Опытное конструкторско-технологическое бюро по интенсификации тепломассообменных процессов Института технической теплофизики АН УССР
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FIELD: metal chip cleaning. SUBSTANCE: chips are fed to the grid of washing chamber 1 by proportioner 7 and then move through chamber 1 to reload branch pipe 8 under the action of directed vibration, and enter drying chamber 2. Used solution with washed off organic materials is bled through a distributing grid of drying chamber 2 is dried from the solution and enters for briquetting through a charging branch pipe. Washing and drying are performed continuously with vibration acting at an angle of 40-45to the direction of material movement at a frequency of 15-25 Hz at washing and drying zones and at an amplitude of 1-3 microns in the washing zone, and 0.5-2 mm - at the drying zone. EFFECT: intensified cleaning and improved quality. 3 cl, 2 tbl, 4 dwg
SU4018604/02A1985-11-221985-11-22Method and device for cleaning metal chips
SU1358450A1
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