SG73661A1 - Apparatus and method for recycling - Google Patents

Apparatus and method for recycling

Info

Publication number
SG73661A1
SG73661A1 SG1999003478A SG1999003478A SG73661A1 SG 73661 A1 SG73661 A1 SG 73661A1 SG 1999003478 A SG1999003478 A SG 1999003478A SG 1999003478 A SG1999003478 A SG 1999003478A SG 73661 A1 SG73661 A1 SG 73661A1
Authority
SG
Singapore
Prior art keywords
recycling
Prior art date
Application number
SG1999003478A
Other languages
English (en)
Inventor
Dominique Belot
Bernard Dhainaut
Takashi Nagamura
Tetsuya Imanaga
Original Assignee
Air Liquide
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide filed Critical Air Liquide
Publication of SG73661A1 publication Critical patent/SG73661A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/02—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping in boilers or stills
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01C—AMMONIA; CYANOGEN; COMPOUNDS THEREOF
    • C01C1/00—Ammonia; Compounds thereof
    • C01C1/02—Preparation, purification or separation of ammonia
    • C01C1/024—Purification

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Heat Treatment Of Water, Waste Water Or Sewage (AREA)
  • Physical Water Treatments (AREA)
SG1999003478A 1998-07-21 1999-07-20 Apparatus and method for recycling SG73661A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20523498A JP4074379B2 (ja) 1998-07-21 1998-07-21 リサイクル装置及びリサイクル方法

Publications (1)

Publication Number Publication Date
SG73661A1 true SG73661A1 (en) 2000-06-20

Family

ID=16503637

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1999003478A SG73661A1 (en) 1998-07-21 1999-07-20 Apparatus and method for recycling

Country Status (5)

Country Link
EP (1) EP0976850A3 (ja)
JP (1) JP4074379B2 (ja)
KR (1) KR20000011828A (ja)
SG (1) SG73661A1 (ja)
TW (1) TW502007B (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6534027B2 (en) * 2000-12-27 2003-03-18 Ashland, Inc. Process for producing ammonia with ultra-low metals content
JP5153980B2 (ja) * 2001-09-27 2013-02-27 パナソニック環境エンジニアリング株式会社 アンモニアの回収装置
US9994457B2 (en) * 2014-04-07 2018-06-12 The Boeing Company System and method for ammonia distillation
CN109481982A (zh) * 2018-10-18 2019-03-19 海宁市英德赛电子有限公司 一种6n4高纯氨的精馏制备设备及工艺
GB2608159A (en) * 2021-06-24 2022-12-28 Process Ltd A system and method for recovering ammonia from an ammonia-containing liquid

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT387987B (de) * 1984-09-26 1989-04-10 Austria Metall Hydrometallurgisches verfahren zur aufarbeitung von anodenschlamm aus der kupferelektrolyse und aehnlicher rohstoffe
US4855023A (en) * 1986-10-06 1989-08-08 Athens, Inc. Method and apparatus for the continuous on-site chemical reprocessing of ultrapure liquids used in semiconductor wafer cleaning
WO1996039265A1 (en) * 1995-06-05 1996-12-12 Startec Ventures, Inc. On-site ammonia purification for semiconductor manufacture

Also Published As

Publication number Publication date
JP4074379B2 (ja) 2008-04-09
KR20000011828A (ko) 2000-02-25
EP0976850A3 (en) 2000-07-19
EP0976850A2 (en) 2000-02-02
JP2000036480A (ja) 2000-02-02
TW502007B (en) 2002-09-11

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