SU477417A1 - Digital machine for controlling electron beam microprocessing processes - Google Patents

Description

one

The invention relates to the field of computer technology and can be used for automated control of the production processes of components of integrated circuits based on electronic technology.

Digital machines are known for controlling the processes of electron beam micro-processing of materials, comprising an operational device comprising a beam deflection control unit and a unit for generating temporal and energy processing parameters; control unit of the coordinate table; a block for combining coordinate axes; deflection unit; a buffer memory, which is a memory, distributed over the maschine blocks, a ferrite memory; an information distribution unit and a punched tape program input unit.

The coordinate axis alignment unit compensates for errors in setting the origin of the working surface relative to the origin of the deflection system, and also performs linear displacement of images within one processing area by a distance specified by the program.

However, in addition to this, in integrated microelectronics, typical cases are when the fragments of the topology form new. volume at an angle of a multiple of 90 °, or mirror

by converting some original drawing. The inability to automatically perform these image transformations is a disadvantage of this machine and leads to a decrease in its efficiency as a whole due to the increase in programming time, an increase in the time of unproductive manual labor associated with stuffing tape, an overload and a decrease in the information capacity of the memory of the machine.

The aim of the invention is to improve the efficiency of the machine when reproducing patterns of complex intral circuits.

The essence of the invention is that a block is introduced into the machine that rotates and mirrors the images, which is connected between the coordinate axis alignment unit and the beam deflection unit.

FIG. 1 is a block diagram of the proposed machine; in fig. 2 illustrates an example of pa turning a 90 ° fragment of the topology of an integrated circuit.

The machine consists of a control device 1, which is used to enter programs and control the blocks of the machine; transmitter unit 2 for inputting punched tape programs; storage device 3, intended for storing programs, and control unit 4, pre-accidental for

distributing the input information between the blocks, as well as controlling the interaction of the blocks of the machine.

In addition, the machine includes a buffer storage device 5 for storing the current information, and an on-6 block 6, which calculates the increments of the coordinates of the next points of the trajectory and also forms the time parameters of the beam effect on the material in accordance with a given law of variation of the envelope of the enable pulse and beam shutdown and power processing modes. The coordinate axis alignment unit 7 is intended for linearly displacing images in order to compensate for the error of setting the origin of coordinates or for shifting the pattern within the processing area by the programmed number of steps. The block 8 of angular transformations of images is intended for mirroring a given pattern but drawing it or turning it by an angle,

multiple -. Block 9 rejects converts

,

digital values of the coordinates in the control action to set the beam at a given point of the working surface. The control table control unit 10 is designed to shift the treatment area by a predetermined distance.

The control unit 4 has two-way communications for exchanging control information with the control device 1 via buses ll, the transmitter unit 2 through buses 12, the storage device 3 through buses 13. For accessing the buffer memory 5, the control unit 4 is associated with it bus 14 signals “READING and a length of 15 signals“ RECORD. The exchange of control information between the control block 4 and the block of operations takes place on buses 16 and 17. The exchange of numerical information between the blocks of the machine takes place on the trunk code bus 18-18ii. To control the movement of the coordinate table, block 6 has two-way communications on buses 19 with block 10, and to control the movement of an electron beam - on buses 20 with block 7. From the output of block 7, the codes of current values of coordinates on bus 21 arrive in block 8, from the exit after which, after the transformations associated with the mirror reflection or rotation, they are transmitted via the bus 22 to the deviation block 9.

In addition, the proposed machine contains 23 regulatory actions, to which a deflection system of an electron-beam installation is connected; bus 24 for connecting block 7 to sensors of signals from markers; tires 25 of blanking signals modulating the beam current; acceleration control bus 26; bus 27 for controlling the value of the beam current; tires 28 table and tire drives 29

control of the table rotation drive. The bus 30 receives the block 10 with signals from the table movement sensors.

A work program consisting of individual commands (frame codes) is entered into memory 3 from control device 1 or non-tape. Each command contains information about the beam trajectory, energy and time processing modes, data about the movement of the coordinate table, as well as information about the linear, mirror or angular transformation of the original topology pattern.

The unit 6 of operations according to a predetermined program generates control signals that specify the time and energy parameters of the beam, as well as affect the deflecting system of the electron-beam installation. At the same time, on the substrate installed in the vacuum chamber on the coordinate table, within the deflection area, the specified figures are processed. After completion of processing within this area, block 6 generates control signals to move the coordinate table, which, through block 10, act on the table electric drives.

Control of the movements of the coordinate table is carried out with the help of displacement sensors, the output signals of which are received in block 10 via bus 30.

The reprocessing of the substrate after moving the coordinate table is carried out with preliminary correction of the position of the origin of the treatment area relative to the origin of the coordinates of the deflecting system. The accuracy of the installation of the axes is determined as a result of the finding by the beam of marker marks applied during the initial processing of the substrate.

The calculation of the error is carried out by the joint operation of blocks 6 and 7 when the last signals from the marker signs arrive at the bus 24 input. The calculated error value is transmitted via bus 20 to block 7 and is subsequently realized when the substrate is reprocessed.

The reprocessing program may contain commands for reproducing the previous image in the given coordinate values, as well as the image formed by rotation or mirror transformation of the original.

To reproduce the pattern with these transformations, a command is entered into the machine, in which the indication of its modification is indicated (the mirror image is relative to

X or Y axis, rotate the image by angle-.,

t:, -, and also the magnitude of the displacement of the reference

point, which automatically selects the starting point of the first reproducible pattern. In the future, this command

it is used in the development of all subsequent geometric patterns that constitute the task fragment of the topology of the integrated circuit.

FIG. Figure 2 shows a fragment of the integrated circuit, which is formed by rotating the 90 ° fragment of the fragment 31 specified by the preprocessing program, the following symbols are used for this: o - reference point, o - center of rotation of the image, Xo and YO - coordinates of the reference point, XT- and UT - the current coordinates of the original image, JCM and USM - the values of the displacement of the reference point, Ho to UO - the coordinates of the center of rotation and TP and UTP - the current coordinates of the transformed image.

The increments of the trajectory coordinates calculated in block 6, along bar 20, arrive in block 7, which corrects the coordinate value by the previously calculated error value, and also performs linear coordinate transformation depending on the code on the bar 18io. Codes of current values of coordinates and UT from the output of block 7 via bus 21 enter block 8 of image angular conversion, on the other hand, codes of coordinate values of reference point o (Ko and UO) and center of rotation o (Ho and wo). Block 8 performs transformations, which result in the output of its current values of the coordinates of the pattern (and the UTP) rotated relative to the initial one in accordance with the specified modification of the rotation command.

When the image is rotated, block 8 performs the following coordinate transformations: X, (), () when rotated through an angle of 90 °; Xm: t1 Ho - {- {Ho-Xi), UTP () when turning at an angle

180 °; LTP o- {Yo-UT), UTP U o-b (lo-XT)

when turning at an angle of 270 °.

When mirroring an image, block 8 performs the following calculations:

XTTI X o-f- (AO-Xf), Ut, Wo- (Wo-Ut)

when converting about the X axis; Xf ,, X o- ()

(Wo Ut)

when converting about the y-axis.

The values of the coordinates, expressed in digital form, are transmitted along the bar 22 to deviation block 9, which converts them into regulating influences delivered to the wounds 23 into the deflecting system of the electron-beam installation, moving the beam to the next point of the working surface. After that, unit 6 generates the time and energy parameters of the effect of the beam on the material, generating, in women 25, 26 and 27, control signals for the modulator and the power supply device of the electron beam installation. After working off the time interval specified by the program, the Maschine calculates the next point of the trajectory as described above. Such alternate cycles of calculation of coordinates and processing continue until the end of the reproduction of the transformed fragment of the topology of the integrated circuit.

Subject invention

 A digital mask for controlling electron beam microprocessing processes, comprising a control device, a transmitter unit, a memory device, a control unit, a buffer memory device, an operation unit connected to a code bus and control signals, a coordinate table control unit connected by two-way communications with the block of operations and with the corresponding inputs and outputs of the maschine, the block combining the coordinate axes connected to the code strip to the corresponding input of the maschine and the connected two-sided By means of links with the unit of operations, the outputs of which are connected to the corresponding outputs of the mashina, the deviation block, the outputs of which are connected to the corresponding outputs of the maschina, is necessary so that, in order to increase the efficiency of reproducing complex integrated patterns circuits, the block of angular transformations of images is connected to it, connected to the code bus and to the output of the coordinate axis alignment block, the output of the block of angular transformations of images is connected to the input of the deviation block.

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