SU1348145A1 - Method of abrasive machining of iceland spar - Google Patents

Description

The invention relates to optics, in particular, to the technology of manufacturing optical components, and can be used in the manufacture of polarization prisms and other details of Iceland spar crystals.

Iceland spar, which has a large birefringence, transparency in the spectral range from 0.22 to 2 microns, and good chemical resistance, is one of the basic materials for the manufacture of crystal polarized radiation.

To the quality of the noiru gulirstans. The iJX of optical centers from the Italian: 1pc spar are of high demands, since the presence of various defects on scratched surfaces (scratches, residual uiepoxoBa- tiness, any errors or deviations from the plane) increases iici light and reduces the quality of the image transmitted by the optical part,

Abrasive processing involves the combination of certain technological operations with the use of special materials, ensuring the obtaining of high-quality polished

surfaces.

There is a known method of abrasive treatment of Iceland spar, including sanding in several transitions with abrasive suspensions consisting of abrasive micro-powders reduced from grit and water as a cooling liquid ml of metal spindle. gnom tool and the subsequent glirovanie suspension of black iron oxide or titanium on the instrument of solid holi resin, the treatment surface of KOTOpoi o is replenished; .- appropriate dissolve ..

However, this method does not provide high-quality surfaces on Iceland spar, located perpendicular to the optical axis of the crystal, since the polishing of the surface results in the exfoliation of the particles of the tetraidal crystals.

To the technical essence of the invention, the method of abrasive treatment of Iceland spar, including WJP with several transitions by abrasive suspensions consisting of abrasive

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50

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corundum (aluminum oxide) microscopic solids with a grain size of 28–10 µm and water as a coolant 1, on a glass cryptographic instrument and subsequent polyro-suspension oiaicnjjioMa on a tool made of SOFT SOFT. PFOVAL RESIN.

 The known method does not provide for obtaining high-quality sparks on the Islamic spar, which are perpendicular to the optical axis of the crystal, since peeling of the crystal tetradal) forms Noah, which makes impossible clean processing of these surfaces). As a result, the quality of polished surfaces is usually not higher than the UP-VO Cl. according to GOST 11 141-7fi.

The core of the invention is to improve the quality of surfaces on i-sln spar, located perpendicularly to them by any other angle. ) 1 to the optical axis of the crystal.

The delivered pellet is achieved by the fact that; - according to the method of abrasive machining of Iceland spar, including 111P11 (} 1пва} -; and there are only abr a 311 transitions in H1; 1 m; ii y with; abrasive micropowders decrease K: iK is granular and compressive liquid, followed by polishing wort, HzieG on hipptal and polal shaft1 | Pom tools, as mother; and 1a grinding and polishing .Nsich HHCTpyNieHTOB take a p.CH. line wax, and nojnijioBaHne are suspended with the following compound ratio of enTtiB., wt%:

(Synthetic diamond grain powder with grain size of 0.5-0.1 µm 9-11 1 and 15% aqueous solution of stillenic acid and 89-91 11; 1 and 1 married 11 method explained in table. I.

The Sun Sh-chi |}) oval tool leaks; and it forms a cellular glass base (cell size 8x8 mm and: g, biy kan.zl 1.5 mm), on the surface H (n (n bee sock layer (softening temperature T of wax) with a thickness of 50.2 mm.

The selected iiijn: (nHa wax layer (.i, 2 mm or less ifa grinding tool is due to the fact that when

, 13

Such a thickness of the layer of low-melting beeswax is influenced by the physicomechanical properties of the glass base on which the wax layer is applied. As a result, a thin layer of beeswax retains high softness and at the same time loses its flow property, i.e. retains the shape of the base. Layer coating: a glass substrate, the working surface of which is ground to the required accuracy, is heated to the melting point of the wax. At the same time, the molten beeswax is poured onto a cold brass grinder, lubricated with silicone fluid, and a heated glass base is quickly applied to the top without pressure. After cooling, a layer of wax on the working surface of the tool is 0.2 mm. The grinding of the waxing tool is done on a brass grinding wheel, the surface of which is machined to an accuracy that corresponds to the final polished surface on Iceland spar. Grinding is carried out with an abrasive suspension, the solid component of which is electrocorundum (alumina) M 5, and the liquid component is distilled water. A necessary condition for grinding is to saturate the surface of the wax with an abrasive.

The wax polishing tool is also a cellular glass base, on the surface of which a layer of beeswax 0.2 mm thick is applied. Tool making is similar to grinding.

The waxing of a polishing tool is carried out with the same brass grinder using a diamond abrasive slurry, the solid component of which is diamond powder AFM / 1/0, and the liquid component is distilled water. In this case, the surface of the wax polishing tool is poorly saturated with abrasive.

The use of beeswax as a material for grinding and polishing tools due to its physical, chemical and elastic-plastic properties.

The essential components of beeswax are esters.

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Q 5 0 5 o

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five

HIGH MOMS: Ku. 1Larns.1X Fatty .H I. l-r.OT

various alcohols. The free acid in wax contains less than 13 ,. Beeswax in its composition contains a small Konvr-iecTPo of polar p-xcioial groups. Therefore, it has a much smaller amount of adhesive adhesion by oTHooieFiUKj to Iceland spar compared to peicotrox resins: 1 used for polishing Iceland spar in the well-known method. As a result, beeswax at w. 5 and a pp. Of OB and a and h; ga; d | t; iro nin-i tané locale 1 -). 2 characters :. on top of the axis.

In addition to Toi Oj, the bee gchggt reads significantly ML HL, i: efi and stagnant deformation and AND. But the value of plastic defnermash and n temperature interpalo 2Ь-3 1 С compared to pitch resin,

The use of water-soluble veins of ethylene glycol as a zhitsky component of ebrazine suspension; in case of lolianization of Iceland spar, the formation of anomalous layers of orellon thickness due to shock absorbers in case of lamination is due to the thickness of the instrument; cases of psm t-STVUYuTsIKh soprpks; H0 .iii; f3 abrazi} - - ny grains with porhnos gyu Hc.naiincKiiro spar. In addition, this ileng.aik-hai prevents the formation of ananin on the polished surface of Iceland spar,

In tab. Table 2 shows the results of prototype 1p and the previous; method of abrasive treatment of Iceland spar.

; The use of synthetic diamond micropowder with a grain size of; 1.0 µm when polishing is due to the requirement to ensure roughness on the polished surface, 05 µm according to GOST 3-2439-74.

The use of diamond micropowders with a grain size of 0.5–0.1 µm in combination with a solution of ethylene glycol during polishing makes it possible to obtain higher-quality surfaces on Iceland spar: R 0.05–0.025 µm according to OST 3-2439-74. The deterioration of the quality of the polished surface with decreasing () (less than 10%) and increasing (more than 15%) of the concentration of ethylene glycol occurs due to a change in the thickness of the anode.

layer of the liquid on the treated surface.

Using the proposed method allows to obtain high-quality surfaces on Iceland spar, located perpendicularly or at any other angle to the optical axis of the crystal, while the number | 0

Brass

Electrocorundum Water

grit

20 microns

Electrocorundum Water

grit

10 microns

Wax pche- Electrocorundum Water

liny grain 5 microns

- Beeswax wax - Diamond mic - Water sowing powder

grit

1, Oh microns

The wax of the pyche- Diamond micron-10-15% aqueous solution of powder with a grain size of 0.1-0.5 micron Lenglycol

A56

This polished surface corresponds to W-IV Cl. according to GOST 11141-76, the roughness R 0.05-0.025, in addition, to introduce optical processing of Iceland spar into mass production, since the proposed method ensures obtaining high-quality surfaces without the use of -. labor-intensive. flourishing operations.

Table 1

The ratio of the solid component of the suspension to the liquid T: W 1: 3

The ratio of the solid component of the suspension to the liquid T: W 1:10

Processing method

Process structure and tools and materials used

Prototype

1. Grinding of 28 µm grit abrasive micropowder onto a glass pyphthalic instrument in the presence of water as the liquid component of the abrasive slurry

2. Elipulating with an abrasive micropowder of corundum with a grain size of 20 µm on a glass polishing tool in the presence of water.

3. Grinding with an abrasive micro corundum powder of 10 µm grit on a glass polishing tool in the presence of water

4.Polishing on polishing Clean polished

the tool from pekokanifolny smop. chrome oxide in the presence of water

unlocked method

1. Grinding with 20 micron grit electro abundant microcorundum on a brass grinding tool in the presence of water as the liquid component of the abrasive slurry.

2. Schiffing by abrasive micro-corundum powder with 10 microns grit on a brass pulp tool in the presence of water

3. Grinding with 5 micron grit electro abundant microcorundum on a wax grinding tool in the presence of water

4.Polishing on a wax polishing tool with a diamond micropowder of 1.0 µm grit in the presence of water

Table 2

The quality of the treated surface, perpendicular to the optical axis

surface P V1I-VIII kp. On the surface there are many localities: for tearing out chunks of crystal ek

1348145

g:

5. Waxing a polishing tool with a synthetic diamond micropowder with a grain size of 0.5–0.1 µm in the presence of a 10–15% aqueous solution of ethylene glycol with a solid content (diamond micropowder) in a polishing suspension in the amount of 9–11 wt.% and a liquid component of 89-91 wt.%

The proposed method with a) Grinding and polishing with diamond with a lower content of micropowder with a grain size of 1.0 µm ethylene glycol is carried out in accordance with paragraphs 1-4 of the process structure of the main proposed method

b) Polishing on a wax polishing tool with a synthetic diamond micropowder with a grain size of 0.5–0.1 µm in the presence of an 8–9% aqueous solution of ethylene glycol with a content of 9–11 wt.% in a polishing slurry and a liquid component 89-91 wt.%

The proposed method with a) Grinding and polishing with an alized content of an ointment micropowder with 1.0 µm ethylene glycol grit is carried out according to points

1-4 structure of the technical process of the main proposed method

b) Polishing on a wax polishing tool with synthetic micropowder with a grain size of 0.5-0.1 µm in the presence of a 16-18% aqueous solution of ethylene glycol with a solid content of 9-11% in the polishing suspension and a liquid composition 89 - 91 wt.%

n

method with microbalo-oval

a) Grinding and polishing with diamond micron powder with a grain size of 1.0 micron is carried out according to clauses 1-4 of the structure of the technical process of the main proposed method

b) Polishing on a wax polishing tool with synthetic diamond micropowder with a grain size of 0.5-0.1 µm in the presence of a 10-15% aqueous solution of ethylene glycol with a solid content (diamond micropowder) in the polishing suspension

10 П11 continued table. 2

P II1-IV cell surface, the surface is clean without

particle extraction by

surface

The cleanness of the polished surface P -V1-V1I class.

The purity of the polished surface of P - -V1-V1I cl.

The cleanness of the polished surface P "° V-VI1 Cl. Scratches appear on the surface due to the fact that abrasive grains are unevenly distributed.

one

ei in the amount of 5-8 wt.% and liquid on the treated part of 92-95 wt.% surface

method with a) Grinding and polishing with an alder-keeping micropowder with a micro-grain size of 1.0 µm is carried out according to the points of the oval 1-4 structure of the technological process of the main proposed method

b) Polishing on a wax polishing tool with a synthetic diamond micropowder with a grain size of 0.5–0.1 in the presence of a 10–15% aqueous solution of ethylene glycol with a solid content of 12–15% by weight in the polishing slurry 85-88 weight, 1

Editor M. Bandura Order 5153/14

Tehredl.Oliynyk Proofreader

Circulation 714 Subscription

VNIIPI USSR State Committee

for inventions and discoveries 113035, Moscow, Zh-35, Raushsk nab., 4/5

Production and printing company, Uzhgorod, st. Project, 4

13481А5

12 Continued table. 2

The purity of the polished surface P VI - VII class. Scratches and dots appear on the surface, since with an abundance of abrasive grains they lump together in the treatment zone, interfering with each other’s work.

Compiled by A. Kozlov

Tehredl.Oliynyk Proofreader L.Pilipenko

Claims (1)

METHOD OF ABLASIVE PROCESSING OF ICELANDAR SPAR, including the steps of processing on grinding and polishing tools in the presence of an abrasive slurry, which is possible due to the fact that, with a whole increase in the quality of surfaces located perpendicular or under another optical axis crystal, as a grinding and polishing tools, take wax. bee, while polishing is carried out by cvci’Hl'meft with the following ratio of components och, May, X: A'1mzzr | .h ': -irk por oshs k o pa; m .'.- rum 30} it is 8.1, microns' 9-11 10-15% complete ethylene glycol solution 89-91