200412593 I i (1) 玖、發明說明 【發明所屬之技術領域】 本發明係關於光記錄媒體，尤其是，和在支持基板之 相反側面設有薄光透射層的次世代型光記錄媒體相關。 【先前技術】 近年來，記錄大容量數位資料爲目的之記錄媒體，以 CD(Compact Disc)、DVD((Digital Versatile Disc)所代表之 光記錄媒體被廣泛利用。 CD之構造上，係在厚度約1.2mm之光透射性基板上 堆疊資訊記錄層及保護層，利用從光透射性基板側對資訊 記錄層照射波長約7 80nm之雷射光束，可執行資料之記錄 及/或再生。雷射光束之集束上，使用數値孔徑（NA)約爲 0.45之物鏡，利用此方式，資訊記錄層上之雷射光束的束 點直徑可收斂至大約1.6 // m。利用此方式，CD約可實現 700MB之記錄容量、和在等倍速（約1.2m/sec)時可實現約 1Mbps之資料傳送率。 相對於此，DVD之構成上，係具有由堆疊於厚度約 0.6mm之光透射性基板上的資訊記錄層及保護層所構成之 積層體，且利用黏結層和厚度約0.6mm之虛擬基板互相貼 合，利用從光透射性基板側對資訊記錄層照射波長約 6 50nm之雷射光束，可執行資料之記錄及/或再生。雷射 光束之集束上，採用數値孔徑（NA)約0.6之物鏡，利用此 方式，資訊記錄層上之雷射光束之束點直徑可收斂成約 -6 - (2)200412593 I i (1) 发明 Description of the invention [Technical field to which the invention belongs] The present invention relates to an optical recording medium, and more particularly, to a next-generation type optical recording medium having a thin light transmitting layer on the opposite side of a supporting substrate. [Prior art] In recent years, optical recording media represented by compact discs (Compact Disc) and DVD ((Digital Versatile Disc)) are widely used as recording media for recording large-capacity digital data. The structure of CDs is based on their thickness. An information recording layer and a protective layer are stacked on a light-transmissive substrate of about 1.2 mm, and the information recording layer is irradiated with a laser beam having a wavelength of about 7 80 nm from the light-transmissive substrate side, and data recording and / or reproduction can be performed. Laser An objective lens with a numerical aperture (NA) of about 0.45 is used for the beam focusing. With this method, the beam spot diameter of the laser beam on the information recording layer can be converged to about 1.6 // m. Using this method, the CD can be approximately Achieving a 700MB recording capacity and a data transmission rate of about 1Mbps at the same speed (about 1.2m / sec). In contrast, the DVD has a light-transmitting substrate stacked on a thickness of about 0.6mm. A laminated body composed of an information recording layer and a protective layer on the surface, and an adhesive layer and a dummy substrate having a thickness of about 0.6 mm are bonded to each other, and the information recording layer is irradiated with a wavelength of about 6 50 nm from the light-transmitting substrate side. The light beam can perform data recording and / or reproduction. The laser beam is focused using an objective lens with a numerical aperture (NA) of about 0.6. In this way, the beam spot diameter of the laser beam on the information recording layer can be reduced to about -6-(2)
(2)200412593 1 J 0.93 // m。如此，DVD之記錄及/再生上，除了使用波長 比CD更短之雷射光束以外，同時，因使用數値孔徑（NA) 較大之物鏡，故可實現比CD更小之束點直徑。利用此方 式，DVD約可實現4.7GB/面之記錄容量、和在等倍速（約 3.5 m /sec)時約可實現11Mbps之資料傳送率。 另一方面，隨著近年來之社會的高資訊化，要求具有 比DVD更多之資料記錄容量，而且，要求具有比DVD更 大之資料傳送率的光記錄媒體能夠實用化，因而進行相關 開發。此種次世代型光記錄媒體爲了實現大容量及高資料 傳送率，必須使資料記錄及/或再生上所使用之雷射光束 的束點直徑進一步收斂成更小，因此，以雷射光束之集束 爲目的之物鏡的數値孔徑（NA)應更大，同時，雷射光束之 波長必須更短。 然而，以雷射光束之集束爲目的之物鏡若高NA化， 則會產生光記錄媒體之反翹或傾斜之容許度一亦即傾斜容 限必須極小之問題。若記錄及/或再生使用之雷射光束波 長爲λ、雷射光束之光路的光透射層之厚度爲d，則傾斜 容限T可以下式表示。 chNA3 由式（1)可知，傾斜容限在物鏡之ΝΑ愈大時會愈小。 又，若發生波面像差（彗形像差）之光透射層的折射率爲 η、傾斜角爲Θ，則波面像差係數W可以下式來表示。 -7- (3) (3)200412593 l i(2) 200412593 1 J 0.93 // m. In this way, in addition to using a laser beam having a shorter wavelength than CD for DVD recording and / or reproduction, at the same time, an objective lens with a larger chirp aperture (NA) is used, so that a smaller beam spot diameter than CD can be achieved. Using this method, the DVD can achieve a recording capacity of about 4.7 GB / area and a data transfer rate of about 11 Mbps at the same speed (about 3.5 m / sec). On the other hand, with the high informationization of society in recent years, more data recording capacity than DVD is required, and optical recording media with greater data transfer rate than DVD are required to be put into practical use. . In order to realize the large capacity and high data transfer rate of such next-generation optical recording media, the beam spot diameter of the laser beam used for data recording and / or reproduction must be further converged to a smaller value. The numerical aperture (NA) of the objective lens for bunching should be larger, and the wavelength of the laser beam must be shorter. However, if the objective lens for the purpose of focusing the laser beam is high in NA, the problem that the tolerance of tilting or tilting of the optical recording medium, that is, the tilting tolerance must be extremely small, arises. If the wavelength of the laser beam used for recording and / or reproduction is λ, and the thickness of the light transmitting layer in the optical path of the laser beam is d, the tilt tolerance T can be expressed by the following formula. chNA3 From formula (1), it can be seen that the tilt tolerance becomes smaller as the NA of the objective lens becomes larger. When the refractive index of the light transmitting layer where wavefront aberration (coma aberration) occurs is η and the tilt angle is Θ, the wavefront aberration coefficient W can be expressed by the following formula. -7- (3) (3) 200412593 l i
y 一 d . -1)· η2 · sin 0 · COS0 ·(似)3 2λ{ρ2 - sin2 〇Y 由式（1)及式（2)可知，爲在獲得較大傾斜容限且抑制 彗形像差之發生上，減少記錄·再生上使用之雷射光束射 入的光透射層厚度d是極爲有效的方法。相對於CD(NA = 約〇·45)使用之光透射性基板的厚度約爲i.2mm，而將 DVD(NA=約0.6)使用之光透射性基板的厚度設定成約爲 0.6mm ’就是因爲上述原因。 由上述理由可知，次世代型之光記錄媒體上，爲了確 保充分之傾斜容限及抑制彗形像差之發生，光透射層之厚 度應爲200 // m以下，最好爲更薄至100// m程度。 因此，想要在次世代型光記錄媒體上，形成如CD或 DVD等現行光記錄媒體上形成於成爲雷射光束光路之光透 射性基板上的資訊記錄層，將會十分困難，故檢討下述方 法，亦即在形成於支持基板上之資訊記錄層等之上，利用 旋轉塗膜法、或光透射性薄片之貼附等形成薄光透射層， 然後在將其當做雷射光束之光路使用的方法。如此，次世 代型光記錄媒體之製作上，與從光射入面側開始依序成膜 之現行光記錄媒體不同，而是從光射入面之相反側面開始 依序成膜。y a d. -1) · η2 · sin 0 · COS0 · (like) 3 2λ {ρ2-sin2 〇Y It can be known from formulas (1) and (2) that in order to obtain a large tilt tolerance and suppress coma In the occurrence of aberrations, it is an extremely effective method to reduce the thickness d of the light-transmitting layer from which a laser beam used for recording and reproduction is incident. The thickness of the light-transmitting substrate used for CD (NA = about 0.45) is about i.2mm, and the thickness of the light-transmitting substrate used for DVD (NA = about 0.6) is set to about 0.6mm 'because The above reasons. From the above reasons, in order to ensure sufficient tilt tolerance and suppress the occurrence of coma aberration on the next-generation type optical recording medium, the thickness of the light transmitting layer should be 200 // m or less, and preferably thinner to 100 // m degree. Therefore, it is very difficult to form an information recording layer on a next-generation optical recording medium, such as a CD or DVD, on an optically-transmissive substrate that becomes a laser beam optical path. This method is to form a thin light-transmitting layer on the information recording layer and the like formed on a support substrate by using a spin coating method or attaching a light-transmitting sheet, and then use it as the optical path of a laser beam. usage instructions. Thus, the production of the next-generation optical recording medium is different from the current optical recording medium in which films are sequentially formed from the light incident surface side, and the films are sequentially formed from the opposite side of the light incident surface.
然而，利用旋轉塗膜法或光透射性薄片之貼附等形成 之光透射層表面（次世代型光記錄媒體之光射入面），與主 要利用射出成型法製作之光透射性基板表面（CD或DVDHowever, the surface of a light-transmitting layer (the light-incident surface of a next-generation optical recording medium) formed by a spin coating method or the attachment of a light-transmissive sheet, and the surface of a light-transmitting substrate mainly produced by an injection molding method ( CD or DVD
200412593 , J (4) 之光射入面）比較會有平坦性低的問題。而且，因爲CD或 DVD之光射入面上形成的雷射光束之束點較大（CD :約 7 00 // m、DVD :約500mm)，可緩和光射入面上之凹凸， 對記錄特性或再生特性產生的影響會較小，另一方面，次 世代型光記錄媒體上，因爲光射入面上形成之雷射光束的 束點爲極小（例如，1 30 // m)，只要少許凹凸即會對記錄特 性或再生特性產生較大影響。 因此，次世代型光記錄媒體之製造步驟中，希望能檢 查光射入面之表面性，若其表面性太低時，則將其視爲不 良品並排除。 【發明內容】 因此，本發明之目的在提供一種光記錄媒體，係在和 支持基板之相反側面上設有薄光透射層，且其光射入面沒 有會對記錄特性或再生特性產生較大影響之凹凸的光記錄 媒體。 本發明之光記錄媒體係具有支持基板、光透射層、以 及設於前述支持基板及前述光透射層間之資訊層，利用經 由前述光透射層對前述資訊層照射雷射光束來執行資料之 記錄及/或再生，且利用下述特徵來達成前述目的，其特 徵爲：存在於射入前述雷射光束之光射入面上的凹凸缺 陷，若其尖峰部分或谷底部分之前述光透射層厚度爲 T1、前述凹凸缺陷之端部的前述光透射層厚度爲T2、以 及前述凹凸缺陷之前述尖峰部分或谷底部分至前述端部爲 -9 - (5) (5)200412593 止之圓周方向距離爲W時，至少關於記錄區域內之全部 凹凸缺陷滿足下式。 \T\-T2\IW ^ 5.5xl〇-4 利用本發明，在次世代型光記錄媒體之記錄及/或再 生時最好使用之線速度區域（10〜19m/s)時，可使光射入面 之凹凸缺陷導致之殘留調焦誤差成分降至大約10%以下。 利用此方式，可有效抑制凹凸缺陷對抖動所造成之影響。 又，在本發明之較佳實施形態中，前述光透射層之層 度爲30〜200 // m。又，本發明之較佳實施形態中，前述 資訊層含有由相變化材料構成之記錄層，且可以lOm/s以 上之線速度執行對前述記錄層之資料記錄。此種次世代型 光記錄媒體，因可使形成於光射入面上之雷射光束的束點 收斂成極小，且可以極快之線速度執行資料記錄，故光射 入面之微小凹凸會對記錄特性或再生特性產生較大影響。 然而，利用本發明，至少記錄區域內之全部凹凸缺陷，因 爲滿足下式關係， \T\-T2\IW ^ 5.5X10-4 而可得到良好記錄特性及再生特性。 -10- (6) (6)200412593 \ ^ 【實施方式】 以下’參加附錄圖面，詳細說明本發明之良好實施形 態。 第1圖（a)係本發明良好實施形態之光記錄媒體之 外觀的斷面斜視圖，第1圖（b)係第1圖（a)所示A部之部 分放大剖面圖。第1圖所示光記錄媒體1 〇係所謂重寫型 光記錄媒體，然而，本發明之對象並未限定爲重寫型光記 錄媒體，亦可以單次寫入型光記錄媒體或讀取專用型光記 錄媒體等其他類型之光記錄媒體爲對象。 第1圖（a)、（ b)所示之光記錄媒體1 〇，係外直徑約爲 120mm、厚度約爲1.2mm圓盤狀之光記錄媒體，如第1圖 (b)所示，其構成上，具有支持基板11、反射層12、第2 電介質層13、記錄層14、第.1電介質層、及光透射層 1 6。雖然並未特別限定，第1圖所示光記錄媒體1 〇係從 光透射層16之表面一光射入面16a照射波長λ爲3 80nm〜 450nm(最好爲約405nm)之雷射光束L而可執行資料記錄 及再生的重寫型光記錄媒體。對光記錄媒體1 0之資料記 錄及再生時，採用數値孔徑爲0.7以上（最好爲0.85程度） 之物鏡，此時，若雷射光束L之波長爲λ、物鏡之數値孔 徑爲ΝΑ時，則應設定爲λ /NAS 640nm。又，「第2」電 介質層13及「第1」電介質層15係分別從光射入面16a 觀看時之第2及第1電介質層。 爲了確保光記錄媒體10要求之厚度（約1.2mm)，支持 基板11會使用厚度約1.1mm之圓盤狀基板，其一方之面 -11 - (7) 200412593 < 上，從其中心部附近朝外緣部方向會形以導引雷射光束L 爲目的之螺旋狀之溝槽11a及平面lib。支持基板11之材 料可使用各材料，例如，玻璃、陶瓷、或樹脂。其中，以 成型之容易性觀點而言，一般大都使用聚碳酸酯樹脂。 反射層1 2具有反射從光透射層1 6側射入之雷射光束 L’然後再將其從光透射層16射出之機能。反射層12之 材料可使用可反射雷射光束L之各種材料，例如，鎂 (Mg)、鋁（A1)、鈦（Ti)、鉻（Cr)、鐵（Fe)、鈷（Co)、鎳 (Ni)、銅（Cu)、鋅（Zn)、鍺（Ge)、銀（Ag)、白金（Pt)、金（Au) 等。反射層12之厚度則設定爲5〜300nm設定。 第1電介質層15及第2電介質層13對設於其間之記 錄層14具有物理及/或化學之保護機能，因爲記錄層14 夾於第1電介質層15及第2電介質層13之間，故光記錄 後’可長期地有效防止記錄資訊劣化。 構成第丨電介質層15及第2電介質層13之材料，只 要在使用之雷射光束L的波長區域爲透明之電介質即可， 並無特別限制，例如，可以氧化物、硫化物、氮化物、或 其組合爲主要成分者，但從防止支持基板11等之熱變 形、及保護記錄層14之特性的觀點而言，最好使用 AH、AIN、ZnO、ZnS、GeN、GeCrN、CeCh、 SiO、 Si〇2 、 Si3N4 、 SiC 、 La2〇3 、 Ta〇、Ti〇2 、 SiAl〇N(Si〇2 、 AI2O3、ShN4、AIN 之混合物）、LaSi〇N(La2〇3、Si(h、及 Si3N4之混合物）等、鋁（Al)、矽（Si)、鈽（Ce)、鈦（Ti)、鋅 (Ζ η)、鉅（T a)等之氧化物、氮化物、硫化物、碳化物、或 -12- (8) (8)200412593 l i 其混合物。又，第1電介質層15及第2電介質層13之層 厚設疋爲3〜200nm。 記錄層14係形成可逆記錄標誌之層，由相變化材料 所構成。相變化材料因晶體狀態時之反射率及非晶狀態時 之反射率不同，利用此來執行資料記錄。記錄之資料係利 用例如非晶狀態之記錄標誌的長度（記錄標誌之前緣至後 緣爲止之長度）、以及例如晶體狀態之空白區域的長度（記 錄標誌之後緣至次一記錄標誌之前緣爲止之長度）來表 爲了使記錄層14從晶體狀態改變成非晶狀態，利用 使從光射入面1 6a照射之雷射光束L具有記錄功率Pw至 基本功率Pb爲止之擺動的脈衝波形，將記錄層1 4加熱至 融點以上之溫度，其後，再將雷射光束L之功率設定成基 本功率Pb實施急冷。利用此方式，溶融之區域會變化成 非晶狀態，此即爲記錄標誌。另一方面，爲了使記錄層 1 4從非晶狀態變成晶體狀態，將從光射入面1 6a照射之雷 射光束L功率設定爲刪除功率Pe，將記錄層14加熱至晶 化溫度以上之溫度。被加熱至晶化溫度以上之溫度的區 域，會因爲雷射光束L離開而緩慢冷卻，該區域會變成晶 體狀態。 此時，記錄功率Pw、刪除功率P e、及基本功率Pb 設定爲如下式所示之關係。200412593, J (4) light incident surface) has a relatively low flatness problem. Moreover, because the beam spot of the laser beam formed on the light incident surface of CD or DVD is large (CD: about 7 00 // m, DVD: about 500mm), the unevenness on the light incident surface can be eased, and the recording The effect of the characteristics or reproduction characteristics will be small. On the other hand, on the next-generation optical recording medium, because the beam spot of the laser beam formed on the light entrance surface is extremely small (for example, 1 30 // m), as long as A small amount of unevenness greatly affects recording characteristics or reproduction characteristics. Therefore, in the manufacturing steps of the next-generation type optical recording medium, it is desirable to check the surface property of the light incident surface. If the surface property is too low, it is regarded as defective and eliminated. SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide an optical recording medium having a thin light transmitting layer on the side opposite to a supporting substrate, and the light incident surface of the optical recording medium does not have a large effect on recording characteristics or reproduction characteristics. Influence of uneven optical recording media. The optical recording medium of the present invention has a supporting substrate, a light transmitting layer, and an information layer provided between the supporting substrate and the light transmitting layer. The information recording layer is irradiated with a laser beam through the light transmitting layer to perform data recording and And / or regeneration, and using the following features to achieve the foregoing purpose, characterized in that: the concave-convex defects existing on the incident surface of the light incident on the laser beam, if the thickness of the light transmitting layer of the peak portion or the valley bottom portion is T1, the thickness of the light transmitting layer at the end of the unevenness defect is T2, and the distance from the peak or valley of the unevenness defect to the end is -9-(5) (5) 200412593 The distance in the circumferential direction is W In this case, at least all the unevenness defects in the recording area satisfy the following formula. \ T \ -T2 \ IW ^ 5.5xl0-4 By using the present invention, in the linear velocity region (10 ~ 19m / s) which is best used in the recording and / or reproduction of the next-generation optical recording medium, the optical The residual focus error component caused by the unevenness of the incident surface is reduced to about 10% or less. In this way, the effect of bump defects on jitter can be effectively suppressed. Moreover, in a preferred embodiment of the present invention, the layer of the light transmitting layer is 30 to 200 // m. In a preferred embodiment of the present invention, the information layer includes a recording layer made of a phase-change material, and data recording on the recording layer can be performed at a linear speed of 10 m / s or more. This next-generation type optical recording medium can converge the beam spot of the laser beam formed on the light incident surface to a very small size, and can perform data recording at extremely fast line speeds. Therefore, the small unevenness of the light incident surface will This greatly affects recording characteristics or reproduction characteristics. However, with the present invention, at least all the unevenness defects in the recording area satisfy the following relationship: \ T \ -T2 \ IW ^ 5.5X10-4, and good recording characteristics and reproduction characteristics can be obtained. -10- (6) (6) 200412593 \ ^ [Embodiment] The following is a detailed description of the preferred embodiment of the present invention with reference to the appended drawings. Fig. 1 (a) is a cross-sectional perspective view of the appearance of an optical recording medium according to a preferred embodiment of the present invention, and Fig. 1 (b) is an enlarged cross-sectional view of a portion shown in Fig. 1 (a). The optical recording medium 10 shown in FIG. 1 is a so-called rewrite-type optical recording medium. However, the object of the present invention is not limited to a rewrite-type optical recording medium, and it may be a write-once optical recording medium or read-only. Other types of optical recording media, such as optical recording media, are targeted. The optical recording medium 10 shown in FIGS. 1 (a) and (b) is a disc-shaped optical recording medium having an outer diameter of about 120 mm and a thickness of about 1.2 mm. As shown in FIG. 1 (b), The structure includes a support substrate 11, a reflective layer 12, a second dielectric layer 13, a recording layer 14, a first dielectric layer, and a light transmitting layer 16. Although not particularly limited, the optical recording medium 10 shown in FIG. 1 is a laser beam L with a wavelength λ of 3 80 nm to 450 nm (preferably about 405 nm) irradiated from a surface of the light transmitting layer 16 to a light incident surface 16 a. A rewritable optical recording medium that can perform data recording and reproduction. When recording and reproducing data on the optical recording medium 10, an objective lens with a numerical aperture of 0.7 or more (preferably 0.85 degree) is used. At this time, if the wavelength of the laser beam L is λ and the numerical aperture of the objective lens is ΝΑ In this case, it should be set to λ / NAS 640nm. The "second" dielectric layer 13 and the "first" dielectric layer 15 are the second and first dielectric layers when viewed from the light incident surface 16a, respectively. In order to ensure the required thickness (approximately 1.2 mm) of the optical recording medium 10, the support substrate 11 uses a disc-shaped substrate having a thickness of approximately 1.1 mm. One side is -11-(7) 200412593 < from near the center A spiral groove 11a and a plane lib for guiding the laser beam L are formed toward the outer edge portion. As the material for supporting the substrate 11, various materials such as glass, ceramics, or resin can be used. Among them, polycarbonate resins are generally used from the viewpoint of ease of molding. The reflecting layer 12 has a function of reflecting the laser beam L 'incident from the light transmitting layer 16 side and then emitting the laser beam L' from the light transmitting layer 16. The material of the reflective layer 12 can use various materials that can reflect the laser beam L, for example, magnesium (Mg), aluminum (A1), titanium (Ti), chromium (Cr), iron (Fe), cobalt (Co), nickel (Ni), copper (Cu), zinc (Zn), germanium (Ge), silver (Ag), platinum (Pt), gold (Au), and the like. The thickness of the reflective layer 12 is set to 5 to 300 nm. The first dielectric layer 15 and the second dielectric layer 13 have a physical and / or chemical protection function for the recording layer 14 provided therebetween, because the recording layer 14 is sandwiched between the first dielectric layer 15 and the second dielectric layer 13, After light recording, it can effectively prevent the deterioration of recorded information for a long time. The material constituting the first dielectric layer 15 and the second dielectric layer 13 is not particularly limited as long as it is a transparent dielectric in the wavelength region of the laser beam L to be used. For example, oxide, sulfide, nitride, Or a combination thereof as a main component, but from the viewpoint of preventing thermal deformation of the support substrate 11 and the like, and protecting the characteristics of the recording layer 14, AH, AIN, ZnO, ZnS, GeN, GeCrN, CeCh, SiO, Si〇2, Si3N4, SiC, La2〇3, Ta〇, Ti〇2, SiAlON (mixture of Si〇2, AI2O3, ShN4, AIN), LaSiON (La2 03, Si (h, and Si3N4) Mixtures), etc., aluminum (Al), silicon (Si), hafnium (Ce), titanium (Ti), zinc (Z η), giant (T a) oxides, nitrides, sulfides, carbides, Or -12- (8) (8) 200412593 li or a mixture thereof. The thickness of the first dielectric layer 15 and the second dielectric layer 13 is set to 3 to 200 nm. The recording layer 14 is a layer forming a reversible recording mark. Phase change material. The phase change material has different reflectance in the crystalline state and the reflectance in the amorphous state. Data recording. The recorded data uses, for example, the length of the recording mark in the amorphous state (the length from the leading edge to the trailing edge of the recording mark), and the length of a blank area such as the crystal state (the trailing edge from the recording mark to the next recording mark). Length to the margin) to indicate that in order to change the recording layer 14 from a crystalline state to an amorphous state, the pulse waveform of the laser beam L irradiated from the light incident surface 16a with a recording power Pw to a basic power Pb is used. The recording layer 14 is heated to a temperature above the melting point, and then the power of the laser beam L is set to the basic power Pb for rapid cooling. In this way, the molten region will change to an amorphous state, which is On the other hand, in order to change the recording layer 14 from an amorphous state to a crystalline state, the power of the laser beam L radiated from the light incident surface 16a is set to the deletion power Pe, and the recording layer 14 is heated to crystallize. The temperature is higher than the temperature. The area heated to the temperature above the crystallization temperature will be slowly cooled by the laser beam L leaving, and the area will become crystalline. , The recording power Pw, remove power P e, and the base power Pb is set to the relation shown by the following formula.
Pw > Pe 2 Pb -13- (9) 1 (9) 1200412593 因爲以此方式來調變雷射光束L之功率，不但記錄層 1 4之未記錄區域上會形成記錄標誌，亦可在已經形成記 錄標誌之區域上，執行和原有記錄標誌之不同記錄標誌的 直接覆蓋（直接重寫）。 構成記錄層1 4之相變化材料的種類上，雖然並未特 別限定，然而，爲了實現高速之直接重寫，應選擇從非晶 狀態到晶體狀態之構造變化上所需要的時間（晶化時間）較 短的材料，此種材料如SbTe系材料。SbTe系材料方面， 可以單獨之SbTe，爲了進一步縮短晶化時間且提高長期 保存之信頼性，亦可添加添加物。記錄層14之層厚則設 定爲2〜40nm。 光透射層16除了構成雷射光束L之射入面以外，尙 是形成雷射光束L之光路的層，其厚度上，應設定爲30 〜2 00 //m、最好設定爲1〇〇以❿。光透射層16之材料方 面，只要在使用之雷射光束L的波長區域具有夠高光透射 率之材料即可，並無特別限制，然而，最好使用丙烯酸系 或環氧系之紫外線硬化性樹脂。又，亦可使用光透射性樹 脂構成之光透射性板以及各種黏結劑或粘著劑形成光透射 層1 6 ’取代由紫外線硬化性樹脂硬化而成之薄膜。 又’構成光記錄媒體10之各層當中，設於支持基板 1 1及光透射層1 6之間的層統稱爲「資訊層」。讀取專用 之光記錄媒體上，因係利用設於支持基板11上之凹洞列 來儲存資訊’而未設置相當於記錄層14之層，此時，反 • 14 - (10) (10)200412593 \ 射層相當於資訊層。 本實施形態之光記錄媒體1 〇中，光射入面1 6 a之凹 凸抑制於特定範圍內。針對其進行更具體之説明。 第2圖係存在於光射入面16a之凹凸部分的槪略放大 剖面圖，（a)係凸缺陷部分、（b)係凹缺陷部分。 如第2圖（a)所示，若存在於光射入面16a之凸缺陷 21尖峰部分21a之光透射層16厚度爲T1、凸缺陷21端 部21b之光透射層16厚度爲T2、凸缺陷21尖峰部分21a 至端部21b爲止之圓周方向的距離（尖峰部分21a至另一 方端部21b爲止之距離、及至另一方端部21b爲止之距離 不同時，較短之一方）爲W時，本實施形態之光記錄媒體 10中，至少記錄區域內之全部凸缺陷21的變動量（T1-T2) 及變動寬度（W)間滿足下式關係。 (Tl-T2)/W^ 5.5 x1ο-4 換言之，本實施形態之光記錄媒體10中，至少記錄 區域內並不存在滿足下式之凸缺陷。 (Tl-T2)/W> 5.5 x1ο-4 又，如第2圖（b)所示，存在於光射入面16a之凹缺陷 22谷底部分22a的光透射層16厚度爲T1、凹缺陷22端 部2 2b之光透射層16的厚度爲T2、凹缺陷22谷底部分 -15- (11) (11)200412593 I i 22a至端部22b爲止之圓周方向的距離（谷底部分22a至一 方端部22b爲止之距離、及至另一方端部22b爲止之距離 不同時，較短之一方）爲W時，本實施形態之光記錄媒體 1〇中，至少記錄區域內之全部凹缺陷22的變動量（T2-T1) 及變動寬度（W)間滿足下式關係。 {T2^T\)!W ^ 5.5 xlO'4 換言之，本實施形態之光記錄媒體10中，至少記錄 區域內不存在滿足下式關係之凹缺陷。 {T2-T\)!W> 5.5x1ο-4 亦即，本實施形態之光記錄媒體i 〇中，存在於光射 入面1 6a之記錄區域的全部缺陷滿足下式關係。 \n-T2\/W£ 5.5 x1ο-4 滿足此種條件之光記錄媒體，因爲光射入面1 6a十分 平滑’不會有存在於光射入面16a之凸缺陷21或凹缺陷 22對記錄特性或再生特性產生重大影響的情形。具體而 言’使用於適合次世代型光記錄媒體之記錄及/或再生的 線速度區域（10〜19fn/s)時，可將高域面振動量抑制於0.35 // m以下、可將面振動加速度抑制於1〇m/s2以下，結果， (12) (12)200412593 ) 高域面振動或面振動加速度導致之殘留調焦誤差成分大約 爲10%以下。一般而言，殘留調焦誤差成分超過10%，則 對抖動之影響會極爲顯著，故本發明中，不會有因爲存在 於光射入面16a之凸缺陷21或凹缺陷22而使抖動顯著劣 化的情形。 此時，「面振動加速度」係指記錄及/或再生時在物 鏡上產生之加速度，「高域面振動量」係指凸缺陷21或 凹缺陷22當中，物鏡無法追隨之驟變部分的大小。 其次，針對第1圖所示之光記錄媒體10的製造方法 進行説明。重寫型光記錄媒體10之製造步驟，大致含有 成膜步驟、及起始化步驟，依成膜步驟及起始化步驟之順 序執行。 第3圖係第1圖所示光記錄媒體10之製造方法的流 程圖。 首先，以使用壓模之射出成型法，製作形成溝槽11 a 及平面lib之支持基板11(步驟S1)。然而，支持基板11 之製作並未限定爲射出成型法，亦可以2P法等其他方法 來製作。 其次，在支持基板11之表面上，在設有溝槽11a及 平面lib之面上形成反射層12(步驟S2)。反射層12之形 成上，以使用含有反射層1 2構成元素之化學種的汽相育 成法爲佳。汽相育成法如濺鍍法或真空蒸鍍法，其中，又 以濺鍍法爲佳。 其次，在反射層12上形成第2電介質層13(步驟 -17- (13) (13)200412593 Λ 53) 。第2電介質層13之形成上’亦以使用含有第2電介 質層13構成元素之化學種的汽相育成法爲佳，其中，又 以濺鍍法爲佳。 其次，在第2電介質層13上形成記錄層14(步驟 54) 。記錄層14之形成上，以使用含有記錄層14構成元 素之化學種的汽相育成法爲佳，其中，又以濺鍍法爲佳。 濺鍍後之相變化材料會成爲非晶狀態，其後，執行起始化 步驟時，會變成晶體狀態。 其次，在記錄層14上形成第1電介質層15(步驟 55) 。第1電介質層15之形成上，以使用含有第1電介質 層1 5構成元素之化學種的汽相育成法爲佳，其中又以濺 鍍法爲佳。 又，在第1電介質層15上形成光透射層16(步驟 56) 。光透射層16係例如以旋轉塗膜法實施經過粘度調整 之丙烯酸系或環氧系紫外線硬化性樹脂的塗敷，然後照射 紫外線使其硬化，或者，以黏結劑貼附光透射性樹脂所構 成之光透射性板之方式來形成。如上面所述，以旋轉塗膜 法或光透射性板之貼附等形成之光透射層1 6的表面（光射 入面16a)，平坦性容易低於CD或DVD之光射入面一光透 射性基板之表面。 如上所示，完成成膜步驟。在本發明中，將完成成膜 步驟之狀態的光記錄媒體稱爲「光記錄媒體前驅物 10’」。然而，無特別區別之必要時，爲了方便，亦會將 光記錄媒體前驅物1〇;簡稱爲「光記錄媒體」。 -18- (14) (14)200412593 其次’將光記錄媒體前驅物1 〇,載置於雷射照射裝置 (圖上未標示）之旋轉台上，在旋轉狀態下，連續照射沿溝 槽11a及平面lib之方向（圓周方向）的長度較短且垂直溝 槽11a及平面lib之方向（直徑方向）的長度較長之矩形起 始化用雷射光束，光記錄媒體前驅物1〇,每旋轉丨次，照 射位置就會朝直徑方向偏移，利用此方式，可對記錄層 1 4之幾乎整面都照射起始化用雷射光束。亦即，執行記 錄層14之起始化（步驟S7)。起始化用雷射光束照射之區 域的相變化材料，會被加熱至高於融點的溫度，其後，將 起始化用雷射光束移至遠處進行緩慢冷卻，記錄層1 4之 整面成爲晶體狀態，亦即未記錄狀態。 利用以上方式，實施起始化步驟，完成光記錄媒體 1 〇。執行起始化步驟，可使晶粒直徑變得相對較大，利用 此方式，記錄層14會有極高之反射率。 又，光記錄媒體10之製造方法上，並未限定爲上述 之製造方法，可以使用公知之光記錄媒體製造上所採用之 製造技術。 其次，針對檢查光記錄媒體之良否的方法進行説明。 執行檢査之時序上，只要在結束成膜步驟後之任何時 序皆可，如以下之説明所示，因爲記錄層14之反射率較 高時不易實施檢査，故在成膜步驟結束後、起始化步驟前 (步驟S6及步驟S7之間）執行檢査最佳。以下，即以上述 光記錄媒體前驅物1 0’爲檢査對象之實例進行説明。 第4圖係以檢查光記錄媒體之良否爲目的之檢査裝置 -19- (15) (15)200412593 1 0 0的槪略構成圖。 如第4圖所示，檢査裝置1 〇〇具有使光記錄媒體前驅 物10’旋轉之轉軸馬達101、對光記錄媒體前驅物10’照射 檢査用雷射光束L1之光學系110、使光學系11〇朝光記 錄媒體前驅物10’之直徑方向移動之轉盤馬達102、對光 學系110提供雷射驅動信號103a之雷射驅動電路103、對 光學系110提供透鏡驅動信號104 a之透鏡驅動電路 1 04、以及控制轉軸馬達1 0 1、轉盤馬達1 02、雷射驅動電 路103、及透鏡驅動電路104之控制器105。 光學系110則具有依據雷射驅動信號103a產生檢査 用雷射光束L 1之雷射光源111、將雷射光源1 1 1產生之 檢査用雷射光束L 1轉換成平行光線之硼砂石蠟准直器 112、將檢査用雷射光束L1及反射光L2分離之射束裂光 鏡113、對光記錄媒體前驅物10’照射檢査用雷射光束L1 之光讀寫頭114、以及依據檢査用雷射光束之反射光L2 產生調焦誤差信號FE之光檢器115。 第5圖係光讀寫頭1 14之構成槪略圖。如第5圖所 示，光讀寫頭114具有實施檢査用雷射光束L1之集光的 物鏡114a、依據透鏡驅動信號l〇4a使物鏡114a上下移動 之作動器1 14b、固定於物鏡1 14a上之永久磁鐵1 14c、以 及環設於永久磁鐵114c之周圍的線圈114d。永久磁鐵 1 14c、及環繞其之線圈1 14d係具有以檢測物鏡1 14a之上 下方向的位置爲目的之位置檢測器的機能，流過線圈 1 1 4d之電流會被當做位置檢測信號P並提供給控制器 -20- (16) ] 1 (16) ] 1200412593 105 ° 轉軸馬達101係在控制器105之控制下，使光記錄媒 體前驅物10’以期望之轉數旋轉。轉盤馬達102係在控制 器105之控制下，使光學系110朝光記錄媒體前驅物1(Τ 之直徑方向移動。雷射驅動電路103係在控制器105之控 制下，對光學系11 〇內之雷射光源111提供雷射驅動信號 103a。透鏡驅動電路104係在控制器105之控制下，對光 讀寫頭11 4提供透鏡驅動信號104a。如上面所述，接收到 透鏡驅動信號104a之光讀寫頭114內的作動器114 b，會 依據信號使物鏡1 14a上下移動。利用此方式，可使檢査 用雷射光束L1之束點正確地聚焦於期望之面上。 控制器105上，含有聚焦控制電路l〇5a及判斷電路 105b，聚焦控制電路105a爲活化狀態時，可以控制透鏡 驅動電路1 04，使檢査用雷射光束L1之束點處於對焦於期 望之面上的狀態。又，判斷電路l〇5b係判斷檢査對象之 光記錄媒體前驅物1 〇’爲良品或不良品之判斷電路，依據 光檢器1 1 5產生之p焦誤差信號FE及位置檢測器產生之 位置檢測信號P執行判斷。 第6圖係以檢查光記錄媒體之良否爲目的之方法的流 程圖。 光記錄媒體良否之檢査上，係裝檢査對象之光記錄媒 體前驅物10’安裝於檢査裝置1〇〇後，首先，在控制器 1 0 5之控制下，利用轉軸馬達1 〇丨使光記錄媒體前驅物 1(Τ旋轉（步驟S 11)，然後，驅動雷射驅動電路103對光 -21 - (17) (17)200412593 i i 記錄媒體前驅物1 0 ’照射檢査用雷射光束L 1 (步驟s 1 2)。 此時，檢査位置可以驅動轉盤馬達1 02實施光記錄媒體前 驅物1 0’之直徑方向的調整。 利用轉軸馬達101使光記錄媒體前驅物10’旋轉時， 最好將相對於檢査用雷射光束L1之線速度控制爲一定， 此時之線速度，應和實際記錄時及/或再生時之線速度大 致一致。檢査時之線速度若和記錄時及/或再生時之線速 度大致一致，則可在考量存在於光射入面1 6a上之凹凸對 實際資料記錄及/或再生之影響的情況下進行檢査。 其次，在控制器105之控制下，驅動透鏡驅動電路 104，使檢査用雷射光束L1聚焦於光記錄媒體前驅物1(Γ 之光射入面16a(步驟S 13)。 接著，活化控制器105內之聚焦控制電路l〇5a，使檢 査用雷射光束L1對焦於光記錄媒體前驅物10’之光射入面 16a(步驟S 14)。利用此方式，可即時對光讀寫頭114內 之作動器1 14b提供透鏡驅動信號104a，使物鏡1 14a追隨 光射入面16a之凹凸。 第7圖係檢査用雷射光束L 1對焦於光記錄媒體前驅 物10’之光射入面16a的狀態模式圖。因爲光射入面16a 通常具有5%程度之反射率，以和資料記錄時或再生時之 對焦於記錄層14時相同的方式，亦可將其對焦於光射入 面16a上，相對於光射入面16a，若記錄層14之反射率過 高，則在光射入面16a上之檢査用雷射光束L1的對焦會 較爲困難。因此，檢査時，記錄層14之反射率應較低。 -22- (18) 200412593 如第6圖所示，檢査步驟以在起始化步驟之前（步驟 及步驟S 7之間）實施爲佳，就是基於上述理由。 此狀態下，控制器105含有之判斷電路l〇5b會 光讀寫頭114提供之位置檢測信號P及光檢器115提 調焦誤差信號FE，並依據該信號分別計算面振動加 及高域面振動量（步驟S 1 5)。利用下述方式，實施依 置檢測信號P之面振動加速度計算、及依據調焦誤差 FE之高域面振動量計算。 亦即，若物鏡114a和存在於光射入面16a之表 的凹凸連動而上下移動，則位置檢測信號P應會顯示 連動之電流値，在判斷電路1 05b內對位置檢測信號 示之物鏡1 1 4a的位置進行2次微分，可以得到物鏡 上產生之加速度。另一方面，即使光射入面16a之表 存在凹凸時，和其連動之物鏡114a未能上下移動時 即，因凹凸變化太大而使物鏡11 4 a無法追隨時，位 測信號P上不會出現變化。 如此，參照位置檢測信號P，當光射入面16a之 上存在凹凸時，可計算物鏡114可追隨之凹凸會對 1 1 4a產生何種程度之加速度，亦即，可計算「面振 速度」。 又，即使光射入面16a之表面上存在凹凸，但因 化十分大而使物鏡114a無法追隨時，檢査用雷射光] 之焦點會偏離光射入面1 6a，其偏離量會以調焦誤差 FE顯示出來。另一方面’雖然光射入面i6a之表面 S 6 監視 供之 速度 據位 信號 面上 和其 P所 114a 面上 ，亦 置檢 表面 物鏡 動加 其變 ^ L1 信號 上存 -23- (19) (19)200412593 在凹凸時’而物鏡 U4a隨其連動而且正確上下移動時， 調焦誤差信號FE會顯示正確聚焦。 因此’參照調焦誤差信號FE，可知道存在於光射入 面16a之表面上之凹凸當中是否有物鏡n4a無法追隨之 急速變化之凹凸的存在，且可計算其大小，亦即，計算 「高域面振動量」。 又’物鏡114a可追隨之凹凸的限界會因爲使用之構 件而不同，使用CD用之構件時，約爲500Hz程度。亦 即，存在於光射入面16a之表面上的凹凸當中，若其頻率 成分爲約500Hz以下，則物鏡114a可追隨，然而，當其 頻率成分超過約500Hz時，物鏡1 14a將無法追隨。 如此，參照光讀寫頭1 14提供之位置檢測信號p、及 光檢器11 5提供之調焦誤差信號FE，可以計算代表光射 入面1 6a之表面性的面振動加速度及高域面振動量。 其次，控制器1 0 5含有之判斷電路1 〇 5 b，會在步驟 S 1 5，依據計算所得之面振動加速度及高域面振動量，判 斷檢査對象之光記錄媒體前驅物10’爲良品或不良品（步驟 S16)。 第8圖係步驟S 1 6之判斷方法的流程圖。 步驟S 16中，首先，會參照由調焦誤差信號fe所得 之高域面振動量，判斷其是否超過高域面振動量之定限値 (步驟S 2 1)。此時，「高域面振動量之定限値」係存在於 光射入面16a之凹凸當中，會造成物鏡114a無法追隨之 急劇變化之凹凸的可容許尺寸的最大値， -24- (20) (20)200412593 \T\-T2\!W> 5.5xl〇-4 而爲了排除i:式條件之E]凸缺陷’只要將高域面振動 量之定限値設定爲0.3 5 // m即可。以此方式設定高域面振 動量之定限値，可使實際記錄及/或再生時之高域面振動 導致的殘留調焦誤差成分成爲大致10%以下。 差成分若大於10%，對抖動的影響會十分明顯，故在本檢 査步驟中必須排除此種光記錄媒體前驅物1 〇,。 此外，步驟S 2 1之判斷上，若高域面振動量之最大値 超過定限値（S 21 :是），則會判斷爲不良品。 另一方面，面振動量之最大値若未超過定限値（S21 : 否），接著，析出光射入面16a之面振動加速度的最大 値，判斷其是否超過面振動加速度之定限値（步驟S22)。 此時，「面振動加速度之定限値」係指依據存在於光射入 面16a上之凹凸而在物鏡114a上產生之加速度的最大容 許値，此種設定之目的，在排除具有即使檢査裝置1 〇〇可 追隨但因爲使用者實際使用之驅動器性能而可能使聚焦偏 離之面振動的光記錄媒體前驅物10’。具體而言’ \T\-T2\!W> 5.5x1ο-4 爲了排除滿足上述條件之凹凸缺陷’將面振動加速度 之定限値設定爲l〇m/s2即可。以此方式設定面振動加速度 -25- (21) (21)200412593 之定限値，可使實際記錄及/或再生時之高域面振動所導 致的殘留調焦誤差成分爲大約10%以下。在步驟S22之判 斷中，若面振動加速度之最大値超過定限値（S 22 :是）， 則判斷爲不良品。 另一方面，若面振動加速度之最大値未規過定限値 (S22 :否），則最後會將其判斷成良品，執行如第3圖所 示之起始化步驟（步驟S7)。 第9圖係依據第8圖所示基準判斷爲良品之區域的模 式圖。如第9圖所示，依據第8圖所示基準執行判斷時， 判斷爲良品之區域係圖上2邊和兩軸圍成之四角形，可 知，只有高域面振動量及面振動加速度皆爲特定定限値以 下時才會判斷成良品。 又，上述光記錄媒體之檢査方法及檢査裝置只是一個 實例而已，亦可利用其他方法， \Tl^T2\/W> 5.5 x1ο-4 排除具有滿足上式條件之凹凸缺陷的光記錄媒體。 例如，上述檢査裝置1 〇〇中，係採用由以產生位置檢 測信號Ρ爲目的之永久磁鐵1 1 4c及線圈1 1 4d所構成之位 置檢測器，亦可利用其他方法來檢測物鏡n 4a上產生之 加速度。例如，以静電電容型位置檢測器取代永久磁鐵 1 14c及線圈丨Md，利用此方式’亦可檢測物鏡n4a上產 生之加速度。 -26- (22) (22)200412593 又，上述之檢査方法中，係使檢査用雷射光束L 1在 光記錄媒體之光射入面上聚焦來檢查光射入面之表面性， 然而，亦可對旋轉中之光記錄媒體的光射入面照射電磁波 或聲波，測量多普勒效果導致之反射波的頻率偏差，檢查 光射入面之表面性。 如以上説明之本實施形態的光記錄媒體1 0，具有設 於支持基板1 1之相反側面的薄光透射層1 6，因爲存在於 其表面一光射入面1 6a之記錄區域內的凹凸缺陷全部滿足 下式條件， \T\-T2\IW ^ 5.5xlO'4 故存在於光射入面1 6a上之凹凸缺陷不會對記錄特性 或再生特性產生嚴重影響。 又，本發明之「光射入面」係指光記錄媒體之表面上 記錄及/或再生時使用之雷射光束射入的表面，不必爲光 透射層16之表面。因此，光透射層16之表面上設有硬覆 層等時，其表面爲「光射入面」。 本發明並未受限於以上之實施形態，在申請專利範圍 之發明範圍內可實施各種變更，當然，前述各種變更亦包 含於本發明之範圍內。 實施例 以下，利用實施例針對本發明進行更具體之説明，然 -27- (23) (23)200412593 而，本發明並未受限於這些實施例。 [樣本之製作] 首先，利用射出成型法’製作厚度1.1mm、直徑 120mm、表面形成溝槽lla及平面lib(軌距（溝槽之間 距）= 0.3// m)、由聚碳酸酯構成之碟狀支持基板1 1。 其次，將此支持基板11設定於濺鍍裝置，以濺鍍法 依序在形成溝槽11a及平面lib之側面上形成由銀（Ag)、 鈀（Pd)、及銅（Cu)之合金所構成之厚度100nm的反射層 12、由Al2〇3所構成之厚度20nm的第2電介質層13、原 子比爲SbTiTe^GeTln!之厚度12nm的記錄層14、以及由 ZnS及Si〇2之混合物（莫耳比=80 ·· 20)所構成之厚度130nm 的第1電介質層1 5。 其次，在第1電介質層15上，以旋轉塗膜法覆蓋紫 外線硬化性樹脂（25 ° C之粘度=5000cP)，再對其照射紫外 線形成厚度1 00 // m之光透射層1 6。旋轉塗膜時’使用封 閉夾具封閉支持基板11之中心孔，以紫外線硬化性樹脂 覆蓋此夾具後，將旋轉數設定爲2000rpm實施8秒鐘旋 轉。 利用以上之方法製作6個樣本# 1〜#6 ° (樣本之評估） 其次，雷射聚焦變位計調查存在於樣本# 1〜#6之光 透射層1 6上的最大凹凸缺陷（塗布不均）尺寸。檢測結果 -28- (24) 200412593 如表1所示。 表1 T1 (// m) T2 (β m) IT1-T2I (β m) W (β m) IT1-T2I/W 樣本#1 100.2 99.9 0.3 1830 1.6 X ΙΟ·4 樣本#2 100.6 99.8 0.8 3200 2.5 X ίο·4 樣本#3 102.3 100.2 2.1 4200 5.0 X ΙΟ'4 樣本#4 101.5 99.4 2.1 2600 8.1 X 1〇·4 樣本#5 101.1 100 1.1 1900 5.8 X ΙΟ'4 樣本#6 102.1 98.9 3.2 1200 2.7 X ΙΟ'3 如表1所示，樣本#1〜#3滿足 \T\-T2\IW ^ 5.5 x1ο*4 ， 然而，樣本#4〜#6並未滿足上式而爲 |Γ1-Γ2|/ίΓ > 5.5X1CT4 ° 其次，將上述樣本#1〜#6分別裝設於檢査裝置（新電 子工業社製ODA—II型機械精度檢測器），實施11.4m/sec 之線速度的旋轉，同時對光射入面1 6a照射檢査用雷射光 束L 1。其次，依據所得之位置檢測信號P及調焦誤差信 -29- (25) (25)200412593 號FE，計算面振動加速度及高域面振動量。檢測結果如 表2所示。 表2 高域面振動量（// m) 面振動加速度 (m/s2) 樣本#1 0.24 6.25 樣本#2 0.28 7.82 樣本#3 0.33 8.56 樣本#4 0.40 16.87 樣本#5 0.36 10.21 樣本#6 0.45 18.60 如表2所示，滿足 \T\-T2\IW ^ 5.5X10-4 之樣本#1〜#3的局域面振動量爲〇·35// m以下，面振動加 速度爲10m/s2以下，然而， \T\-T2\/W> 5.5 x1ο-4 之樣本#4〜#6的高域面振動量爲〇· 35 // m以下，面振動加 速度爲l〇m/ s 2以上。 -30- (26) (26)200412593 其次，將上述樣本#1〜#6分別設定於光碟評估裝置 (PULSTEC公司製DDU1000)，以11.4m/sec之線速度進行 旋轉，經由數値孔徑爲0.85之物鏡，沿著磁軌對記錄層 14照射波長爲405nm之雷射光束L，測量得到之殘留調焦 誤差成分。 此時，殘留調焦誤差成分之檢測方法如下所示。 首先，檢測在未實施聚焦伺服而變動樣本及物鏡之距 離時所得到之調焦誤差信號，求取代表樣本及物鏡之距離 (變位）、以及調焦誤差信號之輸出之關係的聚焦感度曲 線。求取此聚焦感度曲線之正側尖峰値及負側尖峰値之 差，將此値定義爲^ F」。其次，利用刀口法檢測實施聚 焦伺服時所得到之調焦誤差信號，並求取其正側尖峰値及 負側尖峰値之差，將此値定義爲「R」。並利用R/F計算 殘留調焦誤差成分。 又，使用上述評估裝置，在和上述相同之條件下，對 樣本#1〜#6分別記錄1，7RLL調變方式之由2T〜8T信號 所構成之混合信號。其次，再生記錄之混合信號，檢測其 抖動。此時之抖動係指時鐘抖動，利用時間間隔分析器求 取再生信號之「波動（σ )」，利用σ /Tw(Tw :時鐘之1週 期）進行計算。 測定之結果如奉3所示。 -31 - (27) (27)200412593 表3 殘留調焦誤差成分（％) 抖動（％、 樣本#1 4.3 8.3 樣本#2 6.2 8.8 樣本#3 8.8 9.4 樣本#4 12.5 14.2 樣本#5 11.3 1 1.6 樣本#6 15.6 _16.3Pw > Pe 2 Pb -13- (9) 1 (9) 1200412593 Because the power of the laser beam L is adjusted in this way, not only a recording mark will be formed on the unrecorded area of the recording layer 14 but also an already recorded mark In the area where the recording mark is formed, a direct overwriting (direct rewriting) of a recording mark different from the original recording mark is performed. Although the type of the phase change material constituting the recording layer 14 is not particularly limited, in order to achieve high-speed direct rewriting, the time required for the structural change from the amorphous state to the crystalline state (crystallization time) should be selected. ) Shorter materials, such as SbTe-based materials. For SbTe-based materials, SbTe alone can be used. In order to further shorten the crystallization time and improve the reliability of long-term storage, additives can also be added. The thickness of the recording layer 14 is set to 2 to 40 nm. In addition to constituting the incident surface of the laser beam L, the light transmitting layer 16 is a layer forming the optical path of the laser beam L, and its thickness should be set to 30 to 2 00 // m, and preferably 100. To ❿. The material of the light transmitting layer 16 is not particularly limited as long as it has a material with sufficient light transmittance in the wavelength region of the laser beam L to be used. However, it is preferable to use an acrylic or epoxy-based ultraviolet curable resin. . In addition, a light-transmitting layer 1 6 'composed of a light-transmitting resin made of a light-transmitting resin and various adhesives or adhesives may be used instead of a thin film made of an ultraviolet-curable resin. Among the layers constituting the optical recording medium 10, a layer provided between the support substrate 11 and the light transmitting layer 16 is collectively referred to as an "information layer". The read-only optical recording medium uses a row of recessed holes provided on the support substrate 11 to store information, and a layer corresponding to the recording layer 14 is not provided. At this time, the reverse • 14-(10) (10) 200412593 \ The emission layer is equivalent to the information layer. In the optical recording medium 10 of this embodiment, the convexity and convexity of the light incident surface 16a are suppressed within a specific range. This will be described in more detail. Fig. 2 is a slightly enlarged cross-sectional view of the uneven portions existing on the light incident surface 16a. (A) is a convex defect portion, and (b) is a concave defect portion. As shown in FIG. 2 (a), if the thickness of the light transmitting layer 16 of the convex defect 21 peak portion 21a existing on the light incident surface 16a is T1, the thickness of the light transmitting layer 16 of the convex portion 21 end 21b is T2, convex When the distance in the circumferential direction from the peak portion 21a to the end portion 21b of the defect 21 (the distance between the peak portion 21a to the other end portion 21b and the distance to the other end portion 21b is different, the shorter one) is W, In the optical recording medium 10 of this embodiment, at least the variation (T1-T2) and the variation width (W) of all the convex defects 21 in the recording area satisfy the relationship of the following formula. (Tl-T2) / W ^ 5.5 x1ο-4 In other words, in the optical recording medium 10 of this embodiment, at least the recording area does not have a convex defect satisfying the following formula. (Tl-T2) / W > 5.5 x1ο-4 As shown in FIG. 2 (b), the thickness of the light transmitting layer 16 of the concave defect 22 in the valley portion 22a of the light incident surface 16a is T1 and the concave defect 22 The thickness of the light transmitting layer 16 at the end 2 2b is T2, the concave defect 22 valley bottom portion -15- (11) (11) 200412593 I i 22a to the circumferential distance from the end portion 22b (valley bottom portion 22a to one end portion) When the distance to 22b and the distance to the other end portion 22b are different, the shorter one) is W. In the optical recording medium 10 of this embodiment, at least the amount of change in the total number of concave defects 22 in the recording area ( T2-T1) and the variation width (W) satisfy the following relationship. {T2 ^ T \)! W ^ 5.5 xlO'4 In other words, in the optical recording medium 10 of this embodiment, at least the recording area does not have a concave defect satisfying the following relationship. {T2-T \)! W > 5.5x1ο-4 In other words, in the optical recording medium i 0 of this embodiment, all defects existing in the recording area of the light incident surface 16a satisfy the following relationship. \ n-T2 \ / W £ 5.5 x1ο-4 An optical recording medium satisfying this condition, because the light incident surface 16a is very smooth. 'There will be no convex defects 21 or concave defects 22 on the light incident surface 16a. When recording or reproduction characteristics have a significant effect. Specifically, when used in a linear velocity region (10 to 19 fn / s) suitable for recording and / or reproduction of a next-generation optical recording medium, the amount of high-domain surface vibration can be suppressed to 0.35 // m or less. The vibration acceleration is suppressed below 10 m / s2. As a result, (12) (12) 200412593) The residual focus error component caused by high-domain surface vibration or surface vibration acceleration is about 10% or less. Generally speaking, if the residual focus error component exceeds 10%, the effect on the jitter will be extremely significant. Therefore, in the present invention, the jitter is not significant because of the convex defects 21 or concave defects 22 existing on the light incident surface 16a. Deterioration. At this time, "surface vibration acceleration" refers to the acceleration generated on the objective lens during recording and / or reproduction, and "high-area surface vibration amount" refers to the size of the sudden change of the objective lens among the convex defects 21 or concave defects 22. . Next, a method for manufacturing the optical recording medium 10 shown in Fig. 1 will be described. The manufacturing steps of the rewritable optical recording medium 10 generally include a film formation step and an initialization step, and are performed in the order of the film formation step and the initialization step. Fig. 3 is a flowchart of a method of manufacturing the optical recording medium 10 shown in Fig. 1. First, by using an injection molding method using a stamper, a supporting substrate 11 on which a groove 11 a and a plane lib are formed is produced (step S1). However, the production of the support substrate 11 is not limited to the injection molding method, and may be produced by other methods such as the 2P method. Next, a reflective layer 12 is formed on the surface of the support substrate 11 on the surface provided with the groove 11a and the plane lib (step S2). The formation of the reflective layer 12 is preferably a vapor phase growth method using a chemical species containing constituent elements of the reflective layer 12. A vapor phase growth method such as a sputtering method or a vacuum evaporation method is preferred, and a sputtering method is preferred. Next, a second dielectric layer 13 is formed on the reflective layer 12 (steps -17- (13) (13) 200412593 Λ 53). The formation of the second dielectric layer 13 is also preferably a vapor-phase incubation method using a chemical species containing constituent elements of the second dielectric layer 13, and a sputtering method is more preferable. Next, a recording layer 14 is formed on the second dielectric layer 13 (step 54). The formation of the recording layer 14 is preferably a vapor phase growth method using a chemical species containing constituent elements of the recording layer 14, and a sputtering method is more preferable. The phase change material after sputtering will become amorphous, and thereafter, it will become crystalline when the initialization step is performed. Next, a first dielectric layer 15 is formed on the recording layer 14 (step 55). For the formation of the first dielectric layer 15, a vapor phase breeding method using a chemical species containing the constituent elements of the first dielectric layer 15 is preferable, and a sputtering method is more preferable. A light transmitting layer 16 is formed on the first dielectric layer 15 (step 56). The light-transmitting layer 16 is formed by, for example, applying a viscosity-adjusted acrylic or epoxy-based ultraviolet curable resin by a spin coating method, and then curing by irradiating ultraviolet rays, or by attaching a light-transmitting resin with an adhesive. It is formed by a light-transmitting plate. As described above, the surface (light incident surface 16a) of the light-transmitting layer 16 formed by the spin-coating method or the attachment of a light-transmitting plate is less flat than the light-incident surface of a CD or DVD. The surface of a light-transmitting substrate. As shown above, the film formation step is completed. In the present invention, the optical recording medium in a state where the film formation step is completed is referred to as "optical recording medium precursor 10 '". However, when no special distinction is necessary, the optical recording medium precursor 10 will be referred to as "optical recording medium" for convenience. -18- (14) (14) 200412593 Secondly, the optical recording medium precursor 10 is placed on a rotating table of a laser irradiation device (not shown in the figure), and in a rotating state, continuous irradiation is performed along the groove 11a. And the length of the direction of the plane lib (circumferential direction) is shorter and the length of the vertical groove 11a and the direction of the plane lib (diameter direction) is longer. Rotating 丨 times, the irradiation position will be shifted in the diameter direction. In this way, almost the entire surface of the recording layer 14 can be irradiated with a laser beam for initialization. That is, the initialization of the recording layer 14 is performed (step S7). The phase change material in the area irradiated with the laser beam for the initiation will be heated to a temperature higher than the melting point. Thereafter, the initiation laser beam will be moved to a distant place for slow cooling. The plane becomes a crystalline state, that is, an unrecorded state. In the above manner, the initialization step is performed to complete the optical recording medium 10. By performing the initializing step, the crystal grain diameter can be relatively large. In this way, the recording layer 14 will have extremely high reflectance. The manufacturing method of the optical recording medium 10 is not limited to the above-mentioned manufacturing method, and a known manufacturing technique used in manufacturing the optical recording medium can be used. Next, a method for checking the quality of the optical recording medium will be described. As for the timing of performing the inspection, any timing after the completion of the film formation step is acceptable, as shown below, because it is not easy to perform the inspection when the reflectance of the recording layer 14 is high, so after the end of the film formation step, It is best to perform a check before the change step (between steps S6 and S7). Hereinafter, an example in which the above-mentioned optical recording medium precursor 10 'is used as an inspection object will be described. Fig. 4 is a schematic configuration diagram of an inspection device for inspecting the quality of an optical recording medium. (19) (15) (15) 200412593 1 0 0 As shown in FIG. 4, the inspection device 100 includes a spindle motor 101 that rotates the optical recording medium precursor 10 ′, an optical system 110 that irradiates the optical recording medium precursor 10 ′ with a laser beam L1 for inspection, and an optical system 110. A turntable motor 102 moving in the diameter direction of the optical recording medium precursor 10 ', a laser drive circuit 103 that provides a laser drive signal 103a to the optical system 110, and a lens drive circuit that provides a lens drive signal 104a to the optical system 110 104, and a controller 105 that controls the spindle motor 101, the turntable motor 102, the laser driving circuit 103, and the lens driving circuit 104. The optical system 110 has a laser light source 111 for generating the inspection laser beam L 1 according to the laser driving signal 103 a, and a borax paraffin collimator that converts the inspection laser beam L 1 generated by the laser light source 1 1 1 into parallel rays. Device 112, beam splitting mirror 113 that separates inspection laser beam L1 and reflected light L2, optical read-write head 114 that irradiates optical recording medium precursor 10 'with inspection laser beam L1, and inspection laser The reflected light L2 of the light beam generates a photodetector 115 of the focus error signal FE. Fig. 5 is a schematic diagram showing the constitution of the optical pickup head 114. As shown in FIG. 5, the optical pickup head 114 includes an objective lens 114 a that collects the laser beam L1 for inspection, an actuator 1 14 b that moves the objective lens 114 a up and down based on the lens drive signal 104a, and is fixed to the objective lens 1 14 a. The permanent magnet 114c and the coil 114d are provided around the permanent magnet 114c. The permanent magnet 1 14c and the coil 1 14d surrounding it have the function of a position detector for detecting the position of the objective lens 1 14a in the up and down direction. The current flowing through the coil 1 14d is used as a position detection signal P and provided. Give the controller -20- (16)] 1 (16)] 1200412593 105 ° The spindle motor 101 is controlled by the controller 105 to rotate the optical recording medium precursor 10 'at a desired number of revolutions. The turntable motor 102 is controlled by the controller 105 to move the optical system 110 toward the optical recording medium precursor 1 (T). The laser drive circuit 103 is controlled by the controller 105 to control the optical system 110 within The laser light source 111 provides a laser driving signal 103a. The lens driving circuit 104 provides a lens driving signal 104a to the optical read-write head 114 under the control of the controller 105. As described above, the lens driving signal 104a is received. The actuator 114 b in the optical pickup head 114 moves the objective lens 1 14 a up and down according to the signal. In this way, the beam spot of the inspection laser beam L1 can be accurately focused on the desired surface. On the controller 105 It includes a focus control circuit 105a and a determination circuit 105b. When the focus control circuit 105a is in an activated state, the lens drive circuit 104 can be controlled so that the beam spot of the inspection laser beam L1 is focused on a desired surface. In addition, the judgment circuit 105b is a judgment circuit for judging whether the optical recording medium precursor 10 ′ of the inspection object is a good product or a defective product, based on the p-focus error signal FE generated by the photodetector 1 15 and the position detector product. The judgment of the position detection signal P is performed. Fig. 6 is a flowchart of a method for checking the quality of the optical recording medium. For the quality of the optical recording medium, the optical recording medium precursor 10 'for inspection is installed on the After inspecting the device 100, first, under the control of the controller 105, the optical recording medium precursor 1 is rotated (T is rotated (step S11)) by the spindle motor 10, and then the laser driving circuit 103 is driven to Optical-21-(17) (17) 200412593 ii The recording medium precursor 10 'irradiates the inspection laser beam L1 (step s 1 2). At this time, the inspection position can drive the turntable motor 102 to implement the optical recording medium precursor The diameter direction of the object 10 'is adjusted. When the optical recording medium precursor 10' is rotated by the rotating shaft motor 101, it is preferable to control the linear velocity with respect to the inspection laser beam L1 to be constant. The linear velocity at this time should be It is approximately the same as the linear velocity during actual recording and / or reproduction. If the linear velocity during inspection and approximately linear velocity during recording and / or reproduction, the unevenness existing on the light incident surface 16a can be considered. For actual information The inspection is performed under the influence of recording and / or reproduction. Next, under the control of the controller 105, the lens driving circuit 104 is driven to focus the inspection laser beam L1 on the optical recording medium precursor 1 (the light of Γ enters Surface 16a (step S13). Next, the focus control circuit 105a in the controller 105 is activated so that the inspection laser beam L1 is focused on the light incident surface 16a of the optical recording medium precursor 10 '(step S14). In this way, the lens driving signal 104a can be provided to the actuator 1 14b in the optical head 114 immediately, so that the objective lens 1 14a follows the unevenness of the light incident surface 16a. Fig. 7 is a schematic diagram showing a state where the inspection laser beam L1 is focused on the light incident surface 16a of the optical recording medium precursor 10 '. Because the light incident surface 16a usually has a degree of reflectance of 5%, it can also be focused on the light incident surface 16a in the same manner as when the data recording or reproduction is focused on the recording layer 14. If the reflectance of the recording layer 14 on the incident surface 16a is too high, it will be difficult to focus the laser beam L1 for inspection on the light incident surface 16a. Therefore, the reflectance of the recording layer 14 should be low when inspected. -22- (18) 200412593 As shown in Figure 6, the inspection step is preferably performed before the initiation step (between step and step S 7), for the reasons described above. In this state, the judgment circuit 105b included in the controller 105 raises the position detection signal P provided by the optical read-write head 114 and the focus detection signal FE of the photodetector 115, and calculates the surface vibration plus and the high region based on the signals. Surface vibration amount (step S 1 5). In the following manner, the calculation of the surface vibration acceleration according to the detection signal P and the calculation of the high-surface surface vibration amount based on the focus error FE are performed. That is, if the objective lens 114a and the unevenness existing on the surface of the light incident surface 16a are moved up and down, the position detection signal P should display a linked current 値, and the objective lens 1 indicated by the position detection signal in the judgment circuit 105b Differentiate the position of 1 4a twice to obtain the acceleration generated on the objective lens. On the other hand, even when there is unevenness on the surface of the light incident surface 16a, when the associated objective lens 114a fails to move up and down, that is, the objective lens 11 4a cannot be tracked at any time because the unevenness is too large, and the position measurement signal P does not appear. Changes will occur. In this way, referring to the position detection signal P, when there is unevenness on the light incident surface 16a, it is possible to calculate the degree of acceleration that the objective lens 114 can follow the unevenness to 1 1 4a, that is, the "surface vibration velocity" can be calculated. . In addition, even though there is unevenness on the surface of the light incident surface 16a, the focal length of the objective lens 114a cannot be tracked due to the large size, and the focus of the inspection laser light will deviate from the light incident surface 16a. The error FE is displayed. On the other hand, although the surface S 6 of the light incident surface i6a monitors the speed signal signal surface and its P 114a surface, the inspection surface objective lens is also changed ^ L1 signal is stored -23- (19 ) (19) 200412593 When the objective lens U4a moves along with it when it is concave and convex, and it moves correctly up and down, the focus error signal FE will show correct focus. Therefore, with reference to the focusing error signal FE, it can be known whether there is any objective lens n4a among the unevenness existing on the surface of the light incident surface 16a that cannot follow the rapid change, and the size can be calculated, that is, "high Domain surface vibration amount. " Also, the limit that the objective lens 114a can follow the unevenness varies depending on the component used. When using a component for CD, it is about 500 Hz. That is, among the unevenness on the surface of the light incident surface 16a, if the frequency component is about 500 Hz or less, the objective lens 114a can follow. However, when the frequency component exceeds about 500 Hz, the objective lens 114a cannot follow. In this way, referring to the position detection signal p provided by the optical read-write head 1 14 and the focus error signal FE provided by the photodetector 115, it is possible to calculate the surface vibration acceleration and the high-domain surface representing the surface properties of the light incident surface 16a. The amount of vibration. Secondly, the judgment circuit 1 05b included in the controller 105 will judge the optical recording medium precursor 10 'of the inspection object as a good product at step S15 based on the calculated surface vibration acceleration and the high-domain surface vibration amount. Or defective product (step S16). FIG. 8 is a flowchart of the determination method of step S 16. In step S16, first, the high-domain surface vibration amount obtained from the focus error signal fe is referred to determine whether it exceeds a fixed limit 値 of the high-domain surface vibration amount (step S 2 1). At this time, the "constant limit of the amount of vibration in the high-domain plane" exists in the unevenness of the light incident surface 16a, and the maximum allowable size of the unevenness of the objective lens 114a that cannot follow the sharply changing unevenness, -24- (20 ) (20) 200412593 \ T \ -T2 \! W > 5.5xl0-4 And in order to exclude i: E condition of convex condition] convex defect 'Just set the upper limit of the amount of vibration of the high-domain surface 面 to 0.3 5 // m Just fine. Setting the fixed-limit value of the high-domain surface vibration in this way allows the residual focus error component caused by high-domain surface vibration during actual recording and / or reproduction to be approximately 10% or less. If the difference component is greater than 10%, the effect on the jitter will be very obvious. Therefore, this optical recording medium precursor must be excluded in this inspection step. In addition, in the judgment of step S 21, if the maximum 値 of the high-level surface vibration amount exceeds a predetermined limit 値 (S 21: Yes), it is judged as a defective product. On the other hand, if the maximum surface vibration amount 値 does not exceed the fixed limit S (S21: No), then the maximum surface vibration acceleration 光 of the light incident on the surface 16a is precipitated to determine whether it exceeds the fixed limit 面 of the surface vibration acceleration. Step S22). At this time, the "constant limit of surface vibration acceleration" refers to the maximum allowable acceleration of the objective lens 114a based on the unevenness existing on the light incident surface 16a. The purpose of this setting is to exclude even the inspection device. 1 00. An optical recording medium precursor 10 'that can follow but may vibrate off-focus due to the performance of the drive actually used by the user. Specifically, '\ T \ -T2 \! W > 5.5x1ο-4 In order to eliminate irregularities satisfying the above-mentioned conditions', the limit of the surface vibration acceleration 加速度 may be set to 10 m / s2. Setting the surface vibration acceleration -25- (21) (21) 200412593 in this way allows the residual focus error component caused by high-domain surface vibration during actual recording and / or reproduction to be approximately 10% or less. In the judgment of step S22, if the maximum value of the surface vibration acceleration exceeds a predetermined limit (S22: YES), it is judged as a defective product. On the other hand, if the maximum acceleration of surface vibration is not specified (S22: No), it will be judged as a good product, and the initialization step shown in FIG. 3 will be executed (step S7). Fig. 9 is a pattern diagram of a region judged to be a good product based on the criteria shown in Fig. 8. As shown in Figure 9, when the judgment is performed according to the benchmark shown in Figure 8, the area judged to be a good product is a quadrangle surrounded by 2 sides and two axes on the map. It can be seen that only the high-level surface vibration amount and the surface vibration acceleration are Goodness is judged only when the specific limit is set below 値. In addition, the above-mentioned inspection method and inspection device of the optical recording medium are just examples, and other methods may also be used. \ Tl ^ T2 \ / W > 5.5 x1ο-4 Exclude optical recording media having irregularities that satisfy the above-mentioned conditions. For example, in the inspection device 100 described above, a position detector composed of a permanent magnet 1 1 4c and a coil 1 1 4d for generating a position detection signal P is used, and other methods can be used to detect the objective lens n 4a. The resulting acceleration. For example, instead of the permanent magnet 114c and the coil Md, an electrostatic capacitance type position detector can be used to detect the acceleration generated on the objective lens n4a. -26- (22) (22) 200412593 In the above inspection method, the inspection laser beam L 1 is focused on the light entrance surface of the optical recording medium to check the surface properties of the light entrance surface. However, It is also possible to irradiate the light incident surface of the rotating optical recording medium with electromagnetic or acoustic waves, measure the frequency deviation of the reflected wave caused by the Doppler effect, and check the surface properties of the light incident surface. As described above, the optical recording medium 10 of this embodiment has the thin light transmitting layer 16 provided on the opposite side of the support substrate 11 because the unevenness in the recording area of the surface-light incident surface 16a exists. The defects all satisfy the following conditions, \ T \ -T2 \ IW ^ 5.5xlO'4. Therefore, the concave-convex defects existing on the light incident surface 16a will not seriously affect the recording characteristics or reproduction characteristics. The "light incident surface" of the present invention refers to the surface of the optical recording medium on which the laser beam used for recording and / or reproduction is incident, and does not need to be the surface of the light transmitting layer 16. Therefore, when a hard coating layer or the like is provided on the surface of the light transmitting layer 16, the surface is a "light incident surface". The present invention is not limited to the above embodiments, and various changes can be implemented within the scope of the invention for which a patent is applied. Of course, the aforementioned various changes are also included in the scope of the present invention. Examples Hereinafter, the present invention will be described in more detail using examples. However, the present invention is not limited to these examples. [Production of the sample] First, the injection molding method was used to produce a thickness of 1.1 mm, a diameter of 120 mm, a groove 11a formed on the surface, and a plane lib (gauge (distance between grooves) = 0.3 // m) made of polycarbonate. Dish-shaped support substrate 1 1. Next, this support substrate 11 is set in a sputtering device, and an alloy made of silver (Ag), palladium (Pd), and copper (Cu) is sequentially formed on the side where the trench 11a and the plane lib are formed by the sputtering method. A reflection layer 12 having a thickness of 100 nm, a second dielectric layer 13 having a thickness of 20 nm made of Al203, a recording layer 14 having a thickness of 12 nm having an atomic ratio of SbTiTe ^ GeTln !, and a mixture of ZnS and SiO2 ( The first dielectric layer 15 having a thickness of 130 nm composed of Morse ratio = 80 ·· 20). Next, the first dielectric layer 15 was covered with a ultraviolet curable resin (viscosity at 25 ° C. = 5000 cP) by a spin coating method, and then was irradiated with ultraviolet rays to form a light transmitting layer 16 having a thickness of 1 00 // m. When the coating film is rotated ', the center hole of the support substrate 11 is closed with a closing jig, and the jig is covered with an ultraviolet curable resin, and then the rotation number is set to 2000 rpm for 8 seconds. Six samples were made using the above method # 1 ~ # 6 ° (Evaluation of the samples) Secondly, the laser focus displacement gauge investigated the largest unevenness defect (the coating is not applied) on the light transmitting layer 16 of samples # 1 to # 6. Size). Test results -28- (24) 200412593 are shown in Table 1. Table 1 T1 (// m) T2 (β m) IT1-T2I (β m) W (β m) IT1-T2I / W Sample # 1 100.2 99.9 0.3 1830 1.6 X IO · 4 Sample # 2 100.6 99.8 0.8 3200 2.5 X ίο · 4 Sample # 3 102.3 100.2 2.1 4200 5.0 X ΙΟ'4 Sample # 4 101.5 99.4 2.1 2600 8.1 X 1〇 · 4 Sample # 5 101.1 100 1.1 1900 5.8 X ΙΟ'4 Sample # 6 102.1 98.9 3.2 1200 2.7 X ΙΟ'3 As shown in Table 1, samples # 1 ~ # 3 satisfy \ T \ -T2 \ IW ^ 5.5 x1ο * 4, however, samples # 4 ~ # 6 do not satisfy the above formula and are | Γ1-Γ2 | / ίΓ > 5.5X1CT4 ° Next, the above samples # 1 to # 6 were respectively installed in an inspection device (ODA-II type mechanical accuracy detector manufactured by Shin Denki Kogyo Co., Ltd.), and the linear speed of 11.4 m / sec was rotated, and The light incident surface 16a is irradiated with the inspection laser beam L1. Secondly, based on the obtained position detection signal P and the focus error signal -29- (25) (25) 200412593 FE, the surface vibration acceleration and the high-domain surface vibration amount are calculated. The test results are shown in Table 2. Table 2 High-Area Planar Vibration Amount (// m) Surface Vibration Acceleration (m / s2) Sample # 1 0.24 6.25 Sample # 2 0.28 7.82 Sample # 3 0.33 8.56 Sample # 4 0.40 16.87 Sample # 5 0.36 10.21 Sample # 6 0.45 18.60 As shown in Table 2, the local surface vibrations of samples # 1 ~ # 3 that satisfy \ T \ -T2 \ IW ^ 5.5X10-4 are below 0.35 // m and the acceleration of surface vibration is below 10m / s2. However, the sample # 4 ~ # 6 of \ T \ -T2 \ / W > 5.5 x1ο-4 has a high-level surface vibration amount of 0.35 // m or less and a surface vibration acceleration of 10 m / s 2 or more. -30- (26) (26) 200412593 Next, set the above samples # 1 to # 6 to the disc evaluation device (DDU1000 manufactured by PULSTEC), rotate at a linear speed of 11.4m / sec, and pass through the aperture of 0.85 For the objective lens, the recording layer 14 is irradiated with a laser beam L having a wavelength of 405 nm along the magnetic track, and the residual focusing error component obtained by the measurement is measured. At this time, the detection method of the residual focus error component is shown below. First, detect the focus error signal obtained when the distance between the sample and the objective lens is changed without performing the focus servo, and find the focus sensitivity curve that replaces the relationship between the distance between the table sample and the objective lens (displacement) and the output of the focus error signal. . Calculate the difference between the positive-side spike 値 and the negative-side spike 値 of this focus sensitivity curve, and define this as ^ F ". Next, the knife-edge method is used to detect the focus error signal obtained when the focus servo is implemented, and the difference between the positive side spike 値 and the negative side spike 値 is determined, and this frame is defined as "R". And use R / F to calculate the residual focus error component. In addition, using the above-mentioned evaluation device, under the same conditions as described above, the mixed signals composed of 2T to 8T signals of the 1,7RLL modulation method were recorded for samples # 1 to # 6, respectively. Second, the recorded mixed signal is reproduced to detect its jitter. The jitter at this time refers to the jitter of the clock. Use the time interval analyzer to obtain the "fluctuation (σ)" of the reproduced signal, and use σ / Tw (Tw: one cycle of the clock) to calculate. The measurement results are shown in Feng 3. -31-(27) (27) 200412593 Table 3 Residual focus error components (%) Jitter (%, Sample # 1 4.3 8.3 Sample # 2 6.2 8.8 Sample # 3 8.8 9.4 Sample # 4 12.5 14.2 Sample # 5 11.3 1 1.6 Sample # 6 15.6 _16.3
如表3所示，滿足 \T\-T2\/W£ 5.5 x1ο-4 之樣本#上〜#3的殘留調焦誤差成分爲10%以下， 爲抖動良好。另一方面， \T\-T2\IW> 5.5x1ο-4 之樣本#4〜#6的殘留調焦誤差成分爲10%以上， 抖動亦爲相當高的値。 【圖式簡單說明】 第1圖（a)係本發明較佳實施形態之光記錄媒_ 外觀的斷面斜視圖。 -32- (28) (28)200412593 第1圖（b)係第1圖（a)所示A部之部分放大剖面圖。 第2圖（a)係存在於光射入面16a之凸缺陷21的槪略 放大剖面圖。 第2圖（b)係存在於光射入面16a之凹缺陷22的槪略 放大剖面圖。 第3圖係第1圖所示光記錄媒體1 0之製造方法的流 程圖。 第4圖係以檢查光記錄媒體之良否爲目的之檢査裝置 100的槪略構成圖。 第5圖係光讀寫頭1 1 4之構成槪略圖。 第6圖係以檢查光記錄媒體之良否爲目的之方法的流 程圖。 第7圖係檢査用雷射光束L1對焦於光記錄媒體前驅 物10’之光射入面16a的狀態模式圖。 第8圖係步驟S 1 6之判斷方法的流程圖。 第9圖係判斷爲良品之區域的模式圖。 [元件符號之說明] 102…轉盤馬達 103…雷射驅動電路 1 0 4…透鏡驅動電路 105…控制器 105a…聚焦控制電路 105b…判斷電路 -33- (29)200412593 S 1…支持基板1 1之製 S 2…反射層1 2之形成 S 3…第2電介質層13 S 4…記錄層14之形成 S 5…第1電介質層15 S 6…光透射層16之形 S 7…記錄層14之起始 S 1 1…光記錄媒體前驅 S 1 2…檢査用雷射光束 S 1 3…聚焦於光射入面 S 14…對焦 S 1 5 ··面振動加速度及 S 16···判斷 S 21…高域面振動量之 S 22…面振動加速度之 作 之形成 之形成 成 化 物1 (T之旋轉 L 1之照射 16a 高域面振動量之計算 最大値是否超過定限値？ 最大値是否超過定限値？ -34-As shown in Table 3, the residual focus error component of samples ## ~ # 3 on samples # \ T \ -T2 \ /W£5.5 x1ο-4 that meets #T \ -T2 \ /W£5.5 is less than 10%, which is good jitter. On the other hand, the residual focusing error components of samples # 4 ~ # 6 of \ T \ -T2 \ IW> 5.5x1ο-4 are more than 10%, and the jitter is also quite high. [Brief description of the drawings] Fig. 1 (a) is a cross-sectional perspective view of the appearance of an optical recording medium according to a preferred embodiment of the present invention. -32- (28) (28) 200412593 Figure 1 (b) is an enlarged sectional view of a portion of part A shown in Figure 1 (a). Fig. 2 (a) is a schematic enlarged sectional view of a convex defect 21 existing on the light incident surface 16a. Fig. 2 (b) is a schematic enlarged sectional view of a concave defect 22 existing in the light incident surface 16a. Fig. 3 is a flowchart of a method of manufacturing the optical recording medium 10 shown in Fig. 1. FIG. 4 is a schematic configuration diagram of the inspection apparatus 100 for the purpose of inspecting the quality of the optical recording medium. Fig. 5 is a schematic diagram of the structure of the optical head 1 1 4. Fig. 6 is a flowchart of a method for checking the quality of the optical recording medium. Fig. 7 is a schematic diagram showing a state where the inspection laser beam L1 is focused on the light incident surface 16a of the optical recording medium precursor 10 '. FIG. 8 is a flowchart of the determination method of step S 16. Fig. 9 is a schematic diagram of a region judged to be a good product. [Explanation of component symbols] 102 ... turntable motor 103 ... laser drive circuit 1 0 4 ... lens drive circuit 105 ... controller 105a ... focus control circuit 105b ... judgment circuit -33- (29) 200412593 S 1 ... support substrate 1 1 S 2… Formation of reflective layer 12 S 3… Second dielectric layer 13 S 4… Formation of recording layer 14 S 5… First dielectric layer 15 S 6… Shape of light transmitting layer 16 S 7… Recording layer 14 Start of S 1 1 ... Optical recording medium precursor S 1 2 ... Inspection laser beam S 1 3 ... Focusing on the light incident surface S 14 ... Focusing on S 1 5 · Surface vibration acceleration and S 16 · · Judgment S 21… S in the high-level surface vibration amount S 22… In the formation of the acceleration of the surface vibration The formation of the compound 1 (T rotation of L 1 irradiation 16a The calculation of the high-level surface vibration amount is the maximum 超过 exceeds the fixed limit 値? Exceeding the limit? -34-