SG11202109890QA - Improved self-moiré grating design for use in metrology - Google Patents

Improved self-moiré grating design for use in metrology

Info

Publication number
SG11202109890QA
SG11202109890QA SG11202109890QA SG11202109890QA SG 11202109890Q A SG11202109890Q A SG 11202109890QA SG 11202109890Q A SG11202109890Q A SG 11202109890QA SG 11202109890Q A SG11202109890Q A SG 11202109890QA
Authority
SG
Singapore
Prior art keywords
metrology
improved self
grating design
moiré grating
moiré
Prior art date
Application number
Inventor
Vladimir Levinski
Feler Yoel
Original Assignee
Kla Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Corp filed Critical Kla Corp
Publication of SG11202109890QA publication Critical patent/SG11202109890QA/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/60—Systems using moiré fringes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70681—Metrology strategies
    • G03F7/70683—Mark designs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
SG11202109890Q 2019-03-25 2020-03-20 Improved self-moiré grating design for use in metrology SG11202109890QA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201962823342P 2019-03-25 2019-03-25
PCT/US2020/023741 WO2020197950A1 (en) 2019-03-25 2020-03-20 Improved self-moiré grating design for use in metrology

Publications (1)

Publication Number Publication Date
SG11202109890QA true SG11202109890QA (en) 2021-10-28

Family

ID=72611725

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202109890Q SG11202109890QA (en) 2019-03-25 2020-03-20 Improved self-moiré grating design for use in metrology

Country Status (8)

Country Link
US (1) US11614692B2 (en)
EP (1) EP3938837A4 (en)
JP (1) JP7308284B2 (en)
KR (1) KR102637420B1 (en)
CN (1) CN113557466A (en)
SG (1) SG11202109890QA (en)
TW (1) TWI829899B (en)
WO (1) WO2020197950A1 (en)

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* Cited by examiner, † Cited by third party
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US11256177B2 (en) 2019-09-11 2022-02-22 Kla Corporation Imaging overlay targets using Moiré elements and rotational symmetry arrangements
CN112558215B (en) * 2020-12-07 2023-01-13 北京信息科技大学 Step type equal-grid-pitch grating based on femtosecond laser technology and preparation method thereof
US11720031B2 (en) * 2021-06-28 2023-08-08 Kla Corporation Overlay design for electron beam and scatterometry overlay measurements
CN114670244B (en) * 2022-03-29 2023-10-20 中国铁建重工集团股份有限公司 Structure manufacturing method and device

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JPH10270347A (en) * 1997-03-24 1998-10-09 Nikon Corp Method and device for detecting alignment offset
US6351307B1 (en) 1999-02-23 2002-02-26 The Regents Of The University Of California Combined dispersive/interference spectroscopy for producing a vector spectrum
US20030160163A1 (en) 2002-02-25 2003-08-28 Alan Wong Optical metrology target design for simultaneous measurement of multiple periodic structures
US7440105B2 (en) 2002-12-05 2008-10-21 Kla-Tencor Technologies Corporation Continuously varying offset mark and methods of determining overlay
WO2004107415A1 (en) * 2003-05-28 2004-12-09 Nikon Corporation Position information measuring method and device, and exposure method and system
SG118283A1 (en) * 2003-06-20 2006-01-27 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP4074867B2 (en) * 2003-11-04 2008-04-16 エーエスエムエル ネザーランズ ビー．ブイ． Method and apparatus for measuring relative positions of first and second alignment marks
DE102005046973B4 (en) 2005-09-30 2014-01-30 Globalfoundries Inc. A structure and method for simultaneously determining overlay accuracy and pattern placement error
TW200734702A (en) * 2005-12-15 2007-09-16 Nanoopto Corp Optical retarders and methods of making the same
SG153747A1 (en) 2007-12-13 2009-07-29 Asml Netherlands Bv Alignment method, alignment system and product with alignment mark
EP2458441B1 (en) * 2010-11-30 2022-01-19 ASML Netherlands BV Measuring method, apparatus and substrate
US8913237B2 (en) * 2012-06-26 2014-12-16 Kla-Tencor Corporation Device-like scatterometry overlay targets
JP6312664B2 (en) * 2012-06-26 2018-04-18 ケーエルエー−テンカー コーポレイション Near field measurement
WO2014062972A1 (en) 2012-10-18 2014-04-24 Kla-Tencor Corporation Symmetric target design in scatterometry overlay metrology
WO2015120070A1 (en) * 2014-02-05 2015-08-13 Kla-Tencor Corporation Grazing order metrology
CN106575007B (en) * 2014-07-31 2021-07-27 想象光学公司 Bragg liquid crystal polarization grating
JP6404070B2 (en) 2014-10-01 2018-10-10 国立研究開発法人産業技術総合研究所 Grid pattern for multi-scale deformation measurement and its manufacturing method
US9562793B2 (en) * 2014-11-17 2017-02-07 Mitutoyo Corporation Illumination portion for an optical encoder
KR20160121206A (en) 2015-04-10 2016-10-19 삼성전자주식회사 Method for detecting an overlay error and method for manufacturing semiconductor using the same
WO2016187453A1 (en) 2015-05-19 2016-11-24 Kla-Tencor Corporation Self-moiré target design principles for measuring unresolved device-like pitches
KR102311186B1 (en) 2015-11-19 2021-10-08 삼성전자주식회사 Method of forming patterns of semiconductor device
JP2019501416A (en) * 2015-12-09 2019-01-17 スリーエム イノベイティブ プロパティズ カンパニー Optical laminate
DE102016202198A1 (en) * 2016-02-12 2017-08-17 Carl Zeiss Smt Gmbh Device for moiré measurement of an optical specimen
US9871595B2 (en) * 2016-04-27 2018-01-16 Industrial Technology Research Institute Decoding device and method for absolute positioning code
CN106597675B (en) * 2016-12-21 2019-04-05 广东顺德中山大学卡内基梅隆大学国际联合研究院 A kind of naked eye 3D Morie fringe cancellation element and its application method
US10551749B2 (en) * 2017-01-04 2020-02-04 Kla-Tencor Corporation Metrology targets with supplementary structures in an intermediate layer

Also Published As

Publication number Publication date
KR102637420B1 (en) 2024-02-15
JP7308284B2 (en) 2023-07-13
CN113557466A (en) 2021-10-26
US20210200106A1 (en) 2021-07-01
KR20210132737A (en) 2021-11-04
WO2020197950A1 (en) 2020-10-01
TWI829899B (en) 2024-01-21
EP3938837A1 (en) 2022-01-19
US11614692B2 (en) 2023-03-28
JP2022526933A (en) 2022-05-27
EP3938837A4 (en) 2022-11-23
TW202104832A (en) 2021-02-01

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