SU217166A1 - METHOD OF ELECTROLYTIC CHROMINATION - Google Patents
METHOD OF ELECTROLYTIC CHROMINATIONInfo
- Publication number
- SU217166A1 SU217166A1 SU1094518A SU1094518A SU217166A1 SU 217166 A1 SU217166 A1 SU 217166A1 SU 1094518 A SU1094518 A SU 1094518A SU 1094518 A SU1094518 A SU 1094518A SU 217166 A1 SU217166 A1 SU 217166A1
- Authority
- SU
- USSR - Soviet Union
- Prior art keywords
- electrolytic
- chromination
- electrolyte
- alkyl sulfonate
- chromic
- Prior art date
Links
- WGLPBDUCMAPZCE-UHFFFAOYSA-N trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 8
- UIIMBOGNXHQVGW-UHFFFAOYSA-M NaHCO3 Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 6
- 239000003792 electrolyte Substances 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- -1 sodium alkyl sulfonate Chemical class 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 3
- 235000017557 sodium bicarbonate Nutrition 0.000 description 3
- KRVSOGSZCMJSLX-UHFFFAOYSA-L Chromic acid Chemical compound O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 2
- 239000006260 foam Substances 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 241000566113 Branta sandvicensis Species 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000000717 retained Effects 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Description
При электролитическом хромировании за счет выделени газов имеют место непроизводительные потери хромового ангидрида, доЬтигающие 85%. Используемые в насто щее врем способы снижени потерь хромового ангидрида недостаточно эффективны.When electrolytic chromium plating due to the evolution of gases, there are unproductive losses of chromic anhydride, up to 85%. Currently used methods for reducing the loss of chromic anhydride are not effective enough.
Дл снижени потерь хромового ангидрида дл пенообразовани предложено в электролит вводить алкилсульфонат натри .In order to reduce the loss of chromic anhydride for foaming, it has been proposed to introduce sodium alkyl sulfonate into the electrolyte.
Способ состоит в том, что в раствор хромового электролита, содержащий бикарбонат натри , ввод т алкилсульфонат. Эта смесь образует на поверхности электролита слой пены, Преп тствующий уносу электролита. Алкилсульфонат обладает стойкостью к окислению в растворе хромовой кислоты. Продукты окислени оседают на дно ванны в виде шлама.The method consists in introducing alkylsulfonate into the chromic electrolyte solution containing sodium bicarbonate. This mixture forms a layer of foam on the electrolyte surface, which prevents the electrolyte from being carried away. Alkylsulphonate is resistant to oxidation in chromic acid solution. The oxidation products settle to the bottom of the bath as sludge.
Наличие нены не оказывает вли ни на свойства получающихс осадков хрома. Образующийс при введении 1 г/л смеси слой пены сохран етс на поверхности в течение 16 час. Наличие в смеси бикарбоната натри предотвращает возможность взрыва. Оптимальное количество алкилсульфоната натри - от количества вводимого алкилсульфоната натри и бикарбоната натри .The presence of nene does not affect the properties of the resulting chromium precipitates. The foam layer formed upon the introduction of 1 g / l of the mixture is retained on the surface for 16 hours. The presence of sodium bicarbonate in the mixture prevents the possibility of an explosion. The optimum amount of sodium alkyl sulfonate is based on the amount of sodium alkyl sulfonate and sodium bicarbonate added.
Предмет изобретени Subject invention
Способ электролитического хромировани , отличающийс тем, что, с целью снижени потерь хромового ангидрида дл пенообразовани , в электролит ввод т алкилсульфонат натри .A method of electrolytic chromium plating, characterized in that, in order to reduce the loss of chromic anhydride for foaming, sodium alkyl sulfonate is introduced into the electrolyte.
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SU217166A1 true SU217166A1 (en) |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4588481A (en) * | 1985-03-26 | 1986-05-13 | M&T Chemicals Inc. | Chromium plating bath for producing non-iridescent, adherent, bright chromium deposits at high efficiencies and substantially free of cathodic low current density etching |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4588481A (en) * | 1985-03-26 | 1986-05-13 | M&T Chemicals Inc. | Chromium plating bath for producing non-iridescent, adherent, bright chromium deposits at high efficiencies and substantially free of cathodic low current density etching |
| EP0196053A2 (en) * | 1985-03-26 | 1986-10-01 | M & T Chemicals, Inc. | Chromium plating process for producing non-iridescent, adherent, bright chromium deposits at high efficiencies and substantially free of cathodic low current density etching |
| EP0196053A3 (en) * | 1985-03-26 | 1987-03-25 | M & T Chemicals, Inc. | Chromium plating process for producing non-iridescent, adherent, bright chromium deposits at high efficiencies and substantially free of cathodic low current density etching |
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