SU145102A1 - The method of electrodeposition of indium-nickel alloys - Google Patents

The method of electrodeposition of indium-nickel alloys

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Publication number
SU145102A1
SU145102A1 SU735996A SU735996A SU145102A1 SU 145102 A1 SU145102 A1 SU 145102A1 SU 735996 A SU735996 A SU 735996A SU 735996 A SU735996 A SU 735996A SU 145102 A1 SU145102 A1 SU 145102A1
Authority
SU
USSR - Soviet Union
Prior art keywords
indium
electrodeposition
nickel alloys
electrolyte
alloys
Prior art date
Application number
SU735996A
Other languages
Russian (ru)
Inventor
И.И. Лавров
С.И. Скляренко
ренко С.И. Скл
В.М. Хазан
Original Assignee
И.И. Лавров
ренко С.И. Скл
В.М. Хазан
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by И.И. Лавров, ренко С.И. Скл, В.М. Хазан filed Critical И.И. Лавров
Priority to SU735996A priority Critical patent/SU145102A1/en
Application granted granted Critical
Publication of SU145102A1 publication Critical patent/SU145102A1/en

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Description

Дл  нанесени  жаропрочного антифрикционного покрыти  индийникель примен ют термический способ - пр мое сплавление компонентов . Кроме того, известно и используетс  электролитическое осаждение инди  и его сплавов, а также никел  и его сплавов из сульфаминовых электролитов.In order to apply a heat-resistant antifriction coating on indikel, a thermal method is used - direct fusion of the components. In addition, electrolytic precipitation of indium and its alloys, as well as nickel and its alloys from sulfamine electrolytes, is known and used.

Недостаток существующих способов заключаетс  в значительных потер х инди , неравномерном слое покрыти , а при гор чем способе покрыти  в необходимости работы при высокой температуре.The lack of existing methods consists in significant losses of indium, uneven coating layer, and in the case of hot coating method, it is necessary to operate at high temperature.

Описываемый способ осаждени  сплавов индий-никель осуществл етс  при невысокой температуре и обеспечивает получение равномерного покрыти , хорошо сцепл ющегос  с основой и обладающего хорошим блеском, высокой жаропрочностью и коррозионной устойчивостью . Достигаетс  это тем, что покрытие нанос т электролитическим способом из электролита оптимального состава при удачно подобранном режиме электролиза.The described method for the deposition of indium-nickel alloys is carried out at a low temperature and provides a uniform coating that adheres well to the substrate and has good gloss, high heat resistance and corrosion resistance. This is achieved by the fact that the coating is electrolytically applied from an electrolyte of optimal composition with a well-chosen electrolysis mode.

Электролиз ведут при температуре электролита 40-70° и катодной плотности тока 2-5 а/дм из электролита, содержащего: 50 г/л сульфаминовой кислоты, 50 г/л сернокислого натри  и 0,5-2,0 г/л инди . В качестве нерастворимого анода примен ют графит или платину. В зависимости от содержани  инди  в электролите на катоде осаждаетс  сплав, содержащий 10-40Vo инди . Содержание инди  в сплаве пр мо пропорционально его концентрации в электролите, что видно из таблицы.The electrolysis is carried out at an electrolyte temperature of 40-70 ° and a cathode current density of 2-5 a / dm from an electrolyte containing: 50 g / l of sulfamic acid, 50 g / l of sodium sulfate and 0.5-2.0 g / l of indium. Graphite or platinum is used as the insoluble anode. Depending on the indium content in the electrolyte, an alloy containing 10-40Vo indium is deposited on the cathode. The content of indium in the alloy is directly proportional to its concentration in the electrolyte, as can be seen from the table.

№145102-2Предметизобретени No. 145102-2 of the Invention

Способ электроосаждени  сплавов индий-никель, отличаюш,ийс  тем, что, с целью получени  антифрикционного, жаропрочного сплава с содержанием инди  10-40%, используют электролит, содержащий в The method of electrodeposition of indium-nickel alloys is different from that in order to obtain an anti-friction, heat-resistant alloy with an indium content of 10-40%, an electrolyte containing

сульфаминовой кислоты50,sulfamic acid50,

сернокислого никел  (в пересчете на металл) 50,nickel sulphate (in terms of metal) 50,

инди 0,5-2,0indie 0.5-2.0

при режиме электролиза:electrolysis mode:

плотность тока2-5 а/дм,current density of 2-5 a / dm,

температура40-70°,temperature 40-70 °

анодыграфит или пластикanodes graphite or plastic

SU735996A 1961-06-22 1961-06-22 The method of electrodeposition of indium-nickel alloys SU145102A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SU735996A SU145102A1 (en) 1961-06-22 1961-06-22 The method of electrodeposition of indium-nickel alloys

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SU735996A SU145102A1 (en) 1961-06-22 1961-06-22 The method of electrodeposition of indium-nickel alloys

Publications (1)

Publication Number Publication Date
SU145102A1 true SU145102A1 (en) 1961-11-30

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SU (1) SU145102A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4626324A (en) * 1984-04-30 1986-12-02 Allied Corporation Baths for the electrolytic deposition of nickel-indium alloys on printed circuit boards
US4633050A (en) * 1984-04-30 1986-12-30 Allied Corporation Nickel/indium alloy for use in the manufacture of electrical contact areas electrical devices

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4626324A (en) * 1984-04-30 1986-12-02 Allied Corporation Baths for the electrolytic deposition of nickel-indium alloys on printed circuit boards
US4633050A (en) * 1984-04-30 1986-12-30 Allied Corporation Nickel/indium alloy for use in the manufacture of electrical contact areas electrical devices

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