(1) (1)200412425 玖、發明說明 【發明所屬之技術領域】 本發明是關於一種光記錄媒體之檢查方法，特別是， 關於一種具有設於與支持基板相反側的一面的薄光透過層 的下一世代型的光記錄媒體之檢查方法。 【先前技術】 近年來，作爲記錄大容量的數位資料所需的記錄媒體 ，在 CD (Compact Disc)或 DVD (Digital Versatile Disc) 所代表的光記錄媒體被廣泛使用。 CD是在約1.2mm厚度的光透過性基板上具有資訊記 錄層及保護層所疊層的構造，藉由將波長約780nm的雷 射光束從光透過性基板側照射資訊記錄層，可進行資料的 記錄及/或再生。在雷射光束的聚焦使用數値口徑（NA) 大約0.45的物鏡，由此，資訊記錄層上的雷射光束的聚 束光束徑是被縮小至大約1.6/zm。由此在CD是實現大約 700MB的記錄容量，及在等倍速（大約1.2m/sec)中大約 1Mbps的資料轉送速率。 DVD是具有在大約0.6mm厚度的光透過性基板上疊 層有資訊記錄層及保護層的疊層體，及大約〇.6mm厚度 的隔基板經由黏接層黏接的構造，而藉由將波長大約 6 5 Onm的雷射光束從光透過性基板照射至資訊記錄層，可 進行資料的記錄及/或再生。在雷射光束的聚焦使用數値 口徑 （NA)大約0.6的物鏡，由此資訊記錄層上的雷射 (2) (2)200412425 光束的光束聚點徑是被縮小至大約〇. 93 // m。如此地，在 DVD的記錄及/或再生中，使用波長比CD較短的雷射光 束，且使用數値口徑 （NA)較大的物鏡之故，因而實現 比 CD更小的光束聚點徑。由此，在DVD，實現大約 4.7GB/面的記錄容量，及等倍速（大約3.5m/sec)中大約 1 1Mbps的資料轉送速率。 另一方面，隨著近幾年來的資訊化社會的高度化，被 要求具有超越DVD的資料記錄容量，且可實現超越DVD 的資料轉送速率的光記錄媒體的實用化，而進行著其開發 。在此種下一世代型的光記錄媒體中，爲了實現大容量又 高資料轉送速率，必然地須更縮小使用於資料的記錄及/ 或再生的雷射光束的光束聚點徑，爲了此，必須將聚焦雷 射光束所需的物鏡的數値口徑 （NA)作成更大，同時須 更縮短雷射光束的波長。 然而，將雷射光束予以聚束所需的物鏡成爲高NA化 ，則產生光記錄媒體的彎曲或歪斜的容許度的問題，亦即 產生傾斜容限變成極小的問題。傾斜容限T是將使用於記 錄及/或再生的雷射光束的波長作爲λ ，並將成爲雷射光 束的光路的光透過層的厚度作爲d時，則藉由下式可加以 表示。 由式 （1)可知，傾斜容限是物鏡的NA愈大則變小 。又，波面像差（彗形像差）所發生的光透過層的折射率 作爲η，並將傾斜角度作爲β時，則波面像差係數W，是 (3) (3)200412425 藉由下式加以表示。 w=义(”2—l).”2.sin0.(A^)3 ⑵ 2 雄2-sin2 _ 由式（1)及式（2)可知，爲了增加傾斜容限，且抑 制彗形像差，須減小使用於記錄再生的雷射光束所入射的 光透過層的厚度d極有效。針對於被使用在CD (NA=約 0.45)的光透過性基板的厚度爲大約1.2mm，而被使用在 DVD (NA=約0.6)的光透過性基板的厚度被設定在大約 0.6mm，乃爲了以上事項。 由上述理由，在下一世代型的光記錄媒體，爲了充分 確保傾斜容限，.且抑制彗形像差之發生，考量必須將光透 過層的厚度作爲200 // m以下，特別是薄至100 // m左右 者。 爲了此，在下一世代型光記錄媒體中，如現行的光記 錄媒體地，在成爲雷射光束的光路的光透過性基板上很難 形成資訊記錄層，而在形成於支持基板上的資訊記錄層等 上面’藉由旋轉鍍膜法或光透過性片的黏接等以形成薄光 透過層，而檢討將此使用作爲雷射光束的光路的方法。如 此地’在製作下一世代型的光記錄媒體，與從光入射面側 依次進行成膜的現行的光記錄媒體不相同，而成爲從與光 入射面相反側的一面依次進行成膜。 然而，藉由旋轉鍍膜法或光透過性片的黏接所形成的 光透過層的表面（下一世代型光記錄媒體的光入射面）， 是與主要利用注入成形法所製作的光透過性基板的表面 (CD或DVD的光入射面）相比較，具有平坦性較低的缺 (4) (4)200412425 點問題。而且，在CD或DVD中，由於形成在光入射面上 的雷射光束的光束聚點某程度較大（CD:大約700 // m， DVD:大約 500 // m)，因此光入射面上的凹凸是被稀釋 ，給予記錄特性或再生特性的影響變小，另一方面，在下 一世代型的光記錄媒體中，由於形成在光入射面上的雷射 光束的光束聚點極小（例如130// m)之故，因此，些微 的凹凸有給予記錄特性或再生特性很大影響的可能性。 所以，在下一世代型記錄媒體的製程中，被要求檢查 光入射面的表面性，而在其表面性較低時排除作爲不良品 【發明內容】 因此，本發明的目的是屬於具有設在與支持基板相反 側的一面的薄光透過層的光記錄媒體之檢查方法，而其目 的是在於提供一種檢查光入射面的表面性的方法。 本發明的該目的，是藉由一種光記錄媒體之檢查方法 ，屬於具備支持基板，及光透過層，及設於上述支持基板 與上述光透過層之間的資訊層，藉由將雷射光束經由上述 光透過層照射在上述資訊層俾進行資料的記錄及/或再生 的光記錄媒體之檢查方法，其特徵爲具備：算出上述雷射 光束所入射的光入射面的高通面偏心量及/或面偏心加速 度的步驟，及依據上述高通面偏心量及/或面偏心加速度 來判定良否的步驟就可達成。 依照本發明，可簡單且確實地排除存有將記錄及/或 -9- (5) (5)200412425 再生於先入射面給予重大影響的凹凸的光記錄媒體。因此 ’本發明是極適合於光入射面的凹凸給予記錄及/或再生 的影響較顯著的下一世代型光記錄媒體的檢查。 又，上述算出的步驟，是一面旋轉上述光記錄媒體， 一面藉由將檢查用雷射光束的焦點對準於上述光入射面進 行。這時候，測定上述檢查用雷射光束的折回光，並依據 所得到的焦點誤差信號來算出上述高通面偏心量較理想， 測定聚束上述檢查用雷射光束的物鏡的動作，並依據所得 到的位置檢測信號來算出上述面偏心加速度較理想。 又，上述判定的步驟，是上述高通面偏心量至少超過 〇 · 3 5時判定爲不良品較理想。若如此地設定高通面偏心量 的臨界値，則在實際記錄及/或再生中，可將起因於高通 面偏心的殘留焦點誤差成分作成大約1 〇%以下。 又，上述判定的步驟，是上述面偏心加速度至少超過 1 Om/s2時判定爲不良品較理想。若如此地設定面偏心加速 度的臨界値時，則在實際記錄及/或再生中，也可將起因 於高通偏心的殘留焦點誤差成分作成大約1 〇%以下。 又，上述光透過層的層厚爲30至200//m較理想。 具有此種光透過層的光記錄媒體是所謂下一世代型的光記 錄媒體，光入射面的凹凸給予記錄及/或再生的影響較顯 著，因此本發明的適用極適當。 又，在上述資訊層，包含有相變化材料所構成的記錄 層也可以。此種光記錄媒體是所謂重寫型光記錄媒體。這 時候，在初期化上述記錄層之前，實行上述算出的步驟也 -10- (6) (6)200412425 可以。若初期化記錄層，則反射率大幅地變高，成爲很難 將檢查用雷射光束的焦點對準在光入射面，惟在初期化記 錄層之前實行上述算出的步驟，則可解決該問題。 【實施方式】 以下，一面參照圖式，一面詳述本發明的較佳實施形 態。 第1 (a)圖是表示成爲依本發明的檢查方法的對象的 光記錄媒體的一例的光記錄媒體1 0的外觀的切割立體圖； 第1 (b)圖是表示圖示於第1 (a)圖的放大A部的局部 剖視圖。表示於第1圖的光記錄媒體1 0是所謂重寫型的 光記錄媒體，惟成爲依本發明的檢查方法的對象的光記錄 媒體並不限定於重寫型的光記錄媒體者，針對於追記型的 光記錄媒體或再生專用型的光記錄媒體等，其他型式的光 記錄媒體也可成爲檢查對象。 表示於第1 (a) ， （b)圖的光記錄媒體10，是外徑 大約120mm，厚度約1.2mm的圓盤狀光記錄媒體，如第1 (b)圖所示地，具備支持基板11，及反射層12，及第2 介電層13，及記錄層14，及第1介電層15，及光透過層 1 6所構成。並未特別加以限定者，表示於第1圖的光記 錄媒體10，是藉由將波長λ爲380nm至450nm，較理想 爲約40 5 nm的雷射光束L由光透過層16的表面的光入射 面1 6a照射，可進行資料的記錄及再生的重寫型光記錄媒 體，對於光記錄媒體1 0的資料的記錄及再生，使用數値 -11 . (7) (7)200412425 口徑爲0.7以上，較理想爲0.85左右的物鏡，由此，將雷 射L的波長作爲Λ，並將物鏡的數値口徑作爲NA時，則 被設定在；I /NAS 640nm。又，「第2」介質層13及「第1 」介質層15，是意味著從光入射面16a觀看，分別爲第2 及第1介質層。 支持基板11是使用於確保光記錄媒體1 0所求的厚度 (大約1.2mm)所需的大約1.1mm厚度的圓盤狀基板，在 其中一方的面，從該中心部近旁朝外緣部，螺旋狀地形成 有引導雷射光束L所需的凹軌11a及凸軌lib。作爲支持 基板11的材料可使用各種材料，例如可使用玻璃，陶瓷 或樹脂。這些中，從成形的容易性觀點，一般大都使用聚 碳酸酯樹脂。 反射層1 2是具有反射從光透過層1 6側所入射的雷射 光束L。再從光透過層1 6側出射的作用。作爲反射層12 的材料，可使用可反射雷射光束L的各種材料，例如使鎂 (Mg) 銘 (A1)， 鈦 (Ti) 9 鉻 (Cr) ，鐵 (Fe)，鈷 (Co) ， 鎳 (Ni) ^ 銅 (Cu) 9 鋅 (Zn) ，鍺 (G e)，銀 (Ag) 鉑 (Pt)， 金 (Au) 等 〇作 爲反射層 1 3的厚度， 設定 在 5至 300nm 〇 第 1介 質層15 丨及 第2 介質層 13是具有 物理性及/或 化學 性: 池保 護設在此些 之間1 的記錄層1 4， 記錄層14是藉 由被 夾; 時在 這些第 1介 質層 15 及第 2介質層 1 3，光記錄 後，長期間能有效地防止記錄資訊的劣化。 構成第1介質層15及第2介質層丨3的材料，是在所 -12- (8) (8)200412425 使用的雷射光束L的波長領域，若爲透明介質並未特別限 定，例如可將氧化物，硫化物，氮化物或此些組合使用作 爲主成分，惟從支持基板11等的熱變形防止及對於記錄 層14的保護特性的觀點，Al2〇3，AIN，Zn〇，ZnS，Gen， CeCrN，Ce〇2， Si〇，Si〇2，Si3N4，SiC，La2〇3，Ta〇，Ti〇2 ，SiAlON (Si〇2，Al2〇3，ShN4及 AIN的混合物）等，及 LaSiON (La2〇3，SiCh 及 Si3N4 的混合物）等，鋁（Al)， 矽（Si)，鈽（Ce)，鈦（Ti)，鋅（Zn)，鉅（Ta)等 的氧化物，氮化物，硫化物，碳化物或此些的混合物較理 想地被使用。又，作爲第1介質層15及第2介質層13的 層厚，被設定成3至200nm。 記錄層14是形成有可逆式記錄標誌的層，藉由相變 化材料所構成。相變化材料是結晶狀態時的反射率與非晶 質狀態時的反射率不同之故，因而利用此進行資料的記錄 ^被記錄的資料是藉由如非晶質狀態的記錄標誌的長度（ 從記錄標誌的前緣至後緣的長度）及如結晶狀態的空白領 域的長度（從記錄標誌的後緣至下一記錄標誌的前緣的長 度）所表現。 爲了將記錄層14從結晶狀態變化成非晶質狀態，則 藉由將從光入射面1 6a所照射的雷射光束L作成具有從記 錄功率Pw至基底功率Pb的振幅的脈衝波形，使得記錄 層14加熱成融點以上溫度，然後藉由將雷射光束l的功 率設定成基準功率Pb使之急冷。藉此，熔融的領域變化 成非晶質狀態，而將此成爲記錄標誌。另一方面，爲了將 -13- 200412425 Ο) 記錄層14從非晶質狀態變化成結晶狀態，則藉由將從光 入射面1 6a所照射的雷射光束L的功率設定成抹除功率 Pe，使得記錄層14加熱成結晶化溫度以上的溫度。被加 熱成結晶化溫度以上的溫度的領域，是藉由離開雷射光束 L而被徐冷之故，因而該領域變化成結晶狀態。 在此，記錄功率Pw，抹除功率Pe及基底功率Pb的 關係是設定成Pw〉Pe^Pb 因此，如此地調變雷射光束L的功率，則不僅可將記錄標 誌形成在記錄層1 4的未記錄領域，而且在已形成有記錄 標誌的領域成爲可直接重寫與該記錄標誌不相同的記錄標 誌。 作爲構成記錄層14的相變化材料的種類並未特別加 以限制者，惟爲可成爲高速地直接重寫，選擇從非晶質狀 態構造變化成結晶狀態所需時間（結晶化時間）較短的材 料較理想，作爲此種材料可列舉SbTe系材料。作爲SbTe 系材料，僅爲SbTe也可以，或是更縮短結晶化時間之同 時’爲了提局對於長期保存的可靠性而施以添加物也可以 。作爲記錄層14的層厚，被設定成2至40nm。 光透過層16是構成雷射光束L的入射面之同時，成 爲雷射光束L的光路層，作爲其厚度被設定成30至200 //m，較理想爲被設定成大約1〇0 。作爲光透過層16 的材料，在所使用的雷射光束L的波長領域中，只要光透 過率充分高的材料並未特別加以限制，惟丙烯系或環氧系 的紫外線硬化性樹脂最適用。又，代替硬化紫外線硬化性 -14 - (10) (10)200412425 _脂所成的膜，也可使用光透過性樹脂所構成的光透過性 #與各種黏接劑形成光透過層1 6。 又，構成光記錄媒體10的各層中，將設於支持基板 1 1與光透過層1 6之間的層總稱爲「資訊層」。在再生專 $的光記錄媒體，藉由設於支持基板11的凹坑列保持著 資訊之故，因而未設有相當於記錄層14的層，惟這時候 ’反射層相當於資訊層。 以下，針對於表示於第1圖的光記錄媒體10的製造 方法加以說明。重寫型的光記錄媒體1 〇的製程是較大分 類爲成膜過程與初期化過程所構成，依次進行成膜過程及 初期化過程。 第2圖是表示圖示於第1圖的光記錄媒體1〇的製造 方法的流程圖。 首先，藉由使用沖壓模的射出成形法，製作凹軌π a 及凸軌1 1 b所形成的支持基板1 1 (步驟S 1)。但是，支 持基板11的製作是並未限定在射出成形法，藉由2P法等 ，其他方法製作支持基板也可以。 然後，在支持基板11的表面中設有凹軌lla及凸軌 lib的一面形成反射面12 (步驟S2)。反射層12的形成 是使用包含反射層1 2的構成元素的化學種源的氣相成長 法較理想。作爲氣相成長法有濺鍍法或真空蒸鍍法等，其 中以使用濺鍍法較理想。 然後，在反射層12上形成第2介質層13 (步驟s3) 。針對於第2介質層13的形成，也使用包含第2介質層 -15- (11) (11)200412425 1 3的構成元素的化學種源較理想。則濺鍍之後的相變化 材料是成爲非晶質狀態，而在之後所進行的初期化過程變 成結晶狀態。 之後，在記錄層14上形成第1介質層15 (步驟S5) 。在第1介質層15的形成，也使用包含第1介質層15的 構成元素的化學種源的氣相成長法較理想，其中使用濺鍍 法更理想。 然後，在第1介質層15上形成光透過層16 (步驟S 6) 。光透過層1 6是如將經調整粘度的丙烯系或環氧系的紫 外線硬化性樹脂藉由旋轉鍍膜法等施以保護膜，照射紫外 線使之硬化，或是藉由黏接劑黏貼光透過性樹脂所構成的 光透過性片可形成。如上述地，藉由旋轉鑛膜法或光透過 性片的黏貼等所形成的光透過層1 6的表面（光入射面 16a)，是與CD或DVD的光入射面的光透過性基板的表 面相比較，容易使平坦性變低。 由以上，完了成膜過程。在本發明中，將完成成膜過 程的狀態的光記錄媒體稱爲「光記錄媒體前驅體10’」。 但是不需要特別地區別時，爲了方便，對於光記錄媒體前 驅體1(Γ也僅稱爲「光記錄媒體」。 之後，將光記錄媒體前驅體10’裝載於雷射照射裝置 (未圖示）的旋轉台，一面旋轉，一面連續地照射初期化 用雷射光束，該雷射光束是沿著凹軌11a及凸軌lib的方 向（圓周方向）的長度較短，且垂直於凹軌11a及凸軌 lib的方向（徑方向）的長度較長，而藉由每當光記錄媒 (12) (12)200412425 體前驅體10’旋轉一次朝徑方向偏離照射位置，俾將初期 化用雷射光束照射在記錄層14的大約全面。亦即，進行 記錄層14的初期化（步驟S7)。初期化用雷射光束所照 射的領域的相變化材料是被加熱成超過融點的溫度，之後 藉由遠離初期化用雷射光束被徐冷，使得全面記錄層14 成爲結晶狀態，亦即成爲未記錄狀態。 由以上，完了初期化過程，而完成光記錄媒體10。 進行初期化過程，則結晶粒徑變較大，藉此，記錄層14 的反射率變極高。 又，光記錄媒體10的製造方法是並不特別被限定於 上述製造方法者，可使用被採用在公知的光記錄媒體的製 造的製造技術。 以下，說明依本發明的較佳實施形態的光記錄媒體的 檢查方法。 作爲進行檢查的時機，在完了成膜過程之後，則在任 何時機進行也可以，惟如下所述地，若記錄層14的反射 率較高，則難以進行檢查，因此完了成膜過程之後，在進 行初期化過程之前（步驟S6與步驟S7之間）進行檢查較 理想。因此，以下將上述的光記錄媒體前驅體10’作爲檢 查對象的情形作爲例子加以說明。 第3圖是表示可實行依本發明的較佳實施形態的光記 錄媒體的檢查方法的檢查裝置1 00的槪略構成圖。 如第3圖所示，檢查裝置1〇〇是具備：旋轉光記錄媒 體前驅體10’的主軸電動機101，及將檢查用雷射光束L1 -17- (13) (13)200412425 照射在光記錄媒體前驅體1 0’的光學系11 0，及將光學系 110朝光記錄媒體前驅體10’的徑方向移動的橫向電動機 102，及將雷射驅動信號103a供給於光學系110的雷射驅 動電路103，及將透鏡驅動信號104a供給於光學系110的 透鏡驅動電路104，及控制主軸電動機101，橫向電動機 102，雷射驅動電路103及透鏡驅動電路104的控制器105 〇 光學系110是具備：依據雷射驅動信號103a發生檢 查用雷射光束L1的雷射光源111，及將雷射光源111發 出的檢查用雷射光束L1變換成平行光線的準直透鏡1 1 2 ，及分離檢查用雷射光束L1與其折回光L2的分束鏡113 ，及將檢查用雷射光束L1照射在光記錄媒體前驅體10’的 光頭114，及依據檢查用雷射光束的折回光L2產生焦點 誤差信號FE的光檢波器115。 第4圖是表示光頭114的構成的槪略圖。如第4圖所 示地，先頭114是具備：聚光檢查用雷射光束L1的物鏡 114a，及依據透鏡驅動信號104a俾上下移動物鏡114a的 主動器1 14b，及被固定於物鏡114a的永久磁鐵114c，及 設成圍繞永久磁鐵114e的線圈114d。永久磁鐵114c及設 成圍繞該永久磁鐵的線圈1 14d，是功能作爲檢測物鏡 1 1 4a的上下方向位置所需的位置檢測器，又流在線圈 1 14d的電流是作爲位置檢測信號P供給於控制器105。 主軸電動機101，是依據控制器105的控制下，可用 所期盼的轉速來旋轉光記錄媒體前驅體10’。橫向電動器 -18- (14) (14)200412425 1 02，是依據控制器1 05的控制下，使用於朝光記錄媒體 前驅體10’的徑方向移動光學系110所需者。雷射驅動電 路103，是依據控制器105的控制下，使用於將雷射驅動 信號103a供給於光學系11〇內的雷射光源111所需者。 透鏡驅動電路104，是依據控制器105的控制下，使用於 將透鏡驅動信號104a供給於光頭114所需者。如上述， 接受透鏡驅動信號104a的光頭114內的主動器114b，是 依據該信號上下移動物鏡114a。由此，成爲可將檢查用 雷射光束L1的光束聚點正確地聚焦在所期盼的一面。 在控制器105包含焦點控制電路105a及判定電路 105b，當焦點控制電路105a成爲活性狀態，則藉由對透 鏡驅動電路104的控制，使得檢查用雷射光束L 1的光束 聚點成爲聚焦鎖定在所期望的一面的狀態。又，判定電路 l〇5b是判定檢查對象的光記錄媒體前驅體10’是否爲良品 或不良品的電路，依據藉由光檢波器11 5所產生的焦點誤 差信號FE及藉由位置檢測器所產生的位置檢測信號P進 行判定。 第5圖是表示依本發明的較佳實施形態的光記錄媒體 的檢查方法的流程圖。 在依本實施形態的光記錄媒體的檢查中，將檢查對象 的雷射光束前驅體10’設定在檢查裝置100之後，首先， 是依據控制器105的控制下，藉由主軸電動機1 〇 1旋轉光 記錄媒體前驅體10’（步驟S11)，又藉由驅動雷射驅動電 路1 03，將檢查用雷射光束L 1照射在光記錄媒體前驅體 -19- (15) (15)200412425 10’（步驟S 12)。這時候，對於檢查位置，藉由驅動電動 機102可朝光記錄媒體前驅體101的徑方向調整。 依主軸電動機101的光記錄媒體前驅體10’的旋轉， 是對於檢查用雷射光束L1控制成線速度成爲一定較理想 ，作爲此時的線速度，大約一致於實際的記錄時及/或再 生時的線速度較理想。若將檢查時的線速度與記錄時及/ 或再生時的線速度大約一致，則成爲可考慮存在於光入射 面16a的凹凸給予實際的資料記錄及/或再生的影響進行 檢查。 然後，依據控制器105的控制下，驅動透鏡驅動電路 1 04，將檢查用雷射光束L 1的焦點對準在光記錄媒體前驅 體10’的光入射面16a (步驟S13)。 之後，藉由將控制器105內的焦點控制電路l〇5a予 以活性化，可將檢查用雷射光束L1焦點鎖定在光記錄媒 體前驅體1CT的光入射面16a (步驟S14)。由此，在光頭 114內的主動器114b，物鏡114a能追隨於光入射面16a 的凹凸般地，即時地供給透鏡驅動信號l〇4a。 第6圖是模式地表示檢查用雷射光束l 1焦點鎖定在 光記錄媒體前驅體10’的光入射面16a的狀態的圖式。光 入射面16a是一般具有大約5%的反射率之故，因而在資 料的記錄時或再生時，與焦點鎖定在記錄層14的情形同 樣，在光入射面1 6a，也可進行焦點鎖定，惟與光入射面 1 6 a相比較，若記憶層1 4的反射率過高，則不容易將檢查 用雷射光束L1焦點鎖疋在光入射面i6a。因此，在檢查 -20- (16) (16)200412425 時記錄層14的反射率較低較理想。將表示於第5圖的檢 查過程進行在比初期化過程之前（步驟S6與步驟7的圖） 較理想，乃依據該理由。 在該狀態下，包含於控制器105內的判定電路l〇5b， 是監視由光頭114所供給的位置檢測信號P及由光檢波器 11 5所供給的焦點誤差信號FF，而依據此些分別計算面偏 心加速度及高通面偏心量（步驟S15)。在此，「面偏心 加速度」是指產生在物鏡11 4的加速度，而「高通面偏心 量」是指存在於光入射面16a的表面的凹凸中，物鏡114a 無法追隨的陡峻的凹凸大小。依據檢測信號P的面偏心加 速度的計算及依據焦點誤差信號FF的高通面偏心量是如 下地進行。 亦即，當物鏡114a連動於存在於光入射面16a的表 面的凹凸進行上下移動，則位置檢測信號P是表示連動於 該移動的電流値之故，因而在判定電路105b內微分兩次 藉由位置檢測信號P所表示的物鏡11 4 a的位置，成爲可 知道產生在物鏡114a的加速度。另一方面，即使在光入 射面1 6a的表面存在有凹凸的情形，連動於此而使得物鏡 114a未進行上下移動的情形，亦即，凹凸爲陡峻而使得 物鏡11 4a無法追隨時，則位置檢測信號P並未有變化。 如此地，參照位置檢測信號P，成爲可算出藉由存在 於光入射面16a的表面的凹凸中的物鏡114a可追隨的凹 凸，有多少程度的加速度產生在物鏡1 1 4a，亦即可算出 「面偏心加速度」。 -21 - (17) (17)200412425 又，即使凹凸存在於光入射面16a的表面，而因凹凸 爲陡峻之故，因而物鏡114a無法追隨時，則檢查用雷射 光束L1的焦點從光入射面16a偏離，而該偏離量出現在 焦點誤差信號FF。另一方面，即使凹凸存在於光入射面 16a的表面，而物鏡114a能連動於該凹凸而正確地上下移 動時，焦點誤差信號FE是表示正確地被聚焦。 因此，參照焦點誤差信號FE，可算出存在於光入射 面16a的表面的凹凸中，物鏡114a無法追隨的陡峻凹凸 的存在與其大小，亦即，可算出「高通面偏心量」。 又，物鏡114a可追隨的凹凸界限，是藉由使用的零 件有所不同，惟在使用CD用的零件時爲大約500Hz左右 。亦即，存在於光入射面1 6a的表面的凹凸中，若其頻率 成分爲 500Hz以下，則可追隨物鏡114a，另一方面，其 頻率成分超過大約500Hz時，物鏡114a是無法追隨於該 頻率。 如此地，參照由光頭1 14所供給的位置檢測信號P及 由光檢波器115所供給的焦點誤差信號FE，可算出表示 光入射面1 6a的表面性的面偏心加速度及高通面偏心量。 然後，包含於控制器105內的判定電路105b，是依據 在步驟S 1 5所算出的面偏心加速度及高通面偏心量，判定 檢查對象的光記錄媒體前驅體1〇,是否爲良品或不良品（ 步驟S 1 6 ) 。 第7圖是表示依步驟S 1 6的判定方法的流程圖。 首先，在步驟S 16中，參照由焦點誤差信號FE所得 -22- (18) (18)200412425 到的高通面偏心量，判斷該量是否超過高通面偏心量的臨 界値（步驟S21)。在此，「高通面偏心量的臨界値」， 是存在於光入射面16a的凹凸中，物鏡14a無法追隨的陡 峻凹凸所容許的尺寸的最大値，爲了排除在實際的記錄及 /或再生中成爲問題的光記錄媒體前驅體10’，將高通面偏 心量的臨界値設定在0.3至0.4 // m，特別是設定在大約 〇·3 5 /z m較理想。將高通面偏心量的臨界値設定在此値， 則在實際記錄及/或再生中，可將起因於高通面偏心的殘 留焦點誤差成分作爲大約1 0%以下。若殘留焦點誤差成 分超過1 0%時，對顫動的影響成爲極顯著，故此種光記 錄媒體前驅體10’是在主檢查過程中須排除。 之後，步驟S21的判斷結果，高通面偏心量的最大値 超過臨界値（步驟S21:是），判定爲不良品。 另一方面，若面偏心量的最大値未超過臨界値（步驟 S21:否），之後，抽出光入射面16a的面偏心加速度的 最大値，判斷該値是否超過面偏心加速度的臨界値（步驟 S22)。在此，「面偏心加速度的臨界値」，是依據存在 於光入射面16a的凹凸而產生在物鏡114a的加速所容許 的最大値，即使在檢查裝置100中可追隨，設定成排除藉 由使用者實際上使用的驅動性能具有偏離焦點之虞的面偏 心的光記錄媒體前驅體10’作爲目的。爲了排除在實際記 錄及/或再生中具有成爲問題的面偏心加速度的光記錄媒 體前驅體10’，將面偏心加速度的臨界値設定在5至 15m/S2，特別是設定成大約10m/S2較理想。若將耐面偏心 -23- (19) (19)200412425 加速度的臨界値設定成如此，則在實際記錄及/或再生中 可將起因於高通面偏心的殘留焦點誤差成分大約作爲1 0% 以下。結果，若面偏心加速度的最大値超過臨界値（步驟 22:是），則判定爲不良品。 另一方面，若面偏心加速度的最大値未超過臨界値（ 步驟22:否），則最終判定爲良品，進行表示於第2圖 的初期化過程（步驟7)。 第8圖是表示依圖示於第7圖的基準被判定爲良品的 領域的模式性圖表。如第8圖所示地，藉由表示於第7圖 的基準進行判定，被判定爲良品的領域是在圖表上中成爲 兩邊接觸於兩軸的四方形，可知高通面偏心量及面偏心加 速度均僅在所定的臨界値以下時被判定爲良品。 如上所述地，依照本實施形態，在具有設置於與支持 基板11相反側的一面的薄光透過層1 6的下一世代型光記 錄媒體1 0的檢査中，將檢查用雷射光束L1的焦點對準在 光入射面1 6a，依據焦點鎖定時所得到的位置檢測信號P 及焦點誤差信號FE，俾檢查光入射面1 6a的表面性，因 此可簡單且確實地排除具有記錄及/或再生於光入射面16a 成爲問題的缺陷的光記錄媒體1 〇。 又’在本發明中，「光入射面」是指使用於光記錄媒 體的表面中使用於記錄及/或再生的雷射光束所入射的一 面，而不需要光透過層16的表面。因此，在光透過層16 的表面設有硬塗層等時，該表面成爲「光入射面」。 本發明是並不被限定於以上的實施形態，在記載於申 -24- (20) (20)200412425 請專利範圍的範圍的發明的範圍內可作各種變更，當然此 些也包含於本發明的範圍內者。 例如，在上述實施形態中，在步驟S 1 6中依據高通面 偏心量與面偏心加速度的雙方進行判定（參照第7圖）， 對應於目的，依據高通面偏心量與面偏心加速度的其中一 方進行判定也可以。但是，爲了確實地排除在實際記錄及 /或再生中成爲問題的缺陷的光記錄媒體1 0，如上述實施 形態地依據高通面偏心量與面偏心加速度的雙方進行判定 最理想，至少依據高通面偏心量進行判定較理想。 又，在上述實施形態中所使用的檢查裝置100，爲了 產生位置檢測信號P，使用永久磁鐵11 4c及線圈11 4d所 構成的位置檢測器，惟藉由此以外的方法，可測定產生在 物鏡1 1 4a的加速度也可以。例如設置靜電電容型的位置 檢測器來代替永久磁鐵11 4c及線圈1 1 4d，藉此也可測定 產生在物鏡1 14a的加速度。 又，在上述實施形態中，藉由將檢查用雷射光束L1 的焦點對準在光記錄媒體的光入射面，來檢查光入射面的 表面性，惟作爲本發明的檢查方法並不被限定於此者，例 如將電磁波或音波照射在旋轉的光記錄媒體的光入射面， 藉由測定因多卜勒效應所產生的反射波的頻率，來檢查光 入射面的表面性也可以。 (實施例） 以下，使用實施例更具體性地說明本發明，惟本發明 -25- (21) (21)200412425 是在此些實施例並未加以限定者。 [試樣的製作] 首先，藉由射出成形法，製作厚度1.1mm，直徑 120mm，而在表面形成有凹軌及凸軌llb (軌距（凹軌 節距）=0.3 // m)的聚碳酸酯所構成的碟狀支持基板11。 然後，將該支持基板11設定在濺鍍裝置’依次藉由 濺鑛法在形成有凹軌11 a及凸軌11 b的一邊的表面形成銀 (Ag)，銷（Pd)及銅（Cu)的合金所構成的厚度lOOnm 的反射層12，Al2〇3所構成的厚度20nm的第2介質層13 ，原子比爲SbTdeuGedn!的厚度12nm的記錄層14，及 ZnS與Si〇2的混合物（莫爾比：80: 20)所構成的厚度 130nm的第1介質層15。 之後’在第1介質層15上，藉由旋轉鍍膜法塗布紫 外線硬化性樹脂（25 °C的黏度=5000cP)，又，藉由將 紫外線照射在該層俾形成1 〇〇〆m厚度的光透過層1 6。在 旋轉鑛膜時’使用關閉工模來關閉支持基板u的中心孔 ’並將紫外線硬化性樹脂吐出在該工模上之後，將轉速設 定在2000rpm，旋轉8秒鐘。 使用以上的方法製作試樣#1及試樣#2。又，在試樣 #1的光入射面16a未認定有塗布不均，惟在試樣#2的光 入射面16a認疋有高度2l//m，寬度的塗布不均 勻。 又，藉由與上述同樣的方法，在支持基板1 1上依次 -26- (22) (22)200412425 形成反射層12，第2介質層13，記錄層14及第1介質層 1 5之後，將紫外線硬化性樹脂（大日本墨水化學工業公 司所製的SD318)塗布在第1介質層15上，又將紫外線 照射在該層而形成5 // m厚度的黏接層，在該黏接層上黏 貼1 00 // m厚度的聚碳酸酯所構成的光透過片。然後，經 由光透過性片而藉由將紫外線照射在黏接層，形成105 // m的光透過層1 6。 由此，完成試樣#3。 [試樣的評價] 將上述試樣#1至#3分別設定在檢查裝置（新電子工 業公司所製的 ODA- II型機械精度測定器），一面以 6.3m/sec至21.0m/sec的線速度旋轉，一面將檢查用雷射 光束L 1照射在光入射面1 6a。之後，依據所得到的位置 檢測信號P及焦點誤差信號FE，每一線速度地算出面偏 心加速度及高通面偏心量。 然後，將上述試樣#1至#3分割設定在光碟評價裝置 (巴耳斯提克公司所製的DDU 1000)，一面以6.3m/sec至 2 1.0 m / s e c的線速度進行旋轉，一面將波長4 0 5 n m的雷射 光束L經由數値口徑0.8 5的物鏡沿著軌道照射在記錄層 1 4，測定所得到的殘留焦點誤差成分。 殘留焦點誤差成分的測定是如下地進行。 首先未施加焦點伺服’檢測在變動試樣與物鏡之距離 時所得到的焦點誤差信號，求出表示試樣與物鏡之距離（ -27- (23) 200412425 變位）及焦點誤差信號的輸出之關係的焦點感度曲線。求 出該焦點感度曲線的正側的尖峯値與負側的尖峯値的相差 ，將該値定義爲「F」。之後，檢測藉刀刃法施加焦點伺 服時所得到的焦點誤差信號，並求出其正側的尖峯値與負 側的尖峯値的相差，將該値定義爲「R」。藉由R /F，算 出殘留焦點誤差成分。 將測定結果表示於下述的表。 表 線速度(m/s) 6.3 10.4 14.6 18.8 21 試樣 高通面偏心量(// m) 0.21 0.25 0.28 0.32 0.34 #1 面偏心加速度（m/s2) 4.19 5.70 7.84 9.60 12.29 殘留焦點誤差成分（％) 2.33 3.26 4.53 6.16 7.56 試樣 高通面偏心量(//m) 0.32 0.36 0.40 0.45 0.47 #2 面偏心加速度（m/s2) 7.11 10.88 15.95 22.25 26.04 殘留焦點誤差成分（％) 4.88 10.70 14.30 16.63 19.24 試樣 高通面偏心量("m) 0.31 0.35 0.39 0.43 0.46 #3 面偏心加速度（m/s2) 5.89 8.97 13.30 18.96 22.39 殘留焦點誤差成分（％) 3.49 8.60 12.37 15.47 18.84 如表所示地，在所有試樣中，在高通面偏心量成爲 〇·35 // m以下的線速度，則殘留焦點誤差成分爲10%以 下’惟在高通面偏心量成爲超過0.35 // m的線速度，則殘 留焦點誤差成爲1 0%以上。又，在所有試樣中，在面偏 (24) (24)200412425 心加速度成爲10m/s2以下的線速度，則殘留焦點誤差成爲 10%以下，惟在面偏心加速度成爲超過l〇m/s2的線速度 ，則殘留焦點誤差成分大部分均成爲10%以上。 又，在試樣#1中，將線速度設定在21.0m/sec時，則 對於高通面偏心量成爲0.34 // m (0.35 // m以下），而對於 面偏心加速度成爲12.29m/s2 (10m/s2以上），惟殘留焦點 誤差成爲是7.56% ，低於對於顫動的影響成爲極顯著的 目標的10% 。此乃可能爲表示高通面偏心量者比面偏心 加速度對於殘留焦點誤差成分的相關較強者。 【圖式簡單說明】 第1 U)圖是表示成爲依本發明的檢查方法的對象的 光記錄媒體的一例的光記錄媒體1 0的外觀的切除立體圖 〇 第1 (b)圖是表示放大圖示於第1 (a)圖的A部的局 部剖視圖。 第2圖是表示圖示於第1圖的光記錄媒體1〇的製造 方法的流程圖。 第3圖是表示可實行依本發明的較佳實施形態的光記 錄媒體的檢查方法的檢查裝置1 〇〇的槪略構成圖。 第4圖是表不光頭Π4的構成的槪略圖。 第5圖是表示依本發明較佳實施形態的光記錄媒體的 檢查方法的流程圖。 第6圖是模式地表示檢查用雷射光束L 1焦點鎖定在 -29- (25) 200412425 光記錄媒體前驅體1 〇,的光入射面〗6a的狀態的圖式。 第7圖是表示依步驟S 1 6的判定方法的流程圖。 第8圖是表示判定爲良品的領域的模式性的圖表。 元件對照表 10:光記錄媒體 11:支持基板 1 2:反射層 13:第2介質靥 14:記錄層 15:第1介質餍 16:光透過層 100:檢查裝置 101:主軸電動機 102:橫向電動機 103:雷射驅動電路 104:透鏡驅動電路 105:控制器 1 10:光學系 1 1 1 :雷射光源 1 1 2 :準直透鏡 1 1 3 :分束鏡 114:光頭 1 1 5 :光檢波器 L :雷射光束(1) (1) 200412425 发明. Description of the invention [Technical field to which the invention belongs] The present invention relates to an inspection method for an optical recording medium, and in particular, to a thin light transmitting layer having a side provided on the side opposite to a supporting substrate Inspection method for the next generation of optical recording media. [Prior Art] In recent years, as a recording medium required for recording large-capacity digital data, an optical recording medium represented by a CD (Compact Disc) or a DVD (Digital Versatile Disc) has been widely used. CD is around 1. A light-transmissive substrate with a thickness of 2 mm has a structure in which an information recording layer and a protective layer are laminated. A laser beam having a wavelength of about 780 nm is irradiated to the information recording layer from the light-transmitting substrate side, and data can be recorded and / or regeneration. The laser beam is focused using a numerical aperture (NA) of approximately 0. 45 objective lens, whereby the beam diameter of the laser beam on the information recording layer is reduced to about 1. 6 / zm. As a result, the CD has a recording capacity of about 700MB, and at a constant speed (about 1. 2m / sec) data transfer rate of about 1Mbps. DVD is having around 0. A light-transmitting substrate having a thickness of 6 mm is laminated with an information recording layer and a protective layer, and is approximately 0. The 6 mm-thick spacer substrate is bonded through an adhesive layer. By irradiating a laser beam with a wavelength of about 65 nm from the light-transmitting substrate to the information recording layer, data can be recorded and / or reproduced. The laser beam is focused using a number of apertures (NA) of approximately 0. The objective lens of 6, and thus the laser on the information recording layer (2) (2) 200412425 The beam spot diameter of the beam is reduced to approximately 0. 93 // m. In this way, in the recording and / or reproduction of a DVD, a laser beam having a shorter wavelength than CD is used, and an objective lens having a large aperture diameter (NA) is used, so that a smaller beam spot diameter than that of CD is achieved. . Thus, on the DVD, approximately 4. 7GB / area recording capacity, and equal speed (about 3. 5m / sec) data transfer rate of about 11Mbps. On the other hand, with the advancement of the information society in recent years, the development of optical recording media that are required to have a data recording capacity that exceeds DVD and that can achieve a data transfer rate that exceeds DVD is being developed. In such a next-generation optical recording medium, in order to realize a large capacity and a high data transfer rate, it is necessary to further reduce the beam spot diameter of a laser beam used for data recording and / or reproduction. To this end, The numerical aperture (NA) of the objective lens required to focus the laser beam must be made larger, and at the same time, the wavelength of the laser beam must be shortened. However, when the objective lens required to converge the laser beam becomes high NA, the problem of tolerance of bending or skewing of the optical recording medium arises, that is, the problem of the tilt tolerance becoming extremely small. The tilt tolerance T can be expressed by the following formula when the wavelength of the laser beam used for recording and / or reproduction is λ and the thickness of the light transmitting layer which is the optical path of the laser beam is d. From equation (1), it can be seen that the tilt tolerance is smaller as the NA of the objective lens becomes larger. When the refractive index of the light transmitting layer in which wavefront aberration (coma aberration) occurs is η and the inclination angle is β, the wavefront aberration coefficient W is (3) (3) 200412425 by the following formula Show it. w = meaning (”2—l). "2. sin0. (A ^) 3 ⑵ 2 male 2-sin2 _ From equations (1) and (2), it is known that in order to increase the tilt tolerance and suppress the coma aberration, it is necessary to reduce the incidence of the laser beam used for recording and reproduction. The thickness d of the light transmitting layer is extremely effective. For being used in CD (NA = about 0. 45) The thickness of the light-transmitting substrate is about 1. 2mm while being used on DVD (NA = about 0. 6) The thickness of the light-transmitting substrate is set to approximately 0. 6mm is for the above matters. For the above reasons, in the next generation of optical recording media, in order to fully ensure the tilt tolerance, In order to suppress the occurrence of coma aberration, the thickness of the light transmitting layer must be taken as 200 // m or less, especially as thin as 100 // m or less. For this reason, in the next-generation optical recording medium, such as the current optical recording medium, it is difficult to form an information recording layer on a light-transmitting substrate that becomes the optical path of the laser beam, and information recording is formed on a supporting substrate. On the layers, a thin light-transmitting layer is formed by a spin coating method or adhesion of a light-transmitting sheet, and a method of using this as a light path of a laser beam is reviewed. In this way, in the production of the next generation of optical recording media, it is different from the current optical recording media in which films are sequentially formed from the light incident surface side, and film formation is performed sequentially from the side opposite to the light incident surface. However, the surface of the light-transmitting layer (the light-incident surface of the next-generation optical recording medium) formed by the spin coating method or the adhesion of the light-transmitting sheet is similar to the light-transmittance produced by the injection molding method. Compared with the surface of a substrate (the light incident surface of a CD or DVD), it has a lower flatness (4) (4) 200412425 problem. Moreover, in a CD or a DVD, since the beam convergence point of the laser beam formed on the light incident surface is somewhat large (CD: about 700 // m, DVD: about 500 // m), the light incident surface The concavities and convexities are diluted, and the effect on the recording characteristics or reproduction characteristics becomes smaller. On the other hand, in the next-generation optical recording medium, the beam convergence point of the laser beam formed on the light incident surface is extremely small (for example, 130 // m). Therefore, there is a possibility that the slight unevenness greatly affects the recording characteristics or reproduction characteristics. Therefore, in the production process of the next-generation recording medium, it is required to check the surface property of the light incident surface, and to exclude it as a defective product when the surface property is low. [Summary of the Invention] Therefore, the object of the present invention is to An inspection method for an optical recording medium that supports a thin light-transmitting layer on the opposite side of the substrate is intended to provide a method for inspecting the surface property of a light incident surface. The object of the present invention is to provide an inspection method for an optical recording medium, which includes a support substrate, a light transmission layer, and an information layer provided between the support substrate and the light transmission layer. An inspection method for an optical recording medium for recording and / or reproducing data by irradiating the information layer through the light-transmitting layer, comprising: calculating a high-pass surface eccentricity of a light incident surface on which the laser beam is incident; and Or the step of surface eccentric acceleration, and the step of judging whether it is good or bad according to the above-mentioned high-pass surface eccentricity amount and / or surface eccentric acceleration. According to the present invention, it is possible to simply and surely exclude the optical recording medium having unevenness which records and / or reproduces from -9- (5) (5) 200412425 which exerts a significant influence on the first incident surface. Therefore, the present invention is extremely suitable for the inspection of the next-generation type optical recording medium, which has a significant effect on the recording and / or reproduction of the unevenness of the light incident surface. The calculation step is performed by aligning the focal point of the inspection laser beam on the light incident surface while rotating the optical recording medium. At this time, it is desirable to measure the folded-back light of the above-mentioned inspection laser beam, and calculate the high-pass surface eccentricity based on the obtained focus error signal. It is desirable to measure the movement of the objective lens that condenses the above-mentioned inspection laser beam, and based on the obtained It is ideal to calculate the above-mentioned surface eccentric acceleration by using the position detection signal. The determination step is preferably performed when the high-pass surface eccentricity exceeds at least 0.35. By setting the critical value of the eccentricity of the high-pass surface in this way, the residual focus error component due to the eccentricity of the high-pass surface can be made to about 10% or less during actual recording and / or reproduction. The determination step is preferably performed when the surface eccentric acceleration exceeds at least 1 Om / s2. When the critical threshold of the surface eccentric acceleration is set in this way, the residual focus error component due to the high-pass eccentricity can be made to about 10% or less during actual recording and / or reproduction. The thickness of the light transmitting layer is preferably 30 to 200 // m. The optical recording medium having such a light-transmitting layer is a so-called next-generation type optical recording medium. The unevenness of the light incident surface has a significant effect on recording and / or reproduction. Therefore, the present invention is extremely suitable for application. The information layer may include a recording layer made of a phase change material. Such an optical recording medium is a so-called rewritable optical recording medium. In this case, it is also possible to carry out the above calculation steps before initializing the recording layer. (6) (6) 200412425 is fine. When the recording layer is initialized, the reflectance is greatly increased, making it difficult to focus the laser beam for inspection on the light incident surface. However, this problem can be solved by performing the calculation steps described above before initializing the recording layer. . [Embodiment] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings. Fig. 1 (a) is a cut perspective view showing the appearance of an optical recording medium 10, which is an example of an optical recording medium that is an object of the inspection method according to the present invention; Fig. 1 (b) is a diagram showing the diagram shown in Fig. 1 (a ) An enlarged partial cross-sectional view of part A in the figure. The optical recording medium 10 shown in FIG. 1 is a so-called rewritable optical recording medium, but the optical recording medium that is the object of the inspection method according to the present invention is not limited to a rewritable optical recording medium. Write-once optical recording media or reproduction-only optical recording media, etc., other types of optical recording media may also be subject to inspection. The optical recording medium 10 shown in Figs. 1 (a) and (b) has an outer diameter of about 120 mm and a thickness of about 1. A 2 mm disc-shaped optical recording medium includes a support substrate 11 and a reflective layer 12, a second dielectric layer 13, a recording layer 14, and a first dielectric layer 15 as shown in FIG. 1 (b). And a light transmitting layer 16. Without particular limitation, the optical recording medium 10 shown in FIG. 1 uses a laser beam L having a wavelength λ of 380 nm to 450 nm, preferably about 40 5 nm, to pass light from the surface of the light transmitting layer 16 A rewrite type optical recording medium that can be irradiated with the incident surface 16a and can record and reproduce data. For the recording and reproduction of data on the optical recording medium 10, the number 値 -11 is used. (7) (7) 200412425 caliber is 0. 7 or more, ideally 0. When the objective lens is around 85, the wavelength of the laser L is taken as Λ, and when the numerical aperture of the objective lens is taken as NA, it is set to I / NAS 640nm. The "second" dielectric layer 13 and the "first" dielectric layer 15 mean that they are the second and first dielectric layers when viewed from the light incident surface 16a. The supporting substrate 11 is used to secure the thickness required for the optical recording medium 10 (approximately 1. 2mm) required about 1. A disc-shaped substrate having a thickness of 1 mm has a concave rail 11a and a convex rail lib necessary for guiding the laser beam L in a spiral shape on one surface from the vicinity of the center portion toward the outer edge portion. As the material of the supporting substrate 11, various materials can be used, and for example, glass, ceramics, or resin can be used. Among these, a polycarbonate resin is generally used from the viewpoint of ease of molding. The reflective layer 12 has a laser beam L which reflects incident from the light transmitting layer 16 side. The light is emitted from the light transmitting layer 16 side. As the material of the reflective layer 12, various materials that can reflect the laser beam L can be used, for example, magnesium (Mg) indium (A1), titanium (Ti) 9 chromium (Cr), iron (Fe), cobalt (Co), Nickel (Ni) ^ copper (Cu) 9 zinc (Zn), germanium (G e), silver (Ag), platinum (Pt), gold (Au), etc. as the thickness of the reflective layer 13 is set to 5 to 300 nm. The first dielectric layer 15 and the second dielectric layer 13 have physical and / or chemical properties: the cell protects the recording layer 1 4 disposed between these 1 and the recording layer 14 by being sandwiched; The 1 medium layer 15 and the second medium layer 1 3 can effectively prevent deterioration of recorded information for a long period of time after optical recording. The materials constituting the first dielectric layer 15 and the second dielectric layer 3 are in the wavelength range of the laser beam L used by -12- (8) (8) 200412425, and are not particularly limited as long as they are transparent media. An oxide, a sulfide, a nitride, or a combination of these is used as a main component, but from the viewpoints of prevention of thermal deformation of the support substrate 11 and the like and protection characteristics for the recording layer 14, Al203, AIN, ZnO, ZnS, Gen, CeCrN, Ce〇2, Si〇, Si〇2, Si3N4, SiC, La203, Ta〇, Ti〇2, SiAlON (a mixture of Si02, Al203, ShN4 and AIN), etc., and LaSiON (La2〇3, a mixture of SiCh and Si3N4), etc., aluminum (Al), silicon (Si), hafnium (Ce), titanium (Ti), zinc (Zn), giant (Ta) oxides, nitrides, etc. Sulfides, carbides or mixtures of these are preferably used. The layer thicknesses of the first dielectric layer 15 and the second dielectric layer 13 are set to 3 to 200 nm. The recording layer 14 is a layer on which a reversible recording mark is formed, and is composed of a phase change material. The reflectance when the phase change material is in a crystalline state is different from the reflectance in an amorphous state. Therefore, the data is recorded using this method. The recorded data is determined by the length of the recording mark in the amorphous state (from The length from the leading edge to the trailing edge of the recording mark) and the length of the blank area (such as the length from the trailing edge of the recording mark to the leading edge of the next recording mark) as a crystalline state. In order to change the recording layer 14 from a crystalline state to an amorphous state, the laser beam L irradiated from the light incident surface 16a is made into a pulse waveform having an amplitude from a recording power Pw to a substrate power Pb, so that recording is performed. The layer 14 is heated to a temperature above the melting point, and then quenched by setting the power of the laser beam 1 to a reference power Pb. As a result, the molten region changes to an amorphous state, and this becomes a recording mark. On the other hand, in order to change -13-200412425 0) recording layer 14 from an amorphous state to a crystalline state, the power of the laser beam L radiated from the light incident surface 16a is set to the erasing power Pe , So that the recording layer 14 is heated to a temperature higher than the crystallization temperature. The area heated to a temperature higher than the crystallization temperature is cooled by leaving the laser beam L, so that the area changes to a crystalline state. Here, the relationship between the recording power Pw, the erasing power Pe, and the base power Pb is set to Pw> Pe ^ Pb. Therefore, by adjusting the power of the laser beam L in this way, not only the recording mark can be formed on the recording layer 1 4 In the unrecorded area, and in the area where the recording mark has been formed, a recording mark different from the recording mark can be directly rewritten. The type of the phase-change material constituting the recording layer 14 is not particularly limited, but it can be directly rewritten at high speed, and the time required to change from an amorphous structure to a crystalline state (crystallization time) is selected to be short. The material is ideal, and examples of such a material include SbTe-based materials. As the SbTe-based material, only SbTe may be used, or at the same time, the crystallization time may be shortened. ’Additives may be added to improve the reliability of long-term storage. The layer thickness of the recording layer 14 is set to 2 to 40 nm. The light transmitting layer 16 is an optical path layer of the laser beam L while constituting the incident surface of the laser beam L, and its thickness is set to 30 to 200 // m, and is preferably set to about 100. As a material of the light transmitting layer 16, in the wavelength range of the laser beam L to be used, as long as the material having a sufficiently high light transmittance is not particularly limited, an acrylic or epoxy-based ultraviolet curable resin is most suitable. In addition, instead of curing the ultraviolet curable film -14-(10) (10) 200412425 _, it is also possible to use a light-transmitting resin composed of a light-transmitting resin to form a light-transmitting layer 16 with various adhesives. Among the layers constituting the optical recording medium 10, a layer provided between the support substrate 11 and the light transmitting layer 16 is collectively referred to as an "information layer". In the reproduction-only optical recording medium, since information is held by the pit row provided on the support substrate 11, a layer corresponding to the recording layer 14 is not provided, but in this case, the 'reflection layer is equivalent to the information layer. Hereinafter, a method for manufacturing the optical recording medium 10 shown in Fig. 1 will be described. The manufacturing process of the rewritable optical recording medium 10 is largely classified into a film forming process and an initializing process, and the film forming process and the initializing process are sequentially performed. Fig. 2 is a flowchart showing a method of manufacturing the optical recording medium 10 shown in Fig. 1. First, a support substrate 1 1 formed by a concave rail π a and a convex rail 1 1 b is produced by an injection molding method using a stamper (step S 1). However, the production of the supporting substrate 11 is not limited to the injection molding method, and the supporting substrate 11 may be produced by other methods such as the 2P method. Then, the reflecting surface 12 is formed on the surface on which the concave rail 11a and the convex rail lib are provided on the surface of the support substrate 11 (step S2). The reflection layer 12 is preferably formed by a vapor phase growth method using a chemical seed source containing constituent elements of the reflection layer 12. Examples of the vapor phase growth method include a sputtering method and a vacuum evaporation method. Among them, a sputtering method is preferred. Then, a second dielectric layer 13 is formed on the reflective layer 12 (step s3). For the formation of the second dielectric layer 13, a chemical seed source containing constituent elements of the second dielectric layer -15- (11) (11) 200412425 1 3 is also preferably used. Then, the phase change material after sputtering becomes an amorphous state, and an initializing process performed thereafter becomes a crystalline state. After that, a first dielectric layer 15 is formed on the recording layer 14 (step S5). For the formation of the first dielectric layer 15, a vapor phase growth method using a chemical seed source containing constituent elements of the first dielectric layer 15 is also preferable, and a sputtering method is more preferable. Then, a light transmitting layer 16 is formed on the first dielectric layer 15 (step S 6). The light-transmitting layer 16 is obtained by applying a protective film such as a propylene-based or epoxy-based UV-curable resin having a adjusted viscosity by a spin coating method or the like, and curing by irradiating ultraviolet rays, or by transmitting light through an adhesive A light-transmitting sheet made of a flexible resin can be formed. As described above, the surface (light incident surface 16a) of the light transmitting layer 16 formed by the rotating mineral film method or the sticking of a light transmitting sheet is a light transmitting substrate that is in contact with the light incident surface of the CD or DVD. Compared with a surface, it is easy to make flatness low. From the above, the film formation process is completed. In the present invention, the optical recording medium in a state where the film formation process is completed is referred to as "optical recording medium precursor 10 '". However, when no special distinction is required, for convenience, the optical recording medium precursor 1 (Γ is also simply referred to as "optical recording medium". Thereafter, the optical recording medium precursor 10 'is mounted on a laser irradiation device (not shown) The rotating stage rotates while continuously irradiating the laser beam for initializing. The laser beam has a shorter length in the direction (circumferential direction) of the concave rail 11a and the convex rail lib, and is perpendicular to the concave rail 11a. The length of the direction (radial direction) of the convex track lib is relatively long. When the optical recording medium (12) (12) 200412425 rotates once, the body precursor 10 'deviates from the irradiation position in the radial direction. The radiation beam irradiates approximately the entire surface of the recording layer 14. That is, the recording layer 14 is initialized (step S7). The phase change material in the area irradiated with the laser beam is heated to a temperature exceeding the melting point. After that, the laser beam for initializing is gradually cooled, so that the full recording layer 14 becomes a crystalline state, that is, an unrecorded state. From the above, the initializing process is completed, and the optical recording medium 10 is completed. Initializing , The crystal grain size becomes larger, and as a result, the reflectance of the recording layer 14 becomes extremely high. Moreover, the manufacturing method of the optical recording medium 10 is not particularly limited to the above-mentioned manufacturing method, and it can be used in well-known ones. Manufacturing technology for manufacturing optical recording media. Hereinafter, a method for inspecting an optical recording medium according to a preferred embodiment of the present invention will be described. As an inspection timing, after the film formation process is completed, it may be performed at any timing, but As described below, if the reflectance of the recording layer 14 is high, it is difficult to perform the inspection. Therefore, it is preferable to perform the inspection after the film formation process and before the initialization process (between steps S6 and S7). Therefore, the following The case where the above-mentioned optical recording medium precursor 10 'is used as an inspection target will be described as an example. Fig. 3 is a schematic diagram of an inspection apparatus 100 that can implement an inspection method of an optical recording medium according to a preferred embodiment of the present invention. As shown in FIG. 3, the inspection device 100 is provided with a spindle motor 101 that rotates an optical recording medium precursor 10 ', and an inspection mine The light beam L1 -17- (13) (13) 200412425 irradiates the optical system 110 of the optical recording medium precursor 10 ', and the transverse motor 102 which moves the optical system 110 toward the radial direction of the optical recording medium precursor 10', And a laser driving circuit 103 for supplying a laser driving signal 103a to the optical system 110, and a lens driving circuit 104 for supplying a lens driving signal 104a to the optical system 110, and controlling a spindle motor 101, a transverse motor 102, and a laser driving circuit 103 and the controller 105 of the lens driving circuit 104. The optical system 110 includes a laser light source 111 that generates a laser beam L1 for inspection based on the laser drive signal 103a, and an inspection laser beam L1 that emits the laser light source 111. A collimating lens 1 1 2 converted into parallel light, a beam splitter 113 that separates the inspection laser beam L1 and its return light L2, and an optical head 114 that irradiates the inspection laser beam L1 on the optical recording medium precursor 10 '. And a photodetector 115 that generates a focus error signal FE based on the folded-back light L2 of the inspection laser beam. FIG. 4 is a schematic diagram showing the configuration of the optical head 114. As shown in FIG. 4, the head 114 includes an objective lens 114 a for focusing the laser beam L1 for inspection, an actuator 1 14 b that moves the objective lens 114 a up and down in accordance with the lens driving signal 104 a, and a permanent lens fixed to the objective lens 114 a A magnet 114c and a coil 114d provided to surround the permanent magnet 114e. The permanent magnet 114c and the coil 1 14d provided to surround the permanent magnet are position detectors required to detect the vertical position of the objective lens 1 1 4a. The current flowing through the coil 1 14d is supplied as a position detection signal P to Controller 105. The spindle motor 101 rotates the optical recording medium precursor 10 'at a desired rotation speed under the control of the controller 105. Lateral motor -18- (14) (14) 200412425 1 02 is used for moving the optical system 110 in the radial direction of the optical recording medium precursor 10 'under the control of the controller 105. The laser driving circuit 103 is used for supplying the laser driving signal 103a to the laser light source 111 in the optical system 110 under the control of the controller 105. The lens driving circuit 104 is used to supply the lens driving signal 104a to the optical head 114 under the control of the controller 105. As described above, the actuator 114b in the optical head 114 that receives the lens driving signal 104a moves the objective lens 114a up and down based on the signal. As a result, it is possible to accurately focus the beam spot of the inspection laser beam L1 on the desired side. The controller 105 includes a focus control circuit 105a and a determination circuit 105b. When the focus control circuit 105a becomes active, the focus of the inspection laser beam L1 is controlled by focusing the lens driving circuit 104 on the focus lock on The state of the desired side. The determination circuit 105b is a circuit for determining whether the optical recording medium precursor 10 'to be inspected is a good product or a defective product, and is based on a focus error signal FE generated by the optical detector 115 and a position detector. The generated position detection signal P is determined. Fig. 5 is a flowchart showing a method of inspecting an optical recording medium according to a preferred embodiment of the present invention. In the inspection of the optical recording medium according to this embodiment, after the laser beam precursor 10 ′ to be inspected is set in the inspection device 100, first, it is rotated by the spindle motor 1 0 1 under the control of the controller 105. The optical recording medium precursor 10 '(step S11), and by driving the laser driving circuit 103, the inspection laser beam L1 is irradiated on the optical recording medium precursor -19- (15) (15) 200412425 10' (Step S 12). At this time, the inspection position can be adjusted in the radial direction of the optical recording medium precursor 101 by driving the motor 102. The rotation of the optical recording medium precursor 10 'according to the spindle motor 101 is ideal for controlling the linear speed of the inspection laser beam L1 to be constant. The linear speed at this time is approximately the same as the actual recording time and / or reproduction The line speed is ideal. When the linear velocity at the time of inspection and the linear velocity at the time of recording and / or reproduction are approximately the same, it is possible to perform an inspection by considering the influence of the unevenness existing in the light incident surface 16a on the actual data recording and / or reproduction. Then, under the control of the controller 105, the lens driving circuit 104 is driven to focus the inspection laser beam L1 on the light incident surface 16a of the optical recording medium precursor 10 '(step S13). Thereafter, by activating the focus control circuit 105a in the controller 105, the focus of the inspection laser beam L1 on the light incident surface 16a of the optical recording medium precursor 1CT can be locked (step S14). As a result, in the actuator 114b and the objective lens 114a in the optical head 114, the lens driving signal 104a can be supplied in real time following the unevenness of the light incident surface 16a. Fig. 6 is a diagram schematically showing a state where the focus of the inspection laser beam 11 on the light incident surface 16a of the optical recording medium precursor 10 'is locked. The light incident surface 16a generally has a reflectance of about 5%. Therefore, when the data is recorded or reproduced, the focus is locked on the light incident surface 16a, as in the case where the focus is locked on the recording layer 14. However, compared with the light incident surface 16a, if the reflectance of the memory layer 14 is too high, it is not easy to lock the focus of the inspection laser beam L1 on the light incident surface i6a. Therefore, it is desirable that the reflectance of the recording layer 14 is low when inspecting -20- (16) (16) 200412425. It is for this reason that the inspection process shown in Fig. 5 is performed better than before the initialization process (the diagrams of steps S6 and 7). In this state, the determination circuit 105b included in the controller 105 monitors the position detection signal P supplied from the optical head 114 and the focus error signal FF supplied from the optical detector 115, and according to these differences The surface eccentric acceleration and the high-pass surface eccentricity are calculated (step S15). Here, the "surface eccentric acceleration" refers to the acceleration generated in the objective lens 114, and the "high-pass surface eccentricity" refers to the steep unevenness that exists on the surface of the light incident surface 16a, and the objective lens 114a cannot follow. The calculation of the surface eccentric acceleration based on the detection signal P and the high-pass surface eccentricity based on the focus error signal FF are performed as follows. That is, when the objective lens 114a moves up and down in conjunction with the unevenness existing on the surface of the light incident surface 16a, the position detection signal P indicates the current associated with the movement. Therefore, it is differentiated twice in the determination circuit 105b by the The position of the objective lens 11 4 a indicated by the position detection signal P is such that the acceleration occurring in the objective lens 114 a is known. On the other hand, even if there is unevenness on the surface of the light incident surface 16a, the objective lens 114a does not move up and down in conjunction with this, that is, the unevenness is so steep that the objective lens 11a cannot track at any time. There is no change in the detection signal P. In this way, by referring to the position detection signal P, it is possible to calculate the unevenness that can be followed by the objective lens 114a existing in the unevenness on the surface of the light incident surface 16a, and how much acceleration is generated in the objective lens 1 1 4a. Eccentric acceleration of surface. " -21-(17) (17) 200412425 In addition, even if the unevenness exists on the surface of the light incident surface 16a and the unevenness is steep, the objective lens 114a cannot track at any time, the focus of the inspection laser beam L1 is incident from the light The surface 16a is deviated, and the amount of the deviation appears in the focus error signal FF. On the other hand, even if the unevenness exists on the surface of the light incident surface 16a, and the objective lens 114a can be moved up and down correctly in conjunction with the unevenness, the focus error signal FE indicates that it is focused correctly. Therefore, by referring to the focus error signal FE, it is possible to calculate the existence and magnitude of the steep unevenness existing on the surface of the light incident surface 16a, which is not followed by the objective lens 114a, that is, the "high-pass surface eccentricity" can be calculated. The concavo-convex limit that can be followed by the objective lens 114a differs depending on the components used, but is about 500 Hz when using CD components. That is, in the unevenness on the surface of the light incident surface 16a, if the frequency component is 500 Hz or less, the objective lens 114a can be followed. On the other hand, when the frequency component exceeds approximately 500 Hz, the objective lens 114a cannot follow the frequency. . In this way, referring to the position detection signal P supplied from the optical head 114 and the focus error signal FE supplied from the optical detector 115, the surface eccentric acceleration and the high-pass surface eccentricity indicating the surface properties of the light incident surface 16a can be calculated. Then, the determination circuit 105b included in the controller 105 determines whether the optical recording medium precursor 10 to be inspected is a good product or a defective product based on the surface eccentric acceleration and the high-pass surface eccentricity calculated in step S15. (Step S 1 6). Fig. 7 is a flowchart showing a determination method according to step S16. First, in step S16, referring to the high-pass surface eccentricity amount obtained from the focus error signal FE of -22- (18) (18) 200412425, it is determined whether the amount exceeds the threshold of the high-pass surface eccentricity amount (step S21). Here, the "critical threshold of the eccentricity of the high-pass surface" is the largest threshold of the size allowed by the steep unevenness that the objective lens 14a cannot follow in the unevenness of the light incident surface 16a. In order to exclude the actual recording and / or reproduction Become a problem of the optical recording medium precursor 10 ', set the critical 値 of the eccentricity of the high-pass surface at 0. 3 to 0. 4 // m, especially set at about 0.35 / z m is ideal. By setting the critical value of the eccentricity of the high-pass plane here, the residual focus error component due to the eccentricity of the high-pass plane can be set to about 10% or less in actual recording and / or reproduction. If the residual focus error component exceeds 10%, the effect on the flutter becomes extremely significant, so this optical recording medium precursor 10 'must be excluded during the main inspection process. Thereafter, as a result of the determination in step S21, the maximum value 値 of the eccentricity amount of the high-pass surface exceeds the critical value 値 (step S21: Yes), and it is determined as a defective product. On the other hand, if the maximum 値 of the surface eccentricity does not exceed the critical 値 (step S21: No), then the maximum 値 of the surface eccentric acceleration of the light incident surface 16a is extracted to determine whether the 超过 exceeds the critical 値 of the surface eccentric acceleration (step S22). Here, the "critical 値 of surface eccentric acceleration" is the maximum 値 allowed by the acceleration of the objective lens 114a according to the unevenness existing on the light incident surface 16a. It can be followed even in the inspection device 100 and is set to exclude the use of The user actually uses the optical recording medium precursor 10 'having a driving performance having a plane eccentricity which may be out of focus for the purpose. In order to eliminate the optical recording medium precursor 10 'having a surface eccentric acceleration which is a problem in actual recording and / or reproduction, the critical value 面 of the surface eccentric acceleration is set to 5 to 15m / S2, and in particular, it is set to about 10m / S2. ideal. If the threshold 値 of acceleration of eccentric surface -23- (19) (19) 200412425 is set as such, in actual recording and / or reproduction, the residual focus error component due to eccentricity of high-pass surface can be approximately 10% or less. . As a result, if the maximum 値 of the surface eccentric acceleration exceeds the critical value (step 22: Yes), it is determined as a defective product. On the other hand, if the maximum 値 of the surface eccentric acceleration does not exceed the critical value (step 22: No), it is finally judged as a good product, and the initializing process shown in FIG. 2 is performed (step 7). Fig. 8 is a schematic diagram showing an area judged to be a good product according to the reference shown in Fig. 7. As shown in FIG. 8, it is determined based on the criteria shown in FIG. 7. The area judged to be a good product is a square on both sides of the graph that contacts both axes. It can be seen that the high-pass surface eccentricity and surface eccentric acceleration They were judged to be good only when they were below the predetermined critical threshold. As described above, according to the present embodiment, in the inspection of the next-generation optical recording medium 10 having the thin light transmitting layer 16 provided on the side opposite to the support substrate 11, the inspection laser beam L1 is inspected Is focused on the light incident surface 16a, and based on the position detection signal P and the focus error signal FE obtained when the focus is locked, the surface property of the light incident surface 16a is checked, so it can be simply and surely excluded from recording and / Alternatively, it is reproduced from the optical recording medium 10, which is a problematic light incident surface 16a. In the present invention, the "light incident surface" refers to the surface of the optical recording medium on which the laser beam used for recording and / or reproduction is incident, without requiring the surface of the light transmitting layer 16. Therefore, when a hard coat layer or the like is provided on the surface of the light transmitting layer 16, the surface becomes a "light incident surface". The present invention is not limited to the above embodiments, and various changes can be made within the scope of the invention described in the application range of 24-24 (20) (20) 200412425. Of course, these are also included in the present invention. Within range. For example, in the above-mentioned embodiment, the determination is performed in step S 16 based on both the high-pass surface eccentricity and the surface eccentric acceleration (refer to FIG. 7). According to the purpose, one of the high-pass surface eccentricity and the surface eccentric acceleration is determined. Judgment is also possible. However, in order to surely exclude the optical recording medium 10 that is a problem in actual recording and / or reproduction, it is best to make a determination based on both the high-pass surface eccentricity and the surface eccentric acceleration as described in the above embodiment, at least on the high-pass surface. It is ideal to judge the amount of eccentricity. In addition, the inspection apparatus 100 used in the above embodiment uses a position detector composed of a permanent magnet 11 4c and a coil 11 4d to generate a position detection signal P. However, by using a method other than this, it is possible to measure the generation of the objective lens. 1 1 4a acceleration is also possible. For example, instead of the permanent magnets 11 4c and the coils 1 1 4d, an electrostatic capacity type position detector can be provided, so that the acceleration generated in the objective lens 114a can also be measured. In the above embodiment, the surface of the light incident surface is inspected by aligning the focal point of the inspection laser beam L1 on the light incident surface of the optical recording medium. However, the inspection method of the present invention is not limited to this. Here, for example, the light incident surface of the rotating optical recording medium may be irradiated with electromagnetic waves or sound waves, and the surface of the light incident surface may be checked by measuring the frequency of the reflected wave due to the Doppler effect. (Examples) Hereinafter, the present invention will be described more specifically with reference to the examples. However, the present invention is not limited to these examples (25) (21) (21) 200412425. [Sample production] First, by injection molding, a thickness of 1. 1mm, diameter 120mm, and concave and convex tracks llb are formed on the surface (gauge (concave track pitch) = 0. 3 // m) dish-shaped support substrate 11 made of polycarbonate. Then, the support substrate 11 is set in a sputtering apparatus. In this order, silver (Ag), pins (Pd), and copper (Cu) are formed on the surface of one side on which the concave tracks 11 a and the convex tracks 11 b are formed by a sputtering method. 100nm thick reflective layer 12 made of an alloy, 20nm thick second dielectric layer 13 made of Al203, 12nm thick recording layer 14 with an atomic ratio of SbTdeuGedn !, and a mixture of ZnS and SiO2 (Mo Ratio: 80: 20) of the first dielectric layer 15 having a thickness of 130 nm. After that, a UV curable resin (viscosity at 25 ° C = 5000 cP) was applied on the first dielectric layer 15 by a spin coating method, and a layer of light having a thickness of 100 μm was formed by irradiating ultraviolet rays on the layer. Transmission layer 1 6. When the mineral film is rotated, 'the center hole of the support substrate u is closed using a closing die' and the ultraviolet curable resin is ejected onto the die, the rotation speed is set at 2000 rpm and the rotation is performed for 8 seconds. Sample # 1 and sample # 2 were prepared using the above method. In addition, coating unevenness was not recognized on the light incident surface 16a of Sample # 1, but coating unevenness was observed on the light incident surface 16a of Sample # 2 with a height of 2 l // m and a width. In addition, by the same method as described above, after forming the reflective layer 12, the second dielectric layer 13, the recording layer 14, and the first dielectric layer 15 on the supporting substrate 11 in the order of -26- (22) (22) 200412425, An ultraviolet curable resin (SD318 manufactured by Dainippon Ink Chemical Industry Co., Ltd.) was applied to the first dielectric layer 15 and ultraviolet rays were irradiated on the layer to form an adhesive layer with a thickness of 5 // m. A light transmitting sheet made of polycarbonate with a thickness of 1 00 // m is stuck on it. Then, the adhesive layer is irradiated with ultraviolet rays through the light-transmitting sheet to form a light-transmitting layer 16 of 105 m. Thereby, sample # 3 is completed. [Evaluation of Samples] The above-mentioned samples # 1 to # 3 were respectively set in an inspection device (ODA-II type mechanical accuracy tester manufactured by Shin Denki Kogyo Co., Ltd.), with 6. 3m / sec to 21. While rotating at a linear velocity of 0 m / sec, the inspection laser beam L 1 was irradiated onto the light incident surface 16 a. Then, based on the obtained position detection signal P and focus error signal FE, the surface eccentric acceleration and the high-pass surface eccentricity are calculated for each linear velocity. Then, the above-mentioned samples # 1 to # 3 are divided and set in a disc evaluation device (DDU 1000 manufactured by Barstic), with 6. 3m / sec to 2 1. The linear velocity of 0 m / s e c is rotated, while the laser beam L with a wavelength of 4 0 5 n m passes through a number of apertures of 0. The objective lens of 85 was irradiated onto the recording layer 14 along the track, and the residual focus error component obtained was measured. The measurement of the residual focus error component was performed as follows. First, the focus servo is not applied to detect the focus error signal obtained when the distance between the sample and the objective lens is changed, and the distance between the sample and the objective lens (-27- (23) 200412425 displacement) and the output of the focus error signal are obtained. Focus sensitivity curve of the relationship. The difference between the peak 値 on the positive side of the focus sensitivity curve and the peak 値 on the negative side is obtained, and this 値 is defined as "F". Then, the focus error signal obtained when the focus servo is applied by the blade method is detected, and the difference between the peak 値 on the positive side and the peak 求 on the negative side is obtained, and this 値 is defined as "R". The R / F is used to calculate the residual focus error component. The measurement results are shown in the following table. Table Linear speed (m / s) 6. 3 10. 4 14. 6 18. 8 21 Sample eccentricity of high-pass surface (// m) 0. 21 0. 25 0. 28 0. 32 0. 34 # 1 Surface eccentric acceleration (m / s2) 4. 19 5. 70 7. 84 9. 60 12. 29 Residual focus error component (%) 2. 33 3. 26 4. 53 6. 16 7. 56 Sample eccentricity of high-pass surface (// m) 0. 32 0. 36 0. 40 0. 45 0. 47 # 2 Surface eccentric acceleration (m / s2) 7. 11 10. 88 15. 95 22. 25 26. 04 Residual focus error component (%) 4. 88 10. 70 14. 30 16. 63 19. 24 Specimen & Eccentricity of High Pass Surface 0. 31 0. 35 0. 39 0. 43 0. 46 # 3 Surface eccentric acceleration (m / s2) 5. 89 8. 97 13. 30 18. 96 22. 39 Residual focus error component (%) 3. 49 8. 60 12. 37 15. 47 18. 84 As shown in the table, in all the samples, the eccentricity on the high-pass surface becomes a linear velocity of 0.35 // m or less, and the residual focus error component is 10% or less. 'However, the eccentricity on the high-pass surface exceeds 0. 35 // m linear velocity, the residual focus error becomes more than 10%. Also, in all samples, when the surface deviation (24) (24) 200412425 has a linear acceleration with a linear velocity of 10 m / s2 or less, the residual focus error becomes 10% or less, but the surface eccentric acceleration exceeds 10 m / s2. Linear velocity, most of the residual focus error components are more than 10%. Also, in sample # 1, the linear velocity was set to 21. At 0m / sec, the eccentricity for the high-pass surface becomes 0. 34 // m (0. 35 // m or less), and the eccentric acceleration for the surface becomes 12. 29m / s2 (10m / s2 or more), but the residual focus error is 7. 56%, less than 10% where the impact on tremors became a very significant target. This is likely to indicate that the high-pass surface eccentricity has a stronger correlation with the residual focus error component than the surface eccentricity. [Brief Description of the Drawings] Figure 1 U) is a cutaway perspective view showing the appearance of an optical recording medium 10 as an example of an optical recording medium that is an object of the inspection method according to the present invention. Figure 1 (b) is an enlarged view A partial cross-sectional view of part A shown in FIG. 1 (a). Fig. 2 is a flowchart showing a method of manufacturing the optical recording medium 10 shown in Fig. 1. Fig. 3 is a schematic configuration diagram showing an inspection apparatus 100 capable of implementing an inspection method of an optical recording medium according to a preferred embodiment of the present invention. FIG. 4 is a schematic diagram showing the configuration of the bald head Π4. Fig. 5 is a flowchart showing a method for inspecting an optical recording medium according to a preferred embodiment of the present invention. FIG. 6 is a diagram schematically showing a state where the focus of the inspection laser beam L 1 is locked at -29- (25) 200412425, the light incident surface 6a of the optical recording medium precursor 10 ,. Fig. 7 is a flowchart showing a determination method according to step S16. Fig. 8 is a graph showing the pattern of a region determined to be a good product. Component comparison table 10: Optical recording medium 11: Support substrate 1 2: Reflective layer 13: Second medium 靥 14: Recording layer 15: First medium 餍 16: Light transmitting layer 100: Inspection device 101: Spindle motor 102: Transverse motor 103: Laser driving circuit 104: Lens driving circuit 105: Controller 1 10: Optical system 1 1 1: Laser light source 1 1 2: Collimation lens 1 1 3: Beam splitter 114: Optical head 1 1 5: Optical detection Device L: Laser beam
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