TW480585B - Illumination optical device, exposure apparatus having the device, and method of manufacturing micro-device using the exposure apparatus - Google Patents

Abstract

The present invention relates to an illumination optical device for adjusting the size of an illuminated region on an irradiated face and illumination (NA) to a desired level while a loss in light quantity is reduced adequately. An illuminated face is irradiated by an illumination optical device. The illumination optical device includes: a first variable magnification optical system 4 with a variable focal distance or magnification for adjusting the number of illumination openings on the illuminated face, and a second variable magnification optical system 7 with a variable focal distance or magnification for changing the size of the illumination region formed on the illuminated region.

Description

480585 Printed by A7 B7, Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the Invention (/), [Technical Field] The present invention relates to illumination optical devices and exposure devices having the same, and particularly to photolithography. Lighting optics for semiconductor devices, photographic devices, liquid crystal display devices, thin-film magnetic heads and other micro-devices. [Know-how] In this typical exposure device, the light beam emitted by the light source is incident on an optical integrator such as a micro fly's eye lens, and a secondary light source composed of a plurality of light source images is formed on the rear focal plane. . The light beam from the secondary light source is restricted by the opening aperture arranged near it, and then enters the condenser lens. The aperture stop restricts the shape or size of the secondary light source to the desired shape or size according to the desired lighting conditions (exposure conditions). The light beam condensed by the condenser lens forms a rectangular irradiation area on a predetermined surface interacting with the photomask. A mask baffle serving as a diaphragm of the illumination field of view is disposed near the predetermined surface. Therefore, after a light beam from a rectangular illumination area formed on a predetermined surface is restricted by the illumination field of view, it is superimposed to form a photomask with a predetermined pattern through a relay lens. In this way, on the mask, the image of the opening portion of the illumination field diaphragm is formed into a rectangular illumination area. The light passing through the mask pattern is imaged on the wafer by a projection optical system. In this way, the mask pattern is projected and exposed (transferred) on the wafer. In addition, the pattern formed on the photomask is highly dense, and in order to accurately transfer this fine pattern on a wafer, it is necessary to have a uniform illumination distribution. In recent years, by changing the size of the opening (light transmitting portion) of the opening aperture arranged on the exit side of the optical integrator, the transmission integrator is changed. 3 This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (Please read the notes on the back first to write this page)

480585 Α7 Β7 V. Description of the invention (i) (Please read the precautions on the back page first) The size of the secondary light source formed 'and change the lighting factor 0 ^^ 値 The aperture diameter of the opening / the pupil diameter of the projection optical system The technique of 'or (7 値 = number of openings on the exit side of the illumination optical system / number of openings on the entrance side of the projection optical system) has attracted much attention. In addition, by setting the shape of the opening portion of the aperture stop disposed on the exit side of the optical integrator to a belt shape or a four-hole shape (quadrupole shape), the shape of the secondary light source formed by the optical integrator is set. Restricted to a belt or quadrupole shape, technologies that increase the depth of focus and resolution of a projection optical system are valued. [Problems to be Solved by the Invention] However, the exposure device may change the size of the illumination field (exposure field) formed on a photosensitive substrate such as a wafer depending on the characteristics of the micro-device. In other words, there are cases where it is desired to change the size of the illumination area formed on the mask depending on the characteristics of the mask used. For example, when it is desired to form a lighting area smaller than the standard setting lighting area, a method of reducing the opening portion of the illumination field diaphragm mentioned above is considered. However, with this method, light loss will occur at the aperture of the bright field of vision, resulting in a reduction in the production capacity of the exposure device. On the other hand, it is printed by the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. In consideration of, for example, a method of reducing the magnification of the relay lens to reduce the illumination area formed on the photomask and the exposure area formed on the photosensitive substrate. However, with this method, as the size of the lighting field formed on the mask changes, the number of lighting openings (hereinafter referred to as lighting NA) also changes, which in turn leads to a change in σ 値 after proper design. In this way, in the exposure device, according to the characteristics of manufacturing micro-components, and the exposure collar, the paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 480585 A7 B7 printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. The size of the ($) field of the invention is the same. (7 値 is also required to be set as desired. In other words, the lighting optical device used for the exposure device is the same as the size of the lighting field according to the characteristics of the mask used. In addition, the lighting NA is also required to be set as desired. In the present invention, a micro-device includes a semiconductor device including a semiconductor integrated circuit, a high-definition flat panel display, a CCD and other photographic devices, and a personal computer hardware. Magnetic heads for disks, diffractive optical elements, etc. Also, in order to change the exposure conditions or lighting conditions, the light intensity distribution of the secondary light source formed by the optical integrator (the position of the pupil of the exposure lighting device or its vicinity) The formed light intensity distribution) is changed to a desired shape (such as any of a circle, a belt shape, or a 4-pole shape) or a size (such as a circle, a belt shape, or a 4-pole shape) ), The number of illuminated openings (NA) of the photomask as the object to be irradiated changes, which causes a problem that the photomask pattern under a desired exposure condition or lighting condition cannot be exposed on a photosensitive substrate such as a wafer. In view of this, the first object of the present invention is to provide a lighting optical device which can not only suppress the loss of light amount, but also adjust the size of the lighting field formed on the illuminated surface and the lighting NA to a desired level. The exposure device of the illumination optical device, and a method of manufacturing a micro-device using the exposure device. A second object of the present invention is to provide a desired exposure condition or lighting condition even if the exposure condition or the lighting condition is changed. Exposure device and micro-component manufacturing method for exposing a good photomask pattern to a photosensitive substrate such as a wafer. 5 (Please read the note on the back first? Matters-installation --- this page) 5J.-Line · This paper size is applicable China National Standard (CNS) A4 Specification (210 X 297 mm) 480585 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs V. Invention Description (A) [Methods to Solve the Problem In order to achieve the first object of the present invention, the first invention of the present invention provides an illumination optical device for illuminating the illuminated surface, which is characterized by a first variable magnification optical system for adjusting the number of illumination openings on the illuminated surface. 'Variable focal distance or magnification; and the second variable magnification optical system' is used to change the size of the illumination field formed on the illuminated surface, so that the focal distance or magnification is variable. According to the form of the first invention, it is preferable It is provided with an adjustment system for setting the number of the aforementioned lighting openings and the size of the aforementioned illumination field as desired, and adjusting the focal distances or the respective focal lengths of the first zoom optical system and the second zoom optical system. In addition, according to the aspect of the first invention, it is preferable to have: a light source mechanism for supplying illumination light; a multi-light source forming mechanism for forming a plurality of light beams based on the illumination light; and a beam conversion optical system for converting light from the aforementioned The light beam of the light source mechanism is converted into a light beam having a predetermined cross-sectional shape; and the first variable magnification optical system is a beam guide that passes through the light conversion optical system. To the multi-light source forming mechanism; the second variable magnification optical system guides most of the light beams from the multi-light source forming mechanism to the irradiated surface. In this case, it is preferable that the multi-light source forming mechanism has a wave surface division type. For the optical integrator, the aforementioned first variable magnification optical system converts the divergent light beam formed by the aforementioned beam conversion optical system into an almost parallel light beam, and guides it to the incident surface of the aforementioned wave surface division type optical integrator, The aforementioned adjustment system is in order to apply 6 paper sizes of the aforementioned lighting field formed on the illuminated surface to the Chinese National Standard (CNS) A4 (210 X 297 mm) (please read the precautions on the back first) Title page) ·: line · 480585 A7 V. Description of the invention (&) The size is adjusted as desired, and the focal distance of the aforementioned second variable magnification optical system is changed. The number of the aforementioned illumination openings which is changed by changing the focal distance is adjusted to a desired one, and the focal distance of the aforementioned first variable magnification optical system is changed. Alternatively, the multi-light source forming mechanism is preferably an internal reflection type optical integrator, and the first variable magnification optical system condenses a divergent light beam formed through the light beam conversion optical system on the internal reflection type. In the vicinity of the incident surface of the optical integrator, the adjustment system changes the magnification of the second variable magnification optical system in order to adjust the size of the illumination field formed on the illuminated surface to a desired level, and The number of the illumination openings changed by the change of the magnification of the second variable magnification optical system is adjusted to a desired level, and the magnification of the first variable magnification optical system is changed. According to the aspect of the first invention, it is preferable that the light source mechanism includes: a light source mechanism for supplying illumination light; and a beam conversion optical system for converting a light beam from the light source mechanism into a light beam having a predetermined cross-sectional shape; and The first variable magnification optical system guides a light beam from the light beam conversion optical system to the second variable magnification optical system. The second variable magnification optical system includes a multi-light source forming mechanism for transmitting light through the first variable magnification optical system. The light beams of the system form a plurality of light beams, and the first variable magnification optical system guides the light beams from the first variable magnification optical system to the illuminated surface. In this case, it is preferable that the aforementioned multi-light source forming mechanism includes an optical integrator group having a variable focal distance including an optical integrator of movable wavefront division type along the optical axis, and the first variable magnification optical system will transmit The divergent beam formed by the aforementioned beam-converting optical system is converted into almost parallel light. 7 This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (Please read the precautions on the back first-installation --- Page). Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 480585 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. The invention description (?) Bundle 'and guided it to the entrance surface of the aforementioned optical integrator group The adjustment system changes the focal distance of the optical integrator group only to adjust the size of the illumination area formed on the illuminated surface to a desired angle, and adjusts the distance to only the number of illumination openings. Desire, the focal distance of the aforementioned first variable magnification optical system is changed. Moreover, in this case, the aforementioned optical integrator group is preferably a first optical integrator having a positive diffraction force that can move along the optical axis and a negative diffraction force that can move along the optical axis in order. The second optical integrator and the third optical integrator with a positive diffraction force fixed along the optical axis. The aforementioned adjustment system does not need to substantially move the side focal plane behind the optical integrator group. In order to continuously change the focal distance, the aforementioned The first optical integrator and the second optical integrator move independently from each other along the optical axis. Furthermore, according to the aspect of the first invention, it is preferable that the light beam conversion optical system includes a plurality of diffractive optical elements capable of inserting and detaching the illumination light path. The plurality of diffractive optical elements are substantially parallel light beams from the light source mechanism. Divergent beams transformed into mutually different cross-sectional shapes. In addition, the second invention of the present invention provides an exposure device having the illumination optical device of the first invention and a projection optical system for projecting and exposing a pattern of a photomask arranged on the illuminated surface to On a photosensitive substrate. In this case, it is preferable that the adjustment system adjusts each focal distance or each magnification of the first variable magnification optical system and the second variable magnification optical system based on pattern information about the photomask. Furthermore, the third invention of the present invention is to provide a micro-component manufacturer. The paper size is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back first. Installation-▼ Write Title page) -i-ro,. -1 line · 480585 A7 B7 Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (7) method, which includes: the illumination optical device of the first invention, A process of illuminating a photomask disposed on an illuminated surface; and a process of transferring a pattern of the aforementioned photomask to be illuminated on a photosensitive substrate. In this case, it is preferable to include a process of adjusting each focal distance or each magnification of the first variable magnification optical system and the second variable magnification optical system according to the pattern information about the photomask. In order to solve the above-mentioned second object, a fourth invention of the present invention is to provide an exposure device including: an illumination optical device that illuminates a pattern having a predetermined pattern with a light beam for exposure; and a projection system that converts the aforementioned light The pattern image of the mask is projected and exposed on the photosensitive substrate, and is characterized by: an input mechanism for inputting information on the exposure conditions of the photosensitive substrate or the lighting conditions of the mask; and the illumination optical device includes a beam conversion mechanism. According to the input information from the aforementioned input mechanism, the aforementioned exposure light beam is converted into a beam having a desired light intensity distribution; the first variable magnification optical system adjusts the position of the photomask according to the input information from the aforementioned input mechanism. The number of illumination openings; and the second variable magnification optical system, which changes the size formed in the illumination field of the aforementioned photomask according to the input information from the aforementioned input mechanism. In this case, the illumination optical device preferably includes an optical integrator that uniformly illuminates the photomask, the first variable magnification optical system is disposed on an incident side of the optical integrator, and the second variable magnification optical system is disposed on The exit side of the aforementioned optical integrator. Further, the fifth invention of the present invention is to provide a method for manufacturing a micro-device, comprising: an illumination process, illuminating a pattern having a predetermined pattern with a light beam for exposure; and an exposure process, projecting and exposing the pattern image of the aforementioned mask 9 & Zhang scale applies Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back first

(This page)-Line · 480585 A7 B7 Printed by Consumer Cooperatives, Intellectual Property Bureau of the Ministry of Economic Affairs, 5. Description of invention (&?;) on a photosensitive substrate, characterized by the aforementioned lighting project, including: input project, input about Information on the exposure conditions of the aforementioned photosensitive substrate or the illumination conditions on the aforementioned mask; the beam conversion project, which converts the exposure beam into a beam having a desired light intensity distribution according to the input information from the aforementioned input process; the lighting field The variable project changes the size of the lighting field formed in the aforementioned mask according to the input information from the aforementioned input project; and the adjustment project adjusts the number of lighting openings in the aforementioned mask according to the input information from the aforementioned input project. In this case, it is preferable that the aforementioned adjustment process is to compensate for the number of lighting openings that varies according to the aforementioned variable engineering in the lighting field, and to keep the number of lighting openings constant. Further, the sixth invention of the present invention is to provide an exposure device comprising: an illumination optical device for illuminating a pattern having a predetermined pattern with a light beam for exposure; and a projection system for projecting and exposing the pattern image of the aforementioned mask The photosensitive substrate is characterized in that the aforementioned illumination optical device includes: a changing mechanism that changes a pupil position of the lighting optical device or a light intensity distribution in the vicinity thereof; and an adjusting mechanism corresponding to the light intensity distribution by the changing mechanism The number of illumination openings in the photomask is adjusted by the change. In this case, the aforementioned change mechanism preferably includes a beam conversion mechanism for selectively converting the aforementioned exposure light beam into one of a plurality of light beams having different light intensity distributions. In this case, it is preferable that the light beam conversion mechanism includes: a first diffraction optical element for forming a first light intensity distribution; and a second diffraction optical element that is provided on the optical path so as to be compatible with the first diffraction optical element. And forming a second light intensity distribution different from the first light intensity distribution. Furthermore, the seventh invention of the present invention is to provide a micro-device manufacturing method 10 ----------------- (Please read the precautions on the back first to write this page) · _-line -This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) 480585 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Inventory (?) Method, including: lighting engineering for exposure The beam illumination has a pattern of a mask with a predetermined pattern; and an exposure process, which exposes the pattern image of the aforementioned mask onto a photosensitive substrate, which is characterized in that the aforementioned illumination process includes a change process to change the pupil of the illumination optical device The position or the light intensity distribution in its vicinity; and the adjustment process, the number of illumination openings in the aforementioned mask is adjusted corresponding to the change of the light intensity distribution of the change process. [Implementation Mode of the Invention] The present invention includes: a first variable magnification optical system for adjusting the illumination NA on the illuminated surface; and a second variable magnification optical system for changing the illumination area formed on the illuminated surface. size. Furthermore, in a typical embodiment of the present invention, a beam conversion optical system is provided for converting a light beam from a light source mechanism into a divergent light beam having a predetermined cross-sectional shape. The first variable magnification optical system condenses and diverges the divergent light beam. It is guided to the entrance surface of the multi-light-source formation mechanism, and the second variable magnification optical system focuses the majority of the light sources formed by the multi-light source formation mechanism and guides it to the illuminated surface. Specifically, in the case of using a micro fly-eye lens or a fly-eye lens-type wavefront division type optical integrator as a multi-light source forming mechanism, the first variable magnification optical system converts a divergent light beam formed by the light beam conversion optical system into almost The parallel beam is guided to the entrance surface of the optical integrator. The second variable magnification optical system focuses the light beam of the secondary light source formed on the side focus surface behind the optical integrator and guides it to the illuminated surface. In this case, the shape of each lens element (or micro lens) constituting the micro fly-eye lens or fly-eye lens is similar to the shape of the illumination field formed on the illuminated surface, and its size depends on the focal distance of the second variable magnification optical system. set. 11 (Please read the notes on the back first

(This page). • Line · This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 480585 A7 B7 V. Description of the invention (, ...) When the focal distance of the second variable magnification optical system is changed, the size of the illumination area formed on the illuminated surface changes accordingly, and the illumination NA on the illuminated surface also changes. On the other hand, if the focal distance of the first variable magnification optical system is changed, the size of the field of illumination formed on the incident surface of the optical integrator also changes. As a result, the size of the illumination field does not change, only the illumination NA changes. In this way, by changing the focal distance of the second variable magnification optical system, the size of the illumination area formed on the illuminated surface can be changed and adjusted to a desired level. In addition, by changing the focal distance of the first variable magnification optical system, it is possible to adjust the illumination NA that changes as the focal distance of the second variable magnification optical system changes. As described above, the illumination optical device of the present invention can adjust the focal distance (or magnification) of each of the first variable magnification optical system and the second variable magnification optical system, which can not only suppress the loss of light amount, but also form the The size of the illumination area and the NA of the illuminated surface are adjusted to the desired size. Therefore, the exposure device combined with the illumination optical device of the present invention can not only suppress the amount of light loss at the aperture aperture or the aperture of the illumination field of view, but also adjust the size and σ 値 of the exposure area to the desired one. That is, the exposure device of the present invention can set the size of the lighting field (exposure field) and σ 値 to the maximum according to the characteristics required for manufacturing micro-elements or the characteristics of the mask used. Appropriate 値 can be used at high exposure Illumination and good exposure conditions for high-volume projection exposure. Furthermore, since the exposure method or the micro-device manufacturing method for exposing the pattern of the photomask on the irradiated surface on the photosensitive substrate using the illumination optical device of the present invention can perform projection exposure under good exposure conditions, so 12 This paper size applies to China National Standard (CNS) A4 specification (210 X 297 mm) -------------- Package.-(Please read the precautions on the back first to write this page) _ -Line · 480585 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of Invention ([/), which can make good micro-components. In addition, in the present invention, in order to change the exposure conditions or illumination conditions, if a changing mechanism or a beam conversion mechanism (for example, a diffractive optical element 3 for forming a circular beam and a diffractive optical element 3a for forming a belt beam) is used. And one of the three diffractive optical elements 3b for the formation of a 4-pole beam is located on the mechanism of the illumination light path, etc.), and changes in the pupil position of the illumination optical system (the position of the secondary light source formed by the optical integrator or with it The position of the optical intensity) or its vicinity, although the number of illumination openings varies, the change in the number of illumination openings can be corrected by adjusting the magnification or focal distance of the first variable magnification optical system as an adjustment mechanism . Therefore, it is possible to obtain an exposure device and a micro-device manufacturing method for exposing a good mask pattern to a photosensitive substrate such as a wafer under a desired exposure condition or lighting condition. Hereinafter, embodiments of the present invention will be described based on the drawings. Fig. 1 is a schematic diagram showing the configuration of an exposure device having an illumination optical device according to a first embodiment of the present invention. In Fig. 1, the illumination optical device is set to perform normal circular illumination. The exposure apparatus in Fig. 1 has a light source 1 for supplying exposure light (illumination light), for example, an excimer laser light source for supplying light having a wavelength of 248 nm or 193 nm. The almost parallel light beam emitted from the light source 1 along the reference optical axis AX passes through a shaping optical system (not shown) to be shaped into a light beam having a desired rectangular cross section, and then enters the light delay section 2. Fig. 2 is a perspective view illustrating the internal structure and function of the light retardation section 2 of Fig. 1. 13 P-sheet scales are applicable to China National Standard (CNS) A4 specifications (210 X 297 mm) (please read the precautions on the back first —— —— this page) ·, _; line · 480585 A7 B7 V. Description of the invention ( | >) As shown in FIG. 2, the light delay section 2 has a half mirror 200 which is disposed at an angle of 45 degrees to the optical axis AX. Therefore, the light beam that enters the half mirror 200 along the optical axis AX is divided into a light beam that passes through the half mirror 200 and a light beam that is reflected by the half mirror 200 in the -X direction. The light beam transmitted through the half-mirror 200 enters the diffraction optical system (DOE) 3 for circular illumination along the optical axis AX. On the other hand, the light beam reflected in the -X direction by the half mirror 200 is reflected in the -Y direction by the first mirror 201, reflected in the -X direction by the second mirror 202, and + by the third mirror 203. After reflecting in the Y direction and reflecting in the + X direction with the fourth mirror 201, it returns to the half mirror 200. The light beam returned to the half mirror 200 is divided into a light beam that passes through the half mirror 200 and a light beam that is reflected by the half mirror 200 in the -Z direction. The light beam reflected in the -Z direction by the half mirror 200 enters the diffractive optical system 3 along the optical axis AX. On the other hand, the light beam that has passed through the half mirror 200 passes through the first to fourth mirrors 201 to 204 and returns to the half mirror 200. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs ------------- Installation --- (Please read the precautions on the back first to write this page)-Line · As above, along the optical axis AX The light beam that has entered the light delay section 2 is divided into a light beam that has passed through the half mirror 200 as a beam splitter and a light beam that has been reflected by the half mirror 200. After the light beam reflected by the half mirror 200 forms a rectangular retarded optical path, four mirrors 201 to 204 are sequentially deflected, and then return to the half mirror 200. At this time, four mirrors 201 to 204 are arranged, so that the incident position of the light beam that enters the half mirror 200 along the optical axis AX and the re-entered position of the light beam that returns to the half mirror 200 through the rectangular retarded optical path Consistent. Therefore, the light beam P1 reflected by the semi-reflector 200 in the -Z direction after passing through the retarded optical path is transmitted through the semi-reflective mirror without passing through the retarded optical path. 14 This paper applies the Chinese National Standard (CNS) A4 specification (210 X 297). (Mm) 480585 A7 B7 V. Description of the invention (β) 200 The light beam P0 is also emitted along the optical axis AX, and the optical path length difference between the light paths of the delayed light path is equal between the light beam P1 and the light beam P0. Similarly, the light beam P2 reflected by the half mirror 200 in the -Z direction after passing through the secondary retardation optical path is emitted along the same optical axis AX as the light beam P1 and the light beam P0. At this time, an optical path length difference of twice the optical path length of the retarded optical path is given between the optical beams P0 and P2. That is, the optical delay unit 2 divides the light beam incident along the optical axis AX into a plurality of light beams in time (although in theory, there are infinitely many light beams, but if the influence of small energy beams is ignored, it is practically limited. Beam), the difference in optical path length between the two consecutive beams in time is equal to the optical path length of the delayed optical path. In general, the reflectivity of a mirror is different from that of P-polarized light and S-polarized light. S-polarized light can ensure a higher reflectance than P-polarized light. Therefore, in the optical retardation section 2, in order to avoid light loss in the retarded optical path, it is preferable that the four reflecting mirrors 201 to 204 are incident on the light beam in an S-polarized state. In the case of this embodiment, as shown in FIG. 2, the half-mirror 200 emits light in a P-polarized state, and S-polarized light can be incident on the four mirrors 201 to 204. As described above, the light beams incident along the optical axis A X by the optical delay unit 2 are divided into a plurality of light beams which are divided into a plurality of time. The two optical beams having a time length equal to the optical path length of the delayed light beams are given between two consecutive light beams in time. Here, the given optical path length difference is set to be greater than the interferable distance of the time of the light beam from the interfering light source 1. Therefore, the ripples divided by the light delay portion 2 can reduce the interference and suppress the occurrence of interference moire or small speckles on the illuminated surface. For more detailed composition and function of this type of optical delay mechanism, for example, Japan 15 -------------- install --- (Please read the precautions on the back to write this page). -Line . Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. The paper size is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm) 480585 A7 B7 V. Description of the invention (π) Lit Kaiping Π-174365 Bulletin, Special The specifications and drawings of No. 10-1, 17434, and the specifications and drawings of No. 11-21591, and the specifications and drawings of No. 11-25629 are disclosed. As described above, a rectangular almost parallel light beam that has passed through the light delay portion 2 enters the diffractive optical element 3. Generally speaking, a diffractive optical element is formed by forming a step on a glass substrate with a step distance between wavelengths of exposure light (illumination light), and has a function of diffracting an incident light beam at a desired angle. Specifically, the diffractive optical element 3 for circular illumination converts a rectangular almost parallel light beam incident along the optical axis A X into a divergent light beam having a circular cross section. In this way, the diffractive optical element 3 constitutes a light beam conversion system for converting a light beam from the light source 1 into a divergent light beam having a predetermined cross-sectional shape (in this case, a circle). Circular divergent light beam passing through the diffractive optical element 3 | Transformation of the first condensing optical system (the first variable magnification optical system) ′ Enters a multi-light source forming mechanism or an optical integrator After passing through & mirror 4

Eyes through: (Please read the notes on the back first to write this page) • Install. In this way, a circular field is formed on the entrance surface of the micro fly's eye lens 5. Also, the size of the field (i.e., its diameter or radius) formed as described below varies depending on the focal distance of the zoom lens 4 as described later. Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. The micro fly-eye lens 5 is an optical element formed by micro-lenses that are arranged vertically and densely and have a large number of rectangular positive diffraction powers. In general, the 'micro fly-eye lens' is formed by applying an etching treatment to a parallel flat glass plate to form a micro lens group. Here, each micro lens constituting the micro fly-eye lens is smaller than each lens element constituting the fly-eye lens. In addition, the micro fly-eye lens is isolated from each other. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 480585 A7 B7 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (G) The fly-eye lens formed by the mirror element is different, and most micro lenses are integrally formed without being isolated from each other. However, a lens element with a positive diffractive power is arranged at the vertical and horizontal points, and the micro fly-eye lens is the same as a fly-eye lens. In addition, Fig. 1 and Figs. 3, 6 and 7 related to it are shown to clarify the figure, and the number of micro lenses constituting the micro fly-eye lens is smaller than the number actually used. Therefore, a micro-passive meditation two-dimensional division of the light beam multiples that enters the micro fly's eye lens 5 forms a light source image on each of the focal surfaces (i.e., near the exit surface) of each micro lens. In this way, a majority of light sources (hereinafter referred to as "secondary light sources") having the same circular shape as the field formed by the incident light beam to the micro fly-eye lens 5 are formed on the side focal plane behind the micro-fly-eye lens 5. In this way, the micro-rehabilitation lens 5 is a wavefront-splitting type optical integrator, and constitutes a multi-light circle forming mechanism that forms a plurality of light sources (a plurality of light beams) based on a light beam from the light source 1. The zoom lens 4 preferably has its front focal surface aligned with the irradiation surface of the diffractive optical element 3, and its rear focal surface aligned with the entrance surface of the micro fly-eye lens 5, so that the focal distance is continuously changed. Therefore, the zoom lens 4 preferably has three lens groups that are independent and movable along the optical axis. The light beam of a circular secondary light source formed on the focal surface behind the micro fly-eye lens 5 is incident on the secondary lens. Open aperture 6 for nearby circular lighting. The aperture stop 6 has a circular opening (light transmitting portion) corresponding to a circular secondary light source formed on a focal surface on the rear side of the micro fly-eye lens 5. In addition, the diffractive optical element 3 can freely insert and detach the illumination light path, and 17 (Please read the precautions on the back first

(This page) · --- line. This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 480585 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (u) The diffractive optical element 3a for deformed illumination of the belt or the diffractive optical element 3b for deformed illumination of 4 poles is switched. The functions of the diffractive optical element 3a for deformed illumination of the belt and the diffractive optical element 3b for deformed illumination of 4 poles will be described later. As described above, the zoom lens 4 can continuously change the focal distance within a predetermined range. Furthermore, the aperture stop 6 is capable of freely inserting and detaching the illumination light path, and can be different from the aperture size of most circular lighting aperture apertures, and the aperture size of most four-pole deformation illumination aperture apertures or aperture apertures. Switch. Here, the switching of the diffractive optical element 3 for circular lighting and the diffractive optical element 3a for deformed lighting of the belt or the diffractive optical element 3 b for deformed lighting of 4 poles is performed according to the instruction of the control system 21 This is performed by the first drive system 22. The change of the focal distance of the zoom lens 4 'is performed by the second drive system 23 which operates according to a command from the control system 21. Furthermore, switching between the aperture stop 6 for circular illumination and other aperture stops is performed by a third drive system 24 that operates according to a command from the control system 21. In addition, switching between the aperture stop 6 for circular illumination and other aperture stops is performed by an appropriate method such as a turntable method or a slide method. In addition, the aperture stop is not limited to a turntable type or a sliding type, and an aperture stop that can appropriately change the size and shape of the light transmission area can be fixed in the illumination light path. Furthermore, instead of most circular aperture diaphragms, a iris diaphragm that can continuously change the circular aperture diaphragms may be provided. 18 of the secondary light source that passes through the aperture stop 6 with a circular-shaped opening portion. This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -------------- Installation --- (Please read the notes on the back first to write this page)-Line · 480585 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (π) Light is being accepted as the second condensing optical system After the focusing effect of the zoom lens 7 (the second variable magnification optical system), the superimposed illumination is performed on a predetermined surface which interacts with the optical function of the mask 10 described later. In this manner, a rectangular field having a rectangular shape similar to the shape of each of the micro lenses of the micro fly's eye lens 5 is formed on the predetermined surface. In addition, the size and illumination NA of the rectangular field of illumination formed on the predetermined surface are changed depending on the focal distance of the zoom lens 7 as described later. The zoom lens 7 preferably has its front focal surface aligned with the rear-side focal surface of the micro fly-eye lens 5, and its rear focal surface aligned with the above-mentioned predetermined surface, thereby continuously changing the focal distance. Therefore, the zoom lens 7 and the zoom lens 4 preferably have three lens groups that are independent and movable along the optical axis. In this way, the zoom lens 7 can be configured by continuously changing the focal distance within a predetermined range, and the focal distance can be changed by the fourth driving system 25 which is operated by the command of the convergence control system 21. Further, on a predetermined surface which optically interacts with the reticle 10, a reticle baffle plate 8 is provided as a diaphragm for illuminating the field of view. The light beam that has passed through the opening portion (light transmitting portion) of the mask baffle 8 is uniformly illuminated on the mask 10 formed in a predetermined pattern after receiving the condensing effect of the relay optical system 9. In this manner, the relay optical system 9 forms an image of the rectangular opening portion of the mask shutter 8 on the mask 10. The light beam that has passed through the pattern of the photomask is used to form an image of a photomask pattern on the wafer 12 of the photosensitive substrate by the projection optical system 11. The wafer 12 is held in a plane perpendicular to the optical axis AX of the projection optical system 11, and is held on a wafer stage 13 that can be moved in two degrees. In this way, by using wafer 12 as a two-dimensional drive control, the overall exposure or 19 paper sizes are applicable to China National Standard (CNS) A4 specifications (210 x 297 mm) (Please read the precautions on the back first (Installation-strict page) One U ° J.. Line · 480585 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention (β) Scanning exposure, and light exposure in each exposure area of wafer 12. The pattern of the mask 10 is sequentially exposed. In addition, the overall exposure method uses a so-called step and repeat to expose the entire mask pattern to each exposure area of the wafer. In this case, the shape of the illumination area on the mask 10 is close to a rectangular shape, and the cross-sectional shape of each micro lens of the micro fly's eye lens 5 also becomes a rectangular shape close to a square. On the other hand, the scanning exposure method is based on the so-called step and scan method. While the mask and wafer are relatively moved to the projection optical system, the mask pattern is scanned in each exposure area of the wafer. exposure. In this case, the shape of the illumination area on the mask 10 is a rectangular shape in which the ratio of the short side to the long side is, for example, 1: 3, and the cross-sectional shape of each micro lens of the micro fly eye lens 5 also becomes similar to this. Rectangular. FIG. 3 is a diagram illustrating the relationship between the focal distance of both the zoom lens 4 and the zoom lens 7, the size of a rectangular field of illumination formed on a predetermined surface that interacts with the mask 10, and the relationship between illumination NA. In FIG. 3 (a), the light 30 emitted from the intersection of the diffraction surface of the diffractive optical element 3 and the optical axis AX at a maximum exit angle θ1 passes through the zoom lens 4 set at the maximum focal distance Π1 to form the optical axis AX. Parallel and incident into the micro fly's eye lens 5. The micro fly's eye lens 5 is composed of a micro lens having a focal distance of fm. Here, the size of each micro lens along the paper surface in FIG. 3 is d. The outermost light 31 parallel to the optical axis AX is emitted from the micro fly-eye lens 5 and passes through the zoom lens 7 set at the maximum focal distance f21. 20 & Zhang scale is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) (Please read the precautions on the back I-installation --- P page) olaj · line · 480585 A7 B7 intellectual property of the Ministry of Economic Affairs Printed by the Bureau ’s Consumer Cooperative Cooperative 5. Description of the invention (/?) The injection angle of 0 to 21 reached the intersection of the predetermined surface 32 and the optical axis AX that interact with the photomask 10. In this manner, a rectangular field 33 is formed on the predetermined surface 32 similarly to the shape of the minute lens. The size of the photofield 33 along the paper surface of Fig. 3 is Φ1. Here, as shown in FIG. 3 (b), the focus distance of the zoom lens 4 is changed from the maximum focus distance Π1 to the minimum focus distance fl2, and the focus distance of the zoom lens 7 is changed from the maximum focus distance f21 to the minimum. Focus distance f22. In this case, the light 30 emitted from the intersection of the diffraction surface of the self-diffractive optical element 3 and the optical axis AX at a maximum exit angle 01 is formed parallel to the optical axis AX through the zoom lens 4 set at the maximum focal distance Π2, and射入 微 Compound eye lens 5. The micro fly-eye lens 5 emits the outermost light ray 31 parallel to the optical axis AX, passes through the zoom lens 7 set at the maximum focal distance f22, and reaches the predetermined surface 32 that interacts with the mask 10 at an incident angle 0 22 And the intersection of the optical axis AX. In this manner, a rectangular field 33 is formed on the predetermined surface 32 similarly to the shape of the minute lens. The size of the photofield 33 along the paper surface of Fig. 3 is Φ2. In FIG. 3 (a), the relationship shown by the following formula (1) and formula (2) is formed. fl 1 · sin Θ l = f21 · sin 0 2 ... (1) (Dl = (f21 / fm) d ... (2) In addition, in Fig. 3 (b), the following formula (3) and The relationship shown in formula (4): Π2 · sin6 > l = f22 · sin 6 »22 ... (3) 〇2 = (f22 / fm) d ... (4) Refer to the above formula (2) and Equation (4), it can be seen that the Teruno 33 is 21 through the zoom. This paper size applies the Chinese National Standard (CNS) A4 specification (210 x 297 mm) ~ one by one (please read the precautions on the back page first). σ, I-event-line 480585 A7 B7 V. Description of the invention (/) The projection of the tiny lens of the mirror 7 'the size of the illumination field 33 Φ is proportional to the focal distance f2 of the zoom lens 7. That is' in Fig. 3 (a The size Φ1 of the photo field 33 is the largest size 'and the size φ2 of the photo field 33 in FIG. 3 (b) is the minimum size. Also, referring to the above formulas (1) and (3), it can be known that The diffractive optical element 3 is inherent, so it depends on the ratio of the sine of the incident angle 02 to the predetermined surface 32. sin02 is the ratio of the focal distance fl of the zoom lens 4 to the focal distance f2 of the zoom lens 7, that is, it depends on At fl / f2. In other words, the illumination NA of the illumination field 33 in Fig. 3 (a) is proportional to fll / f21, and The illumination NA of the illumination field 33 in Fig. 3 (b) is proportional to fl2 / f22. Furthermore, referring to Figs. 3 (a) and 3 (b), it can be seen that the circular shape formed on the incident surface of the micro fly's eye lens 5 The size of the light field is proportional to the focal distance fl of the zoom lens 4. That is, in FIG. 3 (a), the size of the light field formed on the entrance surface of the micro fly-eye lens 5 is the largest, and in FIG. 3 (b). The size of the light field formed on the entrance surface of the micro fly's eye lens 5 is the smallest. As described above, if the focal length f2 of the zoom lens 7 is changed, the size of the light field formed on the predetermined surface 32 and the pattern formed on the mask 10 are changed. The size of the illumination area on the surface and the size of the exposure area formed on the exposure surface of the wafer 12 also change. Moreover, as the focal distance f2 of the zoom lens 7 changes, the illumination NA on the predetermined surface 32 and The illumination NA of the pattern surface also changes. In detail, if the focal distance f2 of the zoom lens 7 is increased, the illumination area on the reticle 10 becomes larger, and the illumination NA becomes larger. In this way, the zoom lens 7 constitutes It is used to change the size of the illumination area formed on the photomask 10 (and further, the wafer 12) on the illuminated surface. 2Zoom optical system. 22 This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) ---------------- (Please read the precautions on the back first (Write this page).-Line _ Printed by the Employees 'Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 480585 A7 B7 Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (Y 丨) On the other hand, if the zoom lens 4 is changed The focal distance fi has no change in the size of the illumination field formed on the pattern surface of the mask 10 'the size of the field of illumination formed on the entrance surface of the micro fly eye lens 5 changes, and the illumination NA on the mask 10 changes. In detail, if the focal distance fl of the zoom lens 4 is made smaller, the illumination area on the mask 10 is not changed, and only the illumination NA is made smaller. In this way, the zoom lens 4 constitutes a first variable magnification optical system for changing only the illumination NA on the mask 10 of the illuminated surface. Therefore, in this embodiment, by setting the focal distance of the zoom lens 7 to a predetermined value, it is possible to prevent substantial loss of light in the mask baffle 8 and to obtain illumination of a desired size on the mask 10. field. In addition, by setting the focal distance of the zoom lens 4 to a predetermined value with respect to the focal distance of the zoom lens 7 to which a predetermined angle is set, there can be no substantial light loss in the aperture stop 6 and it can be achieved in the reticle 10. Get the NA of the desired size. As described above, the diffractive optical element 3 is configured to be detachable from the illuminating optical path, and is configured to be switchable with the diffractive optical element 3a for the belt deformation lighting or the diffractive optical element 3b for the 4-pole deformation lighting. In the following, instead of the diffractive optical element 3, it is explained that the belt-shaped deformation illumination is obtained by setting the diffractive optical element 3a in the illumination light path. Fig. 4 is a diagram illustrating the function of the diffractive optical element 3a for deformed illumination of the belt. As shown in FIG. 4, the diffractive optical element 3a for the deformation of the belt is a circular beam having a circular beam cross-section that is perpendicularly incident along the optical axis AX, and is oriented in all directions with an equal angle around the optical axis AX Diffraction and conversion into a ring beam with a ring beam cross section. Therefore, if the paper size of the diffractive optical element 3a 23 applies to the Chinese National Standard (CNS) A4 (210 X 297 mm) -------------- install --- (please first (Read the notes on the back to write this page) -laj. --Line_ 480585 A7 B7 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs V. Description of the invention (> >) Injection into the circular cross section along the mounting axis AX The parallel light beam, as shown in FIG. 4, forms a divergent light beam in the shape of a wheel. In this manner, the diffractive optical element 3a constitutes a light beam conversion optical system for substantially converting a light beam from the light source 1 into a belt-shaped divergent light beam. The band-shaped divergent light beam that has passed through the diffractive optical element 3a passes through the zoom lens 4 and enters the micro fly eye lens 5. In this way, a light field in the shape of a ring is formed on the entrance surface of the micro fly's eye lens 5. As a result, a secondary light source in the shape of a circle is formed on the focal surface on the rear side of the micro fly's eye lens 5 in the same manner as the field formed on the incident surface. As described above, on the side focal surface behind the micro fly's eye lens 5, a round band-shaped secondary light source with almost no light loss is formed based on the light beam from the light source 1. In addition, in response to switching from the diffractive optical element 3 to the diffractive optical element 3a, switching from a circular aperture stop to a belt aperture stop is performed. Here, the wheel opening aperture positioned on the illumination light path is an opening aperture having a wheel-shaped opening corresponding to a wheel-shaped secondary light source. In this way, by using the diffractive optical element 3a for deformed lighting of the belt, a wheel-shaped secondary light source with almost no light loss can be formed from the light beam from the light source 1. As a result, the light beam from the secondary light source is limited. Open aperture, which can well suppress the loss of light quantity and deform the belt. Next, it will be described that, for example, instead of the diffractive optical element 3, a four-pole distortion illumination is obtained by setting the diffractive optical element 3b in the illumination light path. Fig. 5 is a diagram illustrating the operation of the diffractive optical element 3b for 4-pole anamorphic illumination. The diffractive optical element 3b for 4-pole deformed lighting, as shown in FIG. 5, has a circular beam with a circular beam cross-section perpendicularly incident along the optical axis AX, and the Chinese paper standard (CNS) is applied to the paper by 24 > A4 specifications (210 > < 297 public love 1 (please read the notes on the back first to write this page) Install a SJ '-line · 480585 Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Invention Description (A ) It is diffracted into 4 thin beams by diffracting in specific 4 directions at equal angles around the optical axis AX. Therefore, if a diffractive optical element 3b is incident on a parallel beam with a circular cross section along the mounting axis AX, As shown in Fig. 5, a four-pole divergent beam is formed. In this way, the diffractive optical element 3b constitutes a beam conversion optical system that converts the beam from the light source 1 into four divergent beams eccentric to the optical axis AX. The quadrupole divergent light beam after the optical element 3b passes through the zoom lens 4 and enters the micro fly eye lens 5. In this way, a quadrupole field is formed on the entrance surface of the micro fly eye lens 5. As a result, in the micro The rear focal plane of the fly-eye lens 5 is formed to be shaped on the incident surface A quadrupole secondary light source with the same illumination field. As described above, a quadrupole secondary light source with almost no light loss is formed from the light beam from the light source 1 on the side focus surface behind the micro fly-eye lens 5. Also, corresponding The switching from the diffractive optical element 3 to the diffractive optical element 3b 'is performed from the circular aperture to the 4-pole aperture. Here, the 4-pole aperture that is positioned on the illumination light path has a shape similar to that of the 4-pole aperture. The apertures of the four eye-shaped openings corresponding to the secondary light source. In this way, by using the diffractive optical element 3b for 4-pole deformation illumination, a 4 'polar shape with almost no light loss can be formed from the light beam' from the light source 1 As a result of the secondary light source, the opening aperture of the light beam from the secondary light source can be restricted, and the loss of light amount can be well suppressed, and 4-pole deformation lighting can be performed. Hereinafter, the size of the lighting field and the adjustment operation of the lighting NA of this embodiment will be specifically described. First of all, the key points of sequential exposure based on segmented repeat method or segmented scan method 25 This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -------- ^ ---- ----- up (Please read first Note on the back, please fill out this page again) 480585 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention (information on various photomasks, lighting conditions of various photomasks or wafers that should be sequentially exposed. Information such as exposure conditions is input to the control system 21 through an input device 20 such as a keyboard. The control system 21 controls the size of the desired illumination area (exposure area) and the most appropriate illumination NA for various photomasks or wafers. Information on the most appropriate line width (resolution) and desired focus depth is stored in the internal memory section, and control signals are appropriately supplied to the first drive system 22 to the fourth drive system 25 according to the input of the input device 20. That is, in the case of performing normal circular lighting under the desired size of the lighting field, the most suitable lighting NA, the most suitable resolution, and the desired depth of focus, the first drive system 22 is based on the instructions of the control system 21, The diffractive optical element 3 for circular illumination is positioned in the illumination light path. Secondly, on the reticle 10, in order to obtain an illumination area having a desired size, the fourth driving system 25 sets the focal distance of the zoom lens 7 according to a command from the control system 21. In addition, on the reticle 10, in order to obtain a desired illumination NA, the second driving system 23 sets the focal distance of the zoom lens 4 in accordance with a command from the control system 21. Furthermore, in order to control the state in which the circular secondary light source formed on the side focus surface behind the micro fly-eye lens 5 controls the amount of light loss well, the third drive, according to a command from the control system 21, opens a desired circular opening optical light path. Furthermore, the focal distance of the zoom lens 4 is changed by the moving system 23 as required, and the focal distance of the zoom lens 7 is changed by the fourth driving system 25. The size and size of the illumination area formed on the mask 10 can be changed as appropriate independently of each other. Lighting NA. In this case, depending on the size of the secondary light source having a circular shape that changes with the focal distance of the zoom lens 4,

This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) 480585 A7 B7 V. Description of the invention (z) Position the desired circular opening light beam in the illumination light path. As described above, since the input device 20, the control system 21, the second drive system 23, and the third drive system 24 can set the size of the lighting area and the lighting NA to the desired one, respectively, it is configured to adjust the first zoom An adjustment system for both the optical system and the second variable magnification optical system. In this way, the size of the illumination area and the illumination N A formed on the mask 10 can be set to the desired ones without any loss of light amount, and the most appropriate circular illumination can be performed. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, where the belt is deformed in the desired lighting field size, the most appropriate lighting NA, the most appropriate resolution, and the desired depth of focus, the first drive The system 22 positions the diffractive optical element 3a for the deformation of the belt in the illumination light path according to the instruction of the control system 21. Next, on the reticle 10, in order to obtain an illumination area having a desired size, the fourth drive system 25 sets the focal distance of the zoom lens 7 according to a command from the control system 21. In addition, on the reticle 10, in order to obtain a desired illumination NA, the second drive system 23 sets the focal distance of the zoom lens 4 in accordance with a command from the control system 21. Furthermore, in order to control the state in which the secondary belt-shaped secondary light source formed on the side focus surface behind the micro fly-eye lens 5 is able to control the light quantity loss well, the third drive system 24 opens the desired belt in accordance with the instruction of the control system 21 The aperture is positioned in the illumination light path. Furthermore, the focal distance of the zoom lens 4 can be changed by the second driving system 23 and the focal distance of the zoom lens 7 can be changed by the fourth driving system 25 as needed. The lighting fields formed on the mask 10 can be appropriately changed independently of each other. Size and lighting NA. In this case, according to the focal length of the zoom lens 4, the paper size of 27 applies to the Chinese National Standard (CNS) A4 (210 X 297 mm)-480585 A7 B7, the employee ’s consumption of the Intellectual Property Bureau of the Ministry of Economic Affairs, and the financial seal. 2. Description of the invention (乂) The size of the wheel-shaped secondary light source that changes with the change of the distance (ie, the size of the circle that is external to the wheel-shaped secondary light source) can selectively open the desired wheel belt. The aperture is positioned in the illumination light path. In this way, the size of the illumination area formed on the reticle 10 and the illumination NA can be set as desired, with almost no loss of light amount, and the most appropriate deformation of the belt can be performed. Furthermore, in the case of performing 4-pole deformation lighting in a desired lighting field size, the most appropriate lighting NA, the most appropriate resolution, and the desired focal depth, the first drive system 22 is based on the instructions of the control system 21 ' The diffractive optical element 3b for 4-pole deformed illumination is positioned in the illumination light path. Next, on the reticle 10, in order to obtain an illumination area having a desired size, the fourth drive system 25 sets the focal distance of the zoom lens 7 according to a command from the control system 21. In addition, on the reticle 10, in order to obtain a desired illumination NA, the second driving system 23 sets the focal distance of the zoom lens 4 in accordance with a command from the control system 21. Furthermore, in order to control the state in which the 4-pole-shaped secondary light source formed on the side focus surface behind the micro fly-eye lens 5 controls the light amount loss well, the third drive system 24 opens the desired 4-pole in accordance with the instruction of the control system 21 The aperture is positioned in the illumination light path. Furthermore, the focal distance of the zoom lens 4 can be changed by the second driving system 23 and the focal distance of the zoom lens 7 can be changed by the fourth driving system 25 as needed. The lighting fields formed on the mask 10 can be appropriately changed independently of each other. Size and lighting NA. In this case, depending on the size of the quadrupole secondary light source that changes with the focal distance of the zoom lens 4 (that is, the size of the circle that is external to the quadrupole secondary light source), the Desired 4 pole open 28 This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm)

I

Page order 480585 A7 B7 V. Description of the invention (> Ί) The mouth light is positioned in the illumination light path. In this way, the size of the illumination area formed on the reticle 10 and the illumination N A can be set to desired levels without any loss of light amount, and the most suitable 4-pole deformation illumination can be performed. As described above, in this embodiment, by controlling the focal distance between the zoom lens 4 as the first variable magnification optical system and the zoom lens 7 as the second variable magnification optical system, it is possible to effectively suppress the aperture 6 or the illumination. The amount of light in the field of view light 8 is lost, and the size of the illumination NA and the illumination area on the mask 10 and the size and σ 値 of the exposure area on the wafer 12 can be adjusted as desired. That is, in the exposure device of this embodiment, the size and σ 値 of the illumination field (exposure field) can be set to the most appropriate 値 and 在, respectively, depending on the characteristics of the manufactured micro-element or the characteristics of the mask 10 used. Under the conditions of high exposure illuminance and exposure conditions, good projection exposure with high productivity is performed. Member of the Intellectual Property Bureau of the Ministry of Economic Affairs, X. Consumption; i is printed again. In the above-mentioned embodiment, the opening of the secondary light source is limited, which can well suppress the loss of light quantity, and can perform deformation lighting such as a belt. Or 4-pole anamorphic lighting and usually circular lighting. Therefore, the type of anamorphic illumination can be appropriately changed, and the resolution and focal depth of the projection optical system most suitable for the fine pattern for exposure projection can be obtained. As a result, it is possible to perform a good projection exposure with a high throughput under the conditions of high exposure illumination and good exposure conditions. In addition, in order to change the exposure conditions and illumination conditions, if a change mechanism or a beam conversion mechanism (for example, a diffractive optical element 3 for forming a circular beam, a diffractive optical element 3a for forming a belt beam, and a 4-pole beam are formed, The diffractive optical element 3b) is used to change the pupil position of the illumination optical system (by optics 29 paper standards apply Chinese National Standard (CNS) A4 specifications (210 X 297 mm) 480585 A7 __B7__ V. Description of the invention (4) The position of the secondary light source formed by the integrator or the position where it interacts with its optics) or the light intensity distribution in the vicinity of the position will produce a situation where the number of lighting openings NA can be changed. Changes in the number of illuminated openings caused by changes in its exposure conditions or lighting conditions can be corrected by adjusting (changing) the magnification or focal distance of the first variable magnification optical system 4 as an adjustment mechanism. In this case, through the input device 20, appropriate control signals based on the exposure conditions and lighting conditions of the photomasks or wafers stored in the internal memory section are output to the first drive system 22 and the second drive system, respectively. 23 and the third drive system 24. That is, the diffractive optical element (3, 3a, 3b) is set in the illumination light path by the first drive system 22, and the opening aperture having an opening of an appropriate shape and size is set in the illumination light path by the third drive system 24 At the same time, in order to correct the change in the number of illumination openings, an appropriate magnification or focal distance of the first variable magnification optical system 4 is adjusted (changed) by the second driving system 23. According to this, it is possible to realize an exposure device and a micro-device manufacturing method for exposing a photomask pattern to a photosensitive substrate such as a wafer under a desired exposure condition or lighting condition. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. FIG. 6 is a block diagram schematically showing a second embodiment of the present invention and an exposure device having a lighting optical device. The second embodiment has a configuration similar to that of the first embodiment. However, in the first embodiment, an optical integrator composed of a single fly-eye lens 5 with a constant focal distance is used as a multi-light source forming mechanism, and a variable focal distance zoom lens 7 is used as a condensing optical system. In the second embodiment, it is basically different in that it uses three micro fly-eye lenses. 30 paper sizes are applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 480585 A7 B7 Intellectual Property Bureau of the Ministry of Economic Affairs Printed by an employee consumer cooperative. 5. Description of the invention (θ) 51-53 micro-fly eye lens group 50 with variable focal distance as a multi-light source forming mechanism, and a condenser lens 70 with a constant focal distance as a focusing optical system. . Therefore, in Fig. 6, elements having the same functions as those of the first embodiment are given the same reference numerals. Hereinafter, the second embodiment will be described focusing on the differences from the first embodiment. In FIG. 6, although the illumination optical device is also set to perform normal circular illumination, as in the first embodiment, by changing the diffraction optical element, it is possible to perform belt deformation illumination or quadrupole deformation illumination. Regarding this point, redundant descriptions are omitted. In the second embodiment, a first micro fly-eye lens 51 formed by a micro lens with a positive diffraction power, a second micro fly-eye lens 52 formed by a micro lens with a negative diffraction power, and a positive lens A third micro fly's eye lens 53 formed by a micro lens with a diffraction force constitutes a micro fly's eye lens group 50. Here, each of the micro lenses constituting the micro fly-eye lenses 51 to 53 also has a rectangular cross section, and their sizes are the same. The first micro fly's eye lens 51 and the second micro fly's eye lens 52 are independently movable along the optical axis A X, and the third micro fly's eye lens 53 is fixed along the optical axis A X. In addition, in order to prevent the rear focal plane of the micro-Fly-eye lens group 50 from moving, the first micro-Fly-eye lens 51 and the second micro-Fly-eye lens 52 are moved along the optical axis AX to focus the micro-Fly eye lens group 50 The distance is continuously changed from the maximum focus distance f501 to the minimum focus distance f502. The change in the focal distance of the micro fly's eye lens group 50 is the same as in the first embodiment, and it is advanced by a drive system that operates according to the instructions of the control system (please read the precautions on the back before this page). • The size of the paper is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm) 480585 A7 B7 V. Description of the invention (>) OK. FIG. 7 is a diagram illustrating the relationship between the focal distance of the zoom lens and the micro fly-eye lens group 50 and the size of the rectangular field of illumination and the illumination N A formed on the surface interacting with the mask 10. In FIG. 7 (a), the light 30 emitted from the intersection of the diffraction surface of the self-diffractive optical element 3 and the optical axis AX at a maximum exit angle 0 1 is formed through the zoom lens 4 set at the maximum focal distance Π1. The optical axis AX is parallel and enters the micro fly-eye lens group 50. The micro fly-eye lens group 50 is set at a maximum focal distance f501. Here, the size of each of the micro-lens lenses 51 to 53 constituting the micro-lens lens group 50 along the paper surface of FIG. 7 is d. The micro-fly-eye lens group 50 emits the outermost light 31 parallel to the optical axis AX, passes through the condenser lens 70 having a focal distance f70, and reaches the predetermined surface 32 and the photomask 10 at an incidence angle θ 21 at the incident angle θ 21. The intersection of the optical axis AX. In this way, a rectangular shaped field 33 is formed on the predetermined surface 32 similar to the shape of the micro lens. The size of the photofield 33 along the paper surface of FIG. 7 is Φ3. Here, as shown in FIG. 7 (b), the focal distance of the zoom lens 4 is changed from the maximum focal distance Π1 to the minimum focal distance Π2, and at the same time, the focal distance of the micro fly eye lens group 50 is also changed from the maximum focal distance f501. Changes occur up to the minimum focal distance f502. In this case, the light 30 emitted from the intersection of the diffraction surface of the self-diffractive optical element 3 and the optical axis AX at a maximum exit angle 01 passes through the zoom lens 4 set at the minimum focal distance Π2 to be parallel to the optical axis AX. The micro fly-eye lens group 50 is set at a minimum focal distance f502. 32 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) (Please read the notes on the back before filling this page) # ------- Order -------- -Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 480585 Α7 Β7 V. Description of the Invention After passing through the condenser lens 70 having the focal distance f70, it reaches the intersection point of the predetermined surface 32 and the optical axis AX that interact with the mask 10 at the incident angle 22. In this way, the predetermined surface 32 forms the shape of a micro lens The similar rectangular photofield 33. The size of the photofield 33 along the paper surface of Fig. 7 is Φ4. In Fig. 7 (a), the relationship shown by the following formula (5) and formula (6) is formed. Fl 1 · sin Θ l = f70 · sin (9 21 ... (5) 〇3 = (f70 / f501) d ... (6) Also, in Fig. 7 (b), the following formula (7) and The relationship shown in formula (8): fl2 · sin0 l = f70 · sin0 22 ... (7) 〇4- (f7〇 / f5〇2) d ... (8) Refer to the above formula (6) and Eq. (8) shows that the size Φ of the Tero field 33 is slightly different The focal distance f50 of the group 50 is inversely proportional. That is, the size Φ3 of the photofield 33 in Fig. 7 (a) is the smallest size, and the size Φ4 of the photofield 33 in Fig. 7 (b) is the largest size. As described above, if If the focal distance f50 of the micro-eye compound lens group 50 is changed, the size of the light field formed on the predetermined surface 32 and the area of the photo-field formed on the pattern surface of the mask 10 will also change. In detail, if the micro-eye compound lens group is changed, The larger the focal distance f50 of 50, the illumination NA on the reticle 10 does not change, and the size of the illumination area only on the reticle 10 becomes smaller. Thus, the micro compound eye lens group 50 constitutes a multi-light source forming mechanism, In addition, it forms part of the second variable magnification optical system for changing the size of the illumination field formed on the irradiated mask 10 (and further, the wafer 12). 33 This paper size applies the Chinese National Standard (CNS) A4 size (210 X 297 mm) Please read the note first

Page I 480585 A7 B7 V. Explanation of the invention (p) On the other hand, if the focal distance fl 'of the zoom lens 4 is changed, the size of the field of light formed on the entrance surface of the micro fly eye lens group 50 changes. The lighting NA on 10 also changes. Specifically, if the focal distance fl of the zoom lens 4 is made smaller, the size of the illumination area formed on the mask is not changed, and only the illumination NA on the mask 10 is reduced. In this way, the 'zoom lens 4' constitutes a first variable magnification optical system for changing only the illumination NA of the mask 10 on the illuminated surface. Therefore, in the second embodiment, by setting the focal distance of the micro fly's eye lens group 50 to a predetermined value, substantially no light loss can be achieved in the mask baffle, and illumination of a desired size can be obtained on the mask 10. field. Furthermore, by setting the focal distance of the zoom lens 4 to a predetermined value, the aperture light 6 can be substantially free of light loss, and the desired size of illumination NA can be obtained on the reticle 10. Figure 8 is a schematic representation Configuration diagram of an exposure device having an illumination optical device according to a third embodiment of the present invention. Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs The third embodiment has a structure similar to that of the first embodiment. However, in the first embodiment, the micro-fly-eye lens 5 using a wavefront-splitting optical integrator is used as a multi-light source forming mechanism. In the third embodiment, it is a rod-type integrator using an internal reflection-type optical integrator. 500, this point is basically different from each other. Therefore, in FIG.8, elements having the same functions as those of the first embodiment are given the same reference numerals as in FIG.1. Hereinafter, the third embodiment will be described focusing on differences from the first embodiment. Also, in Fig. 8, although the illumination optical device is also set to perform ordinary circular illumination, it conforms to the Chinese paper standard (CNS) A4 (210 X 297 mm) in accordance with the 1 34th paper standard. 480585 A7 _______ B7 V. Invention Explanation (w) In the same manner as the embodiment, it is possible to perform belt deformation illumination or quadrupole deformation illumination by switching the diffractive optical element. Repeated description of this point is omitted. In the third embodiment, instead of the micro fly-eye lens 5, a rod integrator 500 is used. In the optical path between the diffractive optical element 3 and the rod integrator 500, a zoom lens 41 is attached as the first imaging optical system. (The first zoom optical system), and a zoom lens 71 is provided as the second imaging optical system (second zoom optical system) instead of the zoom lens 7 and the relay optical system 9. A mask baffle 8 as a light field of illumination is disposed near the exit surface of the rod integrator 500. Here, the zoom lens 41 is configured to continuously change the imaging magnification ml while maintaining the optical interaction with the diffraction surface of the diffractive optical element 3 and the entrance surface of the rod integrator 500. The zoom lens 7 is configured to continuously change the imaging magnification m2 while maintaining optical interaction with the exit surface of the rod integrator 500 and the pattern surface of the photomask 10. The magnification change of the zoom lens 41 and the zoom lens 71 is performed by a drive system that operates according to a command from the control system, as in the first embodiment. The Intellectual Property Bureau's Consumer Cooperatives printed rod-type integrator 500 is an internal reflective glass rod formed of glass materials such as quartz glass or fluorite. It uses the internal and external environment interface, that is, The total reflection on the inner surface passes through the condensing point along a plane parallel to the incident surface of the rod to form a light source image corresponding to the number of reflections on the inner surface. Here, the light source image formed is almost a virtual image, and only the image at the center (condensing point) is a real image. That is, the light beam incident on the rod integrator 500 is divided into angular directions by reflection from the inner surface, and passes through the light collecting point, along a plane parallel to the incident surface. 35 This paper size applies the Chinese National Standard (CNS) A4 specification ( 210 X 297 mm) 480585 A7 B7 V. Description of the invention (π) 'Forms a secondary light source composed of a majority of light source images. The beam of the secondary light source formed on the incident side by the rod integrator 500 overlaps with its exit surface, and then uniformly illuminates the mask 10 formed with a predetermined pattern through the zoom lens 71. As described above, the zoom lens 71 combines the output surface of the rod-type integrator 500 and the photomask 10 to form an optical interaction. Therefore, a rectangular field having a rectangular shape similar to the cross-sectional shape of the rod integrator 500 is formed on the photomask 10. Fig. 9 is a diagram illustrating the relationship between the magnifications of the zoom lens 41 and the zoom lens 71, the size of a rectangular field of illumination formed on a predetermined surface that interacts with the mask 10, and the illumination NA. In FIG. 9 (a), the light beam 30 emitted from the intersection of the diffractive surface of the diffractive optical element 3 and the optical axis AX at the maximum exit angle 0 1 passes through the zoom lens 41 set at the maximum magnification mil, and then The incident angle 011 is the intersection of the incident optical axis AX and the incident surface of the rod integrator 500. Here, the size of the exit surface of the rod-type integrator 500 along the paper surface of FIG. 9 is d5. The consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs prints the light 31 emitted from the intersection of the optical axis AX and the exit surface of the rod integrator 500. After passing through the zoom lens 71 set at the maximum magnification m2i, the incident angle is At 021, the intersection of the predetermined surface 32 and the optical axis AX which interact with the mask 10 is reached. In this way, a rectangular shaped field 33 is formed on the predetermined surface 32 similarly to the exit surface of the rod integrator 500 (more strictly, similar to the shape of the opening portion of the mask baffle 8). The size of the photofield 33 along the paper surface of Fig. 9 is? 5. Here, as shown in FIG. 9 (b), the magnification of the zoom lens 41 is changed from the maximum magnification mil to the minimum magnification ml2, and at the same time, the paper size of the zoom lens 36 is adapted to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 480585 A7 B7 V. Description of the invention (0) The magnification of 71 changes from the maximum magnification m21 to the minimum magnification m22. In this case, the light 30 emitted from the intersection of the diffraction surface of the self-diffractive optical element 3 and the optical axis AX at the maximum exit angle θ1 passes through the zoom lens 41 set at the minimum magnification ml2 and then enters the angle 6 »12 The intersection of the incident optical axis AX and the incident surface of the rod integrator 500. The light 31 emitted from the intersection of the optical axis AX and the exit surface of the rod integrator 500 passes through the zoom lens 71 set at the minimum magnification m22, and reaches the common angle with the photomask 10 at an incident angle 6 »22. The intersection of both the functioning predetermined surface 32 and the optical axis AX. In this way, a rectangular field 33 is formed on the predetermined surface 32 similarly to the exit surface of the rod integrator 500. The size of the photofield 33 along the paper surface of FIG. 9 is Φ6. In FIG. 9 (a), the relationship shown by the following formula (9) and formula (10) is formed. Θ ll = mll · Θ l = m21 · Θ2 ... (9) 05 = m21 / d5 ... (10) In addition, in Fig. 9 (b), the following equations (11) and (12) are formed. The relationship shown is Θ 12 = ml2 · Θ l = m22 · θ 2 ... (11) 0 6 = m22 / d5 ... (12) With reference to the above formulas (10) and (12), we can see Tero The size φ of 33 is proportional to the magnification m2 of the zoom lens 71. That is, the size Φ5 of the photofield 33 in Fig. 9 (a) is the largest, and the size Φ6 of the photofield 33 in Fig. 9 (b) is the smallest. In addition, referring to the above-mentioned formulas (9) and (11), it can be seen that the angle of incidence 6 to the predetermined surface 32 due to the constant 値 is 2 and 37 of which depend on the zoom lens 41. The paper standard is applicable to the Chinese national standard (CNS ) A4 size (210 X 297 mm) "

480585 A7 B7 V. Description of the invention (G) The ratio of the magnification ml to the magnification m2 of the zoom lens 71, ie ml / m2. In other words, the illumination NA of the illumination field 33 in FIG. 9 (a) depends on ml l / m21, and the illumination NA of the illumination field 33 serving in FIG. 9 (b) depends on mM / m22. As described above, if the magnification m2 'of the zoom lens 71 is changed, the size of the illumination area and the illumination N A formed on the pattern surface of the mask 10 also change. Specifically, if the magnification m2 of the zoom lens 7 丨 is increased, the illumination area on the mask 10 becomes larger, and the illumination NA becomes smaller. In this way, the 'zoom lens 71' constitutes a second variable magnification optical system for changing the size of the illumination area formed on the mask 10 on the illuminated surface. On the other hand, if the magnification ml of the zoom lens 41 is changed, the size of the light field formed on the incident surface of the micro fly-eye lens 5, that is, the illumination NA on the mask 10 changes. Specifically, if the magnification ml of the zoom lens 41 is increased, the size of the illumination area formed on the pattern surface of the mask 10 is not changed. The illumination NA on the mask 10 is increased only. As described above, the zoom lens 41 constitutes a first variable magnification optical system for changing only the illumination NA on the mask 10 on the illuminated surface. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. Therefore, in this embodiment, by setting the magnification of the zoom lens 71 to a predetermined value, there can be substantially no light loss in the mask baffle 8 and the mask 10 Get the lighting field of the size you want. Further, by setting the magnification of the zoom lens 41 to a predetermined magnification with respect to the magnification of the zoom lens 71 set at a predetermined value, illumination NA of a desired size can be obtained on the mask 10. The third embodiment shown in FIG. 8 is the same as the first embodiment shown in FIG. 1. In order to change the exposure conditions or lighting conditions, if a change mechanism or a beam conversion mechanism (for example, a circular Beam forming for winding 38 This paper size is applicable to Chinese National Standard (CNS) A4 (210 X 297 mm) 480585 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (η) Radiation optics 3, One of the three diffractive optical elements 3a for the formation of the belt beam and the three diffractive optical elements 3b for the formation of the 4-pole beam is set to the mechanism of the illumination light path, etc., and the pupil position of the illumination optical system is changed (by optical integration The position of the secondary light source formed by the device or the position where it interacts with its optics) or the light intensity distribution near its position may change the number of lighting openings NA. The number of illumination openings that changes as the exposure conditions or lighting conditions change can be corrected by adjusting (changing) the magnification or focal distance of the first variable magnification optical system 41 as an adjustment mechanism. As described above, in the embodiment shown in FIG. 1 and FIG. 8, the number of illumination openings that are changed by changing the illumination field of view of the second variable magnification optical system (7, 71) is adjusted (changed) ) The first variable magnification optical system (4, 41) can be corrected by the magnification or focal distance, and the number of illumination openings can be kept almost constant. Therefore, under such specific conditions, projection exposure can also be performed in a state of high lighting efficiency. However, with a change mechanism or a beam conversion mechanism (for example, a diffraction optical element 3 for forming a circular beam, a diffraction optical element 3a for forming a belt beam, and a diffraction optical element 3b for forming a 4-pole beam, One of them is set in a mechanism for illuminating the light path, etc.), and the illuminance distribution on the reticle or the wafer may change, resulting in uneven illuminance. In this case, the optical element (lens, etc.) of a part of the second condensing optical system (variable magnification optical system 7, 70) or the relay optical system (imaging optical system 9) can be moved, or borrowed The optical path between the optical integrator (5, 50, 500) and the reticle 10 is provided with a plurality of filters having a predetermined angular characteristic for illuminance distribution adjustment. Photo on or on wafer 39

This paper size applies Chinese National Standard (CNS) A4 specification (210 X 297 mm) 480585 A7 B7__ V. Description of invention (M) (Please read the notes on the back before filling this page) Uniform brightness distribution. However, since the number of lighting openings may change with the correction of the illuminance, the number of lighting openings that changes with the correction of the illuminance distribution of the illuminance correction mechanism may be adjusted (changed) ) To correct the magnification or focus distance of the first variable magnification optical system (the first condenser optical system 4, the first imaging optical system 41). The beam conversion mechanism (change mechanism) described in each of the above embodiments is printed by the employee's consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. One of the plurality of beams having different light intensity distributions can be converted according to the exposure beam. It is a function of a light beam having a desired light intensity distribution, in other words, converting a light beam having an exposure light into a light beam having a predetermined first light intensity distribution or a light beam having a predetermined second light intensity distribution different from the first light intensity distribution. The function of the light beam, therefore, the pupil position of the illumination optical system (the position of the secondary light source formed by the optical integrator or the position where it interacts with its optics) or the light intensity distribution near its position can be changed to the desired Light intensity distribution. Such a beam conversion mechanism (change mechanism) for changing the pupil position of the illumination optical system or the light intensity distribution near the position is not limited to the diffractive optical element (3, 3a, 3b) that will form a desired divergent beam ) To switch the configuration, can also form a conical refraction plane 轮 (or 具有 with a concave conical refraction plane) that can form a belt-shaped beam and a 4-corner cone that can form a 4-pole beam The shape of the refractive surface 稜鏡 (or 稜鏡 having a concave quadrangular pyramid-shaped refractive surface) is switched. In this way, the light beam conversion mechanism (change mechanism) can be converted into divergent light in a desired state by selectively arranging one of the optical elements having a diffractive effect or a refractive effect in the illumination optical path. Furthermore, if the light beam conversion mechanism (change mechanism) is exchanged with the three diffractive optical elements and variable magnification light 40, the paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 480585 A7 B7 V. Description of the invention (β) The combination of the academic system, the ratio of the wheel belt (the ratio of the inner diameter to the outer diameter of the belt) of the belt beam formed by the pupil position of the illumination optical system or near the position, The size and distance from the center of the quadrupole beam continuously change. Similarly, a combination of a beam conversion mechanism (change mechanism), a reversible optical element (refractive optical element), and a variable magnification optical system may be used. Also, in each of the optical elements and worktables shown in Figs. 1 to 9, in order to achieve the aforementioned functions, electrical, mechanical, or optical connections can be used to combine the cost of the invention. Exposure device. Next, by using the exposure apparatus of each example shown in FIG. 1 to FIG. 9, a predetermined circuit pattern is formed on a wafer or the like that is a photosensitive substrate. Therefore, an example of a method for obtaining a semiconductor device as a micro device is referred to FIG. 10. The flow chart illustrates it. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs First, in step 301 of FIG. 10, a metal film is vapor-deposited on the wafer. In the next step 302, a photoresist is coated on a metal film on the wafer. Thereafter, in step 303, using any of the projection exposure devices shown in FIG. 1 to FIG. 9, the pattern image on the photomask passes through the projection optical system (projection optical unit), and is sequentially exposed and transferred to the crystal. Various photographic fields on the circle. Thereafter, in step 304, after the development of the photoresist on the wafer is performed, in step 305, uranium engraving is performed by using the photoresist pattern as a photomask on the wafer so as to correspond to the photomask. The circuit pattern of the pattern is formed in each photographic field on each wafer. Thereafter, elements such as semiconductor elements are manufactured by forming circuit patterns on the upper layer and the like. According to the above-mentioned method of manufacturing a semiconductor device, a semiconductor device having an extremely fine circuit pattern can be obtained with a high throughput. 41 This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) " 480585 Printed by A5 _____B7 of the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, the description of the invention (in) and 'in the above Figures 1 to The exposure device shown in FIG. 9 can obtain a liquid crystal display element as a micro element by forming a predetermined pattern (circuit pattern, electrode pattern, etc.) on a plate (glass substrate). An example of this method will be described below with reference to the flowchart of FIG. In FIG. 11, in a pattern forming process 401, a so-called photolithography process is performed in which a pattern of a photomask is transferred to a photosensitive substrate (a photoresist-coated glass substrate, etc.) using the exposure apparatus of this embodiment. By this photolithography process, a predetermined pattern including a large number of electrodes is formed on a photosensitive substrate. After that, the exposed substrate is formed into a predetermined pattern on the substrate through development processes, etching processes, and mask peeling processes, and then transferred to the next color filter formation process 402. Next, in the color filter formation process 402, three batch groups corresponding to R (red), G (green), and B (blue) are formed into a plurality of color filter plates arranged in a matrix. Next, after the color filter formation process 402, the component combination process 403 is performed. At the component combination process 403, a substrate having a predetermined pattern obtained by the pattern formation process 401 is used, and the substrate obtained by the color filter formation process 402 is used. A color filter, etc., combined with a liquid crystal panel (liquid crystal element). In the element combination process 403, for example, liquid crystal is injected between a substrate having a predetermined pattern obtained in the pattern formation process 401 and a color filter plate obtained in the color filter formation process 402 to manufacture a liquid crystal panel (liquid crystal element). . Secondly, in the module assembly project 404, the electric circuit and the backlight of the liquid crystal panel (liquid crystal element) for display operations are assembled to complete the liquid crystal display element. 42 (Please read the precautions on the back before # this page) · The size of the paper used in the paper is applicable to the Chinese National Standard (CNS) A4 (210 X 297 public love) 480585 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs DESCRIPTION OF THE INVENTION (y) According to the above-mentioned method for manufacturing a liquid crystal display element, a liquid crystal display element having an extremely fine circuit pattern can be obtained with high yield. Further, in the above embodiment, the diffractive optical element, which is a light beam conversion optical system, may be configured to be positioned on the illumination optical path in a turntable manner. Moreover, the above-mentioned diffractive optical element can be inserted and removed and switched using a conventional sliding mechanism. However, a detailed description of the diffractive optical element that can be used in the present invention is disclosed in U.S. Patent No. 5,850,300 and the like. Further, in the above-mentioned embodiment, although a diffractive optical element is used as the beam conversion optical system, a wavefront division type optical integrator such as a fly-eye lens or a micro-fly-eye lens may be used. Furthermore, in the above-mentioned embodiment, although a micro fly-eye lens or a rod integrator is used as the multi-light source forming mechanism, other appropriate optical elements such as a fly-eye lens or a diffractive optical element may be used. In the first and second embodiments described above, a field of light is temporarily formed on a predetermined surface that interacts with the cover 10, and after the light beam from the field of light is restricted by the mask baffle 8, it passes through the relay optics. The system 9 forms a light field on the photomask 10. However, the relay optical system 9 may be omitted, and the field of illumination may be directly formed on the mask 10 disposed on the mask baffle 8 through the zoom lens 7 or 70. Furthermore, in the third embodiment described above, although a configuration is adopted in which a rod-shaped integrator 500 having a rectangular cross section is radiated into a circular beam, it is preferable to increase the filling rate of the incident beam. It is converted into an elliptical beam and is incident. In addition, the rod integrator may be a single solid glass rod or a combination of a reflector and a tunnel. In the form of a rod-shaped product 43 with a mirror (please read the precautions on the back before this page), ¾. • Line · This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 480585 A7 _ B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. In the case of the (w) splitter, the cross-sectional size d5 can be changed as required. Further, in the above-mentioned embodiment, an aperture stop for restricting the light beam of the secondary light source is arranged near the focal surface behind the micro fly-eye lens. However, depending on the situation, by setting the cross-sectional area of each micro lens constituting the micro fly-eye lens to be very small and omitting the arrangement of the aperture beam, the configuration of the beam of the secondary light source may not be restricted at all. Furthermore, in the above-mentioned embodiment, although an example of forming a quadrupole secondary light source is described, it is also possible to form, for example, a 2-pole secondary light source or an 8-pole multipolar secondary light source. In this embodiment, since KrF excimer laser (wavelength 248nm) or ArF excimer laser (wavelength 193nm) is used as the light source, the diffractive optical element can be made of quartz glass, for example. And formed. In the case of using exposure light with a wavelength of 200 nm or less, the diffractive optical element is preferably made of fluorite, quartz glass mixed with fluorine, quartz glass mixed with fluorine and hydrogen, and the structure-determining temperature is 1200 K or less and 0H group concentration. Quartz glass above 1000ppm, quartz glass with structure-determined temperature of 1200K or less and hydrogen molecule concentration of lx1017moleCiileS / Cm3 or higher, quartz glass with structure-determined temperature of 1200K or less and chlorine concentration of 50ppm or less, structure-determined temperature of 1200K or less In addition, it is formed of a material selected from quartz glass groups such as quartz glass having a hydrogen molecule concentration of 1 × 1017 molecules / cm3 or more and a chlorine concentration of 50 ppm or less. In addition, the structure-determining temperature is 1200K or lower and the OH group concentration is (Please read the precautions on the back first ¾.! • Fill in this page). • Lines • This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 480585 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. The description of the invention (w) Quartz glass above 1000 ppm has been disclosed in Japanese Invention Patent No. 2770244 proposed by the applicant of this case, and the structure Quartz glass with a determined temperature of 1200K or less and a hydrogen molecule concentration of lxl017molecules / cm3 or more, quartz glass with a structured decision temperature of 1200K or less and a chlorine concentration of 50ppm or less, a structured decision temperature of 1200K or less and a hydrogen molecule concentration of 1x1017molecules / cm3 or more and Quartz glass with a chlorine concentration of 50 ppm or less has been disclosed in Japanese Invention Patent No. 2936138 proposed by the applicant of the present case. [Effects of the Invention] As described above, in the illumination optical device of the present invention, by controlling the focal distance or the magnification of both the first variable magnification optical system and the second variable magnification optical system, not only the light amount loss can be suppressed well, but also Adjust the size of the exposure area and σ 値 to the desired 値, respectively. As a result, in the exposure device of the present invention, the size of the illumination field (exposure field) and σ 値 can be set to the most appropriate 依 according to the characteristics of the manufactured micro-elements or the characteristics of the photomask used, and Projection exposure with high productivity under high exposure illumination and good exposure conditions. In addition, in the exposure method using the illumination optical device of the present invention, which exposes the pattern of the photomask disposed on the irradiated surface onto a photosensitive substrate, or a method for manufacturing a micro-element, projection exposure can be performed under good exposure conditions, so Can make good micro-components. Furthermore, according to a typical embodiment of the present invention, not only the loss of light in the aperture of the aperture used to limit the secondary light source can be well suppressed, but also deformed lighting such as belt deformation lighting or 4-pole deformation lighting, and generally circular Photo 45 (Please read the precautions on the back before Wk this page) too

Language Γ _ ί This paper size is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm) 480585 A7 B7 V. Description of the invention (w). Therefore, in an exposure device incorporating the illumination optical device of the present invention, the type of deformation illumination can be appropriately changed 'to obtain a resolution and a focal depth suitable for a projection optical system for a fine pattern to be exposed and projected. As a result, high-capacity projection exposure can be performed under high-exposure illumination and good exposure conditions. In order to set a desired exposure condition or a desired lighting condition, a beam conversion mechanism (change mechanism) is used to convert the exposure light beam into a light beam having a desired light intensity distribution. Even if the number of illumination openings is changed, it can be borrowed. The number of illumination openings is adjusted by an adjustment mechanism, so that an exposure device for exposing a photomask pattern to a photosensitive substrate such as a wafer and a method for manufacturing an element can be realized under a desired exposure condition or illumination condition. [Brief description of the drawings] Fig. 1 is a schematic configuration diagram showing an exposure device having an illumination optical device according to the first embodiment of the present invention. Fig. 2 is a perspective view illustrating the internal structure and function of the light retardation section 2 of Fig. 1. Printed in Figure 3 by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs illustrates the focal distance between the zoom lens 4 and the zoom lens 7 and the rectangular shaped field formed on a predetermined surface that interacts with the mask 10 in the first embodiment. The relationship between the size and lighting NA. Fig. 4 is a diagram for explaining the function of the diffractive optical element 3a for deformed illumination of the belt. Fig. 5 is a diagram illustrating the operation of the diffractive optical element 3b for 4-pole anamorphic illumination. Fig. 6 shows the second embodiment of the present invention, with illumination optics. 46 The paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 480585 'A7 B7 V. Exposure of the invention (β) The schematic diagram of the device. FIG. 7 is a diagram illustrating the relationship between the focal distance of the zoom lens and the micro fly-eye lens group 50 and the rectangular field size and illumination NA on the surface interacting with the mask 10 in the second embodiment. Fig. 8 is a schematic configuration diagram showing an exposure device having an illuminating optical device according to a third embodiment of the present invention. Fig. 9 is a diagram illustrating the relationship between the magnifications of the zoom lens 41 and the zoom lens 71 and the rectangular field size and illumination NA formed on a predetermined surface that interacts with the mask 10 in the third embodiment. Fig. 10 is a flowchart showing an example of a method used to obtain a semiconductor device as a micro device. FIG. 9 is a flowchart showing an example of a method used when obtaining a liquid crystal display device as a micro device. [Symbol] Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 1 Light source 2 Light delay section 3 Diffractive optical element 4 Zoom lens 5 is a fly-eye lens 6 Opening aperture 7 Zoom lens 8 Mask baffle 9 Relay optical system 10 Light Cover 47 This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) 480585 Printed invention note printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs (11 Projection optical system 12 Wafer 13 Wafer table 20 Input mechanism 21 Control system 22 ～ 25 Drive system A7 B7 (Please read the precautions on the back before _ -install ·! Order on this page: -line · This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

Claims (1)

480585 A8 B8 C8 D8 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 6. Application for patent scope 1. A lighting optical device that illuminates the illuminated surface, which has the following features: The first variable magnification optical system for adjusting the illuminated surface The number of illumination openings makes the focal distance or magnification variable; and a second variable magnification optical system for changing the size of the illumination area formed on the illuminated surface to make the focal distance or magnification variable. 2. If the illumination optical device according to item 1 of the patent application scope has an adjustment system for setting the number of the aforementioned lighting openings and the size of the aforementioned illumination field to the desired ones, and adjusting the aforementioned first variable magnification optical system and Focus distances or magnifications of both the aforementioned second variable magnification optical systems. 3. The illumination optical device according to item 1 of the patent application scope, which has a light source mechanism for supplying illumination light; a multi-light source forming mechanism for forming a plurality of light beams based on the aforementioned illumination light; and a beam conversion optical system for converting the light from the aforementioned The light beam of the light source mechanism is converted into a light beam having a predetermined cross-sectional shape; and the first variable magnification optical system is guided to the multi-light source forming mechanism through the light conversion optical system; and the second variable magnification optical system Most of the light beams of the multi-light source forming mechanism are guided to the aforementioned illuminated surface. 4. For example, the lighting optical device of the scope of application for patent No. 1 has a light source mechanism for supplying illumination light; and a beam conversion optical system for converting the light beam from the aforementioned light source mechanism (please read the precautions on the back before reading) Fill in the dimensions of this paper to apply the Chinese National Standard (CNS) A4 specification (mm) 480585 A8 B8 C8 D8 6. The scope of the patent application is converted into a beam with a predetermined cross-sectional shape; and the aforementioned first variable magnification optical system converts from the aforementioned beam The optical beam of the optical system is guided to the second variable magnification optical system; the second variable magnification optical system includes a multi-light source forming mechanism that forms a plurality of light beams based on the light beam transmitted through the first variable magnification optical system, and sends the light source from the first 1 The light beam of the variable magnification optical system is guided to the aforementioned illuminated surface. 5. The illumination optical device according to item 2 of the patent application includes a light source mechanism for supplying illumination light. A multi-light source formation mechanism is formed according to the aforementioned illumination light. Most light beams; and a beam conversion optical system for converting light beams from the aforementioned light source mechanism The first variable magnification optical system guides the light beam that has passed through the light beam conversion optical system to the multi-light source forming mechanism; the second variable magnification optical system forms the light from the multi light source Most of the light beams of the mechanism are guided to the aforementioned illuminated surface. 6. For example, the illumination optical device of the second patent application scope has a light source mechanism for supplying illumination light; and a beam conversion optical system for transmitting light from the aforementioned light source mechanism. The light beam is converted into a light beam with a predetermined cross-sectional shape; and the aforementioned first variable magnification optical system will be from the aforementioned beam conversion optical system 2 Please read the precautions on the back before filling Ling ·, \ printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, printed by employees 'consumer cooperatives, the paper size applies to China's National Standards (CNS) A4 (210X297 mm) 480585 printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, A8 B8 C8 D8 The light beam in the scope of the patent application is guided to the aforementioned second variable magnification optical system; the aforementioned second variable magnification optical lift system includes a multi-light source forming mechanism for forming a plurality of light beams based on the light beam transmitted through the first variable magnification optical system, and Guide the light beam from the aforementioned first variable magnification optical lift system to the aforementioned irradiated surface. A type of exposure device, which has the following features: an illumination lift device according to any one of the claims 1 to 6; and A projection optical system is used for projecting and exposing a pattern of a photomask disposed on the illuminated surface onto a photosensitive substrate. 8 · — A method for manufacturing a micro-element, which comprises: a process of illuminating a photomask disposed on an irradiated surface by using the illumination optical device of any one of items 1 to 6 of the scope of patent application; and the foregoing to be illuminated The process of transferring the pattern of a photomask onto a photosensitive substrate. 9. An exposure device comprising: an illuminating optical device for illuminating a pattern having a predetermined pattern with a light beam for exposure; and a projection system for projecting and exposing the pattern image of the aforementioned mask on a photosensitive substrate, which has the following features: Means for inputting information on the exposure conditions of the photosensitive substrate or the illumination conditions of the photomask; and the illumination optical device has a beam conversion mechanism that converts the light beam for exposure into the light beam according to the input information from the input mechanism. A light beam having a desired light intensity distribution; the first variable magnification optical system adjusts the number of illumination openings in the aforementioned mask according to input information from the aforementioned input mechanism; and the second variable magnification optical system, according to the input from the aforementioned input mechanism Enter the information and change the size of the lighting area formed in the aforementioned photomask. This paper is in Chinese National Standard (CNS) A4 size (210x297 mm). Please read the precautions on the back before filling in m • Binding · Order # 线 3 _______ 480585 Printed by the Consumers ’Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs A8 B8 ^ ___ 6. Application for patent scope 10 · For the exposure device of the patent application item 9, the aforementioned illumination optical device includes an optical integrator for uniformly illuminating the aforementioned photomask, and the aforementioned first variable magnification optical system is arranged in the aforementioned optical integrator. On the incident side, the second variable magnification optical system is disposed on the exit side of the optical integrator. 11. A method for manufacturing a micro-device, comprising: a lighting process, illuminating a pattern having a predetermined pattern with a light beam for exposure; and an exposure process, projecting and exposing the pattern image of the mask on a photosensitive substrate, the characteristics of which are: The aforementioned lighting project includes: an input process, inputting information about the exposure conditions on the aforementioned photosensitive substrate or an illumination condition on the aforementioned photomask; a beam conversion project, which converts an exposure beam into A light beam having a desired light intensity distribution; a variable project in the lighting field, which changes the size of the lighting field formed in the aforementioned mask according to the input information from the aforementioned input project; and an adjustment project, based on the input information from the aforementioned input project, Adjust the number of lighting openings in the photomask. I2. The method for manufacturing a micro-component according to item 11 of the scope of the patent application, wherein the aforementioned adjustment process is to correct the number of lighting openings changed by the variable engineering in the lighting field, and to keep the number of lighting openings constant. 13. · An exposure device comprising: an illumination optical device for illuminating a pattern having a predetermined pattern with a light beam for exposure; and a projection system for projecting and exposing the pattern image of the aforementioned mask on a photosensitive substrate, which is characterized by: The aforementioned illumination optical device includes: a changing mechanism for changing a pupil position of the illumination optical device or a light intensity distribution in the vicinity thereof; and an adjusting mechanism for adjusting the light intensity distribution in the aforementioned photomask by changing the light intensity distribution of the changing mechanism. Number of lighting openings. ____ 4 ___ This paper size is applicable to China National Standard (CNS) A4 specification (210X297 mm) " " " " " '(Please read the precautions on the back before filling in m-pack ·, 1T line 480585 is8 ___gs__ VI. Application scope of patent 14. The exposure device as described in item 13 of the scope of patent application, wherein the aforementioned change mechanism includes a beam conversion mechanism to selectively convert the aforementioned exposure beam into a plurality of beams having different light intensity distributions. 15. The exposure device according to item 14 of the scope of patent application, wherein the aforementioned beam conversion mechanism has: a first diffractive optical element for forming a first light intensity distribution; and a second diffractive optical element. The optical path can be set to the first diffractive optical element and form a second light intensity distribution which is different from the first light intensity distribution. 16 · —A method for manufacturing a micro-device, including: lighting engineering, using a light beam for exposure has The pattern of the mask of the predetermined pattern; and the exposure process, which exposes the pattern image of the aforementioned mask onto a photosensitive substrate, and is characterized in that the aforementioned lighting project includes: More engineering, changing the pupil position of the illumination optical device or the light intensity distribution in the vicinity; and adjusting the process, adjusting the number of lighting openings in the aforementioned mask corresponding to the change in the light intensity distribution corresponding to the change project. Please read the back first Please fill in the note-packing. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. __________5 This paper size applies to China National Standard (CNS) Α4 specification (210 × 297 mm)