TW200405426A - Diffractive optical device, illuminating optical apparatus, exposure apparatus and exposure method - Google Patents

Abstract

The present invention is related to a kind of illuminating optical apparatus, which is used to illuminate papillary face to form a substantially uniform four-pole shape diffractive optical device such that it is capable of suppressing optical loss when conducting excellent four-pole illumination. The present invention is related to the illumination apparatus used for illuminating the illuminated faces (13, 15). In order to form the secondary light source having four-pole shape light intensity distribution on the illuminating light papillary face, a diffractive optical device (61) used for converting the incident light into four light beams is provided. In the diffractive optical device, the same numbers of the first basic diffractive optical device, the second basic diffractive optical device, the first compensative optical device, and the second compensative optical device are closely arranged.

Description

200405426 Description of the invention: [Technical field to which the invention belongs] The present invention relates to a diffractive optical element, an illumination optical device, an exposure device, and an exposure method ', and more particularly to a non-coupling method for manufacturing a semiconductor device and a photographic device by a lithography process. Optical elements for exposure devices of micro-elements such as liquid crystal display elements, thin-film magnetic heads, etc. [Prior art] In a typical exposure device of this type, a light beam emitted from a light source is incident on a fly-eye lens, and a secondary light source composed of a plurality of light source images is formed on a rear focal plane. The light beam from the secondary light source passes through the aperture light (located near the focal plane behind the fly-eye lens) to limit the difficulty and hit the focusing lens. Hole_ The desired lighting conditions (exposure conditions) of the diaphragm root limit the size of the secondary light source to the desired shape or size. The light beam focused by the focused lens is superimposed to form a mask with a predetermined pattern. The light transmitted through the mask pattern is imaged on the wafer by the projection optical system. In this way, a mask pattern is projected and exposed (transferred) on the wafer. In addition, the pattern formed on the photomask is highly integrated, and the size of the aperture portion (light transmitting portion) for correct rotation of the fine pattern is changed to form a fly-eye lens. In recent years, the fly-eye lens has been changed by changing the position of the fly-eye lens. The configured aperture light is the size of the secondary light source, in order to change the coherence of the illumination. # 童 告 数 σ (σ value = aperture diaphragm diameter / pupil plane diameter of the projection optical system or σ value = illumination optics 200405426 system exit side aperture number / The number of apertures on the incident side of the projection optical system has attracted attention from all walks of life. In addition, the shape of the aperture portion of the aperture stop arranged on the exit side of the fly-eye lens is set to be a ring shape or a 4-hole shape (that is, a 4-pole shape) to limit the shape of the secondary light source formed by the fly-eye lens to a 4-pole shape The technology to improve the depth of focus and resolution of the projection optical system has also attracted attention from all walks of life. As mentioned earlier, the conventional technology is to limit the shape of the secondary light source to the shape of an endless belt or a 4-pole to deform the illumination (ring (With illumination or 4-pole illumination), because the beam from the secondary light source formed by the fly-eye lens is restricted by an aperture stop with an annular zone or a 4-pole aperture. In other words, in the circular lighting A 4 pole lighting of the conventional technology, a considerable portion of the light beam from the secondary light source is blocked by the aperture stop, which does not contribute to the illumination (exposure). As a result, the light amount of the aperture stop is reduced, resulting in low illuminance on the reticle and wafer, resulting in low efficiency of the exposure device. In view of the above-mentioned circumstances, Ben Maoming aims to provide a diffracted light and element, for example, which is used for illumination optical devices, can be formed on the illumination pupil surface, and has a uniform 4-pole illuminance distribution in quality. In addition, another aspect of the present invention ... 'provides a kind of lighting to dream ^ ^ one mile' ,,, and moon nine sub-devices' which uses a uniform 4-pole-shaped eve on the light surface of the lighting \ ι In addition, the diffractive optical elements such as ..., dagger cloth, etc., while suppressing the loss of light quantity, can also be used for multi-pole lighting such as 4-pole lighting. In addition, the 爯 —θ Μ ^ " once in the present invention, provides a method that can suppress the loss of the sagittal and also can self-cup; 杯 / light and nightmare .. ^ multi-pole lighting such as Dingji lighting Under the conditions of the best light source of the mask, the exposure light and the exposure device and method for faithfully turning the mask pattern on the aforesaid substrate are provided. 200405426 [Summary of the Invention] In order to solve the foregoing problem, the first invention of the present invention provides a diffractive optical element, which includes: a first basic diffractive optical element having a linear grating pattern along a first direction; and a second basic diffractive optical element. The diffractive optical element has a linear grating pattern along a second direction different from the first direction. The first complementary diffractive optical element has a light amplitude to the light amplitude generated by the first basic diffractive optical element. A pattern of the light amplitude of the second phase difference; and a second complementary diffractive optical element having a pattern of generating the light amplitude of the second phase difference from the light amplitude generated by the second basic diffractive optical element; The first basic diffractive optical element, the second component, the first complementary diffractive optical element, and the first element are substantially closely aligned. The second invention of this case provides a diffractive optical element preparation: the basic diffractive optics 2 complements the diffracted light, and is characterized in that the first basic diffractive optical element 'features a linear light tearing pattern along the first direction; 2 A basic diffractive optical element having a linear grating pattern in a second direction different from the first direction; and a simple transmission portion is a person having substantially no deflection; 200405426 The first basic diffractive optical element, the first 2 The basic diffractive optical element is arranged approximately closely with the aforementioned simple transmission system. The third invention of the present invention provides an illumination optical device for illuminating the illuminated surface, which is characterized in that: in order to form a secondary light source having a quadrupole intensity distribution on the illumination pupil surface, the device is provided for converting incident light beams into four The diffractive optical element of the first invention of the light beam. The fourth invention of the present case is to provide an illumination optical device, comprising: a light source mechanism for supplying a light beam; and an angular beam forming mechanism for converting a light beam from the light source device into various angle components with respect to an optical axis. The light beam is incident on the first predetermined surface; the light field forming mechanism includes a diffractive optical element to form four poles on the second predetermined surface according to the aforementioned light beam having various angular components incident on the first predetermined surface. An optical integrator, based on the light beam from the aforementioned 4-pole illumination field formed on the second predetermined surface, to form a 4-pole II having a light intensity distribution substantially the same as that of the aforementioned 4-pole illumination field A secondary light source; and a light-guiding optical system for guiding a light beam from the optical integrator to the illuminated surface; the diffractive optical element includes a plurality of first basic diffractive optical elements and a plurality of second basic diffractive optical elements; Element, the first basic diffractive optical element has a linear grating in a first direction, and the second basic diffractive optical element 200405426 has a For the linear gratings in the second direction, the plurality of first basic diffractive optical elements and the plurality of second basic diffractive optical elements are arranged closely together. The fifth invention of the present invention provides an illumination optical device for illuminating the illuminated surface, which is characterized in that: in order to form a secondary light source having a bipolar intensity distribution on the illumination pupil surface, the method is provided for converting the incident light beam into two A diffractive optical element of a light beam, the diffractive optical element has a plurality of basic diffractive optical elements with a linear grating pattern along a predetermined direction, and the light amplitude generated by the basic diffractive optical element has a predetermined phase. The plurality of complementary diffractive optical elements of the pattern of the difference light amplitude are described. The plurality of basic diffractive optical elements and the aforementioned plurality of complementary diffractive optical elements are arranged approximately closely. The sixth invention of the present invention provides an illumination optical device for illuminating the irradiated surface, which is characterized in that: in order to form a secondary light source with a three-pole intensity distribution on the illumination pupil surface, it is provided to convert the incident light beam into three A diffractive optical element of a light beam describes a diffractive optical element having a plurality of basic diffractive optical elements having a linear grating pattern along a predetermined direction, and a plurality of simple transmission portions having substantially no deflection effect; the plurality of basic diffractions just described The optical elements are arranged approximately closely to the plurality of simple transmission portions. 200405426 The seventh invention of the present invention provides an illumination optical device for illuminating the illuminated surface, which is characterized in that: in order to form a secondary light source with an 8-pole intensity distribution on the illumination pupil surface, the method is provided for converting the incident light beam into 8 The above-mentioned diffractive optical element of each light beam includes: a first basic diffractive optical element having a linear grating pattern along the first direction; a second grid pattern, a second grid pattern, and a second grid optical element, It has linear light along the second direction, and the second direction is substantially orthogonal to the first direction. 3 Basic diffractive optical element, which has a straight line of light along the third direction. The third direction is the first direction. Approximately 45 degrees; and 4 basic diffractive optical elements having linear light along a fourth direction, the fourth direction is substantially 45 degrees to the first direction, and is substantially orthogonal to the third direction; The first and fourth basic diffractive optical elements are arranged approximately closely. The invention of case 8 provides an illumination optical device for illuminating the illuminated surface, which is characterized by having: a light source mechanism for supplying a light beam; a light source mechanism having a relative light: mechanism for a light beam of a light source device described below The plane of conversion; and < the light beam of various angle components' is incident on the first both 'system forming mechanism', which contains diffractive optics, and the first conventional product > The beam of light forms a complex polar field on the second surface of 200405426; the aforementioned diffractive optical element is formed by closely arraying a plurality of basic diffractive optical elements with a predetermined pattern of diffractive optical elements; just described The angle beam forming mechanism has an optical member composed of a plurality of optical elements; the diffractive optical element just described is a beam of elements that is positioned to correspond to each of the optical elements of the aforementioned optical member, and includes a total of 4 or more basic diffraction optics Element or complementary diffractive optical element. The ninth invention of this case is to provide an illumination optical device, characterized by (_, having: a light source mechanism for supplying a light beam; an angular beam forming mechanism for converting a light beam from the light source device into various angles with respect to an optical axis A component beam to be incident on the first predetermined surface;

A light field forming mechanism includes a diffractive optical element to form a plurality of polar light fields on a second predetermined surface according to the aforementioned light beams having various angular components incident on the first predetermined surface; an optical integrator, a system Forming a complex polar secondary light source having a light intensity distribution substantially the same as that of the complex polar field according to the light beams from the complex polar field formed on the second predetermined surface; and a light-guiding optical system, It is used to guide the light beam from the optical integrator to the irradiated surface. The aforementioned diffractive optical element is formed by closely arraying a plurality of basic diffractive optical elements having a substantially square shape and a predetermined pattern of diffractive optical elements. The aforementioned field forming mechanism has an optical system arranged in the optical path between the aforementioned optical integrator of the diffractive optical element disk; 设 the size of each surface light source constituting the aforementioned plurality of polar secondary light sources is required; The length of one side of the basic diffractive optical element is L, and the center wavelength of the beam is: I. When the focal length of the optical system is f, the following Piece L > 2 · 5xf X λ / 0. The tenth invention of the present case is to provide a refractive optical element, which is characterized in that it is roughly equivalent to the diffractive optical element of the first or second invention, or the diffractive optical element of the illumination optical device of the fifth or sixth invention. Same light amplitude. The eleventh invention of the present invention is to provide an illumination optical device for illuminating the illuminated surface, which is characterized in that: in order to form a secondary light source with a predetermined intensity distribution on the illumination pupil surface, and reserve it to convert the incident beam into a predetermined cross-sectional shape The diffractive optical element of the tenth invention of the light beam. The twelfth invention of the present invention provides an exposure device, which is provided with the illumination optical device of the third, ninth, or ninth invention, and an optical system, and is a photomask arranged on the illuminated surface. The pattern is projected and exposed on a photosensitive substrate. The thirteenth invention of the present case is to provide an exposure method, characterized in that the illumination optical device of the third to ninth inventions or the eleventh invention is used to illuminate the 13 200405426 bright light mask, and project the image of the pattern formed on the illuminated light mask. Exposure to a photosensitive substrate. [Embodiment] An embodiment of the present invention will be described based on the drawings. Fig. 丨 is a diagram schematically showing the configuration of an exposure device provided with the illumination optical device according to each embodiment of the present invention. In Figure i, 'Z' is set along the normal direction of the wafer 15 of the photosensitive substrate as the Z axis, and the direction parallel to the J-th drawing plane in the plane of the wafer 15 is the γ axis, and in the plane of the wafer 15 and the first The vertical direction of the drawing surface is the χ axis. (The exposure device shown in Figure 1 is used as the light source 1 for the exposure light (illumination light). It is an ArF excimer laser light source that supplies light with a wavelength of 193 ηm (a KrF excimer laser light source that supplies light with a wavelength of 248 mn)) The parallel light beam emitted from the light source i in the direction has a rectangular cross section that extends slenderly in the X direction and enters the shaping optical system 2. The shaping optical system 2 is formed by, for example, a lens having negative refractive power on the paper surface of FIG. It is composed of a lens with positive refractive power. It passes through the shaping optical system 2 and is shaped into a parallel beam with a predetermined rectangular cross-section. After being deflected by the f-fold 3 to the γ direction, it enters the diffractive optical element 4. Generally, the The diffractive optical element is formed by forming a step on the glass substrate (having a pitch of about the wavelength of the exposure light (illumination light)), and has the function of diffracting the incident light beam to a desired angle. Specifically, the diffractive optics Element 4 is a divergent beam forming element, which has the function of diffracting an incident rectangular parallel beam and forming a circular beam in the far field. 14 2004054 26 Therefore, the light diffracted by passing through the diffractive optical element 4 is not incident on the focus-free zoom lens 5 which is the first variable magnification optical system. A circular beam is formed on the ascending surface. From this circular beam Light is emitted from the non-focusing zoom lens $, and is injected into the multiple pole illumination (2 pole illumination, 4 pole illumination, 8 pole illumination) for the diffractive optical element 6. The non-focus zoom lens 5, which can be maintained as The optical conjugate relationship between the diffractive optical element 4 of the divergent beam forming element and the diffractive optical element 6 for the complex pole illumination continuously changes the magnification within a predetermined range. However, as shown in FIG. 丨, the diffractive optical element 6 , = The position of the optical conjugate with the diffractive optical element 4 is slightly biased toward the light source side. In this way, the light beam enters the diffractive optical element 6 from an oblique direction substantially symmetrical to the optical axis AX. That is, the diffractive optical element 4 An angle beam forming mechanism is formed with the non-focus zoom lens 5 to convert the light beam from the light source 丨 into a light beam having various angular components with respect to the optical axis AX, so that it enters the incident surface (the predetermined surface of the diffractive optical element 6) ). Diffraction The optical element 6 has a function of diffracting the beam when it enters a parallel beam, and forming a multipolar beam centered on the optical axis Ax in the far field. The detailed structure and function of the diffractive optical element will be described later. The light beam passing through the diffractive optical element 6 passes through the zoom lens 7 as the second variable magnification optical system to illuminate the micro lens array (or fly-eye lens) 8 as an optical integrator. The zoom lens 7 is The diffractive optical element 6 and the rear focal plane of the microlens array 8 are connected to form an optical conjugation. In another aspect, the 'zoomable lens 7' connects the diffractive optical element 6 and the incident surface of the microlens array 8 into a substantially fu The relationship between the industry transformation. Therefore, the beam passing through the diffractive optical element 6 forms a circular distribution according to the circular distribution of the diffractive optical element 4 and the focal plane behind the variable lens 7 200405426 (and then the incident surface of the microlens array 8). The light intensity distribution of the convolution of the multiple pole-like distribution of the diffractive optical element 6 itself, that is, the formation of a complex polar field with the optical axis AX as the center. As described above, the diffractive optical element 6 and the variable-focus lens 7 constitute a field formation mechanism, which is based on the light beams having various angle components that are incident on the incident surface (the first predetermined surface) of the diffractive optical element 6. A plurality of polar illumination fields centered on the optical axis AX are formed on the incident surface (the second predetermined surface) of the microlens array 8. The width of this complex polar field (1/2 of the difference between the outer diameter and the inner diameter) depends on the focal length of the non-focus zoom lens 5 (the reference magnification varies, and its overall size depends on the focal length of the zoom lens 7). The lens array 8 is an optical element composed of a plurality of tiny lenses with positive refractive power arranged vertically and horizontally. Each tiny lens constituting the microlens array 8 has a shape of a field to be formed on the mask 13 ( Furthermore, it has a rectangular cross section similar to the shape of the exposed area to be formed on the wafer 15.)

In general, the lens array is formed by, for example, etching a parallel flat glass plate to form a micro lens group. Here, each micro lens constituting the micro lens array is smaller than each lens element constituting the fly-eye lens. A microlens array is different from an eye-closing lens composed of lens elements isolated from each other in that a plurality of microlenses are not integrated with each other. However, the point where the lens elements with positive refractive power are arranged vertically and horizontally, the microlens array is the same as the fly-eye lens. In addition, in Fig. 1, for the sake of clarity of the drawing, the number of micro lenses' constituting the micro lens array is shown to be much lower than the actual number. 16 200405426 Therefore, the light beam entering the microlens array 8 is two-dimensionally divided by a plurality of microlenses, and the focal plane behind the microlens array 8 forms and illuminates the field (formed by the incident light beam entering the microlens array 8). (1) Secondary light sources having approximately the same light intensity distribution, that is, a plurality of polar secondary light sources formed by a plurality of substantial surface light sources centered on the optical axis Ax. As described above, the microlens array 8 is configured as an optical integrator for forming a light beam having a shape substantially equal to that of the complex polar field based on the light beams from the complex polar field formed on the incident surface (second predetermined surface). Multiple polar secondary light sources with the same light intensity distribution. The light beam from the multiple polar secondary light source formed by the focal plane on the rear side of the micro lens array 8 is limited by the aperture stop (with a multiple polar light transmitting portion) as needed, and is condensed by the condenser optical system 9 After the light is applied, the light is superimposed on a mask shade serving as a diaphragm of the illumination field. The light beam that has passed through the rectangular opening portion (light transmitting portion) of the mask M is subjected to the condensing action of the imaging optical system (11a, lib), and is then superimposed and illuminated on the mask 13. Here, the imaging optical system (11a, lib) connects the photomask blind 10 and the photomask 13 into a substantially optical conjugate, and the photomask 13 passes through the imaging optical system ⑴a, | 11 b) to form a photomask. Image of the rectangular opening of the shade 10. The photomask 13 is supported on a photomask stage (not shown) capable of two-dimensional movement. The light beam transmitted through the pattern of the mask 13 passes through the projection optical system ’'to form an image of a mask pattern on the wafer 15 of the photosensitive substrate. The wafer 15 'is supported on a wafer stage (not shown) that can be moved in two dimensions. In this way, while performing a two-dimensional driving control scan of the wafer 15 in a plane (χγ plane) orthogonal to the optical axis AX of the projection optical system 14, a full exposure or scan 17 200405426 exposure is performed, and 15 exposures are made on the wafer Each exposure area will repeat the pattern of the mask 13 one by one, a full exposure, which will be repeated according to the command (at this time, the light is exposed to each exposure area of the wafer in the light. The shape of the illuminated area on the In order to talk about the decay of the micro lens array 8 ... It is a rectangle close to a square 'rectangle. In addition— * "The cross-sectional shape of the small lens is also close to the shape of Jiang Yangu, the first cover and the circle are moved relative to the projection optical system, at the same time Scanning and exposure are performed on each exposed area of the wafer. At this time, the shape of the illuminated area on the mask 13 is a rectangular with short sides and long sides, for example, 1: 3, and each small lens of the microlens array 8 ft. The cross-sectional shape is similar to the rectangular shape. In each embodiment, the diffractive optical element 6 is provided with various diffractive optical elements 6 to 64 for various polar lighting (can exchange the optical path of the illumination). Instead of the diffractive optical element 4 as a divergent beam forming element, a microlens array (or fly-eye lens) composed of a plurality of regular hexagonal microlenses (such as lens elements) arranged closely and horizontally is used. At this time, in the microlens The incident surface of the array 8 forms a light intensity distribution based on the convolution of regular hexagons and multiple poles, that is, a plurality of polar field fields with the optical axis AX as the center is formed at the focal surface behind the microlens array 8 to form light. A plurality of polar secondary light sources constituted by a plurality of substantially planar light sources with the axis AX as the center. [First Embodiment] Fig. 2 is a schematic view showing the inclusion of a diffractive optical element for 4-pole illumination in the first embodiment. Figures of the basic diffractive optical element and complementary diffractive optical element 200405426. Fig. 3 is a cross-sectional view of each optical element of Fig. 2. Fig. 4 is a diagram showing a 4-pole of an i-th embodiment. FIG. 5 is a diagram showing the configuration of four types of blocks included in the diffractive optical element for illumination. FIG. 5 is a diagram schematically showing the entire configuration of the diffractive optical element for 4-pole illumination according to the first embodiment. In addition, f 6 For graphics The figure explaining the basic operation of the diffractive optical element for quadrupole illumination according to the first embodiment.

And referring to Figure 2, we can see, oh! The diffractive optical element 61 of the embodiment, the first basic diffractive optical element of the linear grating pattern in the Haze / σ X direction, and the second basic diffractive optical element in the linear grating pattern in the Z direction. The convex and concave surfaces of the basic diffractive optical element are reversed: the i-th complementary diffractive optical element A2 obtained, and the second complement obtained by inverting the second basic diffraction and the convex and concave surfaces of the π member B1. Full diffraction optical element B2. In other words, the second basic diffractive optical element βι has a pattern obtained by rotating the pattern of the: 1 basic diffractive optical element A1 in the χζ plane in the reverse direction of the child's direction: 90 degrees. The second complementary diffractive optical element 2 ′ has a first! The pattern obtained by completing the pattern of the diffractive optical element A2 and rotating it 90 ° counterclockwise in the χζ plane in the figure. In FIG. 2, the oblique line represents a convex surface, and the non-slanted portion (blank portion) is a ._ surface, that is, each optical element A1, A2, β1, and, as in 3 = No, a two-element structure having a convex surface and a concave surface repeatedly. Type diffractive optical element =, the width w of the convex and concave surfaces (and the pitch p and convex p and concave surface p (=) are fixed in the entire system of each 70 optical components, and the length of one side of the whole is L (L :: two, is an integer) ) Square shape. Moreover, the oblique line part indicates convex, non- ',,', part (blank part) indicates the concave symbol 'in the other related figures 10 and 19 200405426. The same is true for the second and third figures. Therefore, the first 1 Complementary diffractive optical element A2, which has a pattern for generating the amplitude of light with a phase difference of 1/2 wavelength (18 °) for the first diffracted light element, and a second complement The diffractive optical element B2 has a pattern for generating a light amplitude with a phase difference of 1/2 wavelength (180 degrees) for the light amplitude generated by the second basic diffractive optical element. Further, each optical element Al, A2 , The difference between convex and concave surfaces of B1 and B2 (convex and concave

The height dimension d) of the parts is set according to the following formula (1) to optimize the diffraction efficiency, that is, the phase difference is / 2. d = A / {2 (nl — n2)} (... here, λ is the wavelength of the illumination light (exposure light), that is, the used wavelength, and nl is the wavelength of the diffractive optical element 6 (61 ~ 64) The refractive index of the glass substrate at the wavelength of use, n2 is the refractive index of the medium at the wavelength of the light used to form the ambient atmosphere of the illumination. Specifically, let us use the wavelength λ of 93nm, the refractive index of the glass substrate at 1.5, and the air of the material In the case of an inert gas, the step d is set to about 193.

Further, the distance P 'between the convex and concave surfaces of each optical element A1, A2, B1, and their respective convex angles and concave surfaces P' depends on the desired winding angle 0 to be set for the diffractive optical element 6 (61 to 64), and is set according to the following formula (2) . ^ sine / ··· (1) Prepare this book Refer to Figure 4 The diffractive optical element of the embodiment has four types of blocks C1 to C4. Also, in the 帛 i block π, the eighth basic diffraction optical elements M and the eight second basic diffraction optical elements M are alternately arranged in two directions: the X direction and the Z direction. Also, in the second block a, 20 200405426 yuan LI, the first basic diffractive optical element A1, and eight second complementary diffractive optical systems ^ are alternately arranged in two directions: the X direction and the z direction. In addition, in the third block C3, 8th! The complementary diffractive optical element A2 is a second basic diffractive optical element B1, which is arranged alternately in two directions of the χ direction and the z direction. In addition, in the fourth block C4, eight U-th completions are given in advance ... The 2 and 8 second complementary diffractive optical elements B2 are alternately arranged along two directions of the χ direction and the ζ direction. In this way, each block ci to y has a square shape and is the same size as each other. It can be seen from FIG. 5 that the diffractive optical element 6 of the first embodiment is composed of a plurality of blocks G1 to C4 that are arranged vertically and closely in a row. Here, the blocks C1 to C4 are approximately the same as each other, and are diffractive The entire rectangular effective area (effective diameter) 61 a of the optical element 61 is randomly arranged. In the exposure device of FIG. 1, the diffractive optical element 6 of the first embodiment is provided at the position of the diffractive optical element 6 for multiple polar illumination. When a parallel light beam is incident on the diffractive optical element 61, a 4-point light intensity distribution as shown in Fig. 6 can be obtained on the incident surface of the microlens 8. Here, the optical axis Aχ and the X-direction Two-point light intensity distribution, which is based on the first basic diffractive optical element A1 and the first complementary diffracted light It is formed by the function of the element A2. The two-point light intensity distribution of the optical axis AX along the Z direction is formed by the action of the second spirit diffraction optical element B1 and the second complementary diffraction optical element B2. Formation 0 FIG. 7 is a diagram for explaining the principle of forming a 4-pole field on the incident surface of the microlens array in the first embodiment. Also, FIG. 8 is a diagram showing the microstructure in the first embodiment. A diagram of the four poles 21 200405426 formed by the incident surface of the lens array. In addition, FIG. 9 shows the micro-lens array used as the divergent beam forming element in the first embodiment. A diagram of a quadrupole field formed by the incident surface of the lens array. In addition, FIG. 7 shows a state where the microlens array 4 is used instead of the diffractive optical element 4 as a divergent beam forming element. FIG. 7 As the divergent beam forming element, since a micro lens array 4 composed of regular hexagonal micro lenses is used, a plurality of light sources are formed on the rear focal plane. In addition, light from a plurality of light sources is used in a non-focus zoom lens 5 Pupil plane formation An angular beam (a regular hexagonal light intensity distribution). When the diffractive optical element 4 is used as the divergent beam forming element, as described above, the pupil surface of the non-focus zoom lens 5 is circular (circular). Shaped light intensity distribution). The light from the hexagonal or circular light intensity distribution formed by the pupil surface of the non-focus zoom lens 5 is emitted from the non-focus zoom lens 5 and becomes a beam with various angle components. Enter the diffractive optical element 61. When a condensed light beam having various angle components enters the diffractive optical element 61, for example, light parallel to the optical axis AX, the line al passes through the diffractive optical element 61 | The axis diffraction angle is not shown). For example, if the axis is ± 1: the angle of the light, line, and center passes through the diffractive optical element ", then the angle of diffraction to the optical axis is ± ( θ ±± t) side). After that, the light rays a 1, a 2, and the mirror 7 reach the micro lens array 8 array 4 a and the light rays ai a3 pass through an incident surface with a focal length f and a variable focal length. On the other hand, the microlenses a2 and a3 pass through the different microlens elements 22 200405426. The light b1, b2, and b3 'also pass through the diffractive optical element 61 and the variable lens 7 and reach the light plane at the incident surface of the microlens array 8. ; 1, a2, a3 same area. In other words, on the incident surface of the microlens array 8, the same area is illuminated by light rays al ~ a3 and light rays b1 ~ b3 overlapping. As described above, when a parallel light beam enters the diffractive optical element Η, a 4-point light intensity distribution as shown in Fig. 6 is formed on the incident surface of the microlens array 8. However, in fact, it is not a parallel light beam that enters the diffractive optical element 61, but a light beam having a cone (a regular hexagonal cone in the microlens array 4a and a cone in the diffractive optical element 4). Beams with angular components defined by the range. As described above, on the incident surface of the microlens array 8, as shown in FIG. 8 or FIG. 9, a 4-pole shape composed of a convolution of a 4-point light intensity distribution and a circular or regular hexagonal beam is formed. Lighting distribution (photofield). As a result, a quadrupole dipole light source having a light intensity distribution approximately the same as that of the quadrupole illumination field is formed on the side focal plane (illumination pupil plane) behind the microlens array 8. Here, the quadrupole secondary light source is composed of four substantially circular or regular hexagonal surface light sources, that is, two surface light sources arranged symmetrically in the X direction by the optical axis AX and the optical axis AX. It consists of two surface light sources arranged symmetrically in the Z direction. As described above, in the first embodiment, a substantially uniform quadrupole secondary light source is formed on the illumination pupil surface by the action of the diffractive optical element. In the first embodiment, by changing the magnification of the non-focus zoom lens 5, the distance between the center and the optical axis A of each surface light source constituting the quadrupole secondary light source can be changed. The size (the radius of the inscribed circle of the 4-pole secondary light source and the half radius of the inscribed circle of the 4-pole secondary light source) is changed.

23 200405426 The surface can be enlarged or reduced similarly to the entire quadrupole secondary light source by changing both the above distance and size by changing the focal length of the zoom lens 7. Also, in the above-mentioned first embodiment, four optical elements are respectively arranged in the horizontal direction and the vertical direction in each of the blocks C1 to C4. η (G2) optical cores to constitute each block C1 ~ C4 ° as in the first embodiment, a method of 'blocking and randomly arranging 4 types of optical elements (Al, A2, Bl, B2) and Compared with the case where the optical elements (Al, A2, B1, B2) are arranged regularly, both in experiments and simulation calculations, it has been proved that it is more beneficial to reduce the uneven illumination caused by the coherent noise. << Second Embodiment >> In the first embodiment, two surface light sources arranged symmetrically with the optical axis AX in the X direction and the optical axis AX in the Z direction are formed by the action of the diffractive optical element 61. A cross-shaped quadrupole secondary light source composed of two surface light sources arranged symmetrically in the direction. In contrast, in the second embodiment,

The function of the diffractive optical element 62 forms a χ-shaped quadrupole-shaped | secondary light source composed of 4 area light sources arranged symmetrically with respect to the optical axis Ax and the phase X axis at 45 degrees. Hereinafter, the second embodiment will be described focusing on differences from the first embodiment. Fig. 10 'is a diagram schematically showing the configuration of a basic diffractive optical element and a complementary diffractive optical element included in the diffractive optical element for quadrupole illumination of the second embodiment. FIG. 1 ′ is a diagram schematically showing the configuration of four types of blocks included in the diffraction optical element for quadrupole illumination according to the second embodiment. Fig. 12 is a diagram schematically showing the overall configuration of the diffracted light for quadrupole illumination of the second embodiment. FIG. 3 is a diagram for explaining the basic operation of the diffractive optical element for quadrupole illumination according to the second embodiment. It can be seen from FIG. 10 that the diffractive optical element M of the second embodiment includes a first linear grating pattern of 45 degrees in a direction of +45 along the pair + X direction (the clockwise direction is a positive corner in the figure).丨 Basic diffractive optical element w, the second basic diffractive optical element E of the linear grating pattern that is wound along the + Z direction—45 axis in the γ axis direction! The first complementary diffractive optical element D2 obtained by inverting the convex and concave surfaces of the basic diffractive optical element di, and the 苐 2 complementary winding obtained by inverting the convex and concave surfaces of the second basic diffractive optical element E1. Emitting optical element μ. That is to say, the second basic diffractive optical element E1 has a pattern obtained by rotating the pattern of the first basic diffractive optical element D1 by 9 G degrees in the counterclockwise direction in the XZ plane. The second complementary diffractive optical element μ has a pattern obtained by rotating the pattern of the first complementary diffractive optical element D2 and the force χ ζ plane: 90 ° counterclockwise. The second embodiment is the same as the first embodiment, and has a two-element structure with a convex surface and a concave surface. Wherever the light beams to the element pattern, the width of the convex surface and the concave surface is in each optical element. It has a square shape with one side length L (L = mP: m is an integer). Referring to FIG. 11, it can be seen that the diffractive optical element 62 ″ of the first embodiment has four types of blocks F1 to F4. In the i-th block Fi, there are g first and second copies: diffractive optical elements D1 and 9 The second basic diffractive optical elements are arranged alternately in two directions at 45 degrees to the X direction. In addition, in the second area A 2, 9 first basic diffractive optical elements D1 and 9 second completions 25 200405426 Diffractive optical element E2 is alternately arranged in two directions that are 45 degrees from the χ direction. In addition, in the third block F3, nine first complementary diffractive optical elements D2 and nine second basic The diffractive optical element E1 is alternately arranged in two directions at 45 degrees to the X direction. In the fourth block f4, nine first complementary diffractive optical elements D2 and nine second complementary diffractive elements are arranged. The diffractive optical element E2 is alternately arranged in two directions at 45 degrees to the X direction. In this way, the blocks F1 to F4 'have the same size as each other. Referring to FIG. 12, it can be seen that the diffractive optics of the second embodiment The element 62% is composed of a plurality of blocks F1 to F4 arranged vertically and horizontally. The blocks C1 to C4 are approximately the same number as each other, and the rectangle of the diffractive optical element 62 The entire effective area (effective diameter) 62a is randomly arranged. At this time, in order to avoid a gap in the effective area 62a, most of the blocks C1 to C4 are arranged with a predetermined margin. In the exposure device of FIG. 1, Diffractive optics for complex pole illumination

A diffractive optical element 62 of the second embodiment is set at the position of 6 and a parallel husband is injected into the diffractive optical element 62 to obtain an X-shaped 4 as shown in FIG. 13 on the projection surface of the micro lens 8. Spot light intensity distribution. Here, the two-point light intensity distribution along the pair AX, around the + X direction + the γ axis (the clockwise direction in the figure is the positive corner direction direction 'is based on 帛 1 basic diffraction optics: D1 and 帛1 is formed by complementing the action of the diffractive optical element D2. Also, "the optical axis AX is paired with + z-direction winding + γ-axis in a 45-degree direction 2 = distribution 'is obtained by the second basic diffractive optical element E1 and the first 2 It is formed by complementing the action of the radiating optical element E2. 26 200405426 Therefore, in the second embodiment, the incident surface of the microlens array 8 is formed as shown in FIG. 14 or FIG. Light intensity distribution A 4-pole illumination distribution (..., field) formed by the convolution of a circular or regular hexagonal beam. As a result, a side focal plane (illumination pupil plane) behind the microlens array 8 is formed with 4 poles. The χ-shaped 4-pole primary light source having substantially the same light intensity distribution in the field of illumination. In this way, the second embodiment is also formed on the illumination pupil surface by the action of the diffractive optical element 62 in the same manner as the first embodiment. A quadrupole secondary light source that is uniform in quality. The second embodiment is the same as the i-th embodiment. By changing the magnification of the k-focusless zoom lens 5 by%, only the size of each surface light source is changed while the distance between the center of each surface light source and the optical axis AX constituting the quadrupole secondary light source is not changed. On the other hand, by changing the focal length of the variable-focus lens 7, both the distance and the size can be changed, so that the entire quadrupole secondary light source can be similarly enlarged or reduced. Further, the optical element arrangement method of each block π to F4, Similar to the first embodiment, various modifications can be made. "Third embodiment" 9 The first embodiment forms a cross-shaped quadrupole secondary light source by the action of the diffractive optical element 61. In the second embodiment, an X-shaped quadrupole secondary light source is formed by the action of the diffractive optical element 62. In contrast, in the third embodiment, the diffractive optical element 61 and the diffractive optical element are used in common. Action 'to form an 8-pole secondary light source. The third embodiment will be described focusing on the differences from the first embodiment and the second embodiment. 27 200405426 In the third embodiment, an 8-pole lighting coil is used. Radiation optical element 63 including: The four types of optical elements (Al, A2, Bl, B2) included in the diffractive optical element 61 for 4-pole illumination according to the embodiment, and the four types of optical elements included in the diffractive optical element 62 for 4-pole illumination according to the second embodiment. This optical element (Dl, D2, El, E2) is similar to (Dl ,, D2 ,, Γ, E2,). The diffractive optical element 63 of the third embodiment includes blocks C1 to C4 and F1, Four blocks DQ1 to DQ4 of ~ F4. Fig. 16 shows the structure of the basic diffractive optical element and the complementary diffractive optical element (Dl ,, D2,, Γ, E2,) of the third embodiment. Conceptual map: As described below, in order to combine with the blocks C1 to C4, the pattern of the square boundary and the linear diffraction grating is patterned to have a 45-degree tilt. Number! Fig. 7 is a conceptual diagram showing the composition of blocks F1 'to F4' composed of optical elements (Dl ,, D2 ,, EΓ, E2,). FIG. 18 is a conceptual diagram of the synthesized blocks DQ1 to DQ4 by combining blocks C1 to C4 and blocks F1 'to F4'. Fig. 19 'is a conceptual diagram showing the structure of a diffractive optical element 63 according to a third embodiment in which a plurality of synthesized blocks DQ1 to DQ4 are arranged closely and vertically. Here, the respective synthetic blocks DQ1 to DQ4 are approximately the same number as each other, and are randomly arranged in the entire rectangular effective area of the diffractive optical element 63. In the exposure apparatus shown in FIG. 1, a diffraction optical element 63 according to the third embodiment is provided at the position of the diffraction optical element 6 for multiple pole illumination. When a parallel light beam is incident on the diffraction optical element 63, the microlens The 8-point incident plane obtains the 8-point light intensity distribution shown in FIG. 20. Here, the two-point light intensity distribution along the X direction along the optical axis µ is formed by the action of the first basic diffraction optical element A1 and the first complementary diffraction optical element A2. In addition, the two-point light intensity distribution of 挟 200405426 2 Complementary Diffraction Optics The optical element B1 and the first system are aligned with the optical axis A × in the z direction and are formed by the action of the second basic diffraction element B2

In addition, the two-point light intensity distribution around the optical axis AX, along the pair + X direction + + axis (the clockwise direction in the figure is a positive angle of 45 degrees, is based on the i-th basic diffraction optics) Element D1 'and the i-th complementary diffractive optical element 2: function and are formed. It is also held by the light car 4 AX, along the pair + z direction around + γ axis: a 2-point light intensity distribution in the direction of 45 degrees. It is formed by the function of the 帛 2 basic diffractive optical element E1 ′ and the second complementary diffractive optical element E2. Therefore, in the third embodiment, the incident surface of the microlens array 8 is as shown in FIG. 21 or As shown in FIG. 22, an 8-pole illumination distribution (illumination field) formed by a convolution of an 8-point light intensity distribution and a circular or regular hexagonal beam is formed. As a result, a focal surface behind the microlens array 8 ( An illumination pupil surface) forms an 8-pole secondary light source having approximately the same light intensity distribution as the 8-pole illumination field. In this way, the third embodiment uses the operation of the diffractive optical element 63

It is used to form a substantially uniform 8-pole secondary light source for the illumination pupil surface. In the third embodiment, by changing the magnification of the non-focus zoom lens 5, when the distance between the center of each surface light source and the optical axis AX of the 8-pole secondary light source is unchanged, only the Size changes. On the other hand, by changing the focal length of the variable focus lens 7, both the above distance and the size can be changed, so that the entire 8-pole secondary light source can be similarly enlarged or reduced. [Fourth Embodiment] The first embodiment and the second embodiment form a quadrupole secondary light source by the action of the diffractive optical element 61 or 62. In contrast, the fourth 29th 200405426 embodiment forms a bipolar secondary light source by the action of the diffractive optical element 64. Hereinafter, the fourth embodiment will be described focusing on differences from the first embodiment and the second embodiment. Fig. 23 is a diagram schematically showing a configuration of a basic diffractive optical element and a complementary diffractive optical element included in the diffractive optical element for bipolar illumination of the fourth embodiment. Fig. 24 is a diagram schematically showing the entire configuration of a diffractive optical element for bipolar illumination according to the fourth embodiment. In addition, Fig. 25 is a diagram for explaining the random arrangement of the optical elements of the fourth embodiment.

In the first and second embodiments, if the phase of the light beam generated by the basic diffractive optical element (Al, Bl, Dl, E1) is zero phase, the diffractive optical element (A2, B2, D2) is completed. The phase of the beam produced by E2) is the 7Γ phase. In other words, the complementary diffractive optical element (A2, B2, E2) is set to the amplitude of the light it generates, and the Phase difference. In contrast to this, the fourth embodiment is set such that if the phase of the light beam generated by the basic diffractive optical element 〇1 is 0 phase, the light beams generated by the first to third complementary diffractive optical elements G2 to G4 are The phases are redundant / 2 phase, | 7Γ phase, and 3 7Γ / 2 phase, respectively. At this time, the basic diffractive optical element G1 has, for example, the same pattern as the basic diffractive optical element A1 of the first embodiment. The second complementary final optical element G3 has, for example, the same pattern as the complementary diffractive optical element A2 of the first embodiment (a figure in which the basic diffractive optical element M is inverted =). In addition, in order to simplify the explanation, the state shown in FIG. 23 is to reduce the number of notches included in the basic diffractive optical element and complete the diffractive optical element <number of strips 30 200405426. In fact, it is desirable that the outer shape of the optical element can be set to have a pair of irregularities as one pitch and include an uneven pattern of 5 pitches or more. On the other hand, the first complementary diffractive optical element G2 with a phase difference of π / 2 is obtained by shifting the pattern of the basic diffractive optical element G1 by 1/4 of the pitch P of the concave-convex pattern. The third complementary diffractive optical element G4 having a phase difference of 3 疋 / 2 is obtained by moving the basic diffractive optical element in a pattern by 3P / 4. That is, the third complementary diffractive optical element G4 has a pattern in which the first complementary diffractive optical element G2 is inverted in phase. In addition, each of the optical elements G1 to G4 has a shape other than a square (boundary), and has approximately the same size as each other. In the fourth embodiment, although the light beam intensity distributions (direction and intensity of light divergence) generated by the basic diffractive optical elements G1 and the first to third complementary diffractive optical elements G2 to G4 are the same, only the intensity is specified. The phase portions of the distributed light amplitudes are different. In this way, by randomly mixing four kinds of light beams with the same intensity distribution and different phases, the regular interference noise can be greatly reduced. Referring to FIG. 24, it can be seen that the diffractive optical element 64 I 'of the fourth embodiment is formed by vertical and horizontal directions. A plurality of basic diffraction optical elements, a first complementary diffraction optical element G2, a second complementary diffraction optical element G3, and a third complementary diffraction optical element G4, which are closely arranged, are formed. Each of the elements G1 to G4 has approximately the same number as each other, and is randomly arranged in the entire rectangular effective area (effective diameter) 64a of the diffractive optical element 64. The random arrangement of each element G1 ~ G4 is shown in Fig. 25, so that (3, 2, 1, 0) corresponds to the basic diffractive optical element gi, 1 pair 31 with the cardinal sequence 0 200405426 should be completed first The diffractive optical elements G2 and 2 correspond to the second complementary diffractive optical element G3 and 3 correspond to the third complementary diffractive optical element G4 to make a random number table. Here, as the random number sequence, those having numbers of approximately 0 to 3 are selected and used. Then, the patterns of the elements G1 to G4 are arranged according to the created random number table, and the structure of the diffractive optical element 64 shown in Fig. 24 is obtained.

In the exposure device of FIG. 1, the fourth embodiment of the diffractive optical element 64 is provided at the position of the diffractive optical element 6 for multiple-pole illumination. When a parallel light beam is incident on this diffractive optical element 64, the The incident surface of the lens 8 obtains a two-point light intensity distribution as shown in FIG. 26. Therefore, in the fourth embodiment, as shown in FIG. 27 or 28, the incident surface of the microlens array 8 is formed by a convolution of a two-point light intensity distribution and a circular or regular hexagonal beam. 2Polar illumination distribution (illumination field).

As a result, a side focus surface (illumination pupil surface) behind the microlens array 8 is a bipolar secondary light source having a light intensity distribution approximately the same as that of the bipolar field. As described above, in the fourth embodiment, a substantially uniform bipolar secondary light source is formed on the illumination pupil surface by the action of the diffractive optical element 64 '. In the fourth embodiment, by changing the magnification of the non-focus zoom lens 5, when the distance between the center of each surface light source and the optical axis AX constituting the bipolar secondary light source is not changed, only the size of each surface light source can be made. Variety. On the other hand, by changing the focal length of the variable-focus lens 7, both the above-mentioned distance and size can be changed, so that the entirety of the bipolar secondary light source can be similarly enlarged or reduced. In addition, in the fourth embodiment, the basic diffractive optical element G1 has the same pattern as the basic diffractive optical element A1 of the first embodiment, so 32 200405426 forms a symmetrical two-pole dipole in the X direction around the optical axis AX. Secondary light source. When the basic diffractive optical element G1 has the same pattern as the basic structure element B &quot; of the i-th embodiment, the optical axis can be oriented in the direction of the optical axis AUZ: a pair of bipolar secondary light sources. In addition, when the present diffractive optical element ^ has the same pattern as the basic diffractive optical element M or π of the second embodiment, it is possible to hold a light beam "X, and form symmetrical two poles at a direction of 45 degrees to the X direction." In the fourth embodiment, the case where the basic diffraction optical element and the complementary diffraction optical element are randomly arranged in a total of four phases has been described, but it is not limited to this, and the phase can be further increased. Type (further increase the number of types of complementary diffractive optical elements) for more uniform illumination. In general, when a plurality of complementary diffractive optical elements with different phases are set for one basic diffractive optical element, To improve the effect of reducing interference noise, it is best to change the phase difference at approximately equal intervals.

As in the first embodiment to the third embodiment, when there is only one type of complementary diffractive optical element, it is preferable to shift the phase of the complementary diffractive optical element by 7Γ to the basic diffractive optical element. The random arrangement of the diffractive optical element and the complementary diffractive optical element can achieve the minimum effect of the base phase. In this case, '' has the advantages of fewer types of complementary diffractive optical elements and easier patterning. Also, a plurality of setting methods of the complementary diffractive optical element can be applied to the first to third embodiments described above. As described above, when a plurality of polar secondary light sources are formed on the illumination pupil surface, it is preferable that the light intensity distribution of each surface light source constituting the secondary light source is top-hat. However, in practice, a phenomenon that the light intensity gradually decreases in the periphery 33 2⑻405426 (edge) due to diffraction. (Llne /, the influence of diffraction, you need to reduce as much as possible = before ^ 70 pieces of this period-the peripheral variables caused by the secondary light, that is, for example, the diffraction element of the first embodiment ( Figure 4 shows the periodic configuration of ...

The lighting component is the diffractive element responsible for the lighting component in the Z direction = direction: That is, for example, the B1 element in the X direction is not helpful at all, and the AU element in the 2 direction is not at all helpful. In other words, for example, considering only the X direction, a pattern in which the C1 element is completely shielded from view can be used. Therefore, for example, when considering the X direction, the C1 element functions as a black-and-white diffractive element with a L-sized A1 pattern and a L-shaped light-shielding portion. A black-and-white diffractive element arranged at a period of 2L will essentially produce this. Caused by additional diffraction components. This point is also exactly the same in terms of the Z direction. Since this additional diffractive component is the main factor for the surrounding darkening, it must be suppressed below a certain value. Here, Fig. 29 is a diagram schematically showing a light intensity profile of each surface light source constituting a plurality of polar secondary light sources. In this figure, it is assumed that when there is no additional diffractive component, only the main component indicated by M becomes the final surface light source distribution, but in fact, the additional diffractive component indicated by s will cause the diffraction component to move and overlap with The principal component M becomes the main factor for the darkening of the true edge. In addition, in the figure, s is an example of the + 1st component of the additional diffraction component. In fact, a 1st component and a higher-order component are also generated. However, the help on high-order components is small, so it is sufficient to consider only high-order components here. Since the diffracted light is generated symmetrically, only the absolute value (for example, only the + 1st order component) is considered here. 34 200405426 The diffraction angle Θι of the additional diffraction component s (+1 order component) can be hypothesized. The black-and-white diffractive element based on the above-mentioned 2L pitch is estimated by the following basic formula (3a). 2Lsin6 &gt;! = Λ ··· (3a) Here, I is the wavelength of the illumination light. In addition, if the focal length of the variable focus lens 7 is set to f ', the amount of shift due to the additional diffraction component will be calculated by the following formula (3b). △ x = fsin0 1 = f λ / (2L)… (3b)

In "2" above formula (3b), fsin ^ is calculated by substituting the estimated value in formula (3a). The smaller this offset, the smaller the effect of the additional diffraction component. As long as the allowable amount of △ X is less than 1/5 (diameter) of the surface light source of the original main component M, good lighting can be achieved. This condition is defined by the following formula (3c). f λ / (2L) &lt; φ / 5 ... (3c) In each embodiment, in order to make the illuminance contrast of the multiple polar secondary light sources good, it is better that the diffractive optical element 6 (61 ~ 64) The element beam corresponding to the diffractive optical element 4 as the divergent beam forming element is positioned so as to include at least four optical elements. When using the microlens array 4a as the divergent beam forming element, it is also preferable that the diffractive optical element 6 (61 to 64) can be positioned as an element beam corresponding to each optical element (each microlens element). Contains at least 4 optical elements. The first to third embodiments described above include a plurality of blocks randomly arranged in the entire diffractive optical element, and two types of optical elements in each block are alternately arranged in the same number. In this arranging method, because part of the 35 200405426 regularity is introduced, it is possible to enhance the directivity while realizing the non-uniformity of the illuminance unevenness caused by the random phase effect that does not substantially interfere with the noise level. Averaging. However, the present invention is not limited to the above-mentioned arrangement method. In the first to third embodiments, as in the fourth embodiment, each optical element can be randomly arranged over the entire diffractive optical element. Further, the diffractive optical element may include a plurality of optical elements in which a plurality of £ blocks are randomly arranged in each block. In this case, it is preferable that the various optical elements are approximately the same as each other. In addition, the diffractive optical element has a plurality of types of blocks, and it is preferable that the random arrangement of each of the various blocks is different. Next, a partial random arrangement will be specifically described with reference to the first embodiment. Fig. 34 is a diagram schematically showing a configuration of a photomask used for manufacturing a diffractive optical element by a lithography method. Fig. 35 is a view showing a diffractive optical element made on a glass substrate using the photomask of Fig. 34. Referring to FIG. 34, it can be seen that two block patterns AAP1 and AAP2 are formed in the center of the mask, for example, in the EB drawing method. First, in the block pattern AAP1, there are 100 jth to 4th section parts, respectively. Each piece Cl, C2, C3, C4 is randomly arranged in the whole block. The random arrangement of the block diagram AAP1, for example, uses the same 'block pattern AAP2 as the same sequence of tricks as $ 25 $, and 100 random first to fourth block elements C1 LZ are also randomly arranged. , C3, C4. However, the rules of random arrangement of the area average pattern AAP2 are different. The random arrangement pattern of the block pattern AAP1 is different. That is, the block map is A AP9 2? ^ "AAP2 'is used in random with the block pattern AAP]. The sequence of the number of tunnels in different rows ~ is randomly arranged. 2004200426. There are 3 alignment marks am drawn around the mask. The alignment mark ⑽ is to reduce the block pattern AAP1 and the block pattern AAP2. Position reference when projecting to a photoresist-coated glass substrate by projection exposure method. In addition, a pair of cutting guide patterns (guide windows) (^. Cutting guide windows GP) are drawn on the cover. Marking is used to cut the diffractive optical element into a predetermined shape. Also, on the photomask, as a regular pattern for controlling the line width and etching depth, for example, forming a line and space pattern Ls. That is, The pattern ^ is a test pattern containing linear lines and space patterns with a line width of about 2 μm. The pattern ^ is printed on the outside of the effective diameter of the diffractive optical element before and after the block pattern AAP1 and AAP2 are exposed. line Wide control ㈣ Depth control. ^ The diffractive optical element shown in Figure 35 is obtained by using the light of Figure 34 to perform 4 × 区块 2 exposures of the block pattern and the staggered pattern, and then develop and etch it. The diffractive optical element made in this way is not randomly arranged in its effective diameter, but all the elements are randomly arranged. This kind of random arrangement is due to the arrangement of each other: the elements in each block are randomly arranged. 'And the interference of excimer lasers is limited, so it has a predetermined optical performance. Moreover, it is possible to manufacture a diffractive optical element with a reticle original plate (reticle) simply and cheaply. The noise achieves a high reduction effect. In addition to the block patterns AAP1 and ΑAP2, it is best to prepare ΑΑΡ3 Α 纲, and other random block patterns with different internal random arrangements. Then, all the blocks in 200405426 are divided according to Sequential exposure to diffractive optical elements is performed by development and etching, that is, as shown in Fig. 5, it is possible to directly control all elements C2, C3, and C4 randomly arranged around the core as shown in Figure 5.射 optical components.

In addition, if it is not possible to arrange all the block patterns on the mask in Fig. 34, ride the remaining block patterns on one or more other masks, and sequentially exchange the masks to place all the blocks. The pattern is also exposed on a glass substrate, and a diffractive optical element can also be manufactured. Also, "The above-mentioned method of patterning the diffractive optical element using the configuration of the partial machine illustrated in Fig. 34 and Fig. M as an example" is not limited to the first embodiment and can be applied to all embodiments of the present invention. That is, "in each embodiment", a mask of the same diffractive optical element as that shown in Fig. 34 can be manufactured, and this mask can be used to manufacture a diffractive optical element that is randomized into two parts as in Fig. 35. χ, in all embodiments of the present invention, a substrate material for patterning a diffractive optical element is used, and synthetic quartz, crystal, fluorite, etc. can be used. In addition, in each of the above embodiments and modifications, a linear raster image

The period (pitch) p of the project is set to the range of 0.1 μm to 25 μm, and the area of the effective diameter of the basic diffractive optical element and the complementary diffractive optical element is set to 7 handsome × 5 μιη to 100 μm μ ×× 〇〇〇〇 μιη, the number of basic diffractive optical elements and complementary diffractive optical elements within the effective diameter of the diffractive optical element is set to about 10 or more. The exposure device shown in FIG. 1 is a microlens array 8 using a wavefront division type optical integrator to form a complex polar secondary light source. However, an internal reflection type optical integrator may be used instead of the microlens array 8. Rod integrator. Fig. 30 is a diagram schematically showing the structure of the main parts when the rod integrator is used in the exposure device shown in Fig.} And a microlens array of 2004200426 is used. Referring to FIG. 30, it can be seen that the rod-shaped product knife 81 is arranged because the library replaces the 锨 lens array δ. The light 1 between the zoom lens 7 and the rod integrator M is input to the lens 82, and the rod integrator 81 and the condenser A relay lens 83 is arranged in the optical path between the optical optical systems 9. Here, Fig. 30_ corresponds to the emission surface of the microlens array 8 of Fig. 1, and ^ shown in Fig. 30 corresponds to the emission surface of the microlens array 8 of Fig. 1. The rod integrator 8 is a reflective glass rod made of glass material such as quartz glass or sapphire. It uses the boundary between the inside and the outside and uses the total reflection on the inside. The planes form a number of light sources corresponding to the number of reflections of the inner plane. Here, although the first sources formed are almost all virtual images, only the central (condensing point) light source is a real image. That is, the light beam incident on the rod integrator 81 is divided into the angular sound direction due to the internal reflection. The secondary light source composed of a plurality of light sources is formed along the plane parallel to the incident surface of the rod through the condensing point. Therefore, after the polarized light field is transmitted through the light beam 面 a side of the diffractive optical element 6 (61 ~ 64), the light beam passes through "⑽_ and is focused near the incident surface 81a of the rod-shaped ❹f =. Thus, from the secondary The light beams (multiple polar secondary light sources formed by the rod-shaped 81 on its projection surface) are superimposed on the emission surface 81b and then transmitted through the relay lens 83 and the condenser optical system 9 to form overlapping illumination. A reticle (photomask) 13 with a predetermined pattern. Also, the relay lens 83 and the condensing optical system 9 may be removed, and the exit surface 81b of the rod integrator 81 may be provided near the reticle 13. Or, The zoom lens 7 and the input lens 82 can also be removed, and the rod-shaped integrator 81 can be inserted into the 200404026. The emission surface 81a is set near the emission surface of the diffractive optical element 6 (61 to 64). The emission surface 81b is provided in the vicinity of the reticle 13. In the exposure apparatus shown in FIG. 1, the optical path between the light source 1 and the diffractive optical element 4 which is a divergent beam forming element may be provided with, for example, Japan. Patent Publication No. 9-205060, Patent Publication No. M-125585, Patent Publication No. 2000-277421, etc. Revealed optical delay system. The following is a brief description of the case where an optical delay system is attached to the optical path between the bending mirror 3 and the diffractive optical element 4. At this time, the transmission optical shaping system 2 and the bending mirror 3 are transformed into expectations. The light beam with a cross-sectional shape enters a light delay system composed of a total reflection mirror and a partial reflection mirror. In the light delay system, a part of the light beam transmitted through the partial reflection mirror enters the diffraction optical element 4 and is reflected by the partial reflection mirror. The other light beams are incident on the total reflection mirror. The light beams reflected by the total reflection mirror are incident on the partial reflection, and the part of the beam transmitted through the mirror is incident on the diffractive optical element 4. The other beams reflected by the partial reflection mirror are incident. In this way, the optical delay system converts the incident beam into a plurality of delayed beam groups in sequence by multiple reflections that are reflected between the total mirror and the partial mirror. As a result, With the effect of the optical delay system, the interference noise of the conjugate surface of the j wafer is reduced. For further details on the composition and effect of the optical delay system, refer to, for example, Japanese Patent Application Laid-Open No. 9-2050 Japanese Patent Application Publication No. 10-125585 and Japanese Patent Application Publication No. 2000-277421. In addition, the pattern in each of the above embodiments is not limited to this, and it is a blade or multi-element diffractive optical element. T ′ Although it is a two-element diffractive optical element, the blazed type diffractive optical element diagram can also be used. Hereinafter, referring to FIGS. 31A to 31c 200405426, the blazed type diffractive optical element pattern, multi-element diffractive optical element, and 2 The elementary diffractive optical element is generally described. Figure 31A is a cross-section of the blazed type diffractive optical element in its periodic direction: in a cut-away cross-sectional view, Figure 31B is a multi-type diffractive optical element A cross-sectional view in which a periodic cross section is cut. A hologram is a cross-sectional view in which a binary diffractive optical element is cut in a periodic cross section. It can be seen from Fig. 3U that the cut surface of the flare-type diffractive optical element is staggered * ,,,, and the pitch P that generates the zigzag order is defined by Equation (2). The depth dG of the cross section is defined by the following formula (5) if the refractive index of the substrate is n and the refractive index of the gas in which the substrate is disposed is 1. d〇 = Λ / (η-1)… ⑸ It is possible to use a basic diffractive optical element having such a blazed type diffractive optical element and a complementary diffractive optical ㈣. At this time, the pattern of the basic diffractive optical element and the complementary diffractive optical element is not a two-element pattern of convex and concave surfaces ′, but is a diagram in which the cross-sectional shape changes in the height direction. In the production of such patterns with different height directions, 'a gray scale musk with gradually decreasing transmittance can be used.' Referring to FIG. 31B, it can be seen that the cut surface of the multi-element diffractive optical element is the first The dentate shape of Figure 31A is similar to the stepped shape of L layer⑽3). In addition, the boundary of each layer can be easily specified by dividing the range of the pitch p according to the step area of each layer by L division. Figure 3ΐβ shows the case of an 8-element phase-type diffractive optical element with L = 8. The depth dL of the cross section is defined by the following formula (6) if the refractive index of the substrate is n and the refractive index of the gas in which the substrate is disposed is i. 41 200405426

dT η- 1)} (6) λ (L-1) / {It is possible to use a basic diffractive optical element and a complementary diffractive optical element with such a multi-type diffractive optical element. At this time, the pattern of the basic diffractive optical element and the complementary diffractive optical element is not a two-element type of convex surface and concave surface, but a pattern in which the cross-sectional shape is stepped and changes in the height direction. In the production of such patterns with different height directions, a gray mask with a step change in transmittance and a multi-step change can be used. Referring to FIG. 31C, it can be seen that the cut surface of the 2-element diffractive optical element is similar to the stepped shape of FIG. 31B and L = 2. That is, as shown in Fig. 31c, the cut surface of the two-dimensional diffractive optical element is a rectangular pattern shown in the thickness 廿 direction with two steps between the convex region portion and the concave region portion. The boundary of each rectangular area can be defined by ρ / 2. The M d2 of the cross section is defined by the following formula (7) if the refractive index of the substrate is η and the refractive index of the gas in which the substrate is disposed is 1. (7) 2 = λ / {2 (η- 1)} and in the above embodiments and modifications, a diffractive optical element (the basic diffractive optical element, A pattern (a pattern obtained by closely aligning a linear grating-shaped diffractive optical element pattern with a set orientation according to a predetermined orientation). However, an optical component with the same optical properties of this diffractive optical element can also be used to prepare a refractive optical element of a basic refractive element (the basic refractive element is: a 折射 -shaped refractive surface (according to a given azimuth force and the set two) (Refracting surface pattern). -Specifically, the male angle can be achieved by changing the diffraction angle of the blazed diffractive optical element to 42 for the refractive angle of the refractive element of the micro-refractive element (micro-edge). 可 蒋 + This kind of refraction elements are closely arranged at the angle of incidence. This means that the azimuth component is included. However, the refraction elements for the king are closely arranged ... Respectively "Q, Dan J's δ tongue, because during glass etching, Wood regards the wavelength phase difference as the equivalent step structure to produce the pattern = refractive optical element, which is performing the basic refractive element ^ converting the chirped pattern into a photomask for the manufacture of micro-refractive elements (gray Photomask, etc.) pattern, and expose the photomask pattern to a glass-based t-plate coated with photoresist, and then develop and etch. Next, a brief description of the typical fabrication of the diffractive optical element of each embodiment is given. First, according to the focal length of the relay lens included in the optical integrator (microlens array 8 in each embodiment) from the predetermined light source to the final stage (closest to the mask side), the beam has the diameter of the light source and the wavelength of the light source. The divergent beam forms the relationship between the divergence angles of all parts, and sets the pitch of the linear grating-shaped diffractive optical element. Then, the predetermined azimuth angle is set according to the desired illumination method, and the effective diameter of the basic diffractive optical element is set. At this time, the Set the effective diameter of the basic diffractive optics | element to the element beam (corresponding to each optical element constituting the divergent beam forming common element) contains a plurality of basic diffractive optical elements or complementary diffractive optical elements. Secondly, The diffractive optical element is set at a predetermined azimuth angle to set the pattern of the basic diffractive optical element. Further, the pattern of one or more complementary diffractive optical elements is set, and the intensity distribution and the basic diffractive optical element produced by the pattern are set. The same, and the phase is different from the basic diffractive optical element 43 200405426. And set the basic diffractive optical element to be obtained in this way The pattern of one or more types of complementary diffractive optical elements is approximately the same as the pattern of the diffractive optical elements integrated within the effective diameter. At this time, 'the arrangement position of the basic diffractive optical element and the complementary diffractive optical element is used. Randomize (random or partially random). Perform wave optical simulations on the diffractive optical elements patterned in this way, the pitch of the basic diffractive optical elements, and the phase of the diffractive optical elements and the types of the phases. Optimize, etc. Then 'A according to the pattern of the optimized diffractive optical element to make a reticle (reticle), use this reticle to transfer the pattern to a glass substrate coated with% light resistance. After that The development process, the etching process, and the process of forming the AR (reflection prevention) layer are performed. Each of the above embodiments uses a basic diffractive optical element having such a binary diffractive optical element pattern and a complementary diffractive optical element. element. In this case, a so-called black-and-white (only transmissive portion and light-shielding portion) mask can be used. In addition, as a material for patterning the 7L pieces of the optical lens, synthetic quartz, crystal, fluorite, etc. can be used. << Fifth Embodiment >> The first embodiment forms two surface light sources arranged symmetrically in the X direction by the optical axis AX and two arranged symmetrically in the direction of the optical axis AXH by the action of the diffractive optical element 61. Cross-shaped 4-pole illumination distribution (secondary light source) composed of individual surface light sources. On the other hand, in the fifth embodiment, the block elements Cld to C4d are used (a new simple transmission part is added to the block elements C1 to C4 included in the diffractive optical element 61) to form the third block. The 4 poles of the shape% are added to the 5-axis illumination distribution of the J pole on the optical axis. Ye 44 200405426 That is, the fifth embodiment is an implementation form of 5-pole illumination that also has an intensity distribution on the optical axis. Hereinafter, the fifth embodiment will be described focusing on differences from the first embodiment. Fig. 36 is a diagram showing a 5-pole field formed on the incident surface of the microlens array in the fifth embodiment. Fig. 37 is a diagram for explaining the basic operation of the diffractive optical element for 5-pole illumination according to the fifth embodiment. Fig. 38 is a diagram schematically showing the entire configuration of a diffractive optical element for 5-pole illumination according to the fifth embodiment. Fig. 39 is a diagram schematically showing the structure of a block element included in the diffractive optical element for 5-pole illumination according to the fifth embodiment. As shown in Fig. 38, the diffractive optical element 100 for 5-pole illumination of the fifth embodiment is composed of a plurality of block elements cid to C4d arranged vertically and horizontally. The block elements Cld to C4d each have a rectangular outer shape (boundary) and have approximately the same size as each other. In addition, the various types of block elements cld ~ c4d include the same number, which is valid for the rectangular shape of the diffractive optical element.

The entire area (effective diameter) 100a is randomly arranged, or randomly arranged in a block that divides the whole into several blocks. -As shown in Fig. 39, the block elements Cld ~ C4d include blocks C 丨 ~ C4, respectively, which are shaped from the middle to the middle. For example, the block element d d is a real yoke-shaped block C1 adjacent to the X direction in which a simple transmission part is arranged Η ::: Similarly, the block element C2d is in a block. The cross direction of 2 is adjacent to the element of dl cf emitter H. The block components ⑶ and C4d are respectively. The element 45 that complements the simple transmission part Hd is arranged adjacent to the X direction. 200405426 Here, the purpose of the simple transmission part Η and the completion of the simple transmission part Hd is to make the incident light transmit straight and go straight. Generally, it is not on the element. Within &quot; Bull Hd.特别 Specially fine patterning. That is, the simple transmission portion H leaves a purely flat portion of the surface of the glass substrate on which the diffractive optical element is formed by the ytterbium. In addition, the completion of the simple transmission portion Hd is a flat portion of the glass substrate on which the diffractive optical element is formed, within the effective diameter of the element Hd to a depth d shown in the formula (1).

Since the surfaces of the element Η and Hd are purely planar, the light entering the element Η and Hd, except for a few diffractions, are simply transmitted and proceed straight. The light beam that does not pass through the simple transmission part 与 and the light beam that passes through the complementary simple transmission 邠 Hd ′ corresponds to a step difference d and has an optical path difference of / 2. That is, the simple transmission part Η is a part that does not particularly guard the glass surface, and the complementary simple transmission part Hd is a relatively simple transmission part Η, which is only a simple and uniformly etched glass with a predetermined optical path difference. &amp; At the divergence angle of the 4-pole component (diffraction angle is different from the centroid of the first implementation, the corresponding divergence angle 0 can be set according to equation (2) to set the component A1 contained in the blocks C1 to C4 The pitch of Α2, β1, β2, will be ^ and

Hd is combined therein to set desired block elements Cld to C4d, thereby forming corresponding diffractive optical elements. As described above, the fifth embodiment using the diffractive optical element 100 generates a 4-pole component having a predetermined divergence angle by transmitting light passing through the blocks C1 to C4, and by transmitting through the element Η and Hd. Light is generated near the optical axis and has an i-pole component with intensity. By combining the 4-pole component and the 1-pole component, the 5-pole illumination shown in FIG. 36 can be performed. Xi 46 200405426 That is, the diffractive optical element ι0 of the fifth embodiment is used. When it is positioned and irradiated into a parallel beam, it will be formed on the incident surface of the microlens array as shown in Figure 37. It consists of a cross-shaped 4-point light intensity distribution and a 1-point light intensity distribution near the optical axis. The total is a 5-point light intensity distribution. However, 'same as the embodiment of 帛 1, in fact, it is not the 疋 flat 仃 beam that radiates the diffracted optical element. Instead, it is incident with a cone shape (in the microlens array 4a, a regular hexagonal cone shape, in the When the diffractive optical element 4 is in the shape of a cone, a light beam having an angular component specified in the light beam range is used. In this way, as shown in FIG. 36 on the incident surface of the M lens array 8, a 5-pole illumination distribution (illumination field) formed by a convolution of a 5-point light intensity distribution and a circular (or regular hexagonal) light beam is formed. . As a result, the focus surface (illumination pupil surface) on the rear side of the microlens array 8 forms a 5-pole secondary light source having a light intensity distribution approximately the same as that of the 5-pole illumination field. Here, the five-pole secondary light source is composed of five circular (or regular hexagonal) surface light sources, that is, two surface light sources symmetrically arranged in the X direction by the optical axis AX and the optical axis. ^ Two surface light sources arranged symmetrically in two directions, and one surface light source arranged near the optical axis. As described above, in the fifth embodiment, a substantially uniform 5-pole secondary light source is formed on the illumination pupil surface by the action of the diffractive optical element. Moreover, the fifth embodiment is the same as the first embodiment. By changing the magnification 'of the non-focus zoom lens 5', the distance between the center of the light source of each plane constituting the 5-pole secondary light source and the optical axis AX is not changed. , Only the size of each surface light source (the outer radius of the quadrupole secondary light source and the inner radius of the quadrupole secondary light source and the straight path of the one-pole secondary light source on the optical axis) are changed. 47 200405426 On the one hand, by changing the focal length of the variable focus lens 7, both the above distance and size can be changed, so that the entire 5-pole secondary light source can be similarly enlarged or reduced. In addition, in the fifth embodiment, it is used as a block. As a modification of the elements Cld to C4d, block elements nd to C4d as shown in FIG. 40 can also be used. Each block Cld is formed by cutting the block C1 and the simple transmission part H approximately in half in a straight line parallel to the x-axis, as shown in Fig. 40. The block element C2d is the same as the block element Cld. The block element C3d is formed by cutting the block C3 and the complementary simple transmission portion Hd approximately in half into a straight line parallel to the x-axis $, and is interspersed with each other as shown in FIG. 40. The use of diffractive optical elements containing block elements Cld ~ C4d (with the above configuration) can improve the lighting balance of 4-pole lighting and 1-pole lighting components near the optical axis. Similarly, the internal patterns of the block elements Cld ~ C4d are further subdivided, the subdivided elements corresponding to the C1 ~ C4 element patterns corresponding to the 4-pole component, and the H, Hd corresponding to the 1-pole component near the optical axis. After the area is subdivided, the subdivided elements are arranged in different or randomly arranged new block components. Using this block component can further enhance the 4-pole illumination H and the 1-pole illumination component near the optical axis. Lighting balance. In the fifth embodiment, it is preferable that the blocks C1 and C2 can be set to have the same area as the simple transmission portion ，, and the blocks C3 and C4 can be set to have the same area as the complementary simple transmission portion Hd. << Sixth Embodiment >> The second embodiment is formed by the action of the diffractive optical element 62 to form 48 200405426 planes with the optical axis AX in the relative + X direction and + γ axis + 45 degrees. The light source is an X-shaped quadrupole illumination distribution (secondary light source) composed of two surface light sources that are oriented along the optical axis AX and around 45 degrees in the + z direction relative to the + axis. In contrast, the sixth embodiment is formed in the second embodiment by using block elements Fid to F4d (a new simple transmission part is added to the block elements F1 to F4 included in the diffractive optical element 62). The fourth pole of the embodiment has a five-pole illumination distribution in which one pole is added to the optical axis. Hereinafter, the sixth embodiment will be described focusing on differences from the second embodiment. Fig. 41 is a diagram showing a 5-pole field formed on the incident surface of the microlens array in the sixth embodiment. Fig. 42 is a diagram for explaining the basic function of the diffractive optical element for 5-pole illumination in the sixth embodiment. Fig. 43 is a diagram schematically showing the overall configuration of a diffractive optical element for 5-pole illumination according to the sixth embodiment. Fig. 44 is a diagram schematically showing a configuration of a block element included in a diffractive optical element for 5-pole illumination according to a sixth embodiment.

As shown in Fig. 43, the diffractive optical element 101 'for 5-pole illumination according to the sixth embodiment is composed of a plurality of block elements Fld to F4d arranged vertically and horizontally. The block elements Fid to F4d have the outer shapes (junctions) shown in Fig. 43 or 44, respectively, and have approximately the same size as each other. In addition, the various types of the block elements Fid to F4d include almost the same number, and are randomly arranged in the entire rectangular effective area (effective diameter) 1 〇1 a of the diffractive optical element 1 01, or the whole is divided into several areas Blocks are randomly allocated in blocks. As shown in FIG. 44, the block elements Fid to F4d include blocks F1 to F4 described in the second embodiment. For example, the block element F1 d is 49 200405426 yuan, in which the simple transmission portion η is adjacently arranged in the X direction of the block f 1 of the second embodiment. Similarly, the block element F2d is an element in which the early pure transmission part Η is arranged adjacent to the sense direction of the block ⑺. The block elements ㈣, _ are elements arranged in the X direction of the block F3 '相邻 to complete the simple transmission part. Here 'in the sixth embodiment, the simple transmission portion H and the complementary simple transmission portion H

Hd is compared with the simple transmission part h and the complementary simple transmission part of the fifth embodiment. Although the shape of the boundary line is different, the setting of the money-cut depth d and the effect of the elements are the same. In addition, when the divergence angle (diffraction angle) θ of the 4-pole component is different from the second embodiment, the component D1 included in the block η% to F4 can be set according to Equation 之 with respect to the corresponding divergence angle θ. The pitch of E1 and E2 is a combination of the elements η and Hd to set a desired block element Fid ~, and it is shaped as a diffractive optical element. As described above, the "sixth embodiment using the diffractive optical element 101" is to generate a 4-pole component having a predetermined divergence angle by transmitting light passing through the blocks F1 to F4, and transmitting the Η and Hd Light generates a 1-pole component with an intensity near the optical axis. The composition of the polar components enables 5-pole illumination as shown in Figure 41. f: That is, when the diffractive optical element m of the sixth embodiment is positioned at the illumination light red and enters the flat beam, it will be formed on the incident surface of the microlens array 8 as shown in Figure 42. A total of five-point light intensity distributions composed of the point-shaped light intensity distribution and the one-point light intensity distribution near the optical axis. However, in the same way as the second embodiment, in fact, what is incident into the diffractive optical element 101 is not a chirped chirped beam, but is incident in a cone shape (a hexagonal pyramid shape in the microlens array 4a, in When diffracting the optical element 4, it is a light beam with an angular component specified by the beam range of the circle 50 (200405426 cone). In this way, as shown in FIG. 41, the incident surface of the microlens array 8 is formed with a bright distribution (illumination field) composed of a convolution of a 5-point intensity distribution and a circular (or regular hexagonal) light beam. '... As a result', the focal surface (illumination pupil surface) on the rear side of the microlens array 8 forms a 5-pole secondary light source having substantially the same light intensity distribution as the 5-pole illumination field. Here, the 5-pole secondary light source is composed of 5 circular (or regular hexagonal) surface light sources. Φ is defined by the direction of the optical axis Αχ, and the relative + χ direction around + Υ axis + 45 degrees. A surface light source, two surface light sources oriented along the optical axis AX, two +45 directions around the + + axis, and one surface light source arranged near the optical axis. As described above, in the sixth embodiment, a substantially uniform five-pole secondary light source is formed on the illumination pupil surface by the action of the diffractive optical element 101. The sixth embodiment is the same as the second embodiment. By changing the magnification of the non-focus zoom lens 5, the distance between the center of the light source and the optical axis AX of each surface constituting the 5-pole secondary light source is not changed. Only the size of each surface light source (the radius of the outer circle of the 4-pole secondary light source—the radius of the inner circle of the 4-pole secondary light source and the diameter of the 1-pole secondary light source on the optical axis) are changed. On the other hand, by changing the focal length of the variable-focus lens 7, both the above-mentioned distance and size can be changed, so that the entire five-pole-shaped secondary light source can be similarly enlarged or reduced. In addition, in the sixth embodiment, as the block element Fid ~ For the modification of F4d, the element patterns corresponding to the four-pole components F1 to F4 contained in Fid to F4d in Fig. 44 can be subdivided into 51 200405426 divided by D1, D2, El, and E2. Or the subdivided elements corresponding to the Η and Hd regions corresponding to the 1-pole component near the optical axis are divided into different elements, and the elements are respectively arranged into new block elements arranged differently from each other as shown in FIG. 45 to improve 4 The lighting balance between the polar lighting and the lighting component near the optical axis. Similarly, the internal patterns of the block elements Fid ~ F4d are further subdivided, and the subdivided elements corresponding to the F1 ~ F 4 element patterns corresponding to the 4-pole component and the H corresponding to the 1-pole component near the optical axis are subdivided. The subdivided elements after subdividing the Hd region are new block elements obtained by differently arranging or randomly disposing each other. Using this block element can further enhance the 4-pole lighting and the 1-pole lighting component near the optical axis. Lighting balance. Further, in the sixth embodiment, it is preferable that the blocks Fl, F2 and the simple transmission part η can be set to have the same area ', and the blocks F3, F4 and the complementary simple transmission part jjd can be set to have the same area. [Seventh Embodiment] The fourth embodiment forms a bipolar illumination distribution (secondary light source) symmetrically arranged in the X direction by the optical axis AX by the action of the diffractive optical element 64. In contrast, the seventh embodiment is formed in the second embodiment according to the second embodiment by using the elements gH to G4d (adding a new simple transmission portion to the elements G1 to G4 included in the diffractive optical element 64). A 3-pole illumination distribution with one pole added to the optical axis outside the pole. Hereinafter, the seventh embodiment will be described focusing on differences from the fourth embodiment. &quot; Fig. 46 is a diagram showing a three-pole field formed on the incident surface of the microlens array in the seventh embodiment. Fig. 47 is a diagram for explaining the basic operation of the diffractive optical element for 3-pole illumination according to the seventh embodiment. W 52 200405426 Fig. 'Is a diagram schematically showing the overall configuration of a diffractive optical element for 3-pole illumination according to a seventh embodiment. Fig. 49 is a diagram schematically showing the configuration of a block element included in the diffraction optical element for 3-pole illumination according to the seventh embodiment. As shown in Fig. 48, for the 3-pole illumination according to the seventh embodiment The diffractive optical element 102 is composed of a plurality of elements Gld to G4d arranged vertically and closely. The elements Gld to G4d each have a rectangular outer shape (boundary) and have approximately the same size as each other. In addition, the various types of the elements Gld to G4d include approximately the same number, and are randomly arranged in the entire rectangular effective area (effective diameter |) 102a of the diffractive optical element 102, or randomly in a block that divides the whole into several blocks. Configuration. As shown in Fig. 49, the elements Gld to G4d include the elements G1 to G4 described in the fourth embodiment, respectively. For example, the element Gld is an element in which the simple transmission portion H is disposed adjacent to each other in the X direction of the element G1 of the fourth embodiment. The same element G2d is an element in which the simple transmission portion 配置 is arranged adjacent to the X direction of the element G2. The elements G3d and G4d are respectively located on the element G3, and the x-squares are: adjacently arranged elements that complete the ribs of the simple transmission part. Here, the simple transmission portion H and the complementary simple transmission portion Hd in the seventh embodiment f have the same configuration and function as those of the simple transmission portion H and the complementary simple transmission portion M in the fifth embodiment. &amp; In addition, the divergence angle (diffraction angle) θ of the 2-pole component is different from that in the fourth embodiment. Each divergence angle corresponding to 0 can be set according to Equation (2). Hd is combined therein to set desired elements Gld to G4d, and corresponding diffraction optical elements are formed.

53 200405426 &amp; As explained above, the seventh embodiment of the use of the diffractive optical element 102 is used to generate light with a predetermined divergence angle and wound by transmitting light passing through the elements G1 to G4, and transmitting through the element H and Hd. The light produces a 1-pole component with an intensity near the optical axis, and thus waits for the 2-pole component to appear! The polar component is used to illuminate the 3-pole illumination along the X direction as shown in Figure 46. That is, when the diffractive optical element 102 of the seventh embodiment is positioned on the illumination light beam and enters a parallel beam, it will be formed on the incident surface of the microlens array 8 as shown in FIG. 47 to form a beam axis A total of five-point light intensity distributions composed of the two-point light intensity distribution in which χ is symmetrically arranged in the χ direction and the one-point light intensity distribution near the optical axis. However, it is the same as the fourth embodiment. 'Actually, it is not a parallel beam that enters the diffractive optical element 102. Instead, it has a cone shape (a regular hexagonal cone shape in the microlens array 4a, a diffraction When the optical element 4 is in the shape of a cone, it is a light beam with an angular component specified by the beam range. In this way, as shown in FIG. 46, the incident surface of the microlens array 8 is formed into a three-pole illumination distribution (illuminated field) formed by a convolution of a three-point light intensity distribution and a circular (or regular hexagonal) light beam. . As a result, the rear focal surface (illumination pupil surface) of the microlens array 8 forms a tripolar secondary light source having a light intensity distribution approximately the same as that of the tripolar illumination field. Here, the tripolar secondary light source is a surface light source composed of three circular (or regular hexagonal) solid shells, that is, two surface light sources symmetrically arranged in the X direction by the optical axis AX of the person, and One surface light source near the axis AX. As described above, in the seventh embodiment, a substantially uniform tripolar secondary light source is formed on the illumination pupil surface by the action of the diffractive optical element 102. The seventh embodiment is the same as the fourth embodiment. By changing 54 200405426 to change the magnification of the non-focus zoom lens 5, the distance between the center of the light source and the optical axis AX of each surface constituting the three-pole secondary light source is not changed. In the case of the light source, only the size of each surface light source (the radius of the outer circle of the 2-pole secondary light source and the radius of the inner circle of the polar secondary light source and the diameter of the polar secondary light source on the optical axis) are changed. On the other hand, by changing the focal length of the variable-focus lens 7, both the distance and the size can be changed, so that the entire three-pole secondary light source can be similarly enlarged or reduced. In addition, the seventh embodiment is also similar to the fifth and fifth embodiments. In the same manner as the sixth embodiment, as a modification of the elements Gld to G4d, the internal patterns of the elements Gld to G4d can be subdivided, and the subdivided elements of the G1 to G4 element patterns corresponding to the two-pole components can be subdivided into Corresponding to the subdivided elements of the 极 and Hd regions of the 1-pole component near the optical axis, new elements obtained by differently arranging or randomly arranging each other, using this element to enhance 2-pole illumination and 1-pole illumination near the optical axis Lighting balance of ingredients. In the seventh embodiment, it is preferable that the elements G1, G2 and the simple transmission portion Η can be set to have the same area, and the elements G3, G4 and the complementary simple transmission portion Hd can be set to have the same area. [Eighth Embodiment] Fig. 50 is a diagram showing a 9-pole field formed on the incident surface of the microlens array in the 8th embodiment. Fig. 51 is a diagram for explaining the basic operation of the diffractive optical element for 9-pole illumination according to the eighth embodiment. As described above, the third embodiment forms an 8-pole illumination distribution by combining the effects of the diffractive optical element 61 of the first embodiment and the functions of the diffractive optical element 62 of the second embodiment (2 Secondary light). Similarly, 55 200405426 in the eighth embodiment, the combination of the function of the diffractive optical element 100 in the fifth embodiment and the function of the diffractive optical element 100 in the sixth embodiment can be used to form FIG. 51. The 9-pole illumination distribution formed by the convolution of a 9-point light intensity distribution and a circular (or regular hexagonal) beam is shown, that is, the 9-pole illumination distribution shown in FIG. 50 is formed. In addition, although the diffractive optical element including a linear grating pattern is used in each of the above embodiments and modifications, as an optical member having the same optical performance as this diffractive optical element, it can also be produced using a diffractive optical element. Refractive optical element with approximately the same light amplitude. In addition, in each of the above-mentioned embodiments and modification examples of the diffractive optical element, although a two-element diffractive optical element pattern is used, it is not limited to this. Similar to the first to fourth embodiments, a sparkle may be used. Type diffractive optical element pattern or multi-type diffractive optical element pattern. In addition, the technical contents described in the i-th to the fourth embodiments and their modifications are also applicable to the fifth to the eighth embodiments and their modifications.

The exposure settings in each of the above embodiments can be manufactured by using illumination light = month, reticle X illumination process), and using a projection optical axis to form a cover to the photosensitive substrate (exposure process) to manufacture Micro 7L pieces (semiconductor element, photo. ¾ og. ^ ~ Element, night and day display element 4 膑 head 4). In the following, referring to the diagram of the circle, the explanation will be made on the day when the exposure apparatus of each of the above embodiments formed the U.S.A. and U.S. circuit pattern on the light-sensitive clay plate as an example.卩 之 + Conductor element when it is 56 200405426 Film. In step 30 of FIG. 32, the metal is vapor-deposited on a batch of wafers. Step 302 of eight people is coated on the metal film on the batch of wafers. After that, in step 30 ", the exposure of each of the above embodiments is used, and the image of the pattern is first masked by the projection system, and the exposures are sequentially exposed. Irradiate the area. After the development of the photoresist on one batch of wafers in step ', the photoresist pattern is engraved on the batch of crystal solids, and each exposure on each wafer is irradiated first. The circuit pattern 电路 corresponding to the pattern on the photomask is formed in the area. Then, the circuit pattern of the upper layer is further formed to manufacture components such as semiconductor elements. If the above-mentioned manufacturing method of the semiconductor S-piece is used, π can be produced with good efficiency. A semiconductor element having an extremely fine circuit pattern is obtained. In addition, the exposure apparatus of each of the above embodiments can also be obtained as a micro-element by forming a predetermined pattern (circuit pattern, electrode pattern, etc.) on a plate (glass substrate). A liquid crystal display element. Hereinafter, an example of this method will be described with reference to the flowchart in FIG. 33. In FIG. 33, the pattern forming step 401 is performed by using the exposure device of each of the above embodiments to mask the photomask. The pattern is transferred to a photosensitive substrate (such as a glass substrate coated with a photoresist), which is a so-called photolithography process. By this photolithography process, a predetermined pattern including a plurality of electrodes is formed on the photosensitive substrate. After that, the exposed substrate is subjected to various processes such as development, etching, and photoresist peeling to form a predetermined pattern on the substrate, and then moves to the next color filter forming step 402. Next, in the color filter forming step 402 Among them, the groups corresponding to the three points of R (Red), G (Green), and B (Blue) are mostly arranged in a matrix, or a plurality of three strip filter groups of R, G, and B are arranged in a horizontal direction. 200405426 Color filter. Then, after the color filter forming step 4202, a cell assembly step 403 is performed. In the cell assembly step 403, a substrate having a predetermined pattern obtained in the pattern forming step 401 is used. And the color filters obtained in the color filter formation step 402 to assemble a liquid crystal panel (liquid crystal cell). In the cell assembly step 403, for example, the pattern obtained in the pattern formation step 401 has a predetermined pattern. Liquid crystal is injected between the substrate and the color filter obtained in the color filter forming step 402 to manufacture a liquid crystal panel (liquid crystal cell). Then, in the module assembly step 404, the assembled liquid crystal t is installed. The panel (liquid crystal cell) performs various operations such as electrical circuits, backlights, etc., and the element becomes a liquid crystal display element.

In each of the above embodiments, although the light source 丨 is an ArF excimer laser light source (or a KrF excimer laser light source that supplies 248 nm light), it is not limited to this. An F2 laser light source that supplies light with a wavelength of 157 nm, or a mercury lamp that supplies light with g-line (436 nm) and i-line (365 nm) can be used. When a mercury lamp is used, the light source 1 'has a structure including a mercury lamp, an elliptical mirror, and a collimating lens. In the above embodiment, the present invention has been described using a projection exposure apparatus provided with an illumination optical device as an example. However, it is obvious that the present invention is also applicable to general illumination optics for illuminating an illuminated surface other than a photomask Device. As described above, the diffractive optical element of the present invention can be used in, for example, an illumination optical device 'to form a substantially uniform plural polar shape (4-pole shape, 8-pole shape, 2-pole shape) on the illumination pupil surface. In addition, the illumination light 58 200405426 of the present invention can be used to form a substantially uniform plural polar shape on the pupil surface of the illumination .... The plural is extremely clear. In addition, 'women have the exposure device of the illumination optical device of the present invention and the exposure method using the illumination optical device of the present invention, and it is possible to use various kinds of extremely bright illumination optical devices that can perform good simultaneous suppression of phase loss in light. Under the optimal lighting conditions of the photomask, the photomask pattern is faithfully transferred to the photosensitive substrate. Further, in the present invention, an exposure device and an exposure method of the present invention that can faithfully transfer a mask pattern onto a photosensitive substrate can be used to produce a good micro-device. [Brief description of the drawings] (I) Schematic part Fig. 1 'is a diagram schematically showing the configuration of an exposure device provided with an illumination optical device according to each embodiment of the present invention.

Fig. 2 is a diagram schematically showing the configuration of a basic diffractive optical element and a complementary diffractive optical element included in the diffractive optical TL element for quadrupole illumination of the first embodiment. FIG. 3 is a cross-sectional view of each optical element in FIG. 2. Fig. 4 is a diagram schematically showing a configuration of four types of blocks included in the diffraction optical element for quadrupole illumination of the first embodiment. Fig. 5 is a diagram schematically showing the entire configuration of 70 diffractive optics for quadrupole illumination of the first embodiment. Fig. 6 is a diagram for explaining the basic operation of the diffraction element for quadrupole illumination 59 200405426 of the first embodiment. Fig. 7 is a diagram for explaining the principle of forming a quadrupole field on the incident surface of the microlens array in the first embodiment. Fig. 8 is a diagram showing a quadrupole field formed on the incident surface of the microlens array in the first embodiment. Fig. 9 is a diagram showing a quadrupole field formed on the incident surface of a microlens array as an optical integrator when a microlens array is used as a divergent beam forming element in the first embodiment.

Fig. 10 is a diagram schematically showing the configuration of a basic diffractive optical element and a complementary diffractive optical element included in the diffractive optical element for quadrupole illumination of the second embodiment. Fig. 11 is a diagram schematically showing the configuration of four types of blocks included in the diffractive optical element for quadrupole illumination of the second embodiment. Fig. 12 'is a diagram schematically showing the entire configuration of a diffractive optical element for quadrupole illumination according to the second embodiment.

Fig. 13 'is a diagram for explaining the basic operation of the diffractive optical element for quadrupole illumination according to the second embodiment. Fig. 14 is a diagram showing a quadrupole field formed on the incident surface of the microlens array in the second embodiment. Fig. 15 is a diagram showing a quadrupole field formed on the incident surface of a microlens array as an optical integrator when a microlens array is used as a divergent beam forming element in the second embodiment. FIG. 16 is a conceptual diagram showing the configuration of the basic diffractive optical element and the complementary diffractive optical element (D1, D2, El, E2,) in the third embodiment. 60 200405426 Fig. 17 is a conceptual diagram showing the composition of blocks F1, ~ F4, composed of optical elements (D1 ,, D2 ,, Γ, E2,). Fig. 18 'is a conceptual diagram of the synthesized blocks DQ1 to DQ4 by combining blocks C1 to C4 and blocks F1 to F4. Fig. 19 'is a conceptual diagram showing the structure of a diffractive optical element 63 according to a third embodiment in which a plurality of synthesized blocks DQ1 to DQ4 are arranged closely and vertically.

Fig. 20 'is a diagram for explaining the basic operation of the diffractive optical element for 8-pole illumination according to the third embodiment. Fig. 21 'is a diagram showing an eight-pole field formed on the incident surface of the microlens array in the third embodiment. Fig. 22 'is a diagram showing an octopole field formed on the incident surface of a microlens array as an optical integrator when a microlens array is used as a divergent beam forming element in the third embodiment.

Fig. 23 is a diagram schematically showing the configuration of a basic diffractive optical element and a complementary diffractive optical element included in the diffractive optical element for bipolar illumination of the fourth embodiment. Fig. 24 is a diagram schematically showing the entire configuration of a diffractive optical element for bipolar illumination of the fourth embodiment. Fig. 25 is a diagram for explaining the random arrangement of each optical element in the fourth embodiment. Fig. 26 is a diagram for explaining the basic operation of the diffractive optical element for bipolar illumination of the fourth embodiment. Fig. 27 is a diagram showing a bipolar field formed on the entrance surface of the microlens array 61 200405426 in the fourth embodiment. Fig. 28 'shows a bipolar field formed on the incident surface of a microlens array as an optical integrator when a microlens array is not used as a divergent beam forming element in the fourth embodiment. Fig. 29 is a diagram showing the light intensity profile of each surface light source constituting a plurality of polar secondary light sources by accident. Fig. 30 is a diagram schematically showing the configuration of the main parts when the rod integrator is used instead of the micro lens array in the exposure apparatus shown in Fig. 丨. FIG. 31A is a cross-sectional view of a flare-type diffractive optical element cut along a periodic plane. Fig. 31B is a cross-sectional view of a multi-element diffractive optical element cut in a periodic cross-section. Fig. 31C is a cross-sectional view of a binary diffractive optical element cut in a periodic cross-section. Fig. 32 is a flowchart of a method of manufacturing a semiconductor device as a micro device.

Fig. 33 'is a flowchart of a method for manufacturing a liquid crystal display device as a micro-device. Fig. 34 is a diagram schematically showing a configuration of a photomask used for manufacturing a diffractive optical element by a lithography method. Fig. 35 is a view showing a diffractive optical element made on a glass substrate using the mask of Fig. 34. Fig. 36 is a diagram showing a 5-pole field formed on the incident surface of the microlens array in the fifth embodiment. 62 200405426 Fig. 37 is a diagram for explaining the basic operation of the diffractive optical element for 5-pole illumination according to the fifth embodiment. Fig. 38 is a diagram schematically showing the entire configuration of a diffractive optical element for 5-pole illumination according to a fifth embodiment. Fig. 39 is a diagram schematically showing the configuration of a block element included in the diffractive optical element for 5-pole illumination according to the fifth embodiment. Fig. 40 is a diagram schematically showing a modification of the block element included in the diffractive optical element for 5-pole illumination according to the fifth embodiment. Fig. 41 is a diagram showing a 5-pole field formed on the entrance surface of the microlens array in the sixth embodiment. Fig. 42 is a diagram for explaining the basic operation of the diffractive optical element for 5-pole illumination according to the sixth embodiment. Fig. 43 is a diagram schematically showing the entire configuration of a diffractive optical element for 5-pole illumination according to a sixth embodiment.

Fig. 44 is a diagram schematically showing the configuration of a block element included in the diffractive optical element for 5-pole illumination according to the sixth embodiment. Fig. 45 is a diagram schematically showing a modification of the block element included in the diffractive optical element for 5-pole illumination according to the sixth embodiment. Fig. 46 is a diagram showing a three-pole field formed on the incident surface of the microlens array in the seventh embodiment. Fig. 47 'is a diagram for explaining the basic operation of the diffractive optical element for 3-pole illumination according to the seventh embodiment. Fig. 48 is a diagram schematically showing the entire configuration of a diffractive optical element for 3-pole illumination according to a seventh embodiment. 06 63 200405426 Fig. 49 is a diagram schematically showing the configuration of a block element included in the diffraction optical element for 3-pole illumination according to the seventh embodiment. Fig. 50 is a diagram showing a nine-pole field formed on the incident surface of the microlens array in the eighth embodiment. Fig. 51 is a diagram for explaining the basic operation of a diffractive optical element for 9-pole illumination according to the eighth embodiment. (II) Symbols for component 1 Light source 2 Plastic optics 3, 12 Bending mirrors 4, 6, 61, 62, 63, 100, 101, 5 Non-focus zoom 7 Zoom lens 8 Micro lens array 9 Condensing optics 10 Photomask curtain 11a, lib Imaging optics 13 Photomask 14 Projection optics 15 Wafer Al, D1 First basic winding Bl, El Second basic winding A2, D2 First complementary winding B2, E2 Second complementary winding System 102 Diffractive Optical Element Lens System All Optical Element Optical Element Optical Element Optical Element 64 200405426 al ~ a3 Light

Cld ~ C4d, Fid ~ F4d, Gld ~ G4d Block elements DQ1 ~ DQ4 Synthetic blocks G1 ~ G4 elements

Claims (1)

^ 00405426 Patent application scope: 1 · A diffractive optical element, comprising: a first basic diffractive optical element having a linear grating pattern along the first direction; a second basic diffractive optical element, which It has a linear grating pattern along a second direction different from the first direction. The first complementary diffractive optical element has a light amplitude generated by the first basic diffractive optical element. A pattern of the difference in light amplitude; and | a second complementary diffractive optical element having a pattern of generating a light amplitude with a second phase difference to the light amplitude generated by the second basic diffractive optical element; 1 basic diffractive optical element and the second basic diffractive optical element: the first complementary diffractive optical element and the second complementary diffractive optical element are arranged approximately closely. 2. A diffractive optical element, comprising: a first basic diffractive optical element having a linear light f-gate pattern along a first direction; and a second basic diffractive optical element having a shape different from that The linear grating pattern in the second direction and the second direction; and the simple transmission part, which is substantially free of deflection; :: The first basic diffraction optical element, the second basic diffraction optical element, and the simple transmission part are roughly the same Closely arranged. 3. If the diffractive optical element of the second item of the scope of the patent application is applied, it is provided in a step of 66 200405426; The first complementary diffractive optical element is a light vibration field produced by the first basic diffractive optical element. 'Has a pattern that produces a light amplitude with a phase difference of 帛 i; a second complementary diffractive optical element which has a light amplitude of the second basic diffractive optical element which has a light amplitude with a phase difference of 帛 2 The pattern and the simple transmission part are complementary, and the light amplitude generated by the simple transmission part has a pattern that generates a light amplitude with a fifth phase difference. 4 · If the scope of patent application is 帛! In the diffractive optical element, the fifth phase difference is approximately 1/2 wavelength. 5. If the scope of patent application is diffractive optical element according to any one of 4 items, wherein the first phase difference and the second phase difference are approximately 1/2 wavelength. 0 6 If the scope of patent application is 帛 1 ~ 4 Any of the terms-the diffractive optical element of the term, wherein the delta diffractive optical element includes: a plurality of the first basic diffractive optical element, a plurality of the second basic diffractive optical element, and a plurality of the first supplement The full diffractive optical element and the plurality of second complementary diffractive optical elements 0 7 · As the diffractive optical element of the sixth item of the patent application scope, wherein the plurality of first basic diffractive optical elements, the plurality of 帛2 The basic diffraction element, the plurality of complementary diffractive optical elements, and the plurality of second complementary diffractive optical elements are substantially the same as each other. 8. If the diffractive optical element according to item 6 of the scope of patent application, the 67 200405426 plurality of ^ th basic diffractive optical elements, the plurality of second basic diffractive optical elements, and the plurality of first complementary diffractive elements The diffractive optical element and the plurality of second complementary diffractive optical elements are randomly arranged in the entirety of the diffractive optical element. 9 The diffractive optical element as described in item 6 of the patent scope, wherein the diffractive optical element has A plurality of blocks, in each block, the plurality of first; the basic ㈣ optical element, the plurality of second basic diffractive optical elements, the The plurality of first complementary diffraction optical elements and the plurality of second complementary diffraction optical elements are arranged at random. 1. I. If the diffractive optical element of item 9 in the scope of patent application, in each block, the 'the complex ㈣i basic diffractive optical element, the plurality of first diffractive optical elements, and the plurality of first complementary windings The diffractive optical element and the plurality of second complementary diffractive optical elements are substantially the same as each other. II. For example, the diffractive optical element according to item 9 of the scope of patent application, wherein the diffractive optical element has a plurality of types of blocks, each of which has a different arrangement pattern for each block f. 12. If a diffractive optical element according to item 6 of the patent is requested, it includes: a plurality of first blocks that are arranged alternately in the same number as the first basic diffractive optical element and the second basic diffractive optical element; X a plurality of second blocks in which the first basic diffractive optical element and the second complementary diffractive optical element are arranged in substantially the same number alternately; / the first complementary diffractive optical element and the 帛 2 basic diffractive optical element are roughly A plurality of third blocks arranged in the same number alternately; and a plurality of fourth blocks arranged in the same number in the first complementary diffraction optical element and the second complementary diffraction optical element. 13 · The diffractive optical element according to item 12 of the patent application scope, wherein the diffractive optical element has a plurality of middle blocks, and among the middle blocks, the plurality of first blocks and the plurality of second blocks The plurality of third blocks and the plurality of fourth blocks are randomly arranged in substantially the same number. 14. The diffractive optical element according to item 13 of the patent application scope, wherein the diffractive optical element has a plurality of types of middle blocks, and the random arrangement of each of the blocks in each class is different. 15 · If the diffractive optical element according to item 12 of the patent application scope, wherein the diffractive optical element contains a plurality of first to fourth blocks of approximately the same number, and each block is randomized in the entire system of the diffractive optical element arrangement. 16. If the diffractive optical element according to any one of items 1-4 of the patent application 'wherein': ㈣1 basic diffractive optical element, the second basic diffractive optical element, the first complementary diffractive optical element, and The second complementary diffractive optical element has a substantially square outer shape. 17. If the diffractive optical element according to item 16 of the patent application scope, the first direction is substantially parallel to one side of the diffractive optical element having a substantially square outer shape, and the 帛 2 direction is substantially parallel to the substantially square external shape. The other side of the diffractive optical element is substantially parallel. 18 · According to the patent application, any one of the linear grating pattern scheme and the blaze-type diffractive optical element pattern pattern. The diffractive optical element of any one of items 1 to 4 has a two-element diffractive optical element pattern and a multi-type diffractive optical element 69 200405426 • An illumination optical system for illuminating the illuminated surface, which is characterized in that : In order to form a secondary light source with a quadrupole intensity distribution on the illumination pupil surface, it is provided with a diffractive optical element according to any of claims 1 to 18 of the patent application scope for converting an incident light beam into four light beams. 20 · The illumination optical device according to item 19 of the patent application scope, further comprising: 'a light source mechanism for supplying a light beam; an angular beam forming mechanism for converting a light beam from the light source device into various types having a relative optical axis The light beam with the angle component is incident on the first predetermined surface; and the illumination field forming mechanism includes a diffractive optical element to transmit the light beam with various angle components into the first predetermined surface according to the light beam having various angle components incident on the first predetermined surface. A quadrupole-shaped light field is formed on the surface; the angle beam forming mechanism has a plurality of light emitting optics composed of a plurality of optical elements, and the diffractive optical element is positioned in the element beam corresponding to the optical element and the element, In total, it contains more than 4 basic ordinary pieces or complementary diffractive optical elements. -An illumination optical device, comprising: a light source mechanism for supplying a light beam; an angular beam forming mechanism for converting a light beam from the light source device into a light beam having various angular components relative to an optical axis, and · A shot into the first predetermined 200405426 photofield formation mechanism, which includes diffractive optical elements to form a 4-pole-shaped beam on the second predetermined surface based on the light beams having various angular components incident on the first predetermined surface. Photofield; an optical integrator that forms a quadrupole secondary light source with approximately the same light intensity distribution as the quadrupole field according to the light beam from the quadrupole field formed on the second predetermined surface ; And the light-guiding optical system 'is used to guide the light beam from the optical integrator to the illuminated surface; the diffractive optical element includes a plurality of first basic diffractive optical elements and a plurality of second basic diffractive optical elements, The second basic diffractive optical element has a linear grating in a first direction, and the second basic diffractive optical element has a linear grating in a second direction different from the first direction The plurality of first basic diffractive optical elements and the plurality of second basic diffractive optical elements are substantially closely arranged. 22. The illumination optical device according to item 21 of the patent application scope, wherein the plurality of first basic diffraction optical elements and the plurality of second basic diffraction optical elements are arranged in approximately the same number alternately. 23 · If the illuminating optical device according to item 21 or 22 of the scope of patent application, wherein the diffractive optical element is provided with a plurality of first complementary diffractive optical elements, the 7th basic diffractive optical element The generated light amplitude has a pattern that generates a light amplitude with a first phase difference; and a plurality of second complementary diffractive optical elements, which have a generated light amplitude to the second basic diffractive optical element. 2 patterns of phase-shifted optical vibrations of 200,405,426; a plurality of first basic diffraction optical elements, the plurality of second basic diffraction optical elements, the plurality of i-th complementary diffraction optical elements, and the plurality of first 2 Complement the diffractive optical elements, which are roughly arranged closely. 24. The illumination optical device according to item 23 of the patent application, wherein the first phase difference between X and second phase is approximately 1/2 wavelength. 25. The illumination optical device according to item 23 of the scope of patent application, wherein the dm number of the first basic diffractive optical elements, the plurality of second basic diffractive optical elements, the plurality of first complementary diffractive optical elements, and The plurality of second complementary diffraction optical elements are substantially the same as each other. 26. The illumination optical device according to item 23 of the scope of patent application, wherein the plurality of first basic diffractive optical elements, the plurality of second basic diffractive optical elements, the plurality of i-th complementary diffractive optical elements, and The plurality of second complementary diffractive optical elements are randomly arranged on the entirety of the diffractive optical elements. 27. The illumination optical device according to item 23 of the patent application scope, wherein the diffractive optical element has a plurality of blocks, and in each block, the plurality of | 1 basic diffractive optical elements, the plurality of 帛 2 The basic diffractive optical element, the plurality of first complementary diffractive optical elements, and the plurality of second complementary diffractive optical elements are arranged randomly. A 28 · If the illumination optical device of the 27th scope of the patent application, in each of the blocks, the plurality of ith basic diffractive optical elements, the plurality of second diffractive optical elements: the diffractive optical element, the plurality of first! The complementary diffractive optical element and the plurality of second complementary diffractive optical elements are substantially the same as each other. The 72-year patent for the lighting optical device of 27 items, among which, the diffractive optical element 彳 来 1 # + _ ^ cattle, multiple types of blocks, the arrangement of the Ik machine of each block of each type is different. 30. The illumination optical device according to item 23 of the scope of patent application, which comprises: ^ a plurality of first blocks of the first basic diffractive optical element and the second basic diffractive optical element arranged substantially in the same order; ° The first and second basic diffractive optical elements and the second complementary diffractive optical element are arranged alternately in the same number of the second block; A the first complementary diffractive optical element and the second basic diffractive optical element A plurality of third blocks that are approximately the same number and are aligned with each other, and a plurality of fourth blocks in which the first complementary diffraction optical element and the second complementary diffraction optical element are arranged in substantially the same number alternately. 31. The illumination optical device according to claim 30 of the patent application scope, wherein the diffractive optical element is provided with a plurality of middle blocks, and among the middle blocks, the plurality of first blocks and the plurality of second blocks The plurality of third blocks and the plurality of fourth blocks are randomly arranged in substantially the same number. 32. If the illumination optical device according to item 31 of the patent application scope, wherein the 4-diffractive optical element has a plurality of types of middle blocks, the random arrangement of each of the blocks in each class is different. 33. The illumination optical device according to item 30 of the scope of patent application, wherein the diffractive optical element includes the plurality of first to fourth blocks having substantially the same number, and each block is randomly arranged in the entire system of the diffractive optical element. arrangement. 3 4 · For example, the illumination optics of item 21 or 22 of Shen Qing's patent scope, 73 200405426, where the 帛 1 basic diffractive optical element, the second basic diffractive optical element, and the first complementary diffractive optical element And the 帛 2 complementary diffractive optical element has a substantially square outer shape. 35. The illumination optical device according to item 34 of the patent application, wherein the first direction is substantially parallel to one side of the diffractive optical element having a substantially square outer shape, and the second direction is substantially parallel to the light having a substantially square outer shape. The other side of the radiation optical element is substantially parallel. 36. If the illumination optical device according to item 21 or 22 of the patent application scope, wherein the '30 -degree angle beam forming mechanism includes an optical member composed of a plurality of optical elements; the diffractive optical element is positioned to correspond to the optical member The elementary beam of each optical element includes a total of four or more basic diffractive optical elements or complementary diffractive optical elements. 37. The illumination optical device according to item 35 of the scope of patent application, wherein the $ 海 照 野 formation mechanism has an optical system arranged in the optical path between the diffractive optical element and the optical integrator; The size of each surface light source of the secondary secondary light source is required. The basic diffractive optical element with 4 approximately square shape is L on one side, the center wavelength of the beam is λ, and the focal length of the optical system is f. Conditions, L &gt; 2.5xf X in / 0. 38 ·-An illumination optical device, which is used to illuminate the irradiated surface, and has the following characteristics: z. In order to form a secondary light with a 2-pole &amp; intensity distribution on the illumination light surface 74 200405426 source, which is used to A diffractive optical element that converts a light beam into two light beams. The diffractive optical element has a plurality of basic diffractive optical elements having a linear grating pattern along a predetermined direction, and a light amplitude generated by the basic diffractive optical element. A plurality of complementary diffractive optical elements having a pattern of light amplitude with a predetermined phase difference; (2) A plurality of basic diffractive optical elements and the plurality of complementary diffractive optical elements are arranged approximately closely. 39 · An illumination optical device is used to illuminate the illuminated surface. Its characteristics are as follows: In order to form a secondary light source with a 3-pole intensity distribution on the illumination pupil surface, it is provided with a function to convert the incident beam into 3 beams. Diffractive optical element, chirped diffractive optical element, having a plurality of basic diffractive optical elements having a linear grating pattern along a predetermined direction, and a plurality of simple transmitting portions having substantially no deflection effect; a plurality of basic diffractive optical elements The | are approximately closely aligned with the plurality of simple transmission portions. 40. The illumination optical device according to item 39 of the patent application scope, further comprising: a plurality of complementary diffractive optical elements having light amplitudes' of the light generated by the basic diffractive optical element to generate light with a predetermined phase difference. A pattern of amplitude; and a simple transmission portion that complements the light amplitude 75 200405426 of the simple transmission portion with a pattern that generates a light amplitude with a fifth phase difference. 41. The illumination optical device according to claim 40, wherein the fifth phase difference is approximately 1/2 wavelength. 42. The illumination optical device according to any one of claims 38 to 41 of the scope of the patent application, wherein the predetermined phase difference is approximately 1/2 wavelength. 43. The illumination optical device ′ according to any one of claims 38 to 41 of the patent application scope, wherein ‘the plurality of basic diffractive optical elements and the plurality of complementary diffractive optical elements ′ are substantially the same as each other. 44 · If the illumination optical device according to any one of claims 38 to 41 of the application scope 'wherein' the plurality of basic diffractive optical elements and the plurality of complementary diffractive optical elements are randomized in the entire system of the diffractive optical elements arrangement. 4 5 · The illumination optical device according to any one of items 38 to 41 in the patent scope of Shenyan, wherein the diffractive optical element has a plurality of blocks, and in each block, the plurality of basic diffractive optical elements and the The plurality of complementary diffractive optical elements are arranged at substantially the same random number. 46. For example, the illumination optical device according to item 45 of the scope of patent application, in which 4L optical 7L pieces have a plurality of types of blocks, each type of each block, a plurality of basic diffractive optical elements and the plurality of supplements The random arrangement of full-diffraction optical elements is different. The female claimed that the scope of patents for any one of the 38 to 41 patents for illumination optics, including the central diffractive optical element and the complementary diffractive optical element, has a roughly square shape. η 48 · If the illumination optics of any one of items 38 to 41 of the scope of patent application is broken, the linear grating pattern has a two-element diffractive optical element 76 200405426 pattern, a blaze-type diffractive optical element pattern, and multiple elements. Any one of the patterns of the diffractive optical element pattern. 49 · An illumination optical system for illuminating the illuminated surface, characterized in that: to form a secondary light source with an 8-pole intensity distribution on the illumination pupil surface, it is provided with a winding for converting an incident light beam into 8 light beams; Linear light in the direction of the optical element The diffractive optical element includes: a first basic diffractive optical element having a pattern along a first grid; a second basic diffractive optical element having a linear grating pattern in a second direction; the second direction and the first The directions are substantially orthogonal; a third basic diffractive optical element having a linear grating pattern along a third direction, the third direction being approximately 45 degrees from the} direction; and a fourth basic diffractive optical element having a along A linear grating pattern in a fourth direction, the fourth direction being approximately 45 degrees from the first direction and being substantially orthogonal to the third direction; the first to fourth basic diffractive optical elements are approximately closely arranged. 50 · The illumination optical device according to the first item of the patent scope of the application, wherein the diffractive optical element further includes a first complementary diffractive optical element, which has an amplitude of light generated by the first basic diffractive optical element, It has a pattern that generates a light amplitude with a second phase difference; a second complementary diffractive optical element that generates a light amplitude to the second basic diffraction optical element 77 200405426 and has a light that has a second phase difference A pattern of amplitude; a third complementary diffractive optical element having a pattern for generating a light amplitude with a third phase difference to the third basic diffractive optical element; and a fourth complementary diffractive optical element Element having a pattern of light amplitude generated by the fourth basic diffractive optical element to generate a light amplitude with a fourth phase difference; the first to fourth basic diffractive optical elements and the fourth to fourth supplements Full-diffraction optics are roughly closely spaced. 51. The illumination optical device according to Claim 50 of the application, wherein the first phase difference, the second phase difference, the third phase difference, and the fourth phase difference are approximately 1/2 wavelengths. 52. The illumination optical device according to the 50th or 51st scope of the application for a patent, wherein the diffractive optical element includes a plurality of the fourth to fourth basic diffractive optical elements and a plurality of the fourth to fourth complementary windings.射 optical components. '53 · If the illumination optical device according to item 52 of the patent application scope, wherein the plurality of first to fourth basic diffractive optical elements and the plurality of first to fourth complementary diffractive optical elements are substantially the same as each other number. 54. The illumination optical device according to item 52 of the application, wherein the plurality of first to fourth basic diffraction optical elements and the plurality of first to fourth complementary diffraction optical elements are attached to the diffractive optics. The whole of the components is arranged with ^. 55 · If the illumination optical device according to item 52 of the patent application scope, 78 200405426 The diffractive optical element has a plurality of blocks, and in each block, the plurality of first to fourth basic diffractive optical elements and the complex number The H-th complementary diffractive optical elements are arranged randomly. 56 · If the patent scope of Shenjing 帛 55 workers ’lighting optics f, each of the four first to fourth basic diffractive optical elements and the plurality of first to fourth complementary diffractive optical elements in each block, They are roughly the same number. 57 For example, the illumination optical device of the 55th scope of the patent application, wherein the diffractive optical it has a plurality of types of blocks, and the random arrangement of each block of each type is different. 58 The illumination optical device according to item 52 in the scope of patent No. 4, including: a plurality of first blocks arranged in the same number as the first basic diffractive optical element and the second basic diffractive optical element; 1 a plurality of second blocks arranged substantially alternately with the basic complementary diffractive optical element and the second complementary diffractive optical element; 4 a plurality of third blocks in which the first complementary, diffractive optical element and the second basic diffractive optical element are arranged in approximately the same number alternately; A plurality of fourth blocks in which the first complementary diffractive optical element and the second complementary diffractive optical element are arranged in substantially the same number alternately; A third basic diffractive optical element and the fourth basic diffractive optical element are roughly A plurality of fifth blocks arranged alternately in the same number; a plurality of sixth blocks arranged alternately in the same number as the third basic diffraction optical element and the fourth complementary diffraction optical element; The third complementary diffraction optical element and the fourth basic diffraction optical element 79 200405426, a plurality of seventh blocks arranged in approximately the same number; and the fourth third complementary diffraction optical element and the fourth complementary diffraction optical element There are a plurality of eighth blocks of the same number of optical elements arranged in parallel. 59. The illumination optical device according to item 58 of the scope of patent application, wherein the diffractive optical element has a plurality of middle blocks, and in each of the middle blocks, the plurality of first to f-th regions i are free, which are approximately the same number. Randomly arranged. 60. For example, the illumination optical device of the 59th scope of the application for a patent, wherein the &quot; Xuan and Fanguang elements have a plurality of types of middle blocks, and the random arrangement of each of the blocks in each class is different. 61. The illumination optical device according to item 58 of the scope of patent application, wherein the diffractive optical element includes the plurality of first to eighth blocks of approximately the same number, and each block is randomized in the entire system of the diffractive optical element. arrangement. 62 · — An illumination optical device for illuminating the illuminated surface, which is provided with a light source mechanism for supplying a light beam; an angular beam forming mechanism for converting a light beam from the light source device into a light having a relative light The light beams of various angular components of the axis are incident on the first predetermined surface; and the illumination field forming mechanism includes a diffractive optical element so that the light beams of various angular components incident on the first predetermined surface are incident on the second surface. A plurality of polar fields are formed on a predetermined surface; the diffractive optical element is formed by closely arranging a plurality of basic diffractive optical elements having a predetermined diffractive optical element pattern; the angle beam forming mechanism includes a plurality of 200405426 optical component composed of optical elements; the diffractive optical element is positioned to correspond to the elementary beam of each optical 7L piece of the optical component, and contains a total of 4 or more basic diffractive optical elements or complementary diffractive optical elements . · An illumination optical device, comprising: a light source mechanism for supplying a light beam; an angular beam forming mechanism for converting a light beam from the light source device Forming a light beam having various angle components relative to the optical axis so as to be incident on the first predetermined surface; a field forming mechanism including a diffractive optical element for according to the light beam having various angle components entering the first predetermined surface, A plurality of polar fields are formed on the second predetermined surface. The optical integrator is based on the light beams from the plurality of polar fields that are formed on the second predetermined surface. Multiple polar secondary light sources with approximately the same light intensity distribution; and a light-guiding optical system toward the illuminated surface; used to guide the light beam from the optical integrator The diffractive optical element is constituted by closely arranging a plurality of basic diffractive optical elements having a substantially square shape and a pattern of existing diffractive optical elements; the light field forming mechanism is provided with the diffractive optical element; The optical system in the path length between the optical integrator and the optical integrator; Suppose that the size of each surface light source constituting the complex polar secondary light source is required, the length of the basic diffractive optical element-side | L, and the center wavelength of the light beam are 81 200405426 A. When the focal length of this optical system is f, the following condition L &gt; 2.5xfx / 0 is satisfied. 64 · —A kind of refractive optical element, which is characterized by its production and application of any of the n-diffractive optical elements in the scope of the application] ~ 18, or an illumination light wind device in any of the scope of the application of the patent in 38 ~ 48 The diffractive optical elements are approximately the same light amplitude. 65 ·-a kind of lighting optics, which is used to illuminate the illuminated surface, characterized by ... In order to form a secondary light source with an existing intensity distribution% on the pupil surface of the illumination, a refracting optical element according to the application patent No. 64 for converting an incident beam into a beam having a predetermined cross-sectional shape is provided. 66 · An exposure device, comprising: an illumination optical device according to any one of claims 19 to 63 or 65 in the scope of patent application; and an f projection optical system for arranging the light to be irradiated The pattern of the face mask is projected and exposed on the photosensitive substrate. 67 · — An exposure method, characterized in that: the photomask is illuminated through the illumination optical device of any of the patent application scopes 19 to 63 or 65, and the pattern formed on the photomask to be illuminated The image is projected and exposed on a photosensitive substrate. Picking up, 囷 style ... as next page 82