TH64545B - Prototype glass with multiple film thicknesses of chromium and nickel types And how to create such prototype glass - Google Patents

Abstract

DC60 (32/09/55) This invention focuses on fabricating a chromium/nickel multi-film thickness mask (Cr/Ni MFT-Mask) to create three-dimensional microstructures with multiple etching depths by varying the thickness of the nickel/chromium film with a constant composition ratio. This can be applied to create three-dimensional concentric chirped grating (CCG) differential lens gratings, replacing the double patterning technique of litho-etch-litho-etch (LELE) with positional shifting during the second irradiation step, which may involve positional errors during wafer-to-wafer process control. Furthermore, it offers lower manufacturing costs than grayscale lithography masks (GSL) and increases the number of three-dimensional structure levels. Beyond the use of multi-layer chromium/nickel film (Cr MFT-Mask) microforming, this invention simplifies quality control of microforms by eliminating the need for ultra-thin film layers. This invention focuses on creating a chromium/nickel multi-layer film thickness mask (Cr/Ni MFT-Mask) capable of producing three-dimensional microstructures with multiple etching depths. This is achieved by varying the thickness of the nickel/chromium film with a constant composition ratio. Furthermore, it can be applied to create three-dimensional concentric chirped grating (CCG) structures, replacing the double-patterning Litho-Etch-Litho-Etch (LELE) technique combined with wafer-to-wafer positioning errors during the second irradiation step. Moreover, it offers lower manufacturing costs compared to conventional methods. Grayscale lithography masks (GSLs) increase the number of three-dimensional structure levels compared to multi-layer chromium film (Cr MFT-Masks) without requiring very thin film layers, making quality control of the prototype glass easier.

Claims (7)

1.Prototype glass with multiple film thicknesses consisting of - a translucent, semi-conductive base - A layer of chromium film coated on the transparent base - A thin layer of nickel film coated on the chromium film. And there are some parts of the nickel film covered. On a semi-conductive translucent base 2.Primary glass with multiple film thicknesses according to claim 1 or 2, where the chromium film thickness is less than 100 nm. 3. Prototype glass with various film thicknesses according to claim 1 or 2, where the nickel film layer is Thick that is less than 50 nm. 4. Prototype glass of various film thicknesses according to claim 1 or 2, where the translucent base is made of glass or quartz or other transparent material. 5. Method for constructing prototype glass with chromium and nickel multi-layer film thickness consists of steps a. Arrangement of a semi-conductive base with a chromium film coated on the substrate b. The photosensitive film is coated on the chromium film in the July process, the light is irradiated onto the photoresist layer by the photolytic process. (Photolithography) and clearing (Develop) d. Etching of the chromium film in the part without the photosensitive step, cover and peel the part of the photosensitive film layer. The residue after the etching e. The coating of the photosensitive film on the semiconductor substrate and the chromium film in step D f. The light is applied to the photosensitive film by the photolytic process. Feed (Photolithographv) and clear pattern (Develop) where the exposure is different from the exposure in the NC process, the nickel film is coated on a layer of the photosensitive film. Semi-conductive and chromium substrate h. Removing the photosensitive film layer of the workpiece through the process 6. Method for creating prototype glass with multi-layer film thickness of chromium and nickel type according to claim 5, where nickel film coating is coated by electron beam sublimation technique. (Electron-beam evaporation) 7. Prototype mirror created by means of Clause 5 or 6.