SU1420491A1 - Apparatus for x-ray analysis of macrostrain - Google Patents

Abstract

The invention relates to the field of scientific instrumentation and can be used for non-destructive macro-stresses in nodes and parts of machines and mechanisms. The purpose of the invention is to increase the productivity of control due to the possibility and speed of restructuring while controlling various types of materials. The device contains a tripod 12 on which the base 5 is rigidly fixed, having an arcuate guide 4, along which the platform 3 moves, carrying an X-ray source 1, a position-sensitive detector 2 and an indicator 7 with an optical signal 8 (L c: 0 th about 4 co

Description

whom center is about the device with a controlled surface of the product. On the platform, 3, mounting holes 9 are made to fasten the radiation source 1 5 which is relocated from one pair of mounting holes to. Pipyrym when switching from one type of catarial to another, by turning the standard 3 relative to the base 5 and fixing it by means of the clamp 6, the angle ui between the normal to the sample surface and the diffraction vector and thus realizes the sin v method when determining the macrostresses in a controlled product, 1 sludge,

The invention relates to scientific design and can be used for non-destructive testing of a cadron, female in a site; and details of machines and mechanisms

 The purpose of the invention is to increase the productivity of control due to the possibility and efficiency of the restructuring of three counterconsists of various types of material;

In the schematic drawing, a predetermined device for determining macroextractions is shown.

The device contains a source 1 installed with the possibility of discrete: who changes between him / eye between him and B: automatically installed position: ion-sensitive (IF) detector 2, ICH detector 2 fixed in naprakpenki axis 00 ,,, diffracted beam on platform 3 with the response part 4 arcuate corpora G1p: Atform 3 is installed with discrete movement on the mating part of the base 5 "Fix 1 orb in the form of a removable lock with a rod (not shown). The device also has an indicator .7 with a measuring probe 8". e source 1 are secured along the direction of the axis 00 of the primary radiation ™ two pins (ke.po thought), as on the platform 3 are paired response ™ radial holes 9 but are located on the straight passage - liTHX through rektgenoopticheskuyu. axis About diffractometric structure. The angle of each of the two springs from the source 1 on the platform 3 is equal to the center. In addition, on the platform 3, there are a number of through holes 10 for the installation of 3 and a lock pin b. Holes | 0 arranged in this way

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that each position of source 1 on platform 3 corresponds to a single position of latch 6, with 3 goJ; between source 1 and latch 6 is d ,, & The angle of the two locking positions of the clamp b is F / 2. In Step 5, holes are filled (not shown),. matched with holes lOj for discrete mounting of platform 3 relative to base 5, Too, for mounting the platform to one of the predetermined angles h.

To install the diffractometric device relative to sample 11. That is, the probe 8 | is used to combine the X-ray optics axis O with the surface of the sample 11f. and for fixing the device in the working position - the holder 12,

The device works as follows

Using the holder 12, the control plane 13 of the platform 3 is installed parallel to the plane of sample 11 and the axis O of the diffractometric device is aligned with the surface of the sample 11. Using the indicator 7 with the probe 8 “Source 1 is installed into a pair of holes 9 on the platform 3 Hi-ieKEtHe eg , marking Fe, In this case, the angle between the source 1 and fixedly mounted on platform 3 The IF-detector 2 is 2i t80 -2epg, where Wolff-Bragg brae to isolate the source-ik and the selected optimal reflection (hki a) test material (Fe).

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40 Clamp 6 is installed in a single through hole 10 with the same marking Ge H; Angle between fic

Sator 6 (hole 10) and source 1 is equal to d.

At the same time, the latch rod 6 is installed through the through hole 10 in the first (clockwise) blind hole to & The base 5, corresponding to the initial angle (. The position of the latch 6 on the base 5 relative to the surface normal of the sample 11 is characterized by the angle / 5. Consistently (by the arrow) install the latch 6 through the same through hole 10 (Fe) into the blind holes on base 5, the deviations of the positions of the diffraction peaks cP (20J for sample 11 from the peak position for the reference (unstressed) material) are determined using the IF detector 2. According to the results obtained, for example, using the sin i method (; the macroscopic contrast in sample 11 is calculated .

The positions of the blind holes on the base 5 correspond to certain values of the angle V, which are constant for any controlled material (Alp Fe, Cu, etc.). To switch from studies of one material (Fe) to another (for example, Cu), it is sufficient to install the source 1 and the clamp 6 into the holes 9 and 10, marked with Cu. The position of the source 1 on the platform 3

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Claims (2)

changes by an angle tf, and clamp 6 by an angle cf / 2. Invention Formula A device for radiographic determinations1 of a voltage array, containing a base with a guide, a platform equipped with an arc-shaped guide-response part and installed with the possibility of rotation relative to the base, an X-ray source and a position-sensitive detector with mutually intersecting the axis of the beam of rays and the detector, mounted on the platform of the means of combining the intersection point of the axes with the reference plane of the act and the indicator with the probe of the control of the accuracy of combining different TeMj that, in order to increase the monitoring performance due to the possibility and speed of restructuring during the control of various types of materials, the X-ray source is removable and installed on the p-shape with the possibility of dismounting along it with a change in the angle of 180 ° -26 between the direction of the primary X-ray beam to the detector axis, the platform is equipped with a means of turning the device relative to the surface of the object for predetermined points and fixing in the position of the installation.