SG90720A1 - Photoresist compositions with cyclic olefin polymers and additive - Google Patents
Photoresist compositions with cyclic olefin polymers and additiveInfo
- Publication number
- SG90720A1 SG90720A1 SG200001282A SG200001282A SG90720A1 SG 90720 A1 SG90720 A1 SG 90720A1 SG 200001282 A SG200001282 A SG 200001282A SG 200001282 A SG200001282 A SG 200001282A SG 90720 A1 SG90720 A1 SG 90720A1
- Authority
- SG
- Singapore
- Prior art keywords
- additive
- cyclic olefin
- olefin polymers
- photoresist compositions
- photoresist
- Prior art date
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US26634299A | 1999-03-11 | 1999-03-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG90720A1 true SG90720A1 (en) | 2002-08-20 |
Family
ID=23014173
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200001282A SG90720A1 (en) | 1999-03-11 | 2000-03-09 | Photoresist compositions with cyclic olefin polymers and additive |
Country Status (3)
Country | Link |
---|---|
CN (1) | CN1267000A (en) |
MY (1) | MY126758A (en) |
SG (1) | SG90720A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070117040A1 (en) * | 2005-11-21 | 2007-05-24 | International Business Machines Corporation | Water castable-water strippable top coats for 193 nm immersion lithography |
US11127592B2 (en) * | 2018-05-31 | 2021-09-21 | Taiwan Semiconductor Manufacturing Co., Ltd. | Photosensitive groups in resist layer |
CN116144015A (en) * | 2021-11-23 | 2023-05-23 | 上海新阳半导体材料股份有限公司 | 193nm dry photoresist additive and preparation method and application thereof |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2327297A (en) * | 1996-03-07 | 1997-09-22 | B.F. Goodrich Company, The | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
EP0880074A1 (en) * | 1997-03-07 | 1998-11-25 | Lucent Technologies Inc. | An energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material |
US5863699A (en) * | 1995-10-12 | 1999-01-26 | Kabushiki Kaisha Toshiba | Photo-sensitive composition |
EP0989462A1 (en) * | 1998-09-23 | 2000-03-29 | Korea Kumho Petrochemical Co. Ltd. | Resist polymer and chemical amplified resist composition containing the same |
-
2000
- 2000-02-02 CN CN 00101840 patent/CN1267000A/en active Pending
- 2000-02-15 MY MYPI20000517A patent/MY126758A/en unknown
- 2000-03-09 SG SG200001282A patent/SG90720A1/en unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5863699A (en) * | 1995-10-12 | 1999-01-26 | Kabushiki Kaisha Toshiba | Photo-sensitive composition |
AU2327297A (en) * | 1996-03-07 | 1997-09-22 | B.F. Goodrich Company, The | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
EP0880074A1 (en) * | 1997-03-07 | 1998-11-25 | Lucent Technologies Inc. | An energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material |
EP0989462A1 (en) * | 1998-09-23 | 2000-03-29 | Korea Kumho Petrochemical Co. Ltd. | Resist polymer and chemical amplified resist composition containing the same |
Also Published As
Publication number | Publication date |
---|---|
CN1267000A (en) | 2000-09-20 |
MY126758A (en) | 2006-10-31 |
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