SU704684A1 - Method of cleaning workpieces of aluminium oxide ceramic materials - Google Patents

Description

(54) METHOD FOR CLEANING DETAILS FROM AIBMOOXY) TSNOY - KERASH1KI:

The invention relates to k methods for cleaning the surface of materials, in particular alumina ceramics, and can be used, for example, in the manufacture of optical quaite generators for cleaning the surface of discharge tubes.

The surface of discharge tubes from alumina ceramics has a significant adsorption capacity.

impurities. In addition, the Surface layer due to mechanical treatment in the manufacture of the part is porous and adsorbs gases that are difficult to remove during thermal processing. Under the influence of ion bombardment, desorption of non-abated gases may occur, which shortens the service life of optical quantum generators and in some cases causes them to fail. Thus, in order to achieve sufficient surface cleanliness, it is necessary not only to remove the contaminants from the surface, but also to remove the gas-saturated layer, which should lead to a reduction in gas separation.

There is a known method of cleaning parts from alumina kergmiky, including a ripoivttJBKy М Mcyogtz solution containing ground ester-active substance (SAS), using utevuka and using a six-sided; suiku {,

: Gas separation n 1sl0 chemical oejpaddTkri and suzhu on c) Zyuhe is 7.5 μm l / cm. Gas separation 0.9 micron l / cm is obtained after chemical treatment of ceramics and subsequent drying in an atmosphere free of dust at 250-300s: V

As a result of drying, some of the aideorbay gae.ov are removed by drying, as a result of which the PM is reduced;

5 residual gaseous ceramics. Similar results are obtained by machining parts in a vacuum with and annealing at ..

Odako given (cleaning method not.

0 removes the gas-saturated surface layer and, thus, does not reduce gas separation in the process of thermal vacuum treatment of the device and its operation. .

five

The purpose of the invention is to improve the quality of cleaning parts from alumina ceramics.

Claims (2)

This is achieved in that the parts, after washing, are washed in a washing solution. with surfactant, with nJpiiMeHeHfWeM radiation, additionally treated with sodium hydroxide solution, and the parts are processed with 15-30% sodium hydroxide solution with a temperature of 75-85 ° C for 30-60 minutes. . With such a deeper chemical cleaning of ceramic parts, not only the removal of nano from the surface occurs, but also the removal of the anti-surface porous gaeo saturated layer by etching. As a result, the gas separation of ceramics decreases and the life span of the device increases. The gas separation in this method after degreasing in OP-10, etching in alkali and drying in air is 1.8 µm l / cm. If then the parts are dried in a dust-free atmosphere at a temperature of 250-. 300 ° C, gas separation is 0, 5 µm l / cm. However, due to the fact that the ceramic parts are subject to the degassing operation in a vacuum at 400 ° C, it is unreasonable to include this operation in the technology of cleaning ceramic parts. Example. Processed in the solution OP-10 using ultra sound ceramic tubes are placed in a bath with a working solution containing 25 wt.% Caustic soda heated to 82 ° C. Processing time 40 min. After this, the tubes are washed with hot distilled water, then with cold distilled water and dried in air at a temperature. The gas recovery is 1.8 µm l / cm. EXAMPLE 2 The treatment is carried out as in Example 1, only with the following parameters :; Worker concentration 15 wt.% Of the solution. The temperature of the working 82C solution is optimal for 40 minutes. Processing time After the keratl is treated in the indicated mode, the gas emission is equal to 3.1 µm l / cm. Example 3. : Concentration of the working 30 wt.% solution 82С ,,, Solution temperature 40 min. Treatment time Gas emission 2.5 µm l / cm. Pr m and 4. The treatment is carried out as in Example 1, only with the following parameters; - Working solution temperature Solution concentration 25 wt.% Processing time 40 minutes Gas emission 2.7 µm l / cm EXAMPLE 5, Treatment Carried out as in example 1, only with the following parameters: Temperature of working solution, 25 weight,% Concentration solution 40 min. Processing time Gas release 2.3 µm / cm Example 6, Treatment is carried out as in Example 1, only with those eaten X P f rame x: Concentration of working jaacTBOpa; 25 wt.% Solution temperature 82С Processing time 30 min. Gas injection 3.0 µm l / cm. EXAMPLE 7 The treatment is carried out as in Measure 1, only with the following parameters :. The concentration of the working solution is 25% by weight. The temperature of the solution is 82 ° C. The treatment time is 60 min. The gas release is 2.3 µm l / cm. The choice of the boundary conditions of the parameters is. The process is determined by the value of the separation gas, which should be minimal (without drying — in a dust-free atmosphere; the minimum value of gas separation is about 1.8 µm l / cm). Gas separation at Boundary values of process paraglles increases. In addition, at a lower (less than 15%) concentration of the solution, the etching rate decreases significantly, and at a higher concentration, the solution becomes unstable and precipitation occurs. The same applies to the temperature range. When the temperature of the working solution is below 75 ° C, the rate of etching decreases, and at temperatures above 85 ° C, a flocculent precipitate falls out. The optimal processing time of parts is chosen depending on other parameters of the mode (concentration and temperature of the working solution). Testing tests (aLi that the gas separation of tubes processed in accordance with this method is halved compared to c / it gas separation of tubes) processed in accordance with a known method. In connection with this, the service life of the device increases in 2-3 times. X. The formula of the invention., 1. A method of cleaning parts from alumina-oxide ceramics, including washing in a washing solution containing a surface-active substance, using ultrasound and subsequent drying, tl and h And with that, in order to improve cleaning, you can 7046846 after washing it with additional sodium hydroxide with temperature is melted with sodium hydroxide solution. within 30-60 minutes 2. Method) according to claim 1, of which they are taken into account during the examination and and with the fact that the processing of details is i. The electronic technology of sulfur, I / leu is carried out with a 15-30% solution of vol. 2, 1972, p. 55-60 (prototype) -. Information sources,