SG52876A1 - Method for the pattern-processing of photosensitive resin composition - Google Patents

Method for the pattern-processing of photosensitive resin composition

Info

Publication number
SG52876A1
SG52876A1 SG1996011891A SG1996011891A SG52876A1 SG 52876 A1 SG52876 A1 SG 52876A1 SG 1996011891 A SG1996011891 A SG 1996011891A SG 1996011891 A SG1996011891 A SG 1996011891A SG 52876 A1 SG52876 A1 SG 52876A1
Authority
SG
Singapore
Prior art keywords
pattern
processing
resin composition
photosensitive resin
photosensitive
Prior art date
Application number
SG1996011891A
Inventor
Toshio Banba
Toshiro Takeda
Original Assignee
Sumitomo Bakelite Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co filed Critical Sumitomo Bakelite Co
Priority to SG1996011891A priority Critical patent/SG52876A1/en
Publication of SG52876A1 publication Critical patent/SG52876A1/en

Links

SG1996011891A 1996-12-21 1996-12-21 Method for the pattern-processing of photosensitive resin composition SG52876A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SG1996011891A SG52876A1 (en) 1996-12-21 1996-12-21 Method for the pattern-processing of photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SG1996011891A SG52876A1 (en) 1996-12-21 1996-12-21 Method for the pattern-processing of photosensitive resin composition

Publications (1)

Publication Number Publication Date
SG52876A1 true SG52876A1 (en) 1998-09-28

Family

ID=20429545

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1996011891A SG52876A1 (en) 1996-12-21 1996-12-21 Method for the pattern-processing of photosensitive resin composition

Country Status (1)

Country Link
SG (1) SG52876A1 (en)

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