SG120952A1 - A method of aligning a substrate, a computer program, a device manufacturing method and a device manufactured thereby - Google Patents

A method of aligning a substrate, a computer program, a device manufacturing method and a device manufactured thereby

Info

Publication number
SG120952A1
SG120952A1 SG200305680A SG200305680A SG120952A1 SG 120952 A1 SG120952 A1 SG 120952A1 SG 200305680 A SG200305680 A SG 200305680A SG 200305680 A SG200305680 A SG 200305680A SG 120952 A1 SG120952 A1 SG 120952A1
Authority
SG
Singapore
Prior art keywords
aligning
substrate
computer program
device manufacturing
device manufactured
Prior art date
Application number
SG200305680A
Other languages
English (en)
Inventor
Keith Frank Best
Consolini Joseph
Alexander Friz
Van Henricus Wilhelmus Ma Buel
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG120952A1 publication Critical patent/SG120952A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200305680A 2002-09-13 2003-09-11 A method of aligning a substrate, a computer program, a device manufacturing method and a device manufactured thereby SG120952A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02256420 2002-09-13

Publications (1)

Publication Number Publication Date
SG120952A1 true SG120952A1 (en) 2006-04-26

Family

ID=32605224

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200305680A SG120952A1 (en) 2002-09-13 2003-09-11 A method of aligning a substrate, a computer program, a device manufacturing method and a device manufactured thereby

Country Status (6)

Country Link
US (1) US7041996B2 (ko)
JP (1) JP3940113B2 (ko)
KR (1) KR100550032B1 (ko)
CN (1) CN1495536A (ko)
SG (1) SG120952A1 (ko)
TW (1) TWI234189B (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1818797B (zh) * 2006-03-16 2011-01-19 上海微电子装备有限公司 光强数据总线系统及方法
CN102566338B (zh) * 2010-12-28 2013-11-13 上海微电子装备有限公司 光刻对准系统中对对准位置进行修正的方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5225686A (en) * 1990-09-12 1993-07-06 Canon Kabushiki Kaisha Positioning method and positioning mechanism for use in exposure apparatus
US5235408A (en) * 1988-09-05 1993-08-10 Canon Kabushiki Kaisha Position detecting method and apparatus
JPH06132197A (ja) * 1992-10-20 1994-05-13 Hitachi Ltd 光投影露光装置
US5801816A (en) * 1996-03-11 1998-09-01 Nikon Corporation Projection exposure apparatus
US6376329B1 (en) * 1997-08-04 2002-04-23 Nikon Corporation Semiconductor wafer alignment using backside illumination

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0727857B2 (ja) 1985-09-09 1995-03-29 株式会社ニコン 投影光学装置
JP4132095B2 (ja) * 1995-03-14 2008-08-13 株式会社ニコン 走査型露光装置
JPH1010746A (ja) 1996-06-27 1998-01-16 Nikon Corp 露光装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5235408A (en) * 1988-09-05 1993-08-10 Canon Kabushiki Kaisha Position detecting method and apparatus
US5225686A (en) * 1990-09-12 1993-07-06 Canon Kabushiki Kaisha Positioning method and positioning mechanism for use in exposure apparatus
JPH06132197A (ja) * 1992-10-20 1994-05-13 Hitachi Ltd 光投影露光装置
US5801816A (en) * 1996-03-11 1998-09-01 Nikon Corporation Projection exposure apparatus
US6376329B1 (en) * 1997-08-04 2002-04-23 Nikon Corporation Semiconductor wafer alignment using backside illumination

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
RESEARCH DISCLOSURE. VOL. 407, NO. 007 *

Also Published As

Publication number Publication date
KR100550032B1 (ko) 2006-02-08
CN1495536A (zh) 2004-05-12
JP2004279403A (ja) 2004-10-07
TW200414304A (en) 2004-08-01
KR20040024525A (ko) 2004-03-20
JP3940113B2 (ja) 2007-07-04
TWI234189B (en) 2005-06-11
US7041996B2 (en) 2006-05-09
US20040124375A1 (en) 2004-07-01

Similar Documents

Publication Publication Date Title
AU2003219354A1 (en) Carrier, method of manufacturing a carrier and an electronic device
EP1575343A4 (en) PLASMA GENERATING DEVICE, PLASMA CONTROL METHOD, AND SUBSTRATE MANUFACTURING METHOD
EP1579497A3 (en) Method for forming a semiconductor device and structure thereof
AU2003273366A8 (en) Semiconductor component comprising a resur transistor and method of manufacturing same
EP1513198A4 (en) METHODS OF MANUFACTURING A SUBSTRATE AND A SEMICONDUCTOR DEVICE, SUBSTRATE, AND SEMICONDUCTOR DEVICE PRODUCED USING THE SAME
AU2003220830A1 (en) Semiconductor manufacturing method and device thereof
EP1620894A4 (en) SUBSTRATE, MANUFACTURING METHOD AND SEMICONDUCTOR COMPONENT
EP1723673A4 (en) METHOD FOR PRODUCING A SEMICONDUCTOR CONSTRUCTION ELEMENT AND SEMICONDUCTOR ELEMENT PRODUCED THEREFOR
AU2003303012A1 (en) Method of manufacturing a trench-gate semiconductor device
AU2003211575A1 (en) Semiconductor substrate, semiconductor chip, and semiconductor device manufacturing method
GB0326376D0 (en) Array substrate for LCD and manufacturing method thereof
HK1111264A1 (en) Semiconductor substrate, semiconductor device and method of manufacturing a semiconductor substrate
AU2003296081A1 (en) Pattern forming method, electronic device manufacturing method, electronic device, and photomask
SG111122A1 (en) Substrate holder and device manufacturing method
AU2003255926A1 (en) Optoelectronic semiconductor device and method of manufacturing such a device
AU2003304218A8 (en) Method and system for fabricating multi layer devices on a substrate
AU2003207156A1 (en) Organic electronic device and its manufacturing method
AU2003277560A1 (en) Electronic device and its manufacturing method
EP1443409A4 (en) MONITORING PROCESS FOR ELECTRONIC EQUIPMENT, ELECTRONIC EQUIPMENT, COMPUTER AND PROGRAM THEREFOR
DE60238952D1 (de) Halbleiteranordnungsherstellungsmethode
TWI370520B (en) Method of manufacturing a semiconductor component, and semiconductor component formed thereby
HK1059000A1 (en) Method of making a semiconductor device with a lowpermittivity region
GB2401807B (en) A manufacturing substrate and a method for forming it
AU2003285510A1 (en) Method of manufacturing a fibrous substrate incorporating an electronic chip
SG120903A1 (en) Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program