TW200411161A - Optical element measuring device - Google Patents

Optical element measuring device Download PDF

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Publication number
TW200411161A
TW200411161A TW91136455A TW91136455A TW200411161A TW 200411161 A TW200411161 A TW 200411161A TW 91136455 A TW91136455 A TW 91136455A TW 91136455 A TW91136455 A TW 91136455A TW 200411161 A TW200411161 A TW 200411161A
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Taiwan
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base
bracket
integrating sphere
turntable
optical element
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TW91136455A
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Chinese (zh)
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TW580572B (en
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Chih-Neng Chang
Chen-Yuan Hsu
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Prodisc Technology Inc
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Publication of TW200411161A publication Critical patent/TW200411161A/en

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Abstract

An optical element measuring device, including a base, a turntable, an integrating sphere and a holder. In this case, a reference point is provided on the circumferential surface of the base. The turntable is pivotally mounted on the base. A fixed-position scale is provided on the circumferential surface of the turntable. The integrating sphere is outwardly extending from the turntable along the radius direction of the turntable. The holder that can chuck an optical element is pivotally mounted on the turntable. The base, the turntable and the holder have the same axis. A reference element for fixing position is provided on the holder. The invention also disclosures an optical element device includes a base, an integrating sphere and a holder.

Description

200411161 五、發明說明(l) (一) 、【發明所屬之技術領域 本發明係關於一種朵風-^ 反射率的光學元件量測裝^,件量測裝置,特別是一測量 (二) 、【先前技術】 光電產業近年來&么& „ 工 業上的應用或是學術3 新興產業之一,不論是 卢土風-術上的研究都有很大的進展。 =干元件中’而反射鏡(High Reflection ιηογ /的應用極廣,大部分的高反射鏡係於一基板上鍍 、=子溥膜所製成。在高反射鏡的製程中,需要經過光學 儀1§,測其反射率,並經由訊號處理轉換成可供比對的數 據’藉以控制高反射鏡的良率。 如圖1所示,在量測一光學元件8的反射率時,係由一 光源區5發射一光束進入設置有光學元件8的一量測裝置6 中。接著,經由光學元件8所反射出的光束再射入一積分 球7中,經由訊號處理得到所需的數據。其中,量測裝置6 係由四個反射元件61、62、63以及64固定於一基座65上所 組成,該等反射元件6 1、6 2、6 3以及6 4之間的相對位置皆 需精準對位,以確保所量測之反射角度的精確度以及再現 性。 於上述的量測裝置中,一種量測裝置只能測量一固定 角度的反射率,並無法隨需要而任意調整。亦即,當測量 不同的反射角度時,即需更換另一量測裝置,造成使用上 的不便,同時增加製造成本。而且’量測裝置上反射元件200411161 V. Description of the invention (l) (a), [Technical field to which the invention belongs] The present invention relates to a kind of measuring device for measuring the reflectivity of an optical element, a piece measuring device, especially a measuring device (two), [Previous technology] The optoelectronic industry in recent years & what & „industrial applications or one of the 3 emerging industries, both the research of Lu Tufeng and surgery have made great progress. High reflection mirrors are widely used. Most of the high reflection mirrors are made by plating on a substrate with a thin film. In the process of high reflection mirrors, an optical instrument 1§ is required to measure the The reflectivity is converted into comparable data through signal processing to control the yield of the high mirror. As shown in FIG. 1, when the reflectance of an optical element 8 is measured, it is emitted by a light source area 5. A light beam enters a measuring device 6 provided with an optical element 8. Then, the light beam reflected by the optical element 8 is incident into an integrating sphere 7 to obtain required data through signal processing. Among them, the measuring device 6 system consists of four reflective elements 61, 62, 63, and 64 are fixed on a base 65, and the relative positions of the reflective elements 6 1, 6, 2, 6, 3, and 6 4 need to be accurately aligned to ensure the measured reflection angle. Accuracy and reproducibility. Among the above-mentioned measuring devices, a measuring device can only measure the reflectivity of a fixed angle and cannot be arbitrarily adjusted as needed. That is, when measuring different reflection angles, it needs to be replaced. Another measurement device causes inconvenience in use and increases manufacturing costs. Also, 'reflective elements on the measurement device

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200411161 五、發明說明(2) 之間的相對位置必須非常精準,若其中一個發生位移,即 無法準確量測到光學元件的反射率,造成所量測之再現性 差。同時,光源、量測裝置以及積分球必須位於同一直線 上,使得整個儀器的體積過大,造成儀器面積上縮小的限 制·,進而減少每單位面積的產能。 (三)、【發明内容】200411161 V. Description of the invention (2) The relative position between the two must be very accurate. If one of them is displaced, the reflectivity of the optical element cannot be accurately measured, resulting in poor reproducibility of the measurement. At the same time, the light source, measuring device, and integrating sphere must be on the same straight line, which makes the volume of the entire instrument too large, which limits the reduction of the instrument area, and thus reduces the capacity per unit area. (Three), [invention content]

是以,為解決上述問題,本發明之目的係提供一種能 夠量測多種反射角度、突破裝置面積限制以及提高精確度 的光學元件量測裝置。 而,本發明係利用同心軸旋轉原理提供一種光學元件 量測裝置,能夠量測光學元件之各種反射角角度的反射 率 〇Therefore, in order to solve the above-mentioned problems, an object of the present invention is to provide an optical element measuring device capable of measuring various reflection angles, breaking the device area limitation, and improving accuracy. However, the present invention provides an optical element measuring device using the principle of concentric axis rotation, which can measure the reflectance of various reflection angles of the optical element.

為達上述目的,本發明係提供一種光學元件量測裝 置’其係包含一基座、一轉盤、一積分球單元組以及一支 架。其中,基座的圓周面上係設有一參考點;轉盤係軸設 於基座上,且轉盤的圓周面上係設有一定位刻度;積分球 單元係於轉盤之半徑方向自轉盤而向外側延設;支架係轴 設於轉盤上,用以挾持一光學元件,基座、轉盤與支架係 位於同心軸上,支架係設有一用以供支架定位之參考元 件。另外,本發明亦提供一種光學元件量測裝置,其係包 含一基座、一積分球單元以及一支架。其中,基座的圓周 面上係設有一定位刻度;積分球單元係樞接於基座上,且 積分球單元係設有一第一參考元件;支架係軸設於積分球To achieve the above object, the present invention provides an optical element measuring device ', which includes a base, a turntable, an integrating sphere unit group, and a stand. Among them, a reference point is provided on the peripheral surface of the base; a turntable axis is provided on the base, and a positioning scale is provided on the peripheral surface of the turntable; an integrating sphere unit extends outward from the turntable in the radial direction of the turntable and extends outward. The bracket is provided on the turntable to hold an optical component. The base, the turntable and the bracket are located on the concentric shaft. The bracket is provided with a reference component for positioning the bracket. In addition, the present invention also provides an optical element measuring device, which includes a base, an integrating sphere unit, and a bracket. Among them, a positioning scale is provided on the peripheral surface of the base; the integrating sphere unit is pivotally connected to the base, and the integrating sphere unit is provided with a first reference element; the bracket system shaft is provided on the integrating sphere.

200411161200411161

基座、積分球單元與支架 用以供支架定位之第二參 單元上,用以挾持一光學元件, 係位於同心軸上,支架係設有一 考元件。 緣是, 用同心軸旋 率。與習知 支架設置於 精確地調整 元件之各種 時,由於量 本發明 轉原理 技術相 同心轴 積分球 反射角 測不同 進一步節省了製程 元不須位於 增加每單位 係固定於同 所以測量到 同一直 面積的 心軸上 結果的 所提供的一 來量測光學 比,本發明 上’以基座 單元與支架 度的反射率 反射角度時 上的成本。 線上,減少 產能。另外 ,不易位移 準確性以及 種光學元件量 元件之各種反 係將基座、積 當作參考座標 的角度,進而 ’縮短了量測 不需更換另一 再者,由於光 整個儀器所佔 ,本發明中量 且減少發生量 重複性皆高。 射角度 分球單 ’即能 能夠量 上的時 量測裝 源與積 的面積 測裝置 測上的 ,係利 的反射 元以及 快速並 測光學 間。同 置,更 分球單 ,進而 的元件 誤差, (四)、【實施方式】 以下將參照相關圖式,說明依據本發明實施例之一種 光學元件量測裝置。 如圖2A及圖2B所示,本發明之第一實施例係提供一種 光學元件量測裝置i ’其係包含一基座丨丨、一轉盤丨卩、一 積分球單元13以及一支架14。其中,基座丨丨的圓周面丨丄^ 上係設有一參考點;轉盤12係軸設於基座丨丨上,且轉si 2 的圓周面121上係設有一定位刻度;積分球單元13係於轉The base, the integrating sphere unit and the bracket are used on the second reference unit for positioning the bracket, and are used for holding an optical element. They are located on the concentric axis, and the bracket is provided with a test element. The reason is to use concentric axis rotation. When the conventional bracket is set to precisely adjust various components, the measurement angle of the mandrel integrating sphere is the same as the measurement principle of the invention, and the reflection angle measurement of the mandrel is different, which further saves the process element. It does not need to be located. Each unit is fixed to the same, so the measurement is the same. The results provided on the mandrel of the area measure the optical ratio, and the cost of the present invention is to reflect the angle with the reflectivity of the base unit and the bracket. Online, reducing production capacity. In addition, the accuracy of displacement is not easy, and various countermeasures of optical elements and measuring elements use the angle of the base and the product as reference coordinates, thereby 'shortening the measurement without replacing the other. Because the entire instrument is occupied by light, the present invention Medium and reduced occurrences are highly reproducible. The shooting angle is divided into single shots, that is, it can measure the time to measure the area of the source and the product. The measuring device is a good reflection element, and it can quickly measure the optical time. In the same arrangement, the ball is more divided, and the component error is further reduced. (4). [Embodiment] The following will describe an optical component measurement device according to an embodiment of the present invention with reference to related drawings. As shown in FIG. 2A and FIG. 2B, a first embodiment of the present invention provides an optical element measuring device i ′, which includes a base 丨 丨, a turntable 丨 卩, an integrating sphere unit 13 and a bracket 14. Among them, a reference point is provided on the circumferential surface of the base 丨 丨; the axis of the turntable 12 is provided on the base 丨 丨, and a positioning scale is provided on the circumferential surface 121 of the turn si 2; the integrating sphere unit 13 Tied to turn

200411161 五、發明說明(4) 盤1 2之半徑方向自轉盤1 2而向外側延設;支架i 4係軸設於 轉盤12上,用以挾持一光學元件2 (顯示於圖3A ),基座 11、轉盤12與支架14係位於同心軸上’支架14係設有一用 以供支架14定位之參考元件141。 如圖2 A及圖2 B所示,本實施例之基座11係將光學元件 量測裝置1固定於光學儀器之測量槽(未顯示)中,以防 止光學元件量測裝置1在測量人員置換光學元件2時造成位 移。在此,基板11的特點包括重心低、平穩而不易產生搖 晃。另外,基座11的圓周面111上係設有一參考點,以供 轉盤12以及支架14定位之用。 請參考圖2A及圖2B,轉盤12係轴設於基座11之上,且 轉盤1 2的圓周面1 2 1上係設有一定位刻度。 再請參考圖2A及圖2B,積分球單元13係於轉盤12之半 徑方向自轉盤1 2而向外側延設。在此,積分球單元1 3包含 一積分球1 3 1、一外殼體1 3 2以及一臂部1 3 3,積分球1 31係 設置於外殼體132内,且外殼體132係藉由臂部丨33而固定 於轉盤12上。其中,積分球131係用以收集反射的光束, 並偵測其光通量,再經由訊號處理而得可供比較的數據。 於本實施例中,轉盤1 2的功能在調整積分球單元1 3的 旋轉角度,當轉盤12轉動時,積分球單元13隨之轉動,並 依據基座11之參考點的位置來調整積分球單元13的旋轉角 度。 另外,如圖2A及圖2B所示,本實施例中支架1 4係軸設 於轉盤12上,用以挾持一光學元件2 (顯示於圖3A ),基200411161 V. Description of the invention (4) The radius of the disc 12 is extended outward from the turntable 12; the bracket i4 is set on the turntable 12 to hold an optical element 2 (shown in Fig. 3A). The base 11, the turntable 12 and the bracket 14 are located on a concentric axis. The bracket 14 is provided with a reference element 141 for positioning the bracket 14. As shown in FIG. 2A and FIG. 2B, the base 11 of this embodiment fixes the optical element measuring device 1 in a measuring slot (not shown) of the optical instrument to prevent the optical element measuring device 1 from being measured by a measuring person. Displacement occurs when the optical element 2 is replaced. Here, the characteristics of the substrate 11 include a low center of gravity, a smoothness, and a low tendency to shake. In addition, a reference point is provided on the peripheral surface 111 of the base 11 for positioning the turntable 12 and the bracket 14. Please refer to FIG. 2A and FIG. 2B. The turntable 12 is provided with a shaft on the base 11 and a positioning scale is provided on the circumferential surface 1 2 1 of the turntable 12. Please refer to FIG. 2A and FIG. 2B again. The integrating sphere unit 13 is extended in the radial direction of the turntable 12 from the turntable 12 to the outside. Here, the integrating sphere unit 1 3 includes an integrating sphere 1 3 1, an outer casing 1 3 2, and an arm portion 1 3 3. The integrating sphere 1 31 is disposed in the outer casing 132, and the outer casing 132 is connected by the arm.部 33 and fixed to the turntable 12. The integrating sphere 131 is used to collect the reflected light beam, detect its luminous flux, and then process the signal to obtain comparable data. In this embodiment, the function of the turntable 12 is to adjust the rotation angle of the integrating sphere unit 13. When the turntable 12 rotates, the integrating sphere unit 13 rotates accordingly, and adjusts the integrating sphere according to the position of the reference point of the base 11. The rotation angle of the unit 13. In addition, as shown in FIG. 2A and FIG. 2B, in this embodiment, the bracket 14 is mounted on the turntable 12 to hold an optical element 2 (shown in FIG. 3A).

200411161 五、發明說明(5) 座11、轉盤12與支架14係位於同心軸上,且支架14上係設 有一用以供支架14定位之參考元件141。在此,支架14係 依據參考元件1 4 1與轉盤1 2之定位刻度的相對位置來調整 支架1 4的旋轉角度。亦即,支架i 4係依據所需,調整入射 光線射入光學元件2的入射角度,藉以改變光線自光學元 件2射出的方向,使得自光學元件2射出的光線能夠射入積 分球單元1 3。 另外’本發明之光學元件量測裝置1更包含一微調單 元1 5 ’此微調單元1 5係設置於基座11内,用以精密調整轉 盤12的旋轉角度,如圖2A及圖2B所示。 於本發明中,係利用基座11、轉盤1 2與支架1 4位於同 心軸上的原理來進行作動。當光源射入光學元件2的入射 角增加Θ度時’其反射角會相對增加θ度,故光線經過光學 元件2之路徑的角度會增加2 Θ度;同理,當光源射入光學 元件2的入射角減少θ度時,其反射角會相對減少θ度,故 光線經過光學元件2之路徑的角度亦減少2 Θ度。 圖3A、圖3B以及圖3C係為本實施例具體實施之一系列 示意圖。在利用光學儀器(未顯示)進行光學元件2的反 射率測量時’一開始必須將基座11鎖在光學儀器的測量槽 (未顯示)中,並將光學元件2放置於支架14上,如圖3A 所示。當欲量測的反射角度為70度時,係先將轉盤12上定 位刻度140度(即欲量測之反射角度的2倍)對準基座11之 參考點(0度)的位置,藉以調整積分球單元13的旋轉角 度,如圖3B所示。接著,再將支架14的參考元件141對準200411161 V. Description of the invention (5) The base 11, the turntable 12 and the bracket 14 are located on a concentric axis, and a reference element 141 is provided on the bracket 14 for positioning the bracket 14. Here, the bracket 14 adjusts the rotation angle of the bracket 14 according to the relative position of the reference component 14 1 and the positioning scale of the turntable 12. That is, the bracket i 4 adjusts the incident angle of the incident light rays into the optical element 2 as required, thereby changing the direction of the light rays emitted from the optical element 2 so that the light rays emitted from the optical element 2 can enter the integrating sphere unit 1 3 . In addition, the optical element measuring device 1 of the present invention further includes a fine adjustment unit 15. The fine adjustment unit 15 is set in the base 11 to precisely adjust the rotation angle of the turntable 12, as shown in FIG. 2A and FIG. 2B. . In the present invention, the operation is based on the principle that the base 11, the turntable 12 and the bracket 14 are located on the same axis. When the incident angle of the light source into the optical element 2 increases by Θ degrees, its reflection angle will increase relatively by θ degrees, so the angle of the path of the light passing through the optical element 2 will increase by 2 Θ degrees; similarly, when the light source enters the optical element 2 When the incident angle of θ is reduced by θ degrees, the reflection angle thereof is relatively reduced by θ degrees, so the angle of the path of the light passing through the optical element 2 is also reduced by 2 θ degrees. Fig. 3A, Fig. 3B and Fig. 3C are a series of schematic diagrams of the specific implementation of this embodiment. When using an optical instrument (not shown) to measure the reflectance of the optical element 2 'In the beginning, the base 11 must be locked in a measuring slot (not shown) of the optical instrument, and the optical element 2 should be placed on the bracket 14, such as Figure 3A. When the reflection angle to be measured is 70 degrees, firstly, the positioning scale on the turntable 12 is 140 degrees (that is, twice the reflection angle to be measured) is aligned with the reference point (0 degree) of the base 11. The rotation angle of the integrating sphere unit 13 is adjusted, as shown in FIG. 3B. Next, align the reference element 141 of the bracket 14

200411161 五、發明說明(6) 轉盤12上定位刻度70度(即欲量測之反射角度),藉以調 整支架1 4的旋轉角度,如圖3 C所示。最後,光源發射一光 束於光學元件2中,接著反射光束進入積分球丨31中,經由 訊號處理將反射光的光通量轉換成可供比對的數據。 需注意者’在本發明之光學元件量測裝置中,轉盤1 2 係以基座1 1之參考點為基準而轉動,支架Η則以轉盤1 2為 基準而轉動,因此,轉盤12與支架14皆能夠以基座11之參 考點為基準而定位。凡熟悉該項技術者應當瞭解,如圖 3八、圖3Β以及圖3C所示的光學元件量測裝置1之積分球131 係固定於轉盤1 2上,而支架1 4係軸設於轉盤1 2上,以便使 得積分球131及支架14能夠以基座11之參考點為基準而定 位;反之,亦可以將支架固定於轉盤上,而將積分球轴設 於轉盤上,同樣能夠使得積分球及支架以基座之參考點為 基準而定位。 接著,如圖4所示,本發明之第二實施例亦提供一種 光學元件量測裝置3,其係包含一基座3 1、一積分球單元 32以及一支架33。 其中,基座3 1的圓周面311上係設有一定位刻度;積 分球單元32係樞接於基座31上,且積分球單元32係設有第 一參考元件324 ;支架33係軸設於基座31上,用以挾持一 光學元件4 (顯示於圖5Α )。在此,基座31、積分球單元 32與支架33係位於同心軸上,支架33係設有一用以供支架 33定位之第二參考元件331。 請參考圖4,積分球單元32係包含一積分球321、一外200411161 V. Description of the invention (6) The positioning scale on the turntable 12 is 70 degrees (that is, the reflection angle to be measured), so as to adjust the rotation angle of the bracket 14 as shown in FIG. 3C. Finally, the light source emits a light beam in the optical element 2, and then the reflected light beam enters the integrating sphere 31, and the light flux of the reflected light is converted into data for comparison through signal processing. It should be noted that in the optical component measuring device of the present invention, the turntable 12 is rotated based on the reference point of the base 11 and the bracket 转动 is rotated based on the turntable 12 as a reference. Therefore, the turntable 12 and the bracket are rotated. 14 can be positioned based on the reference point of the base 11. Those who are familiar with this technology should understand that the integrating sphere 131 of the optical element measuring device 1 shown in FIG. 3, FIG. 3B, and FIG. 3C is fixed on the turntable 12 and the bracket 1 and 4 are equipped with the shaft on the turntable 1 2 so that the integrating sphere 131 and the bracket 14 can be positioned based on the reference point of the base 11; conversely, the bracket can be fixed on the turntable and the integrating sphere axis can be set on the turntable, which can also make the integrating sphere. And the bracket is positioned based on the reference point of the base. Next, as shown in FIG. 4, the second embodiment of the present invention also provides an optical element measuring device 3, which includes a base 31, an integrating sphere unit 32, and a bracket 33. Among them, a positioning scale is provided on the circumferential surface 311 of the base 31; the integrating sphere unit 32 is pivotally connected to the base 31, and the integrating sphere unit 32 is provided with a first reference element 324; the bracket 33 is provided on the shaft The base 31 is used for holding an optical element 4 (shown in FIG. 5A). Here, the base 31, the integrating sphere unit 32, and the bracket 33 are located on a concentric axis. The bracket 33 is provided with a second reference element 331 for positioning the bracket 33. Please refer to FIG. 4, the integrating sphere unit 32 includes an integrating sphere 321 and an outer

200411161 五、發明說明(7) 殼體322、一臂部323以及第一參考元件324。其中,積分 球321係設置於外殼體322内,且外殼體322係藉由臂部323 樞接於基座31上,且臂部32 3係設有第一參考元件324,其 係以基座3 1為間隔與積分球3 21相對而設。在此,積分球 單元32係依據基座31之定位刻度以第一參考元件324調整 積分球單元32的旋轉角度。 再請參考圖4,支架33係軸設於基座31上,用以挾持 一光學元件4 (顯示於圖5A )。其中,支架33係設有一用 以供支架33定位的第二參考元件331,且支架33係依據基 座31之定位刻度以第二參考元件331調整支架33的旋轉角 度。 相同地,於本實施例中,基座31、積分球單元3 2與支 架33亦位於同心軸上。需注意者,在本發明中,支架33之 轴承與臂部3 2 3之樞軸係為一同心軸結構,而支架3 3之轴 承為内軸,臂部323之樞軸為外軸(如圖4所示);另外, 热知技術者亦可以採用支架3 3之軸承為外軸、臂部3 2 3之 槐輛為内軸的設計。 本實施例所依據的原理係與第一實施例相同,但操作 上因元件的調整而有些許的差異。 接著’圖5 A、圖5 B以及圖5 C係為本實施例具體實施之 —系列示意圖。當欲量測7 〇度反射角的反射率時,係將支 架33的第二參考元件mi旋至基座31之定位刻度2〇度的位 置’即反射角70度之餘角,如圖5B所示。接著,再將積分 東單元32的第一參考元件324旋至基座31上定位刻度4〇度200411161 V. Description of the invention (7) The housing 322, the one arm portion 323 and the first reference element 324. Among them, the integrating sphere 321 is disposed in the outer casing 322, and the outer casing 322 is pivotally connected to the base 31 through the arm portion 323, and the arm portion 323 is provided with the first reference element 324, which is based on the base 3 1 is set to face the integrating sphere 3 21. Here, the integrating sphere unit 32 adjusts the rotation angle of the integrating sphere unit 32 with the first reference element 324 according to the positioning scale of the base 31. Please refer to FIG. 4 again, the bracket 33 is mounted on the base 31 for holding an optical element 4 (shown in FIG. 5A). Among them, the bracket 33 is provided with a second reference element 331 for positioning the bracket 33, and the bracket 33 adjusts the rotation angle of the bracket 33 with the second reference element 331 according to the positioning scale of the base 31. Similarly, in this embodiment, the base 31, the integrating sphere unit 32, and the support 33 are also located on the concentric shaft. It should be noted that in the present invention, the bearing of the bracket 33 and the pivot of the arm portion 3 2 3 are of the same mandrel structure, while the bearing of the bracket 33 is an inner shaft, and the pivot of the arm portion 323 is an outer shaft (such as (Shown in Fig. 4); In addition, those skilled in the art can also adopt a design in which the bearing of the bracket 3 3 is an outer shaft, and the locomotive of the arm portion 3 2 3 is an inner shaft. The principle on which this embodiment is based is the same as the first embodiment, but the operation is slightly different due to the adjustment of the components. 5A, 5B, and 5C are a series of schematic diagrams of the embodiment. When measuring the reflectance at a reflection angle of 70 degrees, the second reference element mi of the bracket 33 is rotated to the position of the positioning scale 20 degrees of the base 31, that is, the remaining angle of the reflection angle of 70 degrees, as shown in FIG. 5B. As shown. Next, turn the first reference element 324 of the integral east unit 32 to the positioning scale 40 degrees on the base 31.

200411161 五、發明說明(8) 的位置,即反射角70度之餘角的2倍,如圖5C所示。最 後,光源自刻度0度處發射一光束於光學元件4中,接著反 射光束進入積分球321中,經由訊號處理將反射光的光通 量轉換成可供比對的數據。 本發 軸旋轉原 技術相比 心轴上, 球單元與 射率,並 角度時不 成本。再 上,亦減 產能。另 上,不易 果的準確 上述 明之精神 含於後附 明所提供的一 各種角度 分球單元 座標,即 測光學元 。同時, ’所以更 球單元不 積,進而 置的元件 測上的誤 限制性者 之等效修 裝置,係利用同心 的反射率。與習知 以及支架設置於同 能簡單地調整積分 件之各種角度的反 由於量測不同反射 進一步節省了製造 理來量 ,本發 只須以 支架的 縮短了 需更換 者,由 少整個 外,本 因產生 性以及 僅為舉 與範脅 之申請 測光學 明將基 基座當 角度, 量測上 另一量 於光源 儀器所 發明中 位移而 重複性 例性, ’而對 專利範 種光学 元件之 座、積 作參考 進而量 的時間 測裝置 與積分 佔的面 量測裝 發生量 皆高。 而非為 其進行 圍中。 須位於 增加每 係固定 差,所 同一直線 單位面積的 於同心轴 以測量到結 。任何未脫離本發 改或變更,均應包200411161 Fifth, the position of invention description (8), which is twice the angle of reflection of 70 degrees, as shown in Figure 5C. Finally, the light source emits a light beam at the optical element 4 at the scale of 0 degrees, and then the reflected light beam enters the integrating sphere 321, and converts the light flux of the reflected light into comparable data through signal processing. Compared with the original mandrel rotation technology, the mandrel has no cost when the ball unit and the emissivity are angled. Furthermore, production capacity was also reduced. In addition, the accuracy of the above-mentioned instructions is not easy to be included in the coordinates of the ball unit of various angles provided by the postscript, that is, the optical element. At the same time, the 'spherical unit does not build up, and the misplacement of the measured components is equivalent to the equivalent device, which uses concentric reflectance. It is easy to adjust the various angles of the integrator with the conventional and brackets. It is possible to adjust the different reflections of the integrator to measure the different reflections. This further saves the manufacturing cost. The hair only needs to be shortened by the brackets. This example is repeated because of the nature of the application and the application of Fan Ji to measure the optical base as the angle, and to measure another amount of displacement in the invention of the light source instrument. The amount of time measurement devices, such as seat, product for reference and measurement, and integral surface measurement equipment, are high. Instead of encircling it. Must be located to increase the fixed difference of each system, the unit area of the same straight line on the concentric axis to measure the knot. Any changes or changes that have not deviated from this development shall be included

第12頁 200411161 圖式簡單說明 (五)、【圖式簡單說明】 圖1係習知之光學元件量測裝置的示意圖。 圖2A與圖2B係本發明第一實施例之光學元件量測裝置 的立體圖。 圖3A、圖3B與圖3C係為本發明第一實施例具體實施之 一系列立體示意圖。 圖4係本發明第二實施例之光學元件量測裝置的立體 圖。Page 12 200411161 Brief description of the drawings (five), [Simplified description of the drawings] Fig. 1 is a schematic diagram of a conventional measuring device for optical elements. 2A and 2B are perspective views of an optical element measuring device according to the first embodiment of the present invention. Fig. 3A, Fig. 3B and Fig. 3C are a series of three-dimensional schematic diagrams of the first embodiment of the present invention. Fig. 4 is a perspective view of an optical element measuring device according to a second embodiment of the present invention.

圖5A、圖5B與圖5C係為本發明第二實施例具體實施之 一系列立體示意圖。 元件符號說明: 光學元件量測裝置 基座 圓周面 轉盤 圓周面 積分球單元 積分球 外殼體 臂部 支架 參考元件 微調單元 1 11 111 12 121 13Fig. 5A, Fig. 5B and Fig. 5C are a series of three-dimensional schematic diagrams of the second embodiment of the present invention. Component symbol description: Optical element measuring device Base Circumferential surface Turntable Circumferential surface Integrating sphere unit Integrating sphere Outer housing Arm Arm Bracket Reference component Fine adjustment unit 1 11 111 12 121 13

131 132 133 14 141 15131 132 133 14 141 15

第13頁 200411161 圖式簡單說明 2 光學元件 3 光學元件量測裝置 31 基座 311 圓周面 32 積分球單元 321 積分球 322 外殼體 323 臂部 324 第一參考元件 33 支架 331 第二參考元件 4 光學元件 5 光源區 6 量測裝置 61 、 62 、 63 、 64 反射元件 65 基座 7 積分球 8 光學元件Page 13 200411161 Brief description of drawings 2 Optical element 3 Optical element measuring device 31 Base 311 Circumferential surface 32 Integrating sphere unit 321 Integrating sphere 322 Outer housing 323 Arm 324 First reference element 33 Stand 331 Second reference element 4 Optical Element 5 Light source area 6 Measuring device 61, 62, 63, 64 Reflecting element 65 Base 7 Integrating sphere 8 Optical element

第14頁 ❿Page 14 ❿

Claims (1)

200411161 六、申請專利範圍 1 · 一種光學元件量測裝置,包含: 一基座,該基座的圓周面上係設有一參考點; 一轉盤,係軸設於該基座上,且該轉盤的圓周面上係設有 一定位刻度; 一積分球單元,係於該轉盤之半徑方向自轉盤而向外侧延 設;以及 一支架,係軸設於該轉盤上,用以挾持一光學元件,該基 座、該轉盤與該支架係位於同心轴上,該支架係設有^一 用以供該支架定位之參考元件。 2 ·如申晴專利範圍弟1項所述之光學元件量測裝置,更包 含: 一微調單元,係設置於該基座上,且用以精密調整該轉盤 的旋轉角度。 3 ·如申請專利範園第1項所述之光學元件量測裝置,其 中: 該積分球單元包含一積分球、一外殼體以及一臂部,該積 分球係設置於該外殼體内,且該外殼體係藉由該臂部而 固定於該轉盤上。 4·如申請專利範圍第1項所述之光學元件量測裝置,其 中·· 該轉盤轉動時該積分球單元隨之轉動,並依據該基座之參200411161 6. Scope of patent application1. An optical component measuring device includes: a base, a reference point is provided on the peripheral surface of the base; a turntable is provided with a shaft on the base, and the A positioning scale is provided on the circumferential surface; an integrating sphere unit is extended from the turntable to the outside in the radial direction of the turntable; and a bracket is provided on the turntable to hold an optical element, the base The base, the turntable and the bracket are located on a concentric shaft, and the bracket is provided with a reference element for positioning the bracket. 2 · The optical component measurement device described in item 1 of Shen Qing's patent scope, further comprising: a fine adjustment unit, which is set on the base and is used to precisely adjust the rotation angle of the turntable. 3. The optical element measuring device according to item 1 of the patent application park, wherein: the integrating sphere unit includes an integrating sphere, an outer casing, and an arm, and the integrating sphere is disposed in the outer casing, and The housing system is fixed on the turntable by the arm portion. 4. The optical element measuring device as described in item 1 of the scope of patent application, wherein the integrating sphere unit rotates when the turntable rotates, and according to the parameters of the base 第15頁 200411161 六、申請專利範圍 ' ^— 考點的位置調整該積分球單元的旋轉角度。 5 ·如申請專利範圍第1項所述之光學元件量測裝置,其 中: 、 該支架係依據該參考元件與該轉盤之定位刻度的相對位置 調整該支架的旋轉角度。 6 ·如申請專利範圍第1項所述之光學元件量測裝置,其 中: ’、 量測時係先依據該基座之參考點以該轉盤調整該積分球單 元的》疋轉角度’接著依據該轉盤之定位刻度以該支架之 參考元件調整該支架的旋轉角度。 7 · —種光學元件量測裝置,包含: 一基座,該基座的圓周面上係設有一定位刻度; 一積分球單元,係樞接於該基座上,且該積分球單元係設 有一第一參考元件;以及 一支架,係軸設於該基座上,用以挾持一光學元件,該基 座、該積分球單元與該支架係位於同心軸上,該支架係 設有一用以供該支架定位之第二參考元件。 8.如申請專利範圍第7項所述之光學元件量測裝置,其 中: 該積分球單元包含一積分球、一外殼體以及一臂部,該積Page 15 200411161 6. Scope of Patent Application ^ ^ The position of the test point adjusts the rotation angle of the integrating sphere unit. 5 · The optical element measuring device according to item 1 of the scope of patent application, wherein: The bracket is adjusted according to the relative position of the reference element and the positioning scale of the turntable. 6 · The optical element measuring device according to item 1 of the scope of patent application, wherein: ", when measuring, first adjust the" turn angle "of the integrating sphere unit with the turntable according to the reference point of the base and then follow The positioning scale of the turntable adjusts the rotation angle of the bracket with the reference element of the bracket. 7 · An optical element measuring device, comprising: a base, a positioning scale is provided on a circumferential surface of the base; an integrating sphere unit is pivotally connected to the base, and the integrating sphere unit is provided There is a first reference element; and a bracket is provided on the base for holding an optical element. The base, the integrating sphere unit and the bracket are located on a concentric shaft, and the bracket is provided with a A second reference element for positioning the bracket. 8. The optical element measuring device according to item 7 of the scope of patent application, wherein: the integrating sphere unit includes an integrating sphere, an outer shell and an arm, and the product 第16頁 200411161 六、申請專利範圍 分球係設置於該外殼體内,該外殼體係藉由該臂部而樞 接於該基座上,且該第一參考元件係設置於該臂部上。 9·如申請專利範圍第8項所述之光學元件量測裝置,其 中: 該第一參考元件及該基分球係分別位於該基座之相對兩 側。Page 16 200411161 6. Scope of patent application The ball is arranged in the casing, the casing system is pivotally connected to the base by the arm portion, and the first reference element is disposed on the arm portion. 9. The optical element measuring device according to item 8 of the scope of the patent application, wherein: the first reference element and the base ball are located on opposite sides of the base, respectively. I 〇·如申請專利範圍第7項所述之光學元件量測裝置,其 中·· 該積分球單元係依據該基座之定位刻度以該第一參考元件 調整該積分球單元的旋轉角度。 II ·如申請專利範圍第7項所述之光學元件量測裝置,其 中: 該支架係依據該基座之定位刻度以該第二參考元件調整該 支架的旋轉角度。I 〇 The optical element measuring device as described in item 7 of the scope of patent application, wherein the integrating sphere unit adjusts the rotation angle of the integrating sphere unit with the first reference element according to the positioning scale of the base. II. The optical element measuring device according to item 7 of the scope of patent application, wherein: the bracket is adjusted with the second reference element according to the positioning scale of the base and the rotation angle of the bracket. 第17頁Page 17
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106162165A (en) * 2016-08-23 2016-11-23 凌云光技术集团有限责任公司 Imageing sensor photosurface localization method and relevant apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106162165A (en) * 2016-08-23 2016-11-23 凌云光技术集团有限责任公司 Imageing sensor photosurface localization method and relevant apparatus

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