCi8烷基,或CV C,8烧氧基取代之c6_ci8芳基;Ci_Ci8烷基;或以_〇_間斷之 Ci_C18烧基,且 R29係H; C6_C1S芳基;以Cl-ci8烷基,CrCi8烷氧基取代之 10 C6-C18芳基;CrC18^基;或以-〇-間斷之crci8烷基, R30及R31彼此個別係Cl-C18烷基,c6-c18芳基,或以crc18 烷基取代之c6-c18芳基,且 · R32係crc18烧基,c6-c18芳基,或以CrC18烧基取代之c6-C18芳基。 15 於本發明之第二方面,包含化學式nb之重複單元(特 別係化學式Ila,或lie之重複單元)之聚合物係較佳,其中,5 υ, or 〇, R27 and R28 are each H independently; C6_C18 aryl; c6_ci8 aryl substituted with CrCi8 alkyl, or CV C, 8 alkoxy; Ci_Ci8 alkyl; or _〇_ intermittent Ci_C18 And R29 is H; C6_C1S aryl; 10 C6-C18 aryl substituted with Cl-ci8 alkyl, CrCi8 alkoxy; CrC18 ^; or crci8 alkyl interrupted by -0-, R30 and R31 each other Some are Cl-C18 alkyl, c6-c18 aryl, or c6-c18 aryl substituted with crc18 alkyl, and · R32 is crc18 alkyl, c6-c18 aryl, or c6- substituted with CrC18 alkyl C18 aryl. 15 In the second aspect of the present invention, a polymer comprising a repeating unit of the chemical formula nb (particularly a repeating unit of the chemical formula Ila, or lie) is preferred, of which,
X3係化學式、之基,其中,虛線表示結合至嘧啶 35 2004223 77 環之鍵,且R71係H,烷基,-CeN,或-COOR27,其中,R27係 H,或烷基,其選擇性地可以一或二個氧原子間斷, 特別係C4-C12烷基,其選擇性地可以一或二個氧原子間斷。 R3, R4及R5原則上可為任何有機取代基,只要其對於聚 5 合物之(電)致發光特性不具負面影響,特別係H,CVC18烷基, 以E取代及/或以D間斷之CVC18烷基,C2_C18烯基,C2-C18 炔基,CrC18烷氧基,以E取代及/或以D間斷之(^-0:18烷 氧基,C7-C25*烷基,X3 is a group of formula, wherein the dotted line represents a bond to the pyrimidine 35 2004223 77 ring, and R71 is H, alkyl, -CeN, or -COOR27, wherein R27 is H, or alkyl, which is optionally It can be interrupted by one or two oxygen atoms, especially C4-C12 alkyl, which can optionally be interrupted by one or two oxygen atoms. R3, R4 and R5 can in principle be any organic substituents, as long as it does not have a negative effect on the (electro) luminescence properties of the poly5 complex, especially H, CVC18 alkyl, substituted with E and / or interrupted by D CVC18 alkyl, C2-C18 alkenyl, C2-C18 alkynyl, CrC18 alkoxy, substituted with E and / or interrupted by D (^ -0: 18 alkoxy, C7-C25 * alkyl,
&χ5,。6-。24芳& χ5 ,. 6-. 24 Fang
基,或C2-C2()雜芳基,其選擇性可被取代,特別係如下化學式 10 之基Or C2-C2 () heteroaryl, the selectivity of which may be substituted, especially the group of the following chemical formula 10
36 2004223 7736 2004 223 77
其中,ml,m2, m3, m4, m5, m6及m7係1至10之整數,特 別係1至3, X6係H,CrC18烷基,CrC18烷氧基,以E取代及/或以D間 斷之CVC18烷基,C6-C24芳基,其可選擇性地被取代,特別係Among them, ml, m2, m3, m4, m5, m6 and m7 are integers from 1 to 10, especially from 1 to 3, X6 is H, CrC18 alkyl, CrC18 alkoxy, substituted with E and / or interrupted by D CVC18 alkyl, C6-C24 aryl, which can be optionally substituted, especially
C2-C2Q雜芳基,其 37 200422377C2-C2Q heteroaryl, 37 200422377
可選擇性地被取代,Can optionally be replaced,
C18炔基,crcl8烷氧基,以E取 代及/或以D間斷之CVCm烷氧基,或crC25芳烷基, X4係CVC18烷基,以E取代及/或以D間斷之CVCm烷基, 5 C6-C24芳基或C2-C2。雜芳基,其可選擇性地被取代。 X5係CVC18烷基,C6-C24芳基,或C2-C2g雜芳基,其可選擇性 地以-〇CVC18烷基或-oc6-c24芳基取代, R61,R62及R63彼此個別係H,CVC!8烷基,以E取代及/或以 D間斷之CrC18烧基,C6-C24方基,以E取代之Q-C24方基, 10 C2-C18烯基,C2-C18炔基,Ci-C18烧氧基,以E取代及/或以 D間斷之Ci_C18烧氧基,或CrQ5芳烧基, R64及R65彼此個別係H,CVC18烧基,以E取代及/或以D 間斷之CrC18烷基,C6-C24芳基,以E取代之C6-C24芳基, C2-C2〇雜芳基,或以E取代之C2-C2G雜芳基,且 15 D,E,R56, R57, R58,尺59及r6G係如上所界定。 較佳地,R56及R57彼此個別係H,CrC18烷基,諸如,甲 基,乙基,正丙基,異丙基,正丁基,異丁基,第二丁基,第三丁 基,2-甲基丁基,正戍基,異戍基,正己基,2-乙基己基,及正庚 基,以E取代及/或以D間斷之(VC18烧基,諸如,_ch2〇CH3, 20 -CH2OCH2CH3,-CH2OCH2CH2OCH3, 38 2004223 77 及-CH2OCH2CH2OCH2CH3, crCi2環烧基,諸如,環已基 c6-c24芳基,諸如,苯基,萘基,及聯苯基,或以E取代之c『c 芳基,諸如,<6Η4Ο(:Η3,-<:6Η4(Χ:Η2™3,_0:6ϋ3((ΧΉ3)2 -C6H3(OCH2CH3)2? -c6h4ch35 -C6H3(CH3)25 .c6h2(ch3)3? 5 及-C6H4tBu 〇 R較佳係H,CrCi8烷基,諸如,甲基,乙基,正丙基,異丙基 正丁基,異丁基,第二丁基,第三丁基,2_甲基丁基,正戊基異 戊基,正己基,2-乙基己基,及正庚基,或Q_C24芳基,諸如,苯 基,萘基,及聯笨基。 鲁 10 較佳地,R59及R6G彼此個別係H,CVC18烷基,諸如,正 丁基,第一丁基,己基,辛基,及2_乙基_己基,以E取代及/或 以 D 間斷之 crCls 烷基,諸如,_CH2(〇CH2CH2)w〇CH3, w=l, 2, 3,或4, C0_C24芳基,諸如,苯基,萘基,及聯苯基,以e取代 之 C6-C24 芳基,諸如,-C6H4〇cH3, C6H4〇ch2ch3, 15 -C6H3(OCH3)2? -C6H3(OCH2CH3)25 -C6H4CH3? -C6H3(CH3)25 -C6H2(CH3)3,及_C6H4tBu,或 r59 及 r6G 一起形成 4 至 8 員 _ 之環,較佳係5或6員之環,諸如,環己基及環戊基。 較佳地,R64及R65彼此個別係H,CVC18烷基,諸如, 甲基,乙基,正丙基,異丙基,正丁基,異丁基,及第二丁基,或 20 C0-C24芳基,諸如,苯基,萘基,及聯苯基。 X4較佳係Crc18烷基,諸如,甲基,乙基,正丙基,異丙基, 正丁基,異丁基,第二丁基,第三丁基,己基,辛基,及2-乙基-己 基,或Ce-C24芳基,諸如,苯基,萘基,及聯苯基。 X較佳係crc18院基,諸如,甲基,乙基,正丙基,異丙基, 39 200422377 正丁基,異丁基,第二丁基,第三丁基,己基,辛基,及2-乙基-己 基,C^C:24芳基,諸如,苯基,萘基,及聯苯基,或以〇R29取代 之〇6<24芳基,其中,r29係H,crC18烷基,諸如,甲基,及 乙基,或C0_c24芳基,諸如,苯基。 5 D 較佳係-CO-; -COO-; -OCOO-;各;-so-; -sor; - NR25-;且 E 較佳係 _〇R29;_SR29; -NR25R26 卜 C〇R28; "COOR27; _CONR25R26;或—CN;其中,R25; R27; R28 及 R29 彼 此個別係H; CrC18烷基;諸如,甲基;乙基;正丙基;異丙基; 正丁基;異丁基;第二丁基;己基;辛基;及2-乙基-己基;C6-C24 10芳基;諸如,苯基;萘基;及聯苯基。 較佳地,R1,R2及R3之至少一者係C6-C24芳基或C2-C20 雜芳基,其可選擇性地被取代。於此方面,包含化學式Ila (其 中,R4係Η,且R3及R5彼此個別係C6-C24芳基,或C2-C20 雜芳基),或Iic(其中,R3係Η,且R4及R5彼此個別係C6-15 C24芳基或C2-C2Q雜芳基)之重複單元之聚合物,其相對於具 有化學式IIb(其中,R3, R4,及R5彼此個別係C6-C24芳基或 C2_C2〇雜芳基,其中,c6-C24a芳基或C2-C2〇雜芳基可選擇 性被取代)之重複單元之該等聚合物而言係較佳。C18 alkynyl, crcl8 alkoxy, CVCm alkoxy substituted with E and / or D interrupted, or crC25 aralkyl, X4 CVC18 alkyl, CVCm alkyl substituted with E and / or D interrupted, 5 C6-C24 aryl or C2-C2. Heteroaryl, which may be optionally substituted. X5 is CVC18 alkyl, C6-C24 aryl, or C2-C2g heteroaryl, which may be optionally substituted with -0CVC18 alkyl or -oc6-c24 aryl. R61, R62 and R63 are each H, CVC! 8 alkyl, CrC18 alkyl substituted with E and / or D interrupted, C6-C24 square, Q-C24 square substituted with E, 10 C2-C18 alkenyl, C2-C18 alkynyl, Ci -C18 alkyloxy, Ci_C18 alkyloxy substituted with E and / or D interrupted, or CrQ5 aromatic alkyl, R64 and R65 are each H, CVC18 alkyl, substituted with E and / or D interrupted CrC18 Alkyl, C6-C24 aryl, C6-C24 aryl substituted with E, C2-C20 heteroaryl, or C2-C2G heteroaryl substituted with E, and 15 D, E, R56, R57, R58 Ruler 59 and r6G are as defined above. Preferably, R56 and R57 are each H, CrC18 alkyl, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, 2-methylbutyl, n-fluorenyl, isofluorenyl, n-hexyl, 2-ethylhexyl, and n-heptyl, substituted with E and / or interrupted by D (VC18 alkyl, such as _ch2CH3, 20 -CH2OCH2CH3, -CH2OCH2CH2OCH3, 38 2004223 77 and -CH2OCH2CH2OCH2CH3, crCi2 cycloalkyl, such as cyclohexyl c6-c24 aryl, such as phenyl, naphthyl, and biphenyl, or c substituted with E " c Aryl, such as < 6Η4Ο (: Η3,-<: 6Η4 (χ: Η2 ™ 3, _0: 6ϋ3 ((ΧΉ3) 2 -C6H3 (OCH2CH3) 2? -c6h4ch35 -C6H3 (CH3) 25 .c6h2 (ch3) 3? 5 and -C6H4tBu OR are preferably H, CrCi8 alkyl, such as methyl, ethyl, n-propyl, isopropyl-n-butyl, isobutyl, second butyl, third Butyl, 2-methylbutyl, n-pentyl isopentyl, n-hexyl, 2-ethylhexyl, and n-heptyl, or Q_C24 aryl, such as phenyl, naphthyl, and biphenyl. Lu 10 Preferably, R59 and R6G are each H, CVC18 alkyl, such as , N-butyl, first butyl, hexyl, octyl, and 2-ethyl-hexyl, crCls alkyl substituted with E and / or D-interrupted, such as _CH2 (〇CH2CH2) wOCH3, w = l, 2, 3, or 4, C0_C24 aryl groups, such as phenyl, naphthyl, and biphenyl, C6-C24 aryl groups substituted with e, such as -C6H4ocH3, C6H4och2ch3, 15 -C6H3 (OCH3) 2? -C6H3 (OCH2CH3) 25 -C6H4CH3? -C6H3 (CH3) 25 -C6H2 (CH3) 3, and _C6H4tBu, or r59 and r6G together form a 4 to 8 member ring, preferably 5 or 5 6-membered ring, such as cyclohexyl and cyclopentyl. Preferably, R64 and R65 are each H, CVC18 alkyl, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, Isobutyl, and second butyl, or 20 C0-C24 aryl, such as phenyl, naphthyl, and biphenyl. X4 is preferably Crc18 alkyl, such as methyl, ethyl, n-propyl , Isopropyl, n-butyl, isobutyl, second butyl, third butyl, hexyl, octyl, and 2-ethyl-hexyl, or Ce-C24 aryl, such as phenyl, naphthyl , And biphenyl. X is preferably a crc18 group, such as methyl, ethyl, n-propyl, Isopropyl, 39 200422377 n-butyl, isobutyl, second butyl, third butyl, hexyl, octyl, and 2-ethyl-hexyl, C ^ C: 24 aryl, such as phenyl, Naphthyl, and biphenyl, or 〇6 < 24 aryl substituted with OR29, wherein r29 is H, crC18 alkyl, such as methyl, and ethyl, or CO_c24 aryl, such as phenyl. 5 D is preferably -CO-; -COO-; -OCOO-; each; -so-; -sor;-NR25-; and E is preferably _〇R29; _SR29; -NR25R26 bu Co〇R28; "COOR27;_CONR25R26; or --CN; where R25; R27; R28 and R29 are each independently H; CrC18 alkyl; such as, methyl; ethyl; n-propyl; isopropyl; n-butyl; isobutyl; Second butyl; hexyl; octyl; and 2-ethyl-hexyl; C6-C24 10 aryl; such as, phenyl; naphthyl; and biphenyl. Preferably, at least one of R1, R2 and R3 is a C6-C24 aryl group or a C2-C20 heteroaryl group, which may be optionally substituted. In this regard, it includes the chemical formula Ila (wherein R4 is fluorene, and R3 and R5 are each independently a C6-C24 aryl group, or a C2-C20 heteroaryl group), or Iic (wherein, R3 is fluorene, and R4 and R5 are each other Polymers which are individually repeating units of C6-15 C24 aryl or C2-C2Q heteroaryl) relative to each other having the formula IIb (wherein R3, R4, and R5 are each C6-C24 aryl or C2-C2 hetero Aryl, in which the c6-C24a aryl or C2-C20 heteroaryl can be optionally substituted) repeating units of these polymers are preferred.
40 2004223 77 其中’ R59及r6〇彼此個別係Ci_Ci8烷基,特別係C4_Ci2烷 基,其可以一或二個藉由氧原子間斷,其中,包含化學式lib 之重複單元聚合物,其中,R3,R4,及R5彼此個別係40 2004223 77 where 'R59 and r60 are each Ci_Ci8 alkyl group, especially C4_Ci2 alkyl group, which can be interrupted by one or two oxygen atoms, among which is a repeating unit polymer containing the chemical formula lib, where R3, R4 , And R5 are independent of each other
及包含化學式(Ila)之重複單元之聚合物,其And polymers containing repeating units of formula (Ila),
及包含化學式(lie)之重複單元之聚合物,其中,R3係η,And a polymer containing a repeating unit of chemical formula (lie), wherein R3 is η,
係特別佳。 本發明之聚㈣包含0.5料%至⑽料%之量(特别 41 2004223 77 係40莫耳%至60莫耳%之量)之化學式II之重複單元,其中, 所有重複單元(單體)之總和係100莫耳%。因此,本發明之 聚合物除化學式II之重複單元外可另包含最高達99·5莫耳 %之量(特別係60莫耳%至40莫耳%之量)之化學式II共單 5 體。 適當共單體係選自下述所組成之族群Department is particularly good. The polyfluorene of the present invention comprises repeating units of chemical formula II in an amount of 0.5% to 5% (especially 41 2004 223 77 is 40 mol% to 60 mol%), wherein all of the repeating units (monomers) The sum is 100 mol%. Therefore, in addition to the repeating unit of Chemical Formula II, the polymer of the present invention may further include a total of 5 monomers of Chemical Formula II in an amount of up to 99.5 mol% (especially in an amount of 60 mol% to 40 mol%). The appropriate co-single system is selected from the group consisting of
42 2004223 7742 2004 223 77
43 2004223 7743 2004 223 77
其中, P係1至10之整數,特別係1,2或3, q係1至10之整數,特別係1,2或3, 5 s係1至10之整數,特別係1,2或3,Among them, P is an integer from 1 to 10, particularly 1,2 or 3, q is an integer from 1 to 10, especially 1,2 or 3, 5 s is an integer from 1 to 10, and particularly 1,2 or 3 ,
R72係H; CVCu芳基;以CrCls烷基或CrCi8烷氧基取代 之CfCig方基,烧基;以_〇_間斷之Ci_ci8烧基· R56, R57, R58, R59, R6G,R64 及 R65 係如上所界定,或 R59及R60 —起形成化學式=CR100R101之基,其中 10 R1GG及R1G1彼此個別係H,CrCls烷基,以E取代及/或以D 間斷之CrCls烧基,CVC24芳基,以E取代之c6-C24芳基, 或CVC2。雜芳基,或以E取代之C2-C2G雜芳基,其中,D及 E係如上所界定。R72 is H; CVCu aryl group; CfCig square group substituted with CrCls alkyl or CrCi8 alkoxy group, alkyl group; Ci_ci8 alkyl group with _〇_ interruption · R56, R57, R58, R59, R6G, R64 and R65 series As defined above, or R59 and R60 together form a group of chemical formula = CR100R101, where 10 R1GG and R1G1 are each H, CrCls alkyl groups, substituted with E and / or D interrupted CrCls alkyl groups, CVC24 aryl groups, and E-substituted c6-C24 aryl, or CVC2. Heteroaryl, or C2-C2G heteroaryl substituted with E, wherein D and E are as defined above.
較佳地,R56及R57彼此個別係H,CrC18烷基,諸如, 15 甲基,乙基,正丙基,異丙基,正丁基,異丁基,第二丁基,第三丁 基,2-曱基丁基,正戊基,異戊基,正己基,2-乙基己基,及正庚 基,以E取代及/或以D間斷之CrC18烷基,諸如,-CH2OCH3, -ch2och2ch3, -ch2och2ch2och3, 及-ch2och2ch2och2ch3, c5-c12 環烷基,諸如,環己基, 20 C6-C24芳基,諸如,苯基,萘基,及聯苯基,或以E取代之c6-c24 芳基,諸如,-C6H4OCH3, -C6H4OCH2CH3, -C6H3(OCH3)2, -c6h3(och2ch3)2,-c6h4ch3,-c6h3(ch3)2,-c6h2(ch3)3, 44 200422377 及-C6H4tBu 〇 R58較佳係H,crcls烷基,諸如,甲基,乙基,正丙基,異 丙基,正丁基,異丁基,第二丁基,第三丁基,2-甲基丁基,正戊 基,異戊基,正己基,2-乙基己基,及正庚基,或c6-C24芳基,諸 5 如,苯基,萘基,及聯苯基。 若R59及R6° —起形成化學式=CR1G°R1G1之基,則τ較 佳係如下化學式之基Preferably, R56 and R57 are each H, CrC18 alkyl, such as 15 methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, or third butyl. , 2-fluorenylbutyl, n-pentyl, isopentyl, n-hexyl, 2-ethylhexyl, and n-heptyl, CrC18 alkyl substituted with E and / or D interrupted, such as -CH2OCH3,- ch2och2ch3, -ch2och2ch2och3, and -ch2och2ch2och2ch3, c5-c12 cycloalkyl, such as cyclohexyl, 20 C6-C24 aryl, such as phenyl, naphthyl, and biphenyl, or c6-c24 aromatic substituted with E Groups, such as -C6H4OCH3, -C6H4OCH2CH3, -C6H3 (OCH3) 2, -c6h3 (och2ch3) 2, -c6h4ch3, -c6h3 (ch3) 2, -c6h2 (ch3) 3, 44 200422377 and -C6H4tBu OR58 H, crcls alkyl, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, 2-methylbutyl, n-pentyl Group, isopentyl, n-hexyl, 2-ethylhexyl, and n-heptyl, or c6-C24 aryl, such as phenyl, naphthyl, and biphenyl. If R59 and R6 ° form a base of chemical formula = CR1G ° R1G1, τ is more preferably the base of the following chemical formula
其中,R102及R103彼此個別係CrCi8烷基,CrCi8烷氧基, 10 C6_Cl0芳基,C6-Cio芳基氧,或二(C「C18烧基)胺基,其中, 芳基或芳基氧可選擇性以Cl_C8烷基取代(1^-:6- 6,512,〇83) 〇 較佳地,R59及R6。彼此個別係H,Ci_Ci8烧基,諸如,正 丁基,第二丁基,己基,辛基,及2_乙基_己基,以E取代及/或以 15 〇間斷之C1-C18烧基,諸如,-CH2(OCH2CH2)wOCH3, W=l,2, 3, 或4, C^C24芳基,諸如,苯基,萘基,及聯苯基,以E取代之 C24芳基,諸如,-C6H4〇CH3,_C6H4OCH2CH3, "c6H3(〇ch3)25 -c6h3(〇ch2ch3)2? -c6h4ch35 -c6h3(ch3)25 -C6H2(CH3)3,及-C6H4tBu,或R59及R6G —起形成4至8員之環, 2〇較佳係5或6員之環,諸如,環己基,及環戊基。 較佳地,R64及R65彼此個別係H,CrC18烧基,諸如,甲 45 2004223 77 基,乙基,正丙基,異丙基,正丁基,異丁基,及第二丁基,或c6-c24芳基,諸如,苯基,萘基,及聯苯基。 較佳實施例係有關於包含化學式lib之重複單元(特別 係化學式Ila或lie之重複單元)及共單體 y之聚合 5 物,其中, X係0.005至1之範圍,特別係0.4至0.6,且y係0.995至0 之範圍,特別係0.6至0.4,其中,X及y之總和係1,其中, X3係如下化學式之基Among them, R102 and R103 are each a CrCi8 alkyl group, a CrCi8 alkoxy group, a 10 C6_Cl0 aryl group, a C6-Cio aryloxy group, or a bis (C "C18 alkyl) amino group. Among them, the aryl group or the aryloxy group may be Selectively substituted by Cl_C8 alkyl (1 ^-: 6- 6,512, 〇83) 〇 Preferably, R59 and R6. Each of them is H, Ci_Ci8 alkyl, such as n-butyl, second butyl, hexyl, Octyl, and 2-ethyl-hexyl, substituted with E and / or C1-C18 alkyl group interrupted by 150, such as -CH2 (OCH2CH2) wOCH3, W = 1, 2, 3, or 4, C ^ C24 aryl, such as phenyl, naphthyl, and biphenyl, C24 aryl substituted with E, such as -C6H4OCH3, _C6H4OCH2CH3, " c6H3 (〇ch3) 25 -c6h3 (〇ch2ch3) 2? -c6h4ch35 -c6h3 (ch3) 25 -C6H2 (CH3) 3, and -C6H4tBu, or R59 and R6G together form a ring of 4 to 8 members, 20 is preferably a ring of 5 or 6 members, such as cyclohexyl, Preferably, R64 and R65 are each H, CrC18 alkyl, such as methyl 45 2004223 77, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, and thionyl. Dibutyl, or c6-c24 aryl, such as phenyl, naphthyl, and biphenyl. The examples relate to a polymer 5 including a repeating unit of the chemical formula lib (especially a repeating unit of the chemical formula Ila or lie) and a comonomer y, wherein X is in the range of 0.005 to 1, especially 0.4 to 0.6, and y It ranges from 0.995 to 0, especially from 0.6 to 0.4. Among them, the sum of X and y is 1. Among them, X3 is the base of the following chemical formula.
10 其中,虛線表示結合至嘧啶環之鍵, R3, R4及R5彼此個別係如下化學式之基10 Among them, the dotted line represents the bond to the pyrimidine ring, and R3, R4, and R5 are each independently a base of the following chemical formula
T係如下化學式之基T is the base of the following chemical formula
,特別 200422377, Especially 200422377
其中,s係1,或2,R56,R57及X6彼此個別係CrC18烷基,以 5 E取代及/或以D間斷之CrC18烷基,C6-C24芳基,以E取代 之C6-C24芳基,Among them, s is 1, or 2, R56, R57, and X6 are each independently CrC18 alkyl, substituted with 5 E and / or D-interrupted CrC18 alkyl, C6-C24 aryl, and C6-C24 aromatic substituted with E base,
R59及R6G彼此個別係CrC18烧基,以_〇r29取代及/或以-〇-間斷之CrC18烷基, R71 係 H, -CONR25R25 或-CN,其中, 10 D 係-〇-,或-NR25-, E 係—〇R29,-SR29,或-NR25r25,其中, R25係H,CrC18烷基,或C6_c24芳基,且 R29 係 CrC18 烷基,C6-C24 芳基。 特別佳之實施㈣有關於包含化學式仙之重複單元 47 2004223 77 消別係化學式IIa,或IIc之重複單元)及共賴_之 聚口物’其中’ 1係0.⑻5至i之範圍,特別係至 且y係0.995至〇之範圍,特別係〇 6至其中,X及 之總和係1,R59 and R6G are each CrC18 alkyl, each substituted with _〇r29 and / or with -0- interrupted CrC18 alkyl, R71 is H, -CONR25R25 or -CN, of which 10 D is -〇-, or -NR25 -, E is -OR29, -SR29, or -NR25r25, wherein R25 is H, CrC18 alkyl, or C6_c24 aryl, and R29 is CrC18 alkyl, C6-C24 aryl. A particularly good implementation is about the repeating unit containing the chemical formula 47 2004223 77 (including the repeating unit of the chemical formula IIa, or the repeating unit of the IIc) and the co-relying polymer 'wherein' 1 ranges from 0.5 to i, especially And y is in the range of 0.995 to 0, especially 0 to 6 in which X and the sum are 1,
鍵,且R71係H,烧基,<ξΝ,或_c〇〇R27,其中,係Η或 C「C18烷基,其選擇性地可以—或二個氧原子間斷,特別’:系 CrCu烷基,其可以一或二個氧原子間斷, 10 1 T係如下化學式之基 R3, R4及R5彼此個別係H,Bond, and R71 is H, alkynyl, < ξN, or _c〇〇〇27, wherein, is Η or C "C18 alkyl, which can optionally-or two oxygen atoms are interrupted, especially ': CrCu Alkyl, which may be interrupted by one or two oxygen atoms, 10 1 T is a radical of the formula R3, R4 and R5 each independently H,
其中,R59及R60彼此個別係CrCi8烷基,特別係C4_Cq烷 48 2004223 77 基,其可以一 個氧原子間斷Among them, R59 and R60 are each a CrCi8 alkyl group, especially a C4_Cq alkyl group 48 2004 223 77 group, which can be interrupted by an oxygen atom.
或or
係較佳;及包含如下化學式之重複單元之聚 一 X3-Is preferred; and a polymerization unit comprising a repeating unit of the following chemical formula X3-
(lib), 5 其中,R3, R4,及R5彼此個別係(lib), 5 of which R3, R4, and R5 are independent of each other
或 及包含如下化學式之重複單元之聚合物Or and polymers containing repeating units of the formula
(Ila),其中,R4係Η,且R3及R5彼 49 422377(Ila), wherein R4 is Η, and R3 and R5 are each 49 422377
及包含如下化學式之重複單元之聚合物And polymers containing repeating units of the following formula
表示結合至嘧啶環之鍵,且r”係H,烷基,_CeN, 或-COOR27,其中,R27係η;或Ci_Ci8烷基;其可選擇性地以 10 一或二個氧原子間斷,特別係C4-C12烷基,其可以一或二個 氧原子間斷,且 T係如下化學式之基 50 2004223 77Represents a bond to a pyrimidine ring, and r "is H, alkyl, _CeN, or -COOR27, wherein R27 is η; or Ci_Ci8 alkyl; it may be optionally interrupted by 10 one or two oxygen atoms, particularly Is a C4-C12 alkyl group, which may be interrupted by one or two oxygen atoms, and T is a group of the formula 50 2004223 77
其中,R59及R0G彼此個別係CrC18烷基,特別係C4-C12烷基, 其可以一或二個氧原子間斷,Among them, R59 and ROG are each CrC18 alkyl group, especially C4-C12 alkyl group, which can be interrupted by one or two oxygen atoms.
係特別佳。 5 “聚合物”一辭依據本發明包含具有<3,000道爾頓之重 量平均分子量之寡聚物,及具有3,000道爾頓或更大之重 量平均分子量之聚合物。 本發明之聚合物較佳係具有50,000道爾頓或更大之重 量平均分子量,更佳係100,000道爾頓或更大,且最佳係 10 150,000道爾頓或更大;較佳係1,000,000道爾頓或更少,更Department is particularly good. 5 The term "polymer" according to the present invention includes oligomers having a weight average molecular weight of < 3,000 Daltons, and polymers having a weight average molecular weight of 3,000 Daltons or more. The polymer of the present invention preferably has a weight average molecular weight of 50,000 Daltons or more, more preferably 100,000 Daltons or more, and most preferably 10 150,000 Daltons or more; more preferably 1, 000,000 Daltons or less, more
佳係500,000道爾頓或更少,且較佳係250,000道爾頓或 更少。分子量係依據凝膠滲透色譜術且使用聚苯乙烯標準 物而決定。 本發明之進一步實施例係以如下化學式之單體表示 15The preferred range is 500,000 Daltons or less, and the preferred range is 250,000 Daltons or less. The molecular weight is determined by gel permeation chromatography using polystyrene standards. Further embodiments of the present invention are represented by monomers of the following chemical formula 15
(III),特別係 51 2004223 77(III), special department 51 2004 223 77
(mb);及/或(mb); and / or
(IV),特別係(IV), special department
X11X11
(IVb),或 (IVc);其中, R1,R2, R3, R4及R5彼此個別係有機取代基,特別係c〆如 芳基或Ο:2·。雜芳基,其可選擇性地被取代, X1,X2,及X3彼此個別係二價鍵結基且 X11於每一情況個別係_素原子,或氺(0Η)2, _Β(〇γ1)2或 - Β〔〇>2 crc1Q烷基,且Y2於 -CY3Y4-CY5Y6-,或— 〇 ,其中,γ1於每一情況個別係 每一情況個別係crc1G伸烷基,諸如, 52 10 200422377 cW-CYf - CYuY12、其中,γ3, γ4, γ5, γ6, γ7, γ8, γ9, υ10, r及υ12彼此個別係氫或CrCi。烧基,特別 係-c(ch3)2c(ch3)2、或 _C(CH3)2CH2C(CH3)2,其係製造化 學式I及II之聚合物之起始材料,但附帶條件係2_苯基_4,6_ 5 雙(對-漠苯基)«(A· L· Vais 等人,Izv Slb otd Akad Nauk· SSSR,第 6 冊 1975, 144]46)及 2,4,6 三(對漠苯基) %^(M.Bajic等人·,分子(罐咖㈣’第6冊,編號5,2刪, 477_480)被排除。 做起始化合物係已知,或可依據已知程序或其相似 !〇者製造。本發明之対化合物係,例如,己知經基苯㈣ 咬化合物之衍生物:US_A_3,442,898, US_A_5,597,854及仍-入-5,753,729,此等之相關部份在此被併入以供參考之用。 本發明之t定化合物可,例如,依據下列程序或其相似者 製得: 15(IVb), or (IVc); wherein R1, R2, R3, R4, and R5 are each an organic substituent, especially c〆 such as aryl or 0: 2 ·. Heteroaryl, which can be optionally substituted, X1, X2, and X3 are each a divalent bonding group and X11 is a _ prime atom in each case, or 氺 (0Η) 2, _Β (〇γ1) 2 or-Β [〇 > 2 crc1Q alkyl, and Y2 is -CY3Y4-CY5Y6-, or-〇, where γ1 in each case is individually in each case individually crc1G alkyl, such as, 52 10 200422377 cW-CYf-CYuY12, among which γ3, γ4, γ5, γ6, γ7, γ8, γ9, υ10, r and υ12 are each hydrogen or CrCi. Burning group, especially -c (ch3) 2c (ch3) 2, or _C (CH3) 2CH2C (CH3) 2, which is the starting material for the manufacture of polymers of chemical formulas I and II, but with the condition of 2_benzene Base_4,6_ 5 bis (p-mophenyl) «(A.L. Vais et al., Izv Slot otd Akad Nauk · SSSR, Vol. 6, 1975, 144] 46) and 2,4,6 three (pair Mophenyl)% ^ (M. Bajic et al., Molecules (Kancai's Book 6, No. 5, 2 deleted, 477_480) are excluded. The starting compounds are known, or can be based on known procedures or It is made by similar persons. The hydrazone compound of the present invention is, for example, a derivative of a known benzophenone compound: US_A_3,442,898, US_A_5,597,854 and still-in-5,753,729, the relevant parts of which are here It is incorporated by reference. The specific compounds of the present invention can be prepared, for example, according to the following procedures or the like: 15
x2-x11x2-x11
,其中’ R1,R2, X1及χ2係如上所界定’且”係齒素原 子0 >醯胺氯化氫被添加至於crc4醇(如,甲醇,乙醇,丙醇或 丁醇)内之2-丙稀小酮。驗(例如,驗金屬之氮氧化物或炫 2〇氧化物,諸如,甲氧化鈉或氫氧化鉀)被添加,且溶液於細 如乾燥工氣)存在中授拌(見,例如,歐洲專利申請案第 034〇5〇47.6號案之實施例8)。 53 2004223 77 化學式(ιν)之含硼化合物可藉由任何適合方法製造。 用以製造含硼化合物之反應條件之一例子係描述於 Remmers等人之巨分子快速連通(Macromolecular Rapid Communications),第 17 冊,239-253 (1996)。化學式(IV) 5 之化合物(其係以氯或溴二取代)係藉由與二當量之丁基鋰 反應轉化成相對應之二鋰衍生物。二鋰衍生物與三烷基硼 酸鹽反應及其後之水解反應產生二硼酸衍生物。二硼酸衍 生物與伸烷基二醇(諸如,乙二醇)之酯化反應產生二(環) 硼酸鹽衍生物。 10 鹵素係氣,氯,>臭及破。 crc18烷基係支化或未支化之基,諸如,甲基,乙基,丙 基,異丙基,正丁基,第二丁基,異丁基,第三丁基,2-乙基丁基, 正戊基,異戊基,1-甲基戊基,1,3-二甲基丁基,正己基,1-甲基 己基,正庚基,異庚基,1,1,3,3-四甲基丁基,1-甲基庚基,3-甲基 15 庚基,正辛基,2_乙基己基,1,1,3-三甲基己基,1,1,3,3-四甲基 戊基,壬基,癸基,十一烷基,1-甲基十一烷基,十二烷 基,1,1,3,3,5,5-六甲基己基,十三烷基,十四烷基,十五烷基,十 六烧基,十七烧基,或十八烧基。 <^-(:18烷氧基係直鏈或支化之烷氧基,例如,甲氧基、 20 乙氧基、正丙氧基、異丙氧基、正丁氧基、第二丁氧基、 第三丁氧基、戊氧基、異戊氧基或第三戊氧基、庚氧基、 辛氧基、異辛氧基、壬氧基、癸氧基、十一烷氧基、十二 烷氧基、十四烷氧基、十五烷氧基、十六烷氧基、十七烷 氧基及十八烷氧基。 54 2004223 77 C2-Cls烯基係直鏈或支化之烯基,諸如, 丙基、甲稀丙基、異丙烯基、2-丁烯基、3 稀基、正戊-2,4-一沐基、3-甲基·丁-2-烯基、 正十二-2-烯基、異十二烯基、正十二_2 烯基。 乙烯基、烯 丁烯基、異丁 正辛-2-烯基、 烯基或正-十 八-4- 10 15 c2.24炔基係支鏈蚊化,錄佳係C28炔基,立可為 未被取代或被取代,諸如,乙炔基、Mum# 4-基、1·戊炔_5·基、2·甲基_3_丁快_2_基、戊二快_3_基、 U-戊二块·5_基、i-己炔各基、順_3_甲基戊烯冬快-[ 基、反式-3-甲基-2-戊烯冬炔小基、u·己二块_5_基、i 辛炔各基、i-壬炔_9_基、l癸快·1〇_基或i二十四快a 基。 C4-C18環烧基較佳係C5_Cl2環燒基,諸如,環戊基、環 己基、環庚基、環辛基、環壬基、環癸基、環十二烷基。 環己基及壞戍基係最佳。Where 'R1, R2, X1, and χ2 are as defined above' and "systems of the halogen atom 0 > ammonium hydrogen chloride are added to the 2-propanol in crc4 alcohols (e.g., methanol, ethanol, propanol or butanol) Dilute ketones. Tests (for example, test metal nitrogen oxides or oxo 20 oxides, such as sodium methoxide or potassium hydroxide) are added and the solution is mixed in the presence of as fine as dry working gas (see, For example, Example 8) of European Patent Application No. 03405044.07.6. 53 2004223 77 The boron-containing compound of the chemical formula (ιν) can be produced by any suitable method. One of the reaction conditions for producing a boron-containing compound Examples are described in Macromolecular Rapid Communications by Remmers et al., Volume 17, 239-253 (1996). Compounds of formula (IV) 5 (which are substituted with chlorine or bromine di) are prepared by Two equivalents of butyllithium are converted into the corresponding dilithium derivative. The dilithium derivative reacts with the trialkylborate and the subsequent hydrolysis reaction to produce the diboronic acid derivative. The diboronic acid derivative and the alkylene glycol (Such as ethylene glycol) Bis (cyclic) borate derivatives. 10 Halogen-based gas, chlorine, & odor and crack. Crc18 alkyl-based branched or unbranched groups such as methyl, ethyl, propyl, isopropyl, N-butyl, second butyl, isobutyl, third butyl, 2-ethylbutyl, n-pentyl, isopentyl, 1-methylpentyl, 1,3-dimethylbutyl, N-hexyl, 1-methylhexyl, n-heptyl, isoheptyl, 1,1,3,3-tetramethylbutyl, 1-methylheptyl, 3-methyl 15 heptyl, n-octyl, 2-ethylhexyl, 1,1,3-trimethylhexyl, 1,1,3,3-tetramethylpentyl, nonyl, decyl, undecyl, 1-methylundecyl , Dodecyl, 1,1,3,3,5,5-hexamethylhexyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, heptyl, or ten Octyl. ≪ ^-(: 18 alkoxy is a linear or branched alkoxy group, for example, methoxy, 20 ethoxy, n-propoxy, isopropoxy, n-butoxy , Second butoxy, third butoxy, pentoxy, isopentyloxy or third pentoxy, heptyloxy, octyloxy, isooctyloxy, nonyloxy, decoxy, ten One Oxy, dodecyloxy, tetradecyloxy, pentadecyloxy, hexadecyloxy, heptadecyloxy, and octadecyloxy. 54 2004223 77 C2-Cls alkenyl straight chain Or branched alkenyl, such as propyl, methylpropenyl, isopropenyl, 2-butenyl, 3-oxenyl, n-pent-2,4-monomethyl, 3-methylbut-2 -Alkenyl, n-dodec-2-enyl, isododecenyl, n-dodecenyl. Vinyl, allenyl, isobut-n-oct-2-enyl, alkenyl or n- Eighteen-4- 10 15 c2.24 alkynyl branched chain mosquitoization, Lujia is C28 alkynyl, can be unsubstituted or substituted, such as, ethynyl, Mum # 4-yl, 1.pentyne _5 · group, 2 · methyl_3_buta_2_yl group, glutarate_3_ group, U-pentadi · 5 group, i-hexyne groups, cis_3_methyl group Pentenyl- [group, trans-3-methyl-2-pentenyl small group, u · hexamethylene_5_ group, i octyne groups, i-nonyne_9_ group, l decyl fast · 10-based or i twenty-four fast a-based. The C4-C18 cycloalkyl group is preferably a C5-C12 cycloalkyl group, such as cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclononyl, cyclodecyl, and cyclododecyl. Cyclohexyl and bad fluorenyl are the best.
20 cvc^烯基係’例如,乙烯基、烯丙基、丁烯基、戊 稀基、己稀基、庚稀基或辛稀基。 芳基一般係C6-C3Q芳基,較佳将ρ ρ» Μ3〇π 土早乂住你、-C24芳基,其可選擇 性地被取代,諸如,苯基、4-甲基苯基、4_曱氧基苯基、 苯基、聯苯基、2-芴基、菲某、苜Α 不 非丞恩基、四醯(tetmcyl)、五 醯(pentacyl)、六醯(hexacyl)、聯三苯基或聯四苯基。 烧基較佳係C7-C15芳烧基,其可被取代,諸如,20 cvc ^ alkenyl ', for example, vinyl, allyl, butenyl, pentyl, hexyl, heptyl or octyl. The aryl group is generally a C6-C3Q aryl group, preferably ρ ρ »M3〇π soil will soon hold you, -C24 aryl group, which can be optionally substituted, such as phenyl, 4-methylphenyl, 4-methoxyphenyl, phenyl, biphenyl, 2-fluorenyl, phenanthrene, alfalfa A is not fluorenyl, tetmcyl, pentacyl, hexacyl, biphenyl Triphenyl or bitetraphenyl. The alkyl group is preferably a C7-C15 aromatic alkyl group, which may be substituted, such as,
苯甲基、2-苯甲基-2-丙基、冷-苯乙基、α,α-二甲基苯甲 基、苯基-丁基、ω-苯基-辛基、苯基-十二烷基或3- 55 2004223 77 甲基-5-(1’,1’,3’,3’-四甲基-丁基)-苯甲基。 C2-C26雜芳基係具有五至七個環原子之環或縮合環系 統,其間氮、氧或硫係可能之雜原子,且典型上係具有至 少六個共軛7Γ-電子之具有5至30個原子之不飽和雜環基, 5 諸如,噻嗯基、苯并[b]噻嗯基、二苯并[b,d]噻嗯基、噻蒽 基、吹喃基、糖基、2H-扯喃基、苯并咬喃基、異苯并吹 喃基、二苯并吱喃基、苯氧基13塞嗯基、α比洛基、咪ϋ坐基、 。比。坐基、。比°定基、二定基、三嘻基、定基、扯嘻基、 ΰ比洛嗔基、12引嘴σ秦、異,嘴基、,深基、11引唾基、嘌呤基、 10 17奎嘻基、喊11若基、異σ戚ϋ若基、酜嘻基、萘17定基、嘁σ若嗤琳 基、诫唾琳基、峨0若琳基、蝶11定基、叶σ坐基、叶琳基、苯 并三唑基、苯并噁唑基、菲啶基、丫啶基、白啶基、菲繞 啉基、苯嗪基、異噻唑基、吩噻嗪基、異噁唑基、呋白基 或苯唑嗪基,其可為未被取代或被取代。 15 個別藉由R6與R7及R56與R57形成之五或六員之環的例 子係具有3至5個碳原子之雜環烷或雜環烯,其可具有一額 外之選自氮、氧及硫之雜原子,例如,Benzyl, 2-benzyl-2-propyl, cold-phenethyl, α, α-dimethylbenzyl, phenyl-butyl, ω-phenyl-octyl, phenyl-deca Dialkyl or 3- 55 2004 223 77 methyl-5- (1 ', 1', 3 ', 3'-tetramethyl-butyl) -benzyl. A C2-C26 heteroaryl system has a ring or condensed ring system of five to seven ring atoms with nitrogen, oxygen, or sulfur systems as possible heteroatoms, and typically has at least six conjugated 7Γ-electrons with 5 to 30-atom unsaturated heterocyclic group, 5 such as thienyl, benzo [b] thienyl, dibenzo [b, d] thienyl, thienyl, pyranyl, glycosyl, 2H -Ranyl, benzopyranyl, isobenzopyranyl, dibenzocrotyl, phenoxy 13 ceryl, α-biroyl, imidino, and. ratio. Sitting on the base. Than ° fixed base, second fixed base, triple base, fixed base, base base, ΰBiluo base, 12 lead mouth σ Qin, different, mouth base, deep base, 11 lead sialyl, purine base, 10 17 Kuihe Base, shout 11 rueki, isoσ ϋ ϋ rueki, 酜 基 基 基, naphthalene 17 基 基, 嗤 σ 嗤 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 [ , Benzotriazolyl, benzoxazolyl, phenanthridyl, acridineyl, white pyridyl, phenanthroline, phenazinyl, isothiazolyl, phenothiazyl, isoxazolyl, furoxyl, or Oxazosinyl, which may be unsubstituted or substituted. 15 Individual examples of five- or six-membered rings formed by R6 and R7 and R56 and R57 are heterocycloalkanes or heterocycloolefins having 3 to 5 carbon atoms, which may have an additional selected from nitrogen, oxygen and Heteroatoms of sulfur, for example,
56 上述基之可能取代基係(^_(:8烷基,羥基,硫醇基,Cr 8院氧基,基硫基,鹵素,鹵基炫》基,氣基, 駿基,酮基,鲮基,酯基,氨基甲醯基,胺基,硝基或矽烷 基。 “鹵烷基”一辭係意指以鹵素部份或全部取代上述烷基 所賦與之基,諸如,三氟甲基等。”酸基、酮基、酯基、 氨基甲醯基及胺基,,包含以烷基、環烷基、芳基、芳烷基 或雜環基取代者,其中,烷基、環烷基、芳基、芳烷基及 雜環基可為未被取代或被取代。,,矽烷基,,一辭係意指化學 式-SiRl05R106R107之基,其中,R105、R106及R107彼此個別係 燒基,特別係Ci_C4烧基,c6_C24芳基,或C7_Ci2芳烷 基’諸如,三甲基石夕烧基。 若取代基(諸如,R6, R7, R56及R57)於化學式中發生多 於一次,其於每一情況可為不同。 如上所述,前述之基可以E取代及/或(若要的話)以D 間斷。當然,間斷僅於含有至少2個藉由單一鍵彼此連接 之碳原子之基之情況時才可能;Q-Cu芳基未被間斷;被 間斷之芳基烷基或烷基芳基於烷基部份含有單元D。以一 或更多之E取代及/或以一或更多之D間斷之CrCi8烷基 係’例如,(CH2CH2〇)n-Rx,其中,η係1_9範圍之數值, 且R係Η或CrCw烧基或C2-C1()烧酿基(例如,c〇_ CH(C2H5)C4H9),CH2-CH(0Ry,)-CH2_0-Ry,其中,Ry 係 Ci_ Ci8燒基,C5-C12i哀烧基,苯基,C7-C15苯基燒基,且Ry,包 含與Ry相同之意義或係H; 20042237756 Possible substituents of the above groups (^ _ (: 8 alkyl, hydroxy, thiol, Cr 8 alkyl, thio, halo, halo), radical, carbyl, keto, Fluorenyl, ester, carbamoyl, amine, nitro or silyl. The term "haloalkyl" means a group that is partially or fully substituted with a halogen such as trifluoro, such as trifluoro Methyl, etc. "" Acid, keto, ester, carbamoyl, and amine groups include those substituted with alkyl, cycloalkyl, aryl, aralkyl, or heterocyclic groups, of which alkyl, Cycloalkyl, aryl, aralkyl, and heterocyclic groups may be unsubstituted or substituted. The term, silyl, means a group of the formula -SiRl05R106R107, wherein R105, R106, and R107 are each independently An alkyl group, especially a Ci_C4 alkyl group, a c6_C24 aryl group, or a C7_Ci2 aralkyl group such as a trimethyllithium group. If a substituent (such as R6, R7, R56, and R57) occurs more than once in the chemical formula, it It may be different in each case. As mentioned above, the aforementioned radicals may be replaced by E and / or (if desired) interrupted by D. Of course, the interruption This is only possible when there are at least 2 carbon atom radicals connected to each other by a single bond; the Q-Cu aryl group is not interrupted; the interrupted arylalkyl or alkylaryl contains unit D based on the alkyl moiety. CrCi8 alkyl systems with one or more E substituted and / or one or more D discontinuities, for example, (CH2CH2〇) n-Rx, where η is a value in the range of 1-9, and R is Η or CrCw Base or C2-C1 () roasting group (for example, co-CH (C2H5) C4H9), CH2-CH (0Ry,)-CH2_0-Ry, wherein Ry is Ci_Ci8 alkyl, C5-C12i alkyl , Phenyl, C7-C15 phenyl alkyl, and Ry, containing the same meaning as Ry or H; 200422377
CrC8 伸烷基-COO-RZ,例如,ch2coorz,ch(ch3)coorz, C(CH3)2COORz,其中,Rz 係 H,CVC18 烷基, 9-Rx,且Rx包含如上戶斤指之定義; ch2ch2-o-co-ch=ch2; ch2ch(oh)ch2-o-co- 5 C(CH3)=CH2。 含有化學式(I)及(π)之基之聚合物可藉由任何適當方 法製得,但較佳係藉由如下所述方法製造。芳香族硼酸鹽 及溴化物之縮合反應(一般稱為” Suzuki反應”)係容忍各種 0 有機官能基存在,且係由N. Miyaua及A. Suzuki於Chemical 10 Reviews,第95冊,457-2483頁(1995)中所報導。此反應可 被應用製造高分子量之聚合物及共聚物。 為製造相對應於化學式I或II之聚合物,相對應於化學 式III或IV之二溴化物或其混合物與當量之相對應於化學式 III或IV之二硼酸或二硼酸鹽或其混合物,較佳係如下之共 15 單體,於Pd及三苯基膦之催化作用下反應 χ14Άχ11 # j 其中X11於每一情況個別係_素原子,或-Β(ΟΗ)2, ^(ΟΥ%或 -BC°>2 0 ,其中,Y1於每一情況個別係cvc10烷基,且Y2於每一 情況個別係C2-C1G伸烷基,諸如,—CY3Y4-CY5Y6·,或— 20 CY7Y8-CY9Y10- CYUY12-,其中,Υ3, Υ4, Υ5, γ6, γ7, Υ8, γ9, γιο Υ11及Υ12彼此個別係氫,或crc1G烷基,特別係-C(CH3)2C(CH3)2_, 或-C(CH3)2CH2C(CH3)2-。反應典型上係於約70 °c至120 °C且 58 200422377 於芳香族烴溶劑(諸如,曱苯)中進行。諸如二甲基甲酿胺及四 氫呋喃之其它溶劑亦可被單獨或與芳香族烴混合地使用。水性 鹼(較佳係妷酸鈉或碳酸氫鈉)可被作為HBr清除劑。依反應物 之反應性而定,聚合反應可費時2至1〇〇小時。有機鹼(諸如, 5四烧基叙鼠乳化物)及相轉移催化劑(諸如,ΤΒΑΒ)可促進棚之 活性(見,例如,Leadbeater & Marco; Angew· Chem. Int. Ed” 2003, 42, 1407及其間所引述之參考文獻)。其它變化之反應條件係顯 示於Τ· I· Wallow及Β· M. Novak之有機化學期刊,第59冊,第 5034-5037 頁(1994);及M· Remmers,M. Schulze,及G. Wegner之 10 巨分子快速連通(Macromolecular Rapid Communications),第 17 冊,第239-252頁(1996)。 交替式共聚物係於相對應於化學式(III)或(IV)之二溴 χ11-(-τ+χ11 化物與相對應於化學式 y 之二硼酸鹽反應時形 成, -bc°v 15 其中,X11於每一情況個別係-Β(ΟΗ)2, -Βργ%* 0 , 其中,Υ1於每一情況個別係CrC1G烷基,且Υ2於每一情況 個別係CVG。伸烷基,諸如,-CY3Y4-CY5Y6-,或-CY7Y8_CY9Y10- CYUY12-,其中,Y3, Y4, Y5, Y6, Y7, Y8, Y9, Y10,Y11及Y12彼此個別係氫,或Ci-C1G烧基,特別 20 係-C(CH3)2C(CH3)2-,或 _C(CH3)2CH2C(CH3)2-。若要的話, 單官能性之芳基鹵化物或芳基棚酸鹽可被作為此等反應中 之鏈終止劑,其會造成端芳基之形成。 59 僅涉及二_基管能性反應物之聚合反應方法可使用鎳 偶合反應實行。一種此偶合反應係描述於Colon等人之聚 合物科學期刊(Journal of Polymer Science),A部份,聚合物 化學編輯(Polymer Chemistry Edition),第 28 冊,第 367 頁 (1990),及Colon等人之有機化學期刊(Journal of OrganicCrC8 alkylene-COO-RZ, for example, ch2coorz, ch (ch3) coorz, C (CH3) 2COORz, where Rz is H, CVC18 alkyl, 9-Rx, and Rx includes the definitions of the above households; ch2ch2 -o-co-ch = ch2; ch2ch (oh) ch2-o-co- 5 C (CH3) = CH2. The polymer containing the bases of the formulae (I) and (π) may be produced by any appropriate method, but is preferably produced by a method described below. The condensation reaction of aromatic borate and bromide (commonly referred to as the "Suzuki reaction") is tolerant of the existence of various organic functional groups, and is composed of N. Miyaua and A. Suzuki in Chemical 10 Reviews, Volume 95, 457-2483 (1995). This reaction can be applied to make high molecular weight polymers and copolymers. In order to manufacture a polymer corresponding to Chemical Formula I or II, a dibromide corresponding to Chemical Formula III or IV or a mixture thereof and an equivalent weight corresponding to a diboronic acid or a diborate or a mixture thereof corresponding to Chemical Formula III or IV, preferably It is a total of 15 monomers, which react under the catalysis of Pd and triphenylphosphine χ14χχ11 # j where X11 is a _ prime atom in each case, or -B (〇Η) 2, ^ (ΟΥ% or -BC ° > 2 where Y1 is a cvc10 alkyl group in each case and Y2 is a C2-C1G alkylene group in each case, such as —CY3Y4-CY5Y6 ·, or — 20 CY7Y8-CY9Y10- CYUY12 -, In which Υ3, Υ4, Υ5, γ6, γ7, Υ8, γ9, γιο Υ11 and Υ12 are each independently hydrogen, or crc1G alkyl, especially -C (CH3) 2C (CH3) 2_, or -C (CH3 ) 2CH2C (CH3) 2-. The reaction is typically carried out at about 70 ° C to 120 ° C and 58 200422377 in an aromatic hydrocarbon solvent (such as toluene). Other solvents such as dimethylformamide and tetrahydrofuran It can also be used alone or mixed with aromatic hydrocarbons. Aqueous bases (preferably sodium rhenium or sodium bicarbonate) can be used as HBr scavengers. Depending on the reactant Depending on the reactivity, the polymerization reaction can take 2 to 100 hours. Organic bases (such as 5 tetrakisyl-based rat emulsions) and phase transfer catalysts (such as TBAA) can promote the activity of the shed (see, for example, Leadbeater &Marco; Angew · Chem. Int. Ed "2003, 42, 1407 and references cited therein). Other changing reaction conditions are shown in the journals of organic chemistry of T. I. Wallow and B. M. Novak, Volume 59, pages 5034-5037 (1994); and M. Remmers, M. Schulze, and G. Wegner, 10 Macromolecular Rapid Communications, Volume 17, pages 239-252 (1996) The alternating copolymer is formed when the dibromo χ11-(-τ + χ11 compound corresponding to chemical formula (III) or (IV) is reacted with the diborate corresponding to chemical formula y, -bc ° v 15 where, X11 is individually -B (ΟΗ) 2, -Βργ% * 0 in each case, where Υ1 is individually a CrC1G alkyl group in each case, and 112 is a CVG individually in each case. Alkyl groups such as- CY3Y4-CY5Y6-, or -CY7Y8_CY9Y10- CYUY12-, where Y3, Y4, Y5, Y6, Y7, Y8, Y9, Y10, Y11 and Y12 are each independently hydrogen, or Ci-C1G alkyl, particularly 20-C (CH3) 2C (CH3) 2-, or _C (CH3) 2CH2C (CH3) 2-. If desired, monofunctional aryl halides or aryl chelates can be used as chain terminators in these reactions, which can cause the formation of terminal aryl groups. 59 Polymerization methods involving only dibasic tube-like reactants can be performed using nickel coupling reactions. One such coupling reaction is described in Colon et al.'S Journal of Polymer Science, Part A, Polymer Chemistry Edition, Vol. 28, p. 367 (1990), and Colon et al. Journal of Organic Chemistry
Chemistry),第51冊,第2627頁(1980) 〇反應典型上係於極 性非質子溶劑(例如,二甲基乙醯胺)中且具有催化量之鎳 鹽、大量之三苯基膦及極度過量之辞粉塵而進行。此方法 之變種係由Ioyda等人於日本化學協會公報,第63冊,第80 頁(1990)中描述,其中,有機可溶性碘化物被作為加速劑。 另一鎳偶合反應係由Yamamoto於聚合物科學發展,第π 冊,第1153頁(1992)中揭示,其中,二鹵基芳香族化合物 之混合物係以於惰性溶劑内之過量鎳(1,5•環辛二烯)錯合 物處理。當應用於二或更多之芳香族二鹵化物之反應物混 合物時,所有含鎳之反應產生基本上無規之共聚物。此等 聚合反應可藉由添加小量水至聚合反應混合物而終止,其 係以氫基替代終端之_基。另外,單官能性之芳基函化物 被作為此等反應之鏈終止劑,其會造成終端芳基形成。 於實施例,本發明之聚合物含有非如上所述嘧咬基 之共軛基。”共軛基”係指含有雙鍵、三鍵及/或芳香環之部 份。此等基之例子係上叙共單體。使料基併於聚合物 内可用以改良聚合物之吸紐、離子化電勢及/或電子性 質。此等聚合物可制如上所述之方法併納至少―不同於 如上所述錢化合物之共輛化合物而製造。此等共辆化合 2004223 77 物(其後稱為,,共單體,,)具有能使其與嘧啶化合物共聚合之 官能基。例如,二_基官能性共單體較佳係於鎳偶合聚合 反應與二齒基官能性嘧啶化合物共軛而使用;二!I基官能 性共單體較佳係與嘧啶-二硼酸或嘧啶_二硼酸鹽共軛使 5用,且載荷二硼酸或二硼酸鹽之共軛共單體較佳係與二鹵 基嘴咬共軛使用。為了製造本發明之聚合物,多於一種二 硼酸/二硼酸鹽及多於一種二溴化物可用於Suzuki聚合反 應,只要二硼酸/二硼酸鹽之總莫耳量基本上等於二溴化 物之總量。 10 鎳偶合聚合反應產生包含含嘧啶基之單元及自其它共 單體衍生之單元之基本上無規之共聚物,而Suzuki聚合反 應產生交替式共聚物。 可藉由控制Suzuki反應之單體供料之順序及組成而控 制形成共聚物内之單體單元之序列。例如,主要包含連接 15至短的交替式嘧啶共單體寡聚物嵌段之大的嘧啶同聚物嵌 段之高分子量共聚物可藉由先以適當比例併納於反應之反 應物内製得交替式嘧啶共單體寡聚物及其後併入剩餘之嘲 咬單體而製得,具有棚酸基及漠基之整平衡。 一般,本發明之聚合物包含終端部份&,其中,El係 2〇氫或芳基部份,其可選擇性地以能進行鏈延長或交聯之反 應性基取代,或三(cvcy烷基矽氧基。於此使用時,能 進行鏈延長或交聯之反應性基係指能與另一相同基或另一 基反應以形成製造寡聚物或聚合物之連結之任何基。較佳 地,此反應性基係融合至Ει之芳香族壤之經基、縮水甘油 61 2004223 77 驗、丙烯酸s旨、甲基丙烯酸自旨、乙烯基、乙炔基、馬來醯 亞胺、耐醯亞胺(nadimide)、三氟乙烯基醚部份或環丁烯 部份。Chemistry), Book 51, Page 2627 (1980). The reaction is typically in a polar aprotic solvent (eg, dimethylacetamide) with a catalytic amount of nickel salt, a large amount of triphenylphosphine, and extremes. Excessive dust is carried out. A variant of this method is described by Ioyda et al. In the Bulletin of the Japanese Chemical Society, Vol. 63, p. 80 (1990), in which organic soluble iodide is used as an accelerator. Another nickel coupling reaction is disclosed by Yamamoto in Polymer Science Development, Book π, Page 1153 (1992), where the mixture of dihalo aromatic compounds is an excess of nickel (1, 5 in an inert solvent) • Cyclooctadiene) complex treatment. When applied to a reactant mixture of two or more aromatic dihalides, all nickel-containing reactions produce a substantially random copolymer. These polymerization reactions can be terminated by adding a small amount of water to the polymerization reaction mixture, which replaces the terminal group with a hydrogen group. In addition, monofunctional aryl functional compounds are used as chain terminators for these reactions, which can cause the formation of terminal aryl groups. In the examples, the polymers of the present invention contain conjugated groups other than the pyrimidinyl groups described above. "Conjugating group" means a moiety containing a double bond, a triple bond and / or an aromatic ring. Examples of such groups are the above-mentioned co-monomers. Incorporation of the base into the polymer can be used to improve the absorption, ionization potential, and / or electronic properties of the polymer. These polymers can be made by the methods described above and include at least ―common compounds different from the compounds described above. These compounds (hereinafter referred to as, comonomers, etc.) have a functional group capable of copolymerizing them with a pyrimidine compound. For example, a di-functional co-monomer is preferably used in the coupling reaction of nickel coupling with a bidentate-functional pyrimidine compound; a di-I-functional co-monomer is preferably used with a pyrimidine-diboronic acid or a pyrimidine _ Diborate conjugate is used for 5 purposes, and the conjugated comonomer loaded with diboric acid or diborate is preferably used in conjunction with a dihalo mouth conjugate. In order to make the polymer of the present invention, more than one diboric acid / diborate and more than one dibromide can be used in the Suzuki polymerization reaction, so long as the total mole of diboric acid / diborate is substantially equal to the total dibromide the amount. 10 Nickel coupling polymerization produces a substantially random copolymer containing units containing pyrimidinyl groups and units derived from other comonomers, while Suzuki polymerization produces alternating copolymers. The sequence of the monomer units forming the copolymer can be controlled by controlling the order and composition of the monomer feed of the Suzuki reaction. For example, high molecular weight copolymers that mainly contain large pyrimidine homopolymer blocks connecting 15 to short alternating pyrimidine comonomer oligomer blocks can be prepared by first incorporating the reactants in the appropriate proportions in the reaction Alternate pyrimidine comonomer oligomers are obtained and then incorporated into the remaining mock monomers, which have a complete balance of shed acid groups and desert groups. Generally, the polymer of the present invention includes a terminal moiety & wherein El is a 20 hydrogen or aryl moiety, which can be optionally substituted with a reactive group capable of chain extension or cross-linking, or tri (cvcy) Alkylsiloxy. When used herein, a reactive group capable of chain extension or cross-linking refers to any group that can react with another identical group or another group to form a link for the manufacture of an oligomer or polymer. Preferably, the reactive group is fused to the aromatic soil of Eila, glycidol 61 2004223 77 test, acrylic acid purpose, methacrylic acid purpose, vinyl, ethynyl, maleimide, resistant Nadimide, trifluorovinyl ether moiety or cyclobutene moiety.
本發明之聚合物(其中,E1係如上所界定之反應性基) 5 能於100°C或更多(更佳係15(TC或更多)時交聯形成耐溶劑 之耐熱性薄膜。較佳地,此等交聯反應係於3 5 0 °C或更少(更 佳係300°C或更少,且最佳係250°C或更少)時發生。本發 明之可交聯聚合物於l〇〇°C或更多且較佳係150°C或更多時 係安定。”安定”於此使用時係指此等聚合物於所述溫度或 10 更低時不進行交聯作用或聚合反應。若可交聯材料係所欲 時,E1較佳係乙烯基苯基、乙炔基苯基,或4-(或3-)苯并 環丁浠基。於另一實施例’ E係選自化學式-C6H4-〇-Y之盼 醛衍生物之基,其中,Y係The polymer of the present invention (wherein E1 is a reactive group as defined above) 5 can be crosslinked to form a solvent-resistant heat-resistant film at 100 ° C or more (more preferably 15 (TC or more)). Preferably, these cross-linking reactions occur at 350 ° C or less (more preferably 300 ° C or less, and most preferably 250 ° C or less). The crosslinkable polymerization of the present invention It is stable at 100 ° C or more and preferably at 150 ° C or more. "Stable" when used herein means that these polymers are not crosslinked at the stated temperature or below 10 Action or polymerization reaction. If the crosslinkable material is desired, E1 is preferably vinylphenyl, ethynylphenyl, or 4- (or 3-) benzocyclobutylfluorenyl. In another embodiment ' E is selected from the group of the aldehyde derivative of the chemical formula -C6H4-O-Y, wherein Y is
_J 15 H2« 。若要的話,可交聯之基可存在於聚合物鏈内 之其它部份。例如,共單體T之一取代基可為可交聯之基 E1。 封端劑Ε^Χ^1係如上所界定,且X係C1或Br)係於形 成之聚合物實質上藉由反應性基E1封端之條件下併納於本 20 發明聚合物内。可用於此目的之反應係如上所述之鎳偶合 反應及Suzuki反應。平均聚合度係藉由單體對封端劑之莫 耳比例而控制。 62 200422377 依製造方法而定’本發明之聚合物可為同聚物、嵌段 共聚物、無規共聚物,或交替式共聚物。 本發明另一方面係有關於含有1至99%之至少一本發 明之含有嘧啶之聚合物之聚合物摻合物。摻合物之剩餘的 5 1 %至99%係由一或多種之聚合材料組成,其係選自鍵生長 聚合物,諸如,聚苯乙烯、聚丁二烯、聚(甲基丙烯酸甲 酯)及聚(乙烯化氧);階段生長聚合物,諸如,苯氧基樹脂、 聚碳酸酯、聚醯胺、聚酯、聚胺基甲酸酯及聚醯亞胺;及 交聯聚合物,諸如,交聯環氧樹脂、交聯酚盤樹脂、交聯 10丙烯酸酯樹脂及交聯胺基甲酸酯樹脂。此等聚合物之例子 可於聚合物化學製造方法(preparative Methods of p〇iymer_J 15 H2 «. If desired, the crosslinkable group may be present elsewhere in the polymer chain. For example, one substituent of the comonomer T may be a crosslinkable group E1. The end-capping agent E ^ × ^ 1 is as defined above, and X is C1 or Br) is formed in the polymer formed under the condition that the end is blocked by the reactive group E1 and is included in the polymer of the present invention. The reactions which can be used for this purpose are the nickel coupling reaction and the Suzuki reaction as described above. The average degree of polymerization is controlled by the molar ratio of monomer to capping agent. 62 200422377 Depending on the method of manufacture 'The polymer of the present invention may be a homopolymer, a block copolymer, a random copolymer, or an alternating copolymer. Another aspect of the invention relates to polymer blends containing from 1 to 99% of at least one pyrimidine-containing polymer of the invention. The remaining 51 to 99% of the blend consists of one or more polymeric materials selected from bond-growth polymers such as polystyrene, polybutadiene, poly (methyl methacrylate) And poly (ethylene oxide); stage-growth polymers such as phenoxy resins, polycarbonates, polyamides, polyesters, polyurethanes, and polyimines; and cross-linked polymers such as , Cross-linked epoxy resin, cross-linked phenol resin, cross-linked 10 acrylate resin and cross-linked urethane resin. Examples of these polymers can be found in polymer chemical manufacturing methods (preparative methods of poiymer)
Chemistry),W· R· Sorenson及 Τ· W_ Campbell,第 2版,Chemistry), W · R · Sorenson and Τ · W_ Campbell, 2nd edition,
Interscience publishers (1968)中發現。亦可於摻合物中使 用係共軛聚合物,諸如,聚(伸苯基伸乙烯基)、經取代之 15聚(伸苯基伸乙烯基)、經取代之聚伸苯基及聚噻吩。此等 共輕聚合物之例子係由Greenham及Friend示於State Physics,第49冊,第 ι_149頁(1995)。 本表明另一方面係自本發明聚合物形成之薄膜。此等 薄膜可用於聚合物發光二極性。較佳地,此等薄膜被作為 2〇發光層。此等聚合物亦可作為電子裝置之保護性塗覆物及 =為螢光塗覆物。塗覆物或薄膜之厚度係依最終用途而 疋。一般,此厚度可為〇·〇1至200微米。於其中塗覆物作 ,螢光塗覆物之實施例中,塗覆物或薄膜之厚度係%至· 微米。於其中塗覆物作為電子保護層之實施例,塗覆物之 63 200422377 厚度可為5至20微米。於其間塗覆物用於聚合物發光二極 體之實施例,形成之層的厚度係〇·〇5至2微米。本發明之 聚合物形成良好之無小洞及缺失之薄膜。此等薄膜可藉由 此項技藝已知之手段製得,包含旋轉塗覆、喷灑塗覆、浸 5潰塗覆及軋塗覆。此等塗覆物係藉由包含使組成物塗敷至 基材及使塗敷組成物曝置於形成薄膜之條件之方法製得。 形成薄膜之條件係依塗敷技術及芳基部份之反應性端基而 定。於較佳實施例,塗敷至基材之組成物包含溶於一般有 機溶劑之嘧啶聚合物。較佳地,溶液含有〇1至1〇重量%之 10聚合物。組成物係藉由所欲方法塗敷至基材,且溶劑被蒸 發。殘餘溶劑可藉由真空及加熱而移除。移除溶劑後,若 要的話,塗覆物被曝置於使薄膜固化之必要條件,以製造 具高耐溶劑及耐熱性之薄膜。薄膜較佳係具實質均一之厚 度且實貝上無小洞。於另一實施例,聚合物可被部份固化。 15 此稱為Β-階段。 本發明之另一實施例係有關於包含基材及依據本發明 之聚合物之光學裝置或其組件。 依據本發明之裝置可依據w〇99/48160之揭示内容製 造,其内容在此被併入以供參考之用。依據本發明之聚合 20物可以唯一發光聚合物或以進一步包含電子洞及/或電子 運送聚合物之摻合物之一組份存在於此裝置。另外,此裝 置可包含本發明聚合物、電子洞運送聚合物及/或電子運 送聚合物之個別層。 於一實施例,光學裝置包含電致發光裝置,其包含 64 2004223 77 (a) 用以喷射正電荷載劑之電荷噴射層, (b) 用以喷射負電荷載劑之電荷噴射層, (c) 位於(a)及(b)層間之發光層,其包含依據本發明之聚合 物。 5 (a)層可為位於發光層(c)與陽極電極層間之正電荷載 劑運送層,或可為陽極電極層。(b)層可為位於發光層(c) 及陰極電極層間之負電荷載劑運送層,或可為陰極電極 層。選擇性地,有機電荷運送層可位於發光層(C)及電荷載 劑喷射層(a)及(b)之一者間。 10 電致發光裝置發射低於520 nm(特別係380 nm與520 nm之間)之光線。 電致發光裝置具有約(0·12, 〇〇5)與約(〇16, 〇1〇)間之 NTSC座標,特別係約(〇14,〇〇8)2NTSC座標。 需瞭解發光層可自包含一或多種依據本發明之聚合物 I5及選擇性之進-步不同聚合物之材料之換合物或混合物形 成。進-步不同聚合物可為所謂之電子洞運送聚合物(即, 用以改良電子洞運送至發光材料之效率)或電子運送聚合 物(即,用以改良電子運送至發光材料之效率)。較佳地: 此摻合物或混合物包含至少〇1重量%之依據本發明之聚合 20物,較佳係〇·2至50重量%,更佳係〇 5至3〇重量%。 有機電致發光裝置典型上係由夾置於陽極及陰極間之 有機薄膜,如此,當正偏塵施用於此裝置時,電子洞係自 陽極噴射至有機薄膜,電子係自陰極喷射至有機薄膜1 子洞及電子之結合可產生激子,其可藉由釋出光子而進行 65 2004223 77 輻射延屬至基態。實際上,陽極一般因其導電性及透明性 而係錫及錮之混合氧化物。混合氧化物(ITO)被沈積於透 明基材(諸如,玻璃或塑勝)上,如此,有機薄膜發射之光 可被觀察到。有機薄膜可由數個別層所組成,其每一者係 5針對個別功能而設計。因為電子洞係自陽極喷射,鄰接陽 極之層需具有運送電子洞之功能。相似地,鄰接陰極之層 需具有運送電子之功能。於許多例子中,電子洞_(電子)運 送層亦作為發光層。於某些例子中,一層可施行電子洞及 電子運送及發光之結合功能。有機薄膜之個別層性質上可 10皆為聚合物,或藉由熱蒸發沈積之聚合物薄膜及小分子薄 膜之混合物。較佳地,有機膜之總厚度可為炒於1000毫微 米(nm)。更佳地,總厚度係少於5〇〇 nm。最佳地,總厚度 係>、於300 nm。#父佳地,活性(發光)層之厚度係少於毫 i克米(nm)更佳地,厚度係40至160 nm之範圍。 15 料基材之ΙΊΌ_^璃及陽極可独清潔劑、有機溶劑 及紫外線·臭氧處歡-般清理後而塗覆。亦可先以薄的 導電材料層塗覆以促進電子洞喷射。此等物質包含銅酞 菁聚苯胺及聚(3,4_伸乙基二氧口塞吩)(pedt);後二者係 藉由以強有機酸(例如,聚(苯乙稀績酸))摻雜而呈其導電 2〇形式。較佳地,此層之厚度係200動戈更少;更佳地,厚 度係100 nm或更少。 於/、間電子洞運送層被使用之情況,美國專利第 5,728,8Gm輯述之聚合料胺可被錢。其它已知之電 子洞運达聚合物(諸如,聚乙烯基叶吐)亦可被使用。此層 66 2004223 77 之對其後被施用之聚合物薄膜溶液之腐蝕作用的抗性明顯 地對於成功地製造多層裝置係重要的。此層之厚度可為5〇〇 nm或更少,較佳係300mn或更少,最佳係15〇11111或更少。 於其間電子運送層被使用之情況,其可藉由熱蒸發低 5分子量材料或藉由以不會對底膜造成顯著損害之溶劑溶液 塗覆聚合物而塗敷。 低分子量材料之例子包含8-羥基嗜琳之金屬錯合物(如Interscience publishers (1968). Conjugated polymers can also be used in blends, such as poly (phenylene vinylene), substituted 15 poly (phenylene vinylene), substituted polyphenylene, and polythiophene. Examples of such co-light polymers are shown by Greenham and Friend in State Physics, Book 49, pp._149 (1995). The present invention, on the other hand, is a film formed from the polymer of the present invention. These films can be used for polymer light-emitting dipolarity. Preferably, these films are used as the 20 light emitting layer. These polymers can also be used as protective coatings for electronic devices and are fluorescent coatings. The thickness of the coating or film depends on the end use. Generally, this thickness may be from 0.001 to 200 microns. In the embodiment in which the coating is used as a fluorescent coating, the thickness of the coating or film is from% to · micrometer. In the embodiment in which the coating is used as an electronic protective layer, the thickness of the coating can be 5 to 20 microns. In the embodiment in which the coating is used for a polymer light emitting diode, the thickness of the formed layer is from 0.05 to 2 micrometers. The polymer of the present invention forms a good film without holes and deletions. These films can be made by means known in the art, including spin coating, spray coating, dip coating and pad coating. These coatings are made by a method comprising applying a composition to a substrate and exposing the coating composition to conditions for forming a thin film. The conditions for film formation depend on the coating technique and the reactive end groups of the aryl moiety. In a preferred embodiment, the composition applied to the substrate comprises a pyrimidine polymer dissolved in a general organic solvent. Preferably, the solution contains 10 to 10% by weight of the 10 polymer. The composition is applied to the substrate by a desired method, and the solvent is evaporated. Residual solvents can be removed by vacuum and heating. After the solvent is removed, if necessary, the coating is exposed to the conditions necessary for curing the film to produce a film having high solvent resistance and heat resistance. The film is preferably of substantially uniform thickness and has no small holes in the shell. In another embodiment, the polymer may be partially cured. 15 This is called the B-phase. Another embodiment of the present invention relates to an optical device or a component thereof comprising a substrate and a polymer according to the present invention. The device according to the present invention may be manufactured in accordance with the disclosure of WO99 / 48160, the contents of which are incorporated herein by reference. The polymer 20 according to the present invention may be present in the device as the sole luminescent polymer or as a component further comprising a blend of electron holes and / or electron transport polymers. In addition, the device may include individual layers of the polymer of the present invention, a hole-transporting polymer, and / or an electron-transporting polymer. In one embodiment, the optical device includes an electroluminescent device including 64 2004223 77 (a) a charge spray layer for spraying a positive charge carrier, (b) a charge spray layer for spraying a negative charge carrier, (c) The light-emitting layer located between the layers (a) and (b) comprises a polymer according to the invention. The (a) layer may be a positively-charged carrier transport layer located between the light-emitting layer (c) and the anode electrode layer, or may be an anode electrode layer. The (b) layer may be a negatively-charged carrier transport layer located between the light-emitting layer (c) and the cathode electrode layer, or may be a cathode electrode layer. Alternatively, the organic charge transport layer may be located between one of the light emitting layer (C) and the charge carrier ejection layers (a) and (b). 10 Electroluminescent devices emit light below 520 nm (particularly between 380 nm and 520 nm). The electroluminescence device has an NTSC coordinate between about (0.12,005) and about (〇16,00), and is especially about (14,008) 2NTSC coordinates. It is to be understood that the light-emitting layer may be formed from an exchange or mixture of one or more polymers I5 according to the present invention and optionally further polymers of different polymers. Further different polymers may be so-called electron hole transport polymers (ie, to improve the efficiency of electron hole transport to luminescent materials) or electron transport polymers (ie, to improve the efficiency of electron transport to luminescent materials). Preferably: the blend or mixture comprises at least 0.01% by weight of the polymer 20 according to the present invention, preferably 0.2 to 50% by weight, and more preferably 0.5 to 30% by weight. Organic electroluminescence devices typically consist of an organic film sandwiched between an anode and a cathode. Thus, when positive partial dust is applied to this device, electron holes are sprayed from the anode to the organic film, and electrons are sprayed from the cathode to the organic film. 1 The combination of a sub-hole and an electron can generate an exciton, which can be extended to the ground state by releasing the photon. In fact, anodes are generally mixed oxides of tin and rhenium because of their electrical conductivity and transparency. Mixed oxide (ITO) is deposited on a transparent substrate, such as glass or plastic, so that the light emitted by the organic thin film can be observed. Organic thin films can be composed of several individual layers, each of which is designed for a particular function. Because the electron hole is sprayed from the anode, the layer adjacent to the anode must have the function of transporting the electron hole. Similarly, the layer adjacent to the cathode needs to be capable of transporting electrons. In many examples, the electron hole_ (electron) transport layer also functions as a light emitting layer. In some examples, a layer can perform a combination of electron holes and electron transport and light emitting functions. The individual layers of the organic film may be polymers in nature, or a mixture of polymer films and small molecule films deposited by thermal evaporation. Preferably, the total thickness of the organic film may be about 1000 nanometers (nm). More preferably, the total thickness is less than 500 nm. Optimally, the total thickness is > at 300 nm. # Fatherly, the thickness of the active (light-emitting) layer is less than milligrams (nm). More preferably, the thickness is in the range of 40 to 160 nm. 15 glass substrates and anodes can be coated with cleansers, organic solvents, and ultraviolet and ozone. It can also be coated with a thin layer of conductive material first to promote electron hole ejection. These substances include copper phthalocyanine polyaniline and poly (3,4-ethylidene diphenoxyphene) (pedt); the latter two are by using strong organic acids (for example, poly (phenylethyl acetic acid) ) Is doped to form its conductive 20 form. Preferably, the thickness of this layer is 200 angstroms or less; more preferably, the thickness is 100 nm or less. In the case where the electron hole transport layer is used, the polymer amine described in US Patent No. 5,728,8Gm can be used. Other known electron tunneling polymers (such as polyethylene leaf casts) can also be used. The resistance of this layer 66 2004223 77 to the corrosive action of the polymer film solution to be subsequently applied is obviously important for the successful manufacture of multilayer devices. The thickness of this layer may be 500 nm or less, preferably 300 nm or less, and most preferably 15011111 or less. Where the electron transport layer is used, it can be applied by thermally evaporating the low molecular weight material or by coating the polymer with a solvent solution that does not cause significant damage to the base film. Examples of low molecular weight materials include metal complexes of
Burrows等人於應用物理信函(Applied Physics Letters),第 64冊,第2718-2720頁(1994)所描述),ι〇-經基苯并⑻σ奎琳 10 之金屬錯合物(如Hamada等人於化學信函(ChemistryBurrows et al. In Applied Physics Letters, Vol. 64, pp. 2718-2720 (1994), ι〇-Medium benzopyrene sigmaine 10 metal complexes (eg Hamada et al. In chemical letters
Letters),第 906-906 頁(1993)所描述),ι,3,4-噁二唑(如 Hamada專人於光電子裝置及技術(Optoelectronics-Devices and Technologies),第 7冊,第 83_93 頁 (1992) 所描述 ), 1,3,4-三嗤(如Kido等人於化學化學信函(chemistry Letters), 15第47-48頁(1996)所描述),及二苯嵌苯之二碳草醯亞胺(如 Yoshida等人於應用物理信函(Applied Physics Letters),第69 冊,第734_736頁(1996)所描述)。 聚合物電子運送材料係以下述例示:含1,3,4-噁二唑 之聚合物(如Li等人於化學協會期刊(journal of Chemical 20 Society),第 2211 ·2212 頁(1995),Yang及 Pei於應用物理期刊 (Journal of Applied Physics),第 77冊,第 4807-4809 頁(1995) 所述),含1,3,4-三唑之聚合物(如Strukelj等人於科學 (Science),第267冊,第1969_1972頁(1995)所述),含喹噁啉之 聚合物(如Yamamoto等人於曰本應用物理期刊(Japan 67Letters), pp. 906-906 (1993)), ι, 3,4-oxadiazole (as Hamada specializes in Optoelectronics-Devices and Technologies, Vol. 7, pp. 83_93 (1992 )), 1, 3, 4-triamidine (as described by Kido et al. In Chemistry Letters, 15 pp. 47-48 (1996)), and dibenzyl bicarbonate Imine (as described by Yoshida et al. In Applied Physics Letters, Vol. 69, pp. 734_736 (1996)). Polymer electron transport materials are exemplified by the following: polymers containing 1,3,4-oxadiazole (such as Li et al. In the Journal of Chemical 20 Society, 2211 · 2212 (1995), Yang And Pei in the Journal of Applied Physics, Vol. 77, pp. 4807-4809 (1995), polymers containing 1,3,4-triazoles (such as Strukelj et al. In Science (Science ), Vol. 267, pp. 1969-1972 (1995), quinoxaline-containing polymers (e.g. Yamamoto et al., Japanese Journal of Applied Physics (Japan 67
Journal of Applied Physics),第 33冊,第L250-L253 頁(1994), O’Brien等人於合成金屬(Synthetic Metals),第 76冊,第 105-108頁(1996)所述),及氰基-PPV (如Weaver等人於薄金屬膜 (Thin Solid Films),第 273 冊,第 39-47 頁(1996)所述)。此層之 厚度可為nm或更少,較佳係300 nm或更少,最佳係150 nm或 更少。 金屬陰極可藉由熱蒸發或藉由喷濺而沈積。陰極之厚 度可為100 nm至10,000 nm。較佳之金屬係鈣、鎂、銦及 鋁。此等金屬之合金亦可被使用。含1至5%之鐘的鋁合金 及含至少80%之鎂的鎂合金係較佳。 於較佳實施例中,電致發光裝置包含至少一電子洞運 送聚合物膜及發光聚合物膜,其包含本發明之聚合物,配 置於陽極材料及陰極材料之間,以使於應用電壓下,當此 裝置係前偏壓時,電子洞係自陽極材料噴射至電子洞運送 聚合物膜内’且電子係自陰極材料喷射至發光聚合物膜 内’造成光線自發光層發射。 、 於另-較佳實施例,電子洞運送聚合物層被配置成使 最,近陽極之層具有較低之氧化電勢,且相鄰層具有逐漸 較门之乳化電i藉由此方法,每單位電麼具有相對較高 光輸出之電致發光裝置可被製得。 门 施以 發光聚合物 電子洞運送聚合物膜,,-辭於此使用時係指被沈積於 1場且電子洞自陽極噴射之二電極間時,能使 5k田地運送至發光聚合物内之聚合物薄 送聚合物典—三芳基㈣份所組成電子而運 200422377 膜”一辭於此使用時係指其激光態可藉由發射光子(較佳係 相對應於可見光範圍之波長)而減缓至基態之聚合物薄膜 層。”陽極材料”一辭於此使用時係指具有4.5電子伏特(eV) 與5.5 ev間之功函的半透明或透明之導性薄膜。例子係金、 5 銀、銅、銦、鐵、鋅、錫、鉻、鈦、釩、鈷、鎳、鉛、錳、 鎢等;金屬合金,諸如,鎂/銅、鎂/銀、鎂/銘、鋁/銦等; 半導體,諸如,Si、Ge、GaAs等;金屬氧化物,諸如,銦 -錫-氧化物(“ITO”)、ZnO等;金屬化合物,諸如,CuI等, 及,導電性聚合物,諸如,聚乙炔、聚苯胺、聚噻吩、聚 10 比π各、聚對伸苯基。銦及錫之氧化物及混合氧化物係較佳。 最佳係ΙΤΟ,特別係於玻璃(作為基材)上之ιΤ〇。,,陰極材 料”一辭於此使用時係指具2.5 eV與4_5 ev間之功函的導性 薄膜。例子係鹼金屬、鹼土金屬、13族之元素、銀及銅, 與其合金或混合物,諸如,鈉、链、鉀、約、氟化鐘(Uf)、 15 納"卸合金、錢、鎮-銀合金、鎮-銅合金、鎂合金、鎮_ 銦合金、銘、銘-氧化銘合金、|g-裡合金、銦、約,及邱_ A 499,011中例示之材料,諸如,導電性聚合物,例如,聚 吼咯、聚噻吩、聚苯胺、聚乙炔等。較佳地,鋰、詞、鎮、 銦、銀、鋁或上述之搀合物及合金被使用。於使用金屬或 20 金屬合金作為電極材料之情況,電極可僅藉由真空沈積方 法形成。於使用金屬或金屬合金作為形成電極之材料的情 況,電子可進一步藉由化學電鍍方法形成(見,例如,電 化學手冊(Handbook of Electrochemistry),第 383_387頁,Journal of Applied Physics), Vol. 33, pages L250-L253 (1994), O'Brien et al. Synthetic Metals, Vol. 76, pages 105-108 (1996)), and cyanide Base-PPV (as described by Weaver et al. In Thin Solid Films, Vol. 273, pp. 39-47 (1996)). The thickness of this layer may be nm or less, preferably 300 nm or less, and most preferably 150 nm or less. Metal cathodes can be deposited by thermal evaporation or by sputtering. The thickness of the cathode can be from 100 nm to 10,000 nm. Preferred metals are calcium, magnesium, indium and aluminum. Alloys of these metals can also be used. Aluminum alloys containing 1 to 5% bells and magnesium alloys containing at least 80% magnesium are preferred. In a preferred embodiment, the electroluminescent device includes at least one electron hole transporting polymer film and a light-emitting polymer film, which includes the polymer of the present invention and is disposed between the anode material and the cathode material so that it is applied at the applied voltage. When the device is forward biased, electron holes are ejected from the anode material into the electron hole transport polymer film 'and electrons are ejected from the cathode material into the light emitting polymer film' causing light to be emitted from the light emitting layer. In another preferred embodiment, the electron hole transporting polymer layer is configured such that the layer near the anode has a lower oxidation potential, and the adjacent layer has an emulsification potential that is gradually higher than that of the gate. An electroluminescent device having a relatively high light output per unit of electricity can be made. The gate uses a light-emitting polymer electron hole to transport the polymer film.-When used herein, it means that when it is deposited between the two electrodes in a field and the electron hole is sprayed from the anode, it can transport 5k field to the light-emitting polymer. The polymer thin film polymer code—the triaryl radical is composed of electrons and the 200422377 film is used here to mean that its laser state can be reduced by emitting photons (preferably corresponding to the wavelength in the visible range). A polymer film layer that is slow to the ground state. The term "anode material" as used herein refers to a translucent or transparent conductive film with a work function between 4.5 electron volts (eV) and 5.5 ev. Examples are gold, 5 Silver, copper, indium, iron, zinc, tin, chromium, titanium, vanadium, cobalt, nickel, lead, manganese, tungsten, etc .; metal alloys, such as magnesium / copper, magnesium / silver, magnesium / ming, aluminum / indium, etc. Semiconductors such as Si, Ge, GaAs, etc .; metal oxides such as indium-tin-oxide ("ITO"), ZnO, etc .; metal compounds such as CuI, etc., and conductive polymers such as, Polyacetylene, polyaniline, polythiophene, poly 10 to π each, polyparaphenylene. Indium The oxides of tin and mixed oxides are preferred. The best is ITO, especially ITO on glass (as the substrate). The term "cathode material" when used herein means 2.5 eV and 4_5 ev Conductive thin film of work function. Examples are alkali metals, alkaline earth metals, Group 13 elements, silver and copper, and alloys or mixtures thereof, such as sodium, chain, potassium, about, fluoride (Uf), 15 nanometers " unalloyed, money, town- Silver alloy, town-copper alloy, magnesium alloy, town_indium alloy, Ming, Ming-oxide alloy, | g-Li alloy, indium, about, and materials exemplified in Qiu A 499,011, such as conductive polymers For example, polyrole, polythiophene, polyaniline, polyacetylene, and the like. Preferably, lithium, the word, the town, the indium, the silver, the aluminum or the above-mentioned adducts and alloys are used. In the case of using a metal or a 20 metal alloy as the electrode material, the electrode may be formed only by a vacuum deposition method. In the case of using a metal or a metal alloy as a material for forming an electrode, electrons may be further formed by a chemical plating method (see, for example, Handbook of Electrochemistry, pages 383_387,
Mazuren,1985)。於使用導電性聚合物之情況,電極可藉 69 2004223 77 由使其藉由陽極氧化聚合反應方法於事先提供導電塗覆物 之基材上形成薄膜而製得。 作為形成該薄膜之方法,其係,例如,真空沈積法、 旋轉塗覆法、鑄製法、Langmuir-Blodgett (“LB”)法、喷墨 5 印刷法等。此等方法中,真空沈積法、旋轉塗覆法、喷墨 印刷法及鑄製法以操作簡易性及費用而言係特別佳。 於藉由使用旋轉塗覆法、鑄製法及喷墨印刷法形成此 等層之情況,塗覆可使用藉由使組成物以0.0001至90重量 %之濃度溶於適當有機溶劑(諸如,苯、甲苯、二甲苯、四 10 氫呋喃、甲基四氫呋喃、N,N-二甲基曱醯胺、二氯甲烷、 二甲基硫氧化物等)而製得之溶液實行。 本發明之有機電致發光裝置具有顯著工業價值,因為 可被用於壁上電視機之平板顯示器、平發光裝置、影印機 或印表機之光源、液晶顯示器或對兆物之光源、顯示器信 15 號板及信號燈。本發明之聚合物及組成物可用於有機電致 發光裝置、光生伏打裝置、電子照相之光接受器、光電轉 換器、太陽能電池、圖像感應器等之領域。 施方式3 下列實施例被包含僅用於例示目的,且非限制申請專 20 利範圍之範圍。除非其它指示外,所有份數及百分率係以 重量計。 實施例1 70 200422377Mazuren, 1985). In the case of using a conductive polymer, the electrode can be produced by 69 2004223 77 by forming a thin film on a substrate provided with a conductive coating in advance by an anodic oxidation polymerization method. As a method for forming the thin film, there are, for example, a vacuum deposition method, a spin coating method, a casting method, a Langmuir-Blodgett ("LB") method, an inkjet 5 printing method, and the like. Among these methods, the vacuum deposition method, spin coating method, inkjet printing method, and casting method are particularly excellent in terms of ease of operation and cost. In the case where these layers are formed by using a spin coating method, a casting method, and an inkjet printing method, the coating can be used by dissolving the composition in an appropriate organic solvent (such as benzene, Toluene, xylene, tetra- 10-hydrofuran, methyltetrahydrofuran, N, N-dimethylamidamine, dichloromethane, dimethylsulfoxide, etc.) are implemented. The organic electroluminescence device of the present invention has significant industrial value because it can be used in a flat panel display, a flat light emitting device, a light source of a photocopier or a printer, a liquid crystal display or a light source for a sign, a display signal, etc. No. 15 board and signal lights. The polymer and composition of the present invention can be used in the fields of organic electroluminescence devices, photovoltaic devices, photoreceptors for electrophotography, photoelectric converters, solar cells, image sensors, and the like. Embodiment 3 The following examples are included for illustrative purposes only and are not intended to limit the scope of patent application. Unless otherwise indicated, all parts and percentages are by weight. Example 1 70 200422377
雙(1,5-環辛二烯)鎳(0) (2·〇克,7·27毫莫耳)及2,2,_聯二 吡啶(1.14克,7.27毫莫耳)被溶於無水甲苯(7 〇亳升)且於8〇 °C之氬氛圍下且於黑暗中攪拌1小時。單體1 (0.85克,ι·82 5 宅莫耳)及—演-9,9-二己基苟(〇·89克,1 ·82宅莫耳)被溶 於無水甲苯(7.0毫升),且以氬氣充分清除,然後添加至Ni錯 合物之溶液,且於黑暗中之80°C氬氛圍下攪拌17小時。無 水甲苯(7.0毫升)被添加,且反應進一步進行5小時。溴苯(i 毫升,9·5毫莫耳)被添加,且反應進一步攪拌2小時。反應 10 混合物被倒入攪拌之甲醇/c.HCl(aq) (10:1,600毫升),且形 成之沈澱物攪拌30分鐘,並藉由過濾收集。沈澱物被再次 溶於甲苯(80毫升),沈澱作用於酸性甲醇内重複。沈澱物 再次溶於氯仿(80毫升),且通過矽石栓,然後以氯仿(5 X 100 毫升)充分清洗。混合之氯仿相被收集至約80毫升,且於 15 攪拌甲醇(600毫升)沈澱,並攪拌30分鐘。聚合物藉由過濾 收集並乾燥。0·674 g; 58%之物料回收;Mw = 650,000, PD = 2.2卜 實施例1之聚合反應可被用於自下列單體家族製造高 71 2004223 77Bis (1,5-cyclooctadiene) nickel (0) (2.0 g, 7.27 mmol) and 2,2, -bipyridyl (1.14 g, 7.27 mmol) were dissolved in anhydrous Toluene (70 liters) and stirred under an argon atmosphere at 80 ° C for 1 hour in the dark. Monomer 1 (0.85 g, ι · 82 5 zemol) and —Yan-9,9-dihexylgoro (0.89 g, 1.82 zemol) were dissolved in anhydrous toluene (7.0 ml), and After being sufficiently purged with argon, it was added to the solution of the Ni complex and stirred for 17 hours under an argon atmosphere at 80 ° C in the dark. Anhydrous toluene (7.0 mL) was added, and the reaction was further performed for 5 hours. Bromobenzene (i mL, 9.5 mmol) was added and the reaction was stirred for a further 2 hours. Reaction 10 The mixture was poured into stirred methanol / c.HCl (aq) (10: 1,600 ml), and the formed precipitate was stirred for 30 minutes and collected by filtration. The precipitate was redissolved in toluene (80 ml) and the precipitation was repeated in acidic methanol. The precipitate was redissolved in chloroform (80 mL), passed through a silica plug, and then washed thoroughly with chloroform (5 X 100 mL). The combined chloroform phases were collected to about 80 ml, and the methanol (600 ml) was stirred at 15 ° C to precipitate and stirred for 30 minutes. The polymer was collected by filtration and dried. 0 · 674 g; 58% material recovery; Mw = 650,000, PD = 2.2. The polymerization reaction of Example 1 can be used to make high from the following monomer families 71 2004 223 77
Mw同聚物或高Mw統計共聚物: 單體〗 單體2Mw homopolymer or high Mw statistical copolymer: monomer〗 monomer 2
聚合物 Ατι Ar2 Ar3 Rioi 1 苯基 4-溴苯基 4-溴苯基 正己基 2 苯基 4-溴苯基 4’溴聯苯基 正己基 3 苯基 4;溴聯苯基 4’溴聯苯基 正己基 4 苯基 4-溴苯基 4->臭苯基 正己基 5 苯基 4-漠苯基 4’溴聯苯基 正己基 6 苯基 4’溴聯苯基 4’溴聯苯基 正己基 7 苯基 4-溴苯基 4-漠苯基 正辛基 8 苯基 4-溴苯基 4’溴聯苯基 正辛基 9 苯基 4’溴聯苯基 4’>臭聯苯基 正辛基 10 4-第三丁基苯基 4-溴苯基 4-';臭苯基 正己基 11 4-第三丁基苯基 4-漠苯基 4’漠聯苯基 正己基 12 4-第三丁基苯基 4’溴聯苯基 4’溴聯苯基 正己基 13 4-第三丁基苯基 4-溴苯基 4-漠苯基 正庚基 14 4-第三丁基苯基 4-溴苯基 4’溴聯苯基 正庚基 15 4-第三丁基苯基 4’溴聯苯基 4’漠聯苯基 正庚基 16 4-第三丁基苯基 4-溴苯基 4-溴苯基 正辛基 17 4-第三丁基苯基 4-溴苯基 4’溴聯苯基 正辛基 18 4-第三丁基苯基 4’溴聯苯基 4’漠聯苯基 正辛基 19 4-己基苯基 4-溴苯基 4-漠苯基 正己基 20 4-己基苯基 4-溴苯基 4’溴聯苯基 正己基 21 4-己基苯基 4’漠聯苯基 4’溴聯苯基 正己基 22 4-己基苯基 4-演苯基 4-漠苯基 正庚基 23 4-己基苯基 4-溴苯基 4’溴聯苯基 正庚基 24 4-己基苯基 4’溴聯苯基 4’溴聯苯基 正庚基 25 4-己基苯基 4-溴苯基 4-溴苯基 正辛基 26 4-己基苯基 4-溴苯基 4’漠聯苯基 正辛基 27 4-己基苯基 4’溴聯苯基 4’>臭聯苯基 正辛基 72 28 4-第三丁基聯苯基 4-溴苯基 4-溴苯基 正己基 29 4-第三丁基聯苯基 4-溴苯基 4’溴聯苯基 正己基 30 4-第三丁基聯苯基 4’溴聯苯基 4’漠聯苯基 正己基 31 4·第三丁基聯苯基 4-漠苯基 4-溴苯基 正庚基 32 4-第三丁基聯苯基 4-溴苯基 4’溴聯苯基 正庚基 33 4-第三丁基聯苯基 4’溴聯苯基 4’溴聯苯基 正庚基 34 4_第三丁基聯苯基 4->臭苯基 4->臭苯基 正辛基 35 4-第三丁基聯苯基 4-溴苯基 4’溴聯苯基 正辛基 36 4-第三丁基聯苯基 4’溴聯苯基 4’溴聯苯基 正辛基 37 聯苯基 4-溴苯基 4_溴苯基 正己基 38 聯苯基 4-漠苯基 4’溴聯苯基 正己基 39 聯苯基 4’漠聯苯基 4’溴聯苯基 正己基 40 聯苯基 4-溴苯基 4-溴苯基 正庚基 41 聯苯基 4-溴苯基 4’溴聯苯基 正庚基 42 聯苯基 4’溴聯苯基 4’漠聯苯基 正庚基 43 聯苯基 4-溴苯基 4-漠苯基 正辛基 44 聯苯基 4-溴苯基 4’溴聯苯基 正辛基 45 聯苯基 4’溴聯苯基 4’溴聯苯基 正辛基 46 2-萘基 4-溴苯棊 4-溴苯基 正己基 47 2-萘基 4-漠苯基 4’溴聯苯基 正己基 48 2-秦基 4’溴聯苯基 4’漠聯苯基 正己基 49 2-秦基 4-溴苯基 4-漠苯基 正庚基 50 2-萘基 4-溴苯基 4’溴聯苯基 正庚基 51 2-萘基 4’溴聯苯基 4’溴聯苯基 正庚基 52 2-秦基 4-溴苯基 4-漠苯基 正辛基 53 2-秦基 4-漠苯基 4’溴聯苯基 正辛基 54 2_秦基 4’溴聯苯基 4’溴聯苯基 正辛基 55 3,4-二丁氧基_苯基 4-溴苯基 4-溴苯基 _ι) 56 3,4-二辛氧基-苯基 4-溴苯基 4-溴苯基 -1) 57 3,4-二癸氧基苯基 4-溴苯基 4-溴苯基 J) υ同聚物;無單體2 2004223 77 實施例2 73 2004223 77Polymer Ατι Ar2 Ar3 Rioi 1 phenyl 4-bromophenyl 4-bromophenyl n-hexyl 2 phenyl 4-bromophenyl 4 'bromobiphenyl n-hexyl 3 phenyl 4; bromobiphenyl 4' bromo Phenyl n-hexyl 4 phenyl 4-bromophenyl 4- > styrenyl n-hexyl 5 phenyl 4-benzyl 4 'bromobiphenyl n-hexyl 6 phenyl 4' bromobiphenyl 4 'bromobi Phenyl n-hexyl 7 phenyl 4-bromophenyl 4-benzyl n-octyl 8 phenyl 4-bromophenyl 4 'bromobiphenyl n-octyl 9 phenyl 4' bromobiphenyl 4 '> Biphenyl n-octyl 10 4-Third-butylphenyl 4-bromophenyl 4- '; Biphenyl n-hexyl 11 4-Third-butylphenyl 4-Methyl 4'-Methyl N-hexyl 12 4-tert-butylphenyl 4'bromobiphenyl 4'bromobiphenyl n-hexyl 13 4-tert-butylphenyl 4-bromophenyl 4-benzyl n-heptyl 14 4- Tertiary butylphenyl 4-bromophenyl 4 'bromobiphenyl n-heptyl 15 4-tertiary butylphenyl 4' bromobiphenyl 4 'mobiphenyl n-heptyl 16 4-tert-butyl 4-phenylphenyl 4-bromophenyl 4-bromophenyl n-octyl 17 4-third butylphenyl 4-bromophenyl 4 'bromobiphenyl n-octyl 18 4-third Phenyl 4 'bromobiphenyl 4' mobiphenyl n-octyl 19 4-hexylphenyl 4-bromophenyl 4-mophenyl n-hexyl 20 4-hexylphenyl 4-bromophenyl 4 'bromo Biphenyl n-hexyl 21 4-hexylphenyl 4 'mobiphenyl 4' bromobiphenyl n-hexyl 22 4-hexylphenyl 4-benzyl 4-benzyl n-heptyl 23 4-hexylphenyl 4-bromophenyl 4 'bromobiphenyl n-heptyl 24 4-hexylphenyl 4' bromobiphenyl 4 'bromobiphenyl n-heptyl 25 4-hexylphenyl 4-bromophenyl 4-bromobenzene N-octyl 26 4-hexylphenyl 4-bromophenyl 4 'mobiphenyl n-octyl 27 4-hexylphenyl 4' bromobiphenyl 4 '> stilbyl n-octyl 72 28 4 -Third butyl biphenyl 4-bromophenyl 4-bromophenyl n-hexyl 29 4- Third butyl biphenyl 4-bromophenyl 4 'bromobiphenyl n-hexyl 30 4- third butyl Biphenyl 4 ′ Bromobiphenyl 4 ′ Mobiphenyl n-hexyl 31 4 · Third-butylbiphenyl 4- Mophenyl 4-bromophenyl n-heptyl 32 4-Third-butylbiphenyl 4-bromophenyl 4 'bromobiphenyl n-heptyl 33 4-tert-butylbiphenyl 4' bromobiphenyl 4 'bromobiphenyl n-heptyl 34 4-ter Biphenyl 4- > Oxyphenyl 4- > Oxyphenyl n-octyl 35 4-Third-butylbiphenyl 4-Bromophenyl 4'bromobiphenyl n-octyl 36 4-Third Butylbiphenyl 4'bromobiphenyl 4'bromobiphenyl n-octyl 37 biphenyl 4-bromophenyl 4-bromophenyl n-hexyl 38 biphenyl 4-benzyl 4 'bromobiphenyl N-hexyl 39 biphenyl 4 'mobiphenyl 4' bromobiphenyl n-hexyl 40 biphenyl 4-bromophenyl 4-bromophenyl n-heptyl 41 biphenyl 4-bromophenyl 4 'bromo Biphenyl n-heptyl 42 biphenyl 4 'bromobiphenyl 4' mobiphenyl n-heptyl 43 biphenyl 4-bromophenyl 4-mophenyl n-octyl 44 biphenyl 4-bromobenzene 4 'bromobiphenyl n-octyl 45 biphenyl 4' bromobiphenyl 4 'bromobiphenyl n-octyl 46 2-naphthyl 4-bromophenylfluorene 4-bromophenyl n-hexyl 47 2-naphthalene 4-Methenyl 4'bromobiphenyl n-hexyl 48 2-Qinyl 4'bromobiphenyl 4 'Moth biphenyl n-hexyl 49 2-Qinyl 4-bromophenyl 4-mothyl n-heptyl 50 2-naphthyl 4-bromophenyl 4 'bromobiphenyl n-heptyl 51 2-naphthyl 4' bromobiphenyl 4 'bromobiphenyl n-heptyl 52 2-pentyl 4- Phenyl 4-benzyl n-octyl 53 2-pentyl 4-benzyl 4 'bromobiphenyl n-octyl 54 2-benzyl 4' bromobiphenyl 4 'bromobiphenyl n-octyl 55 3,4-dibutoxy-phenyl 4-bromophenyl 4-bromophenyl_ι) 56 3,4-dioctyloxy-phenyl 4-bromophenyl 4-bromophenyl-1) 57 3,4-Didecoxyphenyl 4-bromophenyl 4-bromophenyl J) υ homopolymer; monomer-free 2 2004 223 77 Example 2 73 2004 223 77
單體1 (1.0克,2.15毫莫耳)及單體3 (138克,2.15毫莫 耳)於甲苯(15¾升)内懸浮,且以氣泡式氬氣充分清除1〇分 鐘。鈀催化劑(1莫耳%)被添加,且甲苯相進一步清除1〇分 5鐘。四乙基銨氫氧化物(20°/。水溶液;8毫升)被添加,且全 體被加熱迴流20小時。溴苯(〇·2毫升)被添加,且反應進一 步進行1小時,然後,苯基硼酸被添加,且反應另外攪拌i 小時。冷卻時,反應混合物以甲苯(2〇毫升)稀釋,且倒至 酸性甲醇(10毫升32%HCl(aq),於500毫升MeOH内)内,並 10 過濾。淡色固體再次溶於CHC13 (100毫升)内,且經矽石栓 (3公分)過濾,然後以CHC13 (500毫升)充分清洗。CHC13被移 除,且殘質再次溶於甲苯(100毫升),且與二鈉EDTA水溶 液(5%,200毫升)劇烈攪拌1小時。甲苯相被分離,濃縮至 約50毫升,且沈澱於MeOH (400毫升),過濾並乾燥。875mg, 15 79%回收率。 實施例2之聚合反應可用以製造下列單體家族之交替 式共聚物: 74 2004223 77 單體1 單體3Monomer 1 (1.0 g, 2.15 mmol) and Monomer 3 (138 g, 2.15 mmol) were suspended in toluene (15 ¾ liters), and fully bubbled with argon for 10 minutes. A palladium catalyst (1 mole%) was added, and the toluene phase was further removed for 10 minutes and 5 minutes. Tetraethylammonium hydroxide (20 ° /. Aqueous solution; 8 ml) was added, and the whole was heated under reflux for 20 hours. Bromobenzene (0.2 ml) was added, and the reaction was further performed for 1 hour, then, phenylboronic acid was added, and the reaction was stirred for an additional hour. Upon cooling, the reaction mixture was diluted with toluene (20 mL) and poured into acidic methanol (10 mL of 32% HCl (aq) in 500 mL of MeOH) and filtered. The pale solid was dissolved again in CHC13 (100 ml), filtered through a silica plug (3 cm), and then washed thoroughly with CHC13 (500 ml). CHC13 was removed and the residue was redissolved in toluene (100 ml) and stirred vigorously with a disodium EDTA aqueous solution (5%, 200 ml) for 1 hour. The toluene phase was separated, concentrated to about 50 ml, and precipitated in MeOH (400 ml), filtered and dried. 875mg, 15 79% recovery. The polymerization of Example 2 can be used to make alternating copolymers of the following monomer families: 74 2004 223 77 Monomer 1 Monomer 3
R|〇1 Rl〇1 聚合物 Μ Ar2 Ar3 RlOl 58 苯基 4-漠苯基 4-漠苯基 正己基 59 苯基 4-溴苯基 4’溴聯苯基 正己基 60 苯基 4’溴聯苯基 4’>臭聯苯基 正己基 61 苯基 4-漠苯基 4-漠苯基 正庚基 62 苯基 4->臭苯基 4’溴聯苯基 正庚基 63 苯基 4’溴聯苯基 4’溴聯苯基 正庚基 64 苯基 4-溴苯基 4-漠苯基 正辛基 65 苯基 4-溴苯基 4’溴聯苯基 正辛基 66 苯基 4’溴聯苯基 4’溴聯苯基 正辛基 67 4-第三丁基苯基 4-漠苯基 4-漠苯基 正己基 68 4-第三丁基苯基 4-溴苯基 4’溴聯苯基 正己基 69 4-第三丁基苯基 4’溴聯苯基 4’溴聯苯基 正己基 70 4-第三丁基苯基 4-漠苯基 4-漠苯基 正庚基 71 4-第三丁基苯基 4->臭苯基 4’溴聯苯基 正庚基 72 4-第三丁基苯基 4’溴聯苯基 4’溴聯苯基 正庚基 73 4-第三丁基苯基 4-漠苯基 4-漠苯基 正辛基 74 4-第三丁基苯基 4-溴苯基 4’溴聯苯基 正辛基 75 4-第三丁基苯基 4’溴聯苯基 4’溴聯苯基 正辛基 76 4-己基苯基 4-漠苯基 4-漠苯基 正己基 77 4-己基苯基 4-溴苯基 4’溴聯苯基 正己基 78 4-己基苯基 4’溴聯苯基 4’溴聯苯基 正己基 79 4-己基苯基 4-溴苯基 4-漠苯基 正庚基 80 4-己基苯基 4-漠苯基 4’溴聯苯基 正庚基 81 4-己基苯基 4’溴聯苯基 4’溴聯苯基 正庚基 82 4-己基苯基 4-溴苯基 4->臭苯基 正辛基 83 4-己基苯基 4-溴苯基 4’溴聯苯基 正辛基 84 4-己基苯基 4’漠聯苯基 4’溴聯苯基 正辛基 85 4-第三丁基聯苯基 4-溴苯基 4-溴苯基 正己基 75 2004223 77 86 4-第三丁基聯苯基 4-溴苯基 4’溴聯苯基 正己基 87 4-第三丁基聯苯基 4’溴聯苯基 4’溴聯苯基 正己基 88 4-第三丁基聯苯基 4->臭苯基 4-溴苯基 正庚基 89 4-第三丁基聯苯基 4-漠苯基 4’溴聯苯基 正庚基 90 4-第三丁基聯苯基 4’漠聯苯基 4’溴聯苯基 正庚基 91 4-第三丁基聯苯基 4-漠苯基 4->臭苯基 正辛基 92 4-第三丁基聯苯基 4-溴苯基 4’溴聯苯基 正辛基 93 4-第三丁基聯苯基 4’漠聯苯基 4’溴聯苯基 正辛基 94 聯苯基 4-溴苯基 4-溴苯基 正己基 95 聯苯基 4-漠苯基 4’溴聯苯基 正己基 96 聯苯基 4’溴聯苯基 4’溴聯苯基 正己基 97 聯苯基 4-溴苯基 4-溴苯基 正庚基 98 聯苯基 4-漠苯基 4’溴聯苯基 正庚基 99 聯苯基 4’溴聯苯基 4’溴聯苯基 正庚基 100 聯苯基 4-漠苯基 4-溴苯基 正辛基 101 聯苯基 4->臭苯基 4’溴聯苯基 正辛基 102 聯苯基 4’漠聯苯基 4’溴聯苯基 正辛基 103 2-萘基 4-溴苯基 4->臭苯基 正己基 104 2-秦基 4-漠苯基 4’溴聯苯基 正己基 105 2-秦基 4’漠聯苯基 4’漠聯苯基 正己基 106 2-秦基 4-漠苯基 4-溴苯基 正庚基 107 2-秦基 4->臭苯基 4’>臭聯苯基 正庚基 108 2-萘基 4’溴聯苯基 4’溴聯苯基 正庚基 109 2-秦基 4->臭苯基 4-溴苯基 正辛基 110 2-秦基 4’溴聯苯基 4’溴聯苯基 正辛基 111 2_萘基 4’溴聯苯基 4’溴聯苯基 正辛基 實施例3 I II J Ni(COD)2 J 2,2_-璘二吡啶 Μ -,^ϊιΜ 苯 80BC〇r CrBrR | 〇1 R101 Polymer M Ar2 Ar3 RlOl 58 Phenyl 4-benzyl 4-benzyl n-hexyl 59 Phenyl 4-bromophenyl 4'bromobiphenyl n-hexyl 60 Phenyl 4 'bromide Biphenyl 4 '> Obiphenyl n-hexyl 61 phenyl 4-Methylphenyl 4-Methylphenyl n-heptyl 62 Phenyl 4- > Obiphenyl 4' Bromobiphenyl n-heptyl 63 Benzene 4 'bromobiphenyl 4' bromobiphenyl n-heptyl 64 phenyl 4-bromophenyl 4-benzyl n-octyl 65 phenyl 4-bromophenyl 4 'bromobiphenyl n-octyl 66 Phenyl 4 'bromobiphenyl 4' bromobiphenyl n-octyl 67 4-Third-butylphenyl 4-Amophenyl 4-Amophenyl-n-hexyl 68 4-Third-butylphenyl 4-Bromo Phenyl 4 'bromobiphenyl n-hexyl 69 4-third butylphenyl 4' bromobiphenyl 4 'bromobiphenyl n-hexyl 70 4-third butylphenyl 4-benzyl 4-benzyl Phenyl n-heptyl 71 4-Third-butylphenyl 4- > Styryl 4 'bromobiphenyl n-heptyl 72 4-Third-butylphenyl 4' bromobiphenyl 4 'bromobiphenyl N-heptyl 73 4-tert-butylphenyl 4-benzyl 4-benzyl-n-octyl 74 4-tert-butylphenyl 4-bromophenyl 4 'bromobiphenyl Octyl 75 4-Third-butylphenyl 4'bromobiphenyl 4'bromobiphenyl n-octyl 76 4-hexylphenyl 4-benzyl 4-benzyl-n-hexyl 77 4-hexylphenyl 4-bromophenyl 4 'bromobiphenyl n-hexyl 78 4-hexylphenyl 4' bromobiphenyl 4 'bromobiphenyl n-hexyl 79 4-hexylphenyl 4-bromophenyl 4-benzyl n- Heptyl 80 4-hexylphenyl 4-benzyl 4 'bromobiphenyl n-heptyl 81 4-hexylphenyl 4' bromobiphenyl 4 'bromobiphenyl n-heptyl 82 4-hexylphenyl 4 -Bromophenyl 4- > Styrenyl n-octyl 83 4-hexylphenyl 4-bromophenyl 4 'bromobiphenyl n-octyl 84 4-hexylphenyl 4' mobiphenyl 4 'bromobi Phenyl n-octyl 85 4-tert-butylbiphenyl 4-bromophenyl 4-bromophenyl-n-hexyl 75 2004223 77 86 4-tert-butylbiphenyl 4-bromophenyl 4'bromobiphenyl N-hexyl 87 4-tert-butylbiphenyl 4'bromobiphenyl 4'bromobiphenyl n-hexyl 88 4-tert-butylbiphenyl 4- > styrenyl 4-bromophenyl n- Heptyl 89 4-Third-butylbiphenyl 4-mophenyl 4'bromobiphenyl n-heptyl90 4-Third-butylbiphenyl 4'Mobiphenyl 4 ' Bromobiphenyl n-heptyl 91 4-tert-butylbiphenyl 4-benzyl 4- > Styrenyl n-octyl 92 4-tert-butylbiphenyl 4-bromophenyl 4'bromo Biphenyl n-octyl 93 4-Third-butylbiphenyl 4 'Mobiphenyl 4' Bromobiphenyl n-octyl 94 Biphenyl 4-bromophenyl 4-bromophenyl n-hexyl 95 Biphenyl 4-Methenyl 4'bromobiphenyl n-hexyl 96 biphenyl 4'bromobiphenyl 4'bromobiphenyl n-hexyl 97 biphenyl 4-bromophenyl 4-bromophenyl n-heptyl 98 Biphenyl 4-benzyl 4'bromobiphenyl n-heptyl 99 biphenyl 4'bromobiphenyl 4'bromobiphenyl n-heptyl 100 biphenyl 4-benzyl 4-bromophenyl N-octyl 101 biphenyl 4- > odorant 4 'bromobiphenyl n-octyl 102 biphenyl 4' mobiphenyl 4 'bromobiphenyl n-octyl 103 2-naphthyl 4-bromo Phenyl 4- > Styrenyl n-hexyl 104 2-Qinyl 4-benzyl 4 'bromobiphenyl n-hexyl 105 2-Qinyl 4' molyl 4phenyl molyl n-hexyl 106 2 -Qinyl 4-benzyl 4-bromophenyl n-heptyl 107 2-Qinyl 4- > Styrenyl 4 '> Stylenyl biphenyl n-heptyl 108 2-naphthyl 4 Bromobiphenyl 4 'bromobiphenyl n-heptyl 109 2-Qinyl 4- > Styryl 4-bromophenyl n-octyl 110 2-Qinyl 4' bromobiphenyl 4 'bromobiphenyl N-octyl 111 2-naphthyl 4 'bromobiphenyl 4' bromobiphenyl n-octyl Example 3 I II J Ni (COD) 2 J 2,2_-pyridinedipyridine M-, ^ ϊιΜ benzene 80BC. r CrBr
單體3Monomer 3
76 200422377 雙(1,5_環辛二烯)鎳(0) (2.0克,7.27毫莫耳)及2,2,·聯二 比定(1.14克,7.27¾莫耳)被溶於無水甲苯(7.0亳升),且於 黑暗中之80°C氬氛圍下攪拌丨小時。單體3 (2·38克,3·3毫莫 耳)被溶於無水甲苯(7〇毫升卜且以氬氣充分清除,然後 5添加至Nl錯合物溶液,且於黑暗中之80°C氬氣下攪拌17小 時。無水甲苯(7.0毫升)被添加,且反應進一步進行5小時。 溴苯(1毫升,9.5毫莫耳)被添加,且反應進一步攪拌2小時。 反應混合物被倒至攪拌之甲醇/c.HCl^ (1〇:1,6〇〇毫升) 内,且形成之沈澱物被攪拌30分鐘,且藉由過濾收集。沈 10澱物再次溶於甲苯(80毫升),且於酸性甲醇内之沈澱作用 被重複。沈澱物再次溶於氣仿(8〇毫升),且通過矽石栓, 然後以氣仿(5 X 1〇〇毫升)充分清洗。混合之氣仿相被濃縮 至約80毫升,且於攪拌甲醇(6〇〇毫升)内沈澱,且攪拌3〇分 鐘。聚合物藉由過濾收集並乾燥。 15 實施例476 200422377 Bis (1,5_cyclooctadiene) nickel (0) (2.0 g, 7.27 mmol) and 2,2, dibiidine (1.14 g, 7.27 ¾ mole) were dissolved in anhydrous toluene (7.0 Torr), and stirred in the dark at 80 ° C under an argon atmosphere for 1 hour. Monomer 3 (2.38 grams, 3.3 millimoles) was dissolved in anhydrous toluene (70 mL and fully purged with argon), and then 5 was added to the Nl complex solution at 80 ° in the dark Stir under C argon for 17 hours. Anhydrous toluene (7.0 mL) was added and the reaction proceeded for another 5 hours. Bromobenzene (1 mL, 9.5 mmol) was added and the reaction was stirred for another 2 hours. The reaction mixture was poured to Stirred in methanol / c.HCl ^ (10: 1,600 ml), and the formed precipitate was stirred for 30 minutes and collected by filtration. The precipitate was again dissolved in toluene (80 ml), And the precipitation in acidic methanol was repeated. The precipitate was dissolved again in aeroform (80 ml), passed through a silica plug, and then thoroughly washed with aeroform (5 x 100 ml). The mixed aeroform phase It was concentrated to about 80 ml and precipitated in stirred methanol (600 ml) and stirred for 30 minutes. The polymer was collected by filtration and dried. 15 Example 4
單«4 單體4 (5.0克,14.95毫莫耳),AIBN (48毫克,0.293毫莫 耳)及氯苯(12克)以氬氣清除,然後於氬氛圍下加熱至150°C 20 且持續2小時。熱溶液被倒至攪拌之曱醇(3〇〇毫升)内,且 形成之白色沈澱物被過濾。沈澱物被再次溶於甲苯(60毫 77 2004223 77 升)内,且緩慢滴至酸性甲醇溶液(2毫升c.HCl⑽於400毫升 MeOH内)。聚合物被過濾,以甲醇清洗並於40°C真空中乾 燥隔夜。質量=3.5克,70%之物料回收;Mw = 20,000 (GPC, PS標準物)。 5 實施例5Single «4 Monomer 4 (5.0 g, 14.95 mmol), AIBN (48 mg, 0.293 mmol) and chlorobenzene (12 g) were purged with argon and then heated to 150 ° C in an argon atmosphere 20 and Lasts 2 hours. The hot solution was poured into stirred methanol (300 ml) and the white precipitate formed was filtered. The precipitate was redissolved in toluene (60 mmol 77 2004 223 77 liters) and slowly dropped into an acidic methanol solution (2 ml of c.HCl in 400 ml of MeOH). The polymer was filtered, washed with methanol and dried overnight at 40 ° C under vacuum. Mass = 3.5 grams, 70% of material recovered; Mw = 20,000 (GPC, PS standard). 5 Example 5
雙(1,5-環辛二烯)鎳(0) (2.0克,7.27毫莫耳)及2,2’-聯二 吡啶(1.14克,7.27毫莫耳)被溶於無水甲苯(7.0毫升)且於黑 10 暗中於8(TC氬氛圍下攪拌1小時。單體5 (2.38克,3.3毫莫耳) 被溶於無水甲苯(7.0毫升),且以氬氣充分清除,然後,添 加至Ni錯合物溶液且於黑暗中且於80°C氬氣下攪拌17小 時。無水甲苯(7.0毫升)被添加,且反應進一步進行5小時。 溴苯(1毫升,9.5毫莫耳)被添加,且反應進一步攪拌2小時。 15 反應混合物被倒至攪拌之甲縮/c.HCl(aq) (10:1,600毫升) 内,且形成之沈澱物攪拌30分鐘,且藉由過濾收集。。沈 澱物再次溶於甲苯(80毫升),且於酸性甲醇内之沈澱作用 被重複。沈澱物再次溶於氯仿(80毫升),且通過矽石栓, 然後,以氯仿(5 X 100毫升)充分清洗。混合之氯仿相被濃 78 200422377 縮至約80毫升,且於攪拌之甲醇(600毫升)沈澱,且攪拌3〇 分鐘。聚合物藉由過濾收集並乾燥。 實施例6Bis (1,5-cyclooctadiene) nickel (0) (2.0 g, 7.27 mmol) and 2,2'-bipyridine (1.14 g, 7.27 mmol) were dissolved in anhydrous toluene (7.0 ml) ) And stirred in a dark 10 at 8 (TC argon atmosphere for 1 hour. Monomer 5 (2.38 g, 3.3 mmol) was dissolved in anhydrous toluene (7.0 ml) and fully removed with argon, and then added to The Ni complex solution was stirred in the dark under argon at 80 ° C for 17 hours. Anhydrous toluene (7.0 mL) was added, and the reaction was further performed for 5 hours. Bromobenzene (1 mL, 9.5 mmol) was added And the reaction was further stirred for 2 hours. 15 The reaction mixture was poured into a stirred formic acid / c.HCl (aq) (10: 1,600 ml), and the formed precipitate was stirred for 30 minutes and collected by filtration. The precipitate was redissolved in toluene (80 ml) and the precipitation in acidic methanol was repeated. The precipitate was redissolved in chloroform (80 ml) and passed through a silica plug, then chloroform (5 X 100 ml) Wash thoroughly. The mixed chloroform phase was reduced to about 80 ml by concentrated 78 200422377, and precipitated in stirred methanol (600 ml), and stirred for 30 minutes. Bell. The polymer was collected by filtration and dried. Example 6
5 單體6 (2.0克,3·65毫莫耳)及單體7 (1·38克,3·65毫莫 耳)被懸浮於甲苯(15毫升),且以氣泡式氬氣充分清除1〇分 鐘。鈀催化劑(1莫耳%)被添加,且甲苯相進一步清除1〇分 鐘。四乙基銨氫氧化物(20%水溶液;14毫升)被添加,且整 10體被加熱迴流2〇小時。溴苯(0·2毫升)被添加,且反應進一 步進行一小時,然後,苯基硼酸被添加,且反應另外擾掉 一小時。冷卻時,反應混合物以甲苯(20毫升)稀釋,且倒 至酸性甲醇(10毫升32%HCl(aq),於500毫升MeOH)内,並 過濾。淡色固體再次溶於甲苯(100毫升),並以二鈉EDTA 15 水溶液(5%, 200毫升)劇烈攪拌1小時。甲苯相被分離,濃 縮至約50毫升,且於MeOH (400毫升)内沈澱,過濾並乾燥。 實施例7 79 2004223 775 Monomer 6 (2.0 g, 3.65 mmol) and Monomer 7 (1.38 g, 3.65 mmol) were suspended in toluene (15 mL) and fully purged with bubble argon 1 〇minutes. A palladium catalyst (1 mole%) was added, and the toluene phase was further removed for 10 minutes. Tetraethylammonium hydroxide (20% aqueous solution; 14 ml) was added, and the whole was heated to reflux for 20 hours. Bromobenzene (0.2 ml) was added, and the reaction was further performed for one hour, then, phenylboronic acid was added, and the reaction was disturbed for another hour. Upon cooling, the reaction mixture was diluted with toluene (20 mL) and poured into acidic methanol (10 mL of 32% HCl (aq) in 500 mL of MeOH) and filtered. The pale solid was re-dissolved in toluene (100 mL) and stirred vigorously with disodium EDTA 15 aqueous solution (5%, 200 mL) for 1 hour. The toluene phase was separated, concentrated to about 50 ml, and precipitated in MeOH (400 ml), filtered and dried. Example 7 79 2004 223 77
單體6 (2.0克,3.65毫莫耳)及單體7 (1·98克,3.65毫莫 耳)被懸浮於甲苯(15毫升),且以氣泡式氬氣充分清除10分 鐘。把催化劑(1莫耳%)被添加,且甲苯相進一步清除1〇分 5 鐘。四乙基銨氫氧化物(20%水溶液;14毫升)被添加,且整 體被加熱迴流20小時。溴苯(〇·2毫升)被添加,且反應進一 步進行一小時,然後,苯基硼酸被添加,且反應另外攪拌 一小時。冷卻時,反應混合物以甲苯(2〇毫升)稀釋,且倒 至酸性甲醇(10毫升32%HCl(aq),於500毫升MeOH)内,並 10 過濾。淡色固體再次溶於甲苯(1〇〇毫升),並以二鈉EDTA 水溶液(5%,200毫升)劇烈授拌1小時。甲苯相被分離,濃 縮至約50毫升,且於MeOH (400毫升)内沈澱,過濾並乾燥。 應用實施例1 用於裝置製造之ITO-玻璃具有12歐姆/平方之公稱片 15材電阻。電子洞喷射導性聚合物被使用時係聚(3,4-伸乙基 二氧-喧吩)(PEDT),電子洞運送聚合物被使用時係聚(4,4,_ 80 2004223 77 伸聯苯基·二基-N’N’-二苯基二胺基-1,4-伸苯基)(其係描述 於US-B-5,728,801,其後縮寫成"P3DA”),且電子運送層 當被使用時係8-羥基_喳啉之鋁錯合物,其後縮寫成’’Alq”。 PEDT膜係藉由自得自拜耳公司之聚合物水溶液之旋轉塗 5 覆而形成。P3DA膜係自氯苯溶液之旋轉塗覆而形成。Alq 膜係藉由高度真空中之熱蒸發而形成。多層裝置係藉由依 序鋪置此等層而製得,其係自鄰接ITO之層開始。於所有 層被沈積後,適當之金屬陰極藉由熱蒸發沈積於有機膜 上。於此例子中之鎂合金係含有至少85%鎂之鎂合金。活 10 性聚合物藉由自有機溶劑(甲苯)之旋轉塗覆而沈積。 電致發光裝置 裝置編號 電子洞 喷射 電子洞運 送 聚合物 電子運送 陰極 D1 - 64 - Mg合金 D2 - - 64 Alq “ D3 - P3DA 64 - “ D4 - P3DA 64 Alq “ D5 PEDT PVK 64 - A1 D6 - PVK 64 - A11) D7 PEDT - 64 - A11) υ鈣或鋇之薄層(約5 nm)係存在於電子運送層與陰極之間; PVK=聚乙烯基咔唑。 15 【圖式簡單說明】 (無) 【圖式之主要元件代表符號表】 (無) 81Monomer 6 (2.0 g, 3.65 mmol) and Monomer 7 (1.98 g, 3.65 mmol) were suspended in toluene (15 ml) and thoroughly purged with bubble argon for 10 minutes. The catalyst (1 mole%) was added and the toluene phase was further removed for 10 minutes. Tetraethylammonium hydroxide (20% aqueous solution; 14 ml) was added, and the whole was heated under reflux for 20 hours. Bromobenzene (0.2 ml) was added, and the reaction was further performed for one hour, then, phenylboronic acid was added, and the reaction was stirred for an additional hour. Upon cooling, the reaction mixture was diluted with toluene (20 mL) and poured into acidic methanol (10 mL of 32% HCl (aq) in 500 mL of MeOH) and filtered. The pale solid was dissolved again in toluene (100 mL) and was vigorously stirred with disodium EDTA aqueous solution (5%, 200 mL) for 1 hour. The toluene phase was separated, concentrated to about 50 ml, and precipitated in MeOH (400 ml), filtered and dried. Application Example 1 ITO-glass for device manufacturing has a nominal sheet resistance of 12 ohms / square. Electron hole ejection conductive polymer is poly (3,4-ethylene dioxy-benzene) (PEDT) when used, and electron hole transporting polymer is poly (4,4, _ 80 2004223 77) Biphenyl-diyl-N'N'-diphenyldiamino-1,4-phenylene) (which is described in US-B-5,728,801, and abbreviated as " P3DA "), and the electron The transport layer, when used, is an aluminum complex of 8-hydroxy-pyridoline, and is abbreviated as "Alq" hereinafter. The PEDT film was formed by spin coating of an aqueous polymer solution obtained from Bayer. The P3DA film is formed by spin coating of a chlorobenzene solution. The Alq film is formed by thermal evaporation in a high vacuum. Multilayer devices are made by sequentially laying out these layers, starting with the layer adjacent to ITO. After all the layers have been deposited, a suitable metal cathode is deposited on the organic film by thermal evaporation. The magnesium alloy in this example is a magnesium alloy containing at least 85% magnesium. The living polymer is deposited by spin coating from an organic solvent (toluene). Electroluminescent device device number Electron hole ejection electron hole transport polymer Electron transport cathode D1-64-Mg alloy D2--64 Alq "D3-P3DA 64-" D4-P3DA 64 Alq "D5 PEDT PVK 64-A1 D6-PVK 64-A11) D7 PEDT-64-A11) υ A thin layer of calcium or barium (approximately 5 nm) exists between the electron transport layer and the cathode; PVK = polyvinylcarbazole. 15 [Simplified illustration of the drawing] ( [None] [Representation of the main symbols of the diagram] (None) 81
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TW092130088A TWI294905B (en) | 2002-10-30 | 2003-10-29 | Novel polymers for use in optical devices |
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US (1) | US7649077B2 (en) |
EP (1) | EP1556435A1 (en) |
JP (1) | JP4619944B2 (en) |
KR (2) | KR101015032B1 (en) |
AU (1) | AU2003283284A1 (en) |
BR (1) | BR0315854A (en) |
CA (1) | CA2501692A1 (en) |
MX (1) | MXPA05004423A (en) |
TW (1) | TWI294905B (en) |
WO (1) | WO2004039864A1 (en) |
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SG111090A1 (en) * | 2002-10-25 | 2005-05-30 | Agency Science Tech & Res | Cationic water-soluble conjugated polymers and their precursors |
CN101087863B (en) | 2004-12-23 | 2012-06-20 | 西巴特殊化学品控股有限公司 | Electroluminescent metal complexes with nucleophilic carbene ligands |
TW200716536A (en) | 2005-06-09 | 2007-05-01 | Chugai Pharmaceutical Co Ltd | Vitamin D compounds |
JP5446096B2 (en) * | 2007-02-06 | 2014-03-19 | 住友化学株式会社 | Composition and light-emitting device using the composition |
US7926697B2 (en) * | 2007-09-19 | 2011-04-19 | Intel Corporation | Underfill formulation and method of increasing an adhesion property of same |
EP2275458A4 (en) * | 2008-04-24 | 2013-04-17 | Showa Denko Kk | Charge-transporting polymer compound and organic electroluminescent device using the same |
JP5544775B2 (en) * | 2008-07-29 | 2014-07-09 | 住友化学株式会社 | Composition containing phosphorescent compound and light emitting device using the composition |
JP5672681B2 (en) * | 2008-09-18 | 2015-02-18 | 三菱化学株式会社 | Composition for charge transport film, organic electroluminescence device, organic EL display and organic EL lighting |
JP5515542B2 (en) * | 2008-10-06 | 2014-06-11 | 住友化学株式会社 | Polymer compound containing nitrogen-containing heterocyclic structure |
KR101761431B1 (en) | 2009-08-21 | 2017-07-25 | 토소가부시키가이샤 | Cyclic azine derivatives, processes for producing these, and organic electroluminescent element containing these as component |
KR101805962B1 (en) * | 2010-11-30 | 2017-12-06 | 스미또모 가가꾸 가부시키가이샤 | High molecular compound, method for producing same, and light-emitting element |
TWI774347B (en) | 2011-08-25 | 2022-08-11 | 日商半導體能源研究所股份有限公司 | Light-emitting element, light-emitting device, electronic device, lighting device, and novel organic compound |
US9252368B2 (en) | 2011-11-11 | 2016-02-02 | Tosoh Corporation | Cyclic azine compound having nitrogen-containing condensed aromatic group, method for producing same, and organic electroluminescent device comprising same as constituent component |
US9059411B2 (en) | 2012-02-29 | 2015-06-16 | Semiconductor Energy Laboratory Co., Ltd. | Fluorene compound, light-emitting element, light-emitting device, electronic device, and lighting device |
KR101335161B1 (en) * | 2012-06-18 | 2013-11-29 | (주)원우시스템즈 | Improved method and apparatus for measuring properties of solar cell |
JP6312960B2 (en) | 2012-08-03 | 2018-04-18 | 株式会社半導体エネルギー研究所 | Light emitting element, light emitting device, electronic device, lighting device, and heterocyclic compound |
US9444059B2 (en) | 2013-02-21 | 2016-09-13 | Semiconductor Energy Laboratory Co., Ltd. | Organometallic complex, light-emitting element, light-emitting device, electronic device, and lighting device |
KR102457008B1 (en) | 2014-05-23 | 2022-10-19 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | Heterocyclic compound, light-emitting element, light-emitting device, electronic device, and lighting device |
JP6684085B2 (en) | 2014-12-19 | 2020-04-22 | 株式会社半導体エネルギー研究所 | Organometallic complex, light emitting element, light emitting device, electronic device, and lighting device |
WO2016132250A1 (en) | 2015-02-18 | 2016-08-25 | Semiconductor Energy Laboratory Co., Ltd. | Organic compound, light-emitting element, display module, lighting module, light-emitting device, display device, electronic device, and lighting device |
KR20210018105A (en) | 2019-08-09 | 2021-02-17 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | Organic compound, light-emitting device, light-emitting apparatus, electronic device, and lighting device |
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EP0069058B1 (en) * | 1981-06-10 | 1986-02-26 | Ciba-Geigy Ag | 2-substituted 5-vinylpyrimidines, polymers to be prepared thereof and process for their preparation |
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ES2168144T3 (en) | 1996-09-16 | 2002-06-01 | Bayer Ag | TRIAZINE POLYMERS AND THEIR EMPLOYMENT IN ELECTROLUMINISCENT PROVISIONS. |
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JP4940493B2 (en) * | 1999-12-20 | 2012-05-30 | 住友化学株式会社 | Polymer phosphor, method for producing the same, and polymer light emitting device |
US7357990B2 (en) * | 1999-12-20 | 2008-04-15 | Sumitomo Chemical Company, Limited | Polymeric fluorescent material, process for producing the same, and polymeric luminiscent element |
TWI238183B (en) * | 2000-01-12 | 2005-08-21 | Sumitomo Chemical Co | Polymeric fluorescent substance and polymer light-emitting device |
JP2001302793A (en) * | 2000-02-17 | 2001-10-31 | Fuji Photo Film Co Ltd | Novel polymer, luminescent element material and luminescent element using the same |
JP2002105444A (en) | 2000-09-29 | 2002-04-10 | Fuji Photo Film Co Ltd | Method for synthesizing heteroaromatic ring-containing vinyl monomer, and organic light-emitting element material using the same and organic light-emitting element |
DE10143353A1 (en) * | 2001-09-04 | 2003-03-20 | Covion Organic Semiconductors | Conjugated polymers containing spirobifluorene units and their use |
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- 2003-10-21 EP EP03775209A patent/EP1556435A1/en not_active Withdrawn
- 2003-10-21 JP JP2005501807A patent/JP4619944B2/en not_active Expired - Fee Related
- 2003-10-21 MX MXPA05004423A patent/MXPA05004423A/en unknown
- 2003-10-21 BR BR0315854-3A patent/BR0315854A/en not_active Application Discontinuation
- 2003-10-21 KR KR1020057007698A patent/KR101015032B1/en not_active IP Right Cessation
- 2003-10-21 KR KR1020107020815A patent/KR101015045B1/en not_active IP Right Cessation
- 2003-10-21 AU AU2003283284A patent/AU2003283284A1/en not_active Abandoned
- 2003-10-21 US US10/531,779 patent/US7649077B2/en not_active Expired - Fee Related
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- 2003-10-21 CA CA002501692A patent/CA2501692A1/en not_active Abandoned
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Also Published As
Publication number | Publication date |
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KR20100119798A (en) | 2010-11-10 |
CA2501692A1 (en) | 2004-05-13 |
JP2006504862A (en) | 2006-02-09 |
US20060025564A1 (en) | 2006-02-02 |
KR20050084618A (en) | 2005-08-26 |
TWI294905B (en) | 2008-03-21 |
EP1556435A1 (en) | 2005-07-27 |
US7649077B2 (en) | 2010-01-19 |
JP4619944B2 (en) | 2011-01-26 |
MXPA05004423A (en) | 2005-07-26 |
KR101015032B1 (en) | 2011-02-16 |
KR101015045B1 (en) | 2011-02-16 |
WO2004039864A1 (en) | 2004-05-13 |
WO2004039864A8 (en) | 2004-08-19 |
AU2003283284A1 (en) | 2004-05-25 |
BR0315854A (en) | 2005-09-20 |
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