SG151190A1 - Radiation-sensitive resin composition for forming colored layer and color filter - Google Patents

Radiation-sensitive resin composition for forming colored layer and color filter

Info

Publication number
SG151190A1
SG151190A1 SG200806544-3A SG2008065443A SG151190A1 SG 151190 A1 SG151190 A1 SG 151190A1 SG 2008065443 A SG2008065443 A SG 2008065443A SG 151190 A1 SG151190 A1 SG 151190A1
Authority
SG
Singapore
Prior art keywords
radiation
resin composition
colored layer
sensitive resin
color filter
Prior art date
Application number
SG200806544-3A
Inventor
Masashi Arai
Tatsuyoshi Kawamoto
Tomohiro Takami
Kazuhiro Kobayashi
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of SG151190A1 publication Critical patent/SG151190A1/en

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Liquid Crystal (AREA)

Abstract

RADIATION-SENSITIVE RESIN COMPOSITION FOR FORMING COLORED LAYER AND COLOR FILTER There is provided a radiation-sensitive resin composition for forming a colored layer which can form a color filter not causing "burn-in" at a high product yield, and has high solubility in a cleaning solvent even after drying. The radiation-sensitive resin composition for forming the colored layer contains (A) a colorant,(B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator, wherein the alkali-soluble resin (B) contains a copolymer produced by polymerizing a polymerizable unsaturated compound containing (bl) at least one selected from the group consisting of polymerizable unsaturated carboxylic acids and polymerizable unsaturated carboxylic acid anhydrides in the presence of a compound represented by the following formula (1): wherein Z1 and Z2 represent an alkyl group having 4 to 18 carbon atoms or an optionally substituted benzyl group.
SG200806544-3A 2007-09-14 2008-09-08 Radiation-sensitive resin composition for forming colored layer and color filter SG151190A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007238639A JP4946748B2 (en) 2007-09-14 2007-09-14 Radiation-sensitive resin composition for forming colored layer and color filter

Publications (1)

Publication Number Publication Date
SG151190A1 true SG151190A1 (en) 2009-04-30

Family

ID=40477306

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200806544-3A SG151190A1 (en) 2007-09-14 2008-09-08 Radiation-sensitive resin composition for forming colored layer and color filter

Country Status (5)

Country Link
JP (1) JP4946748B2 (en)
KR (1) KR20090028466A (en)
CN (1) CN101387830B (en)
SG (1) SG151190A1 (en)
TW (1) TWI431417B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5168120B2 (en) * 2008-12-12 2013-03-21 Ｊｓｒ株式会社 Radiation-sensitive resin composition, spacer and protective film for liquid crystal display element, and method for forming them
JP5899798B2 (en) * 2011-10-26 2016-04-06 日立化成株式会社 Photosensitive resin composition, photosensitive element, resist pattern forming method and printed wiring board manufacturing method
JP6078970B2 (en) * 2012-03-30 2017-02-15 住友化学株式会社 Colored photosensitive resin composition
JP2021017498A (en) * 2019-07-19 2021-02-15 日本テルペン化学株式会社 Production method of polymer using disulfide compound

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2779982B2 (en) * 1991-06-19 1998-07-23 富士写真フイルム株式会社 Photosensitive composition
US5858616A (en) * 1995-10-13 1999-01-12 Hitachi Chemical Company, Ltd. Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the same
CN1519260A (en) * 2003-01-20 2004-08-11 上海华谊（集团）公司 Method of controllable free radical polymerization by using sulfid of amino thiocarbonyl as chain transfer agent
TW200502682A (en) * 2003-03-25 2005-01-16 Sumitomo Chemical Co Process for forming hardened resin pattern
JP4825405B2 (en) * 2003-05-08 2011-11-30 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー Photoresist compositions and methods for their preparation
DE602005020603D1 (en) * 2004-05-12 2010-05-27 Du Pont SYNTHESIS OF TRITHIOCARBONATE RAFT AGENTIA AND INTERMEDIATE PRODUCTS THEREOF
JP4923496B2 (en) * 2005-02-18 2012-04-25 Ｊｓｒ株式会社 Radiation sensitive resin composition for color filter and color filter
CN101258169B (en) * 2005-09-08 2011-01-19 Jsr株式会社 Radiation-sensitive resin composition and color filters
JP2009063895A (en) * 2007-09-07 2009-03-26 Fujifilm Corp Curable composition, color filter using the same, and method for manufacturing color filter

Also Published As

Publication number Publication date
CN101387830A (en) 2009-03-18
JP2009069547A (en) 2009-04-02
KR20090028466A (en) 2009-03-18
JP4946748B2 (en) 2012-06-06
TWI431417B (en) 2014-03-21
CN101387830B (en) 2012-10-03
TW200923575A (en) 2009-06-01

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