SG90720A1 - Photoresist compositions with cyclic olefin polymers and additive - Google Patents

Photoresist compositions with cyclic olefin polymers and additive

Info

Publication number
SG90720A1
SG90720A1 SG200001282A SG200001282A SG90720A1 SG 90720 A1 SG90720 A1 SG 90720A1 SG 200001282 A SG200001282 A SG 200001282A SG 200001282 A SG200001282 A SG 200001282A SG 90720 A1 SG90720 A1 SG 90720A1
Authority
SG
Singapore
Prior art keywords
additive
cyclic olefin
olefin polymers
photoresist compositions
photoresist
Prior art date
Application number
SG200001282A
Inventor
Rao Varanasi Pushkara
F Maniscalco Joseph
C Lawson Margaret
Marie Mewherter Ann
M Khojasteh Mahmoud
M Jordhamo George
D Allen Robert
Optiz Juliann
Ito Hiroshi
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of SG90720A1 publication Critical patent/SG90720A1/en

Links

SG200001282A 1999-03-11 2000-03-09 Photoresist compositions with cyclic olefin polymers and additive SG90720A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US26634299A 1999-03-11 1999-03-11

Publications (1)

Publication Number Publication Date
SG90720A1 true SG90720A1 (en) 2002-08-20

Family

ID=23014173

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200001282A SG90720A1 (en) 1999-03-11 2000-03-09 Photoresist compositions with cyclic olefin polymers and additive

Country Status (3)

Country Link
CN (1) CN1267000A (en)
MY (1) MY126758A (en)
SG (1) SG90720A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070117040A1 (en) * 2005-11-21 2007-05-24 International Business Machines Corporation Water castable-water strippable top coats for 193 nm immersion lithography
US11127592B2 (en) * 2018-05-31 2021-09-21 Taiwan Semiconductor Manufacturing Co., Ltd. Photosensitive groups in resist layer
CN116144015A (en) * 2021-11-23 2023-05-23 上海新阳半导体材料股份有限公司 193nm dry photoresist additive and preparation method and application thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2327297A (en) * 1996-03-07 1997-09-22 B.F. Goodrich Company, The Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
EP0880074A1 (en) * 1997-03-07 1998-11-25 Lucent Technologies Inc. An energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
US5863699A (en) * 1995-10-12 1999-01-26 Kabushiki Kaisha Toshiba Photo-sensitive composition
EP0989462A1 (en) * 1998-09-23 2000-03-29 Korea Kumho Petrochemical Co. Ltd. Resist polymer and chemical amplified resist composition containing the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5863699A (en) * 1995-10-12 1999-01-26 Kabushiki Kaisha Toshiba Photo-sensitive composition
AU2327297A (en) * 1996-03-07 1997-09-22 B.F. Goodrich Company, The Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
EP0880074A1 (en) * 1997-03-07 1998-11-25 Lucent Technologies Inc. An energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
EP0989462A1 (en) * 1998-09-23 2000-03-29 Korea Kumho Petrochemical Co. Ltd. Resist polymer and chemical amplified resist composition containing the same

Also Published As

Publication number Publication date
CN1267000A (en) 2000-09-20
MY126758A (en) 2006-10-31

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