SG116612A1 - Lithographic apparatus, control system and device manufacturing method. - Google Patents

Lithographic apparatus, control system and device manufacturing method.

Info

Publication number
SG116612A1
SG116612A1 SG200502260A SG200502260A SG116612A1 SG 116612 A1 SG116612 A1 SG 116612A1 SG 200502260 A SG200502260 A SG 200502260A SG 200502260 A SG200502260 A SG 200502260A SG 116612 A1 SG116612 A1 SG 116612A1
Authority
SG
Singapore
Prior art keywords
control system
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200502260A
Other languages
English (en)
Inventor
Butler Hans
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG116612A1 publication Critical patent/SG116612A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70533—Controlling abnormal operating mode, e.g. taking account of waiting time, decision to rework or rework flow
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200502260A 2004-04-14 2005-04-13 Lithographic apparatus, control system and device manufacturing method. SG116612A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/823,776 US7084958B2 (en) 2004-04-14 2004-04-14 Lithographic apparatus, control system and device manufacturing method

Publications (1)

Publication Number Publication Date
SG116612A1 true SG116612A1 (en) 2005-11-28

Family

ID=34938164

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200502260A SG116612A1 (en) 2004-04-14 2005-04-13 Lithographic apparatus, control system and device manufacturing method.

Country Status (7)

Country Link
US (1) US7084958B2 (zh)
EP (1) EP1586947A1 (zh)
JP (1) JP4617191B2 (zh)
KR (1) KR100714468B1 (zh)
CN (1) CN100498536C (zh)
SG (1) SG116612A1 (zh)
TW (1) TWI299438B (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036277A1 (nl) * 2007-12-19 2009-06-22 Asml Netherlands Bv Lithographic apparatus, stage system and stage control method.
NL1036292A1 (nl) * 2007-12-19 2009-06-22 Asml Netherlands Bv Controller for a positioning device, method for controlling a positioning device, positioning device, and lithographic apparatus provided with a positioning device.
NL1036516A1 (nl) * 2008-03-05 2009-09-08 Asml Netherlands Bv Lithographic apparatus and method.
JP5634052B2 (ja) * 2009-01-09 2014-12-03 キヤノン株式会社 荷電粒子線描画装置およびデバイス製造方法
US8228017B2 (en) * 2009-02-09 2012-07-24 Analog Devices, Inc. Control techniques for motor driven systems
US8766565B2 (en) 2009-02-09 2014-07-01 Analog Devices, Inc. Control techniques for motor driven systems
US8299744B2 (en) * 2009-02-09 2012-10-30 Analog Devices, Inc. Control techniques for motor driven systems
US9121753B2 (en) 2013-02-06 2015-09-01 Analog Devices Global Control techniques for motor driven systems utilizing back-EMF measurement techniques
US10175587B2 (en) 2013-12-20 2019-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102018202637B4 (de) * 2018-02-21 2021-09-23 Carl Zeiss Smt Gmbh Verfahren zur Bestimmung einer Fokuslage einer Lithographie-Maske und Metrologiesystem zur Durchführung eines derartigen Verfahrens
JP7148268B2 (ja) * 2018-05-01 2022-10-05 キヤノン株式会社 制御装置、リソグラフィ装置、および物品の製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0992609A (ja) * 1995-09-28 1997-04-04 Nikon Corp 露光方法及び装置
JP3651074B2 (ja) * 1995-09-13 2005-05-25 株式会社ニコン 露光方法、それを用いた半導体集積回路又は液晶表示素子の製造方法、及び露光装置
KR970016827A (ko) 1995-09-13 1997-04-28 오노 시게오 노광 방법 및 노광 장치
JPH09320933A (ja) * 1996-05-28 1997-12-12 Nikon Corp 走査型露光装置
JP3826481B2 (ja) * 1997-03-17 2006-09-27 株式会社ニコン ステージ装置及び制御ユニット
US6490025B1 (en) * 1997-03-17 2002-12-03 Nikon Corporation Exposure apparatus
JPH10275770A (ja) * 1997-03-31 1998-10-13 Nikon Corp 投影露光装置
US7016019B2 (en) * 2003-12-16 2006-03-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
US7084958B2 (en) 2006-08-01
TW200611079A (en) 2006-04-01
JP2005303318A (ja) 2005-10-27
TWI299438B (en) 2008-08-01
CN100498536C (zh) 2009-06-10
KR100714468B1 (ko) 2007-05-04
US20050231699A1 (en) 2005-10-20
CN1721994A (zh) 2006-01-18
JP4617191B2 (ja) 2011-01-19
EP1586947A1 (en) 2005-10-19
KR20060045680A (ko) 2006-05-17

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