SG144824A1 - High density, low oxygen re and re-based consolidated powder materials for use as deposition sources & methods of making same - Google Patents
High density, low oxygen re and re-based consolidated powder materials for use as deposition sources & methods of making sameInfo
- Publication number
- SG144824A1 SG144824A1 SG200800180-2A SG2008001802A SG144824A1 SG 144824 A1 SG144824 A1 SG 144824A1 SG 2008001802 A SG2008001802 A SG 2008001802A SG 144824 A1 SG144824 A1 SG 144824A1
- Authority
- SG
- Singapore
- Prior art keywords
- powder
- deposition sources
- low oxygen
- methods
- high density
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/05—Mixtures of metal powder with non-metallic powder
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
- B22F2998/10—Processes characterised by the sequence of their steps
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Powder Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
Abstract
HIGH DENSITY, LOW OXYGEN RE AND RE-BASED CONSOLIDATED POWDER MATERIALS FOR USE AS DEPOSITION SOURCES & METHODS OF MAKING SAME A method of making Re and Re-based materials comprises steps of: providing a Re powder starting material or a Re powder starting material and at least one additional powder material; subjecting at least the Re powder to a first degassing treatment for reducing the oxygen content thereof; increasing the density of the degassed Re powder or a mixture of the degassed Re powder and the at least one additional powder material to form a green billet; subjecting the billet to a second degassing treatment to further reduce the oxygen content; and consolidating the billet to form a consolidated material with greater than about 95% of theoretical density and low oxygen content below about 200 ppm for Re and below about 500 ppm for Re-based materials formed from the mixture, excluding oxygen from non-metallic compounds and ceramics. Materials so produced are useful in the manufacture of deposition sources such as sputtering targets. (Figure 1)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US87941807P | 2007-01-08 | 2007-01-08 | |
US90763307P | 2007-04-13 | 2007-04-13 | |
US11/969,172 US20080166255A1 (en) | 2007-01-08 | 2008-01-03 | High density, low oxygen re and re-based consolidated powder materials for use as deposition sources & methods of making same |
Publications (1)
Publication Number | Publication Date |
---|---|
SG144824A1 true SG144824A1 (en) | 2008-08-28 |
Family
ID=39608168
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200800180-2A SG144824A1 (en) | 2007-01-08 | 2008-01-08 | High density, low oxygen re and re-based consolidated powder materials for use as deposition sources & methods of making same |
Country Status (3)
Country | Link |
---|---|
US (1) | US20080166255A1 (en) |
SG (1) | SG144824A1 (en) |
TW (1) | TW200912010A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10675685B2 (en) | 2014-01-14 | 2020-06-09 | Raytheon Technologies Corporation | Method for preventing powder depletion/contamination during consolidation process |
US9963344B2 (en) * | 2015-01-21 | 2018-05-08 | National Technology & Engineering Solution of Sandia, LLC | Method to synthesize bulk iron nitride |
WO2017182361A1 (en) * | 2016-04-18 | 2017-10-26 | Metalvalue Sas | Seamless metal tubes |
-
2008
- 2008-01-03 US US11/969,172 patent/US20080166255A1/en not_active Abandoned
- 2008-01-07 TW TW097100539A patent/TW200912010A/en unknown
- 2008-01-08 SG SG200800180-2A patent/SG144824A1/en unknown
Also Published As
Publication number | Publication date |
---|---|
US20080166255A1 (en) | 2008-07-10 |
TW200912010A (en) | 2009-03-16 |
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