TW200418723A - Involved fullerene manufacturing and collecting system tool - Google Patents

Abstract

This invention provides a fullerene manufacturing and collecting system tool capable of manufacturing a high quality involved fullerene with a high production efficiency, comprising a vacuum chamber (1), a film formation chamber (5) having a substrate inlet port (2a) for leading a substrate (3a) therein formed on the vacuum chamber (1) side and stacking the involved fullerene on the substrate (2a), a dissolving chamber (6) having a substrate inlet port (2b) for leading, therein, a substrate (3b) on which the involved fullerene was stacked in the film formation chamber (5) formed on the vacuum chamber (1) side and also having a dissolving liquid inlet port (9) for leading dissolving liquid for melting the involved fullerene stacked on the substrate (2b) and a dissolving liquid outlet port (10) for discharging the dissolving liquid (this dissolving liquid is referred to as "resolvent") after the involved fullerene is dissolved, and susceptors (4a, 4b) allowed to be rotated and reciprocatingly moved, allowing a plurality of substrates to be placed thereon, and capable of leading the substrates into the film formation chamber (5) and the dissolving chamber (6).

Description

200418723 V. Description of the invention (l) The present invention relates to the manufacture of a fullerene encased [Technical field to which the invention belongs [prior art] In 1990, Kratshmer (person name) published a tubular and Hollow carbon clusters, the so-called fullerene mass synthesis method (W. K rats hmer et al., Nature (person name), 347 (199〇) 3 54). This has always been the study of various C6O crystals.

In addition, this report uses K3C60 doped with K in C60 thin films made by Hebard (person names) to show the critical temperature ^^ "exceeding ^ (AFHebard et al m Q,. (1990 6 0 0). This tie / point = tUre (person's name), 350, and the “eyes” and “eyes” become the new superconductor material. The rate to get the fullerene side: established on the substrate, with high quality.

That is, on the inner wall of the device or on the substrate, that is, at the present point in time, it is extremely small. The amount of fullerene included in the package is only the current status of J. With the # _ I, or the package obtained on the substrate ^ Cannot establish recycling in the device user

By any of the methods ::: 之 方 &. For example, the actual state I (fullerene inclusive). What's more; θ recovery is difficult to recover attached to the inner wall of the device. High recovery rate. Inner package Scholler = industrial level and good production efficiency. It also becomes a complete second = law system. Even for the research, the present invention Human department additionally provides with high yield

200418723 V. Description of the invention (2) —, the technology of enclosing J lerene (this version is specially established to enclose the fuller in 2000. It is required that the yield and production efficiency _ 样 秘 、 # y 义 Η 刀 田The characteristics of Le%, and the technology of good recovery with the drought of 丄 A. The purpose of M 鬲 Shishiyue is to provide _species to manufacture and recycle high-quality, good and high-quality production and recycling system tools. Production of Inner Fullerene [Summary of the Invention] & Inner Fullerene in the present invention includes: vacuum chamber; in the true ;; side with its characteristic film forming chamber; in the film forming chamber, two: fuller The substrates of the substrates that cover the Fuller ’s thinly stacked substrates are stacked in-line on the substrate and are provided with an inlet for liquid introduction and a discharge solution for dissolution: dissolution: T: For dissolution (this solution for dissolution is referred to as "the dissolution liquid chamber after dissolving the changlerene; and the dissolving plate capable of rotating and moving = moving = dissolving liquid discharge port, the substrate can be introduced to, and Multiple bases can be placed to describe the inclusive 6 / state of war. Fullerene is enclosed in metal. 'I is a type of alkali metal. Fullerene in an enclosed state. 2 Liquid benzylamine is used. Aniline is insoluble. Therefore, the fullerene can be dissolved by dissolving benzyltriphenylamine. As a result, It can recover not only the fullerenes but also the fullerenes. The aniline system can be used as a fullerene in the recovery rate. In addition, it is a developing solution for horse speed chromatography (HPLC). It is characterized by its characteristics It is characterized by the following: ~~;!; Or the carrier of the dissolution chamber 200418723 V. Description of the invention (3) It is characterized by the formation: the entrance path at the entrance of a certain end is ancient and useful. "Introduction> Guide of liquid guide" the discharge path of the discharge port; I won the introduction path and: ", first formed at the other end of the intersection with the intersection" on the same day, will be "in the Xi !: J intersection is placed towards the substrate To be an opening-shaped opening portion: a spray; a pressure control means for controlling the pressure of the solution contacting the substrate and the atmospheric pressure body to pass through the opening portion to make the contact with the substrate ^… in The discharge port is connected with the discharge port. The connection solution> Gujie liquid discharge port is characterized in that it is provided with a means for imparting ultrasound to the dissolving solution. The substrate can be easily separated from and deposited on the US board by giving an ultrasonic wave. Fullerene is enclosed in order to further increase the recovery soil rate of enclosed fullerenes. ^ /, ~ %% han > ^ τ, and wash back the hiccups. In other words, if it is in the dissolving operation Later, the switching valve can also be used to clean the substrate. Of course, it can also be special ..... downstream of the above-mentioned solution introduction inlet, one side of the switching valve \ switching valve is connected to the dissolution liquid. The other side = connected to the cleaning solution. In order to clean the substrate, as described above, a cleaning chamber can be installed, but even if the cleaning chamber is not intentionally set, it can be introduced by the solution for dissolution. A switching valve is installed downstream of the mouth. One side of the switching valve is connected to the dissolving liquid, and the other side is connected to the washing liquid to perform basic cleaning. In other words, if the cleaning solution is used in the dissolution operation, the cleaning and the cleaning of the cleaning room are performed together. Its special policy is to install a space between the film formation chamber and the dissolution chamber.

2015-6047-PF (Nl) .ptd Page 8 200418723 V. Description of the invention (4) f 芩 If the inside and inside are cleaned by introducing the washing liquid, the spray body is set in the washing room. It can also be simply washed, and the special command is that: in the aforementioned dissolution chamber, the connection is characterized by the use of chromatography in the aforementioned column /, the main method. It is characterized by the aforementioned column and connecting component analysis machine. Empty interior. The component analysis machine is arranged in the real [Embodiment] (Example 1) The tool is shown in the figure 丨 'This example includes Fullerene's manufacturing and recycling system =: 2a and uses m rows for the substrate 3a The substrate guide iV * film forming chamber 5 is provided on the side of the vacuum chamber 1 for the introduction of the substrate 3b of Narita Le finely deposited substrate into the stack, the introduction of the substrate into the inner package to deposit fullerene on the substrate 2b, The solution is introduced into the solution introduction port 9 and the solution solution used to dissolve / dissolve the solution (this solution is called "dissolution solution"). 6; and a plurality of substrates can be rotated and reciprocated, and the substrates can be introduced to i = to place the carriers 4a, 4b. The inheritance of _ to 5 or ^ solution room 6 will be described in more detail with reference to FIG. 1. Page 9 2015-6047-PF (Nl) .ptd 200418723 V. Description of the invention (5) In the vacuum chamber 1, a film forming chamber 5 and a dissolution chamber 6 are provided. The film forming chamber 5 is provided on the vacuum chamber 1 side and has an opening. This opening is a substrate introduction port 2a for introducing the substrate 3a. In this example, a gate valve 11 is provided adjacent to the vacuum chamber 1. In order to carry out the accumulation of fullerenes, it is basically not necessary to exchange substrates. That is, the substrate can be reused. However, a new substrate may be introduced into the vacuum chamber through the gate valve 11. In the film formation chamber 5, accumulation of fullerene is carried out. The internal structure of the film forming chamber 5 is not particularly limited as long as the fullerene-inclusive deposition can be performed. φ On the other hand, the dissolution chamber 6 is provided on the vacuum chamber 1 side, and a substrate introduction port 2b for introducing an opening-shaped substrate 3b is provided. In the dissolution chamber 2, a dissolution solution introduction port 9 and a dissolution solution discharge port 10 are formed. From the dissolution solution introduction port 9, a dissolution solution (solvent) for dissolving the fullerene incorporation is introduced. The dissolved solution containing the fullerene dissolved therein is discharged to the outside of the dissolution chamber 6 through the dissolution solution discharge port 9. Dissolving solution discharge port 9 can be installed under the dissolution chamber to discharge the dissolving solution by gravity. Or discharge by attraction. A fullerene-encapsulated separation is performed by installing a column for solution chromatography (especially high-speed solution chromatography) downstream of the dissolving solution discharge port 9 • Purification. An analysis device may be provided downstream of the column for analyzing the fullerene content and the like. The signal from the analysis device can be transmitted to the film forming chamber 5 to control the film forming conditions. In addition, it can be installed in a vacuum chamber to dry the fullerene or

2015-6047-PF (Nl) .ptd Page 10 200418723 V. Description of the invention (6) Drying chamber for substrate In this state, the column and analysis machine are arranged in the vacuum chamber 1. Inside the empty room 1. It can be set that the dissolution liquid discharge port 10 of the taxi chamber 6 is directly formed from the film formation to the analysis of the sample without contacting the atmosphere. Then: =, you can get a higher quality fullerene.仃 # Describes the carrier. ^ It can be rotated and reciprocated in the load / set, and can be used to introduce the substrates 3a, 3b to the point 5 or A soil plate 3a, 3b. The Cheng Cong II carrier system is divided into two carriers, ", but, ΐ 为 is -body. This m also designs and configures the carrier at the position where the substrate is guided to the film formation and also the cooling chamber Θ. To the example shown in FIG. 1, Γ is divided into Vb on the carriers 4a and 4b. In addition, for example, a state in which an opening is provided on the vacuum chamber side and washing is arranged, and the substrate is cleaned in the cleaning chamber is washed. In addition, a substrate is also loaded on the substrate. In other words, 1 corresponds to the number of substrates in the processing chamber of the plate U, and is placed on the carrier. The processing load of the plate is 4 a, 4 b. It is held by the holder 8. The carriers 4a and 4b are placed on the substrates 3a and 3b to raise the holder 8 to 7 and the substrates 3a and 3b are introduced into the film through the inlets 2a and 2b, respectively. Dissolution chamber 6. In the state where the substrates 3 & and 3b are respectively introduced, it is formed on the bottom of the film formation chamber, the dissolution chamber 6, and the carrier 4a and the interlayer. The sealing energy can be airtight inside the chamber 5 and the dissolution chamber 6. Of course, it is \ air film with high air tightness, so it can be dissolved in the carrier 4a, "and the film forming chamber 5,

2015-6047-PF (Nl) .ptd Page 11 V. Description of the invention (7) Between the bottom surface of J6, an O-ring and the like are provided. This step is the substrate. That is to say, the fullerene deposits are packed in the d: carrier grounded. On the surface of the bearing, the bottom surface and the contact surface to the bottom surface are preferably mirror-finished in order to accumulate the full π ^ fullerene accumulation on the substrates 3a and 3b. At stack J, the film-forming chamber 5 is lowered, and the inner envelope 1 is maintained at a vacuum or reduced pressure odorous energy U body 8. At this point, it's true. By lowering the holder δ, the substrate 3 = upper = film-forming chamber 5 and dissolution chamber 6 are taken out to the space M ⑼: Do not make the stacked fullerene-containing substrates dissolved by the ^ = hold side. At this temple, the substrate 3b is located below the film-forming chamber 5 to = to 6. The substrate 3b is introduced into the film-forming chamber 5, and the substrate 3a of the / fuller woman is introduced into the dissolution chamber 6: : Stacking the inner envelope chamber 5 to deposit the fullerene. Simultaneously ;: 2 times': In the forming chamber 6, the substrate 3 is deposited in the substrate 3, and the aforementioned operations are repeated while being dissolved. Dissolve within. In this way, the inner fullerenes are not exposed to obtain high-quality inner fullerenes, and at the same time, the fullerenes are produced with high production efficiency because they are soluble. Inch film formation (Example 2) Example 2 is shown in FIG. 2 '.

200418723 V. Description of the invention (8) An introduction passage 2 1 0 having an introduction port 207 for introducing a solution at one end and an outlet passage 212 having an outlet 215 for discharging the solution to the outside of the system are formed at one end. 'The introduction passage 21o and the discharge passage 212 cross each other to form an intersection portion 214, and at the same time, an opening portion 2 is provided in the parent difference portion 2 1 4 to face the substrate 201 to form an opening. The nozzle structure formed by 6 and the difference between the pressure and the atmospheric pressure of the solution contacting the substrate 201 are controlled through the opening portion 206 so that the solution contacting the substrate 201 does not flow outside the discharge path 212 The nozzle 202 of the pressure control 213 is provided in the liquid introduction port 9 and the introduction port 207 in the dissolution chamber 6 in the same manner, and the discharge port 215 is pressed. The pressure control means may be between the liquid discharge port 10 and the discharge port 2 15. Solution & Solution In the foregoing embodiment, even after the dissolution, the dissolution solution remains in the dissolution chamber 6 '. Therefore, two of the vacuum chambers when the substrate is taken out of the chamber are caused by the decrease in vacancy. In: Example / Solution solution system is not exposed, the reason is out, the recovery system of the dissolved solution becomes extremely simple. And inside: "The state τ of the solution chamber to take out the substrate will not lead to the ':: contamination of the solution or the reduction of the vacuum degree. After the fullerene of the substrate is washed, the a will be necessary. Cleaning room for cleaning substrate introduction port plate '

2015-6047-PF (Nl) .ptd Page 13 200418723 V. Description of the invention (9) However, 'If the solution for dissolution and the washing solution are switched by switching the solution, after dissolving, only by making As the introduction liquid, pure water or ultrapure water is sufficient. That is, even if a cleaning chamber is not provided, it is possible to simplify the cleaning of the substrate. In Fig. 2, reference numeral 202 denotes a wet processing liquid supply 嗔 nozzle 2. The 2 is mainly composed of a nozzle body 25. As shown in the figure, the pressure control unit 213 is composed of = pressure: pu. That is, by controlling the pressure of the treatment liquid Λ, and then controlling the difference between the atmospheric pressure and the pressure of the wet treatment liquid between the treated objects 1; Reduce & pump 217, control the thirst type and fluid force of the suction cross section 214, and obtain the solution pressure (including the surface tension of the processing surface of the surface processing solution) and the dissolution chamber and surface. The pressure Pw of the wet processing fluid for rolling and processing in the production line (including 渴 ί ί tension and the surface tension of the treated surface of the wet-processed material) 206 ports \ The relationship 'becomes P, Pa, and is supplied to the substrate 201 through the openings, 206'; the dissolving liquid system 'male' contacting the substrate 201 is discharged to the outside of the wet processing liquid supply nozzle, and is discharged to the discharge path. If the shape of the top of the cross section is to produce the effect of Coanda 200418723 V. Description of Invention (ίο), it is easy to obtain the pressure balance and become more ideal. In addition, an ultrasonic wave is provided on the top 218 of the nozzle. Application means 220. The fullerene can be detached from the substrate more easily by applying an ultrasonic wave during dissolution. Of course, the present invention is not limited to the embodiment described above. For example, in FIG. 8 describes the device as a vertical type that moves up and down, but the device of FIG. 1 can also be made into a horizontal type with an angle of 90 degrees. In addition, a bias voltage can be applied to the carrier in a variable manner. [Industrial Applicability] It is possible to produce high-quality enclosed fullerenes with high production efficiency.

20! 5-6047-PF (Nl) .ptd Page 15 200418723 Brief Description of Drawings Fig. 1 is a sectional view and a plan view showing an example of Embodiment 1 Fig. 2 is a sectional view of an example of Embodiment 2. 【Symbol Description】

Pa ~ pressure in the dissolution chamber; 1 ~ vacuum chamber; 2b ~ substrate introduction port; 3b ~ substrate; 4b ~ carrier; 6 ~ dissolution chamber; 9 ~ dissolution liquid introduction port

Pw ~ pressure of wet processing liquid 2a ~ substrate introduction port; 3a ~ substrate; 4a ~ carrier; 5 ~ film forming chamber; 8 ~ holding body; 10 ~ dissolving liquid discharge port; valve gate manufacturing Erlefu., Cladding inner base II 11 ο ο The engineering system retracts the nozzle to spray the liquid supply JI virgin wet 2 ο segment hand; • 'plus; the road; the Pu Shi mouth through the Ministry of pressure in and out differential pressure sound Leading cross-over reduction one by one one by one 7 2 4 7 0 11 1 ± 1i ox ^ _ 2 2 2 2 2 paragraph. •, hand ·, body; road system; part-by-part, top-control mouth structure, mouth-in force, mouth-out, mouth opening, pressure-exhausting, spraying, spraying, spraying, spraying, spraying, spraying, spraying, spraying, spraying, spraying, spraying, spraying, spraying.

2015-6047-PF (Nl) .ptd Page 16

Claims (1)

6. The scope of applying for patents includes: manufacturing and recycling of olefins, vacuum vacuum chambers, and Gongtong tools, which are characterized in the film-forming chamber, and on the side of the vacuum chamber, there is a solution ^ into the inner package on the substrate ^ The substrate guide introduced into the substrate is internally inserted; Le: the film forming chamber is stacked in the true; the introduction is introduced; the substrate guide of the thinly stacked substrate is introduced; It also has an introduction port for lysing solution and a bathing solution for dissolving lerene (the dissolving solution is referred to as ",, 4 after dissolving the inclusion of fullerene); And ... Dissolving liquid discharge of the "infusion solution") ... The carrier can rotate and reciprocate several substrates, can introduce substrates into the =, and can be placed ^ 2 as within the scope of the first patent application Scoop into or the dissolution chamber. System tool, in which, the production and recycling of the aforementioned enclosed fullerene% octadecene 3. As in the scope of the patent application No. 2 ~ metal enclosed fullerene. System tools, in which the production and recycling of the aforementioned metal-based alkali metalloprene 4 · For example, in the scope of application for patents No. 1 to No. 3, manufacturing and recycling system tools, "Medium, the aforementioned ,: 7 of the fullerene 5 · As in the application of the scope of patent applications Nos. 1 to 4 ^ liquid aniline. Manufacturing and recycling system tools, in which the introduction path of the full solution-containing fullerene-introducing solution introduction port and the discharge path at the 芈 end for conducting liquid to the discharge port outside the system are provided. It is used to discharge the dissolution path to the other end to form an intersection], the introduction path and the row _, at the same time, will have inn 2015-6047-PF (Nl) .ptd $ 17 pages 200418723 VI. Scope of patent application The intersection part is provided with an opening formed by openings facing toward the substrate to form an opening = to control the difference between the pressure of the solution in contact with the substrate and the atmospheric pressure, and to make contact through the opening: row = road evening The nozzle of the pressure control means is arranged inside, and connects the Lisu dissolving liquid introduction port and the 誃 = ^ lysis to the dissolving solution discharge port and the discharge port. 5-day inch 'connection such as "manufacturing and recycling of fufu in item 5 of the mr range = medium" is set to give ultrasound to the hand of the dissolving solution 7 · as in the patent application scope of item 5 or 6 of the collection system tool Among them, in the liquid dissolving two port of the aforementioned dissolving: make two switching valves, one side of the switching valve is connected to 4, and not connected to the washing liquid. N— 解 W 'Other sides are connected 8. Such as Any of the scope of applications for patents Nos. 1 to 7-manufacturing and recycling system tools' wherein, a washing chamber for cleaning the substrate after dissolution is provided between the aforementioned film-forming lerene. And other dissolution chamber 9. For example, any of the items i to 8 in the scope of the patent application — manufacturing and recycling system tools, #, in the aforementioned dissolution;: $ ene column for spectrometry. Connection solution color 10 as described in the scope of the patent application, including fuller 糸System tools, in which, downstream of the aforementioned column, Lianyungang · Recycling 1 1 · If the scope of the patent application scope includes the knife analysis machine state. R system tools, in which the aforementioned column and composition analysis = preparation manufacturing · Back to the vacuum chamber. 2015-6047-PF (Nl) .ptd Page 18