200412319 坎、發明說明： 【發明所屬技術領域】 發明領域 本發明涉及一種吸附墊，它包括墊部和支撐部，該墊 5部具有：由産生比支撐上述對象物産生的負荷的支撐力大 的吸附力的真空、對被支撐的面爲平面的對象物的上述被 支撐面進行吸附的支撐面以及被支撐的被支撐部，該支撐 部’支撐上述被支撐部，尤其涉及在液晶玻璃基板的熱處 理的移送時防止真空吸附面脫落的技術。 10 【先前技術】 背景技術 對液晶顯示器用玻璃基板（以下，簡稱爲“玻璃基板，，) 等具有平面狀的被支撐部的對象物、在熱處理或其前後的 工序進行移送時，通常使用安裝在機械手上的多個吸附 15 墊。即，爲了以某種程度的高速且安全地移動·移送玻璃 基板，不但將它簡單地放在機械手上，而且通過吸附墊牢 固地真空吸附玻璃基板。 這種基板移送部分的結構，通常，如第5圖所示，由玻 璃基板W、承載該基板W的4個吸附墊丨，的墊2,、被配置於 20 機械手10上並安裝著該墊2’的支撐體3，、與形成在墊2,中並 與支撐體3,一側相導通的真空吸引用的通路25、形成在墊2, 的下部與支撐體3,之間的球面狀支撐面24,及33,等構成。而 且，通過球面狀支撐面的墊的旋轉，可與玻璃基板的彎曲 或4個墊的支撐面的傾斜角的誤差相對應。（例如參照專利 5 200412319 文獻1。） 專利文獻1 :特開平07 —237765號公報（第1圖、第2圖 及相關說明） 但是，在由上述的現行的吸附墊將lm左右的方形的大 5型的玻璃基板放入280 C左右的熱處理室進行熱處理後取 出進行移送時，産生玻璃基板w與吸附墊1，的吸附支撐面22 之間的真空度降低的問題。 這個問題被認爲是由於玻璃基板的大型化而使作爲多 個吸附墊之間的最大間隔的圖示的€111變長，並在取出高溫 10的玻璃基板時，其溫度急劇地下降而使熱收縮的量變大， 又因玻璃基板與機械手之間的相對變位使它們雙方均向處 在其中間的吸附墊施加外力，而在現行的結構中不能與之 相對應，是産生破壞真空的動作。另外，由於玻璃基板的 大型化而産生重置增加，故也關係到在移送時在玻璃基板 15上産生的前進方向的慣性力的影響等。 即’如第6圖所示，纟現行的球面支撑結構的吸附墊 中，若玻璃基板沿箭頭所示方向收縮、吸附墊的接觸面沿 其方向被力F拉引，則在吸附墊的球面狀支樓面上産生的以 I體阻止其拉引的力、作用在力的作用面的重心位置， 對應於拉力F與阻力〜F和它們的間隔h，使爲外的力矩 作用於吸附墊上，而使其如箭頭方向所示在圖中沿順時針 方向旋轉。 在逆種情況下，由於墊r被支舰y所支#、不能直接 沿F的作用方向運動，故F、―以具有要大到改變與它們相 6 關部分的支撐狀態的性質的力。而且，會産生使一側的吸 附支撐面22a以另一側的支撐面22b爲支點、從玻璃基板W 的下面…^要離開的脫離力，如第6(a)圖所示那樣，有與坡 璃基板的接觸面離開而吸入大氣、破壞其中的真空狀態的 可能性。 另外，如第6(b)圖所示，由F與一F的平行力偶使塾2與 玻璃基板一起沿玻璃基板W的收縮方向被拉引而浮起，使 球面狀支撐面24,與33,之間離開，並使外部氣體從該部分進 入處於真空狀態的通路25，而會對真空産生破壞。 【明内溶L】 發明概要 而且，實際上由上述原因會産生破壞真空的不良現 象。因此，本發明解決了現行技術的上述問題，其目的在 於提供一種即使在對象物的熱變位元等大的情況下也能可 靠地防止真空破壞的吸附墊。 本發明爲了上述目的，第1項發明的吸附墊，包括墊部 和支撐部，該墊部具有··由産生比支撐上述對象物産生的 負何的支揮力大的㈣力的真空、對被支撐的面爲平面的 對象物的上述被支撐面進行吸附的支撐面以及被支撺的被 支撐部，該支撐部，支撐上述被支撐部，其特徵在於： 、，上述被支撐部與上述支撐部，爲上述墊部可沿與上述 平面相平仃的方向移動、並且上述支樓面可傾斜的支撐關 '、二/、有限制上述移動的1在小移動範圍内的移動限制 、u冓梢限制上賴斜的量在小傾斜範圍_傾斜限制結 200412319 構部。 在第2項發明中，除上述以外，其特徵在於：上述支撐 · 部具有放入上述被支撐部的空間部；上述墊部具有與上述 支撐面相導通、形成在上述被支撐部中並在上述空間部具 ^ 5 有開口的通路，以形成上述真空；並且還具有密封部件， - 該密封部件，在上述空間部的從上述開口位置到上述支撐 面一側分隔上述空間部，遮斷被分隔的兩側的透氣性，並 且對應上述移動與上述傾斜可變形。 修 圖式簡單說明 10 第1(a)圖是表示應用本發明的吸附墊的截面狀態的一 例的說明圖、第1(b)圖是表示將該吸附墊安裝在機械手上的 狀態的俯視圖。 第2(a)及2(b)圖是表示應用本發明的吸附墊的另一例 的截面狀態的說明圖。 15 第3圖是第1圖的吸附墊的原理的說明圖。 第4圖是表示應用本發明的吸附墊的再一例的說明 鲁 圖，第4(a)及4(b)圖分別是第4(b)及4(a)圖的a—a線及b — b 線的箭頭示意圖。 第5 (a)圖是表示現行的吸附墊的截面狀態的一例的說 20 明圖、第5(b)圖是表示將該吸附墊安裝在機械手上的狀態的 、 俯視圖。 第6(a)及6(b)圖是上述現行的吸附墊的原理的說明圖。 L實施方式3 具體實施方式 8 200412319 第1(a)圖是表示應用本發明的吸附墊的整體構成的一 例的說明圖。 吸附墊1，包括：具有支撐面22和作爲被支撐的被支撐 部的筒狀部23的墊部的墊2、作爲可支撐筒狀部23的支撐部 5的支撐箱3、及作爲密封部件的襯片4等，其中，上述支撐 面22’爲形成在上端的中央部分21的周圍的邊緣部分、由 真空可吸附作爲被支撐的面的截面狀態爲圖示的平面价的 對象物的玻璃基板W(以下簡稱爲“基板w”）的被支撲的下 面Wi 〇 10 上述的本實施例的吸附墊1，如第1(b)圖所示，被安裝 在機械手10上。即，將支撐箱3固定安裝在機械手10的具有 如圖示的尺寸的位置。尺寸Cm是在本實施例中安裝4個的 墊1的最大間隔。此外，基板W的實際的支撐體是機械手， 支撐箱3也可直接形成在機械手1〇上。另外，在(b)圖中以2 15個機械手10相分離的狀態進行表示，但它們在未圖示的位 置爲一體化。 塾2的筒狀部23與支撐箱3，具有墊2可沿與平面Ft相平 行的方向、即圖示的截面狀態的橫X方向移動、且支撐面22 可傾斜的支撐關係。可移動及傾斜的支撐關係，是以使支 20撐箱3不限制筒狀部23的X方向的運動、並且在墊2以支撐筒 狀部23的狀態旋轉時使不會妨礙其旋轉的方式實現的。例 如’在如現行的吸附墊那樣的球面支撐關係中，因爲阻止 塾向平面方向移動，所以即使可旋轉也並不是可移動的支 撐關係。 9 由此’在本實施例中，如圖示那樣，將筒狀部23的下 端部仏形成爲曲面狀，並將承受其的支樓箱3的訂端部 仏相接觸的面設置成截面朝向橫X方向的平面部31。二 且，除此之外沒有設置妨礙移動與旋轉的結構部分。此外， 下端部23a與平面部31的曲面和平面的關係也可相反。另 雖然只要-側爲小面積則、即使是平面之間的關係也 可以，但是爲了使旋轉圓滑，最好是將任—個面設爲曲面。 另外’下端部23_只在相當於切面η的巾心的位置設 置1處，但也可形成多個曲面。 下端部23a與平面部31之__，理想是㈣2容易 移動與旋制支撐隱。由此，在下端部23a與平面部31之 門不産生大的料力。讀，不把這些部分設爲例如橡膠 那樣的材料，而設成具有—定程度的硬度、原本摩擦係數 不大的材料’並且相互的接觸面加工成爲—定程度圓滑的 面，以使相互_摩擦係數不太大。在這種情況下，因爲 吸附墊也被使用在向熱處理裝置移入、移出基板w，所以 作爲其材料要求要具有耐熱性，應優先考慮這方面。基於 這樣的條件，在本實施例中，在墊2及支撐箱3上分別使用 耐熱性樹脂材料及不錄鋼。而且，以一般的加工精度對它 們進行加工，使兩者之間的摩擦係數在〇·3〜〇·4左右。 作爲限制移動的量在小移動的範圍内的移動限制結構 部’在本實施例中，設有將被支撐部作爲筒狀部23的其圓 筒外面23b、和與圓筒外面空出窄間隔〇1並作爲從支撐箱3 凸出的凸出部而形成的内圈部32。如第1(b)圖所示的被安裝 的吸附墊1，雖然爲了對其進行定位或保持姿勢而原本最好 不’/α平面方向運動，但在本發明中，由於在吸附支撑時容 易與基板W上産生的熱膨脹及熱收縮的熱變位相對應，故 作爲小移動的範圍，設定爲能夠確實允許上述熱變位的範 圍。 此外，作爲這種移動限制結構部，能夠採用其他適當 的結構。例如，也可取代内圈部32而在筒狀部23上安裝環， 旅在其與支撐箱3的内面之間設置上述間隔Cl，或將内圈部 3 2設成具有一定長度的長的筒狀的結構。如果將内圈部設 成筒狀，則也可兼用在接著敍述的傾斜限制結構部上。 作爲限制傾斜量在小傾斜範圍内的傾斜限制結構部， 在本實施例中，設有墊2的上端的中央部分21及支撐面22的 下環面24、和與其相對向空出窄間隔以的支撐箱3的上端面 部33。如第1(b)圖那樣安裝的吸附墊丨，雖然原本只要成爲 與機械手1〇的面相平行的基準面即可，但必須可與前述的 基板W的彎曲或各自的墊的支撐面之間的傾斜角的誤差等 相對應。因爲間隔C2是爲此而設置的，所以例如支撐面22 可定爲傾斜到5°左右的範圍。 此外，作爲這種傾斜限制結構部，與移動限制結構部 相同地也可採用其他適當的結才冓。例如，如上所述，如果 將内圈部32*爲具有-定的長度的筒狀，則在吸附塾丄傾斜 時，由内圈部32的上下端阻擋其傾斜的圓筒外面2儿，因此 能夠將其作爲傾斜限制結構部。 另外，在本貫施例的吸附墊丨中，如圖所示，支撐箱） 200412319 具有放入筒狀部23的空間部34，墊2具有與支撐面22相導 通、形成在筒狀部23中並在空間部34中具有開口 25 a的通路 25 ’以形成用於吸附基板W的真空。而且，設有上述襯片*， 該襯片4，在空間部34内的從開口 25a的位置到支撐面22 — 5 側分隔空間部3 4，並遮斷由被分隔開的外氣側3 4 a及真空側 34b形成的兩侧的透氣性，並且作爲對應墊2的移動與支拎 面22的傾斜可變形地形成的密封部件。符號35是與真窆= 空間部34b相導通並與未圖示的真空配管相連接、在真窆口 引時通空氣的中間通路。 10 襯片4作爲分隔空間部34的結構，本實施例中，在筒趺 部23的開口 25a上方的位置，在圓筒外面23b對襯片4的内押 侧41進行密封黏接，同時，將支撐箱3分割成上下箱知、％ 兩部分，並將襯片4的外徑側42夾在它們之間的槽部3〇中 這樣的襯>} 4,被形錢面爲曲線狀的曲面狀，並且在未* 15施例中利用矽酮橡膠作爲具有柔軟性的材料，以便容易= 如上所述的塾2的移動與支撐面22的傾斜相對應而産心 形。 疋 這種襯片4,因爲只要能夠允許墊2向平面方向及旋轉 方向的運動、並且可對外氣側施與真空側她之間進行〜 20封即可，所以可設爲除第1®的紐叫的其賴適當的= 狀，第2圖表示其另一例。 乂 其中⑷的結構，是將襯片4的内經側41設成比圓筒外 23b稱小徑的環端41a。符號23c是限位件。本實施例的結 是延伸環端41碰嵌在圓筒外面说上進行安裝的。從而， 12 安衣谷易。另一方面，在圓筒外面23b與環端之間可由 其收縮力得到密封性。 (b)不出的疋將襯片4設爲截φυ字形的環狀的例子。内 外U41、42分別嵌人墊2的筒狀部23及支撐㈤的槽部^ 中，並與它們相接續的部分分㈣圓料面別及下箱3b的 内面接觸。 本實施例的襯片4，由於截面爲U字形，所以，當在其 中的作爲外部壓力的大氣壓Pa、和與通路25㈣真空相同 地形成真空的U字形外的真空壓力Pv之間産生壓力差時由 於利用塾2及支撐箱3支馳>;4賴面及底面，故對於真空 的耐壓性好。另-方面，由於U字形的寬度容易擴大縮小， 故塾2容易沿橫X方向運動。並且，本實施例的概片4，因爲 具有既允許墊2㈣又若其移動力消失舰夠可#地使塾2 =到原來的中心位置的作用，所以塾2的位置保持性好。 …0果月b夠使本貝知例的襯片4設爲移動及傾斜限制結 ^ 〇 、、口 —以上所述的本發明的吸附墊i，通常如第i(b)圖所示被 安衣在機械手10上，用於基板w的向熱處理裝置的移入及 移出的製造功中的移動，發揮以下的作用效果。 。在熱處理襄置内，疊放多張基板评，例如加熱到· °c ’若經過—定的加熱時間，則在1個生産工序内逐張取出 ，處理完畢的基板並移入新的基板，依次進行熱處理。此 時使用裝備了本實施例的吸附塾的機械手來進行基板顺 的取出放入。 200412319 若將機械手10插入未圖示的熱處理裝置内、設定其位 置在應取出的基_的下方，則上升並使基板w承載在幻 圖例中的4個吸附塾1的支撐面22上。此時，形成有支撐面 22的塾2，處於其筒狀部23在_部32巾的大致基準位置， 5並由支撐箱3的上端面部33維持支樓面^的下方的環面24 在小傾斜角的範圍内，以使其容易移動及旋轉，因此若在 塾的支撐面22上承載基板w，則支撐面Μ在大致基準位置 沿基板w的下面Wl相接觸，以支撐基板w。 另外，此時，安裝在自動機械上並驅動機械手1〇的未 10圖不的真空裝置動作，通過在機械手内或其外部、沿其導 引設置的未圖示的真空配管，依次經過形成在支撐箱3内的 中間通路35、真空側空間部34b、㈤口25a及形成在筒狀部 23内的通路25，從上端的中央部分21與基板的下面％之間 的間隙部分吸引空氣。其結果，4個吸附墊丨的所有支撐面 15 22元全與基板的下面Wi相接觸而對其進行吸附支撐。該吸 附力，如後所述，被設定爲比丨個吸附墊丨所分擔的基板w 的重量部分的負荷支撐力大。 此時’基板熱處理而成爲280°C的溫度。另一方 面，因爲只是機械手1〇插入熱處理室内，所以溫度並不怎 20麼上升。在該狀態從熱處理室移出支撐基板W的機械手， 再將基板W移到下面的處理生產線。而且在這之間，基板 可在慢冷卻室或外面的外氣溫度環境下急劇地降低溫度。 其結果’在機械手10上的一定位置被支撐的基板W産 生收縮。其收縮量，假如基板溫度從280°C下降到常溫，則 14 200412319 在1右的方形基板W的第1圖的墊之間的最大距離Cm之 間約爲1mm。此時，墊2承受來自基板W及支撐箱3的外力， 其關係表示在第3圖中。 在機械手10上，處在第1(b)圖的最大間隔Cin的位置關係 的及附墊1，爲了使基板W收縮1mm左右而通過吸附支撐面 22由基板W的下面Wi沿平行其面的方向承受拉力，與此相 對，克服墊2的下端部23a與支撐箱3的平面部31之間的摩擦 力R。從而，若將拉力設爲F，則在墊2到運動之前爲F= — R 的關係，即作用有與摩擦力大小相同、方向相反的拉力F。 另一方面，在墊2上，作爲産生上述摩擦力尺的朝向下 方的垂直力，作用有基板W的自重G的這些吸附塾1的分擔 一刀g’和在由真空産生的力作用在襯片4上時、因其産生 的向下施加在筒狀部23上的真空分擔力v。從而，若在上述 摩擦力作用的面之間的摩擦係數設爲#，則R=/z(g + v)。 另外，若這樣因摩擦而作用由尺與—尺構成的力偶，則 據此，産生M1 = Rh的力矩。h是圖示的R的作用面之間的距 離。該力矩!^^，在墊的支撐面22的圖中，成爲産生要使右 端部分22a從基板的下面\\^向圖中的下方脫離的力的脫離 力矩。從而，該力成爲要産生真空破壞的力。 與此相對，因爲在基板的下面與支樓面22之間作用 有由真空産生的吸附力v，所以若産生上述脫離力矩Μι， 則在圖中以支撐面22的左端部分22b爲中心産生M2 = vd/2 的黏接力矩，以與其相對抗。 從而’只要Μ!小於M2，則墊的支撐面22就不會從基板 15 下面Wl脫離，因此不産生真空破壞。在此，比較1^與?^2 , 如下所示。 如果將由真空産生大氣壓Pa與真空壓力Pv的壓力差設 爲ΔΡ’將對支撐面22及襯片4的壓力部分的直徑分別設爲〇 5 及d，則 ν< Δ Ρ( 7Γ d2/4)(l/2) 9 Mtxv= Δ P( 7Γ d2/4)(l/2) ^ V= Δ P 7Γ d2/4) ’則MAM2分別爲： U (g+v)h==// gh+ β vh = (自重部分)+ # (真空部分)___⑴ 10 ^2^0/2= Δ Ρ( π D2/4)(D/2)---(2)。 在此，機械手10儘量製作得較薄，以減輕其重量，另 一方面，支撐面22的直徑，爲要獲得保持基板所必需的吸 附力的大小、被設爲D = 3h左右。另外，如前所述的真空吸 附力V，比分擔負荷的支揮力认。另外，在从中存在例如 15 〇·3左右的#。並且，因爲概片4被放入支撐箱3的空間部％ 内，所以其直徑d比支揮面η的直徑D充分小 ，例如被設爲 D 2d左右。其⑺果’假使—左右，他也是仏中的 自重4刀的H真工部分的仙倍，從而成爲从的^倍。 其結果’黏接力矩]爲大值、與脫離力矩从相比具有 2〇充分的餘量，能可靠地防止支撐面22相對基板襲脫離、 及由其産生的真空破壞。 另一方面，作爲與訾紙 汽4使用的吸附墊相關的各條件的 一例，若按 ΔΡ=〇·〇5ΜΡα、！丄 p lm左右大小的方形基板時的 g=2N、d=14mm、h=l〇m m、I>=30mm、// =〇·3計算v、V、 16 200412319 Μ!、M2 ’ 則 v = 3.8N、V与 35N、Μ! = 0.0174Nm、M2与 0.525Nm 与30Mi。從而，能夠以大到不產生問題的安全係數防止由 支撐面的脫離産生的真空破壞。 此外，在這種關係中，因爲墊2被設成可在與支撐箱3 5 之間移動的支撐關係，所以對於基板W的熱收縮，實際上 以稍超過一 R的拉力F使墊2沿熱收縮方向運動lmm左右。 對於這點，在現行的球面支撐型的吸附墊中，由於不 允許墊沿基板支撐面方向移動，故具有吸附面的脫離力矩 變大、使吸附面相脫離、破壞真空狀態的缺點，實際上也 10確實産生如上所述的不良現象。根據應用本發明的吸附 墊，能夠確實解決如上所述的這類問題。此外，若吸附面 相脫離，則在基板W的移出時，由其加速度或振動等施加 在基板W上的外力，不用說有基板w從支撐面上脫落的危 險性等。 15 第4圖是表示應用本發明的吸附墊的另一構成例。 本實施例的吸附墊1，與第1圖的相比較不設置作爲密 封部件的㈣4。而且’由與第丨圖的相同作爲被支撐部的 筒狀部23内所設的通路25、開在支撐箱3内的導引孔％、及 與通路25相連接的貫通導引孔％並與機械手1〇的真空吸引 配&相連接的容易變形地形成的中間管5等構成在支撐面 上産生真空的結構部分。 中間管5以容易變形的方式、在本實施例中由入口部 51呈螺旋狀繞與其相連接的筒狀部23一圈左右的彎曲部 52 kV引孔36導出的出口部53、及與其相接續的管54等 17 構成。這種中間管5由具有柔軟性的耐熱樹脂材料等製成， 並以:t干接寺方式安裝在阂狀部23上。通過導引設置這種形 狀及材質的中間管5，而能夠使真空的保持性良好。而且， 利用入口部51與出口部件53之間的變位的自由性，能夠容 易允許塾2的移動及旋轉。 (發明的效果） 根據如上所述的本發明’在弟1項發明中，吸附塾包括 墊部和支撐部，該墊部具有：由産生比支撐由對象物産生 的負荷的支撐力大的吸附力的真空、對被支撐的面爲平面 的對象物的被支撐面進行吸附的支撐面以及被支撐的被支 撐部’該支撐部，支撐被支撐部，所以如果在使對象物移 動時維持真空，則由真空吸附支撐作爲被熱處理的基板的 液晶玻璃基板等對象物，而包含向熱處理室内的移出放入 在内’能夠安全地使對象物移動。 而且’由於將被支撐部與支撐部設爲墊部可沿與平面 相平行方向移動的支撐關係，所以當從吸附開始到移動時 ’月間、在基板等對象物上産生大的溫度差而使對象物因熱 産生膨脹或收縮、安裝於支撐部上的墊部在對象物與支撐 邛之間叉到沿與平面相平行方向的力時，相對支撐部，墊 邛與進行吸附支撐的對象物一起沿其平面的方向移動，因 此犯夠由比支撐對象物的支撐負荷大的充分的吸附力、 可罪地維持對象物與支撐部之間的進行吸附的接觸關係。 /、〜果’此夠維持吸附部的真空並將對象物安全地移動。 在這種情況下’針對作用於對象物的被支撐的面與墊 邛的支撐面吸附的接觸面上的其平面方向的外力，在墊部 的被支撐部與支撐其的支撐部之間的另一接觸部處，雖然 爲可移動的支撐關係，但由接觸不<避免地産生摩擦力， 並由於外力比摩擦力大，故塾部移動以釋放外力，但在此 之月3，摩ί祭力和與其大小相等方向相反的外力成爲力偶， 據此産生外力力矩’產生要脫離吸附接觸面的力。 10 但是’摩擦力由支撐對象物的負荷的支撐力產生，並 由於存在料餘故通常tb續力較小。減㈣，相對 於外力力矩產线抗力矩的韻力，與支撑力相比越大， 就越比摩擦更大。料，成爲決定外力力㈣大小的 條件的吸附接觸面與其他的接觸面的間隔，無需設 ^ ’爲了使支樓部插人進行熱處理的基板的間距之間以 =輕重量而被安裝在厚度儘量設得薄的機械手等上，故 15 ^=_限制’因此通常設爲比吸附面的間隔較小的 果’對抗力料比外力力矩充分大的值，塾部不 曰二附接觸面脫離地容易沿平面方 防止産生真空破壞。 匕夕罪地 目㈣切部及域部，騎與《物的被支 20 係 y相接觸的㈣的切面錢W傾斜那樣的支 係，所以通常即使在褒 牙奇 支撑面的傾斜狀能有=上的多個吸㈣之間 對象物的被支以=1 撑面容易傾斜而可與 進行吸附其結果，能夠可靠産生由直空 進灯吸附支撐時的真空。 〜二 亚且，因爲設有限制移動的量在小移動的範圍的移動 19 200412319 ==’所以限制塾部不必要的移動，並將其維持在 位置谁 置的範圍内，能夠滿足在以對象物爲目的的 位置進行切的支撐條件。 限制結構:Γ有限制傾斜的量在小傾斜的範圍的_ 也將支/ 卩使在墊部的支樓面不切對象物時， “ /面維持在只必需的儘量小的傾斜角内，在支撐到 此防止由大的角變位纽的支撐位置的錯位，並卫 月b σ易於與對象物相接觸。 ίο 15200412319 Description of invention: [Technical field to which the invention belongs] FIELD OF THE INVENTION The present invention relates to an adsorption pad, which includes a pad portion and a support portion. The pad 5 has a support force greater than that of a load generated by supporting the object. The vacuum of the suction force, the supporting surface that adsorbs the above-mentioned supported surface of the object whose surface is a flat surface, and the supported supporting portion. The supporting portion 'supports the supported portion, and particularly relates to the liquid crystal glass substrate. Technology to prevent the vacuum suction surface from falling off during transfer of heat treatment. [Prior Art] Background Art Generally, when an object having a flat support portion such as a glass substrate for a liquid crystal display (hereinafter referred to as a "glass substrate") is transferred during a heat treatment or a process before and after the object, 15 pads are held on the manipulator. That is, in order to move and transfer the glass substrate at a high speed and safety to a certain degree, not only it is simply placed on the manipulator, but the glass substrate is firmly vacuum-absorbed by the pad. As shown in FIG. 5, the structure of the substrate transfer part is generally composed of a glass substrate W, four suction pads carrying the substrate W, and pads 2, which are arranged on a 20 robot 10 and installed. The support 3 of the pad 2 'is connected to the vacuum suction passage 25 formed in the pad 2 and communicated with one side of the support 3, and is formed between the lower portion of the pad 2 and the support 3, Spherical support surfaces 24, 33, and the like. Moreover, the rotation of the pad of the spherical support surface can correspond to the curvature of the glass substrate or the error of the inclination angle of the support surface of the four pads. 200412319 Literature 1 .) Patent Document 1: Japanese Patent Application Laid-Open No. 07-237765 (Figs. 1 and 2 and related descriptions) However, a rectangular large 5 type glass substrate having a size of about lm is placed in 280 by the above-mentioned current adsorption pad. When the heat treatment chambers around C are heat-treated and taken out and transferred, a problem arises in that the degree of vacuum between the glass substrate w and the suction support surface 22 of the suction pad 1 is reduced. This problem is considered to be caused by the enlargement of the glass substrate. As shown in the figure, the maximum distance between a plurality of adsorption pads becomes longer, and when the glass substrate with a high temperature of 10 is taken out, the temperature drops sharply to increase the amount of heat shrinkage. The relative displacement between them causes both of them to apply an external force to the adsorption pad in the middle, which cannot correspond to it in the current structure, which is an action that destroys the vacuum. In addition, due to the large size of the glass substrate, heavy pressure is generated. The increase in the number of positions is also related to the influence of the inertial force in the forward direction generated on the glass substrate 15 during the transfer. That is, as shown in FIG. 6, the adsorption pad of the current spherical support structure If the glass substrate shrinks in the direction shown by the arrow, and the contact surface of the adsorption pad is pulled by the force F in the direction, the force and action of the I body to prevent its pulling on the spherical support surface of the adsorption pad is generated. At the position of the center of gravity of the force acting surface, corresponding to the pull force F and the resistance force ~ F and their interval h, an external moment acts on the adsorption pad and rotates it clockwise in the figure as shown by the arrow direction. In the reverse case, since the pad r is supported by the support ship y and cannot be moved directly in the direction of the action of F, F has a force that is large enough to change the supporting state of the relevant part of them. In addition, a detachment force that causes the adsorption support surface 22a on one side and the support surface 22b on the other side as the fulcrum from the lower surface of the glass substrate W to be separated is as shown in FIG. 6 (a). There is a possibility that the contact surface of the sloping glass substrate may be sucked into the atmosphere and the vacuum state may be destroyed. In addition, as shown in FIG. 6 (b), the parallel force couple of F and F causes 塾 2 and the glass substrate to be pulled and floated along the contraction direction of the glass substrate W, so that the spherical support surfaces 24 and 33 , Leave between, and let the external air enter the path 25 in a vacuum state from this part, and the vacuum will be destroyed. [Meiyin L] Summary of the Invention In fact, the above-mentioned causes actually cause a problem of breaking the vacuum. Therefore, the present invention solves the above-mentioned problems of the prior art, and an object thereof is to provide an adsorption pad that can reliably prevent vacuum damage even when the thermal displacement of an object is large. To achieve the above object, the present invention provides a suction pad according to a first aspect of the present invention, which includes a pad portion and a support portion, the pad portion having a vacuum and a pressure generated by generating a larger force than a negative force generated by supporting the object. The supported surface is a supporting surface that is adsorbed on the supported surface of a planar object and a supported portion that is supported. The supporting portion supports the supported portion. The supported portion is characterized in that: The support part is a support part in which the pad part can move in a direction parallel to the plane, and the support floor can be tilted. 2), 1 has a movement restriction within a small movement range that restricts the movement, u The amount of upright obliquity of the palate tip is in a small inclination range. In the second invention, in addition to the above, the support and the part have a space portion in which the supported part is inserted; the pad part has a communication with the support surface, is formed in the supported part, and is formed in the support part. The space part has a passage with an opening to form the above-mentioned vacuum; and also has a sealing member, which seals the space part from the opening position to the support surface side of the space part, and blocks the partition Both sides are breathable and deformable in response to the aforementioned movement and the aforementioned tilt. Brief description of the drawing 10 FIG. 1 (a) is an explanatory diagram showing an example of a cross-sectional state of the adsorption pad to which the present invention is applied, and FIG. 1 (b) is a plan view showing a state where the adsorption pad is mounted on a robot . Figures 2 (a) and 2 (b) are explanatory views showing the cross-sectional state of another example of the adsorption pad to which the present invention is applied. 15 FIG. 3 is an explanatory diagram of the principle of the adsorption pad of FIG. 1. Fig. 4 is an explanatory drawing showing still another example of an adsorption pad to which the present invention is applied, and Figs. 4 (a) and 4 (b) are a-a and b of Figs. 4 (b) and 4 (a), respectively. — Schematic diagram of arrows on line b. Fig. 5 (a) is an explanatory view showing an example of a cross-sectional state of a conventional adsorption pad, and Fig. 5 (b) is a plan view showing a state where the adsorption pad is mounted on a robot. 6 (a) and 6 (b) are diagrams illustrating the principle of the above-mentioned conventional adsorption pad. L Embodiment 3 Detailed Description 8 200412319 Fig. 1 (a) is an explanatory diagram showing an example of the overall configuration of an adsorption pad to which the present invention is applied. The suction pad 1 includes a pad 2 having a support surface 22 and a pad portion of a tubular portion 23 as a supported portion to be supported, a support box 3 as a support portion 5 capable of supporting the tubular portion 23, and a sealing member. In the backing sheet 4 and the like, the support surface 22 'is an edge portion formed around the central portion 21 at the upper end, and is a glass that can be adsorbed by a vacuum to be a supported surface, and the cross-sectional state is a flat object as shown in the figure. The bottom surface of the substrate W (hereinafter simply referred to as the "substrate w") Wi 〇10. The suction pad 1 of the present embodiment described above is mounted on the robot 10 as shown in FIG. 1 (b). That is, the support box 3 is fixedly installed at a position of the robot 10 having a size as shown in the figure. The dimension Cm is the maximum interval at which four pads 1 are mounted in this embodiment. The actual support of the substrate W is a robot, and the support box 3 may be directly formed on the robot 10. In addition, in the figure (b), two to fifteen robots 10 are shown separated from each other, but they are integrated at a position not shown. The cylindrical portion 23 and the support box 3 of 塾 2 have a support relationship in which the pad 2 can move in a direction parallel to the plane Ft, that is, in the horizontal X direction of the cross-section state shown, and the support surface 22 can be inclined. The movable and inclined support relationship is such that the support 20 supports the box 3 without restricting the movement of the cylindrical portion 23 in the X direction, and when the cushion 2 rotates while supporting the cylindrical portion 23, it does not hinder its rotation. Realized. For example, in a spherical support relationship such as a conventional suction pad, since the 塾 is prevented from moving in a planar direction, even if it is rotatable, it is not a movable support relationship. 9 Therefore, in the present embodiment, as shown in the figure, the lower end portion 仏 of the cylindrical portion 23 is formed into a curved shape, and the surface on which the end portion 仏 of the branch box 3 which receives it is in contact is set to a cross section. The flat portion 31 faces the lateral X direction. In addition, there are no structural parts that hinder movement and rotation. The relationship between the curved surface and the flat surface of the lower end portion 23 a and the flat surface portion 31 may be reversed. Also, as long as the-side has a small area, even a relationship between planes is possible, but in order to make the rotation smooth, it is best to set any surface to a curved surface. In addition, the 'lower end portion 23_ is provided at only one position corresponding to the center of the face of the cut plane n, but a plurality of curved surfaces may be formed. The __ of the lower end portion 23a and the flat portion 31 is preferably ㈣2, which is easy to move and can be turned to support. Therefore, a large material force is not generated at the gates of the lower end portion 23a and the flat portion 31. Read, do n’t set these parts as materials such as rubber, but set them as materials with a certain degree of hardness and originally low coefficient of friction ', and the contact surfaces of each other are processed into a certain degree of smooth surfaces to make each other _ The coefficient of friction is not too large. In this case, since the suction pad is also used to move the substrate w into and out of the heat treatment device, it is required to have heat resistance as a material, and this aspect should be given priority. Based on such conditions, in this embodiment, a heat-resistant resin material and a non-recording steel are used for the pad 2 and the support box 3, respectively. In addition, they are processed with general processing accuracy so that the friction coefficient between the two is about 0.3 to 0.4. The movement restriction structure portion 'in a range of small movement as an amount of movement restriction' In this embodiment, a cylindrical outer surface 23b having a supported portion as the cylindrical portion 23 is provided, and a narrow space is provided from the outer surface of the cylinder. 〇1 and an inner ring portion 32 formed as a projection protruding from the support box 3. As shown in FIG. 1 (b), the attached suction pad 1 is preferably not moved in the '/ α plane direction in order to position or maintain the posture. However, in the present invention, it is easy to hold the suction pad in the suction support. Corresponding to the thermal displacement of the thermal expansion and thermal contraction generated on the substrate W, the range of the small movement is set to a range in which the above-mentioned thermal displacement can be surely allowed. In addition, as such a movement restriction structure portion, other appropriate structures can be adopted. For example, instead of the inner ring portion 32, a ring may be installed on the cylindrical portion 23, and the above-mentioned interval C1 may be provided between the inner portion and the inner surface of the support box 3, or the inner ring portion 32 may be formed to have a long length with a certain length. Tubular structure. If the inner ring portion is formed in a cylindrical shape, it can also be used for the tilt restriction structure portion described later. As an inclination restricting structural portion that restricts the amount of inclination within a small inclination range, in this embodiment, a central portion 21 at the upper end of the pad 2 and a lower annular surface 24 of the support surface 22 are provided, and a narrow interval is provided to face the opposite side.上 的 保护 箱 3 的 上 表面 部 33。 33 of the upper end portion 33. The suction pad 丨 mounted as shown in FIG. 1 (b) may be a reference plane parallel to the surface of the robot 10, but it must be able to be bent with the substrate W or the support surface of each pad. The angle of inclination and other errors correspond to each other. Since the interval C2 is provided for this purpose, for example, the support surface 22 may be set to a range inclined to about 5 °. In addition, as the tilt restriction structure portion, other appropriate knots can be adopted in the same manner as the movement restriction structure portion. For example, as described above, if the inner ring portion 32 * has a cylindrical shape having a predetermined length, the outer surface of the inclined cylinder is blocked by the upper and lower ends of the inner ring portion 32 when the 塾 丄 is tilted. This can be used as a tilt-restricting structure. In addition, in the suction pad of the present embodiment, as shown in the figure, the support box) 200412319 has a space portion 34 into which the cylindrical portion 23 is placed, and the pad 2 has a communication with the support surface 22 and is formed in the cylindrical portion 23 There is a passage 25 ′ having an opening 25 a in the space portion 34 to form a vacuum for adsorbing the substrate W. Further, the above-mentioned lining sheet * is provided, and the lining sheet 4 divides the space part 34 from the position of the opening 25a to the support surface 22-5 side in the space part 34, and blocks the side of the outside air that is separated The air permeability on both sides formed by 3 4 a and the vacuum side 34 b serves as a sealing member that is deformably formed in response to the movement of the pad 2 and the inclination of the support surface 22. Reference numeral 35 is an intermediate passage that communicates with Shinji = space portion 34b, is connected to a vacuum pipe (not shown), and passes air through the Shinji mouth. 10 The lining 4 serves as a structure that separates the space portion 34. In this embodiment, the inner side 41 of the lining 4 is hermetically adhered to the outer side 23b of the cylinder at a position above the opening 25a of the barrel portion 23, and at the same time, The support box 3 is divided into two parts, the upper and lower boxes, and the outer side 42 of the lining 4 is sandwiched between the grooves 30 between them. The lining 4 is shaped like a curve. It has a curved surface and uses silicone rubber as a flexible material in the non- * 15 examples so that it is easy to make the movement of 塾 2 as described above corresponds to the inclination of the support surface 22 to produce a heart shape.疋 This kind of lining 4 can be used as long as it can allow the pad 2 to move in the planar direction and the rotation direction, and can perform ~ 20 seals between the outer air side and the vacuum side. The name of the button is appropriate, and Figure 2 shows another example.乂 Among them, the structure of ⑷ is such that the inner warp side 41 of the lining 4 is provided with a ring end 41a having a smaller diameter than the outside 23b of the cylinder. The symbol 23c is a stopper. The knot of this embodiment is mounted by the extension ring end 41 being fitted on the outside of the cylinder. Thus, 12 Anigu Valley is easy. On the other hand, tightness can be obtained between the outer surface 23b of the cylinder and the ring end by its shrinking force. (b) Unknown example in which the lining 4 is formed in a ring shape with a cross-shaped φυ shape. The inner and outer U41 and 42 are respectively embedded in the cylindrical portion 23 of the human cushion 2 and the groove portion ^ of the support cymbal, and are in contact with the parts where they are continuous with each other and the inner surface of the lower case 3b. Since the lining 4 of this embodiment has a U-shaped cross section, when a pressure difference occurs between the atmospheric pressure Pa, which is an external pressure, and the vacuum pressure Pv outside the U-shape that forms a vacuum in the same way as the passage 25㈣ vacuum, Since the 塾 2 and the support box 3 are used to support the 赖 4 and the bottom surface, the pressure resistance to vacuum is good. On the other hand, since the width of the U-shape is easily expanded and reduced, 塾 2 is easy to move in the lateral X direction. In addition, since the overview piece 4 of this embodiment has the function of allowing the pad 2㈣ to be able to make 塾 2 = to the original center position if its moving force disappears, the position retention of 塾 2 is good. … 0guyue b is enough to make the lining 4 known in this example set as a movement and tilt restriction ^ 〇 ,, mouth-the above-mentioned adsorption pad i of the present invention is usually as shown in figure i (b) Anyi is used in the robot 10 to move the substrate w into and out of the manufacturing process of the heat treatment device, and exhibits the following effects. . In the heat treatment process, multiple substrates are stacked, for example, heated to · ° c 'If a predetermined heating time has passed, they are taken out one by one in a production process, and the processed substrates are moved into a new substrate, in order Perform heat treatment. At this time, the robot equipped with the plutonium adsorbent of this embodiment is used to smoothly take out and put the substrate. 200412319 When the robot hand 10 is inserted into a heat treatment device (not shown), and the position is set below the substrate _ which should be taken out, the substrate w is raised and carried on the support surfaces 22 of the four adsorption ridges 1 in the legend. At this time, the ridge 2 with the support surface 22 is formed at the approximate reference position of the cylindrical portion 23 at the _ section 32, and the ring surface 24 below the support surface ^ is maintained by the upper end surface portion 33 of the support box 3 at Within a range of a small inclination angle to make it easy to move and rotate, if the substrate w is carried on the support surface 22 of the cymbal, the support surface M contacts the lower surface W1 of the substrate w at a substantially reference position to support the substrate w. In addition, at this time, a vacuum device (not shown in Fig. 10) mounted on the robot and driving the robot 10 is operated, and sequentially passes through a vacuum pipe (not shown) provided in or along the robot, and guided along it, and sequentially passes through. The intermediate passage 35 formed in the support box 3, the vacuum-side space portion 34b, the slit 25a, and the passage 25 formed in the cylindrical portion 23 suck air from the gap portion between the upper central portion 21 and the bottom% of the substrate. . As a result, all the support surfaces 15 to 22 of the four adsorption pads are in contact with the lower surface of the substrate Wi to support them. As described later, this suction force is set to be larger than the load supporting force of the weight portion of the substrate w shared by one suction pad 丨. At this time, the substrate is heat-treated to a temperature of 280 ° C. On the other hand, because only the robot hand 10 is inserted into the heat treatment chamber, the temperature does not rise much. In this state, the robot supporting the substrate W is removed from the heat treatment chamber, and then the substrate W is moved to the lower processing line. In addition, the substrate can drastically decrease the temperature in a slow cooling chamber or outside air temperature environment. As a result, the substrate W supported at a certain position on the robot 10 shrinks. As for the shrinkage amount, if the substrate temperature drops from 280 ° C to normal temperature, the maximum distance Cm between the pads in the first figure of the square substrate W on the right of 14 200412319 is about 1 mm. At this time, the pad 2 receives an external force from the substrate W and the support box 3, and the relationship is shown in FIG. In the manipulator 10, in the positional relationship of the maximum interval Cin in FIG. 1 (b) and the pad 1, the substrate W is contracted by the supporting surface 22 through the lower surface Wi of the substrate W to be parallel to the surface by shrinking the substrate W by about 1 mm. In the opposite direction, a tensile force is received, and the frictional force R between the lower end portion 23 a of the pad 2 and the flat surface portion 31 of the support box 3 is overcome. Therefore, if the pulling force is set to F, the relationship of F = -R before the pad 2 is moved, that is, the pulling force F with the same magnitude and opposite direction as the friction force is applied. On the other hand, on the pad 2, as the downward vertical force that generates the frictional force scale described above, the adsorption 塾 1 of the self-weight G of the substrate W acts as a blade g ′ and the force generated by the vacuum acts on the lining. At the time of 4 upwards, the vacuum sharing force v applied downwardly to the cylindrical portion 23 due to this is applied. Therefore, if the friction coefficient between the surfaces where the frictional force acts is #, then R = / z (g + v). In addition, if a force couple consisting of a ruler and a ruler is applied due to friction in this way, a moment of M1 = Rh is generated accordingly. h is the distance between the active surfaces of R as shown. This moment! ^^ in the drawing of the support surface 22 of the pad is a disengagement moment which generates a force to disengage the right end portion 22a from the lower surface of the substrate to the lower portion in the figure. Therefore, this force becomes a force to be generated by vacuum destruction. On the other hand, since the suction force v generated by the vacuum acts between the lower surface of the substrate and the supporting floor 22, if the above-mentioned disengagement moment M1 is generated, M2 is generated around the left end portion 22b of the supporting surface 22 in the figure. = vd / 2 adhesion torque to counteract it. Therefore, as long as M! Is smaller than M2, the support surface 22 of the pad will not be detached from the lower surface W1 of the substrate 15, and thus no vacuum failure will occur. Here, compare 1 ^ with? ^ 2 as shown below. If the pressure difference between the atmospheric pressure Pa generated by the vacuum and the vacuum pressure Pv is set to ΔP ′ and the diameters of the pressure portions against the support surface 22 and the lining 4 are set to 0 and d, respectively, ν < ΔP (7Γ d2 / 4) (l / 2) 9 Mtxv = ΔP (7Γ d2 / 4) (l / 2) ^ V = Δ P 7Γ d2 / 4) 'Then MAM2 is: U (g + v) h == // gh + β vh = (self-weight part) + # (vacuum part) ___ ⑴ 10 ^ 2 ^ 0/2 = ΔP (π D2 / 4) (D / 2) --- (2). Here, the robot hand 10 is made as thin as possible to reduce its weight. On the other hand, the diameter of the support surface 22 is set to about D = 3h in order to obtain the amount of suction force necessary to hold the substrate. It should be noted that the vacuum suction force V described above is smaller than the load sharing force. In addition, for example, there are # around 15 0 · 3. In addition, since the profile 4 is placed in the space portion% of the support box 3, its diameter d is sufficiently smaller than the diameter D of the support surface η, and is set to about D 2d, for example. The ⑺ 果 ’, if it is left and right, he is also the doubling of the real part of the H-worker's weight of 4 knives. As a result, the "adhesive moment" is large and has a sufficient margin of 20 compared with the detachment moment, and it is possible to reliably prevent the support surface 22 from detaching from the substrate and the vacuum breakage caused by it. On the other hand, as an example of each condition related to the adsorption pad used for the paper steam 4, if ΔP = 0.55 Μα,! G = 2N, d = 14mm, h = l0mm, I > = 30mm, // = Calculate v, V, 16 200412319 M !, M2 'then v = 3.8N, V and 35N, M! = 0.0174Nm, M2 and 0.525Nm and 30Mi. Therefore, it is possible to prevent the vacuum failure caused by the detachment of the support surface with a safety factor that is so large that no problem occurs. Further, in this relationship, since the pad 2 is provided in a supporting relationship that can be moved between the pad 2 and the support box 3 5, the thermal contraction of the substrate W is actually caused to cause the pad 2 along The movement in the heat shrinking direction is about lmm. In this regard, in the existing spherical support type adsorption pad, since the pad is not allowed to move in the direction of the substrate support surface, it has the disadvantages that the detachment moment of the adsorption surface becomes large, the adsorption surface phase is detached, and the vacuum state is broken. 10 does produce the undesirable phenomenon described above. According to the application of the adsorption pad of the present invention, such problems as described above can be reliably solved. In addition, if the suction surfaces are separated from each other, when the substrate W is removed, an external force applied to the substrate W by its acceleration, vibration, or the like, needless to say that there is a danger that the substrate w may fall off the support surface. 15 FIG. 4 shows another configuration example of the adsorption pad to which the present invention is applied. The suction pad 1 of the present embodiment is not provided with a cymbal 4 as a sealing member, as compared with that shown in FIG. In addition, the passage 25 provided in the cylindrical portion 23 as the supported portion, which is the same as that shown in FIG. 1, the guide hole% opened in the support box 3, and the through guide hole% connected to the passage 25 are combined. The intermediate tube 5 and the like which are easily deformed and connected to the vacuum suction arrangement & of the robot 10 constitute a structural portion that generates a vacuum on the support surface. The intermediate tube 5 is easily deformed, and in this embodiment, the inlet portion 51 is spirally wound around the cylindrical portion 23 connected to it by a curved portion 52 kV lead-through hole 36 and the outlet portion 53 and the phase portion The subsequent tubes 54 and 17 are formed. This intermediate pipe 5 is made of a flexible heat-resistant resin material or the like, and is attached to the cymbal portion 23 in a dry-tipped manner. By providing the intermediate tube 5 of such a shape and material as a guide, it is possible to improve the vacuum holding property. Furthermore, by using the freedom of displacement between the inlet portion 51 and the outlet member 53, it is possible to easily allow movement and rotation of the cymbal 2. (Effects of the Invention) According to the invention of the invention described above, in the first invention, the adsorption pad includes a pad portion and a support portion, the pad portion having an adsorption force that is greater than a supporting force that generates a load that supports a load generated by the object. The vacuum of the force, the support surface that adsorbs the supported surface of the object whose support surface is flat, and the supported portion that supports the supported portion. The supporting portion supports the supported portion. Therefore, if the object is moved, a vacuum is maintained. , The object such as a liquid crystal glass substrate, which is a substrate to be heat-treated, is supported by vacuum suction, and the object can be moved safely including being removed from the heat treatment chamber. In addition, 'the supported part and the supporting part are set as a supporting relationship in which the pad part can move in a direction parallel to the plane, so when the adsorption starts to move', there is a large temperature difference between the substrate and other objects during the month. When the object expands or contracts due to heat, when the pad mounted on the support part crosses the force between the object and the support 到 in a direction parallel to the plane, the support 吸附 吸附 and the object supporting the suction support relative to the support part. Since they move together in the direction of their planes, it is necessary to maintain the contact relationship between the object and the support for adsorption due to a sufficient suction force larger than the supporting load of the supporting object. /, ~ Fruit 'This is enough to maintain the vacuum of the suction part and move the object safely. In this case, 'for the external force in the plane direction of the contact surface acting on the supported surface of the object and the contact surface attracted by the support surface of the cushion, between the supported portion of the cushion portion and the support portion supporting it. At the other contact part, although it is a movable supporting relationship, friction is not avoided by the contact, and because the external force is greater than the friction force, the crotch part moves to release the external force. However, on this month 3, friction The force of the sacrifice and the external force opposite to the direction equal to its size become a force couple, and based on this, an external force moment is generated to generate a force to leave the adsorption contact surface. 10 However, the 'friction force is generated by the supporting force of the load supporting the object, and the tb continuity is usually small due to the remaining material. Reduction: Compared with the supporting force, the larger the force of the anti-torque relative to the external force and torque production line, the greater the friction. It is not necessary to set the distance between the adsorption contact surface and other contact surfaces, which is a condition that determines the magnitude of the external force, in order to allow the branch section to be inserted into the thickness of the substrate to be heat-treated at a thickness of = light weight. Set the robot as thin as possible, so 15 ^ = _ limit '. Therefore, it is usually set to a smaller interval than the suction surface. The value of the resistance force material is larger than the external force moment. Disengagement is easy along the plane to prevent vacuum damage. The cutting part and the field part of the dagger wickedness are riding on a branch such as the sloping section of the ㈣ that is in contact with the 20th branch of the object. The slope W is usually inclined. The support of the object between the multiple suction pumps is = 1, and the supporting surface is easy to incline and can be sucked. As a result, the vacuum when the suction is supported by the direct-into-light can be reliably generated. ~ Erya, because there is a movement that restricts the amount of movement in a small movement range 19 200412319 == ', so unnecessary movement of the crotch is restricted, and it is maintained within the range of who is placed, which can satisfy the target Support conditions for cutting the target position. Restricted structure: Γ has a limited amount of inclination in the range of small inclination. _ Also keeps the branch / slab in the cushion part of the floor when the object does not cut the object, "/ surface is maintained within only the necessary minimum tilt angle At this point, the support position is prevented from being displaced by the large angle dislocation button, and Weiyue b σ is easy to contact the object. Ίο 15
邙·〜員t明中，因爲支樓部具有放入被支擇部的空間 『立呈/、有與支撐面相導通、形成在被支撐部中並在空 有開π的通路，以形成所述；並域具有密封部件， 封$件’在空間部的從開口位置到支撐面-侧分隔空 2 P立遮斷破分隔的兩側的透氣性，所以能夠使開口側的 π 1 p成爲可形成真空的真空空間。其結果，在支撐部上 又有開口於真空空間的導通孔，與塾部沒有連接關係、可邙 · ～ member t Mingzhong, because the branch part has a space to be placed in the selected part "Li Cheng /, there is a communication with the support surface, is formed in the supported part, and there is an open π passage in the space to form the The parallel region has a sealing member, and the seal member's air permeability from the opening position to the support surface-side partition space 2 P in the space portion blocks the two sides of the broken partition, so π 1 p on the opening side can be made Can form a vacuum vacuum space. As a result, the support portion has a through hole that opens into the vacuum space, and has no connection relationship with the crotch portion.
在不運動的支撐部上連接真空配管。其結果，能夠容易連 接真空配管。 且该始、封部件，因爲可與墊部的移動與其支撐面 2〇、、斜相對應變形’所以不會妨礙墊部的移動，從而在對 盥2、、、收但日不會有助於由此產生的吸附支撐面的脫離 :y皮裹此外，因爲密封部件通常由某種程度柔軟的 成所以通過使用這樣的材料成爲通常可變形的形 把夠不妨礙這齡縣$移動與傾斜的特性。 面右這樣设置贫封部件，將空間部分隔成爲 20 200412319 真空狀態，則在密封部件處、在被分隔的空間部的内外之 間産生壓力差，密封部件雖然受到基於真空的外壓，但能 夠承受得住該外力、並遮斷如前所述的透氣性、保持真空。 這種密封部件的構成，以公知的適當的方法將密封部件的 5 兩端固定在具有成爲形成空間部的開口的墊部與支撐部 上，並且通過適當地選擇僅承受得住上述外壓的材質或厚 度的材料而容易貫現。 另外，因爲若外壓加在密封部件上、則其一端側的力 籲 加在塾部上，所以除由對象物的負荷産生的的支撐力外， 10 該外壓力也作用在被支撐部與支撐部之間，使摩擦力增 加。但是，因爲無需增大空間部並增大密封部件，而且空 間部被形成在支撐部中，所以空間部的面積被設定得比對 象物的支撐面的面積較小，故外壓力遠遠小於接觸面的吸 附力。而且，因爲與支撐力的情況相同，通過摩擦係數産 15 生摩擦力，所以最終由該附加的外壓力産生的力成爲比吸 附面的接觸力充分小的值。其結果，可靠地維持由支撐面 籲 與對象物的被支撐面之間的真空吸附産生的接觸狀態。A vacuum pipe is connected to the non-moving support. As a result, the vacuum piping can be easily connected. And the starting and sealing members can be deformed corresponding to the movement of the pad and its supporting surface 20, and obliquely, so it will not hinder the movement of the pad, so it will not help the toilet 2, Due to the detachment of the suction support surface: y leather wrap In addition, because the sealing member is usually made of a certain degree of softness, by using such materials into a generally deformable shape, it is not enough to hinder the movement and tilt of this age county Characteristics. If a lean sealing member is provided on the right side of the surface and the space portion is separated into a vacuum state of 20 200412319, a pressure difference occurs between the sealing member and the inside and outside of the partitioned space portion. Although the sealing member is subjected to external pressure based on vacuum, it can Can withstand this external force, interrupt the air permeability as described above, and maintain a vacuum. In the structure of such a sealing member, both ends of the sealing member 5 are fixed to a pad portion and a supporting portion having an opening forming a space portion by a known and appropriate method, and by appropriately selecting only one that can withstand the external pressure described above, Material or thickness of material. In addition, if external pressure is applied to the sealing member, the force on one end side is applied to the crotch, so in addition to the supporting force caused by the load of the object, the external pressure also acts on the supported portion and The friction between the support parts is increased. However, since there is no need to increase the space portion and the sealing member, and the space portion is formed in the support portion, the area of the space portion is set smaller than the area of the support surface of the object, so the external pressure is much smaller than the contact. Face adsorption. Further, since the friction force is generated by the friction coefficient as in the case of the supporting force, the force generated by the additional external pressure finally becomes a value sufficiently smaller than the contact force of the suction surface. As a result, the contact state caused by the vacuum suction between the support surface and the supported surface of the object is reliably maintained.
I：圖式簡單說明I 第1(a)圖是表示應用本發明的吸附墊的截面狀態的一 20 例的說明圖、第1(b)圖是表示將該吸附墊安裝在機械手上的 . 狀態的俯視圖。 _ 第2(a)及2(b)圖是表示應用本發明的吸附墊的另一例 的截面狀態的說明圖。 第3圖是第1圖的吸附墊的原理的說明圖。 21 200412319 第4圖是表示應用本發明的吸附墊的再一例的〜、 圖，第4(a)及4(b)圖分別是第4(b)及4(a)圖的 va a綠及b〜^ 線的前頭不意圖。 第5(a)圖是表示現行的吸附墊的截面狀態的一例的…、 5明圖、第5(b)圖是表示將該吸附蟄安裝在機械手上的狀，、 俯視圖。 ％ 第6(a)及6(b)圖是上述現行的吸附墊的原理的說明 【圖式之主要元件代表符號表】 1…吸附墊 2···墊(墊部） 3···支撐箱(支撐部） 3a…上箱 3b…下箱 3c…槽部 4···襯片（密封部件） 5…中間管 10…機械手 21…中央部分 22…支撐面 22a···右端部分 22b···左端部分 23…筒狀部(被支撐部） 23&··下端部(被支撐部） 23b···圓筒外面(移動限制結構部) 24···環面(傾斜限制結構部） 25…通路 25a…開口 31…平面部(支撐部） 32…内圈部(移動限制結構部） 33…上端面部(傾斜限制結構部） 34…空間部 34a、34b...外氣側、真空側(被 隔開的兩側） 35…中間通路 36···導引孔 41…内徑側 41a…環端 42…外徑側 51···入口部 52···彎曲部I: A brief description of the drawing I FIG. 1 (a) is an explanatory diagram showing a cross-sectional state of an adsorption pad to which the present invention is applied, and FIG. 1 (b) is a diagram showing the attachment of the adsorption pad to a robot . Top view of the state. _ Figures 2 (a) and 2 (b) are explanatory views showing the cross-sectional state of another example of the adsorption pad to which the present invention is applied. Fig. 3 is an explanatory diagram of the principle of the adsorption pad of Fig. 1. 21 200412319 Figure 4 is a ~, figure showing still another example of the adsorption pad to which the present invention is applied. Figures 4 (a) and 4 (b) are va a green and 4 (b) and 4 (a), respectively. b ~ ^ The front of the line is not intended. Fig. 5 (a) shows an example of a cross-sectional state of a conventional adsorption pad, Fig. 5 is a plan view, and Fig. 5 (b) is a plan view showing a state in which the adsorption pad is mounted on a robot. % Figures 6 (a) and 6 (b) are the explanation of the principle of the above-mentioned current suction pad [Table of the main component representative symbols of the drawing] 1 ... suction pad 2 ··· pad (pad portion) 3 ··· support Box (supporting section) 3a ... Upper box 3b ... Lower box 3c ... Groove section 4 ... Liner (sealing member) 5 ... Intermediate tube 10 ... Robot 21 ... Central portion 22 ... Support surface 22a ... Right end portion 22b ..... Left end portion 23 ... cylindrical portion (supported portion) 23 & ... lower end portion (supported portion) 23b ... outer surface of the cylinder (movement restriction structure portion) 24 ... toroidal surface (tilt restriction structure portion) ) 25 ... passage 25a ... opening 31 ... flat portion (supporting portion) 32 ... inner ring portion (movement restriction structure portion) 33 ... upper end surface portion (inclination restriction structure portion) 34 ... space portions 34a, 34b ... outdoor air side, Vacuum side (two sides separated) 35 ... Intermediate passage 36 ... Guide hole 41 ... Inner diameter side 41a ... Ring end 42 ... Outer diameter side 51 ... Inlet portion 52 ... Bent portion
22 200412319 53…出口部 54…管 cr··窄間隔(移動限制結構部) cr··窄間隔(傾斜限制結構部) Ft…平面 g···基板的自重分擔部分(支撐 對象物的負荷的支撐力） V···吸附力 W…玻璃基板、基板(對象物） W!…下面(被支撐的面）22 200412319 53 ... outlet 54 ... tube cr ... narrow gap (movement restriction structure) cr ... narrow gap (incline restriction structure) Ft ... plane g ... weight-sharing portion of the substrate (for supporting the load of the object Supporting force) V ··· Adsorption force W ... Glass substrate, substrate (object) W! ... underside (supported surface)
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