SG166747A1 - Fluid handling structure, lithographic apparatus and device manufacturing method - Google Patents

Fluid handling structure, lithographic apparatus and device manufacturing method

Info

Publication number
SG166747A1
SG166747A1 SG201003431-2A SG2010034312A SG166747A1 SG 166747 A1 SG166747 A1 SG 166747A1 SG 2010034312 A SG2010034312 A SG 2010034312A SG 166747 A1 SG166747 A1 SG 166747A1
Authority
SG
Singapore
Prior art keywords
meniscus pinning
fluid handling
pinning system
handling structure
device manufacturing
Prior art date
Application number
SG201003431-2A
Other languages
English (en)
Inventor
Michel Riepen
Nicolaas Rudolf Kemper
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG166747A1 publication Critical patent/SG166747A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8376—Combined

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
SG201003431-2A 2009-05-26 2010-05-17 Fluid handling structure, lithographic apparatus and device manufacturing method SG166747A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US18115809P 2009-05-26 2009-05-26
US23955509P 2009-09-03 2009-09-03

Publications (1)

Publication Number Publication Date
SG166747A1 true SG166747A1 (en) 2010-12-29

Family

ID=42641066

Family Applications (1)

Application Number Title Priority Date Filing Date
SG201003431-2A SG166747A1 (en) 2009-05-26 2010-05-17 Fluid handling structure, lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (1) US8547523B2 (ja)
EP (1) EP2256553B1 (ja)
JP (2) JP5001407B2 (ja)
KR (1) KR101131075B1 (ja)
CN (1) CN101900949B (ja)
SG (1) SG166747A1 (ja)
TW (1) TWI424280B (ja)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8634053B2 (en) * 2006-12-07 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2131241B1 (en) * 2008-05-08 2019-07-31 ASML Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
NL2005089A (nl) * 2009-09-23 2011-03-28 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
NL2005610A (en) 2009-12-02 2011-06-06 Asml Netherlands Bv Lithographic apparatus and surface cleaning method.
NL2005655A (en) 2009-12-09 2011-06-14 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
NL2005951A (en) * 2010-02-02 2011-08-03 Asml Netherlands Bv Lithographic apparatus and a device manufacturing method.
NL2006054A (en) 2010-02-09 2011-08-10 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
NL2005974A (en) 2010-02-12 2011-08-15 Asml Netherlands Bv Lithographic apparatus and a device manufacturing method.
NL2006244A (en) 2010-03-16 2011-09-19 Asml Netherlands Bv Lithographic apparatus, cover for use in a lithographic apparatus and method for designing a cover for use in a lithographic apparatus.
NL2006203A (en) * 2010-03-16 2011-09-19 Asml Netherlands Bv Cover for a substrate table, substrate table for a lithographic apparatus, lithographic apparatus, and device manufacturing method.
NL2006389A (en) 2010-04-15 2011-10-18 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and a device manufacturing method.
EP2381310B1 (en) 2010-04-22 2015-05-06 ASML Netherlands BV Fluid handling structure and lithographic apparatus
NL2006615A (en) 2010-05-11 2011-11-14 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
JP5313293B2 (ja) * 2010-05-19 2013-10-09 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、リソグラフィ装置で使用する流体ハンドリング構造およびデバイス製造方法
NL2007182A (en) * 2010-08-23 2012-02-27 Asml Netherlands Bv Fluid handling structure, module for an immersion lithographic apparatus, lithographic apparatus and device manufacturing method.
NL2007453A (en) 2010-10-18 2012-04-19 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2008980A (en) * 2011-07-11 2013-01-14 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2008979A (en) * 2011-07-11 2013-01-14 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2009139A (en) 2011-08-05 2013-02-06 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2009271A (en) 2011-09-15 2013-03-18 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2009692A (en) 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
NL2009899A (en) 2011-12-20 2013-06-24 Asml Netherlands Bv A pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method.
AU344271S (en) * 2012-05-02 2012-09-07 Samsung Electronics Co Ltd Display screen for an electronic device
US9891541B2 (en) 2012-05-17 2018-02-13 Asml Netherlands B.V. Thermal conditioning unit, lithographic apparatus and device manufacturing method
CN107367907B (zh) 2012-05-29 2019-05-03 Asml荷兰有限公司 支撑装置、光刻装置和器件制造方法
WO2013178438A1 (en) 2012-05-29 2013-12-05 Asml Netherlands B.V. Object holder and lithographic apparatus
WO2014096299A1 (en) 2012-12-20 2014-06-26 Asml Netherlands B.V. Lithographic apparatus and table for use in such an apparatus
WO2015028202A1 (en) 2013-08-30 2015-03-05 Asml Netherlands B.V. Immersion lithographic apparatus
CN106030413B (zh) 2014-02-20 2018-09-14 Asml荷兰有限公司 光刻设备和器件制造方法
US10551748B2 (en) 2014-12-19 2020-02-04 Asml Netherlands B.V. Fluid handling structure, a lithographic apparatus and a device manufacturing method
KR20230048456A (ko) 2016-01-13 2023-04-11 에이에스엠엘 네델란즈 비.브이. 유체 핸들링 구조체 및 리소그래피 장치
NL2019453A (en) 2016-09-12 2018-03-15 Asml Netherlands Bv Fluid handling structure for lithographic apparatus
CN114294460A (zh) 2016-10-20 2022-04-08 Asml荷兰有限公司 压力控制阀、用于光刻设备的流体处理结构和光刻设备
CN110088686B (zh) 2016-12-14 2021-11-16 Asml荷兰有限公司 光刻设备及器件制造方法
US10534271B2 (en) 2017-01-26 2020-01-14 Asml Netherlands B.V. Lithography apparatus and a method of manufacturing a device
USD1025031S1 (en) * 2020-09-17 2024-04-30 thatgamecompany, Inc. Near-field communication enabled smart device

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8021A (en) * 1851-04-01 Brick-press
US4509852A (en) 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
US7367345B1 (en) * 2002-09-30 2008-05-06 Lam Research Corporation Apparatus and method for providing a confined liquid for immersion lithography
SG135052A1 (en) 2002-11-12 2007-09-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1420300B1 (en) 2002-11-12 2015-07-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7394521B2 (en) 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7701550B2 (en) * 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7423720B2 (en) * 2004-11-12 2008-09-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7397533B2 (en) 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE602006012746D1 (de) * 2005-01-14 2010-04-22 Asml Netherlands Bv Lithografische Vorrichtung und Herstellungsverfahren
US7834974B2 (en) * 2005-06-28 2010-11-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4125315B2 (ja) * 2005-10-11 2008-07-30 キヤノン株式会社 露光装置及びデバイス製造方法
US7675604B2 (en) 2006-05-04 2010-03-09 Taiwan Semiconductor Manufacturing Company, Ltd. Hood for immersion lithography
US8144305B2 (en) * 2006-05-18 2012-03-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8634053B2 (en) 2006-12-07 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4902505B2 (ja) * 2006-12-07 2012-03-21 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置およびデバイス製造方法
JP2008147577A (ja) * 2006-12-13 2008-06-26 Canon Inc 露光装置及びデバイス製造方法
EP2131241B1 (en) * 2008-05-08 2019-07-31 ASML Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
US8421993B2 (en) * 2008-05-08 2013-04-16 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
JP4922359B2 (ja) * 2008-07-25 2012-04-25 エーエスエムエル ネザーランズ ビー．ブイ． 流体ハンドリング構造、リソグラフィ装置及びデバイス製造方法

Also Published As

Publication number Publication date
CN101900949B (zh) 2015-01-21
KR101131075B1 (ko) 2012-03-30
EP2256553B1 (en) 2016-05-25
EP2256553A1 (en) 2010-12-01
JP2012156557A (ja) 2012-08-16
JP5661064B2 (ja) 2015-01-28
TWI424280B (zh) 2014-01-21
JP2010278432A (ja) 2010-12-09
KR20100127720A (ko) 2010-12-06
US8547523B2 (en) 2013-10-01
JP5001407B2 (ja) 2012-08-15
CN101900949A (zh) 2010-12-01
US20100313974A1 (en) 2010-12-16
TW201113650A (en) 2011-04-16

Similar Documents

Publication Publication Date Title
SG166747A1 (en) Fluid handling structure, lithographic apparatus and device manufacturing method
MX2009009274A (es) Sistemas de limpieza de tuberias.
SG157283A1 (en) Fluid handling structure, lithographic apparatus and device manufacturing method
EP2197408A4 (en) SYSTEMS, METHOD AND DEVICE FOR DIFFERENTIAL AIR PRESSURE EQUIPMENT
WO2011136888A9 (en) Fluid flow distribution device
IL209971A (en) Flow Sensor System, Spray Generation System and Method to Operate Flow Sensor System
BRPI1004914A2 (pt) "aparelhos, sistemas, e métodos para o desempenho melhorado de um sistema pressurizado"
FR2944775B1 (fr) Procede de deplacement d'un aeronef au sol
BRPI1013148A2 (pt) método e aparelho para despachar uma realimentação de indicador de qualidade de canal em um sistema multiportadora.
ZA200805707B (en) A method and a system for performing maintenance on a membrane used for pressure retarded osmosis
FR2930973B1 (fr) Procede et dispositif de mise en oeuvre des inverseurs de poussee d'un aeronef
FR3025801B1 (fr) Composition de liquide, notamment encre, pour l'impression par jet continu devie binaire, a gouttes non chargees, utilisation de ladite composition, procede de marquage, et substrat marque.
BRPI1008575A2 (pt) método de processamento de um fluxo gráfico, aparelho para processamento de um fluxo gráfico, e meio de armazenamento legível por computador
BR112013032093A2 (pt) método de impressão, sistema de impressão e meio de armazenamento legível por máquina tangível
FR2959906B1 (fr) Procede et dispositif pour la generation d'un jet de plasma non-isothermique.
FR2918037B1 (fr) Procede de maintenance d'un reservoir d'aeronef.
WO2013037962A3 (en) Microfluidic device
BRPI0819427A2 (pt) "dispositivo para a ebulição contínua do mosto de cerveja, sistema de ebulição do mosto de cerveja e método para a ebulição contínua do mosto de cerveja"
FI20105361A (fi) Laitteisto paperikoneen tyhjöjärjestelmän vedenerotukseen sekä sitä hyödyntävä menetelmä
FR2993573B1 (fr) Procede d'isolement de microorganismes sur un milieu de culture et dispositif associe
MX336128B (es) Un producto secuestrante de hidrocarburos, metodo para obtener el producto, metodo para el secuestro de hidrocarburos y disposicion paral el secuestro de hidrocarburos.
FR2998541B1 (fr) Procede d'agencement d'un systeme de flottabilite sur un aeronef, systeme de flottabilite pour aeronef, et aeronef
WO2011146603A3 (en) Indicator marks on a roll of label stock
WO2011139402A8 (en) Removing a sheet from the surface of a melt using gas jets
FR2925670B1 (fr) Procede d'alignement autonome de centrale inertielle pour instrument de bord pouvant equiper un aeronef et instrument de bord pouvant utiliser un tel procede