SG96547A1 - Photoresist compositions with cyclic olefin polymers and additive - Google Patents

Photoresist compositions with cyclic olefin polymers and additive

Info

Publication number
SG96547A1
SG96547A1 SG200001379A SG200001379A SG96547A1 SG 96547 A1 SG96547 A1 SG 96547A1 SG 200001379 A SG200001379 A SG 200001379A SG 200001379 A SG200001379 A SG 200001379A SG 96547 A1 SG96547 A1 SG 96547A1
Authority
SG
Singapore
Prior art keywords
additive
cyclic olefin
olefin polymers
photoresist compositions
photoresist
Prior art date
Application number
SG200001379A
Inventor
Rao Varanasi Pushkara
D Allen Robert
I Wallow Thomas
Optiz Juliann
A Depietro Richard
C Lawson Margaret
Marie Mewherter Ann
F Maniscalco Joseph
M Jordhamo George
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US26634499A priority Critical
Priority to US26634399A priority
Priority to US09/266,341 priority patent/US6124074A/en
Application filed by Ibm filed Critical Ibm
Publication of SG96547A1 publication Critical patent/SG96547A1/en

Links

SG200001379A 1999-03-11 2000-03-10 Photoresist compositions with cyclic olefin polymers and additive SG96547A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US26634499A true 1999-03-11 1999-03-11
US26634399A true 1999-03-11 1999-03-11
US09/266,341 US6124074A (en) 1999-03-11 1999-03-11 Photoresist compositions with cyclic olefin polymers and hydrophobic non-steroidal multi-alicyclic additives

Publications (1)

Publication Number Publication Date
SG96547A1 true SG96547A1 (en) 2003-06-16

Family

ID=28457732

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200001379A SG96547A1 (en) 1999-03-11 2000-03-10 Photoresist compositions with cyclic olefin polymers and additive

Country Status (1)

Country Link
SG (1) SG96547A1 (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5786131A (en) * 1994-06-27 1998-07-28 International Business Machines Corporation Process for use of photoresist composition with deep ultraviolet radiation
US5801094A (en) * 1997-02-28 1998-09-01 United Microelectronics Corporation Dual damascene process
JPH10239845A (en) * 1997-02-25 1998-09-11 Nec Corp Photosensitive resin composition and pattern forming method
JPH10301283A (en) * 1997-04-28 1998-11-13 Toshiba Corp Photosensitive composition and pattern forming method using the same
US5879857A (en) * 1997-02-21 1999-03-09 Lucent Technologies Inc. Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
EP0930541A1 (en) * 1998-01-16 1999-07-21 JSR Corporation Radiation sensitive resin composition

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5786131A (en) * 1994-06-27 1998-07-28 International Business Machines Corporation Process for use of photoresist composition with deep ultraviolet radiation
US5879857A (en) * 1997-02-21 1999-03-09 Lucent Technologies Inc. Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
JPH10239845A (en) * 1997-02-25 1998-09-11 Nec Corp Photosensitive resin composition and pattern forming method
US5801094A (en) * 1997-02-28 1998-09-01 United Microelectronics Corporation Dual damascene process
JPH10301283A (en) * 1997-04-28 1998-11-13 Toshiba Corp Photosensitive composition and pattern forming method using the same
EP0930541A1 (en) * 1998-01-16 1999-07-21 JSR Corporation Radiation sensitive resin composition

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