SG133499A1 - Cleaning compound and method and system for using the cleaning compound - Google Patents
Cleaning compound and method and system for using the cleaning compoundInfo
- Publication number
- SG133499A1 SG133499A1 SG200608344-8A SG2006083448A SG133499A1 SG 133499 A1 SG133499 A1 SG 133499A1 SG 2006083448 A SG2006083448 A SG 2006083448A SG 133499 A1 SG133499 A1 SG 133499A1
- Authority
- SG
- Singapore
- Prior art keywords
- cleaning
- cleaning compound
- fatty acid
- substrate
- weight percent
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title abstract 8
- 150000001875 compounds Chemical class 0.000 title abstract 5
- 238000000034 method Methods 0.000 title abstract 3
- 235000014113 dietary fatty acids Nutrition 0.000 abstract 3
- 229930195729 fatty acid Natural products 0.000 abstract 3
- 239000000194 fatty acid Substances 0.000 abstract 3
- 150000004665 fatty acids Chemical class 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/02—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by distortion, beating, or vibration of the surface to be cleaned
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D17/00—Detergent materials or soaps characterised by their shape or physical properties
- C11D17/0008—Detergent materials or soaps characterised by their shape or physical properties aqueous liquid non soap compositions
- C11D17/0013—Liquid compositions with insoluble particles in suspension
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D17/00—Detergent materials or soaps characterised by their shape or physical properties
- C11D17/0008—Detergent materials or soaps characterised by their shape or physical properties aqueous liquid non soap compositions
- C11D17/0017—Multi-phase liquid compositions
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2075—Carboxylic acids-salts thereof
- C11D3/2079—Monocarboxylic acids-salts thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/261—Alcohols; Phenols
- C11D7/262—Alcohols; Phenols fatty or with at least 8 carbon atoms in the alkyl or alkenyl chain
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D9/00—Compositions of detergents based essentially on soap
- C11D9/02—Compositions of detergents based essentially on soap on alkali or ammonium soaps
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D9/00—Compositions of detergents based essentially on soap
- C11D9/04—Compositions of detergents based essentially on soap containing compounding ingredients other than soaps
- C11D9/22—Organic compounds, e.g. vitamins
- C11D9/26—Organic compounds, e.g. vitamins containing oxygen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D9/00—Compositions of detergents based essentially on soap
- C11D9/04—Compositions of detergents based essentially on soap containing compounding ingredients other than soaps
- C11D9/22—Organic compounds, e.g. vitamins
- C11D9/26—Organic compounds, e.g. vitamins containing oxygen
- C11D9/267—Organic compounds, e.g. vitamins containing oxygen containing free fatty acids
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/16—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions using inhibitors
- C23G1/18—Organic inhibitors
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Emergency Medicine (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Detergent Compositions (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US75537705P | 2005-12-30 | 2005-12-30 | |
US11/347,154 US7696141B2 (en) | 2003-06-27 | 2006-02-03 | Cleaning compound and method and system for using the cleaning compound |
Publications (1)
Publication Number | Publication Date |
---|---|
SG133499A1 true SG133499A1 (en) | 2007-07-30 |
Family
ID=37963650
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG2012096426A SG187413A1 (en) | 2005-12-30 | 2006-11-29 | Cleaning compound and method and system for using the cleaning compound |
SG200608344-8A SG133499A1 (en) | 2005-12-30 | 2006-11-29 | Cleaning compound and method and system for using the cleaning compound |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG2012096426A SG187413A1 (en) | 2005-12-30 | 2006-11-29 | Cleaning compound and method and system for using the cleaning compound |
Country Status (7)
Country | Link |
---|---|
US (3) | US7696141B2 (ja) |
EP (1) | EP1803803A3 (ja) |
JP (1) | JP4732326B2 (ja) |
KR (2) | KR20070072377A (ja) |
MY (1) | MY141193A (ja) |
SG (2) | SG187413A1 (ja) |
TW (3) | TW201430936A (ja) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7737097B2 (en) * | 2003-06-27 | 2010-06-15 | Lam Research Corporation | Method for removing contamination from a substrate and for making a cleaning solution |
US9236279B2 (en) * | 2003-06-27 | 2016-01-12 | Lam Research Corporation | Method of dielectric film treatment |
US7862662B2 (en) * | 2005-12-30 | 2011-01-04 | Lam Research Corporation | Method and material for cleaning a substrate |
TWI324797B (en) * | 2005-04-05 | 2010-05-11 | Lam Res Corp | Method for removing particles from a surface |
US8388762B2 (en) * | 2007-05-02 | 2013-03-05 | Lam Research Corporation | Substrate cleaning technique employing multi-phase solution |
US20090211596A1 (en) * | 2007-07-11 | 2009-08-27 | Lam Research Corporation | Method of post etch polymer residue removal |
US7749327B2 (en) * | 2007-11-01 | 2010-07-06 | Micron Technology, Inc. | Methods for treating surfaces |
US8084406B2 (en) | 2007-12-14 | 2011-12-27 | Lam Research Corporation | Apparatus for particle removal by single-phase and two-phase media |
US7981221B2 (en) * | 2008-02-21 | 2011-07-19 | Micron Technology, Inc. | Rheological fluids for particle removal |
US8585825B2 (en) * | 2008-10-30 | 2013-11-19 | Lam Research Corporation | Acoustic assisted single wafer wet clean for semiconductor wafer process |
US8105997B2 (en) * | 2008-11-07 | 2012-01-31 | Lam Research Corporation | Composition and application of a two-phase contaminant removal medium |
US8739805B2 (en) * | 2008-11-26 | 2014-06-03 | Lam Research Corporation | Confinement of foam delivered by a proximity head |
US8845812B2 (en) * | 2009-06-12 | 2014-09-30 | Micron Technology, Inc. | Method for contamination removal using magnetic particles |
US8246755B2 (en) * | 2009-11-05 | 2012-08-21 | Lam Research Corporation | In situ morphological characterization of foam for a proximity head |
CA2856196C (en) | 2011-12-06 | 2020-09-01 | Masco Corporation Of Indiana | Ozone distribution in a faucet |
US10767143B2 (en) * | 2014-03-06 | 2020-09-08 | Sage Electrochromics, Inc. | Particle removal from electrochromic films using non-aqueous fluids |
JP2015207712A (ja) | 2014-04-22 | 2015-11-19 | 三菱電機株式会社 | 洗浄液、洗浄設備、および実装基板の洗浄方法 |
CN115093008B (zh) | 2015-12-21 | 2024-05-14 | 德尔塔阀门公司 | 包括消毒装置的流体输送系统 |
WO2021073718A1 (en) * | 2019-10-15 | 2021-04-22 | Henkel Ag & Co. Kgaa | Photoresist stripping composition |
CN114634846A (zh) * | 2020-12-16 | 2022-06-17 | 泉芯集成电路制造(济南)有限公司 | 一种醇胺类清洗液的润洗溶液 |
CN113916630A (zh) * | 2021-10-14 | 2022-01-11 | 安徽江淮汽车集团股份有限公司 | 基于消光法的变速箱润滑油清洁度检测预处理方法 |
Family Cites Families (42)
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US1901434A (en) * | 1928-10-15 | 1933-03-14 | Arthur R Cade | Germicidal and detergent substances |
US2356792A (en) * | 1938-11-05 | 1944-08-29 | Minnesota Mining & Mfg | Liquid composition for polishing and the like |
US2619495A (en) * | 1948-10-26 | 1952-11-25 | Pittsburgh Plate Glass Co | Preparation of wool grease unsaponifiable matter |
US2530810A (en) * | 1949-08-23 | 1950-11-21 | Pittsburgh Plate Glass Co | Separation of unsaponifiable matter from tall oil residue |
FR1078204A (fr) * | 1953-02-24 | 1954-11-16 | Parker Ste Continentale | Procédé de réglage du moussage des solutions aqueuses de savon et solution en résultant |
US3360476A (en) * | 1964-03-19 | 1967-12-26 | Fmc Corp | Liquid heavy duty cleaner and disinfectant |
US3957966A (en) * | 1972-05-19 | 1976-05-18 | Gaf Corporation | Stabilized vitamin food coatings |
GB1427341A (en) * | 1972-05-22 | 1976-03-10 | Unilever Ltd | Liquid soap product |
DE2823002B2 (de) * | 1978-05-26 | 1981-06-04 | Chemische Werke München Otto Bärlocher GmbH, 8000 München | Verfahren zur Herstellung von Metallseifengranulat |
US4387040A (en) * | 1981-09-30 | 1983-06-07 | Colgate-Palmolive Company | Liquid toilet soap |
GB2144763B (en) * | 1983-08-11 | 1987-10-28 | Procter & Gamble | Liquid detergent compositions with magnesium salts |
US5413727A (en) * | 1985-06-14 | 1995-05-09 | Colgate Palmolive Co. | Thixotropic aqueous compositions containing long chain saturated fatty acid stabilizers |
US4973422A (en) * | 1989-01-17 | 1990-11-27 | The Procter & Gamble Company | Perfume particles for use in cleaning and conditioning compositions |
US5807810A (en) * | 1989-08-24 | 1998-09-15 | Albright & Wilson Limited | Functional fluids and liquid cleaning compositions and suspending media |
US5964692A (en) * | 1989-08-24 | 1999-10-12 | Albright & Wilson Limited | Functional fluids and liquid cleaning compositions and suspending media |
WO1992003528A1 (en) * | 1990-08-22 | 1992-03-05 | R & C Products Pty. Ltd. | Hard surface cleaner |
US5147574A (en) * | 1991-03-05 | 1992-09-15 | The Procter & Gamble Company | Stable liquid soap personal cleanser |
US5264047A (en) * | 1991-07-17 | 1993-11-23 | Church & Dwight Co., Inc. | Low foaming effective hydrotrope |
FR2723377B1 (fr) * | 1994-08-02 | 1997-01-10 | Commerciale Du Rhone Sincora S | Compositions nettoyantes ou decapantes, et preparations les contenant |
US5820695A (en) * | 1994-09-06 | 1998-10-13 | S. C. Johnson & Son, Inc. | Single-phase soap compositions |
US5633223A (en) * | 1995-08-30 | 1997-05-27 | Lever Brothers Company, Division Of Conopco, Inc. | Heavy duty liquid compositions comprising structuring solids of defined dimension and morphology |
JPH09157692A (ja) * | 1995-10-04 | 1997-06-17 | Mitsubishi Chem Corp | 表面処理組成物及び基体表面処理方法 |
US5674826A (en) * | 1996-01-02 | 1997-10-07 | Mcmullen; Robert W. | Cleaning composition |
US5719114A (en) * | 1996-06-28 | 1998-02-17 | Colgate Palmolive Company | Cleaning composition in various liquid forms comprising acaricidal agents |
JPH10298600A (ja) * | 1997-04-24 | 1998-11-10 | Kao Corp | 液体洗浄剤組成物 |
JP3567971B2 (ja) * | 1998-11-10 | 2004-09-22 | 日立プラント建設株式会社 | ガラス基板の洗浄液及び洗浄方法 |
US6362156B1 (en) * | 1998-12-16 | 2002-03-26 | Unilever Home & Personal Care, Usa, Division Of Conopco, Inc. | Pourable transparent/translucent liquid detergent composition with suspended particles |
US6849581B1 (en) * | 1999-03-30 | 2005-02-01 | Bj Services Company | Gelled hydrocarbon compositions and methods for use thereof |
WO2000078904A1 (en) * | 1999-06-17 | 2000-12-28 | The Clorox Company | Suspoemulsion system for delivery of actives |
FR2795960B1 (fr) * | 1999-07-05 | 2001-10-19 | Sanofi Elf | Microemulsions stables pour l'administration d'acides gras a l'homme ou a l'animal, et utilisation de ces microemulsions |
AU7971201A (en) * | 2000-07-06 | 2002-01-14 | Huntsman Int Llc | Solid-suspending systems |
US6395691B1 (en) * | 2001-02-28 | 2002-05-28 | Unilever Home & Personal Care Usa Division Of Conopco, Inc. | Personal wash compositions containing particle-in-oil dispersion |
US6914040B2 (en) * | 2001-05-04 | 2005-07-05 | Procter & Gamble Company | Process for treating a lipophilic fluid in the form of a siloxane emulsion |
US6797683B2 (en) * | 2002-03-04 | 2004-09-28 | Unilever Home & Personal Care Usa, Division Of Conopco, Inc. | Ordered liquid crystalline cleansing composition with benefit agent particles |
US6683037B2 (en) * | 2002-04-19 | 2004-01-27 | Colgate-Palmolive Company | Cleaning system including a liquid cleaning composition disposed in a water soluble container |
US7198055B2 (en) * | 2002-09-30 | 2007-04-03 | Lam Research Corporation | Meniscus, vacuum, IPA vapor, drying manifold |
GB2393911A (en) * | 2002-10-12 | 2004-04-14 | Reckitt Benckiser Inc | Antimicrobial hard surface cleaner |
US20040229766A1 (en) * | 2003-02-28 | 2004-11-18 | The Procter & Gamble Company | Protomicroemulsion, cleaning implement containing same, and method of use therefor |
US7737097B2 (en) * | 2003-06-27 | 2010-06-15 | Lam Research Corporation | Method for removing contamination from a substrate and for making a cleaning solution |
GB0403410D0 (en) * | 2003-11-18 | 2004-03-24 | Unilever Plc | Improved low ph detergent composition |
JP4821122B2 (ja) * | 2004-02-10 | 2011-11-24 | Jsr株式会社 | 洗浄用組成物、半導体基板の洗浄方法および半導体装置の製造方法 |
US20050205835A1 (en) * | 2004-03-19 | 2005-09-22 | Tamboli Dnyanesh C | Alkaline post-chemical mechanical planarization cleaning compositions |
-
2006
- 2006-02-03 US US11/347,154 patent/US7696141B2/en not_active Expired - Fee Related
- 2006-11-29 EP EP06256122A patent/EP1803803A3/en not_active Withdrawn
- 2006-11-29 SG SG2012096426A patent/SG187413A1/en unknown
- 2006-11-29 SG SG200608344-8A patent/SG133499A1/en unknown
- 2006-11-30 MY MYPI20064606A patent/MY141193A/en unknown
- 2006-11-30 TW TW103114090A patent/TW201430936A/zh unknown
- 2006-11-30 TW TW095144353A patent/TWI347354B/zh not_active IP Right Cessation
- 2006-11-30 TW TW100113915A patent/TW201137089A/zh unknown
- 2006-12-22 KR KR1020060132365A patent/KR20070072377A/ko active IP Right Grant
- 2006-12-27 JP JP2006351427A patent/JP4732326B2/ja not_active Expired - Fee Related
-
2010
- 2010-02-12 US US12/705,445 patent/US8137474B2/en not_active Expired - Fee Related
-
2012
- 2012-02-14 US US13/396,047 patent/US20120145202A1/en not_active Abandoned
-
2013
- 2013-09-30 KR KR1020130116973A patent/KR101445118B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US8137474B2 (en) | 2012-03-20 |
SG187413A1 (en) | 2013-02-28 |
KR20070072377A (ko) | 2007-07-04 |
JP4732326B2 (ja) | 2011-07-27 |
KR101445118B1 (ko) | 2014-11-03 |
US20100139694A1 (en) | 2010-06-10 |
TW201137089A (en) | 2011-11-01 |
KR20130112847A (ko) | 2013-10-14 |
MY141193A (en) | 2010-03-31 |
US20060128600A1 (en) | 2006-06-15 |
TW201430936A (zh) | 2014-08-01 |
TWI347354B (en) | 2011-08-21 |
TW200726824A (en) | 2007-07-16 |
EP1803803A2 (en) | 2007-07-04 |
EP1803803A3 (en) | 2012-08-01 |
US20120145202A1 (en) | 2012-06-14 |
JP2007184600A (ja) | 2007-07-19 |
US7696141B2 (en) | 2010-04-13 |
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